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Coating apparatus inventions 04/06

Recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing format for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application.    04/27/2006 > 7 patent applications in 6 patent subcategories.

20060086316 - Spray-drying device and feet means for this spray-drying device: The invention provides a spray-drying device comprising a housing (1), a first feed means (2) with a first spray opening, for supplying a first substance, the first substance being a liquid which is sprayed in a cone (3; 3a, 3b) in a first outlet direction, a second feed means (4)...

20060086317 - Automobile door holder or automobile lid holder: An automobile door or compartment-cover holder to fix in position a door or a cover for an engine or luggage compartment of an automobile during a processing event in the manufacturing procedure, in particular the application of a CDP coating and/or paint, constructed as a multi-part plastic holder or combined...

20060086318 - Gas diffusion plate: In a gas diffusion plate, a plurality of through holes for passing a processing gas used in processing a substrate are provided. Each one of the through holes provided in a peripheral region of the gas diffusion plate is formed so that an area of an inlet thereof is larger...

20060086319 - Processing gas supply mechanism, film forming apparatus and method, and computer storage medium storing program for controlling same: A processing gas supply mechanism installed on a processing chamber of a film forming apparatus for supplying a processing gas containing a metal organic compound onto a substrate to be processed includes a processing gas inlet opening for introducing the processing gas, a diffusion space for diffusing the processing gas...

20060086320 - Method and device for plasma treating workpieces: Disclosed are a method and a device for plasma treating workpieces (5). Said workpiece is inserted into a chamber (4) of a treatment station (17), which can be at least partly evacuated, and at least one part (18) of the treatment station is moved relative to another part (27, 35)...

20060086321 - Substrate-to-mask alignment and securing system with temperature control for use in an automated shadow mask vacuum deposition process: The present invention is a substrate holder system for and method of providing a substrate-to-mask alignment mechanism, securing mechanism and temperature control mechanism. The substrate holder system is suitable for use in an automated shadow mask vacuum deposition process. The substrate holder system includes a system controller, and a substrate...

20060086322 - Device for production of a plasma sheet: The invention relates to a device for the production of a plasma (16) within a housing comprising means for the generation of energy in the microwave spectrum, for the excitation of the plasma, said means comprise at least one basic plasma excitation device with a coaxial applicator (4) of microwave...

  
04/20/2006 > 15 patent applications in 13 patent subcategories.

20060081174 - Vacuum nozzle for spray system: A cold spray system includes a spray nozzle for depositing material onto a substrate. A collection assembly at least partially surrounds the spray nozzle for vacuuming undepositive material and gases in the work area. The collection assembly includes a transparent collection tube at an end portion of the collection assembly...

20060081175 - Coating system for protective layer forming material: A coating system (10a) has a first coating station (ST1), a second coating station (ST2), and a third coating station (ST3), which are successively arranged downstream with respect to the conveying direction of vehicles (14). Each of the coating stations has a plurality of robots (16). In the first coating...

20060081176 - Surfactant applicator for solution casting system and method of use to produce a film: A solvent band casting system, roll coating apparatus, and method of using the same are disclosed. The system includes a tank for mixing and/or storing a polymer solution for a band casting machine having at least a first and a second rotating drums about which a continuous metal band is...

20060081177 - Wire insulating line: In a wire insulating line, a cooling device that cools down a traveling high-temperature linear material, which is resin-coated by an extruder, in cooling water includes a reservoir tank that reserves the cooling water and allows the linear material to pass therein, and water spray nozzles that are provided in...

20060081178 - Electrostatic spray nozzle with multiple outlets at varying lengths from target surface: A nozzle spray head is provided for use in a dynamic electrostatic air filter, in which the nozzle spray head assembly exhibits multiple nozzle orifices as outlet ports, which extend from the bottom of the nozzle body such that the distances between the outlet ports and a target member are...

20060081179 - Device, method and arrangement for pressing two axis-parallel rollers approachable to one another in a device for producing and/or treating a web of material: Two axially parallel rolls are pressed against each other in a device for producing and/or treating a moving material web. Sensor elements are arranged in the force transmission path running from the force-producing elements via the rolls, outside roll bodies of the two rolls. As a result of displacing the...

