Coating apparatus patents - Monitor Patents Logo icons
Monitor Keywords Patent Organizer File a Provisional Patent Browse Inventors Browse Industry Browse Agents

USPTO Class 118  |  Browse by Industry: Previous - Next | All     monitor keywords
Recent  |  14: Jul | Jun | May | Apr | Mar | Feb | Jan | 13: Dec | Nov | Oct | Sep | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan | 12: Dec | Nov | Oct | Sep | Aug | July | June | May | April | Mar | Feb | Jan | 11: Dec | Nov | Oct | Sep | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan | 10: Dec | Nov | Oct | Sep | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan |  | 09: Dec | Nov | Oct | Sep | Aug | Jl | Jn | May | Apr | Mar | Fb | Jn |  | 2008 | 2007 |

Coating apparatus

Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application.
07/10/2014 > 10 patent applications in 9 patent subcategories.

20140190404 - Apparatus for dispensing objects on a substrate: An apparatus for deploying objects such as candies from an objects dispenser onto an underlying substrate such as cake according to a selected pattern, the apparatus including a rigid frame and at least one beam extending across the frame, with an objects dispenser device mounted to the beam. Selectively operable... Agent:

20140190405 - Self-cleaning shutter for cvd reactor: A chemical vapor deposition reactor and a method of wafer processing are provided. The reactor can include a reaction chamber having an interior and an entry port for insertion and removal of substrates, a gas inlet manifold communicating with the interior of the chamber for admitting process gasses to form... Agent: Veeco Instruments Inc.

20140190406 - Chassis dip treatment stations: A chassis dip treatment station may include a process liquid tank; a line configured to convey in sequence a plurality of skids inside and outside of the station, the skids each configured to support a chassis to be treated, the conveying line comprising roller units for displacing the skids, the... Agent: Geico S.p.a.

20140190407 - Coating a substance with graphene: Technologies are generally described for a system and process effective to coat a substance with graphene. A system may include a first container including graphene oxide and water and a second container including a reducing agent and the substance. A third container may be operative relationship with the first container... Agent: Empire Tecnology Development, LLC

20140190408 - Catheter tip coating system: A catheter tip coating assembly includes a housing defining a fluid reservoir and having a fluid outlet configured to dispense fluid to an end of a piece of tubing. The catheter tip coating assembly includes a valve assembly carried by the housing and at least partly disposed in fluid communication... Agent: Fishman Corporation

20140190409 - Device and method for forming film: The present disclosure relates to a film forming apparatus for forming a thin film on a surface of an object to be processed by using an organic metal raw material gas within a processing chamber configured to exhaust air, wherein a hydrophobic layer is installed on a surface of a... Agent: Tokyo Electron Limited

20140190410 - Equipment for manufacturing semiconductor: Provided is an equipment for manufacturing a semiconductor. The equipment for manufacturing a semiconductor includes a cleaning chamber in which a cleaning process is performed on substrates, an epitaxial chamber in which an epitaxial process for forming an epitaxial layer on each of the substrates is performed, and a transfer... Agent: Eugene Technology Co., Ltd.

20140190411 - Lid assembly for a processing system to facilitate sequential deposition techniques: Embodiments of the invention generally relate to apparatuses for processing substrates. In one embodiment, a substrate processing system is provided and includes a lid having an upper lid surface opposed to a lower lid surface, a plurality of gas inlet passages extending from the upper lid surface to the lower... Agent: Applied Materials, Inc.

20140190412 - Apparatus for fabricating ingot: Disclosed is an apparatus for fabricating an ingot. The apparatus includes a crucible to receive a raw material, and a filter part to allow a specific component in the crucible to selectively pass through the filter part. The raw material includes silicon and carbon.... Agent: Lg Innotek Co., Ltd.

20140190413 - Apparatus for fabricating ingot: Disclosed is an apparatus for fabricating an ingot. The apparatus comprises a crucible to receive a source material, and a temperature difference compensating part on the source material. The temperature difference compensating part comprises a plurality of holes.... Agent: Lg Innotek Co., Ltd.

07/03/2014 > 4 patent applications in 4 patent subcategories.

