Coating apparatus inventions 03/06

20060065188 - Method and system for coating a human body: A coating system for automatically coating a human body in a coating chamber, followed by automatically cleaning the coating chamber and a method of operating thereof is described. The coating system comprises a coating solution reservoir configured to hold a coating solution, a cleaning solution reservoir configured to hold a...

20060065190 - Application device: A device for direct or indirect application of liquid or viscous coating medium by way of an application system onto a material web, especially a paper or cardboard web, including a weakening device for weakening the boundary layer of air that is carried along by the application surface. The weakening...

20060065189 - Method and system for homogenization of supercritical fluid in a high pressure processing system: A method and system for providing a homogeneous processing environment in a high pressure processing system is described. A high pressure fluid and a process chemistry are mixed in a pre-mixing system prior to exposure with the fluid in a supercritical state of a substrate in the high pressure processing...

20060065191 - Water feed device for a moistener of a mail handling machine: A water feed device for feeding water to a moistener for moistening envelope flaps, which moistener is incorporated into a mail handling machine, the water feed device including a water tank which is mounted on a support and from which a quantity of water flows through a water feed pipe...

20060065192 - Method and assembly for coating articles: A coating assembly paints a coating on a plurality of articles having first and second article portions. The coating assembly includes a rail frame defining a longitudinal path for the plurality of articles to travel along. An endless chain having a chain portion thereof extending along the longitudinal path transports...

20060065193 - Device for supporting a stent during coating of the stent: A device to support a stent during a process of forming a coating on the stent is disclosed....

20060065194 - Diffuser and semiconductor device manufacturing equipment having the same: Semiconductor device manufacturing equipment includes a plurality of process chambers in which one or more fabrication processes takes place, a transfer chamber selectively communicating with the process chambers by means of doors, a vacuum pump and a source of vent gas which are connected to the transfer chamber via vacuum/vent...

20060065195 - Microwave plasma generating device: A microwave plasma generator is provided in which a gas in a vacuum vessel is directly excited by an evanescent wave from a microwave resonator disposed in the vessel without using an ECR system. The microwave plasma generator of the present invention includes a microwave source to generate an excitation...

20060065196 - Susceptor: A susceptor at least a surface thereof being coated with SiC, includes a recess where an wafer is mounted, the recess having an round portion disposed on a lower portion of an outer circumferential portion of the recess, a ring-shaped SiC crystal growth surface portion provided within the round portion...

20060065197 - Vapor deposition apparatus: A vapor deposition apparatus of the present invention has a substrate holder having a substrate holding surface for holding a substrate thereon, and a flow channel for supplying a source gas onto the substrate. The flow channel has an upper wall and a lower wall. An aperture portion is provided...

20060054082 - Substrate holding and rotating apparatus: A substrate holding and rotating apparatus includes: a spin base connected to a rotary shaft and rotatable therearound; holding members attached to the spin base and displaceable between holding positions at which the holding members come in contact with the peripheral edge of the substrate such that the holding members...

20060054083 - Coating device: There is provided a coating device which can quickly cope with a change in size of a container. A pair of coating belts (annular belts) (11, 15) are arranged on two sides of a conveyor (10). The coating belt (15) is rotated at a high speed while the coating belt...

20060054084 - Painting device of a crash pad: A painting device of a crash pad includes a painting jig inserted into or separated from a painting groove formed in a boundary between two tones painted on the crash pad when the crash pad is painted in two tones, so as to divide the crash pad into portions to...

20060054085 - Simplified powder fluidization apparatus and method: Fluidizing device that is structurally separate from a powder container (12) includes a housing (100) that defines an interior air volume and a portion of the housing is porous or permeable to air flow. The housing (100) is coupled to a source of air (104) and produces a distributed fluidization...

20060054086 - Liquid crystal filter manufacturing apparatus and method for controlling the inkjet head: When nozzles of an inkjet head face cells of a liquid crystal filter, respectively, several ink droplets having small sizes are continuously ejected from each nozzle. The several ink droplets having small sizes, which are continuously ejected from each nozzle, are securely accommodated in and applied to each of the...

20060054087 - Process chamber for manufacturing seminconductor devices: The present invention is directed to a plasma process chamber capable of maintaining a high vacuum in the idle state. The present invention maintains a high vacuum in the idle state and prevents a contamination of the wafer transferred into the process chamber....

20060054088 - Vapor phase epitaxial growth apparatus and semiconductor wafer production method: A vapor phase epitaxial growth apparatus, comprising a chamber, to which a wafer is fed; a gas introduction device for introducing a reaction gas into the chamber; a gas flow amount sensor for detecting a flow amount of the reaction gas introduced by the gas introduction device; heaters for heating...

