|Cleaning and liquid contact with solids patents - Monitor Patents|
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Cleaning and liquid contact with solidsBelow are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 12/04/2014 > 30 patent applications in 21 patent subcategories.
20140352716 - Dry etching method, dry etching apparatus, metal film, and device including the metal film: In a dry etching method for etching a metal film formed on a substrate by use of etching gas containing β-diketone, the metal film contains at least one metal material that forms a penta- or hexa-coordinated complex structure with β-diketone; the etching gas containing β-diketone contains at least one additive... Agent: Central Glass Company, Limited
20140352717 - Method for decomposing an oxide layer: The invention relates to a method for decomposing an oxide layer containing chromium, iron, nickel, and radionuclides by means of an aqueous oxidative decontamination solution, which contains permanganic acid and a mineral acid and which flows in a circuit (K1), wherein the oxidative decontamination solution is set to a pH... Agent:
20140352720 - Low voc content waterless cleaner and article impregnated therewith: An article is provided including composition of 0.5 to 15 total weight percent of a surfactant. The surfactant is a non-ionic surfactant, an anionic surfactant, or a combination thereof. The composition also includes 0.01 to 35 total weight percent of solvent including a microemulsion, a carboxylic acid ester based ketal... Agent:
20140352718 - Tile sponge: A tile sponge is provided for cleaning the space between adjacent tiles in the installation of all tile applications. The tile sponge has an elongated flange comprised of a flexible material such as rubber that extends outwardly a predetermined distance intermediate the sponge absorbing material. The flange is sized so... Agent:
20140352719 - Toothbrush with gripping handle: A toothbrush with secure grip and a method for brushing teeth are disclose, including picking up a toothbrush below the neck portion, a toothbrush head extending from one end of the neck portion, a round/octagon/oval shaped handle, and a grip handle extending from the other end of the neck portion,... Agent:
20140352721 - Liquid cleaning and/or cleansing composition: A liquid cleaning and/or cleansing composition comprising abrasive cleaning foam particles derived from grinding a foam structure, wherein said abrasive cleaning foam particles comprise a thermoplastic material having a raw material density of greater than 1.15, and the foam having a coefficient of expansion of from 8 to 14.... Agent: The Procter & Gamble Company
20140352722 - Liquid cleaning and/or cleansing composition: A liquid cleaning and/or cleansing composition comprising abrasive cleaning foam particles, wherein said abrasive cleaning foam particles comprise a biodegradable thermoplastic material and have a packing density of from greater than 100 kg/m3 to less than 250 kg/m3, and wherein the abrasive cleaning foam particles have a biodegradable rate of... Agent: The Procter & Gamble Company
20140352723 - Liquid cleaning composition with abrasives: A liquid cleaning and/or cleansing composition comprising abrasive cleaning particles; one or more surfactants selected from the group consisting of anionic, nonionic, cationic, amphoteric and mixtures thereof; and a first acidic component wherein said acidic component consists of one or more chelating acids; wherein at least one nonionic surfactant is... Agent: The Procter & Gamble Company
20140352724 - Apparatus and method for cleaning microsurgical instruments: A cleaning apparatus for microsurgical instruments of the type having screw-type mechanisms used to advance or retract a plunger has a hollow sleeve into which the injector is liquid-tightly inserted, the sleeve being configured to hold the plunger in a fixed position when the plunger is disengaged from the injector... Agent:
20140352725 - Convertible wiping device: A wiping device including a resilient body having a wiping surface. A support member is convertible between a first shape defined by a first center line of the support member and a second shape defined by a second center line of the support member. The support member is disposed relative... Agent: Baker Hughes Incorporated
20140352726 - Liquid processing apparatus and liquid processing method: A liquid processing apparatus includes a substrate retaining part that retains a substrate in a horizontal position and rotates the substrate, first and second processing liquid supply nozzles disposed to supply first and second processing liquids, respectively, to the substrate, liquid receiving cups disposed to appropriately position an upper end... Agent:
20140352727 - Dry steam cleaning a surface: A device and method for cleaning a surface using dry steam is disclosed. A dry steam wand is fitted with a custom nozzle that permits the dry steam to be angled to clean difficult to access surfaces of a gas turbine. The nozzle includes a slit that is configured to... Agent:
20140352728 - Method for monitoring the operation of a liquid food processing system: A method for monitoring the operation of a liquid food processing system is provided. The method comprises the steps of initiating a fluid flow through at least one section of said food processing system; and determining a pressure difference across said at least one section during said fluid flow for... Agent:
20140352729 - Stormwater vault apparatus and servicing process: A stormwater vault and a process for servicing the stormwater vault speeds the process of cleaning a stormwater vault. The stormwater vault has a built in liquefaction system for liquefying settled debris in the vault which works together with a sloped or angled floor in the vault. The settled debris... Agent:
20140352730 - Substrate processing apparatus and nozzle cleaning method: A substrate processing apparatus according to the present disclosure includes first and second nozzles that eject a processing liquid to a substrate; a moving mechanism that moves the first and second nozzles; and a nozzle cleaning device that cleans at least the second nozzle. The nozzle cleaning device includes a... Agent: Tokyo Electron Limited
20140352731 - Surface cleaners and methods for using the same: A cleaning composition suitable for removing soil from a variety of surfaces and a method of using the same are provided. Cleaning compositions according to embodiments of the present invention include at least one carbonate ester, including, for example, ethylene carbonate, propylene carbonate, trimethylene carbonate, and combinations thereof. Depending on... Agent:
20140352732 - Solids removal apparatus: An apparatus for cleaning a vessel, the apparatus comprising: a housing (1) having an inlet (27) for receiving a pressurised fluid and an outlet (2) for fluidly connecting the housing to the vessel; a cleaning apparatus arranged to spray pressurised fluid inside the vessel; an outlet for fluid returning from... Agent: National Oilwell Varco, L.p.
20140352734 - Method for cleaning chlorine membrane electrochemical cell: The present disclosure provides a method for cleaning a chlorine membrane electrochemical cell.... Agent: Dow Global Technologies LLC
20140352733 - Method for creating positive hardness gradient in ionomer core and golf ball: A hollow golf ball center defined by an intermediate layer including a thermoplastic ionomer resin neutralized at least about 40% with a metal cation is filled with an alcohol having up to three carbon atoms or an aqueous alcohol solution to create a hardness gradient in the intermediate layer. The... Agent:
20140352736 - Cleaning apparatus and cleaning method, coater/developer and coating and developing method, and computer readable storing medium: A cleaning apparatus includes a first substrate-holding portion configured to hold a first area of a back surface of the substrate so that the top surface is kept face up; a second substrate-holding portion configured to hold a second area of the back surface of the substrate, the second area... Agent: Tokyo Electron Limited
20140352735 - Zero lag dispense apparatus: A wafer cleaning method includes dispensing liquid chemicals at two flow rates to start a chemical reaction, with the second flow rate being lower than the first. The method also includes dispensing liquid waters at two flow rates to stop a chemical reaction, with the second flow rate being lower... Agent: Beijing Sevenstar Electronics Co. Ltd.
20140352737 - Substrate cleaning apparatus, substrate cleaning method and non-transitory storage medium: A cleaning liquid and a gas are discharged in sequence to a central portion of a substrate while the substrate is being rotated, and after nozzles that discharge them are moved to a peripheral edge side of the substrate, discharge of the cleaning liquid is switched to a second cleaning... Agent: Tokyo Electron Limited
20140352738 - Zero lag dispense apparatus: A liquid dispenser for a wafer processing system includes a supply tube with an inlet at one end and an outlet at the other end. Attached to the supply tube at the outlet end is a liquid reservoir. The liquid reservoir has a dispensing plate that has an outlet for... Agent: Beijing Sevenstar Electronics Co. Ltd.
