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Coating apparatus September class, title,number 09/11

20110232565 - Pad with brush/scrub function: The present application relates to a laminated pad (1) that is used to apply a liquid or a colloidal substance in a controlled manner onto a surface. The laminated pad comprises at least one storage layer (4), where the storage layer when provided with through-going cuts (8) and welded to... Agent: Padtech As

20110232566 - Method and apparatus for shaping a gas profile near bevel edge: A method for etching a bevel edge of a substrate in a processing chamber is provided. The method includes flowing an inert gas into a center region of the processing chamber defined above a center region of the substrate and flowing a mixture of an inert gas and a processing... Agent:

20110232567 - Method of cleaning the filament and reactor's interior in facvd: A method of operating a filament assisted chemical vapor deposition (FACVD) system. The method includes depositing a film on a substrate in a reactor of the FACVD system. During the depositing, a DC power is supplied to a heater assembly to thermally decompose a film forming material. The method also... Agent: Tokyo Electron Limited

20110232568 - Hybrid gas injector: A gas injector for use in injecting process gas into a space in a vertical furnace between a tower supporting multiple wafers and a tubular liner includes a tubular straw having an open distal end and a first bore extending along a first axis and composed of a first single... Agent: Ferrotec (usa) Corporation

20110232571 - Film formation apparatus, method for forming film, and method for manufacturing photoelectric conversion device: The present invention relates to a film formation apparatus including a first transfer chamber having a roller for sending a substrate, a film formation chamber having a discharging electrode, a buffer chamber provided between the transfer chamber and the film formation chamber or between the film formation chambers, a slit... Agent: Semiconductor Energy Laboratory Co., Ltd.

20110232569 - Segmented substrate loading for multiple substrate processing: Embodiments of the present invention provide apparatus and methods for loading and unloading a multiple-substrate processing chamber segment by segment. One embodiment of the present invention provides an apparatus for processing multiple substrates. The apparatus includes a substrate supporting tray having a plurality of substrate pockets forming a plurality of... Agent: Applied Materials, Inc.

20110232570 - System and method for depositing a material on a substrate: A method and apparatus for depositing a film on a substrate includes introducing a material and a carrier gas into a heated chamber. The material may be a semiconductor material, such as a cadmium chalcogenide. A resulting mixture of vapor and carrier gas containing no unvaporized material is provided. The... Agent:

20110232572 - Plasma film-coating apparatus: An exemplary plasma film-coating apparatus includes a reaction chamber, a pipe, and a reaction device. The reaction chamber defines a reaction cavity. The reaction cavity includes receiving grooves defined in an inner wall of the reaction chamber. The receiving grooves are configured for receiving workpieces. The pipe extends through the... Agent: Hon Hai Precision Industry Co., Ltd.

20110232573 - Catalytic chemical vapor deposition apparatus: [Solving Means] In a catalytic chemical vapor deposition apparatus (1) according to the present invention, a catalyst wire (6) including a tantalum wire and a boride layer formed on a surface of the tantalum wire is used. The boride of the metal tantalum (tantalum boride) is harder than the metal... Agent: Ulvac, Inc.

20110226178 - Film deposition system: A film deposition system which a cycle of alternately supplying a first reactive gas and a second reactive gas and exhausting them is repeated twice or more in a vacuum vessel to cause reaction between the two gases, thereby depositing thin films on substrate surfaces, the film deposition system includes:... Agent: Tokyo Electron Limited

20110226179 - Process and apparatus for drying & curing a container coating and containers produced therefrom: The present invention generally relates to apparatus and methods of coating glass containers and the containers produced therefrom. In particular, embodiments of the invention provide a method of coating glass containers by at least partially drying and/or curing one or more organic coatings on a glass container using accelerated drying.... Agent: The Coca-cola Company

20110226180 - Film formation apparatus: A film formation apparatus comprises: a first unit having a vacuum chamber in which film formation is performed on the base film; a second unit having a feeding system for feeding the base film; and a joining unit that conductively joins the first unit and second unit, wherein the first... Agent: Fujifilm Corporation

20110226181 - Film forming apparatus: Disclosed is a film forming apparatus to form a thin film on a surface of an object to be processed by using a raw material gas including an organometallic compound includes; a processing container to carry out vacuum exhaustion; a placing table having a heater; and a gas introduction mechanism... Agent: Tokyo Electron Limited

20110226182 - Crucible, crystal production device, and holder: A crucible includes a body portion having a hollow inner portion, and a projection portion connected to an inner circumferential surface of the body portion and projecting toward the inner portion. The projection portion has a side surface provided with a thread. A holder includes a base and a protrusion... Agent: Sumitomo Electric Industries, Ltd.

