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Coating apparatus

20130118401 - System and method for coating tubes: The present invention relates to coating of tubes, and more particularly to a system and method for coating and/or renovating deteriorated or pitted tubes to extend tube life and enhance performance. Using this system and method a thin coating is applied to the interior of a tube such that the... Agent: Plastocor, Inc.

20130118402 - Masking article for producing precise paint lines and method of improving paint line performance of masking articles: An adhesive masking article for shielding a protected work surface from a coating applied to a surface adjacent the protected work surface includes a backing layer having first and second opposed major surfaces, and at least one edge, an adhesive on at least a portion of at least one of... Agent: 3m Innovative Properties Company

20130118403 - Chemical bath deposition system: A chemical bath deposition system is used for forming a buffer layer on a back electrode substrate having a photoelectric transducing layer. The chemical bath deposition system includes a chemical bath tank, a chemical-solution purification device, and a dosing device. The chemical bath tank is used for storing a buffer-layer... Agent:

20130118404 - Methods and systems for forming thin films: A method and apparatus for the deposition of thin films is described. In embodiments, systems and methods for epitaxial thin film formation are provided, including systems and methods for forming binary compound epitaxial thin films. Methods and systems of embodiments of the invention may be used to form direct bandgap... Agent: Intermolecular, Inc.

20130118405 - Fluid cooled showerhead with post injection mixing: A showerhead that injects two process gases into the processing chamber via separate sets of holes. The showerhead is constructed of upper plate and lower plate. Upper plate has a first set of holes. The lower plate has two sets of holes: one set is aligned with the holes in... Agent:

20130118406 - Method for cold plasma treatment of plastic bottles and device for implementing same: The present invention relates to a method for treating plastic bottles comprising an operation for cold plasma sterilization with non-germicidal gasses and/or an operation for the cold plasma deposition of a diffusion barrier layer, said method being characterized in that said cold plasma delivers adjustable nonthermal energy to the entire... Agent: Air Liquide, Societe Anonyme Pour Etude Et Exploitation Des Procedes Georges Claude

20130118407 - Substrate susceptor and deposition apparatus having same: The present disclosure relates to a deposition apparatus used to manufacture a semiconductor device including a process chamber; a substrate susceptor installed in the process chamber and including a plurality of concentrically arranged stages on which substrates are positioned; a plurality of members for supplying reaction gas; a member for... Agent: Kookje Electric Korea Co., Ltd.

20130118409 - Electrical contacts for use with vacuum deposition sources: The present invention provides electrical contact assemblies can be used with vacuum deposition sources. In one exemplary application, the electrical contact assemblies of the present invention provide electrical contact to an arcuate or otherwise curved surface of a heating device used with a vacuum deposition source.... Agent: Veeco Instuments Inc.

20130118408 - System for use in the formation of semiconductor crystalline materials: A system used in the formation of a semiconductor crystalline material includes a first chamber configured to contain a liquid metal and a second chamber in fluid communication with the first chamber, the second chamber having a greater volume than a volume of the first reservoir chamber. The system further... Agent: Saint-gobain Ceramics & Plastics, Inc.

20130112136 - Device for applying fluid media: The invention relates to a device for applying fluid media to material that is moved in a web-like manner, in particular for applying hot-melt adhesive (4) to a textile material, and in particular for reinforcing the back of a carpet or a synthetic turf (1), comprising a gap-shaped application region... Agent:

20130112137 - Curtain coater: Curtain coater for discharging liquid or pasty application medium in the form of a curtain moving substantially under the force of gravity onto a moving paper or board web, comprising a nozzle body which has a first distributor chamber extending along a discharge width, to which the application medium is... Agent: Andritz Kusters Gmbh

20130112138 - Particle sources and methods for manufacturing the same: The present disclosure provides a method for manufacturing a particle source, comprising: placing a metal wire in vacuum, introducing active gas and catalyst gas, adjusting a temperature of the metal wire, and applying a positive high voltage V to the metal wire to dissociate the active gas at the surface... Agent: 38th Research Institute, China Electronics Technology Group Corporation

20130112139 - Mask for use in evaporation coating process: A mask includes a base board, a number of wing boards, and aluminum foil. The wing boards are detachably attached to the base board in pairs, in a certain disposition and order and are rotatable relative to the base board in a substantially coplanar manner. The aluminum foil wraps around... Agent: Hon Hai Precision Industry Co., Ltd.

