|Coating apparatus patents - Monitor Patents|
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Coating apparatus May archived by USPTO category 05/11Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 05/26/2011 > 10 patent applications in 10 patent subcategories. archived by USPTO category
20110120368 - Method and device for dispersing dry powders: A device for dispersing a sample of dry powder onto a surface in a dispersion chamber. The device includes a dispersion chamber situated in an environment, and a pressure source that provides a pressure difference between the environment and an inside of the dispersion chamber. The surface is positioned in... Agent:
20110120369 - Shielding tool: A shielding tool protects a non-sprayed surface of a workpiece including a coating surface and defining a groove in the coating surface, with a bottom surface of the groove is the non-sprayed surface of the workpiece. The shielding tool includes a first shield member positioned in the groove of the... Agent: Hon Hai Precision Industry Co., Ltd.
20110120370 - Thin-film solar cell manufacturing apparatus: A thin-film solar cell manufacturing apparatus includes a film forming chamber which stores a substrate; and an electrode unit which performs film formation using a CVD method on the substrate in the film forming chamber. The electrode unit has an anode and a cathode; and a side wall portion which... Agent: Ulvac, Inc.
20110120371 - Method and apparatus for chemical deposition: Embodiments of the present system and method are useful for chemical deposition, particularly continuous deposition of thin films. Disclosed systems typically comprise a micromixer and a microchannel applicator. A deposition material or materials is applied to a substrate, such as an oxidized silicon substrate, a flexible substrate useful for forming... Agent: Oregon State University
20110120372 - Plasma deposition apparatus and deposition method utilizing same: A plasma deposition apparatus is provided. The plasma deposition apparatus comprises a chamber. A pedestal is placed in the chamber. A plasma generator is placed in the chamber and over the pedestal. The plasma generator comprises a plasma jet for plasma thin film deposition having a discharge direction angle θ1... Agent: Industrial Technology Research Institute
20110120373 - Methods and devices for processing a precursor layer in a group via environment: Methods and devices for high-throughput printing of a precursor material for forming a film of a group IB-IIIA-chalcogenide compound are disclosed. In one embodiment, the method comprises forming a precursor layer on a substrate, the precursor is subsequently processed in one or more steps in a VIA environment.... Agent:
20110120374 - System and method for mitigating oxide growth in a gate dielectric: Oxide growth of a gate dielectric layer that occurs between processes used in the fabrication of a gate dielectric structure can be reduced. The reduction in oxide growth can be achieved by maintaining the gate dielectric layer in an ambient effective to mitigate oxide growth of the gate dielectric layer... Agent: Texas Instruments Incorporated
20110120375 - Apparatus for processing substrate: An apparatus for processing a substrate includes: a process chamber providing a reaction space by a combination of a lid and a body; a susceptor in the reaction space and having a substrate thereon; a plurality of plasma source electrodes over the reaction space; a plurality of first lower protruding... Agent: Jusung Engineering Co., Ltd.
20110120377 - Remote plasma processing of interface surfaces: Embodiments related to the cleaning of interface surfaces in a semiconductor wafer fabrication process via remote plasma processing are disclosed herein. For example, in one disclosed embodiment, a semiconductor processing apparatus comprises a processing chamber, a load lock coupled to the processing chamber via a transfer port, a wafer pedestal... Agent:
20110120376 - Epitaxial growth systems: Disclosed is about an epitaxial growth system, including an epitaxial growth reactor chamber, a susceptor including a supporting surface and disposed in the epitaxial growth reactor chamber, and a plurality of wafer fixing elements disposed on the supporting surface. The supporting surface of the susceptor includes a rim, and each... Agent:05/19/2011 > 5 patent applications in 5 patent subcategories. archived by USPTO category
20110114018 - Particulate material applicator and pump: A nozzle assembly for a material application device includes an expansion chamber for slowing down the velocity of powder fed to the nozzle from a dense phase pump. The nozzle assembly includes a nozzle insert that forms the expansion chamber and provides air assist function. The nozzle includes an integral... Agent: Nordson Corporation
20110114019 - Direct coating solid dosage forms using powdered materials: The present invention provides a method and apparatus for dry coating solid dosage forms. The method includes the steps of placing solid dosage forms in a rotatable, electrically grounded housing, and spraying a film forming polymer powder composition into the housing during rotation thereof to form a polymer coating on... Agent: The University Of Western Ontario
20110114020 - Lid assembly for a processing system to facilitate sequential deposition techniques: Embodiments of the invention generally relate to apparatuses for processing substrates. In one embodiment, a substrate processing system for sequential deposition or atomic layer deposition (ALD) is provided and includes a lid assembly coupled with a chamber housing, wherein the lid assembly contains a lid having a plurality of controllable... Agent:
20110114021 - Planar antenna member and plasma processing apparatus including the same: The present invention is a planar antenna member configured to introduce electromagnetic waves generated by an electromagnetic-wave generating source into a processing vessel of a plasma processing apparatus, the planar antenna member comprising: a base member of a circular plate shape, made of a conductive material; and a plurality of... Agent:
20110114022 - Wafer carrier with hub: A wafer carrier for a rotating disc CVD reactor includes a unitary plate of a ceramic such as silicon carbide defining wafer-holding features such as pockets on its upstream surface and also includes a hub removably mounted to the plate in a central region of the plate. The hub provides... Agent: Veeco Instruments Inc.05/12/2011 > 9 patent applications in 8 patent subcategories. archived by USPTO category
20110107962 - Piezoelectric actuators: Piezoelectric actuators are provided. In some instances, the piezoelectric actuators are high-precision piezoelectric actuators. The piezoelectric beams may have a bi-chevron configuration. Also provided are methods of making the piezoelectric actuators, e.g., using Micro-Electro-Mechanical System (MEMS) fabrication techniques, and methods of using the piezoelectric actuators, e.g., as valves in fluid... Agent:
20110107963 - Dispensing apparatus and dispensing method: A dispensing apparatus includes a dispensing unit having a main body, a channel through the main body, and a plurality of nozzles connected to the main body, the plurality of nozzles being configured to dispense fluid flowing in the channel, a gap sensor unit configured to determine size of gaps... Agent:
20110107964 - Object holding apparatus: An object holding apparatus for holding an object, a portion of which is supposed to be surface treated, the object holding apparatus including: a body to which the object is fixed; a mask for covering a non-treatment portion of the object; and a magnetic fixing member for bringing the mask... Agent: Molten North America Corporation
20110107965 - Device for imparting gradations of tint density on a plastic ophthalmic lens: A device for imparting a gradation of tint density on an ophthalmic or optical lens is described. This gradient-tinting device utilizes both vertical movement and rotation about the vertical axis of the lens as it moves into a tinting solution.... Agent:
20110107966 - Electrostatic coating apparatus: A current sensor for detecting a full return current is connected to a high voltage generator. A leakage current detector including current sensors for detecting a leakage current is provided at the surface of the cover of a coating machine, air passages and a paint passage. Based on current detection... Agent: Abb K.k.
20110107967 - Method and apparatus for combining particulate material: A method of selectively combining particulate material, for example plastics material by sintering, comprises providing a layer of particulate material, providing radiation, for example using a radiation source over the layer, and varying the absorption of the provided radiation across a selected surface portion of the layer to combine a... Agent: Loughborough University Enterprises Limited
20110107968 - Semiconductor manufacturing apparatus: A semiconductor manufacturing apparatus includes: a reaction chamber for providing an airtight process space; a boat for loading/unloading a pair of semiconductor substrates into/from the reaction chamber, wherein the boat includes susceptors and rotary tables to be rotatably supported by a plurality of supporting rollers, each semiconductor substrate being mounted... Agent: Terasemicon Corporation
20110107969 - Apparatus for manufacturing thin-film solar cell: An apparatus for manufacturing a thin film solar cell of the present invention has a film forming chamber in which a substrate is arranged so that the film formation face of the substrate is substantially parallel to the direction of gravitational force and a film is formed on the film... Agent: Ulvac, Inc.
20110107970 - Heating unit and substrate processing apparatus having the same: A substrate processing apparatus includes a heating unit that heats a processing chamber that processes a plurality of substrates and that quickly cools the processing chamber after the processing. The heating unit includes a body having an intake port and an exhaust port, one or more heaters located inside the... Agent: Samsung Mobile Display Co., Ltd.05/05/2011 > 6 patent applications in 4 patent subcategories. archived by USPTO category
20110100293 - System and method for coating medical devices: A system and method for photo-grafting a coating polymer onto the surface of a medical device are provided. The system comprises a plurality of stations including a novel grafting station. The system and method of the invention are both time- and resource-efficient. The system includes several stations, each station including... Agent: Covalon Technologies Inc.
20110100294 - System and method for coating medical devices: A system and method for photo-grafting a coating polymer onto the surface of a medical device are provided. The system comprises a plurality of stations including a novel grafting station. The system and method of the invention are both time- and resource-efficient. The system includes several stations, each station including... Agent: Covalon Technologies Inc.
20110100295 - System and method for forming an integrated barrier layer: An apparatus for processing a substrate is provided. The apparatus includes a process chamber, and a dual-mode gas distribution plate disposed within the process chamber. The dual-mode gas distribution plate comprises a first gas distribution zone disposed in a center of the gas distribution plate, and a second gas distribution... Agent:
20110100296 - Film formation apparatus: A film formation apparatus includes: a film forming chamber in which a desired film is formed on a substrate in a vacuum; a loading-ejecting chamber fixed to the film forming chamber with a first opening-closing section interposed therebetween, being capable of reducing a pressure inside the loading-ejecting chamber so as... Agent: Ulvac, Inc.
20110100298 - Fluorinating apparatus: An apparatus for fluorinating a substrate. The apparatus includes a vacuum chamber and a means for generating a fluorine-containing plasma throughout the entire chamber. The apparatus includes a capacitively-coupled system within the chamber that has at least one electrode powered by an RF source and at least one grounded electrode... Agent: 3m Innovative Properties Company
20110100297 - Thin-film solar cell manufacturing apparatus: A thin-film solar cell manufacturing apparatus includes a film forming chamber that is evacuated to a reduced pressure and forms a film on a substrate using a CVD method; a loading-ejecting chamber that is connected to the film forming chamber via a first opening-closing part and that is switchable between... Agent: Ulvac, Inc.Previous industry: Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
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