Coating apparatus inventions

20090277378 - Coating apparatus: A round outer periphery of a valve mount member (17) is provided at a rear end portion (3D) of a housing (3) of a main coater body (2), main component valves (22) and wash fluid valve (30) of a main component valve assembly (21) are detachably mounted along with hardener... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20090277379 - Film coating apparatus: A gas ejected from a sonic nozzle toward the rear surface of a wafer. The flow speed of the gas flowing to the outer circumference side along the rear surface of the wafer is increased between the rear surface of the wafer and a second cup and is kept by... Agent: Masuvalley & Partners

20090277380 - Method and apparatus to coat eps foam cored mouldings: A method and apparatus to coat preformed polystyrene cores with a layer of stucco-like material. The apparatus includes a coating chamber which is adjustable vertically and horizontally to suit the core height and width and includes a knife guide to maintain straightness of the core. Three chains with teeth drive... Agent: David A. Schmidt

20090277381 - Film coating holder: An exemplary film coating holder includes a main body, a plurality of workpiece holders, and a driving module. The main body includes a plurality of through holes defined therein and a central axis. The main body is capable of rotating around the central axis. Each workpiece holder is arranged in... Agent: PCe Industry, Inc. Att. Steven Reiss

20090277382 - Semiconductor manufacturing apparatus: Provided is a semiconductor manufacturing apparatus, which is capable of realizing fine-pitch patterns and thus improving stabilization of patterning precision. The semiconductor manufacturing apparatus comprises: a photoresist processing unit for forming a photoresist pattern in a predetermined region on a substrate to which a predetermined process is applied; and a... Agent: Brundidge & Stanger, P.C.

20090277383 - Adhesive dispenser with temperature controller: An exemplary adhesive dispenser includes a container configured for supplying an adhesive, a plurality of nozzles configured for dispensing the adhesive, and a temperature controller connected between the container and the nozzles. The temperature controller has a chamber defined therein, and the chamber is configured for accommodating the adhesive. The... Agent: PCe Industry, Inc. Att. Steven Reiss

20090277384 - Modular paint line and method of operation therefor: A paint line includes a plurality of modular manufacturing stations positioned in series and defining a forward transport direction. Each modular manufacturing station includes an article transportation device for moving at least one carrier through the modular manufacturing station. At least one of the modular manufacturing stations includes a piece... Agent: Caterpillar C/o Liell, Mcneil & Harper Intellectual Property Department

20090277385 - Method and apparatus for coating interior surfaces of medical devices: A coating can be applied to an endolumenal wall of a medical device by positioning an optical fiber within the lumen, providing a photo-activated chemical to contact the endolumenal wall, supplying the optical fiber with radiation capable of activating the chemical within the lumen, and withdrawing the optical fiber from... Agent: Brinks Hofer Gilson & Lione/indy/cook Brinks Hofer Gilson & Lione

20090277386 - Catalytic chemical vapor deposition apparatus: A catalytic chemical vapor deposition apparatus comprising a substrate 4 arranged in a processing chamber 1, a shower plate 7 facing the substrate 4, and a catalyst 5 comprising metal tungsten wire activating a raw material gas from the shower plate 7, where the catalyst 5 is interposed between the... Agent: Arent Fox LLP

20090277388 - Heater with detachable shaft: Embodiments of the present invention generally include an apparatus for uniform heat distribution across the surface of a substrate during processing. The apparatus includes a substrate heater with a heated substrate support surface that is removable attached to a heater shaft via a fastening mechanism. The interface between the heated... Agent: Patterson & Sheridan, LLP - - Appm/tx

20090277389 - Processing apparatus: A processing apparatus is provided for performing a process on a target object in a processing chamber which can be vacuumized, especially for performing high-k dielectric of HfO, HfSiO, ZrO, ZrSiO, PZT, BST and the like. A film adhesion preventing layer composed of an SAM (self-assembled monolayer) is arranged on... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20090277387 - Susceptor and chemical vapor deposition apparatus including the same: There are provided a susceptor and a chemical vapor deposition apparatus including the same. The susceptor includes: at least one pocket accommodating a deposition object therein; a seating part stepped downward from a top end of the pocket, the seating part having the deposition object placed thereon; and a recess... Agent: Mcdermott Will & Emery LLP

