|Coating apparatus patents - Monitor Patents|
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Coating apparatusBelow are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 07/10/2014 > 10 patent applications in 9 patent subcategories.
20140190404 - Apparatus for dispensing objects on a substrate: An apparatus for deploying objects such as candies from an objects dispenser onto an underlying substrate such as cake according to a selected pattern, the apparatus including a rigid frame and at least one beam extending across the frame, with an objects dispenser device mounted to the beam. Selectively operable... Agent:
20140190405 - Self-cleaning shutter for cvd reactor: A chemical vapor deposition reactor and a method of wafer processing are provided. The reactor can include a reaction chamber having an interior and an entry port for insertion and removal of substrates, a gas inlet manifold communicating with the interior of the chamber for admitting process gasses to form... Agent: Veeco Instruments Inc.
20140190406 - Chassis dip treatment stations: A chassis dip treatment station may include a process liquid tank; a line configured to convey in sequence a plurality of skids inside and outside of the station, the skids each configured to support a chassis to be treated, the conveying line comprising roller units for displacing the skids, the... Agent: Geico S.p.a.
20140190407 - Coating a substance with graphene: Technologies are generally described for a system and process effective to coat a substance with graphene. A system may include a first container including graphene oxide and water and a second container including a reducing agent and the substance. A third container may be operative relationship with the first container... Agent: Empire Tecnology Development, LLC
20140190408 - Catheter tip coating system: A catheter tip coating assembly includes a housing defining a fluid reservoir and having a fluid outlet configured to dispense fluid to an end of a piece of tubing. The catheter tip coating assembly includes a valve assembly carried by the housing and at least partly disposed in fluid communication... Agent: Fishman Corporation
20140190409 - Device and method for forming film: The present disclosure relates to a film forming apparatus for forming a thin film on a surface of an object to be processed by using an organic metal raw material gas within a processing chamber configured to exhaust air, wherein a hydrophobic layer is installed on a surface of a... Agent: Tokyo Electron Limited
20140190410 - Equipment for manufacturing semiconductor: Provided is an equipment for manufacturing a semiconductor. The equipment for manufacturing a semiconductor includes a cleaning chamber in which a cleaning process is performed on substrates, an epitaxial chamber in which an epitaxial process for forming an epitaxial layer on each of the substrates is performed, and a transfer... Agent: Eugene Technology Co., Ltd.
20140190411 - Lid assembly for a processing system to facilitate sequential deposition techniques: Embodiments of the invention generally relate to apparatuses for processing substrates. In one embodiment, a substrate processing system is provided and includes a lid having an upper lid surface opposed to a lower lid surface, a plurality of gas inlet passages extending from the upper lid surface to the lower... Agent: Applied Materials, Inc.
20140190412 - Apparatus for fabricating ingot: Disclosed is an apparatus for fabricating an ingot. The apparatus includes a crucible to receive a raw material, and a filter part to allow a specific component in the crucible to selectively pass through the filter part. The raw material includes silicon and carbon.... Agent: Lg Innotek Co., Ltd.
20140190413 - Apparatus for fabricating ingot: Disclosed is an apparatus for fabricating an ingot. The apparatus comprises a crucible to receive a source material, and a temperature difference compensating part on the source material. The temperature difference compensating part comprises a plurality of holes.... Agent: Lg Innotek Co., Ltd.07/03/2014 > 4 patent applications in 4 patent subcategories.
20140182513 - Hybrid screening nozzle: An extrusion nozzle for applying a paste to a green sheet. The nozzle having a center orifice with a leading edge and a trailing edge. The leading edge comprising a tip having a durometer value of about 40 D shore. The leading edge may comprise a urethane material. The trailing... Agent: International Business Machines Corporation
20140182514 - Display panel manufacturing device: A display panel manufacturing device including a stage slider, a first stage configured to slide on the stage slider and to receive a test substrate, a second stage on the stage slider and configured to receive a main substrate, and a patterning unit located at a distance from the stage... Agent:
20140182515 - Substrate processing apparatus, method of manufacturing semiconductor device and vaporization system: A substrate processing apparatus includes: a processing chamber configured to accommodate a substrate; a vaporized gas supply system which includes a vaporizer to vaporize a liquid precursor into a vaporized gas and is configured to supply the vaporized gas into the processing chamber; and a control unit configured to control... Agent: Hitachi Kokusai Electric Inc.