20110220014 - Apparatus for dusting printed sheets with powder: An apparatus for dusting printed sheets with powder contains at least one powder nozzle, an actuating element which is mounted such that it can be adjusted into a position, in which the actuating element is situated in the jet path of the powder nozzle and the powder bounces off the... Agent: Heidelberger Druckmaschinen Ag

20110220015 - Seamless capsule manufacturing apparatus: A seamless capsule manufacturing apparatus (1) manufactures a seamless capsule by means of nozzles (2a-2d). A core liquid (5) and a coating liquid (6) are supplied to each of the nozzles (2a-2d) from pumps (16, 18) through distributors (21, 22). The distributors (21, 22) and the nozzles (2a-2d) are connected... Agent:

20110220016 - Overspray shield devices suitable for use with material application apparatus: An overspray shield device, which is suitable for use with a material application apparatus, said overspray shield device includes a shield member and a collar member. The shield member includes a body wall having an outer surface and an inner surface defining a cavity, wherein the body wall includes a... Agent:

20110220017 - Image forming apparatus: An image forming apparatus includes an image forming unit for forming an image on a medium; and an application device for applying a treatment liquid to the medium. The application device includes a conveying roller; an application roller for applying the liquid; a squeeze roller for reducing the thickness of... Agent: Ricoh Company, Ltd

20110220018 - Device for clamping an optical workpiece, particularly spectacle lens, blocked on a block piece for processing and/or coating thereof: The invention discloses a device (10) for clamping particularly an eye glass lens blocked on a block piece for processing and/or coating said eye glass lens, comprising a receiving space (34) having a center line (M) for a clamping section of the block piece, and a plurality of clamping surfaces... Agent: Satisloh Ag

20110220019 - Mask frame assembly for thin film deposition and method of assembling the same: A mask frame assembly for thin film deposition, the mask frame assembly including a frame having an opening; a plurality of masks having deposition patterns, the masks being fixed to the frame such that the deposition patterns extend over the opening; and a balance stick being fixed to the frame... Agent:

20110220020 - Enhanced magnetic plating method: An apparatus for plating a magnetic film on a substrate includes: a track including a plurality of stopping points along the track; a permanent magnet placed on the track such that the permanent magnet can be moved along the track towards and away from the stopping points; at least one... Agent: International Business Machines Corporation

20110220021 - Apparatus for vapor phase processing ophthalmic devices: This invention discloses apparatus for processing one or more of a Lens Precursor, a Lens Precursor Form and an ophthalmic Lens. The apparatus provides for vapor phase processing of the subject Lens Precursor, a Lens Precursor Form and an ophthalmic Lens.... Agent:

20110220022 - Thin film deposition apparatus: A thin film deposition apparatus includes: a deposition source that discharges a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; a patterning slit sheet disposed opposite to the deposition source... Agent: Samsung Mobile Display Co., Ltd.

20110220023 - Nitrogen gas injection apparatus: The present invention relates to a nitrogen gas injection apparatus for semiconductor fabrication equipment or LCD fabrication equipment, which can be simply manufactured and which thus reduces manufacturing costs, and which enables a nitrogen gas injection direction to correspond to the flow direction of reaction by-products, to thereby inject nitrogen... Agent:

20110220024 - Device for the synthesis of nanoparticles by fluidized-bed chemical vapour deposition: A device for vapor deposition of chemical species on support grains of spherical or similar shape disposed in a fluidized bed. The device includes a first chamber including a fluidized bed in which a funnel-shaped fluidizer element is housed to receive support grains of spherical or similar shape; a second... Agent: Comm. A L'energie Atomique Et Aux Energies Alter.