20060054089 - Source for thermal physical vapor deposition of organic electroluminescent layers: The present invention disclosed the deposition source installed in a chamber, heated by applied electric power to transfer heat to a vapor deposition material received therein and applying a vaporized deposition material generated therein to a substrate to form deposition organic electroluminescent layers onto the substrate, and comprising a vessel...

20060054090 - Pecvd susceptor support construction: An apparatus and method for maintaining or adjusting the orientation of a large area substrate is disclosed by using multiple support plates disposed below a susceptor adapted to support the large area substrate. The multiple support plates are supported by a plurality of support shafts that are coupled to at...

20060054091 - Support system for a treatment apparatus: A system for an apparatus of the type adapted to treat substrates and/or wafers is described and comprises a stationary base element (600) and a movable support (610) for at least one substrate or at least one wafer, the support being rotatable above the element (600) about a stationary axis;...

20060048704 - Apparatus for making abrasive article: The invention provides a method and apparatus for making an abrasive product comprising providing a substantially horizontally deployed flexible backing having a first surface bearing an at least partially cured primer coating and an opposite second surface; providing a dry flowable particle mixture comprising abrasive particles and particulate curable binder...

20060048705 - Process and device for deposition of glue on a cellular surface: A glue film (11) is placed on a cellular structure (10) in order to form a regular glue strip on the edges of the partitions of the cells of this cellular structure (10), and this glue film (11) is heated by a source (24) that emits radiation adapted to reactivity...

20060048707 - Anti-clogging nozzle for semiconductor processing: Techniques of the present invention are directed to reducing clogging of nozzles. In one embodiment, a method of introducing a gas into a semiconductor processing chamber comprises providing a nozzle having a proximal portion connected to a chamber wall or a gas distribution ring of the semiconductor processing chamber and...

20060048706 - Apparatus for manufacturing semiconductor device and method for manufacturing semiconductor device by using the same: In a process for manufacturing a hyperfine semiconductor device, an apparatus for manufacturing a semiconductor device such as a schottky barrier MOSFET and a method for manufacturing the semiconductor device using the same are provided. Two chambers are connected with each other. A cleaning process, a metal layer forming process,...

20060048708 - Coater having interrupted conveyor system: Methods and coaters for applying films onto a substrate (e.g., a large-area glass substrate) are disclosed. Certain embodiments involve a coater for applying thin films onto a sheet-like substrate. The coater in some embodiments has a transport system adapted for conveying the substrate along a path of substrate travel extending...

20060048709 - Plasma processing apparatus: Disclosed herein is a plasma processing apparatus, which generates plasma within a vacuum chamber to process semiconductor substrates using the plasma. The apparatus comprises a substrate mounting table, an outer lifting bar, and a baffle. The outer lifting bar comprises a driving shaft, and a substrate supporting member coupled perpendicular...

20060048710 - Substrate processing apparatus: The substrate processing apparatus according to the present invention is aimed to stably and efficiently perform a deposition process on a substrate W. The substrate processing apparatus supports the substrate W in a position facing a heater portion and thus rotates a holding member holding the substrate W. Furthermore, the...

20060048711 - Systems and methods of forming tantalum silicide layers: A method of forming (and apparatus for forming) tantalum silicide layers (including tantalum silicon nitride layers), which are typically useful as diffusion barrier layers, on a substrate by using a vapor deposition process with a tantalum halide precursor compound, a silicon precursor compound, and an optional nitrogen precursor compound....

20060042543 - Process control using physical modules and virtual modules: The invention relates to controlling a semiconductor processing system. Among other things, the invention relates to a run-to-run controller to create virtual modules to control a multi-pass process performed by a multi-chamber tool during the processing of a semiconductor wafer....

20060042544 - Film formation apparatus and method of using the same: A film formation apparatus for a semiconductor process includes a cleaning gas supply circuit, a concentration measuring section, and an information processor. The cleaning gas supply circuit is configured to supply a cleaning gas into a reaction chamber to perform cleaning of removing from an inner surface of the reaction...

20060042545 - Plasma treatment apparatus, method of producing reaction vessel for plasma generation, and plasma treatment method: A plasma treatment apparatus is provided, which enables to increase a treatment area and provide good treatment uniformity. This apparatus comprises a pair of electrode plates having a plurality of through holes and an insulating plate having a plurality of through holes. The insulating plate is disposed between the electrode...

20060042546 - Plasma processing apparatus and controlling method therefor: A detector detects microwaves reflected from a processing chamber. Based on the reflected microwaves, a load impedance is calculated. An amount of adjustment required to match the load impedance with an impedance of a microwave oscillator is calculated. The calculated amount of adjustment multiplied by a predetermined value smaller than...

20060042547 - Portable microwave plasma discharge unit: A portable microwave plasma discharge unit receives microwaves and a gas flow via a supply line. The portable microwave plasma discharge unit generates plasma from the gas flow and the received microwaves. The portable microwave plasma discharge unit includes a gas flow tube made of a conducting and/or dielectric material...