|Cleaning and liquid contact with solids patents - Monitor Patents|
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Cleaning and liquid contact with solids May archived by USPTO category 05/10Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 05/27/2010 > patent applications in patent subcategories. archived by USPTO category
20100126524 - Systems, methods and solutions for cleaning crystal growth vessels: The disclosure provides mixed acid solutions for cleaning a vessel, such as a vessel used for growing a GaAs crystal, comprising nitric acid, hydrofluoric acid and water. Further, the disclosure also provides exemplary methods for cleaning a vessel for growing a GaAs crystal, by: a) immersing the vessel in a... Agent: Dla Piper LLP (us )
20100126525 - Allergen depressant and depression method: The invention provides a means capable of effectively inactivating and removing allergen or a precursor thereof. The invention relates to an allergen-reducing agent containing water and a water-soluble polymer compound having units having hydroxy or carboxy groups wherein at least a part of hydrogen atoms of the hydroxy or carboxy... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100126526 - Safety arrangement for a dishwasher: Provided is a safety arrangement for a dishwasher. The safety arrangement may include a rack sensing component configured to determine whether a rack is in a washing location in a dishwasher and to provide a signal in response thereto. A processing unit may be in communication with the rack sensing... Agent: Alston & Bird LLP
20100126527 - Apparatus for and method of processing substrate subjected to exposure process: A method of processing a substrate subjected to an exposure process includes the steps of: transporting a substrate subjected to the exposure process to a cleaning processing part and performing a cleaning process in said cleaning processing part on said substrate subjected to the exposure process. The method also includes... Agent: Townsend And Townsend And Crew, LLP
20100126528 - Confinement of foam delivered by a proximity head: In an example embodiment, a linear wet system includes a carrier and a proximity head in a chamber. The proximity head includes three sections in a linear arrangement. The first section suctions liquid from the upper surface of a semiconductor wafer as the wafer is transported by the carrier under... Agent: Martine Penilla & Gencarella, LLP
20100126529 - Maintenance liquid for inkjet printers: wherein R2, R5, and R8 each independently represent an ethylene group or a propylene group, R1, R3, R4, and R6 each independently represent an alkyl group having 1 to 4 carbon atoms, R7 and R9 each independently represent a hydrogen atom or an alkyl group having 1 to 4 carbon... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100126530 - Drip shield for a drawer-type dishwasher: A drip shield is mounted to a drawer of a drawer-type dishwasher so as to extend along an outer rear surface of the drawer and catch droplets of washing fluid falling from a lid of the dishwasher. The drip shield includes a shelf that extends between up-turned wall portions. The... Agent: Whirlpool Patents Company - Md 0750
20100126531 - Method and apparatus for cleaning semiconductor device fabrication equipment using supercritical fluids: A process of cleaning a semiconductor device fabrication equipment is provided. In one embodiment, the semiconductor device fabrication equipment is placed in a chamber; a fluid is introduced into the chamber; a pressure and temperature of the fluid is controlled to bring the fluid to a supercritical state; the semiconductor... Agent: Lowe Hauptman Ham & Berner, LLP
20100126532 - Substrate processing apparatus and substrate processing method: A processing solution supply nozzle is moved relatively from one end to the opposite end of a semiconductor wafer having undergone a developing operation while discharging an anti-static processing solution in a discharge width equal to or greater than the width of the semiconductor wafer. The anti-static processing solution is... Agent: Ostrolenk Faber Gerb & Soffen
20100126535 - Multi-direction actuator: A steam appliance, such as a steam mop having a main body including a water pump for pumping water from a water tank to a steam generator in response to any movement of the appliance is provided. Movement causes a pump actuator to slide within a frame. The actuator has... Agent: Mccarter & English, LLP Stamford
20100126534 - Pump having a heating device: A pump, particularly for dishwashers, is provided and includes a housing made of a housing bottom, a housing cover, and a heating device disposed in between the bottom and cover for heating a washing fluid. The heating device forms a ring-shaped side wall of the housing. An impeller is arranged... Agent: Bsh Home Appliances Corporation Intellectual Property Department
20100126533 - Steam mop: A steam mop that includes a handle, an extension member, a base mount, a steam generator, and a mop head. The steam generator includes a body that at least partially contains a fluid tank, fluid pump and a heating element used to at least partially vaporize fluid. The body of... Agent: Fay Sharpe LLP
