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Cleaning and liquid contact with solids March listing by industry category 03/13

20130074871 - Stainless steel pickling in an oxidizing, electrolytic acid bath: A pickling process designed for pickling a metal strip such as a stainless steel strip reduces the amount of HF and/or HNO3. The strip is immersed in at least one first pickling tub that contains a mixture of an acid such as H2SO4, an excess of at least one oxidizing... Agent: Ak Steel Properties, Inc.

20130074870 - Treatment process for an isomerization unit: One exemplary embodiment can be a process for treating an interior of equipment for an isomerization unit. Generally, the isomerization unit includes at least one of a drying zone, an isomerization reaction zone, and a stabilizer zone, for receiving a feed stream. Usually, the feed stream includes one or more... Agent: Uop, LLC.

20130074872 - In-situ backside cleaning of semiconductor substrate: The present disclosure provides a method and apparatus for cleaning a semiconductor wafer. In an embodiment of the method, a single wafer cleaning apparatus is provided and a wafer is positioned in the apparatus. A first chemical spray is dispensed onto a front surface of the wafer. A back surface... Agent: Taiwan Semiconductor Manufacturing Company, Ltd., ("tsmc")

20130074873 - Substrate processing apparatus and substrate processing method: A substrate processing apparatus comprising: a substrate holder which holds a substrate having a pattern formed in a surface of the substrate in a predetermined positional relationship with a reference indicator of the substrate; and a cleaner which abuts an adhesive member on the surface of the substrate which is... Agent:

20130074874 - Fuel additive for improved performance of low sulfur diesel fuels: wherein R is selected from hydrogen and a hydrocarbyl group containing from about 1 to about 15 carbon atoms, and R1 is selected from hydrogen and a hydrocarbyl group containing from about 1 to about 20 carbon atoms, wherein the reaction product contains less than one equivalent of an amino... Agent: Afton Chemical Corporation

20130074875 - Ware washing system containing cationic starch: The present invention discloses a method of washing ware, in particular in an automatic domestic or institutional ware washing machine, using a detergent composition containing a cationic starch. This eliminates the need for a surfactant in the rinse step. The cationic starch provides a layer of cationic starch on the... Agent: Diversey, Inc., Part Of Sealed Air

20130074876 - Cleaning apparatus and cleaning method for components of metal organic chemical vapor deposition device: A cleaning apparatus a metal organic chemical vapor deposition (MOCVD) device incorporating a susceptor rotatably holding the plurality of substrate holders through a rotating mechanism of a bearing; and a cleaning method for efficiently removing deposits from components of the device. The cleaning apparatus includes storage for the susceptor and... Agent: Japan Pionics Co., Ltd.

20130074877 - Method of washing eggs: A method of washing eggs in a manner which allows controlling the level of pollutants of the washing fluid. At least two sprayer units are located over a conveyor in which eggs to be washed travel in a conveying direction. The eggs are engaged by a brush at each sprayer... Agent: Fps Food Processing Systems B.v.

20130074878 - Wafer scrubber: A wafer scrubber is disclosed, including a chamber, and a holder connecting to a spindle disposed in the chamber, wherein the holder supports a wafer, and the wafer spins to remove water on the wafer, and a mashed inner cup comprising a plurality of through holes disposed between the holder... Agent: Nanya Technology Corporation

20130074880 - Industrial cleaning system and methods related thereto: Embodiments of the invention relate to an industrial cleaning system and related methods. The system and methods utilize propelled media to clean equipment and facilities.... Agent:

20130074881 - Process for pickling or descaling a concrete surface: A method for pickling or descaling a concrete surface employing at least one jet of liquid nitrogen at cryogenic temperature below −100° C. at a pressure of at least 500 bar, distributed by the discharge orifice of at least one nozzle for distributing the jet of liquid nitrogen. At least... Agent: L'air Liquide Societe Anonyme Pour I'etude Et I'expoitation Des Procedes Georges Claude

20130074879 - Staged compressor water wash system: A compressor wash system for compressor washing includes stages of fluid delivery lines coupled at one end to a pump output and at the other end to a corresponding nozzle set. A control valve is connected to the fluid delivery line between the pump and the nozzle set, selectively supplying... Agent: Gas Turbine Efficiency Sweden Ab