20140182516 - Apparatus for fabricating ingot: The present invention relates to an apparatus for fabricating ingot including a crucible to accommodate a material, a top cover enclosing the circumference of the temperature difference compensative part, and a heat insulator to be disposed on the top cover.... Agent: Lg Innotek Co., Ltd.06/26/2014 > 22 patent applications in 18 patent subcategories.
20140174344 - Feed roller type system for continuous feeding of filler material for friction stir welding, processing and fabrication: The present invention relates to tools and methods for disposing, coating, repairing, or otherwise modifying the surface of a metal substrate using frictional heating and compressive/shear loading of a consumable metal against the substrate. Embodiments of the invention include friction-based fabrication tooling comprising a non-consumable member with a throat and... Agent:
20140174345 - Dyeing device for applying dye to columnar objects: A device for dyeing columnar objects rotates the columnar object as they brush past an endless, absorbent, dye-carrying belt. The colored dye from the belt rubs off onto the columnar object, providing an even and consistent coating of dye.... Agent:
20140174346 - Powder coating booth: A powder spray for lengthy parts includes a booth wall structure comprised primarily of doors. A moveable roof may be raised and lowered to clean powder overspray from the interior surfaces of the booth. A cleaning process may be performed with a sideways extraction mode and a downward extraction mode.... Agent: Nordson Corporation
20140174347 - Mounting assembly for adhesive dispenser and adhesive dispenser using same: A mounting assembly for an adhesive dispenser includes a sliding board, a first fixing board, and a second fixing board. The sliding board includes two sliding rails on two opposite sides thereof. An adhesive container is mounted on the sliding board. The first fixing board includes a first sliding groove.... Agent: Hong Fu Jin Precision Industry (shenzhen) Co., Ltd.
20140174348 - Glue coating device: A glue coating device for coating glue on a workpiece includes a table, a first driving mechanism assembled on the table, a second driving mechanism slidably assembled to the first driving mechanism, a rotating mechanism assembled to the second driving mechanism, and a dispensing assembly assembled to the rotating mechanism.... Agent: Hong Fu Jin Precision Industry (shenzhen) Co., Ltd
20140174349 - Apparatus and methods of mixing and depositing thin film photovoltaic compositions: Improved methods and apparatus for forming thin-film layers of semiconductor material absorber layers on a substrate web. According to the present teachings, a semiconductor layer may be formed in a multi-zone process whereby various layers are deposited sequentially onto a moving substrate web. At least one layer is deposited from... Agent: Global Solar Energy, Inc.
20140174350 - Vapor deposition apparatus: There is provided a vapor phase deposition apparatus including: a reaction chamber having a susceptor with a wafer mounted thereon and depositing and growing an epitaxial thin film on the wafer; a housing having the reaction chamber disposed therein and having a window opened and closed to allow the wafer... Agent: Samsung Electronics Co., Ltd.
20140174351 - Substrate position detecting apparatus, substrate processing apparatus using substrate position detecting apparatus, and deposition apparatus: A substrate position detecting apparatus detects a position of a substrate inside a chamber from an image of a target inside the chamber. The apparatus includes an image pickup device to pick up the image of the target inside the chamber through a window, an illumination device to irradiate light... Agent: Tokyo Electron Limited
20140174352 - Apparatus for processing wafers: A wafer processing apparatus includes a first tube extending in a vertical direction, a second tube arranged in the first tube and defining a reaction chamber, the reaction chamber being configured to receive a boat that holds a plurality of wafers, first and second gas nozzles in the second tube,... Agent:
20140174353 - High-temperature grade steel for fluidized bed reactor equipment: Embodiments of a reaction chamber liner for use in a heated silicon deposition reactor are disclosed. The liner has an upper portion, a mid portion comprising a material other than a stainless steel alloy, and a lower portion comprising a martensitic stainless steel alloy. The liner's upper portion may have... Agent: Rec Silicon Inc
20140174354 - Single-and dual-chamber module-attachable wafer-handling chamber: A single- and dual-chamber module-attachable wafer-handling chamber includes: a wafer-handling main chamber equipped with a wafer-handling robot therein, and adaptors for connecting process modules to the wafer-handling main chamber. The adaptors are detachably attached to the sides of the wafer-handling main chamber, respectively, and the process modules are detachably attached... Agent: AsmIPHolding B.v.