20060081180 - Substrate processing apparatus: The invention provides a substrate processing apparatus that offers high processing efficiency in resist removal, cleaning and so on. The substrate processing apparatus includes a substrate mounting table that rotates with a semiconductor substrate retained thereon, a first container that stores a first liquid to be supplied to a surface...

20060081181 - Film forming system and film forming method: A clean gas circulates to pass through a loading area provided below a vertical heat treatment furnace. The clean gas unidirectionally flows through the loading area. After completion of wafer processing, a wafer boat lowers from the heat treatment furnace to the loading area, where the wafers are removed from...

20060081182 - Method of cleaning thin film deposition system, thin film deposition system and program: A thin film deposition system cleaning method is capable of efficiently removing reaction products deposited on surfaces of component members of a thin film deposition system. A thermal processing system 1 capable of carrying out the thin film deposition system cleaning method includes a controller 100. The controller 100 controls...

20060081183 - Plasma treatment processing apparatus: A processing apparatus that provides a plasma treatment to an object includes a process chamber that accommodates an object to be processed, and generates plasma, a gas introducing part for introducing gas into the process chamber, and a mechanism that arranges the object at an upper side in a flow...

20060081184 - Evaporation mask with high precision deposition pattern: An evaporation mask comprises a substrate having a deposition surface; an evaporation mask installed below the deposition surface of the substrate; the thermal expansion coefficient of the evaporation mask being not greater than that of the substrate; a plurality of rectangular mask working units being arranged on the substrate; for...

20060081185 - Thermal management of dielectric components in a plasma discharge device: A plasma discharge device is provided having features for enhanced thermal management and protection of dielectric materials in the device. The invention generally comprises a plasma confinement chamber constructed at least in part of dielectric materials, with a cooling instrument disposed in contact with the outer dielectric surfaces of the...

20060081186 - Single-substrate-heat-processing apparatus for performing reformation and crystallization: An insulating film consisting of first and second tantalum oxide layers is formed on a semiconductor wafer. First, an amorphous first layer is formed by CVD, and a reforming process for removing organic impurities contained in the first layer is carried out. Then, an amorphous second layer is formed by...

20060081187 - Susceptor system: The present invention relates to a susceptor system for an apparatus for the treatment of substrates and/or wafers, provided with a treatment chamber (1) delimited by at least two walls and with at least one heating solenoid (9); the susceptor system comprises at least one susceptor element (2, 3) delimited...

20060081188 - Deposition system: A vacuum deposition system comprises a vacuum vessel, an evaporation source holder provided in the vacuum vessel for holding an evaporation substance and a holding jig provided in the vacuum vessel for holding a substrate facing the evaporation source. An adhesion-prevention member is provided at outer peripheries of the evaporation...

  
04/13/2006 > 12 patent applications in 10 patent subcategories.

20060075961 - Moistening arrangement of multiple-nip calender: A multiple-nip calender has a set of rolls (2) with roll nips (N) between the rolls. A moistening arrangement has a roll means (3) for moistening the fibre web comprising a damping unit (33) and rolls (32) guiding the fibre web (W). The roll means is located in a pocket...

20060075962 - Adhesion promoter application system and process: A system and method for applying a material for improving the adhesion between the surface of thermoplastic polyolefin (TPO) elements and a coating applied thereto is disclosed. The system comprises the mixing of an adhesion promoter with de-ionized water and applying it to the surface of the TPO elements to...

20060075963 - Vacuum rotational seeding and loading device and method for same: An apparatus for seeding material in a scaffold member capable of entrapping such seeding material therein is provided. The apparatus may include a chamber having an interior and capable of maintaining a negative pressure and capable of enclosing the scaffold member therein, and a support member for rotating the scaffold...

20060075964 - Packaging and/or applicator device for applying at least one substance: A packaging and applicator device for applying at least one substance may include: a support that includes at least one cavity configured to containing the substance; and an applicator that includes at least one cut out part of the support that is secured to the support at least before use....

20060075965 - Method of and apparatus for dispensing photoresist in manufacturing semiconductor devices or the like: In a photoresist dispensing apparatus for use in manufacturing a semiconductor device, to coercively emit photoresist from a bottle by using a dispensing pump and to pass it through a supply line and a filter to obtain a filtering operation, and to spray the filtered photoresist to a wafer through...