20130074882 - Device for cleaning respirators: A cleaning device for cleaning respirators, in particular breathing regulators and/or breathing masks, is proposed. The cleaning device comprises at least one cleaning chamber for receiving at least one respirator. The cleaning device also has at least one fluid device for applying at least one cleaning fluid to the respirator.... Agent: Meiko Maschinenbau Gmbh & Co. Kg

20130074883 - High-pressure cleaning appliance: The invention relates to a high-pressure cleaning appliance comprising a first functional device required for operation in the form of a heatable heat exchanger for heating a liquid that is dischargeable from the high pressure cleaning appliance, and at least one further, second functional device required for operation which is... Agent: Alfred Kaercher Gmbh & Co. Kg

20130074884 - High-pressure cleaning appliance: The invention relates to a high-pressure cleaning appliance, comprising a heatable heat exchanger for heating a liquid that is dischargeable by the high-pressure cleaning appliance, a motor having a drive shaft that defines a drive axis, a pump unit for increasing the liquid pressure, a blower wheel for generating a... Agent: Alfred Kaercher Gmbh & Co. Kg

20130074885 - Method and plant for treating bottom sludge in a tank: e

20130074886 - Dishwasher with spray system: A dishwasher includes a tub at least partially defining a treating chamber for receiving utensils for treatment according to the automatic cycle of operation, a rotatable spray arm provided within the treating chamber and defining an interior through which liquid may pass, and hydraulic driving nozzles to rotate the rotatable... Agent: Whirlpool Corporation

20130074887 - Dishwasher with sprayer: A dishwasher includes a tub at least partially defining a treating chamber and a sprayer for spraying liquid to the treating chamber. The sprayer may include a liquid passage and at least one outlet extending from an interior to an exterior of the sprayer and in fluid communication with the... Agent: Whirlpool Corporation

20130074888 - Dishwasher with spray system: A dishwasher includes a tub at least partially defining a treating chamber and a spraying system for supplying liquid to the treating chamber. The spraying system includes a sprayer having a body with an interior, a liquid passage provided in the interior, and an outlet extending through the body and... Agent: Whirlpool Corporation

20130074889 - Fluid inlet for controlled filling of a dishwasher: A fluid inlet housing for controlled filling of a dishwasher is provided. For example, a dishwasher comprising a tub for receiving dishware therein, a water conduit, and a fluid inlet housing is provided. The fluid inlet housing is in fluid communication with the tub and the water conduit. Additionally, the... Agent: Electrolux Home Products, Inc.

20130074890 - Dishwasher with spray system: A dishwasher includes a tub at least partially defining a treating chamber and a spraying system for supplying liquid to the treating chamber. The spraying system includes a sprayer having a body with an interior, a liquid passage provided in the interior, and a plurality of outlets extending through the... Agent: Whirlpool Corporation

20130074891 - Dishwasher with spray system: A dishwasher includes a tub at least partially defining a treating chamber and a spraying system for supplying liquid to the treating chamber. The spraying system includes a sprayer having a body with an interior, a liquid passage provided in the interior, and a plurality of outlets extending through the... Agent: Whirlpool Corporation

20130068247 - Methods and apparatus for cleaning surgical instruments: Methods and apparatus for cleaning a surgical instrument during a surgical procedure insert at least the portion of the surgical instrument that is to be cleaned into a vessel containing a liquid and applying ultrasonic vibrations to the liquid within the vessel to generate cavitation bubbles in the liquid. The... Agent: Gyrus Medical, Inc.

20130068249 - Method of treating rolled steel article: A process is disclosed in which hot rolled or cold rolled steel articles, such as tube, pipe, plate and sheet are cleaned of mill scale, surface rust and oils. The cleaning compositions compromise a solution mixture of diluted hydrochloric acid, a non-anionic surfactant, a non-ionic, non denaturing detergent, sodium carbonate,... Agent:

20130068248 - Semiconductor device cleaning method: The present disclosure provides a method including providing a chamber having a first inlet and a second inlet. A solution of a de-ionized (DI) water and an acid (e.g., a dilute acid) is provided to the chamber via the first inlet. A carrier gas (e.g., N2) is provided to the... Agent: Taiwan Semiconductor Manufacturing Company, Ltd., ("tsmc")

