|Cleaning and liquid contact with solids patents - Monitor Patents|
USPTO Class 134 | Browse by Industry: Previous - Next | All
Recent | 15: May | Apr | Mar | Feb | Jan | 14: Dec | Nov | Oct | Sep | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan | 13: Dec | Nov | Oct | Sep | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan | 12: Dec | Nov | Oct | Sep | Aug | July | June | May | April | Mar | Feb | Jan | 11: Dec | Nov | Oct | Sep | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan | 10: Dec | Nov | Oct | Sep | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan | | 09: Dec | Nov | Oct | Sep | Aug | Jl | Jn | May | Apr | Mar | Fb | Jn | | 2008 | 2007 |
Cleaning and liquid contact with solidsBelow are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 06/11/2015 > patent applications in patent subcategories.
06/04/2015 > patent applications in patent subcategories.
05/28/2015 > 12 patent applications in 10 patent subcategories.
20150144153 - Ultraviolet light based cleansing method and cleansing device: The present invention provides an ultraviolet light based cleansing method and cleansing device. The method includes: (1) irradiating a substrate to be cleansed with ultraviolet light and controlling output energy of the ultraviolet light in order to control photon energy received by TFT component patterns formed on the substrate to... Agent:
20150144154 - Method for in-situ chamber clean using carbon monoxide (co) gas utlized in an etch processing chamber: Embodiments of the disclosure generally relate to methods of removing etch by-products from the plasma processing chamber using carbon monoxide or carbon dioxide. In one embodiment, a method for dry cleaning a processing chamber includes exposing a chamber component disposed within the processing chamber in absence of a substrate disposed... Agent:
20150144155 - Method for high aspect ratio photoresist removal in pure reducing plasma: A method for removing photoresist, an oxidation layer, or both from a semiconductor substrate is disclosed. The method includes placing a substrate in a processing chamber, the processing chamber separate from a plasma chamber for generating a non-oxidizing plasma to be used in treating the substrate; generating a first non-oxidizing... Agent:
20150144157 - Method of cleaning residue from a surface using a high efficiency disposable cellulosic wiper: A method of cleaning residue from a surface includes providing a disposable cellulosic wiper including a percentage by weight of pulp-derived papermaking fibers, and a percentage by weight of regenerated independent cellulosic microfibers having a number average diameter of less than about 2 microns and a characteristic Canadian Standard Freeness... Agent:
20150144158 - Method of cleaning residue from a surface using a high efficiency disposable cellulosic wiper: A method of cleaning residue from a surface includes providing a disposable cellulosic wiper including a percentage by weight of pulp-derived papermaking fibers, and a percentage by weight of regenerated independent cellulosic microfibers having a number average diameter of less than about 2 microns and a characteristic Canadian Standard Freeness... Agent:
20150144156 - Systems, vehicles, and methods for maintaining rail-based arrays of photovoltaic modules: A system includes an elongated rail including support surfaces and a mounting surface disposed between the support surfaces. Photovoltaic modules can be coupled to the mounting surface and raised relative to the support surfaces. A first maintenance vehicle can include a cleaning head, actuator, motor, and support legs. The support... Agent:
20150144159 - Mechanisms for wafer cleaning: Embodiments that relate to mechanisms for cleaning wafers is provided. A method for wafer cleaning includes cleaning wafers by a wet-bench cleaning operation. The method also includes thereafter cleaning each of the wafers by a single-wafer cleaning operation. In addition, a cleaning apparatus for enhancing the performance of the above... Agent: Taiwan Semiconductor Manufacturing Co., Ltd.
20150144160 - Etchant, preparation thereof and method of using the same in the cleaning process: The present invention provides an etchant which is a reaction product of sulfuric acid and ammonium persulfate, wherein the concentration of the ammonium persulfate is 1˜25%, the concentration of the sulfuric acid is 98%. The etchant is produced by adding the ammonium persulfate into the sulfuric acid at a temperature... Agent:
20150144161 - Dispensing apparatus and dispensing method: A dispensing method is disclosed that includes the following steps: a cleaning sleeve is provided to surround a spray member. A first fluid is previously dispensed from a first fluid outlet of the spray member. A second fluid is sprayed from a second fluid outlet of the cleaning sleeve to... Agent: Taiwan Semiconductor Manufacturing Co., Ltd.