20140352740 - Label removal solution for low temperature and low alkaline conditions: According to the invention, the compositions and methods provide for the complete removal of synthetic glues or adhesives from a plurality of surfaces through the use of amide solvents in combination with surfactants, chelants, acidulants and/or additional bottle wash additives. Beneficially, the compositions and methods are suitable for use at... Agent:
20140352739 - Non-amine post-cmp composition and method of use: A cleaning composition and process for cleaning post-chemical mechanical polishing (CMP) residue and contaminants from a microelectronic device having said residue and contaminants thereon. The cleaning compositions are substantially devoid of amine and ammonium-containing compounds, e.g., quaternary ammonium bases. The composition achieves highly efficacious cleaning of the post-CMP residue and... Agent:
20140352744 - Washing device: A washing device is provided which reduces a load on a user while ensuring favorable operability and safety. An opening/closing door (2) includes, at a front surface thereof, a control panel (3) which includes at least a setting portion (4) and a display portion (5), a handle portion (8) for... Agent: Saraya Co., Ltd.
20140352745 - Cleaning and disinfecting device: The invention relates to a cleaning and disinfecting device (10). The cleaning and disinfecting device (10) comprises a wash chamber (12), which is closed by a wash chamber door (14) and which can be actuated by means of a drive (26). A pivoting path or a pivoting area (24) of... Agent: Meiko Maschinenbau Gmbh & Co. Kg
20140352741 - Liquid treatment apparatus: In one embodiment, a clean gas supply mechanism includes a supply path having an upstream end provided with a gas intake port, and a downstream end connected to a treatment chamber. The supply path is provided therein with a fan, and a filter disposed upstream of the fan. A return... Agent: Tokyo Electron Limited
20140352742 - Substrate processing apparatus: A substrate processing apparatus has a cup part for receiving processing liquid such as pure water which is splashed from a substrate. The cup part is formed of electrical insulation material or semiconductor material. Hydrophilic treatment may be performed on an outer annular surface of the cup part and water... Agent: Dainippon Screen Mfg. Co., Ltd.
20140352743 - Dishwasher with controlled rotation of lower spray arm: An automatic dishwasher having first and second sprayers located within a washtub, a diverter valve to selectively divert liquid flowing from the wash chamber between the first and second sprayers, and a drive system moving the first sprayer in the wash chamber.... Agent: Whirlpool Corporation11/27/2014 > 15 patent applications in 13 patent subcategories.
20140345645 - Copper residue chamber clean: Methods of removing copper residue from interior surfaces of an etch process chamber are described. A plasma treatment using halogen-containing precursors transforms the copper residue into halogen-copper complexes. Plasma-excited inert gases are used to desorb the halogen-copper complexes. In this way, the copper residue is removed from the interior surfaces... Agent: Applied Materials, Inc.
20140345644 - Method for cleaning reaction chamber using pre-cleaning process: A method for cleaning a reaction chamber is conducted after depositing an oxide, nitride, or oxynitride film on a substrate in a reaction chamber having interior surfaces on which oxide, nitride, or oxynitride is accumulated as a result of the deposition, said oxide, nitride, or oxynitride being selected from the... Agent:
20140345646 - Apparatus and method for cleaning photomask: This invention relates to an apparatus and method for cleaning a photomask. This apparatus, suitable for use in removing an adhesive residue from a photomask, includes a photomask disposed such that a surface thereof on which an adhesive residue is left behind is directed downwards, a metal plate formed adjacent... Agent: Ap Systems Inc.
20140345647 - Tongue brush with powered roller: A tongue cleaner tool comprises a handle with an actuator therein and a rotatable roller or brush near one end of the handle that is driven by the actuator. The rotatable brush has soft protrusions, as knobs or bristles, to gently massage and clean the tongue as the brush is... Agent:
20140345648 - Oral healthcare, products and methods therefor: The present invention relates to oral health. In particular, though not solely, the present invention is directed to products and methods for use by a consumer on a regular basis to maintain and improve their oral health as part of their oral health care program.... Agent: Ozospa Holdings Limited
20140345649 - System and method for remediating highly contaminated fine soil using multiple micro hydrocyclone: The present invention relates to a system for remediating highly contaminated fine soil using multiple micro hydrocyclones that includes: a mill adapted to mix contaminated soil with water and to individualize the soil; a screen adapted to separate the soil introduced from the mill into soil having given particle sizes;... Agent: Hyundai Engineering & Construction Co., Ltd.