20130068250 - Whisk wiper: A whisk wiper, a device having a a plurality of intersecting slits angularly disposed in an asterisk type pattern, is mounted onto a whisk. It is pulled down over the loops 44, each loop 44 guided through a slit 32. To clean off mixture 50 stuck to the whisk 46... Agent:

20130068251 - Fastenable conduit for breathable gas delivery: A fastenable air delivery conduit includes a body portion having a supply end and a delivery end and a fastener that substantially extends from the supply end to the delivery end. The fastener, when engaged, forms the body portion into a fastened configuration, and when disengaged, forms the body portion... Agent: Resmed Limited

20130068252 - Method and apparatus for cleaning filters: There is described an apparatus for cleaning a filter cloth, comprising: a cleaning station comprising a gas flow device and a support surface defining an aperture; and a collection device positioned below the aperture for receiving material removed from the filter cloth; wherein the gas flow device is configured to... Agent: Microbial Solutions Limited

20130068253 - System and method for purging a bearing and bearing housing: A system and method for heating a purging fluid contained in a portable oil sump or reservoir, and pumping the hot purging fluid through a bearing housing in order to purge the bearing and bearing housing of accumulated hardened grease, sludge, and debris. The heated purging fluid can then be... Agent: Inventus Holdings, LLC

20130068254 - Composition and method for continuous or intermittent removal of soil from recirculated washing solution: A method of removing food soils from a recirculated washing solution includes adding a flocculating agent to the recirculated washing solution and separating the particulates from the recirculated washing solution using a hydrocyclone. The flocculating agent causes a portion of the food soils to combine into particulates having a higher... Agent: Ecolab Usa Inc.

20130068255 - Automated dust collection system: Apparatus, methods and systems for controlling a dust collecting system are presented. A system includes a plurality of sensors paired to a corresponding plurality of blast gates, and a controller coupled to receive a signal from each of the plurality of blast gates. The sensor non-invasively detects power flow through... Agent: Heger Research LLC

20130068256 - Longitudinal solid-liquid countercurrent contact method, method of washing solid particles, method of manufacturing poly(arylene sulfide) and apparatus: A longitudinal solid-liquid countercurrent contact method and apparatus are provided in which an aqueous slurry containing solid particles is supplied from an upper part and is caused to pass through a plurality of contact-processing chambers connected in a vertical direction while being caused to proceed downward, a contacting liquid is... Agent: Kureha Corporation

20130068257 - Method and device for cleaning semiconductor substrate: According to one embodiment, a method for cleaning a semiconductor substrate comprises supplying water vapor to a surface of a semiconductor substrate on which a concave-convex pattern is formed while heating the semiconductor substrate at a predetermined temperature, cooling the semiconductor substrate after stopping the heating and the supply of... Agent:

20130068258 - Air cannon assembly having an automated blast guard valve: An air cannon has a pressure vessel, a discharge valve, and a discharge tube assembly. The discharge tube assembly comprises a fluid passageway and a blast guard valve. The discharge valve is capable of opening and closing and allows pressurized gas to be discharged from the pressure vessel into the... Agent: Martin Engineering Company

20130068259 - Dual direction, double tier spray arm assembly for a dishwashing appliance: A spray arm assembly for a dishwashing appliance is provided. The assembly can provide for sprays of fluid at different angles against the articles to be cleaned. For example, the spray arm assembly can have at least two spray bodies rotatable in opposite directions. Because the fluid is sprayed from... Agent: General Electric Company

20130068260 - Method of cleaning electronic material and cleaning system: An electronic material cleaning system includes a chemical cleaning means, a wet cleaning means and a single-wafer cleaning apparatus. The chemical cleaning means comprises a functional chemical storage tank and an electrolytic reaction apparatus connected to the functional chemical storage tank via a concentrated sulfuric acid electrolysis line. The functional... Agent: Kurita Water Industries Ltd

20130068261 - Multi-stage substrate cleaning method and apparatus: A first application of a cleaning material is made to a surface of a substrate. The cleaning material includes one or more viscoelastic materials for entrapping contaminants present on the surface of the substrate. A first application of a rinsing fluid is made to the surface of the substrate so... Agent:

20130068262 - Method for the treatment of a semiconductor wafer: Semiconductor wafers are treated in a liquid container filled at least partly with a solution containing hydrogen fluoride, such that surface oxide dissolves, are transported out of the solution along a transport direction and dried, and are then treated with an ozone-containing gas to oxidize the surface of the semiconductor... Agent: Siltronic Ag

20130068263 - Method of removing contaminates from particulate material: A cylindrical dedusting apparatus has an upper material infeed opening to introduce material into a frusto-conical infeed hopper centered over the tip of a conical wash deck supported over an air infeed conduit. Air is blown through slots and openings in the surface of the wash deck to separate dust... Agent: Pelletron Corporation

20130068264 - Wafer scrubber apparatus: A wafer scrubber apparatus is disclosed, including a chamber, and holder connecting to a spindle disposed in the chamber, wherein the holder supports a wafer, and a gas purge pipe disposed at the top of a wall of the chamber, wherein the gas purge pipe comprises a plurality of gas... Agent: Nanya Technology Corporation

20130068266 - Dishwasher with multi-piece tub: A dishwasher having a treating chamber for receiving dishes for treatment according to an automatic treating cycle within the treating chamber that includes a shell partially defining the treating chamber and a base structure supporting the shell as well as a liquid recirculation system mounted to the base structure and... Agent: Whirlpool Corporation

20130068265 - Two level conduit docking port mechanism for a dishwashing appliance: A two level conduit docking port for a dishwashing appliance is described. The docking port is provided having an upper port and a lower port, either of which is opened depending upon the position of a sliding valve that moves along the vertical direction. Movement of the valve to open... Agent: General Electric Company

20130068267 - Single-dose applicator and method: An applicator, related applicator system, and a method for delivering a self-adhesive material are provided. The applicator includes an outer surface, and an inner surface opposite the outer surface. The inner surface of the applicator defines a void that is operable to receive the self-adhesive material. At least a portion... Agent:

20130061869 - Use of megasonic energy to assist edge bond removal in a zonal temporary bonding process: New methods of weakening the bonds between a bonded pair of wafers or substrates are provided. The substrates are preferably bonded at their outer peripheries. When it is desired to separate the substrates, they are contacted with a solvent system suitable for weakening, softening, and/or dissolving the bonding composition at... Agent: Brewer Science Inc.

20130061872 - Ion bombardment treatment apparatus and method for cleaning of surface of base material using the same: In an ion bombardment treatment apparatus (1A) and a cleaning method, base materials (W) to be treated are held by a work table (11) so as to be placed between a filament (3) and an anode (4) in a vacuum chamber (2), and a discharge power supply (5) which can... Agent: Kabushiki Kaisha Kobe Seiko Sho (kobe Steel, Ltd.)

20130061870 - Method of cleaning film forming apparatus: In one embodiment, a method of cleaning a film forming apparatus includes: plasmatizing cleaning gas having at least one of the group consisting of chlorine gas, hydrocarbon gas, and chlorinated hydrocarbon gas; and supplying the plasmatized cleaning gas to a heated inner part of the film forming apparatus.... Agent:

20130061871 - Plasma purging an idle chamber to reduce particles: During each idle period in which a plasma processing tool is not used in succession, upon lapse of a selected period of inactivity by the plasma production tool of between 10 and 60 minutes, a plasma is generated within the plasma processing tool to heat the vacuum enclosure to an... Agent: Texas Instruments Incorporated

20130061873 - Method and apparatus for liquid treatment of wafer shaped articles: In an apparatus and method for treating a wafer-shaped article, a spin chuck is provided for holding a wafer-shaped article in a predetermined orientation wherein a lower surface of the wafer-shaped article is spaced a predetermined distance from an upper surface of the spin chuck. A heating assembly comprising at... Agent: Lam Research Ag

20130061874 - Cap sanitizer and method of use thereof: A cap sanitizer with an anti-bacterial sponge therein for sanitizing a dispenser bottle tip or other similar device. The inner side portions of the cap are lined with a continuous sponge (or absorbent foam) ring soaked with antibacterial solution. An o-ring is disposed below the sponge to prevent solution from... Agent:

20130061875 - Component cleaning in a metal plating apparatus: A plating apparatus includes a vessel for holding a bath of plating liquid. A head is adapted to hold a work piece, such as a silicon wafer, in the vessel, with a seal on the head sealing against the work piece. A component cleaner assembly may be used to automatically... Agent:

20130061876 - Semiconductor device surface clean: A system and method for cleaning a surface of a semiconductor device is disclosed. An embodiment comprises buffing the first surface with a cleaning solution comprising a reactant that will remove a portion of the first surface and also change the first surface from hydrophobic to hydrophilic. The first surface... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20130061877 - Cleaning method: The present invention relates to a cleaning method using dry ice pellets that make it possible to efficiently peel off a UV resin. The cleaning method according to the present invention is a method for cleaning a surface of an object to be cleaned that is fixed to a fixture... Agent: Japan Display East Inc.

20130061878 - High throughput processing system for chemical treatment and thermal treatment and method of operating: A high throughput processing system having a chemical treatment system and a thermal treatment system for processing a plurality of substrates is described. The chemical treatment system is configured to chemically treat a plurality of substrates in a dry, non-plasma environment. The thermal treatment system is configured to thermally treat... Agent: Tokyo Electron Limited

20130061879 - Reduction of entrance and exit marks left by a substrate-processing meniscus: A substrate is placed on a plurality of support pins within an opening of a carrier, such that a gap exists between the radial perimeter of the substrate and the carrier. The substrate and carrier are passed in a linear direction through a meniscus generated between respective faces of upper... Agent:

20130061880 - Continual flow pin washer: A multi-chambered deposition pin wash station is provided. The wash station includes a lower chamber and an upper drain basin connected by a plurality of wash tubes. Cleaning fluid is provided to the lower chamber and passes through the cleaning tubes into the upper drain basin. The cleaning tubes are... Agent: Aushon Biosystems

20130061882 - Cleaning formulations and method of using the cleaning formulations: A water-rich hydroxylamine formulation for photoresist and post-etch/post-ash residue removal in applications wherein a semiconductor substrate comprises aluminum. The cleaning composition comprises from about 2 to about 15% by wt. of hydroxylamine; from about 50 to about 80% by wt. of water; from about 0.01 to about 5.0% by wt.... Agent: Air Products And Chemicals, Inc.

20130061883 - Encapsulates: The present application relates to encapsulated, preformed peracids and products comprising such encapsulates, as well as processes for making and using such encapsulates and products comprising such encapsulates. Such products deliver bleaching that results in superior whiteness and stain removal without the stability issues that are normally associated with certain... Agent:

20130061884 - Method for cleaning wafer after chemical mechanical planarization: A method for cleaning wafer after chemical mechanical planarization that includes placing the wafer in the wafer holder and rotating the wafer holder and the wafer simultaneously, cleaning with chemicals by providing the wafer surface with chemical detergent through the detergent supply cantilever that keeps a certain distance away from... Agent: Institute Of Microelectronics, Chinese Academy Of Sciences

20130061881 - Method of improving purity and yield of chemical product in automatic radioactive medicine synthesis system: The present invention increases a number of target reaction containers from one into many. Coordinated with increased reaction times, total reaction volume is increased. By modifying an affinitive column of an automatic synthesis system, a production in a single batch is increased. The products obtained can be conformed to quality... Agent: Atomic Energy Council-institute Of Nuclear Energy Research

20130061885 - Method for removing overspray of thermal spray coatings: A method for removing the overspray of a coating which has been sprayed onto a workpiece directs at least one liquid jet from a jet lance as a hydrodynamic wedge in the parting plane between the workpiece and the overspray onto those regions of the workpiece which have overspray.... Agent: Gehring Technologies Gmbh

20130061886 - Powder coating booth: A powder spray for lengthy parts includes a booth wall structure comprised primarily of doors. A moveable roof may be raised and lowered to clean powder overspray from the interior surfaces of the booth. A cleaning process may be performed with a sideways extraction mode and a downward extraction mode.... Agent: Nordson Corporation

20130061889 - Method for controlling a dosing system which can be positioned inside a water-conducting domestic appliance: The invention relates to a method for controlling a dispensing system positionable in the interior of an automatic dishwasher, encompassing a cartridge filled with at least one preparation, a dispenser that is couplable to the cartridge, the dispenser encompassing at least a temperature sensor and a conductivity sensor, such that... Agent:

20130061890 - Filter cleaning method: Apparatus for filter cleaning including a filter element surface (12) to be cleaned, and a cleaning head (10), characterised by a controller (16) operative to move the cleaning head (10) with respect to the filter element surface (12) in a spiral scanning trajectory in such a way that a relative... Agent:

20130061887 - Method for removing material from semiconductor wafer and apparatus for performing the same: A pressure is maintained within a volume within which a semiconductor wafer resides at a pressure that is sufficient to maintain a liquid state of a precursor fluid to a non-Newtonian fluid. The precursor fluid is disposed proximate to a material to be removed from the semiconductor wafer while maintaining... Agent:

20130061888 - Substrate processing apparatus, substrate processing method and storage medium: A particle level varied depending on a drying processing condition can be suppressed to be stably lowered. A batch type substrate processing apparatus include a cleaning processing unit 62 having a cleaning tank 69 that stores therein a cleaning solution for cleaning a substrate, and a drying processing unit 61... Agent: Tokyo Electron Limited

20130056021 - Antifouling device for ducts: An antifouling device (1) adapted to be fastened to a duct (10) including a fluid and to be connected to a generator apparatus (20) for generation of an alternating electrical signal; the antifouling device (1) comprises at least one piezoelectric unit (2) adapted to convert the alternating electrical signal into... Agent: Lain Electronic S.r.l.

20130056022 - Bare aluminum baffles for resist stripping chambers: Bare aluminum baffles are adapted for resist stripping chambers and include an outer aluminum oxide layer, which can be a native aluminum oxide layer or a layer formed by chemically treating a new or used bare aluminum baffle to form a thin outer aluminum oxide layer.... Agent: Lam Research Corporation

20130056023 - Chemical for forming protective film: Disclosed is a liquid chemical for forming a water repellent protective film on a wafer that has at its surface a finely uneven pattern and contains silicon element at least at a part of the uneven pattern, the water repellent protective film being formed at least on surfaces of recessed... Agent: Central Glass Company, Limited

20130056024 - Substrate cleaning method and semiconductor manufacturing apparatus: A substrate cleaning method for cleaning a substrate on which a film is formed with a pattern in a vacuum-state processing chamber includes a preprocessing step where the film formed on the substrate on which the pattern has been formed by an etching process is cleaned by using a cleaning... Agent: Tokyo Electron Limited

20130056026 - Autonomous cleaning apparatus and method of controlling the same: An autonomous cleaning apparatus including a body, a brush unit which is rotatably installed onto the body to collect dust from a bottom of the body, and a brush cleaning member including a first brush cleaning protrusion and a second brush cleaning protrusion that protrude toward the brush unit to... Agent:

20130056027 - Cleaning apparatus for cleaning mop material and method of cleaning mop material: A cleaning device (14) for cleaning mop material (33) which freely hangs from a holder (31,32), having an opening (15) in which the hanging mop material (33) is receivable, including a pair of bristle carrying parts (22, 24), each of the bristle carrying parts (22, 24) being rotatable about a... Agent:

20130056025 - In-line cleaning method for ultrasonic welding tools: A method for in-line cleaning of ultrasonic welding tools is described. The method includes applying cleaning solution onto a work surface of a welding tool to be cleaned using an application device. Then the method involves removing residue dissolved in the cleaning solution from the work surface using a cleaning... Agent: Ford Global Technologies, LLC

20130056028 - Window-cleaning apparatus, and method for controlling the movement thereof: A window cleaning apparatus includes a first cleaning unit and a second cleaning unit that is attached to both sides of a window, respectively, by a magnetic force and moved on the sides, and a method of controlling a movement of the window cleaning apparatus. The method includes detecting the... Agent: Ilshim Global Co., Ltd.