20150144162 - Synthesis and antiscalant behavior of a novel polyzwitterionic acid: A zwitterionic monomer and corresponding cyclopolymerized polyzwitterion (±) (PZ) containing, on each repeating unit, both phosphonate and sulfonate functionalities. Phosphonate ester hydrolysis in PZ gave a pH-responsive polyzwitterionic acid (±) (PZA). The PZA under pH-induced transformation was converted into polyzwitterion/anion (±−) (PZAN) and polyzwitterion/dianion (±=) (PZDAN).... Agent: King Fahd University Petroleum And Minerals
20150144163 - Automatic tonometer tip disinfection apparatus: A tonometer tip disinfection apparatus for disinfecting and rinsing a tonometer tip includes a first basin configured to hold a disinfecting solution, a second basin configured to hold a rinsing solution, a holding platform configured to receive at least one tonometer tip, a tonometer tip support arm configured to support... Agent:
20150144164 - Substrate cleaning apparatus and substrate processing apparatus: A substrate cleaning apparatus capable of removing particles that exist in minute recesses formed on a substrate surface is disclosed. The substrate cleaning apparatus includes a substrate holder configured to hold a substrate; and a two-fluid nozzle configured to deliver a two-fluid jet onto a surface of the substrate. The... Agent:05/21/2015 > 20 patent applications in 15 patent subcategories.
20150136170 - Method for removing adhesive agent: A method for removing an adhesive agent from a base plate with a plurality of accessories installed adjacent to the adhesive agent includes certain steps. The steps form a protection layer on the base plate, and the protection layer completely covers the electronic members and completely or partially covers the... Agent:
20150136171 - Liquid or vapor injection plasma ashing systems and methods: A plasma ashing system includes a process chamber including a substrate. A carrier gas supply supplies a carrier gas to the processing chamber. A plasma source is configured to create plasma to the process chamber. A liquid injection source is configured to at least one of inject a compound into... Agent: Lam Research Corporation
20150136172 - Phase plate for a transmission electron microscope: The present invention relates to a method for cleaning a phase plate (1) for a transmission electron microscope wherein said phase plate is etched before being irradiated for the first time in the TEM, and is then held in an ultra-pure holding atmosphere until the irradiation in the TEM.... Agent: Fei Company
20150136173 - Process and apparatus for cleaning imprinting molds, and process for manufacturing imprinting molds: The cleaning process of cleaning an imprinting mold including a release layer coupled via siloxane bonds to a substrate of that release layer includes a first cleaning step and a second cleaning step. In the first cleaning step, the angle of contact of the surface of the release layer with... Agent: Dai Nippon Printing Co., Ltd.
20150136177 - Cleaning glove: A cleaning glove is provided. The cleaning glove is made of leather and may be tanned. The cleaning glove includes an outside surface and an inside surface. The inside surface is formed to receive a hand of a user. The body portion may further include a first side forming a... Agent:
20150136174 - Combination cleaning tool with flexible head: A new combination cleaning tool construction wherein the same can be utilized for cleaning surfaces, in particular, glass surfaces such as windshields. In particular the invention described herein provides a new combination cleaning tool construction wherein the same can be utilized for cleaning surfaces, in particular, glass surfaces such as... Agent:
20150136175 - Hair brush cover: A hair brush cover for use in covering the bristles of a hair brush having bristles and a handle, the hair brush cover having a net component with a closed end and an open end. An elastic band is adapted around the open end. The open end of the net... Agent:
20150136176 - Power/water supply and reclamation tank for cleaning devices, and associated systems and methods: A portable power and water supply for hard surface or carpet cleaners is disclosed. The portable power and water supply can include a portable platform with a fresh/waste water tank and two or more power connectors that can be coupled to separate power sources. The fresh/waste water tank can have... Agent:
20150136178 - Bucket cleaning apparatus and method of use thereof: A bucket cleaning apparatus is provided. The bucket cleaning apparatus includes a frame. One or more primary support members is coupled individually to the frame. A corresponding secondary support member is coupled to each primary support member. A scraper is coupled to one or more of each of the primary... Agent:
20150136179 - Optimized dosing procedure for a washing machine: The present invention relates to a method of controlling a dispenser for dosing a product in a washing machine leading to an optimized dosing result, a dispenser controller programmed with an algorithm to execute the method of the present invention as well as to the use of said dispenser for... Agent: Ecolab Usa Inc.