20140345650 - Debris collecting system: A debris collecting system comprises a debris collecting assembly including an air-flow generating device and a debris body. The system further comprises an intermediate debris collecting container connected to the debris collecting assembly such that the collected debris is by-passing the debris body of the assembly.... Agent:
20140345651 - Water deluge system cleaning apparatus and method: A water deluge system cleaning apparatus and method of cleaning a water deluge system which does not require the water deluge system to be offline while it is being cleaned. This is achieved by a packing device that provides an annular seal within the water deluge system, and a cleaning... Agent: Paradigm Flow Services Limited
20140345652 - Hot beverage maker with cleaning apparatus and related method: A hot beverage maker is provided with a removable pump for cleaning a brewing needle. The pump fits into a brewing chamber which normally receives a pod of an infusible beverage material. A pod receptacle and a lid pivotally connected to the housing form the brewing chamber, After a brewing... Agent: Sunbeam Products, Inc.
20140345653 - Device and method for cleaning containers: A device for cleaning containers, such as for cleaning returnable bottles in a beverage filling plant, comprises a main treatment area, in which the containers are treated by means of a main lye, and a post-treatment area, in which the containers are treated with a water bath or post-lye bath... Agent: Krones Ag
20140345658 - Substrate processing apparatus: A substrate processing apparatus 1 includes a substrate processing unit 40 configured to process a substrate W by supplying a mixed liquid M of a first liquid C and a second liquid D to the substrate W, a first flow rate regulator 10 disposed in a first supply pipe 31... Agent: Ebara Corporation
20140345654 - Nozzle assembly and dishwasher having the same: A nozzle assembly and a dishwasher having the same. The dishwasher includes a main body, a wash tub, and at least one first nozzle assembly to wash the objects received in the wash tub. The first nozzle assembly includes a main nozzle configured to be rotatable about a rotation axis... Agent: Samsung Electronics Co., Ltd.
20140345655 - Dishwasher: Disclosed herein is a dishwasher including a spray unit fixed to one sidewall of a wash tub and a reflecting plate assembly to reflect wash water sprayed from the spray unit onto dishes and to linearly reciprocate in a spray direction of the wash water sprayed from the spray unit.... Agent: Samsung Electronics Co., Ltd.
20140345657 - Foreign material removing device of track turnout portion: There is provided a foreign material removing device of a track turnout portion which can tightly attach and fix nozzles to a rail belly portion stably without machining a rail itself. A foreign material removing device of a track turnout portion which has point rails which can move to contact... Agent:
20140345656 - Roller assembly and roll-to-roll system including the same: Disclosed is a roller assembly, including a roller body portion and a first spray portion provided in the roller body portion to spray a first fluid onto a surface of a transfer member. The roller body portion and the first spray portion are configured to form an angle between the... Agent: Samsung Display Co., Ltd.11/20/2014 > 14 patent applications in 10 patent subcategories.
20140338696 - Process for dissolving an oxide layer: The invention relates to a process for dissolving a chromium, iron, nickel, zinc and radionuclides containing oxide layer, in particular for breaking down oxide layers deposited on inner surfaces of systems and components of a nuclear power plant, by means of an aqueous decontamination solution containing methanesulfonic acid, which flows... Agent:
20140338700 - Child wiping assist apparatus and method: An apparatus for assisting with wiping a child includes a stabilized base configured to sit on a horizontal surface and a first handle coupled to the stabilized base. The first handle is positioned such that a child bending over and grabbing the first handle with both hands opens the child's... Agent:
20140338699 - Marine geophysical equipment cleaner: Techniques are disclosed relating to an apparatus with scraping members for cleaning a geophysical equipment (e.g., a streamer) being towed behind a survey vessel. The apparatus may, in one embodiment, include a housing and a plurality of scraping members that are disposed at least partially outside of the housing. In... Agent: Pgs Geophysical As
20140338697 - Mitter wringer: A handheld mitter wringer tool is provided for cleansing build-up from hanging mitters. For example, one can expel build-up from a mitter, which is secured at one end to a fixed structure, by indenting the mitter between two non-cutting surfaces that extend across the width of the mitter, while moving... Agent: Connecticut Carwash, LLC
20140338698 - Working surface cleaning system and method: A cleaning film designed to remove foreign matter and particulates from working surfaces of cleaning wafers used in semiconductor processes. These processes include wafer sort test for cleaning of probe card pins and FEOL tooling for cleaning during wafer handling equipment and wafer chucks. The debris collected on the cleaning... Agent: International Test Solutions, Inc.