20130056029 - Adjustable filter system for a dishwashing appliance: An adjustable filter system for a dishwashing appliance is provided. More specifically, a filter system is provided whereby the relative amount of fluid filtered by two different filters can be selectively controlled during operation of the dishwashing appliance. Flow can be directed primarily to one filter or the other depending... Agent: General Electric Company

20130056031 - Apparatus and methods for movable megasonic wafer probe: Methods and apparatus for a movable megasonic wafer probe. A method is disclosed including positioning a movable probe on a wafer surface, the movable probe having an open bottom portion that exposes a portion of the wafer surface; applying a liquid onto the wafer surface through a bottom portion of... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20130056030 - Beverage can cleaning apparatus and method of use thereof: A beverage can cleaning apparatus for cleaning beverage cans before they are dispensed from vending machines. The apparatus has a can holder, a hinged platform, tubes, a first nozzle, a second nozzle and a sensing block that matches the profile of the can top periphery. The sensing block is depressed... Agent:

20130056032 - Robot cleaner, and system and method for remotely controlling the same: A robot cleaner is accessed to a terminal through a network. A situation inside a house can be real-time checked from the outside, and the situation can be rapidly handled according to a state of the robot cleaner. The robot cleaner can patrol a predetermined region or move to a... Agent:

20130056033 - Substrate cleaning method and substrate cleaning device: A substrate cleaning method includes removing a foreign material attached to a substrate while preventing deterioration of the substrate and any film formed on or above the substrate. A cleaning gas at a pressure between 0.3 MPa and 2.0 MPa is sprayed towards a wafer W with attached foreign material... Agent: Tokyo Electron Limited

20130056034 - Self driven rotating pulse detonation cleaning system: A pulse detonation device can provide one or more shock waves to an operating device. The pulse detonation device includes a pulse detonation chamber providing one or more shock waves, at least one pulse detonation outlet extending into the operating device and in operative association with the pulse detonation chamber,... Agent: Bha Group, Inc.

20130056035 - Method and arrangement for cleaning one or more air filters: A method of cleaning one or more air filter elements with a cleaning arrangement includes a rotatable basket for holding the one or more air filters, a spraying device for spraying cleaning fluid into the basket, and a driving unit for driving the basket into rotational motion. The method includes... Agent: Dakra B.v.

20130056036 - Integrated processing and critical point drying systems for semiconductor and mems devices: Processing and drying of a sample, such as a semiconductor or MEMS device, is achieved using a single pressure chamber. The pressure chamber holds the sample in a sealed interior volume throughout various process steps, such as, but not limited to, photoresist removal, sacrificial layer etching, flushing or rinsing, dehydration,... Agent:

20130056037 - Apparatus for and method of processing substrate: A processing unit includes third discharge nozzles. Each of the third discharge nozzles discharges a processing liquid toward a lower tapered surface of a groove of a V-shaped cross-sectional configuration formed in a side wall of an inner bath. This forms relatively low-speed liquid flows within the inner bath. The... Agent:

20130056038 - Wet surface treatment by usage of a liquid bath containing energy limited bubbles: A method controllably and sustainably creates an upwardly directed gradient of dropping temperatures in a wet treatment tank between a cooled and face down workpiece (e.g., an in-process semiconductor wafer) and a lower down heat source. A thermal fluid upwell containing thermally collapsible bubbles is then directed from the heat... Agent:

20130056039 - Use of recycled wash and rinse water for the pre-rinse operation of dishes: A dishwashing machine is used for pre-rinse operation of soiled dishes. A cavity is configured and arranged to contain the soiled dishes. A nozzle is proximate the cavity and is in fluid communication with the cavity. An accumulator pan accumulates wash and rinse water including cleaning chemicals used in a... Agent: Ecolab Usa Inc.

20130056040 - Dish washer: Provided is a dish washer. The dish washer includes a tub configured to accommodate dishes, a sump configured to supply water to the tub, and a water supply device configured to supply water received from an outer source to the sump or the tub. The water supply device includes a... Agent:

20130056042 - Dishwasher with detergent dispenser: The application relates to a dishwasher (10) which comprises: a washing chamber (12) with a top wall (18), a vertical back wall (14), two opposing vertical side walls (16), a water-collecting bottom (20) at its lower end, a frontal access opening (22) for loading articles to be cleaned, and a... Agent: Electrolux Home Products Corporation N.v.

20130056041 - Megasonic precision cleaning of semiconductor process equipment components and parts: Apparatuses are provided for cleaning a processing component using megasonic energy including megasonic tanks, scanning megasonic plates, megasonic jets, and megasonic sweeping beams etc., in combination with selective chemistries to remove sub-micron particulate contaminants from the surfaces of the processing component that is used in cleaning semiconductor, medical, or any... Agent: