|Cleaning and liquid contact with solids patents - Monitor Patents|
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Cleaning and liquid contact with solidsBelow are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 11/13/2014 > 15 patent applications in 12 patent subcategories.
20140332029 - Cleaning tool device: A cleaning tool device for cleaning a desired area with a cleaning implement is provided. The cleaning tool device comprises a handle portion having a first end and a second end and a tool portion having a first end and a second end. The first end of the tool portion... Agent:
20140332028 - Toothbrush with gripping handle: A toothbrush with secure grip and a method for brushing teeth are disclose, including picking up a toothbrush below the neck portion, a toothbrush head extending from one end of the neck portion, a round/octagon/oval shaped handle, and a grip handle extending from the other end of the neck portion,... Agent:
20140332030 - Window cleaning devices and systems and methods of using same: The present disclosure provides window cleaning devices and methods for using same to clean a window, for example an exterior surface of a window.... Agent:
20140332031 - Pipe cleaning system and method: An HVAC pipe cleaning system includes a pipe cleaning adapter attached to the upstream end of a pipe and a catch device attached to the downstream end of the pipe k cylindrical wiper is closely fitted into the interior of the pipe cleaning adapter and is propelled from the pipe... Agent:
20140332032 - Fill level gauge with a rinsing device: A fill level gauge is described with a rinsing device for rinsing a fill level sensor, comprising a sensor for detecting a measuring signal as well as a measurement device connected to the sensor for determining a measurement from the detected measuring signal, with the measurement device being connected to... Agent: Vega Grishaber Kg
20140332033 - Flux residue cleaning system and method: A flux residue cleaning system includes first and second immersion chambers, first and second spray chambers, and a drying chamber. The first immersion chamber softens an outer region of a flux residue formed around microbumps interposed between a wafer and a die when the wafer is immersed in a first... Agent:
20140332034 - Process comprising water vapor for haze elimination and residue removal: A method of treating a substrate comprises removing material from a substrate using a treatment protocol to provide a treated substrate followed by a rinsing step. In the rinsing step at least one stream comprising a rinsing fluid is introduced and water vapor is caused to collide with and atomize... Agent: Tel Fsi, Inc.
20140332035 - Method for vapor-cleaning object to be cleaned and device therefor: When an object to be cleaned is vapor cleaned in the prior art, a tubular cleaning tube is arranged on the top face of the cover plate, at the outer periphery of the outlet, so that the cleaning vapor can accumulate, allowing very little pushing out the air in the... Agent: Japan Field Co., Ltd.
20140332036 - Device and method for treating substrate surfaces: e
20140332037 - Controls of ambient environment during wafer drying using proximity head: A method for processing a substrate is provided which includes generating a fluid meniscus to process the substrate and applying the fluid meniscus to a surface of the substrate. The method further includes reducing evaporation of fluids from a surface in the substrate processing environment.... Agent: Lam Research Corporation
20140332038 - Cleaning valve with dampening mechanism: Pulse valves and methods of using pulse valves are provided. The pulse valves include a dampening mechanism to decrease mechanical stresses, decrease operating noise, decrease compressed air waste and increase operational life expectancy. Such dampening mechanism is arranged within an internal area of the pulse valve housing. Additionally, fluid within... Agent: Alstom Technology Ltd
20140332039 - Quiet pulse valve: A relatively quiet pulse valve and a method of using the pulse valve are provided. The pulse valve includes a dampening mechanism to decrease mechanical stresses, decrease operating noise, decrease compressed air waste and increase operational life expectancy of the valve. Such dampening mechanism is arranged within an internal area... Agent: Alstom Technology Ltd
20140332040 - Reduced sound with a rotating filter for a dishwasher: A dishwasher with a tub at least partially defining a washing chamber, a liquid spraying system, a liquid recirculation system defining a recirculation flow path, and a liquid filtering system. The liquid filtering system includes a rotating filter disposed in the recirculation flow path to filter the liquid.... Agent: Whirlpool Corporation
20140332041 - Dishwasher with directional spray: A dishwasher includes a tub at least partially defining a treating chamber and a spraying system for supplying liquid to the treating chamber. The spraying system includes a sprayer having a body with an interior, a liquid passage provided in the interior, and a plurality of outlets extending through the... Agent: Whirlpool Corporation
20140332042 - Dishwasher with rack corner spray system: A dishwasher includes a rack provided with interior and exterior corner nozzles to direct washing fluid onto interior and exterior surface portions of an object placed in a corner of the rack.... Agent: Whirlpool Corporation11/06/2014 > 8 patent applications in 6 patent subcategories.
