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Coating apparatus May archived by USPTO category 05/09

20090133618 - Coating apparatus: A coating apparatus is provided which does not form lines having a constant pitch in applying a coating solution to a web or a sheet medium by using a coating rod or a coating roller even at a high speed. The present invention relates to a coating apparatus for applying... Agent: Sughrue Mion, PLLC

20090133619 - Adhesive applicator and bookbinder in bookbinding apparatus, and image-forming system associated therewith: Bookbinding-unit adhesive application device that does not interrupt the unit to replenish adhesive when consecutively applying adhesive to sheet bundles, and can shorten the time the system is interrupted. An adhesive storage container (10) that stores adhesive; an applicator roller (30) rotatably disposed in the adhesive storage container (10); an... Agent: Judge Patent Associates

20090133620 - Sealer coater: A sealer coater (20) comprising cylinder unit (22) arranged to be joined with a robot arm (16), a floating base (24) joined with the piston rod of this cylinder unit, a compression spring (25) provided between the floating base and the cylinder unit to urge the piston rod in the... Agent: Birch Stewart Kolasch & Birch

20090133621 - Paint masking for corners: A paint mask particularly adapted for masking corner areas of a demarcation zone to facilitate painting of an area of a workpiece disposed on the other side of the demarcation zone is formed of a thin, flexible sheet having opposite faces. The paint mask includes a first leg and a... Agent: Fay Sharpe LLP

20090133622 - Plasma assisted apparatus for organic film deposition: A plasma assisted apparatus for organic film deposition, comprising: a plasma chamber, capable of thermally cracking a precursor in the plasma chamber; and a deposition chamber, being channeled with the plasma chamber for receiving the thermally cracked precursor. In an exemplary embodiment, the deposition chamber further comprises a substrate device,... Agent: Wpat, PC

20090133623 - Metal film production apparatus and metal film production method: Alternatively, a source gas is supplied to the interior of a chamber between a substrate and a copper plate member such that the source gas is gradually increased continuously from a flow rate of 0 to a predetermined flow rate to increase the particle size of the metal component, as... Agent: Fitzpatrick Cella Harper & Scinto

20090133624 - Coating apparatus: The present invention has as an object to provide a coating apparatus for forming a coating film on each of many lenses in a short time. To attain this object, in the coating apparatus for a lens according to the invention, a lens support portion of a lens centering device,... Agent: Birch Stewart Kolasch & Birch

20090133625 - Coating apparatus: The present invention provides a coating apparatus which can form a stable photochromic coating film. In the invention, a centering device, a lens height measuring device, a primer fluid applicator device, a primer spinning device, a drying device, a photochromic fluid applicator device, a photochromic spinning device, a UV device... Agent: Birch Stewart Kolasch & Birch

20090133626 - Apparatus for pecvd deposition of an internal barrier layer on a receptacle, the apparatus including an optical plasma analysis device: An apparatus (1) for PECVD deposition of a thin layer of a barrier-effect material in a receptacle (3), the apparatus comprising: a structure (5) receiving the receptacle (3), said structure (5) defining a plasma-presence zone (18), said structure (5) being provided with an orifice (14) defining an axis (A1) and... Agent: Sughrue Mion, PLLC

20090133627 - Substrate processing apparatus and method, and gas nozzle for improving purge efficiency: A substrate processing apparatus capable of efficiently purging not only a process space but also the inside of a processing gas feed nozzle when a multi element compound film is formed on a substrate by laminating a molecular layer thereon, wherein an exhaust line is connected to one end of... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090133629 - In-line film-formation apparatus: Provided is an in-line film-formation apparatus including: deposition sources, deposition-preventing plates, and a screen. The deposition sources store different film-formation materials, and include openings extending in the width directions of a substrate, which is perpendicular to the conveying direction. The openings, arranged in parallel with each other, are disposed respectively... Agent: Birch Stewart Kolasch & Birch

20090133628 - Vacuum device for continuous processing of substrates: A continuous vacuum system for processing substrates has an inlet air lock, an outlet air lock, at least one process chamber, and a device for conveying the substrates through the continuous system. To create a continuous system having a compact design and high throughput for plasma-enhanced treatment of substrates at... Agent: Heslin Rothenberg Farley & Mesiti PC

20090133631 - Coating device and method of producing an electrode assembly: An electrode assembly 12 for a PECVD (Plasma Enhanced Chemical Vapour Deposition) coating installation comprises a base plate 13, a separation plate 14 and an electrode plate 15. The electrode plate 15 includes frame members 16. Fixing elements 17 are provided for fixing the electrode plate 15 to the base... Agent: Townsend And Townsend And Crew, LLP

20090133630 - Batch-type remote plasma processing apparatus: A plasma processing apparatus comprises a processing chamber in which a plurality of substrates are stacked and accommodated; a pair of electrodes extending in the stacking direction of the plurality of substrates, which are disposed at one side of the plurality of substrates in said processing chamber, and to which... Agent: Hogan & Hartson L.L.P.

20090133632 - Safe liquid source containers: Containers for providing vapor phase reactant from liquid sources include bubbler designs and designs in which carrier gas flows over the liquid surface. Among the bubbler arrangements, a bypass conductance is provided to release excess pressure from the gas volume inside the container, or an enlarged bubbler tube is provided... Agent: Knobbe Martens Olson & Bear LLP

20090126625 - Non-intrusive portable safety seal used to obtain people's dna and genetic patterns through fingerprinting: A non-intrusive portable safety seal to collect human organic remnants in order to obtain DNA and genetic patterns of fingerprints is provided. The proposed seal comprises four related basic components: a sheet of paper or base forming a triptych, which serves to support the entire set, an adhesive-covered central sheet... Agent: Jacobson Holman PLLC

20090126626 - Annular nozzle structure for high density inkjet printheads: A method for fabricating an orifice plate with high density arrays of nozzles entails disposing a photoresist layer on a glass with a metalized layer forming a photomask blank and patterning the photomask blank with one or more openings. Second openings are formed by etching through the initial openings into... Agent: Andrew J. Anderson, Patent Legal Staff Eastman Kodak Company

20090126627 - Laser assisted nano deposition: An apparatus and method is disclosed for forming a nano structure on a substrate with nano particles. The nano particles are deposited through a nano size pore onto the substrate. A laser beam is directed through a concentrator to focus a nano size laser beam onto the deposited nano particles... Agent: Robert F. Frijouf

20090126629 - Film-forming system and film-forming method: A film-forming system comprising a vacuum chamber and an electroconductive partition plate dividing said vacuum chamber into a plasma generating space provided with a high-frequency electrode and a film-forming treatment space provided with a substrate-retaining mechanism for holding a substrate mounted thereon. A gas for generating desired active species by... Agent: Wenderoth, Lind & Ponack, L.L.P.

20090126628 - Radiation appliance, powder applying station, arrangement for coating temperature-sensitive materials, and associated method: The invention relates to a radiation appliance (21) and a powder-application station (4), an arrangement thereof for powder-coating temperature-sensitive materials, such as timber-derived products and MDF panels (8), and an associated method. The inventive arrangement and method are characterised in that the specific geometry of the radiation appliance (21) or... Agent: Price Heneveld Cooper Dewitt & Litton, LLP

20090126630 - Spindle spray coating system: A spindle spray coating system including a spindle conveyor system for horizontally transporting parts supported on spindles within the system. A spindle rotation station assembly is also provided for rotating individual spindles supporting parts during spraying. A spray containment closed spray booth for containment of parts supported on spindles during... Agent: Jeanne E. Longmuir

20090126631 - Chemical vapor deposition reactor having multiple inlets: A chemical vapor deposition reactor has a wafer carrier which cooperates with a chamber of the reactor to facilitate laminar flow of reaction gas within the chamber and a plurality of injectors configured in flow controllable zones so as to mitigate depletion.... Agent: Haynes And Boone, LLPIPSection

20090126633 - Electrode/probe assemblies and plasma processing chambers incorporating the same: The present invention relates generally to plasma processing chambers and electrode assemblies used therein. According to one embodiment, an electrode assembly comprises a thermal control plate, a silicon-based showerhead electrode, and a probe assembly comprising an electrically conductive probe body and a silicon-based cap. The electrode assembly is configured such... Agent: Dinsmore & Shohl LLP One Dayton Centre

20090126632 - Quick-change precursor manifold for large-area cvd and pecvd: A tube-array showerhead for CVD or PECVD on large substrates delivers precursors to a process chamber via an array of tubes drilled with precision holes. The tubes rapidly become contaminated with use and must be changed frequently to maintain process quality. An improved manifold for a tube-array showerhead, intended for... Agent: Elizabeth Anne Nevis

20090126634 - Plasma processing apparatus: A plasma processing apparatus includes a processing chamber; a first electrode for mounting thereon a target substrate in the processing chamber; a second electrode which faces the first electrode obliquely or in parallel thereto to form a high frequency discharging capacitor; a processing gas supply unit for supplying a processing... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090126635 - Metalorganic chemical vapor deposition reactor: Affords MOCVD reactors with which, while deposited films are uniformized in thickness, film deposition efficiency can be improved. An MOCVD reactor (1) is furnished with a susceptor (5) and a duct (11). The susceptor (5) has a carrying surface for heating and carrying substrates (20). The duct (11) is for... Agent: Judge Patent Associates

20090120355 - Surface-treated doctor blade: The surface-treated doctor blade having nickel-phosphorus-based alloy plating which does not include irregularities of planar diameter exceeding 50 μm at least at the blade edge end can have an improved conformability of blade edge and at the same time improved wear resistance of the blade edge, thereby enabling reduction in... Agent: Dennis G. Lapointe Lapointe Law Group, Pl

20090120356 - Lubricant application apparatus, process cartridge, and image forming apparatus using same: A lubricant application apparatus including a lubricant application member and an elastic member. The lubricant application member applies lubricant to a lubricant receiving member moving in a given a surface movement direction. The elastic member contacts the lubricant receiving member in a counter direction with respect to the surface movement... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090120357 - Liquid delivery apparatus: [Solving Means] The liquid delivery apparatus comprises a pressure reducing valve for adjusting pressure of pressurized gas, a pressure supply joint for supplying the pressurized gas having the adjusted pressure, and a solenoid valve for selectively establishing or cutting off communication between the pressure reducing valve and the pressure supply... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20090120359 - Solution deposition assembly: Methods and devices are provided for improved sputtering systems. In one embodiment of the present invention, a deposition system for use with a substrate, the system comprising a solution deposition apparatus; at heating chamber; and at least assembly for holding solution over the substrate to allow for a depth of... Agent: Director Of Ip

20090120358 - Spray coating member having excellent injury resistance and so on and method for producing the same: For the purpose of solving problems inherent to a white Al2O3 spray coating, i.e. drawbacks that the injury resistance, corrosion resistance, heat resistance, abrasion resistance and the like are poor and the light reflectance is high because the coating is porous and weak in the bonding force among particles, there... Agent: Greenblum & Bernstein, P.L.C

20090120360 - Plating jig: A plating jig can perform the processing of plating wherein a thickness of a plating film formed on each object to be plated becomes even when a plurality of objects to be plated are plated at a time. The plating jig is horizontally disposed, immersed in plating solution, and rotated... Agent: Crowell & Moring LLP Intellectual Property Group

20090120361 - Coating device for water-based lacquer that is dried by near-infrared light: The invention relates to a coating device by means of which a water-soluble compound is applied to at least one edge of a moving oblong part and is dried by NIR light.... Agent: Friedrich Kueffner

20090120362 - Temperature measurement in a substrate processing apparatus: A substrate processing apparatus is configured to provide in series a plurality of processing blocks, each block including a processing unit and a transport robot transporting a substrate. A substrate rest is provided in a connecting portion of adjacent processing blocks. A sensor plate with sensor coils is provided spanning... Agent: Townsend And Townsend And Crew, LLP

20090120364 - Gas mixing swirl insert assembly: A gas mixing system for a semiconductor wafer processing chamber is described. The mixing system may include a gas mixing chamber concentrically aligned with a gas transport tube that extends to a blocker plate. The gas mixing chamber and the transport tube are separated by a porous barrier that increases... Agent: Townsend And Townsend And Crew LLP

20090120363 - Gas supply pipe for plasma treatment: A gas supply pipe 4 for plasma treatment which is inserted in a container 3 held in a plasma treatment chamber 1 to form a deposited film on the inner surface of the container 3 by the supply of a gas for plasma treatment to the inside of the container... Agent: Kanesaka Berner And Partners LLP

20090120365 - Substrate processing apparatus: To provide a substrate processing apparatus capable of easily installing a plasma discharge electrode having flexibility at a prescribed position in an electrode protective tube, and is capable of holing the plasma discharge electrode having flexibility at the prescribed position. This apparatus includes: a processing chamber that houses a plurality... Agent: Oliff & Berridge, PLC

20090120367 - Plasma immersion ion implantation reactor with extended cathode process ring: The disclosure concerns a process ring for the wafer support pedestal of a toroidal source plasma immersion ion implantation reactor. The process ring improves edge uniformity by providing a continuous surface extending beyond the wafer edge, in one embodiment. In another embodiment, the process ring includes a floating electrode that... Agent: Law Office Of Robert M. Wallace

20090120366 - Microwave plasma cvd device: The present invention provides a microwave plasma CVD device that can satisfactorily perform plasma position control under a condition capable of fabricating a large-area high-quality diamond thin film or the like. A microwave plasma CVD device includes: a vacuum chamber 1 having, in the center of its upper portion, an... Agent: GlobalIPCounselors, LLP

20090120368 - Rotating temperature controlled substrate pedestal for film uniformity: Substrate processing systems are described. The systems may include a processing chamber, and a substrate support assembly at least partially disposed within the chamber. The substrate support assembly is rotatable by a motor yet still allows electricity, cooling fluids, gases and vacuum to be transferred from a non-rotating source outside... Agent: Townsend And Townsend And Crew LLP

20090114149 - Gas wiping apparatus: A gas wiping apparatus for use in coating a molten metal onto a steel strip. In the apparatus, a chamber, to which a high pressure gas is supplied, defines a multistage uniform pressure space. A lip support unit is associated with a front of the chamber to allow the high... Agent: The Webb Law Firm, P.C.

20090114150 - Substrate processing apparatus: To simultaneously display a transfer state of substrates (wafers) held on a substrate holding tool and detail-information thereof on the same screen. In a substrate processing apparatus that loads a substrate holding tool, on which a plurality of substrates are placed, into a furnace, and applies prescribed processing thereto, a... Agent: Oliff & Berridge, PLC

20090114151 - Apparatuses and methods for maskless mesoscale material deposition: Apparatuses and processes for maskless deposition of electronic and biological materials. The process is capable of direct deposition of features with linewidths varying from the micron range up to a fraction of a millimeter, and may be used to deposit features on substrates with damage thresholds near 100° C. Deposition... Agent: Peacock Myers, P.C.

20090114152 - Apparatus for plasma treatment: An apparatus for treating with plasma a specimen mounted on a specimen table and a next specimen mounted thereon after the treatment of the specimen is completed in a vacuumed container, comprises, a detector for measuring a temperature of the specimen table, and an adjustor for adjusting the temperature of... Agent: Antonelli, Terry, Stout & Kraus, LLP

20090114153 - Method and apparatus for sealing an opening of a processing chamber: A method and apparatus for sealing an opening of a processing chamber are provided. In one embodiment, the invention generally provides a closure member integrated within a wall of a process chamber for sealing an opening within the wall of the chamber. In another embodiment, the invention provides a closure... Agent: Patterson & Sheridan, LLP - - Appm/tx

20090114154 - Plasma treatment apparatus: The present invention provides a plasma treatment apparatus which has a plurality of UR-type plasma guns including reflected electron return electrodes, and can stably form a film having uniform film thickness and film quality. A plasma treatment apparatus according to one embodiment of the present invention sets an electric potential... Agent: Fitzpatrick Cella Harper & Scinto

20090114155 - Processing apparatus, exhaust processing process and plasma processing process: There is disclosed an exhaust processing process of a processing apparatus for processing a substrate or a film, which comprises after the processing of the substrate or the film, introducing a non-reacted gas and/or a by-product into a trap means comprising a filament comprised of a high-melting metal material comprising... Agent: Fitzpatrick Cella Harper & Scinto

20090114156 - Film formation apparatus for semiconductor process: A film formation apparatus for a semiconductor process includes a support member having a plurality of support levels configured to support target substrates inside a reaction chamber; a film formation gas supply system configured to supply a film formation gas into the reaction chamber and including a gas distribution nozzle;... Agent: Smith, Gambrell & Russell

20090114157 - Ampoule splash guard apparatus: Embodiments of the invention provide an apparatus for generating a precursor gas used in a vapor deposition process system. The apparatus contains a canister or an ampoule for containing a chemical precursor and a splash guard contained within the ampoule. The splash guard is positioned to obstruct the chemical precursor... Agent: Patterson & Sheridan, LLP - - Appm/tx

20090114159 - Transporting means and vacuum coating installation for substrates of different sizes: In a vacuum coating installation to coat planar substrates, comprising a vacuum chamber and a transport device arranged in the vacuum chamber for transporting the substrates along a transportation path through the vacuum chamber, with the transport device comprising a multitude of transport rollers arranged successively along the transportation path,... Agent: Heslin Rothenberg Farley & Mesiti PC

20090114158 - Workpiece support with fluid zones for temperature control: A workpiece support is disclosed defining a workpiece-receiving surface. The workpiece support includes a plurality of fluid zones. A fluid, such as a gas, is fed to the fluid zones for contact with a workpiece on the workpiece support. The fluid can have selected thermoconductivity characteristics for controlling the temperature... Agent: Dority & Manning, P.A.