20130112140 - Apparatus for growth of dilute-nitride materials using an isotope for enhancing the sensitivity of resonant nuclear reaction analysis: In certain desirable embodiments, the present invention relates to the use of 15N isotopes into GaAsN, InAsN or GaSbN films for ion beam analysis. A semiconductor-nitride assembly for growing and analyzing crystal growth in a group III-V semiconductor sample that includes: a substrate; a buffer layer deposited on the substrate,... Agent: U.s. Government As Represented By The Secretary Of The Army

20130112141 - Treatment device: A processing system according to the present invention includes: a diffusion processing section 10 which heats a sintered R-T-B based magnet body 1 and an RH diffusion source 2 made of either a metal or alloy of a heavy rare-earth element RH (which is at least one of Dy and... Agent: Hitachi Metals ,ltd.

20130104801 - Mask for use in evaporation coating device: An evaporation coating device includes a hollow main portion, a loading rack, a source material, and a mask. The loading rack is received in the main portion and mounted on a top plate of the main portion for carrying workpieces to be coated. The source material for evaporation is arranged... Agent: Hon Hai Precision Industry Co., Ltd.

20130104802 - Gallium trichloride injection scheme: A system for epitaxial deposition of a Group III-V semiconductor material that includes gallium. The system includes sources of the reactants, one of which is a gaseous Group III precursor having one or more gaseous gallium precursors and another of which is a gaseous Group V component, a reaction chamber... Agent: Soitec

20130104804 - Batch-type remote plasma processing apparatus: A plasma processing apparatus comprises a processing chamber in which a plurality of substrates are stacked and accommodated; a pair of electrodes extending in the stacking direction of the plurality of substrates, which are disposed at one side of the plurality of substrates in said processing chamber, and to which... Agent: Hitachi Kokusai Electric Inc.

20130104803 - Thin film forming apparatus: The thin-film forming apparatus includes: a deposition vessel that includes a deposition space in which the thin film is formed on the substrate in a reduced-pressure state; a raw material gas introducing section configured to introduce a raw material gas for the thin-film into the deposition space of the deposition... Agent: Mitsui Engineering & Shipbuilding Co., Ltd.

20130098291 - Substrate treatment equipment and manufacturing method of substrate: The invention aims to provide substrate treatment equipment that can automatically collect a substrate in a normal condition without needing manual operation. The equipment includes a substrate holder 26 for holding substrates 12 in a multistage manner and a substrate transfer unit 34 for transferring the substrates 12 into the... Agent: Hitaci Kokusai Electric Inc.

20130098292 - Processing system: A processing system for processing an object (3) is provided, wherein the processing system is adapted, to focus a first energy beam, in particular an electron beam (11), and a second energy beam, in particular an ion beam (21), on a focusing region (29) in which a object (3) to... Agent: Carl Zeiss Nts Gmbh

20130098293 - Chemical vapor deposition apparatus: A chemical vapor deposition apparatus can include a reaction chamber having a reaction space therein; a wafer boat disposed in the reaction space, the wafer boat arranged and structured to support a plurality of wafers; and a gas supplying part disposed in the reaction chamber to supply two or more... Agent: Samsung Electronics Co., Ltd.

20130098294 - Conveyor assembly with removable rollers for a vapor deposition system: A conveyor assembly for conveying substrates through a vapor deposition system includes a first carriage rail disposed at a drive side of the conveyor assembly. A roller position is defined along the carriage rail, and a drive wheel is disposed at the roller position and configured for driving engagement against... Agent: Primestar Solar, Inc.