20140182513 - Hybrid screening nozzle: An extrusion nozzle for applying a paste to a green sheet. The nozzle having a center orifice with a leading edge and a trailing edge. The leading edge comprising a tip having a durometer value of about 40 D shore. The leading edge may comprise a urethane material. The trailing... Agent: International Business Machines Corporation

20140182514 - Display panel manufacturing device: A display panel manufacturing device including a stage slider, a first stage configured to slide on the stage slider and to receive a test substrate, a second stage on the stage slider and configured to receive a main substrate, and a patterning unit located at a distance from the stage... Agent:

20140182515 - Substrate processing apparatus, method of manufacturing semiconductor device and vaporization system: A substrate processing apparatus includes: a processing chamber configured to accommodate a substrate; a vaporized gas supply system which includes a vaporizer to vaporize a liquid precursor into a vaporized gas and is configured to supply the vaporized gas into the processing chamber; and a control unit configured to control... Agent: Hitachi Kokusai Electric Inc.

20140182516 - Apparatus for fabricating ingot: The present invention relates to an apparatus for fabricating ingot including a crucible to accommodate a material, a top cover enclosing the circumference of the temperature difference compensative part, and a heat insulator to be disposed on the top cover.... Agent: Lg Innotek Co., Ltd.

06/26/2014 > 22 patent applications in 18 patent subcategories.

20140174344 - Feed roller type system for continuous feeding of filler material for friction stir welding, processing and fabrication: The present invention relates to tools and methods for disposing, coating, repairing, or otherwise modifying the surface of a metal substrate using frictional heating and compressive/shear loading of a consumable metal against the substrate. Embodiments of the invention include friction-based fabrication tooling comprising a non-consumable member with a throat and... Agent:

20140174345 - Dyeing device for applying dye to columnar objects: A device for dyeing columnar objects rotates the columnar object as they brush past an endless, absorbent, dye-carrying belt. The colored dye from the belt rubs off onto the columnar object, providing an even and consistent coating of dye.... Agent:

20140174346 - Powder coating booth: A powder spray for lengthy parts includes a booth wall structure comprised primarily of doors. A moveable roof may be raised and lowered to clean powder overspray from the interior surfaces of the booth. A cleaning process may be performed with a sideways extraction mode and a downward extraction mode.... Agent: Nordson Corporation

20140174347 - Mounting assembly for adhesive dispenser and adhesive dispenser using same: A mounting assembly for an adhesive dispenser includes a sliding board, a first fixing board, and a second fixing board. The sliding board includes two sliding rails on two opposite sides thereof. An adhesive container is mounted on the sliding board. The first fixing board includes a first sliding groove.... Agent: Hong Fu Jin Precision Industry (shenzhen) Co., Ltd.

20140174348 - Glue coating device: A glue coating device for coating glue on a workpiece includes a table, a first driving mechanism assembled on the table, a second driving mechanism slidably assembled to the first driving mechanism, a rotating mechanism assembled to the second driving mechanism, and a dispensing assembly assembled to the rotating mechanism.... Agent: Hong Fu Jin Precision Industry (shenzhen) Co., Ltd

20140174349 - Apparatus and methods of mixing and depositing thin film photovoltaic compositions: Improved methods and apparatus for forming thin-film layers of semiconductor material absorber layers on a substrate web. According to the present teachings, a semiconductor layer may be formed in a multi-zone process whereby various layers are deposited sequentially onto a moving substrate web. At least one layer is deposited from... Agent: Global Solar Energy, Inc.

20140174350 - Vapor deposition apparatus: There is provided a vapor phase deposition apparatus including: a reaction chamber having a susceptor with a wafer mounted thereon and depositing and growing an epitaxial thin film on the wafer; a housing having the reaction chamber disposed therein and having a window opened and closed to allow the wafer... Agent: Samsung Electronics Co., Ltd.

20140174351 - Substrate position detecting apparatus, substrate processing apparatus using substrate position detecting apparatus, and deposition apparatus: A substrate position detecting apparatus detects a position of a substrate inside a chamber from an image of a target inside the chamber. The apparatus includes an image pickup device to pick up the image of the target inside the chamber through a window, an illumination device to irradiate light... Agent: Tokyo Electron Limited

20140174352 - Apparatus for processing wafers: A wafer processing apparatus includes a first tube extending in a vertical direction, a second tube arranged in the first tube and defining a reaction chamber, the reaction chamber being configured to receive a boat that holds a plurality of wafers, first and second gas nozzles in the second tube,... Agent:

20140174353 - High-temperature grade steel for fluidized bed reactor equipment: Embodiments of a reaction chamber liner for use in a heated silicon deposition reactor are disclosed. The liner has an upper portion, a mid portion comprising a material other than a stainless steel alloy, and a lower portion comprising a martensitic stainless steel alloy. The liner's upper portion may have... Agent: Rec Silicon Inc

20140174354 - Single-and dual-chamber module-attachable wafer-handling chamber: A single- and dual-chamber module-attachable wafer-handling chamber includes: a wafer-handling main chamber equipped with a wafer-handling robot therein, and adaptors for connecting process modules to the wafer-handling main chamber. The adaptors are detachably attached to the sides of the wafer-handling main chamber, respectively, and the process modules are detachably attached... Agent: AsmIPHolding B.v.

20140174355 - Plasma cvd apparatus and vacuum treatment apparatus: In one embodiment of the invention, a protective film formation chamber for forming a carbon protective film on a magnetic film includes: a gas introduction part which introduces a source gas to a vacuum vessel; a discharge electrode having a discharge surface at a position facing a substrate conveyed to... Agent: Canon Anelva Corporation

20140174357 - Equipment for manufacturing semiconductor: Provided is an equipment for manufacturing a semiconductor. The equipment for manufacturing a semiconductor includes a cleaning chamber in which a cleaning process is performed on substrates, an epitaxial chamber in which an epitaxial process for forming an epitaxial layer on each of the substrates is performed, and a transfer... Agent: Eugene Technology Co., Ltd.

20140174356 - Substrate supporting unit and substrate processing apparatus manufacturing method of the substrate supporting unit: Provided are a substrate supporting unit and a substrate processing apparatus, and a method of manufacturing the substrate supporting unit. The substrate supporting unit includes a susceptor on which a substrate is placed on a top surface thereof, one or more heat absorbing members which are capable of being converted... Agent: Eugene Technology Co., Ltd.

20140174358 - Magnetic field assisted deposition: Embodiments relate to applying a magnetic field across the paths of injected polar precursor molecules to cause spiral movement of the precursor molecules relative to the surface of a substrate. When the polar precursor molecules arrive at the surface of the substrate, the polar precursor molecules make lateral movements on... Agent: Veeco Ald Inc.

20140174362 - Apparatus and methods for symmetrical gas distribution with high purge efficiency: Provided are apparatus and methods for depositing materials by vapor deposition and plasma enhanced vapor deposition techniques, and more particularly a gas distribution assembly and vapor deposition chamber to deposit a material. The gas distribution assembly comprises a plurality of sections with each section containing a flow channel with passages... Agent:

20140174361 - Heated backing plate: The present invention generally relates to a heated backing plate coupled to a gas distribution showerhead in a PECVD chamber. The backing plate is heated by circulating a heating fluid either through channels formed within the backing plate or a tube coupled to the backing plate. A heated backing plate... Agent: Applied Materials, Inc.

20140174360 - Vapor deposition apparatus and method of manufacturing organic light-emitting display apparatus: A vapor deposition apparatus for forming a deposition layer on a substrate, the vapor deposition apparatus includes a supply unit configured to receive a first source gas, a reaction space connected to the supply unit, a plasma generator in the reaction space, a first injection unit configured to inject a... Agent: Samsung Display Co., Ltd.

20140174359 - Plasma generator and cvd device: A plasma generation apparatus according to the present invention includes an electrode cell and a housing that encloses the electrode cell. The electrode cell includes a first electrode, a discharge space, a second electrode, dielectrics, and a pass-through formed in a central portion in a plan view. An insulating tube... Agent: Toshiba Mitsubishi-electric Industrial Systems Corporation

20140174363 - Film forming apparatus: A method for forming a film includes the steps of: placing an object to be processed into a processing container; and generating M(BH4)4 gas by feeding H2 gas as carrier gas into a raw material container in which solid M(BH4)4 (where M is Zr or Hf) is accommodated to introduce... Agent: Tokyo Electron Limited

20140174364 - Heat treatment device: A heat treatment device includes: a processing container that accommodates a plurality of substrates to be subjected to heat treatment; a substrate holding member that holds the plurality of substrates; an induction heating coil that forms an induction magnetic field inside the processing container; a high frequency power supply that... Agent: Tokyo Electron Limited

20140174365 - Latent print development apparatus: A kit, an apparatus, and method are provided for developing a latent print. The apparatus comprises a pellet comprising a substrate impregnated with a sublimation compound, a receptacle, an adapter, and an end cap. The receptacle is open at a first end and detachably connected to a heat source at... Agent:

06/19/2014 > 10 patent applications in 7 patent subcategories.