20150136180 - Assembly for engaging and activating a bargun during cleaning operation: The invention concerns an assembly (1) for engaging and activating a bargun (2), the bargun having a handle (21) with at least one button (22, 23) on its upper surface (24) and a nozzle (25) perpendicular to the handle, the assembly comprising:—a draining body (11) presenting:. an opening (111) for... Agent:
20150136181 - Rack for receiving dishes, to be inserted into a dishwasher: A rack for receiving dishes, intended to be inserted into a dishwasher, including a frame delimiting an upper area and a lower area between which a support grid for supporting the dishes is arranged. The upper area including receptacles for receiving the dishes and the lower area is equipped with... Agent:
20150136189 - Sliding spray arm assembly for a dishwashing appliance: A dishwashing appliance is provided having a spray arm assembly with one or more sliding spray arms. The spray arms can slide linearly, back and forth, along either a transverse or lateral direction of a wash chamber of the appliance. The spray arms are precluded from rotating relative to the... Agent: General Electric Company
20150136182 - Continuous-type apparatus for surface treatment of workpieces: Disclosed is a continuous type apparatus for surface treatment of workpieces, comprising at least a surface treating bath, a rinsing bath installed on a lifting stage in a production line, a transfer all assembly, and a plurality of water storage tanks out of the production line. The transfer rail assembly... Agent: Round Elegant Enterprise Co., Ltd.
20150136183 - System of controlling treatment liquid dispense for spinning substrates: Provided is a method for cleaning an ion implanted resist layer or a substrate after an ashing process. A duty cycle for turning on and turning off flows of a treatment liquid in two or more nozzles is generated. The substrate is exposed to the treatment liquid comprising a first... Agent:
20150136184 - Apparatus for cleaning and sterilizing interior of shoe: Provided is an apparatus for cleaning and sterilizing an interior of a shoe which generates ultrasonic wind of a whirlwind type in the interior of the shoe to remove foreign substances from the interior of the shoe and which injects ultra fine particles of germicide solution into the interior of... Agent:
20150136185 - Apparatus of cleaning substrate: Provided is a substrate cleaning apparatus of cleaning a substrate. The substrate cleaning apparatus includes a cleaning chamber, a first cleaning nozzle, a cover member, an air flow generation unit, and an exhaust unit. The main cleaning chamber has a cleaning space in which the substrate is cleaned and includes... Agent:
20150136186 - System for processing substrates with two or more ultraviolet light sources that provide different wavelengths of light: Systems for cleaning substrates including cleaning of semiconductor substrates, use atmospheric or sub-atmospheric ultraviolet (UV) light to improve selectivity of conventional wet chemical cleaning in the manufacture of semiconductor devices. The UV light systems are configured to improve front-end-of-line (FEOL) (e.g., non-metal) or back-end-of-line (BEOL) (e.g., metal) removal of etch... Agent:
20150136187 - Dishwasher: A dishwasher having a tub defining a wash chamber, a dish rack located within the wash chamber, and pump assembly for recirculating wash liquid is further provided with a spray assembly and a spray manifold with multiple nozzles each having at least one aperture emitting wash liquid into the wash... Agent:
20150136188 - Pump device for dishwasher appliance: Dishwasher appliances are provided. A pump device of a dishwasher appliance may include a first centrifugal pump in fluid communication with a drain and a second centrifugal pump in fluid communication with a fluid circulation assembly. The pump device further includes a motor, the motor including a driveshaft, the driveshaft... Agent: General Electric CompanyPrevious industry: Toilet
Next industry: Tent, canopy, umbrella, or cane
RSS FEED for 20150611:
Integrate FreshPatents.com into your RSS reader/aggregator or website to track weekly updates.
For more info, read this article.
Thank you for viewing Cleaning and liquid contact with solids patents on the FreshPatents.com website. These are patent applications which have been filed in the United States. There are a variety ways to browse Cleaning and liquid contact with solids patent applications on our website including browsing by date, agent, inventor, and industry. If you are interested in receiving occasional emails regarding Cleaning and liquid contact with solids patents we recommend signing up for free keyword monitoring by email.
Advertise on FreshPatents.com - Rates & Info
FreshPatents.com Support - Terms & Conditions
Results in 0.03872 seconds