20140174355 - Plasma cvd apparatus and vacuum treatment apparatus: In one embodiment of the invention, a protective film formation chamber for forming a carbon protective film on a magnetic film includes: a gas introduction part which introduces a source gas to a vacuum vessel; a discharge electrode having a discharge surface at a position facing a substrate conveyed to... Agent: Canon Anelva Corporation
20140174357 - Equipment for manufacturing semiconductor: Provided is an equipment for manufacturing a semiconductor. The equipment for manufacturing a semiconductor includes a cleaning chamber in which a cleaning process is performed on substrates, an epitaxial chamber in which an epitaxial process for forming an epitaxial layer on each of the substrates is performed, and a transfer... Agent: Eugene Technology Co., Ltd.
20140174356 - Substrate supporting unit and substrate processing apparatus manufacturing method of the substrate supporting unit: Provided are a substrate supporting unit and a substrate processing apparatus, and a method of manufacturing the substrate supporting unit. The substrate supporting unit includes a susceptor on which a substrate is placed on a top surface thereof, one or more heat absorbing members which are capable of being converted... Agent: Eugene Technology Co., Ltd.
20140174358 - Magnetic field assisted deposition: Embodiments relate to applying a magnetic field across the paths of injected polar precursor molecules to cause spiral movement of the precursor molecules relative to the surface of a substrate. When the polar precursor molecules arrive at the surface of the substrate, the polar precursor molecules make lateral movements on... Agent: Veeco Ald Inc.
20140174362 - Apparatus and methods for symmetrical gas distribution with high purge efficiency: Provided are apparatus and methods for depositing materials by vapor deposition and plasma enhanced vapor deposition techniques, and more particularly a gas distribution assembly and vapor deposition chamber to deposit a material. The gas distribution assembly comprises a plurality of sections with each section containing a flow channel with passages... Agent:
20140174361 - Heated backing plate: The present invention generally relates to a heated backing plate coupled to a gas distribution showerhead in a PECVD chamber. The backing plate is heated by circulating a heating fluid either through channels formed within the backing plate or a tube coupled to the backing plate. A heated backing plate... Agent: Applied Materials, Inc.
20140174360 - Vapor deposition apparatus and method of manufacturing organic light-emitting display apparatus: A vapor deposition apparatus for forming a deposition layer on a substrate, the vapor deposition apparatus includes a supply unit configured to receive a first source gas, a reaction space connected to the supply unit, a plasma generator in the reaction space, a first injection unit configured to inject a... Agent: Samsung Display Co., Ltd.
20140174359 - Plasma generator and cvd device: A plasma generation apparatus according to the present invention includes an electrode cell and a housing that encloses the electrode cell. The electrode cell includes a first electrode, a discharge space, a second electrode, dielectrics, and a pass-through formed in a central portion in a plan view. An insulating tube... Agent: Toshiba Mitsubishi-electric Industrial Systems Corporation
20140174363 - Film forming apparatus: A method for forming a film includes the steps of: placing an object to be processed into a processing container; and generating M(BH4)4 gas by feeding H2 gas as carrier gas into a raw material container in which solid M(BH4)4 (where M is Zr or Hf) is accommodated to introduce... Agent: Tokyo Electron Limited
20140174364 - Heat treatment device: A heat treatment device includes: a processing container that accommodates a plurality of substrates to be subjected to heat treatment; a substrate holding member that holds the plurality of substrates; an induction heating coil that forms an induction magnetic field inside the processing container; a high frequency power supply that... Agent: Tokyo Electron Limited
20140174365 - Latent print development apparatus: A kit, an apparatus, and method are provided for developing a latent print. The apparatus comprises a pellet comprising a substrate impregnated with a sublimation compound, a receptacle, an adapter, and an end cap. The receptacle is open at a first end and detachably connected to a heat source at... Agent:06/19/2014 > 10 patent applications in 7 patent subcategories.