20140326277 - Apparatus and method for plasma treatment of surfaces: A method and a device for the plasma treatment of surfaces of at least one workpiece. At least one plasma source is connected to an energy source in order to generate a plasma. A closed area is in fluid connection to the at least one plasma source. At least one... Agent:
20140326276 - Cobalt removal for chamber clean or pre-clean process: Implementations described herein generally relate to methods and apparatus for in-situ removal of unwanted deposition buildup from one or more interior surfaces of a semiconductor substrate processing chamber. In one implementation, a method for removing cobalt or cobalt containing deposits from one or more interior surfaces of a substrate processing... Agent: Applied Materials, Inc.
20140326275 - Method and apparatus for cleaning organic materials: Provided are a method and apparatus for cleaning organic materials accumulated on a mask used in a process of depositing organic materials. The apparatus includes a plasma generating unit, a cleaning chamber connected to the plasma generating unit and accommodating the mask therein, a gas injection port disposed within the... Agent: Samsung Display Co., Ltd.
20140326278 - Reticle chuck cleaner and reticle chuck cleaning method: o
20140326279 - Cleaning equipment of sample bottle for chrimatography analysis and cleaning method thereof: A cleaning equipment of sample bottle for chromatography analysis comprising: a base; a support frame vertically fixed to the base; a horizontal column having two ends, wherein one of the ends is disposed at the support frame through an adjustment knob; a rotary drive device fixed to the other end... Agent:
20140326280 - Cleaning apparatus for heat exhange tubes of air cooled heat exchangers: A spray mat for spraying cleaning fluid under pressure onto the outer surfaces of heat exchange tubes that extend in rows in a heat exchanger, the rows of tubes being spaced apart from each other with a generally planar space defined between each two adjacent rows, the spray mat formed... Agent: Saudi Arabian Oil Company
20140326281 - Substrate treatment apparatus: A substrate treatment apparatus for treating a substrate with a chemical liquid in a treatment chamber. The apparatus includes a higher temperature chemical liquid supplying unit, and a rinse liquid supplying unit for rinsing away the higher temperature chemical liquid. A control unit controls a rotation unit for rotating the... Agent:
20140326282 - Endoscope cleaning/disinfecting apparatus: An endoscope cleaning/disinfecting apparatus has a cleaning tank in which an endoscope is disposed, a chemical tank that stores a chemical solution, a water supply connecting portion that is connectable to a water service pipe, an endoscope cleaning/disinfecting section having a first conduit that connects the cleaning tank and the... Agent: Olympus Medical Systems Corp.10/30/2014 > 13 patent applications in 10 patent subcategories.
20140318573 - Phonograph record cleaner: Methods, systems and apparatus for cleaning phonograph records are disclosed. In some embodiments, a phonograph record can be cleaned in a liquid basin using ultrasonic transducers, wherein the liquid basin has a dampening structure. Also, the ultrasonic transducers are disposed on a flexible wall for reducing vibrations of the cleaner.... Agent:
20140318574 - Pipette tip washing device: A washing device includes a top compartment capable of receiving a manifold dispenser. The manifold dispenser is coupled to a rack and comprises at least one liquid input and a plurality of liquid outputs that operably direct fluid to contact a plurality of laboratory consumables held by the rack. A... Agent: Health Diagnostic Laboratory, Inc.
20140318575 - Protective cover for electrostatic chuck: A protective cover for an electrostatic chuck may include a conductive wafer and a plasma resistant ceramic layer on at least one surface of the conductive wafer. The plasma resistant ceramic layer covers a top surface of the conductive wafer, side walls of the conductive wafer and an outer perimeter... Agent: Applied Materials, Inc.