20140338701 - Vibratory firearm barrel cleaning tool: The vibratory firearm barrel cleaning tool of this invention is a device to clean firearm barrels more thoroughly, quickly and efficiently than that with prior art devices. It employs the conventional cleaning rod, brush and cleaning fluid, but is powered by a vibratory source on the cleaning rod to more... Agent:
20140338702 - Use of chemically patterned substrate for liquid handling, chemical and biological reactions: A device for washing an array plate having an array of liquid droplets adhered thereto is described. The array of liquid droplets is covered with a hydrophobic medium immiscible with the array of liquid droplets. The device includes a mechanism for draining the hydrophobic medium from the array plate; a... Agent:
20140338703 - Cleaning composition for the food and beverage industry: An aqueous cleaning composition and methods for use in the agricultural, food and beverage industry which comprises at least 3% of hydrogen peroxide and a plurality of non-ionic surfactants, wherein said cleaning composition is substantially free of any alkalinity source.... Agent: Madison Chemical Co., Inc.
20140338704 - Method for cleaning a (meth)acrylate ester process tank: Provided is a method for removing deposited solid residue from equipment used in the processing of (meth)acrylic acid or esters, including the steps of dissolving the solid residue in a cleaning solution comprising an organic carboxylic acid to produce a solid residue slurry; and removing the solid residue slurry from... Agent:
20140338705 - Duct cleaning clamp and duct cleaning access door: The present invention is directed to a magnetic duct cleaning hose clamp for attaching an airflow hose to a HVAC duct to be cleaned. The improved duct cleaning hose clamp includes: a planar clamp base; a plurality of magnets arranged around the periphery of the back surface of the clamp... Agent:
20140338706 - Liquid processing method, liquid processing device, and storage medium: [Problem] To provide a liquid processing method with which, while alleviating a watermark occurring in the surface of a substrate, it is possible to hydrophobize the surface using a hydrophobing gas. [Solution] A substrate (W), retained in substrate retaining parts (21, 22, 23), is rotated and has a liquid compound... Agent: Tokyo Electron Limited
20140338709 - Systems and methods for adjusting moisture concentration of a veneer: Systems and methods for adjusting a moisture concentration of veneer are provided. In at least one specific embodiment, the method for adjusting a moisture concentration of a veneer can include estimating a moisture concentration of a veneer surface at one or more locations thereon. The method can also include comparing... Agent:
20140338707 - Cleaning device: A cleaning device for a laboratory fermenter for growing microorganisms is provided. The laboratory fermenter to be cleaned has a gas supply connection connected to a line reaching into the fermenter's nutrient solution, an exhaust connection to the gas space over the nutrient solution, and a withdrawal connection leading to... Agent: Infors Ag
20140338708 - Dishwasher with integrated lighting: A dishwasher includes a tub at least partially defining a treating chamber for receiving dishes for treatment according to the cycle of operation and having an open face providing access to the treating chamber, a dish holder slidable relative to the tub through the open face between a loading position... Agent: Whirlpool Corporation11/13/2014 > 15 patent applications in 12 patent subcategories.