20100126536 - Cleaning device and analyzer: A cleaning device that cleans inside of a vessel. The cleaning device includes a suction nozzle configured to be inserted into the vessel to suck liquid contained in the vessel; and a supply nozzle configured to be inserted into the vessel to supply cleaning liquid into the vessel. At least... Agent: Townsend And Townsend And Crew LLP
20100126537 - Surface treatment equipment: Surface treatment equipment in which a working mechanism housed in a surface treatment tank is moved up and down while keeping the tank in a vacuum state, and the working mechanism can be rotated or oscillated, is provided.... Agent: Jordan And Hamburg LLP
20100126538 - Device for removing dust from pharmaceutical tables or capsules: Device for removing dust from pharmaceutical tablets or capsules, comprising a dust removal column (1) with a first ramp (2) for controlled conveying in a helical shape, said ramp comprising a first base (3) having a front face (3a) and a rear face (3b), a first peripheral edge (5) and... Agent: Michael Toback
20100126539 - Spin head, apparatus for treating substrate, and method for treating substrate: Provided is a spin head supporting a substrate and rotating the substrate. The spin head includes a body, chuck pins installed on the body and moving between supporting positions where a substrate is supported and waiting positions providing space for loading/unloading of the substrate, and a chuck pin moving unit... Agent: Carter, Deluca, Farrell & Schmidt, LLP
20100126540 - Tube lancing machine: A pair of parallel metal lances is driven by a transversal drive into and out of heat exchanger tubes. The lances are supported by a plurality of spaced apart, retractable door supports so that the transversal drive mechanism can approach the tube sheet of the heat exchanger tubes as closely... Agent: Tim Cook
20100126541 - Cleaning device for cleaning spray guns: The invention relates to a cleaning device for cleaning spray guns (S), particularly paint spray guns, having at least one cleaning nozzle (1) connected to a transport device (2) for cleaning fluid, and having a frictional cleaning device (3) for manually cleaning the spray guns or parts thereof Known cleaning... Agent: Fleit Gibbons Gutman Bongini & Bianco Pl05/20/2010 > patent applications in patent subcategories. archived by USPTO category
20100122710 - Film deposition apparatus, cleaning method for the same, and computer storage medium storing program: A disclosed film deposition apparatus includes a susceptor provided rotatably in a chamber; a substrate receiving portion provided in one surface of the susceptor, for receiving a substrate; a reaction gas supplying member configured to supply a reaction gas to the one surface of the susceptor; a cleaning member including:... Agent: Ipusa, P.l.l.c
20100122711 - wet clean method for semiconductor device fabrication processes: A wet clean method for semiconductor device fabrication begins by providing a semiconductor device structure having a substrate and features protruding from the substrate. The features are formed from a dielectric material, such as an ultra-low-k material. The method continues by cleaning the semiconductor device structure with an aqueous solution... Agent: Ingrassia Fisher & Lorenz, P.C. (amd)
20100122712 - Ferric pickling of silicon steel: The pickling process designed for pickling electrical steel strip in a continuous fashion comprising immersing the strip in at least one pickling tub. The pickling tub contains a mixture of HCl, Fe2+, and Fe3+ and a low concentration of HF. Upon exiting the final pickling tub, the strip may be... Agent: Frost Brown Todd, LLC
20100122713 - Washing method and apparatus for use therein: A method of washing an object to be processed, using water containing at least either one selected from a hydrogen radical and a carbon radical, and a novel method capable of exerting sufficient washing effect without using chemicals, by a washing apparatus having a processing bath for washing an object... Agent: Birch Stewart Kolasch & Birch
20100122714 - Method of operating a wheel washing assembly: A wheel washing assembly contains a machine frame, a pendulum assembly pivotably supported on the machine frame, and two washing manifolds, including a first washing manifold and a second washing manifold, attached to the pendulum assembly. Each of the washing manifolds has a nozzle assembly for ejecting water at a... Agent: Lerner Greenberg Stemer LLP
20100122715 - Screening arrangement for a dishwashing appliance, and associated apparatus: A screening arrangement for screening washing fluid in a dishwashing appliance is provided. Such a screening arrangement comprises intersecting wall members forming a latticework structure, defining opposing inlet and outlet planes, for receiving the washing fluid therethrough. The wall members have inlet and outlet ends disposed toward the respective inlet... Agent: Alston & Bird LLP