20140318576 - Machine and method for continuously washing containers made of plastic material, and removal of contaminants and labels from their surface: A machine and a method are described for washing and removal, in a continuous manner, of contaminants and labels from plastic containers made of recyclable material. During washing, the containers pass inside a washing chamber and are subject to a high level of friction caused by an agitator rotating at... Agent: Amut S.p.a.
20140318577 - Apparatuses and methods for removing deposits in thermal conversion processes: Embodiments of apparatuses and methods for removing deposits in thermal conversion processes are provided herein. In one example, a method comprises advancing a hot vapor through a hot vapor inlet tubular section to a low temperature zone inlet nozzle of a longitudinal tubular section. The hot vapor inlet tubular section... Agent:
20140318578 - Method of cleaning glass substrates: A method of cleaning thin glass substrates comprises applying a sequence of chemical washing steps as the thin glass substrate is being conveyed in a conveyance direction. In addition, surfaces of the glass substrate may be treated to enhance electrostatic discharge properties of the glass substrates.... Agent: Corning Incorporated
20140318581 - Camera cleaning system and method and rotary milking system: A camera cleaning system and method for a milking system which includes a rotating platform, plural milking stalls thereon, a robot for performing an animal related operation with respect to the animals in the milking stalls passing by the robot, and a camera in response to signals from which the... Agent:
20140318580 - Condition warning system, control system and method for pot and pan washing machine: A condition warning system for an apparatus such as a pot and pan washing machine, a control system and control methods for a pot and pan washing machine are provided. The condition warning system includes a control system that monitors operational, safety or compliance parameters of an apparatus, and a... Agent: Unified Brands, Inc.
20140318579 - Methods for dispensing a treating chemistry in a dishwasher: A dishwasher has a treating chamber for receiving dishes for treatment according to an automatic cycle of operation and a dispensing system for storing and dispensing a treating chemistry to the treating chamber during the cycle of operation. The dishwasher may dispense a treating chemistry when a temperature of a... Agent: Whirlpool Corporation
20140318582 - Endoscope lens cleaning device: An endoscope lens cleaning apparatus used for removing surgical debris from an objective lens of an endoscope. The endoscope lens cleaning apparatus includes an elongated sheath and a connection assembly. The elongated sheath includes an endoscope lumen and an irrigation channel, configured in parallel and adjoining, each extending between an... Agent:
20140318583 - Dishwasher with permanent storage compartment: A dishwasher, including a chamber for washing dishes and a chamber for storing dishes is provided. A mechanism is also provided allowing the dish racks to move the dishes from the washing chamber to the storage chamber of the dishwasher once the wash is completed.... Agent:
20140318584 - Formulations for the removal of particles generated by cerium-containing solutions: Compositions and methods for removing lanthanoid-containing solids and/or species from the surface of a microelectronic device or microelectronic device fabrication hardware. Preferably, the lanthanoid-containing solids and/or species comprise cerium. The composition is preferably substantially devoid of fluoride ions.... Agent: Advanced Technology Materials, Inc.
20140318585 - Dishwasher and sensing module for the same: A dishwasher including a washing chamber to perform dishwashing, a water collecting portion provided at a lower portion of the washing chamber to gather water used for washing, and a sensing module which is disposed in the water collecting portion and integrally includes a water sensing sensor to sense whether... Agent: Samsung Electronics Co., Ltd.10/23/2014 > 14 patent applications in 11 patent subcategories.
20140311525 - Label sheet for cleaning and conveying member having cleaning function: A label sheet for cleaning is formed of a label for cleaning including a cleaning layer having a 180° peeling adhesion to a silicon wafer of 0.20 N/10 mm or less after receiving an active energy and an adhesive layer provided on one of surfaces of said cleaning layer, and... Agent: Nitto Denko Corporation
20140311524 - Multi-function cleaning apparatus: A cleaning device includes a refillable handle, a scrubbing member, a plurality of bristles, and a squeegee. The refillable handle includes first and second end portions and a hollow interior configured to hold a cleaning fluid. The scrubbing member is positioned at the first end portion of the handle and... Agent:
20140311522 - Porous material for insertion cleaning of instruments: A porous material for insertion cleaning of instruments is provided, such porous material including an at least partially open-cell foam body and a surface configured to enable an instrument having contaminants to be inserted into the body. The body may be configured to substantially grip the instrument to remove a... Agent: Jordco, Inc.