20140332029 - Cleaning tool device: A cleaning tool device for cleaning a desired area with a cleaning implement is provided. The cleaning tool device comprises a handle portion having a first end and a second end and a tool portion having a first end and a second end. The first end of the tool portion... Agent:
20140332028 - Toothbrush with gripping handle: A toothbrush with secure grip and a method for brushing teeth are disclose, including picking up a toothbrush below the neck portion, a toothbrush head extending from one end of the neck portion, a round/octagon/oval shaped handle, and a grip handle extending from the other end of the neck portion,... Agent:
20140332030 - Window cleaning devices and systems and methods of using same: The present disclosure provides window cleaning devices and methods for using same to clean a window, for example an exterior surface of a window.... Agent:
20140332031 - Pipe cleaning system and method: An HVAC pipe cleaning system includes a pipe cleaning adapter attached to the upstream end of a pipe and a catch device attached to the downstream end of the pipe k cylindrical wiper is closely fitted into the interior of the pipe cleaning adapter and is propelled from the pipe... Agent:
20140332032 - Fill level gauge with a rinsing device: A fill level gauge is described with a rinsing device for rinsing a fill level sensor, comprising a sensor for detecting a measuring signal as well as a measurement device connected to the sensor for determining a measurement from the detected measuring signal, with the measurement device being connected to... Agent: Vega Grishaber Kg
20140332033 - Flux residue cleaning system and method: A flux residue cleaning system includes first and second immersion chambers, first and second spray chambers, and a drying chamber. The first immersion chamber softens an outer region of a flux residue formed around microbumps interposed between a wafer and a die when the wafer is immersed in a first... Agent:
20140332034 - Process comprising water vapor for haze elimination and residue removal: A method of treating a substrate comprises removing material from a substrate using a treatment protocol to provide a treated substrate followed by a rinsing step. In the rinsing step at least one stream comprising a rinsing fluid is introduced and water vapor is caused to collide with and atomize... Agent: Tel Fsi, Inc.
20140332035 - Method for vapor-cleaning object to be cleaned and device therefor: When an object to be cleaned is vapor cleaned in the prior art, a tubular cleaning tube is arranged on the top face of the cover plate, at the outer periphery of the outlet, so that the cleaning vapor can accumulate, allowing very little pushing out the air in the... Agent: Japan Field Co., Ltd.
20140332036 - Device and method for treating substrate surfaces: e
20140332037 - Controls of ambient environment during wafer drying using proximity head: A method for processing a substrate is provided which includes generating a fluid meniscus to process the substrate and applying the fluid meniscus to a surface of the substrate. The method further includes reducing evaporation of fluids from a surface in the substrate processing environment.... Agent: Lam Research Corporation
20140332038 - Cleaning valve with dampening mechanism: Pulse valves and methods of using pulse valves are provided. The pulse valves include a dampening mechanism to decrease mechanical stresses, decrease operating noise, decrease compressed air waste and increase operational life expectancy. Such dampening mechanism is arranged within an internal area of the pulse valve housing. Additionally, fluid within... Agent: Alstom Technology Ltd
20140332039 - Quiet pulse valve: A relatively quiet pulse valve and a method of using the pulse valve are provided. The pulse valve includes a dampening mechanism to decrease mechanical stresses, decrease operating noise, decrease compressed air waste and increase operational life expectancy of the valve. Such dampening mechanism is arranged within an internal area... Agent: Alstom Technology Ltd
20140332040 - Reduced sound with a rotating filter for a dishwasher: A dishwasher with a tub at least partially defining a washing chamber, a liquid spraying system, a liquid recirculation system defining a recirculation flow path, and a liquid filtering system. The liquid filtering system includes a rotating filter disposed in the recirculation flow path to filter the liquid.... Agent: Whirlpool Corporation
20140332041 - Dishwasher with directional spray: A dishwasher includes a tub at least partially defining a treating chamber and a spraying system for supplying liquid to the treating chamber. The spraying system includes a sprayer having a body with an interior, a liquid passage provided in the interior, and a plurality of outlets extending through the... Agent: Whirlpool Corporation
20140332042 - Dishwasher with rack corner spray system: A dishwasher includes a rack provided with interior and exterior corner nozzles to direct washing fluid onto interior and exterior surface portions of an object placed in a corner of the rack.... Agent: Whirlpool CorporationPrevious industry: Toilet
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