20090277390 - Source, an arrangement for installing a source, and a method for installing and removing a source: The invention relates to an arrangement for installing a source into a gas deposition reactor. The arrangement comprises at least one source fitting for the source such that the source fitting is connected to a reaction space of the gas deposition reactor, and a source installable at least partly inside... Agent: Oliff & Berridge, PLC

20090272316 - Device for spraying a cosmetic composition: The present invention relates to a cosmetic assembly comprising a cosmetic or dermatological composition contained in a reservoir, the said composition being liquid and comprising, in a physiologically acceptable medium, at least one pulverulent phase, and the said composition having a viscosity ranging from 5 to 500 mPa·s, and to... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20090272317 - Powder coating cabin or substructure therefor: In a powder spraycoating cabin or substructure for same, a cabin bottom contains bottom flaps configured near outer longitudinal walls and a walk-on bottom part situated between the bottom flaps. The bottom flaps are rotatable about an axis of rotation running in the lengthwise cabin direction, as a result of... Agent: Lowe, Hauptman, Ham & Berner, LLP (itw)

20090272318 - Device for supporting a substrate, as well as a method for manufacturing such a device: The invention to a device (10) for supporting a substrate during the manufacture of semiconductor components, comprising a substantially flat plate with an upper surface (11) on which the substrate can be positioned. The invention also relates to a method for manufacturing such a device (10). The object of the... Agent: Haynes And Boone, LLPIPSection

20090272319 - Apparatus for hot-dip coating of a metal strand: e

20090272320 - Jet driven rotating ultraviolet lamps for curing floor coatings: A machine for applying ultraviolet light to curable coatings on floors and other wide area surfaces. A housing encloses rotating arms carrying UV lamps spinning about a central axis. Rotation is caused by reactive momentum from heated air jets coming from fans in barrels blowing air over heated wires, resembling... Agent: Schneck & Schneck

20090272321 - Manufacturing apparatus of semiconductor device and pattern-forming method: The present invention provides a manufacturing apparatus of a semiconductor device, having a pattern-forming apparatus using a droplet-discharging method that is suitable for a large substrate in mass production. A plurality of pattern-forming apparatuses using a droplet-discharging method and a plurality of heat-treatment chambers are provided, and each of which... Agent: Nixon Peabody, LLP

20090272322 - Film depositing apparatus: A film depositing apparatus comprises: a transport unit that transports a substrate along a predetermined transport path; a first film deposition compartment that is provided with a first film depositing unit for forming an organic layer on a surface of the substrate; a second film deposition compartment that is disposed... Agent: Sughrue Mion, PLLC

20090272323 - Susceptor, semiconductor manufacturing apparatus, and semiconductor manufacturing method: A susceptor includes a first step portion on which a wafer is placed; and a convex portion placed on a bottom surface of the first step portion, wherein a void is formed between a top surface of the convex portion and a rear surface of the wafer in a state... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20090272324 - Slit valve having increased flow uniformity: Methods and apparatus for increasing flow uniformity are provided herein. In some embodiments, a slit valve having increased flow uniformity may be provided, the slit valve may include a housing having an opening disposed therethrough, the opening configured to allow a substrate to pass therethrough; a gas inlet formed in... Agent: MoserIPLaw Group / Applied Materials, Inc.

20090266295 - Tiling adhesive applicator: Apparatus (10) for applying adhesive to a surface to be tiled has a container (11) for the adhesive and a pair of opposed end walls (12,14) at least one of which is removable. The container has an outlet port (24) and one end wall (14) supports a plunger (19,23) for... Agent: Brooks Kushman P.C.