20110220025 - Metal organic chemical vapor deposition apparatus having satellite n-type and p-type doping chambers: The present invention is related to a metal organic chemical vapor deposition apparatus, which is equipped with multiple numbers of n-type doping satellite chambers and a p-type doping satellite chamber in addition to a main growth chamber, and methods for minimizing the contamination of the epitaxial layers by residual doping... Agent:

20110220026 - Plasma processing device: A plasma processing device according to the present invention includes a plasma processing chamber consisting of a vacuum container, a pair of substrate holders standing opposite each other in the plasma processing chamber, a plurality of first reaction gas tubes provided between the two substrate holders, and a plurality of... Agent: Evatech Co., Ltd.

20110220027 - Multi-nozzle tubular plasma deposition burner for producing preforms as semi-finished products for optical fibers: The invention relates to a multi-nozzle, tubular plasma deposition burner (1) for producing preforms as semi-finished products for optical fibers, wherein a media stream containing glass starting material and a carrier gas is fed to the burner (1), means for feeding at least one dopant using at least one precursor... Agent: J-fiber Gmbh

20110214607 - Spray edger devices suitable for use with material application apparatus: A spray edger device, which is suitable for use with a material application apparatus, said spray edger device includes a planar blade member, a substantially V-shaped frame member for supporting the planar blade member, and a collar member configured for moveably connecting the planar blade member to a barrel portion... Agent:

20110214608 - Electroless plating system: An electroless plating system includes a plating solution, and controlling reducing agents in the plating solution for deposition over outlier features smaller than about five hundred nanometers and isolated by about one thousand nanometers.... Agent:

20110214609 - Atmospheric plasma apparatus: An atmospheric plasma apparatus for depositing a layer on a continuous base film transported in its longitudinal direction includes an electrode for treatment provided opposite to the peripheral surface of a drum electrode and upstream of an electrode for deposition in the direction of transportation of the base film, an... Agent: Fujifilm Corporation

20110214611 - Film deposition apparatus: A film deposition apparatus is provided with a gas nozzle in which ejection holes that eject a reaction gas are formed along a longitudinal direction of the gas nozzle, and a flow regulation member that protrudes from the gas nozzle in either one of upstream and downstream directions of a... Agent: Tokyo Electron Limited

20110214610 - Manufacturing method and manufacturing apparatus of semiconductor substrate: It is an object to provide a homogeneous semiconductor substrate in which defective bonding is reduced. Such a semiconductor substrate can be formed by the steps of: disposing a first substrate in a substrate bonding chamber which includes a substrate supporting base where a plurality of openings is provided, substrate... Agent: Semiconductor Energy Laboratory Co., Ltd.

20110209661 - Automated pizza assembly system: An apparatus is provided for assembling a pizza, including a pizza sauce spreading station, a cheese spreading station and a pepperoni applying station. A robot including a stationary base and an articulating arm having a gripper attached to the end is operable to grip a pizza pan having pizza dough... Agent: Little Caesar Enterprises, Inc.

20110209662 - Vacuum processing chamber manufactured by aluminum casting: The present invention provides a method for manufacturing a vacuum processing chamber comprising a volume which is defined by a wall and which can be evacuated, said wall being made of aluminum by casting, said wall comprising an outer face and an inner face, said inner face faces the volume,... Agent: Oerlikon Solar Ag, Trubbach

20110209663 - Multi-region processing system and heads: The various embodiments of the invention provide for relative movement of the substrate and a process head to access the entire wafer in a minimal space to conduct combinatorial processing on various regions of the substrate. The heads enable site isolated processing within the chamber described and method of using... Agent: Intermolecular, Inc.

20110209664 - Substrate processing apparatus: A substrate processing apparatus comprising: a processing chamber which is to accommodate at least one substrate; a gas supply system which is to supply processing gas into the processing chamber; an exhaust system which is to exhaust atmosphere in the processing chamber; and at least one pair of electrodes which... Agent: