|Coating apparatus patents - Monitor Patents|
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Coating apparatus March listing by industry category 03/09Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 03/26/2009 > patent applications in patent subcategories. listing by industry category
20090078194 - Powdering device for powdering printed sheet: A powdering device includes: a powder placing member having a placing section on which a powder fed from a storage container is placed; a first scraping member for scraping the powder on the placing section of the powder placing member, so that a constant amount of the powder remains on... Agent: Birch Stewart Kolasch & Birch
20090078195 - Reagent activator for electroless plating: A method for electroless plating of a substrate is provided that comprises exposing an electroless plating reagent comprising a metal to be plated and at least one reducing agent to a solid phase Activation Material to form an activated electroless plating reagent prior to application of the electroless plating reagent... Agent: Kagan Binder, PLLC
20090078197 - Substrate processing system, control method for substrate processing apparatus and program: The present invention provides a substrate processing system, a control method for a substrate processing apparatus, and a program for the system and/or method, each of which is intended to achieve effective control for a film-forming amount on processed substrates. The substrate processing system includes a substrate processing unit adapted... Agent: Smith, Gambrell & Russell
20090078196 - Treatment device, treatment device consumable parts management method, treatment system, and treatment system consumable parts management method: A processing apparatus includes counters each used to measure the length of RF discharge time over which power is applied to a consumable component in correspondence to a specific type of processing executed in a processing chamber, a storage to store wear coefficient information indicating wear coefficients each corresponding to... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20090078198 - Chamber components with increased pyrometry visibility: The present invention generally provides method and apparatus for non-contact temperature measurement in a semiconductor processing chamber. Particularly, the present invention provides methods and apparatus for non-contact temperature measurement for temperature below 500° C. One embodiment of the present invention provides an apparatus for processing semiconductor substrates. The apparatus comprises... Agent: Patterson & Sheridan, LLP - - Appm/tx
20090078200 - Apparatus for manufacturing flat-panel display: Disclosed herein is a flat panel display (FPD) manufacturing apparatus for performing a desired process for a substrate positioned in a chamber after establishing a vacuum atmosphere in the chamber. The vacuum chamber is divided into a chamber body and an upper cover to ensure easy opening/closing operations of the... Agent: Ked & Associates, LLP
20090078199 - Plasma enhanced chemical vapor deposition apparatus: A plasma enhanced chemical vapor deposition apparatus includes a receptacle having three chambers as an entering chamber, an intermediate chamber, and an exit chamber, four gates disposed before or behind or between the chambers for selectively closing the chambers and for allowing the chambers to be selectively vacuumed, one or... Agent: Charles E. Baxley, Esquire
20090078201 - Vertical plasma processing apparatus for semiconductor process: A vertical plasma processing apparatus for a semiconductor process includes an airtight auxiliary chamber defined by a casing having an insulative inner surface and integrated with a process container. The auxiliary chamber includes a plasma generation area extending over a length corresponding to a plurality of target substrates in a... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20090078202 - Substrate heater for material deposition: A radiative heater for substrates in a physical vapor deposition process for fabricating films of materials in a wide dynamic range of process temperatures and gas pressures includes a heat radiating member made from a high-temperature and oxidation resistant material tolerant to vacuum conditions which separates a heater volume containing... Agent: Rosenberg, Klein & Lee
20090078203 - Hot source: A hot source for vapour deposition apparatuses for supplying source substance into a reactor, the source comprising a source container having a source space for the source substance. The source further comprises a lid comprising first heating means for heating the lid, the lid being detachably installable in the source... Agent: Oliff & Berridge, PLC
20090078204 - Deposition system for thin film formation: An apparatus for maintaining the alignment or positional relationship between at least two coating modules in an ALD system, the apparatus comprising a plurality of coating modules in a coating section, at least a first bar and a second bar for supporting the coating modules, and at least a first... Agent: Eastman Kodak Company Patent Legal Staff03/19/2009 > patent applications in patent subcategories. listing by industry category
20090071395 - Dispensing machine to enhance the visual appeal of prepared foods: The present invention is a dispensing machine (10) to enhance the visual appeal of prepared foods. The dispensing machine includes one or more temperature controlled storage containers (36) that stores sauces, syrups, or other flowable foods and includes one or more dispensing nozzles (44) for dispensing the same. The dispensing... Agent: Charley Michael Parks
20090071396 - System for production-line printing on wet web material: The present invention is method and system for applying a finish to non-woven fabric as part of the production line, during the production process, and provides for the selective application of, for example, colorants so as to produce patterns or graphic designs to the non-woven fabric before completion of the... Agent: Dr. Mark M. Friedman C/o Bill Polkinghorn - Discovery Dispatch
20090071397 - Rotary atomizer head type paining machine: A coupling portion is provided on an outer peripheral side of a rotational shaft, a stationary ring is mounted on a fore end portion of an air motor, a rotatable ring is rotatably attached to a stationary ring, and slide plates are provided between the stationary ring and the rotatable... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.
20090071398 - Rotary feeding system: Methods and apparatus for accurately and repeatably depositing edible particulates on edible products. A dual-drum rotary feed system accurately meters an amount of edible particle for each edible product with a first rotary drum while a second rotary drum deposits the edible particulates onto or within the edible product. The... Agent: General Mills, Inc.
20090071399 - Apparatus for treating workpieces: The invention relates to a fluid rotary leadthrough having a journal and a sleeve. The sleeve and the journal are sealed off with respect to one another. The journal and the sleeve each have a line connection. The line connections, at least from time to time, are connected to one... Agent: Ohlandt, Greeley, Ruggiero & Perle, LLP
20090071400 - Flexible hose and a paint application apparatus and system with same: An insulated hose for a high voltage paint application apparatus including an inner hose containing a fluid or paint charged at a high voltage. The flexible inner tube hose is arranged inside at least one flexible mechanical protection tube or layer and an air excluding medium is enclosed between flexible... Agent: St. Onge Steward Johnston & Reens, LLC
20090071402 - Metal film vapor phase deposition method and vapor phase deposition apparatus: A copper film vapor phase deposition method includes the steps of exposing high-purity copper to a plasma of a gas containing chlorine gas to etch the high-purity copper, thereby generating active CuxCly, wherein x is 1 to 3, y is 1 to 3, gas, and forming a copper film by... Agent: Fitzpatrick Cella Harper & Scinto
20090071401 - Method and apparatus for recycling inert gas: A method for recycling an inert gas evacuated from a material deposition process chamber 10 comprises cooling the evacuated inert gas and recirculating a proportion of the cooled gas to the chamber 10 at a first temperature for use as a cooling gas in the material deposition process 12, and... Agent: Manelli Denison & Selter
20090071403 - Pecvd process chamber with cooled backing plate: The invention generally relates to a plasma enhanced chemical vapor deposition chamber for depositing amorphous or microcrystalline silicon on a glass substrate to fabricate solar voltaic cells. The chamber includes a backing plate having at least one fluid receiving conduit to receive cooling fluid to remove heat generated within the... Agent: Patterson & Sheridan, LLP - - Appm/tx
20090071405 - Substrate processing apparatus: Disclosed is a substrate processing apparatus, comprising a processing chamber to accommodate one or more substrates, a gas supply section to supply processing gas into the processing chamber, a gas discharge section to discharge the processing gas from the processing chamber, at least a pair of electrodes provided inside the... Agent: Birch Stewart Kolasch & Birch
20090071404 - Method of forming titanium film by cvd: A Ti film is formed by CVD in holes formed in an insulating film formed on a Si substrate or on a Si film formed on a Si substrate by a method according to the present invention. The method includes the steps of: loading a Si substrate into a film... Agent: Smith, Gambrell & Russell
20090071406 - Cooled backing plate: A plasma enhanced chemical vapor deposition chamber (PECVD) which includes a backing plate that provides support to a diffuser. The backing plate includes a plurality of fluid conduits adapted for circulation of a cooling fluid therethrough to remove excess heat generated in the chamber by the plasma to thereby maintain... Agent: Applied Materials, Inc. C/o Fulbright & Jaworski L.L.P.
20090071407 - Semiconductor processing parts having apertures with deposited coatings and methods for forming the same: Holes in semiconductor processing reactor parts are sized to facilitate deposition of protective coatings, such chemical vapor deposition at atmospheric pressure. In some embodiments, the holes each have a flow constriction that narrows the holes in one part and that also divides the holes into one or more other portions.... Agent: Knobbe Martens Olson & Bear LLP03/12/2009 > patent applications in patent subcategories. listing by industry category
20090064924 - Method for the consolidation of ornamental stones, device and relevant plant: The method for consolidating plate-like, slice-like or modularelement-like ornamental stones comprises: the impregnation by means of the pressure created in the treatment environment with a water glass solution wherein the material being treated is plunged for enough time for the full penetration in fissures and microporosities of the surface thereof;... Agent: Mcginn Intellectual Property Law Group, PLLC
20090064925 - Apparatus for controlling the adhesive feed to an application comb: The line (4) intended for applying glue to a workpiece having a finger-jointing profile at the end face and supplying glue to an application comb (1) to be operated in accordance with the working cycle of a finger-jointing plant forms, via a branching point (5), a through-connection with two supply... Agent: Fox Rothschild LLP
20090064926 - Drum for coating grained substrates: The invention concerns a drum for coating or drying grained substrates (10), said drum comprising a horizontal or slightly inclined axis (1). The invention is characterized in that the casing (2) of the drum comprises slots (5) for allowing through gas, said slots being formed between parallel ridges (8), said... Agent: Jacobson Holman PLLC
20090064927 - Single sided treatment method and hollow holding apparatus: A method for applying treatment to a single side or surface of an object while preventing other surfaces from being treated and a holder used during the treatment process are disclosed. An object is placed in an opening of the holder. The holder firmly holds the object during the treatment... Agent: Sinorica, LLC
20090064928 - Cluster tool architecture for processing a substrate: Embodiments generally provide an apparatus and method for processing substrates using a multi-chamber processing system (e.g., a cluster tool) that has an increased system throughput, increased system reliability, substrates processed in the cluster tool have a more repeatable wafer history, and also the cluster tool has a smaller system footprint.... Agent: Patterson & Sheridan, LLP - - Appm/tx
20090064929 - Cluster tool architecture for processing a substrate: Embodiments generally provide an apparatus and method for processing substrates using a multi-chamber processing system (e.g., a cluster tool) that has an increased system throughput, increased system reliability, substrates processed in the cluster tool have a more repeatable wafer history, and also the cluster tool has a smaller system footprint.... Agent: Patterson & Sheridan, LLP - - Appm/tx
20090064930 - Stent coating device: The present invention is a method and device, which is suitable for use in an operating theater just prior to implantation, for selectively applying a medical coating to an implantable medical device, for example a stent. Disclosed is a device for use with a stent deployed on a catheter balloon.... Agent: Rissman Jobse Hendricks & Oliverio, LLP
20090064931 - Method of manufacturing semiconductor device and substrate processing apparatus: A method of manufacturing a semiconductor device of the present invention includes a first step of forming a metal oxide film containing at least one or more kinds of elements selected from the group consisting of hafnium, yttrium, lanthanum, aluminium, zirconium, strontium, titanium, barium, tantalum, niobium, on a substrate having... Agent: Oliff & Berridge, PLC
20090064932 - Apparatus for hdp-cvd and method of forming insulating layer using the same: The high-density plasma chemical vapor deposition apparatus includes a plurality of gas suppliers to supply a gas into a chamber and to form an insulating layer between semiconductor devices, each of the gas suppliers including a gas injection valve to perform an on/off operation and a valve controller to control... Agent: Staas & Halsey LLP
20090064933 - Film coating system and isolating device thereof: A film coating system for coating an object includes a working station and an isolating device. The object is disposed on the working station, and the isolating device is utilized to isolate the object. The isolating device includes a body generating a first power, a first working fluid, a second... Agent: Quintero Law Office, PC
20090064934 - Source gas flow path control in pecvd system to control a by-product film deposition on inside chamber: The present invention generally comprises a method and an apparatus for guiding the flow of processing gases away from chamber walls and slit valve opening. By controlling the flow path of the process gases within a processing chamber, undesirable deposition upon chamber walls and within slit valve openings may be... Agent: Patterson & Sheridan, LLP - - Appm/tx
20090064935 - Cvd reactor having a process-chamber ceiling which can be lowered: The invention relates to an apparatus for the deposition of one or more layers on a substrate (4), which comprises a process chamber (2) which is arranged in a reactor housing (1) and has a heatable bottom (3) on which the substrate rests and a lid (5) extending parallel to... Agent: Sonnenschein Nath & Rosenthal LLP03/05/2009 > patent applications in patent subcategories. listing by industry category
20090056621 - Coating material cartridge: For providing a coating material cartridge capable of reliably discharging air and coating material stagnated in a hydraulic fluid chamber, a coating material cartridge has a cartridge main body, a partition body, a coating material transfer path and a plurality of hydraulic fluid transfer paths. The cartridge main body is... Agent: Greenblum & Bernstein, P.L.C
20090056620 - Thermal spraying nozzle device and thermal spraying system using the same: A thermal spraying nozzle device wherein carrier gas is introduced into an inlet side of a nozzle (1) to form a supersonic gas flow in the entire region inside the nozzle and a thermal spraying material is atomized and ejected by the gas flow, the thermal spraying nozzle device comprising... Agent: Reed Smith LLP
20090056622 - Spray guide: A spray guide is disclosed herein for implementation with a spray assembly comprising a spray wand and a spray nozzle. The spray guide includes an arm having a first end and a second end. A mechanism is used for removably attaching the first end of the arm to the swivel... Agent: Timothy H. Van Dyke Beusse Wolter Sanks Mora & Maire, P.A.
20090056623 - Coating system and method: An apparatus and system for electromotively coating a part can include a conveyor that has a plurality of hangars that are configured to be positively connected to respective parts that are to be coated. An attachment mechanism can be provided on the hangar and the part, the attachment mechanism being... Agent: Cermak Kenealy & Vaidya, LLP
20090056624 - Fluid circulating system for manufacturing printed circuit board: An exemplary fluid circulating system includes a return pipe, a reservoir, a suction pipe, a supply pipe, a circulating pump, and a processing device. The reservoir is configured for containing a work fluid. The processing device is configured for processing a semi-finished printed circuit board using the work fluid. The... Agent: PCe Industry, Inc. Att. Cheng-ju Chiang
20090056625 - Shielding member of processing system: A shielding member applicable in a deposition apparatus is provided. The shielding member includes a base metal and an adhesion promoter layer arc-sprayed on the base metal, wherein adhesion promoter layer has a thickness gradient increasing from an upper end of the shielding member to a lower end of the... Agent: J C Patents, Inc.
20090056626 - Apparatus for cyclical depositing of thin films: An apparatus for cyclical depositing of thin films on semiconductor substrates, comprising a process chamber having a gas distribution system with separate paths for process gases and an exhaust system synchronized with operation of valves dosing the process gases into a reaction region of the chamber.... Agent: Patterson & Sheridan, LLP - - Appm/tx
20090056627 - Method and apparatus for monitoring plasma-induced damage using dc floating potential of substrate: A method for monitoring plasma-induced damage to a substrate while being processed in a plasma CVD apparatus includes: measuring DC floating potential of the substrate using a detection electrode in contact with the substrate while the substrate is processed in the apparatus; and detecting abnormality as plasma-induced damage based on... Agent: Knobbe Martens Olson & Bear LLP
20090056628 - Process and apparatus for forming nanoparticles using radiofrequency plasmas: Methods and apparatus for producing nanoparticles, including single-crystal semiconductor nanoparticles, are provided. The methods include the step of generating a constricted radiofrequency plasma in the presence of a precursor gas containing precursor molecules to form nanoparticles. Single-crystal semiconductor nanoparticles, including photoluminescent silicon nanoparticles, having diameters of no more than 10... Agent: Westman Champlin & Kelly, P.A.
20090056629 - Cathode liner with wafer edge gas injection in a plasma reactor chamber: The disclosure concerns a wafer support for use in a plasma reactor chamber, in which the wafer support has a wafer edge gas injector adjacent and surrounding the wafer edge.... Agent: Law Office Of Robert M. Wallace
20090056630 - Workpiece support system and method: A workpiece support system for a vacuum coating machine includes a base table having a rotating spindle rod that extends in a vertical direction away from the base table and is capable of powered rotation. A stop post is connected to the table and extends in a vertical direction at... Agent: Leydig, Voit & Mayer, Ltd
20090056631 - Apparatus for manufacturing semiconductor layer: An apparatus for manufacturing a semiconductor layer on a substrate typically includes a reaction chamber, a first feed pipe, and a second feed pipe. The reaction chamber is configured for receiving the substrate therein. The first feed pipe and the second feed pipe communicate with the reaction chamber, providing a... Agent: PCe Industry, Inc. Att. Cheng-ju ChiangPrevious industry: Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
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