20140165907 - Conveyance apparatus and robot system: The conveyance apparatus includes: a swing arm whose distal end portion passes on a carrying-in/out position and a working position while being swung, which are provided on a circular trajectory in advance, a plurality of turn tables each of which is mounted on the corresponding distal end portion of the... Agent: Kabushiki Kaisha Yaskawa Denki

20140165906 - Magnetic masks for an ion implant apparatus: An ion implant apparatus configured to measure the temperature or monitor the degradation of components in the apparatus is provided. The ion implant apparatus may include a platen configured to move in a first direction, a mask frame to hold one or more masks disposed on the platen, a first... Agent: Varian Semiconductor Equipment Associates, Inc.

20140165909 - Manufacturing apparatus for depositing a material on a carrier body: A gasket is used in a manufacturing apparatus, which deposits a material on a carrier body. A reaction chamber is defined by a housing and a base plate of the manufacturing apparatus. The gasket is disposed between the housing and the base plate for preventing a deposition composition, which comprises... Agent: Hemlock Semiconductor Corporation

20140165908 - Transfer chamber and method of using a transfer chamber: An ion implanter and method for facilitating expeditious performance of maintenance on a component of the ion implanter in a manner that reduces downtime while increasing throughput of the ion implanter. The ion implanter includes a process chamber, a transfer chamber connected to the process chamber, a first isolation gate... Agent: Varian Semiconductor Equipment Associates, Inc.

20140165910 - Apparatus for large-area atomic layer deposition: Disclosed is an apparatus for batch-type large-area atomic layer deposition, which can perform an atomic layer deposition process on a plurality of large-area glass substrates. The apparatus comprises: a vacuum chamber; gate valves provided at both sides of the vacuum chamber; a process gas supply unit provided in the upper... Agent: Ncd Co., Ltd.

20140165911 - Apparatus for providing plasma to a process chamber: Embodiments of apparatus for providing plasma to a process chamber are provided. In some embodiments, an apparatus may include a first ground plate; an electrode disposed beneath and spaced apart from the first ground plate by a first electrical insulator to define a first gap between the first ground plate... Agent: Applied Materials, Inc.

20140165912 - Apparatus for providing plasma to a process chamber: Apparatus for providing plasma to a process chamber may include an electrode; a first ground plate disposed beneath the electrode defining a cavity therebetween; an insulator disposed between the electrode and first ground plate to prevent direct contact therebetween; a second ground plate disposed beneath the first ground plate defining... Agent: Applied Materials, Inc.

20140165913 - Deposition source and deposition apparatus including the same: A deposition source includes a furnace extending in a first direction and configured to discharge deposits on a substrate, and a cooling housing on the furnace comprising a plurality of cooling plates, wherein each of the cooling plates comprises a plurality of cooling flow paths around the furnace.... Agent: Samsung Display Co., Ltd.

20140165914 - Organic material deposition apparatus: An organic material deposition apparatus includes a chamber, a substrate support unit, a rail, a driving apparatus, a plate heating apparatus, and a plate cooling apparatus. The substrate support unit is disposed in an upper portion of the chamber and supports the substrate. The rail extends from a deposition region,... Agent:

20140165915 - Thermal radiation barrier for substrate processing chamber components: An apparatus for a substrate support heater and associated chamber components having reduced energy losses are provided. In one embodiment, a substrate support heater is provided. The substrate support heater includes a heater body having a first surface to receive a substrate and a second surface opposing the first surface,... Agent:

Previous industry: Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
Next industry: Animal husbandry


RSS FEED for 20140710: xml
Integrate into your RSS reader/aggregator or website to track weekly updates.
For more info, read this article.


Thank you for viewing Coating apparatus patents on the website. These are patent applications which have been filed in the United States. There are a variety ways to browse Coating apparatus patent applications on our website including browsing by date, agent, inventor, and industry. If you are interested in receiving occasional emails regarding Coating apparatus patents we recommend signing up for free keyword monitoring by email.

Results in 0.44673 seconds