Coating apparatus inventions 12/05

20050284362 - Apparatus for processing surface of substrate: A substrate surface processing apparatus is provided. In the substrate surface processing apparatus, a spin chuck holds a substrate thereon by suction, spins the substrate, and moves up and down the substrate. An upper bowl and a lower bowl surround the spin chuck for receiving a processing solution by which...

20050284364 - Application device: A device for applying a medium in the form of a liquid or a paste to a moving substrate, the substrate being a surface of a web of paper, a paper board, fibrous material and/or a transfer element including an application chamber, a first element, a second element and at...

20050284365 - Application device: A device for applying a liquid to pasty medium to a moving surface, the moving surface in the case of direct application being the surface of a paper, board or other fibrous web. In the case of indirect application the moving surface being the surface of a transfer element which...

20050284363 - Doctor bed: A doctor bed is provided for holding a circularly cylindrical metering rod, including a housing of a homogenous material, which is designed with a cross section at right angles to the cylinder longitudinal axis of the metering rod and has a circularly cylindrical recess which surrounds the metering rod with...

20050284366 - Systems and methods for building tamper resistant coatings: A system for building a TRC includes a spray mechanism for spraying a coating material, a target system including a rotatable spray-target that retains an object with a surface to be covered by the TRC, a temperature sensor, and a control system for controlling application of the coating material based...

20050284367 - Thermo-stable coating die design method and apparatus: A method of designing and the resulting thermally stable heated coating die apparatus, the die apparatus including a die having a die geometry and a heating system with heaters and temperature sensors. The method and resultant apparatus provides minimized temperature gradients, flat die lip faces in a die to roll...

20050284368 - Apparatus for holding a door to be painted: A method and apparatus to hold a structure such as a door, window frame, shutter and the like is described. In one embodiment, two supporting members are coupled together. The two supporting members may be positioned relative one another to form a rail receiving opening therebetween. The rail receiving opening...

20050284369 - Substrate processing apparatus and substrate processing method which performs predetermined processing on a substrate which is positioned approximately horizontally at a substrate processing position: As a substrate transportation robot transports an unprocessed substrate W to a substrate transfer position P1, inert gas ejected from a substrate floating head 71 toward the bottom surface of the substrate W floats up the unprocessed substrate W. Driven by an actuator 74, the substrate floating head 71 floating...

20050284372 - Chamber component having grooved surface with depressions: A substrate processing chamber component is capable of being exposed to an energized gas in a process chamber. The component has an underlying component structure and a surface on the underlying structure. The surface has a plurality of concentric grooves that are radially spaced apart across the surface, and electron...

20050284371 - Deposition apparatus for providing uniform low-k dielectric: Improvements in a PECVD chamber to provide better uniformity in film thickness and mechanical strength are described. Less contact surface is provided to the outer edge of the wafer and non-uniform gas distribution occurs through adjustments to the gas distribution plate to provide this uniformity....

20050284370 - High rate atomic layer deposition apparatus and method of using: A processing system for performing atomic layer deposition (ALD) including a process chamber, a substrate holder provided within the process chamber, and a gas injection system configured to supply a first process gas and a second process gas to the process chamber. The gas injection system is configured to introduce...

20050284373 - Apparatus for manufacturing a luminescent device using a buffer cassette: The present invention relates to an apparatus for manufacturing a luminescent device using a buffer cassette which stores substrates. An apparatus of manufacturing the luminescent device according to first embodiment of the present invention includes a depositing section, a sealing section, and a buffer cassette. The depositing section deposits a...

20050284374 - Expanded thermal plasma apparatus: Disclosed herein is an assembly for plasma generation comprising a cathode plate comprising a fixed cathode tip, the cathode tip being integral part of the cathode plate. The assembly further comprises at least one cascade plate, at least one separator plate disposed between the cathode plate and the cascade plate,...

20050284375 - Method and apparatus for processing a workpiece: An apparatus for processing a workpiece, such as a semiconductor wafer, includes a rotor for holding workpieces within a process chamber. A gas pressure seal around the shaft of the rotor has a shaft adapter on the shaft and an o-ring providing a seal between the shaft and the shaft...

20050279280 - Coating formulation kit including a catalyst solution dispenser for a hand-held liquid spraying apparatus: P

20050279281 - Substrate processing apparatus: An object of the present invention is to improve the operation efficiency of a substrate processing apparatus while ensuring the safety of an operator who performs maintenance of the apparatus. The present invention is a substrate processing apparatus including a substrate unit capable of housing a substrate and a substrate...