20090266296 - Atomic layer growing apparatus: An atomic layer growing apparatus includes a film forming chamber (101) in which the vapor phase growth of a film is performed, a substrate table (102) having a heating mechanism accommodated in the film forming chamber (101), and an exhaust mechanism (104). The atomic layer growing apparatus also includes a... Agent: Blakely Sokoloff Taylor & Zafman LLP

20090266297 - Liquid material application device: A liquid material application device having high space utilization efficiency and having excellent maintainability. In a liquid material application device for applying a liquid material to a desired position on a surface of a workpiece in a box by relatively moving a nozzle for discharging the liquid material and a... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20090266298 - Plasma doping apparatus: On an upper wall of a vacuum container opposing a sample electrode, a plasma-invasion prevention-and-electron beam introducing hole is installed which is communicated with an electron beam introducing tube, and is used for introducing an electron beam toward a substrate in the vacuum container, as well as for preventing invasion... Agent: Mcdermott Will & Emery LLP

20090266299 - Low profile process kit: Embodiments of process kits for substrate supports of semiconductor substrate process chambers are provided herein. In some embodiments, a process kit for a semiconductor process chamber may include an annular body being substantially horizontal and having an inner and an outer edge, and an upper and a lower surface; an... Agent: MoserIPLaw Group / Applied Materials, Inc.

20090266300 - Substrate processing apparatus and substrate placing table: A film forming apparatus includes a process chamber 2 configured to accommodate a semiconductor wafer W; a substrate worktable 5 disposed inside the process chamber 2 and configured to place the semiconductor wafer W thereon; a showerhead 40 used as a process gas delivery mechanism disposed to face the worktable... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20090260565 - Apparatus for continuously producing laminated confectioneries: An apparatus (1) serves for continuously producing a laminated confectionary mass (14), especially halva, from a base mass (11) and a separating mass (12). The apparatus (1) includes a stator (2) and a rotor (3) being arranged to rotate in the stator (2). An inlet (10) serves to introduce the... Agent: Thomas, Kayden, Horstemeyer & Risley, LLP

20090260566 - Mask support, mask assembly, and assembly comprising a mask support and a mask: A mask support 10 comprises a frame element 20 and an elastic element 30. The elastic element 30 is fixed to the frame element 20. The elastic element 30 is a component integrally formed of a flexible material. It comprises a lever or arm portion 37 having a first engagement... Agent: Townsend And Townsend And Crew, LLP

20090260567 - Temporary tattoo applicators: A tattoo applicator for applying temporary tattoos to a subject, the tattoo applicator including a handheld housing and a sponge moveably supported by the housing to moisten the temporary tattoo and to apply pressure to the temporary tattoo. In some examples, the housing defines a retaining slot for receiving a... Agent: Kolisch Hartwell, P.C.

20090260568 - Glue dispenser and glue dispensing process: An exemplary glue dispenser for dispensing a glue on a workpiece includes a nozzle for dispensing the glue on the workpiece, a working platform for supporting a workpiece thereon, and a heating device mounted on the working platform. The heating device is configured for maintaining the workpiece in an elevated... Agent: PCe Industry, Inc. Att. Steven Reiss

20090260569 - Chemical vapor deposition apparatus: There is provided a chemical vapor deposition apparatus improved in structure such that a reaction gas introduced into a reactor where deposition is performed flows at a substantially uniform rate to ensure a thin film is grown substantially uniformly on the deposition object. The chemical vapor deposition apparatus includes: a... Agent: Mcdermott Will & Emery LLP

20090260570 - Oxygen ion implantation equipment: In oxygen ion implantation equipment, a chamber has a bottom wall on one end face thereof and is open in the other end face thereof. A wafer holder rotatably holding a plurality of wafers on the same circumference of a circle is housed in the chamber. Inside a cap closing... Agent: Greenblum & Bernstein, P.L.C

20090260571 - Showerhead for chemical vapor deposition: A CVD showerhead is connected to a chamber top via a leveling assembly. The leveling assembly allows the showerhead to pivot when a bellows in the leveling assembly is adjusted from outside the chamber. With the improved showerhead, leveling calibration can occur from outside of the chamber without having to... Agent: Weaver Austin Villeneuve & Sampson LLP - Novl Attn.: Novellus Systems, Inc.

20090260572 - Chemical vapor deposition apparatus: There is provided a chemical vapor deposition apparatus including: a chamber including a reactor where a deposition object is deposited; a first supplier including a plurality of gas pipes allowing a first gas to be jetted into the reactor in a substantially horizontal direction; a second supplier including a plurality... Agent: Mcdermott Will & Emery LLP