20140311523 - Vehicle-mounted footwear cleaning device: A footwear cleaning device for attachment to a vehicle having a passenger compartment and a frame running lengthwise under said passenger compartment, the cleaning device comprising a base for mounting to the frame; an arm having a proximate end and a distal end, the arm being pivotally or slideably operatively... Agent:
20140311526 - Solvent systems for use in cleaning electronic and other components: A method for cleaning a precision component by immersing the component in a heated solvating agent disposed in a pre-clean module tank to thereby remove an adherent contaminant; treating the component with a rinsing solvent to remove any remaining contaminants and residual solvating agent in a separate rinse degreaser whereby... Agent:
20140311527 - Device and method for cleaning dental appliances: A device for cleaning a dental appliance is disclosed. The device includes a holding container including an upper portion and a lower portion, the holding container adapted to receive at least one dental appliance; an electrolytic cell for generating chlorine dioxide from a chlorine dioxide precursor; and an electrical current... Agent: The Procter & Gamble Company
20140311528 - Cleaning tool and a method for treating an inner surface of a casing: The present invention relates to a cleaning tool for cleaning and treating an inner surface of a downhole casing. The cleaning tool comprises a tool housing, a mechanical cleaning tool section comprising mechanical cleaning elements for releasing elements of the inner surface of the casing in order to clean the... Agent: Welltec A/s
20140311529 - Detergent compositions for endoscope washers: wherein R represents a branched-chain alkyl group having not less than 7 and not more than 9 carbon atoms; EO represents an ethanediyloxy group; PO represents a propanediyloxy group; m and n each represent an average molar number of addition of the ethanediyloxy or propanediyloxy group in which m is... Agent:
20140311530 - Substrate processing method and template: A substrate processing method of performing a predetermined processing by supplying a processing liquid to a processing region on a surface of a substrate, includes: supplying an alignment liquid to an alignment region on the surface of the substrate formed at a position different from that of the processing region;... Agent: Tokyo Electron Limited
20140311531 - Gas-liquid two-phase atomizing cleaning device and cleaning method: The present invention provides a gas-liquid two-phase atomizing cleaning device. The cleaning device comprises a gas-liquid two-phase atomizing spray head. The spray head is a double jacket structure and comprises a nozzle, a rotating arm, a gas guide tube and a liquid guide tube; wherein the nozzle is connected with... Agent:
20140311532 - Substrate processing apparatus and processed substrate manufacturing method: A substrate processing apparatus has a substrate rotating device 10, 20 for holding and rotating a substrate W, a cleaning device 41 configured to clean a substrate W which is rotated by the substrate rotating device 10, 20 at predetermined rotating speed, a movement device 42 configured to move the... Agent: Ebara Corporation
20140311533 - Process for the demulsifying cleaning of metallic surfaces: The demulsifying cleaning of metallic surfaces which may be contaminated with oil(s) with at least one further nonpolar organic compound, with fat(s), with soap(s), with particulate dirt or with at least one anionic organic compound using an aqueous, alkaline, surfactant-containing bath solutions.... Agent:
20140311534 - Cleaning method and cleaning device for sealing mask, and production method for honeycomb structure: A sealing mask has a pair of principal surfaces opposed to each other and a plurality of through-holes opening in the pair of principal surfaces and is used for sealing predetermined cells out of a plurality of cells in a honeycomb structure. A cleaning device for the sealing mask is... Agent: Sumitomo Chemical Company, Limited
20140311535 - Machine for washing objects and method for the hydraulic and mechanical connection of a trolley carrying objects to be washed to a feed circuit of a washing liquid for a machine for washing objects: A device according to the present invention can be used for the hydraulic and mechanical connection of a distributor circuit of washing liquid of a trolley carrying objects to be washed to a feed circuit of a washing liquid for a washer machine for objects. The washer machine provides a... Agent:Previous industry: Toilet
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