20050279282 - Method and apparatus for processing a semiconductor substrate: In a method of processing a semiconductor substrate, a source gas is primarily excited into a first plasma state having a first energy. The primarily excited source gas is provided to a process chamber. The excited source gas in the process chamber is secondarily excited into a second plasma state...

20050279283 - Method for stabilizing high pressure oxidation of a semiconductor device: A method and apparatus for preventing N2O from becoming super critical during a high pressure oxidation stage within a high pressure oxidation furnace are disclosed. The method and apparatus utilize a catalyst to catalytically disassociate N2O as it enters the high pressure oxidation furnace. This catalyst is used in an...

20050279284 - Temperature control system: An apparatus for controlling the substrate temperature of a substrate during processing of the substrate at a process energy. A chuck temperature input receives temperature measurements from temperature sensors at a substrate chuck, and a temperature set point input receives temperature set points. The temperature set points define a range...

20050279285 - Phosphor sheet manufacturing apparatus: There is provided a stimulable phosphor sheet manufacturing apparatus which forms a stimulable phosphor layer through vacuum evaporation in a vacuum chamber. A substrate is conveyed linearly, evaporation sources are arranged in a direction perpendicular to a direction in which the substrate is conveyed, and/or the apparatus includes the evaporation...

20050274315 - Spin-coating apparatus for use in manufacturing semiconductor devices: Spin-coating apparatus for use in manufacturing a semiconductor device includes a spin-chuck for rotating a wafer or the like, and a baffle plate disposed under the spin chuck to collect and discharge residue spun off of the wafer as the wafer is rotated by the spin chuck. The inner periphery...

20050274316 - Fixing material delivery system for a blocking apparatus: Blocking apparatus and a blocking method allow precise alignment of an axis of a button with an axis of a block for blocking process of lens manufacturing. According to another aspect, the invention provides a blocking apparatus and a blocking method for automatically compensating variations in a button geometry without...

20050274317 - Applicator head, applicator nozzle arrangement, adaptor plate and mounting plate: An apparatus for applying fluid from a fluid source to a substrate. The apparatus comprises a housing configured to receive the fluid from the fluid source, a nozzle arrangement in fluid communication with the housing, and a lever pivotally mounted to the housing for releasably securing the nozzle arrangement thereto....

20050274318 - Strand guide implements or mechanisms for use in connection with material dispensing and coating nozzles: A new and improved strand coating system comprises a strand guide block which serves to properly position and orient a plurality of elongated, parallel strands, which are being respectively conveyed in front of a plurality of the material dispensing nozzles, in such a manner that the plurality of elongated, parallel...

20050274319 - Producing repetitive coatings on a flexible substrate: Apparatus for use in making a device by forming repetitive sequences of coatings on a flexible substrate including defining a path for the flexible substrate; the flexible substrate being disposed about at least a portion of the path; a first deposition source for depositing material located around the path periphery...

20050274320 - Erosion resistant process chamber components: A substrate processing chamber component demonstrates reduced erosion in an energized gas. The component has a ceramic structure composed of aluminum oxide with a surface exposed to the energized gas in the chamber. The erosion of the surface by the energized gas is substantially reduced by erosion resistant properties of...

20050274321 - Plasma processing apparatus and method: A plasma processing apparatus for converting a processing gas into a plasma by a high frequency power in a processing chamber and performing a plasma processing on a substrate mounted on a mounting table includes a ring portion disposed to surround the substrate on the mounting table, and a temperature...

20050274322 - Reactor for producing reactive intermediates for low dielectric constant polymer thin films: A reactor for forming a reactive intermediate for a transport polymerization process is disclosed, wherein the reactor includes an exterior unit having an inlet, an outlet, and an interior disposed between the inlet and the outlet; a heater body located in said interior, wherein the heater body is at least...

20050274323 - Massively parallel atomic layer deposition/chemical vapor deposition system: A method and apparatus for the use of individual vertically stacked ALD or CVD reactors. Individual reactors are independently operable and maintainable. The gas inlet and output are vertically configured with respect to the reactor chamber for generally axi-symmetric process control. The chamber design is modular in which cover and...

20050274324 - Plasma processing apparatus and mounting unit thereof: A parallel plate type plasma processing apparatus including a RF feed rod for applying a high frequency power to a susceptor and a temperature detection unit for detecting the temperature of a substrate on the susceptor is configured to reduce an effect that high frequency current flowing in the RF...

20050274325 - Semiconductor heating apparatus: The present invention provides a semiconductor heating apparatus, in which, when measuring the electrical properties of multiple chips formed on a large size wafer, only one or a several chips are heated uniformly, and the other chips are on standby at a low temperature. The present invention is a semiconductor...

20050268843 - Nozzle for use in rotational casting apparatus: For use in a rotational casting machine used for coating a rotating body with elastomer, such as polyurethane, there is provided a nozzle used for dispensing the liquid polyurethane onto the rotating body to be coated. The nozzle of the invention has a plurality of liquid-flow interior discharge-passageways each of...

20050268844 - Discharge device and discharge method: By means of a fluid material discharge device of simple construction, a technique for fluid material discharge is provided which has few or no inadequate discharge, high productivity, and which enables easy modification and adjustment of the amount of fluid material discharge. The fluid material discharge device comprises a nozzle...

20050268845 - Apparatus and nozzle plate for dispensing liquid material: A nozzle for a liquid dispenser of liquid materials, such as thermoplastic adhesives, including a plurality of liquid passageways coupled in fluid communication with a supply passage of the dispenser. The nozzle includes one or more liquid passageways coupled in fluid communication with the supply passage. Each liquid passageway has...

20050268846 - Apparatus for gluing of veneer sheets: Apparatus for applying glue to veneer sheets comprises elements (6, 7, 8) for transporting veneer sheets (3), supported substantially in a horizontal position, to the gluing, a glue applying device (2) for administering glue onto the veneer traveling under it, as well as elements (9, 10, 11) for directing the...

20050268847 - Selective deposition system and method for initiating deposition at a defined starting surface: A selective deposition system and method for initiating deposition of an unconsolidated material at a defined starting surface are disclosed. The system includes a sensor system for measuring an upper surface of a workpiece and a surface level of the unconsolidated material as deposited on the upper surface of the...

20050268848 - Atomic layer deposition apparatus and process: An atomic layer deposition apparatus for depositing a plurality of ultra-thin layers onto an epitaxial substrate comprises first and second chambers each having an inlet for a gas to be adsorbed on an epitaxial substrate, a transport chamber disposed between the first and second chambers, a loading chamber connected to...

20050268849 - Film forming apparatus and film forming method: An apparatus for forming a film on a wafer comprising, a first coating apparatus coating a foaming insulation film material on the wafer, a second coating apparatus coating a non-porous insulation film material on the wafer, a low oxygen heating temperature regulating process apparatus performing a heating process on the...

20050268850 - Plasma processing system: A plasma processing system includes a plasma processing chamber and a plasma confining portion for defining a plasma confined area in the processing chamber. The plasma confining portion includes a plurality of spaced-apart segments arranged in a structural array. An X-axis control portion is provided for moving the plasma confining...

20050268851 - Method for processing interior of vapor phase deposition apparatus, method for depositing thin film and method for manufacturing semiconductor device: A method for depositing a metal compound film on the wafer by using a vapor phase deposition apparatus 100, comprising: forming a thin film on the wafer in an interior of the vapor phase deposition apparatus 100 by introducing a source gas for the metal compound film containing Hf or...

20050268852 - Vaccum film-forming apparatus: A vacuum film-forming apparatus comprising substrate stages; vacuum chamber-forming containers opposed to the stages; a means for moving the substrate between the stages; and gas-introduction means connected to every containers, wherein one of the stage and the container is ascended or descended towards the other to bring the upper face...

20050268855 - Evaporative deposition with enhanced film uniformity and stoichiometry: A method and apparatus for forming a thermally-evaporated binary (or greater) thin film are disclosed in which the surface area of an evaporation container is effectively increased by using an inert medium added to source materials that are to form the binary (or greater) film. Using this method and apparatus,...

20050268854 - Film forming apparatus and film forming method: To provide a film forming apparatus in which an impurity contained in an organic compound is separated to be removed and a film is formed without decreasing the purity of the purified organic compound, whereby a high-purity organic compound is formed. A film forming apparatus of the present invention includes...

20050268853 - Vapor phase deposition apparatus, method for depositing thin film and method for manufacturing semiconductor device: A vapor phase deposition apparatus 100 for forming a thin film comprising a chamber 1060, a piping unit 120 for supplying a source material of the thin film into the chamber 1060 in a gaseous condition, a vaporizer 202 for vaporizing the source material in a source material container 112...

20050268856 - Reactors, systems and methods for depositing thin films onto microfeature workpieces: A reactor, system including reactors, and methods for depositing thin films on microfeature workpieces comprising a reaction vessel having a chamber, a gas distributor attached to the reaction vessel, a workpiece holder in the chamber, and a side unit in the reaction vessel at a location relative to the gas...

20050268857 - Uniformly compressed process chamber gate seal for semiconductor processing chamber: Techniques for a door system for sealing an opening between two chambers in a semiconductor processing system are described. The opening has at least one angled corner. The door system includes a door, actuator, and sealing member. The door is moveable in the plane and has at least one angled...

20050263066 - Apparatus for electroless deposition of metals onto semiconductor substrates: An electroless deposition system is provided. The system includes a processing mainframe, at least one substrate cleaning station positioned on the mainframe, and an electroless deposition station positioned on the mainframe. The electroless deposition station includes an environmentally controlled processing enclosure, a first processing station configured to clean and activate...

20050263067 - Film forming apparatus, manufacturing management system and method of manufacturing semiconductor devices: A film forming apparatus which forms a film on a substrate by utilizing a chemical solution, including: a correlation data creating unit which creates a correlation data that is related to the quality of a chemical solution, from data that is related to the properties of the chemical solution including...

20050263068 - Lithographic apparatus: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the...

20050263069 - Automatic label canceling system: The design of this machine presents a simple and low cost solution for automatically canceling old labels and barcodes on packages. The unique design enables the machine to be completely independent from the conveying surface by locating labels with image processing and canceling with ink jets or other marking technologies...

20050263071 - Apparatus and system for manufacturing a semiconductor: The present invention provides an apparatus for manufacturing a semiconductor including: a reactor; a substrate holder for supporting a substrate; a primary gas supply unit for supplying a primary gas to the reactor; a secondary gas supply unit for supplying a secondary gas to the reactor; a first plasma generator...

20050263070 - Pressure control and plasma confinement in a plasma processing chamber: A plasma apparatus which includes a vacuum chamber provided with an exhaust port and a chuck assembly disposed inside the vacuum chamber. The plasma apparatus also includes a plasma confinement and pressure control apparatus disposed proximate to the substrate. The plasma confinement and pressure control apparatus includes a plurality of...

20050263072 - Uniformity control for low flow process and chamber to chamber matching: Apparatus and methods for distributing gases into a processing chamber are disclosed. In one embodiment, the apparatus includes a gas distribution plate having a plurality of apertures disposed therethrough and a blocker plate having both a plurality of apertures disposed therethrough and a plurality of feed through passageways disposed therein....

20050263073 - Furnace for heating a wafer and chemical vapor deposition apparatus having the same: A furnace for heating a wafer is provided comprising a process chamber including a space for processing a plurality of wafers. A heating member is disposed in the process chamber which generates a light and heat for heating the wafers. Moreover, a light blocking member is disposed in the process...

20050263075 - Delivery systems for efficient vaporization of precursor source material: A delivery system for vaporizing and delivering vaporized solid and liquid precursor materials at a controlled rate having particular utility for semiconductor manufacturing applications. The system includes a vaporization vessel, a processing tool and a connecting vapor line therebetween, where the system further includes an input flow controller and/or an...

20050263074 - Film formation source, vacuum film formation apparatus, organic el panel and method of manufacturing the same: A film formation source of a vacuum film formation apparatus for forming thin film on the film formation surface of a substrate comprises: a material accommodating unit containing a film formation material; heating means for heating the film formation material contained within the material accommodating unit; a film formation flow...

20050263077 - Adaptive shape substrate support method: The present method features an active compliant pin chuck to hold a substrate, having opposed first and second surfaces, and compensates for non-planarity in one of the surfaces of the substrate. To that end, the method includes creating a point contact on the first surface to generate a change in...

20050263076 - Atomic layer deposition apparatus having improved reactor and sample holder: Provided is an atomic layer deposition (ALD) apparatus that has an improved reactor and sample holder. The apparatus includes a reactor including an upper plate and a lower plate and accommodating a reaction chamber; and a sample holder supporting a sample loaded into the reaction chamber. The upper plate includes...

20050263078 - Drive mechanism for a vacuum treatment apparatus: The invention relates to a drive mechanism for a vacuum treatment apparatus by which substrate holders can be transported around an axis (A-A) from an entrance airlock to an exit airlock. A stationary supporting column (1) is disposed in the center and on it a rotatory drive chamber (6) is...