20140165907 - Conveyance apparatus and robot system: The conveyance apparatus includes: a swing arm whose distal end portion passes on a carrying-in/out position and a working position while being swung, which are provided on a circular trajectory in advance, a plurality of turn tables each of which is mounted on the corresponding distal end portion of the... Agent: Kabushiki Kaisha Yaskawa Denki
20140165906 - Magnetic masks for an ion implant apparatus: An ion implant apparatus configured to measure the temperature or monitor the degradation of components in the apparatus is provided. The ion implant apparatus may include a platen configured to move in a first direction, a mask frame to hold one or more masks disposed on the platen, a first... Agent: Varian Semiconductor Equipment Associates, Inc.
20140165909 - Manufacturing apparatus for depositing a material on a carrier body: A gasket is used in a manufacturing apparatus, which deposits a material on a carrier body. A reaction chamber is defined by a housing and a base plate of the manufacturing apparatus. The gasket is disposed between the housing and the base plate for preventing a deposition composition, which comprises... Agent: Hemlock Semiconductor Corporation
20140165908 - Transfer chamber and method of using a transfer chamber: An ion implanter and method for facilitating expeditious performance of maintenance on a component of the ion implanter in a manner that reduces downtime while increasing throughput of the ion implanter. The ion implanter includes a process chamber, a transfer chamber connected to the process chamber, a first isolation gate... Agent: Varian Semiconductor Equipment Associates, Inc.
20140165910 - Apparatus for large-area atomic layer deposition: Disclosed is an apparatus for batch-type large-area atomic layer deposition, which can perform an atomic layer deposition process on a plurality of large-area glass substrates. The apparatus comprises: a vacuum chamber; gate valves provided at both sides of the vacuum chamber; a process gas supply unit provided in the upper... Agent: Ncd Co., Ltd.
20140165911 - Apparatus for providing plasma to a process chamber: Embodiments of apparatus for providing plasma to a process chamber are provided. In some embodiments, an apparatus may include a first ground plate; an electrode disposed beneath and spaced apart from the first ground plate by a first electrical insulator to define a first gap between the first ground plate... Agent: Applied Materials, Inc.
20140165912 - Apparatus for providing plasma to a process chamber: Apparatus for providing plasma to a process chamber may include an electrode; a first ground plate disposed beneath the electrode defining a cavity therebetween; an insulator disposed between the electrode and first ground plate to prevent direct contact therebetween; a second ground plate disposed beneath the first ground plate defining... Agent: Applied Materials, Inc.
20140165913 - Deposition source and deposition apparatus including the same: A deposition source includes a furnace extending in a first direction and configured to discharge deposits on a substrate, and a cooling housing on the furnace comprising a plurality of cooling plates, wherein each of the cooling plates comprises a plurality of cooling flow paths around the furnace.... Agent: Samsung Display Co., Ltd.
20140165914 - Organic material deposition apparatus: An organic material deposition apparatus includes a chamber, a substrate support unit, a rail, a driving apparatus, a plate heating apparatus, and a plate cooling apparatus. The substrate support unit is disposed in an upper portion of the chamber and supports the substrate. The rail extends from a deposition region,... Agent:
20140165915 - Thermal radiation barrier for substrate processing chamber components: An apparatus for a substrate support heater and associated chamber components having reduced energy losses are provided. In one embodiment, a substrate support heater is provided. The substrate support heater includes a heater body having a first surface to receive a substrate and a second surface opposing the first surface,... Agent:Previous industry: Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
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