20100122716 - Washing device: A washing device is disclosed, which is capable of preventing damage of a substrate caused by drooping of the substrate. The washing device includes a plasma irradiating part supplied with a substrate from a substrate loading part to remove dirt from the substrate by irradiating plasma to the substrate; a... Agent: Brinks Hofer Gilson & Lione
20100122717 - Shopping cart auto washing system: The shopping cart washing machine includes a cart transporting means (200) which continuously transports a cart in a forward direction, a high pressure washing water spraying means (300) which washes the cart by spraying high pressure washing water to a surface of the cart, a handle washing means (400) which... Agent: Kang Intellectual Property Law, LLC05/13/2010 > patent applications in patent subcategories. archived by USPTO category
20100116288 - Method for decontaminating surfaces of nuclear plants which have been contaminated with alpha emitters: A method for decontaminating nuclear plant surfaces, which have been contaminated with alpha emitters, is carried out subsequently to a decontamination process which is aimed at the removal of oxide layers. The surfaces are treated with an aqueous solution which contains a cationic or zwitterionic surfactant and oxalic acid. At... Agent: Lerner Greenberg Stemer LLP
20100116289 - Cleaning brush with pulsing water: A paint preparation tool (10) having a distal brush head (18) with a mode valve to switch between continuous spraying under low pressure and pulsed spraying under higher pressure' connected by a hollow tube to a proximal remote control element (14) capable of switching off liquid to the brush head... Agent: Faegre & Benson LLP Patent Docketing - Intellectual Property
20100116290 - Composition and application of a two-phase contaminant removal medium: The embodiments provide substrate cleaning techniques to remove contaminants from the substrate surface to improve device yield. The substrate cleaning techniques utilize a cleaning material with solid components and polymers with a large molecular weight dispersed in a cleaning liquid to form the cleaning material, which is fluidic. The solid... Agent: Martine Penilla & Gencarella, LLP
20100116291 - Advanced cleaning tool: A cleaning tool, comprising a first support member, an absorbent member disposed below the first support member; and a plurality of brush bristles which extend into the absorbent member. Further embodiments of the present invention provide a cleaning tool comprising a first support member and a second support member, an... Agent: Moore & Van Allen PLLC
20100116293 - Substrate processing system and method of controlling the same: A process system includes a plurality of processing modules each processing a substrate with a process liquid. There is disposed a dispensing mechanism that dispenses the process liquid to the vertically arranged modules. The dispensing mechanism is provided with a process liquid supply source, and pumps corresponding to the respective... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100116292 - System and method for optimized gas turbine compressor cleaning and performance measurement: The present invention is directed to a system and method for optimizing a wash procedure. Embodiments of the present invention are directed to a system for optimizing a wash procedure. In a first embodiment, the system comprises: means for collecting a sample of fouling, the sample comprising one or more... Agent: Ip Group Of Dla Piper LLP (us)
20100116294 - Process gas filtration: The present invention relates to a spray drying system provided with a gas filtering system, which system is intended for use in the pharmaceutical industry for aseptic production of sterile pharmaceutical products or in other industries e.g. production of food, where an intake of sterile air for the drying process... Agent: Sughrue Mion, PLLC
20100116295 - method of cleaning returned beverage bottles in a bottle filling plant, a method of introducing treatment fluid into containers to remove contaminants therefrom in a container filling plant, and an arrangement therefor: A method of introducing treatment fluid into containers to remove contaminants therefrom in a container filling plant, and an arrangement therefor. The abstract of the disclosure is submitted herewith as required by 37 C.F.R. §1.72(b). As stated in 37 C.F.R. §1.72(b): A brief abstract of the technical disclosure in the... Agent: Nils H. Ljungman & Associates
20100116296 - Dishwasher having dedicated sprayer for silverware basket: A method and apparatus for providing multiple spray zones to different subportions of a silverware basket within the wash chamber of a dishwasher.... Agent: Whirlpool Patents Company - Md 0750
20100116297 - System and method for component recovery: A component recovery system, configured to refurbish components, includes a fluid feed tank, a refurbishment compartment having a fluid delivery element, a waste tank, fluid lines connecting the fluid feed tank to the fluid delivery element and the refurbishment compartment to the waste tank, and pumps for delivering fluid through... Agent: Kinney & Lange, P.A.
20100116298 - Steam appliance with motion switch: A steam appliance having a water pump controlled by a motion switch response to movement of the appliance is provided. In one embodiment, a micro-switch is turned ON and OFF by movement of a micro-switch actuator in operative engagement with the towel frame at the base if the appliance. In... Agent: Mccarter & English, LLP Stamford
20100116299 - Apparatus to process used materials: An apparatus (1) to process used materials for input into a manufacturing process. The apparatus includes a housing (10) having a top surface (15) and providing a plurality of chambers arranged in descending order. A series of locations (20) are positioned under said top surface and through which used materials... Agent: David A. Guerra International Patent Group, LLC
20100116300 - Stethoscope cleaning assembly: An assembly structured to clean the head portion of a stethoscope comprising a housing including a path of travel along which the head portion passes during cleaning. A supply of cleaning fluid is associated with a dispenser assembly which is cooperatively disposed relative to an activating assembly. The activating assembly... Agent: Malloy & Malloy, P.A.
20100116301 - Top spray device for dishwashers: A dishwasher is provided that includes a hydraulic system and a top spray device that is disposed above a washing product basket such as a cutlery drawer. The top spray device can be supplied with a washing solution via the hydraulic system and has a rotatable spray head that is... Agent: Bsh Home Appliances Corporation Intellectual Property Department
20100116302 - Device for cleaning a support: The invention relates to a device for cleaning a support comprising: a casing, at least one cleaning-liquid spray means mounted on the casing, characterized in that it also comprises means for adjusting a distance between the spray means and the support.... Agent: James C. Lydon05/06/2010 > patent applications in patent subcategories. archived by USPTO category
20100108092 - Ultrasonic powered sugarbeet and cut sugar cane cleaning method using a stainless steel flume: An improved method of cleaning topped/scalped sugar beets and field chopped sugar cane cuttings using ultrasonic energy by the utilization of water used to transport and clean the topped/scalped sugar beets, beet pieces, beet slices, beet noodles, and chopped sugar cane using a plurality of ultrasonic emitters lining the walls... Agent: Leon Edward Zaharis
20100108093 - Acoustic assisted single wafer wet clean for semiconductor wafer process: A method for cleaning a substrate is provided that includes applying a liquid medium to a surface of the substrate such that the liquid medium substantially covers a portion of the substrate that is being cleaned. One or more transducers are used to generate acoustic energy. The generated acoustic energy... Agent: Martine Penilla & Gencarella, LLP
20100108094 - Solvent composition for removing radioactive substance and removing material, and method for removing radioactive substance: The present invention relates to a solvent composition for removing radioactive substance, characterized by comprising at least one selected from hydrofluorocarbon, hydrofluoroether, and perfluoroketone as a medium for transporting the radioactive substance, and a method for removing a radioactive substance characterized by using the solvent composition for removing.... Agent: Workman Nydegger 1000 Eagle Gate Tower
20100108095 - Substrate processing apparatus and substrate cleaning method: Disclosed are a substrate processing apparatus and a substrate cleaning method to satisfactorily clean the entire circumferential periphery of a substrate, including an upper surface circumferential periphery, an end, and a lower surface circumferential periphery of the substrate. The substrate processing apparatus includes a substrate supporter to support the substrate,... Agent: Cantor Colburn, LLP
20100108096 - Liquid processing method and apparatus: A liquid processing method performs a liquid process after an etching target film formed on a surface of a substrate is etched through a hard mask layer used as an etching mask and having a predetermined pattern formed therein. The liquid process is used for removing the hard mask layer... Agent: Smith, Gambrell & Russell
20100108097 - Biochemical analyzer and method for cleaning fluid components of the same: There is provided a biochemical analyzer and a method of cleaning fluid components of the same. The biochemical analyzer includes a reagent adding mechanism, a sample adding mechanism, at least one reaction cup, a cleaning mechanism and a waste pipeline connected to the cleaning mechanism. A control system is employed,... Agent: Mindray C/o VistaIPLaw Group LLP
20100108099 - portable industrial vacuum system: An industrial vacuum system which is contained in a portable container having a bottom and an open end and includes an extension unit having a first end operatively connected to the portable container and a second end that is selectively extendable away from the container, a collection unit rotatively coupled... Agent: Sonnenschein Nath & Rosenthal LLP
20100108098 - Cleaning nozzle and method for vacuum cleaning: The invention relates to a vacuum cleaner nozzle (1) bounding an inlet (2) for guiding aspirated air through the nozzle (1). The nozzle (1) comprises a rim (3, 4) along an outer end contour of the inlet (2) for contacting a floor surface area (6) when in an operating position... Agent: Philips Intellectual Property & Standards
20100108100 - Ready mix truck wash: A ready mix truck wash system includes at least one spray arch fluidly connected to a pump, a motor, and controls. The spray arch has a plurality of pipes and spray nozzles configured to spray pressurized fluid onto a ready mix truck. In one embodiment, the ready mix truck is... Agent: Kinney & Lange, P.A.
