Cleaning compositions for solid surfaces, auxiliary compositions therefor, or processes of preparing the compositions inventions 04/07

20070093399 - Cleaning, sanitization and regeneration of chromatography media using chlorine dioxide: Disclosed are methods for using chlorine dioxide, e.g., pure chlorine dioxide solutions, for cleaning, regenerating and/or sterilizing chromatographic media. Such methods may be carried out in situ, e.g., without removing the media from a column.... Agent: Lahive & Cockfield, LLP

20070093400 - Dishwashing composition: This invention is related to a process for the controlled release into a cleaning environment of an active ingredient of a detergent or detergent additive composition wherein the cleaning environment, to which the detergent or detergent additive composition has been delivered, is exposed to an electric, magnetic or electromagnetic field... Agent: Andrew N. Parfomak Norris Mclaughlin & Marcus, Pa

20070093401 - Cleaning composition with improved dispensing and cling: A thickened oxidant composition is formulated to be easily and evenly applied to a vertical surface to provide consumer preferred cling to the vertical surface. The composition has a low relaxation constant. The composition is useful in cleaning toilet bowls and other hard surfaces. The composition can be applied in... Agent: The Clorox Company

20070093402 - Bleaching agent particles encapsulated in a water soluble material: The invention relates to encapsulated bleaching agent particles. Said particles consist of a core that contains a bleaching-agent active ingredient and a coating of water-soluble material that at least partially surrounds said core, the core containing peroxocarboxylic acid and the coating material containing polyvinyl alcohol. The particles can be produced... Agent: Paul & Paul

20070093403 - Method for production of enzyme granules and enzyme granules produced thus: A method of producing enzyme granulates, enzyme granulates produced by the method, and the use thereof in formulations is provided, for example, for animal feed, foodstuffs, washing agents, rinsing agents or for pharmaceutical uses. The enzyme granulates have a high relative proportion of active enzyme, particular particle size, good shelf... Agent: Volpe And Koenig, P.C.

20070093404 - Low odor ester-based microemulsions for cleaning hard surfaces: Disclosed is a hard surface cleaning composition employing dibasic esters as a primary solvent in combination with a primary emulsifier, a short-chain cosurfactant, a secondary emulsifier and water. Optional components include a polar solvent and a thickener. The disclosed composition is preferably in the form of an oil continuous microemulsion... Agent: Cognis Corporation Patent Department

20070093406 - Novel cleaning process for masks and mask blanks: This invention includes processes that employ alkaline-based compositions with varying pH values and conductivities for use in surface preparation steps of substrate surfaces, such as quartz, particularly those used for photomask applications. Controlling pH values is an aspect of the invention in quartz surface cleaning, i.e., maintaining a higher pH... Agent: Millen, White, Zelano & Branigan, P.C.

20070093405 - Use of a solution comprising at least one nonionic surfactant: The invention relates firstly to the use of a solution composed of at least one solvent and at least one nonionic surfactant as a carrier system for at least one active substance. The invention secondly provides a composition composed of such a solution with at least one active substance. The... Agent: Nath & Associates

20070093407 - Process of treating fabrics: According to the present invention there is provided a process of treating a fabric with a laundry pretreater composition comprising a peroxycarboxylic acid. More specifically, the process of the present invention comprises the step of mechanically rubbing the laundry pretreater composition into stained parts of a fabric.... Agent: The Procter & Gamble Company Intellectual Property Division

20070093408 - Compositions useful as fabric softeners: Compositions and methods of treating textiles are disclosed. More specifically, stable compositions and methods for softening a wide range of fabrics are disclosed, including 100% cotton and hydrophobic synthetic fabrics, without detrimentally affecting the water absorbency properties of the fabrics. The compositions and methods provide desirable odor control without interfering... Agent: Woodcock Washburn LLP

20070093409 - Fabric care compositions and systems comprising organosilicone microemulsions and methods employing same: Systems, compositions and methods for fabric laundering comprising selected organosilicones which are formulated into microemulsions for improved deposition onto fabrics to provide fabric care benefits.... Agent: The Procter & Gamble Company Intellectual Property Division

20070087948 - Aqueous cleaning composition and method for using same: An aqueous-based composition and method comprising same for removing residues such as without limitation post-ashed and/or post-etched photoresist from a substrate is described herein. In one aspect, there is provided a composition for removing residues comprising: water; at least one selected from a hydroxylamine, a hydroxylamine salt compound, and mixtures... Agent: Air Products And Chemicals, Inc. Patent Department

20070087949 - Aqueous cleaning composition for removing residues and method using same: A composition and method for removing residues such as, without limitation, post etched and/or post ashed photoresist, plasma etching, ashing, and mixtures thereof from a substrate is described herein. In one aspect, there is provided a method for removing residues from a substrate comprising: contacting the substrate with a composition... Agent: Air Products And Chemicals, Inc. Patent Department

20070087950 - Method and system for using a two-phases substrate cleaning compound: Cleaning compounds, apparatus, and methods to remove contaminants from a substrate surface are provided. An exemplary cleaning compound to remove particulate contaminants from a semiconductor substrate surface is provided. The cleaning compound includes a viscous liquid with a viscosity between about 1 cP to about 10,000 cP. The cleaning compound... Agent: Martine Penilla & Gencarella, LLP

20070087951 - Thinner composition for inhibiting photoresist from drying: A thinner composition prevents photoresist from drying at the tip of a photoresist spraying nozzle during a semiconductor process. When the spraying nozzle is not used, the thinner composition that includes two or more solvents having a different volatility, specifically a mixture solvent including a first solvent consisting of an... Agent: Marshall, Gerstein & Borun LLP

20070087952 - Floor stripper/cleaner containing aliphatic acid-organic base pair: Floor finishes are stripped or deep scrubbed using a floor stripper/cleaner composition containing sparingly water-soluble floor finish solvent, water, C10 aliphatic acid in an amount sufficient to provide a homogenous aqueous liquid phase during shaking, and sufficient organic amine so that the composition pH is more than 2 and less... Agent: Ann Kulprathipanja Kinney & Lange, P.A.

20070087953 - Photocatalytic composition: Cleaning compositions including a photocatalytic material and a sensitiser employ a photocatalytic material and a sensitiser at a locus, for example on a surface. The residue combats soils and/or undesired microorganisms at the locus. The photocatalytic material is peroxo modified titania, preferably in its anatase form, or peroxo modified titanic... Agent: Andrew N. Parfomak Norris Mclaughlin & Marcus Pa

20070087954 - Liquid detergent formulation with hydrogen peroxide: A stabilized basic aqueous liquid detergent composition is disclosed. The composition comprises hydrogen peroxide, a hydrogen peroxide stabilizer or a mixture of hydrogen peroxide stabilizers, an anionic surfactant or mixture of anionic surfactants, a non-ionic surfactant or mixture of anionic surfactants, and a builder or a mixture of builders. The... Agent: Arkema Inc. Patent Department - 26th Floor

20070087955 - Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent: A cleaning system that utilizes an organic cleaning solvent and pressurized fluid solvent is disclosed. The system has no conventional evaporative hot air drying cycle. Instead, the system utilizes the solubility of the organic solvent in pressurized fluid solvent as well as the physical properties of pressurized fluid solvent. After... Agent: Howrey LLP

20070082829 - Microcapsule and method of producing same: A microcapsule which is able to stably retain a benefit agent such as a volatile substance for an extended period, and which is also suitable for encapsulating fragrances and the like. Such capsule encapsulates a mixture comprising a volatile substance, and an additive that has a higher melting point than... Agent: Dinsmore & Shohl, LLP

20070082830 - Heterogeneous cleaning composition and methods: The present invention relates to heterogeneous cleaning compositions, methods employing them, and methods of making them.... Agent: Ecolab Inc.

20070082831 - Use of copolymers, containing alkylene oxide units, as deposit inhibitor additives in the rinsing process of a dishwasher: e

20070082832 - Enzymatic production of peracids from carboxylic acid ester substrates using non-heme haloperoxidases: A process is provided for producing peroxycarboxylic acids from carboxylic acid esters. More specifically, carboxylic acid esters are reacted in situ with an inorganic peroxide in the presence of a non-heme haloperoxidase having perhydrolysis activity to produce peroxycarboxylic acids.... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center

20070082833 - Low cost and low dishing slurry for polysilicon cmp: Methods and compositions are provided for planarizing substrate surfaces with low dishing. Aspects of the invention provide methods of using compositions comprising an abrasive selected from the group consisting of alumina and ceria and a surfactant for chemical mechanical planarization of substrates to remove polysilicon.... Agent: Patterson & Sheridan, LLP

20070082834 - Microemulsions containing alkoxylated amine carboxylates: The compositions of this invention are microemulsions having a. a surfactant consisting essentially of a mixture of one or more alkoxylated amines or alkoxylated quaternary ammonium salts and one or more preferably branched carboxylic acids or salts thereof, b. a solvent or oil that is liquid at 25° C. and... Agent: Alice P. Hudson

20070082835 - Use of polymers containing polyvinylamine and polyvinylamide in order to prevent smell in dishwashers: e

20070082836 - Mixture of surface-active compounds for use in cleaning preparations:

20070078071 - Spray dry capsule products and methods for preparing and using same: The present invention relates to spray-dried compositions comprising encapsulated active materials and a spray-dry carrier, to methods for imparting an effective amount of active materials to spray-dried products and to products incorporating the spray-dried compositions.... Agent: International Flavors & Fragrances Inc.

20070078074 - Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials: A composition for removing resists and etching residue from substrates containing at least one nucleophilic amine compound having oxidation and reduction potentials, at least one organic solvent, water and, optionally, a chelating agent is described. The chelating agent is preferred to be included since it provides added stability and activity... Agent: Morgan Lewis & Bockius LLP

20070078072 - Photoresist stripping solution: Disclosed is a photoresist stripping solution consisting essentially of (a) a quaternary ammonium hydroxide (e.g., tetramethylammonium hydroxide), (b) at least one water-soluble organic solvent selected from glycols and glycol ethers (e.g., propylene glycol, ethylene glycol, diethylene glycol monobutyl ether), and (c) a non-amine water-soluble organic solvent (e.g., dimethyl sulfoxide, N-methyl-2-pyrrolidone).... Agent: Wenderoth, Lind & Ponack, L.L.P.

20070078073 - Stripper: Compositions and methods useful for the removal of polymeric material and copper oxide from substrates, such as electronic devices are provided. These compositions and methods are particularly suitable for removing polymer residues from electronic devices following plasma etch processes.... Agent: Rohm And Haas Electronic Materials LLC

20070078075 - Method for producing alkylaryl compounds and alklaryl sulphonates: In a process for preparing alkylaryl compounds by reacting a C10-14-monoolefin mixture with an aromatic hydrocarbon in the presence of an alkylation catalyst to form alkyl aromatic compounds and if appropriate subsequently sulfonating and neutralizing the resulting alkylaryl compounds, in the C10-14-monoolefins, on average, more than 0% and up to... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.