20060075966 - Apparatus and method for plasma assisted deposition: Embodiments of the present invention relate to an apparatus and method of plasma assisted deposition by generation of a plasma adjacent a processing region. One embodiment of the apparatus comprises a substrate processing chamber including a top shower plate, a power source coupled to the top shower plate, a bottom...

20060075967 - Magnetic-field concentration in inductively coupled plasma reactors: A substrate processing system is provided with a housing defining a process chamber. A substrate holder is disposed within the process chamber and configured to support a substrate during substrate processing. A gas delivery system is configured to introduce a gas into the process chamber. A pressure-control system is provided...

20060075968 - Leak detector and process gas monitor: A method and apparatus for a plasma enhanced chemical vapor deposition system for processing one or more flat panel display substrates comprising a vacuum deposition process chamber configured to contain gas, a residual gas analyzer configured to analyze the gas within the process chamber and to provide feedback, and a...

20060075969 - Heat transfer system for improved semiconductor processing uniformity: A plasma processing system and methods for processing a substrate using a heat transfer system are provided. The heat transfer system, which is capable of producing a high degree of processing uniformity across the surface of a substrate, comprises a uniformity pedestal supported on and in good thermal contact with...

20060075970 - Heated substrate support and method of fabricating same: A method and apparatus for forming a substrate support is provided herein. In one embodiment, the substrate support includes a body having a support surface and at least one groove. A heater element clad with a malleable heat sink is disposed in the groove. Substantially no air is trapped between...

20060075971 - Heated substrate support and method of fabricating same: A method and apparatus for forming a substrate support is provided herein. In one embodiment, the substrate support includes a body having a support surface and at least one groove. A heater element surrounded with a malleable heat sink is disposed in the groove. The heat sink may be comprised...

20060075972 - Substrate processing apparatus and substrate processing method: A substrate processing apparatus comprises a processing chamber; a susceptor on which a substrate to be processed is to be placed; and a heating unit disposed below the susceptor for heating the substrate to be processed placed on the susceptor. The susceptor and the heating unit are accommodated in the...

  
04/06/2006 > 7 patent applications in 6 patent subcategories.

20060070570 - Application device for a printing/painting unit in a processing machine: An applicator device for a printing/varnishing unit in a processing machine is provided. The applicator device helps prevent jolts caused by a cylinder channel and thereby increasing the print quality. The applicator roller 5, 6, 7 is associated with a cylinder channel 10 of a printing cylinder 1. The applicator...

20060070571 - Versatile system for self-aligning deposition equipment: The present invention provides a system (100) for aligning a dispensing apparatus (110) utilized within a semiconductor deposition chamber (102). A stationary reference apparatus (106) is disposed along the bottom of the deposition chamber. A self-alignment support system (122), comprising one or more support components (124), is intercoupled between the...

20060070572 - Process and apparatus for the application of fluoropolymer coating to threaded fasteners: A process and apparatus are provided for the application of a fluoropolymer coating to the threads of an internally threaded fastener. The fastener has a body and a threaded bore extending to opposing ends of the body to define opposing first and second openings in the fastener. The fastener is...

20060070573 - Apparatus and method for coating an article: A coating apparatus includes a mounting member for mounting a turbine airfoil in a coating chamber. The mounting member defines a chamber therein and includes a mounting port that is adapted to receive the turbine airfoil. The mounting port provides a fluid connection between the chamber and an internal passage...

20060070574 - Method and system for binding halide-based contaminants: A method and apparatus are presented for reducing halide-based contamination within deposited titanium-based thin films. Halide adsorbing materials are utilized within the deposition chamber to remove halides, such as chlorine and chlorides, during the deposition process so that contamination of the titanium-based film is minimized. A method for regenerating the...

20060070575 - Solution-vaporization type cvd apparatus: The vaporizer of the solution-vaporization type CVD apparatus comprises: the orifice tube dispersing at least one kind of a raw-material solution in a carrier gas in a fine particulate or misty form; at least one path for at least one kind of the raw-material solution, the at least one path...

20060070576 - Source for thermal physical vapor deposition of organic electroluminescent layers: The present invention disclosed the deposition source installed in a chamber, heated by applied electric power to transfer heat to a vapor deposition material received therein and applying a vaporized deposition material generated therein to a substrate to form deposition organic electroluminescent layers onto the substrate, and comprising a vessel...

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