20100108101 - Sample processing apparatus and cleaning method: The present invention is to present a sample processing apparatus, comprising: a sample processing mechanism which comprises a flow channel to be used for processing a sample, and performs a sample processing operation for processing the sample using the flow channel and a cleaning operation for cleaning the flow channel;... Agent: Sughrue Mion, PLLC
20100108102 - Dishwasher with mist cleaning: A dishwasher having a liquid spraying system operable in a first mode to spray a focused stream of liquid within the wash chamber, and operable in a second mode to spray a diffused stream of liquid within the wash chamber.... Agent: Whirlpool Patents Company - Md 0750
20100108103 - Cleaning apparatus, cleaning method and recording medium: Disclosed are a cleaning apparatus and a cleaning method, which can collect a chemical liquid without reducing the throughput after a substrate is subjected to a cleaning treatment and dried by using a drying solvent, such as IPA. The disclosed cleaning apparatus carries out a chemical liquid cleaning treatment, a... Agent: Cantor Colburn, LLP
20100108104 - Jetspray nozzle and method for cleaning photo masks and semiconductor wafers: A jetspray nozzle for cleaning a photolithographic mask or semiconductor wafer and method for cleaning the same. The jetspray nozzle in one embodiment includes a water supply inlet, a gas supply inlet, a first row of gas injection nozzles communicating with the gas supply inlet, a mixing cavity defining a... Agent: Duane Morris LLP (tsmc)IPDepartment
20100108112 - Method for supplying clear rinsing agents in a program-controlled dishwasher: A device for checking the concentration of clear rinsing agent in a rinsing liquid circulated in the means for retaining water of a household appliance is provided. The device includes a processing unit operatively connectable to a sensor having at least one transmitting element that emits an optical signal and... Agent: Bsh Home Appliances Corporation Intellectual Property Department
20100108105 - Water-conducting domestic appliance comprising a detergent dosing system and cartridge therefor: A water-conducting domestic appliance, in particular a domestic dishwasher, the water-conducting domestic appliance including a washing compartment for receiving items therein that are to be subjected to a handling process by the water-conducting domestic appliance; and a detergent dosing system, the detergent dosing system having a detergent dispenser with a... Agent: Bsh Home Appliances Corporation Intellectual Property Department
20100108106 - Substrate cleaning apparatus: A chemical solution is mixed to deionized water from a chemical cartridge 29 via a chemical supply unit 27 to produce a treating liquid. Then, the treating liquid is supplied to a treating tank via a supply pipe. The chemical cartridge 29 is not supplemented with the chemical solution through... Agent: Ostrolenk Faber Gerb & Soffen
20100108107 - System and apparatus for fluoride ion cleaning: System and apparatuses for utilizing in-situ generated hydrogen fluoride (HF) in a cleaning process. An exemplary system includes a cleaning retort operable at a temperature sufficient to promote an in-situ reaction between a liquid or gaseous halogenated feedstock and hydrogen gas to form the HF. The system includes a liquid... Agent: General Electric Company
20100108108 - Substrate mounting table, substrate processing apparatus and method for treating surface of substrate mounting table: A substrate mounting table includes a mounting table main body whose top surface and side surface are covered with an upper cover member. Surface treatment is performed partially to a substrate surrounding region disposed outside a substrate mounting region on a top surface of the upper cover member, so that... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100108109 - Device incorporating a chamber through which fluid is adapted to flow and the use of a drawer guide in such a device: A drawer guide is provided for a dishwasher or other device through which there is a flow of liquid or gas. The drawer guide has guide rails and at least one rolling member assembly to guide the guide rails in a displaceable manner on another guide rail. A cage is... Agent: Lipsitz & Mcallister, LLC
20100108110 - Dish washing machine: Disclosed herein is a dish washing machine including a sump unit capable of supplying, to an injection nozzle, wash water flowing in accordance with operation of an impeller, without using a separate channel member. The dish washing machine includes a body provided with a washing tub, a sump unit arranged... Agent: Staas & Halsey LLP
20100108111 - Ultrasonic cleaning apparatus: An ultrasonic cleaning apparatus for cleaning an object to be cleaned by ultrasonic vibrations including: ultrasonic vibration generating means configured to generate a frequency modulated signal and generate the ultrasonic vibrations; and a cleaning tank configured to store cleaning liquid in which the object to be cleaned is to be... Agent: Frishauf, Holtz, Goodman & Chick, PCPrevious industry: Toilet
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