Cleaning and liquid contact with solids inventions 10/08

20080257379 - Method and equipment for the treatment of a surface of a work piece: A method for treating the surface of a work piece includes exposing the surface to be treated to a beam of electromagnetic radiation, and simultaneously exposing an area of the surface exposed to the beam of electromagnetic radiation at least partially to a plasma beam. This method provides an improved... Agent: Proskauer Rose LLP

20080257380 - Process of cleaning a substrate for microelectronic applications including directing mechanical energy through a fluid bath and apparatus of same: An apparatus of cleaning a workpiece for microelectronic applications can include fixture to help position the workpiece. In one aspect the apparatus can include a tank and a transducer. In another aspect the apparatus can include a nozzle. The fixture, the tank, the nozzle, or any combination thereof can include... Agent: Larson Newman Abel Polansky & White, LLP

20080257381 - Use of polyvinyl acetate dispersions for cleaning purposes: The invention relates to the use of dispersions containing polyvinyl acetate for cleaning purposes, for example for cleaning plaster floors, ceramic wall and floor linings, steps, window sills, gravestones, sculptures, and jointing materials. According to the invention, the dispersion containing polyvinyl acetate is applied to part or all of the... Agent: Wolf Greenfield & Sacks, P.C.

20080257384 - Bucket arrangement and method of using the same: An improved apparatus and a method of using the apparatus for cleaning tools, utensils, and other objects. The apparatus comprises a container, a first wiping element that is submerged in a liquid in the container capable of removing undesirable material from at least a portion of the object and a... Agent: Jennifer A. Calcagni Carmody & Torrance

20080257382 - Cleaning solution and wipes and method for cleaning: The present invention provides a cleaning solution, a wipe impregnated with the cleaning solution and packages/dispenser including such wipes which can be used to effectively clean a variety of articles such as optical lenses, optical glasses, camera and video camera lenses, head and face protective masks, scientific instruments including gauges,... Agent: Husch Blackwell Sanders, LLP Welsh & Katz

20080257383 - Method for semiconductor wafer fabrication utilizing a cleaning substrate: In one disclosed embodiment, the present method for semiconductor fabrication utilizing a cleaning substrate comprises loading a cleaning substrate capable of removing an undesirable particle from a semiconductor processing tool onto the tool, causing the undesirable particle to be attracted to the cleaning substrate, and unloading the cleaning substrate from... Agent: Farjami & Farjami LLP

20080257385 - Method and device for cleaning an electrode used in resistance point welding or a cap and device for resistance point welding: The invention relates to a method for cleaning an electrode (1) used in resistance point welding, particular a cap (2) which can be placed on the electrode. According to the invention, the electrode (1) and/or the cap (2) are impinged upon with a cold medium. The temperature difference between the... Agent: Blakely Sokoloff Taylor & Zafman LLP

20080257387 - Method and apparatus for cleaning ophthalmic lenses: The present invention relates to a method and a device for cleaning ophthalmic lenses, particularly contact lenses. The method and the device are suitable for integration into an automated production of ophthalmic lenses, particularly contact lenses.... Agent: Ciba Vision Corporation Patent Department

20080257386 - Water-based cleaning: A method of cleaning a surface, comprising applying de-gassed water (containing no more than 1 ppm gas) to the surface to disperse or dissolve dirt on the surface in the water. The method may also comprise dissolving hydrophobic dirt on the surface using a non-aqueous solvent, and dispersing the non-aqueous... Agent: Knobbe Martens Olson & Bear LLP

20080257390 - Method for selectively washing used reaction cuvettes in an automatic analyzer: A method for cleansing used reaction cuvettes so that whenever certain assays are to be or have been performed in the reaction cuvette, the cuvette is automatically subjected to an additional cleaning operation by providing a number of washing and drying manifolds, each of which is independently selectively activated to... Agent: Dade Behring Inc. Legal Department

20080257391 - Pass-through dishwasher with controlled drying: A pass-through dishwasher is provided having at least one washing zone, at least one rinsing zone and a drying zone. The pass-through dishwasher is used to clean items to be washed and comprises a conveyor device for conveying the items to be washed through successive treatment zones. The pass-through dishwasher... Agent: Muncy, Geissler, Olds & Lowe, PLLC

20080257388 - Gaming chip washing machine: A machine for cleaning gaming chips or coins which includes means to convey individual coins or chips to a carrier wheel consisting of a vertically oriented disc having arranged about its periphery a plurality of coin or chip sized open recesses to receive individual coins or chips so that the... Agent: Greenberg Traurig

20080257389 - Devices, assemblies, and methods for extracting extractable materials from polymerized biomedical devices: A biomedical device carrier includes multiple recesses for holding a plurality of polymerized biomedical devices, such as polymerized ophthalmic lenses, during an extraction procedure. A biomedical device extraction assembly includes multiple biomedical device carriers. The structure of the individual carriers and the arrangement of the carriers in the assembly provide... Agent: Klein, O'neil & Singh, LLP

20080257379 - Method and equipment for the treatment of a surface of a work piece: A method for treating the surface of a work piece includes exposing the surface to be treated to a beam of electromagnetic radiation, and simultaneously exposing an area of the surface exposed to the beam of electromagnetic radiation at least partially to a plasma beam. This method provides an improved... Agent: Proskauer Rose LLP

20080257380 - Process of cleaning a substrate for microelectronic applications including directing mechanical energy through a fluid bath and apparatus of same: An apparatus of cleaning a workpiece for microelectronic applications can include fixture to help position the workpiece. In one aspect the apparatus can include a tank and a transducer. In another aspect the apparatus can include a nozzle. The fixture, the tank, the nozzle, or any combination thereof can include... Agent: Larson Newman Abel Polansky & White, LLP

20080257381 - Use of polyvinyl acetate dispersions for cleaning purposes: The invention relates to the use of dispersions containing polyvinyl acetate for cleaning purposes, for example for cleaning plaster floors, ceramic wall and floor linings, steps, window sills, gravestones, sculptures, and jointing materials. According to the invention, the dispersion containing polyvinyl acetate is applied to part or all of the... Agent: Wolf Greenfield & Sacks, P.C.

20080257384 - Bucket arrangement and method of using the same: An improved apparatus and a method of using the apparatus for cleaning tools, utensils, and other objects. The apparatus comprises a container, a first wiping element that is submerged in a liquid in the container capable of removing undesirable material from at least a portion of the object and a... Agent: Jennifer A. Calcagni Carmody & Torrance

20080257382 - Cleaning solution and wipes and method for cleaning: The present invention provides a cleaning solution, a wipe impregnated with the cleaning solution and packages/dispenser including such wipes which can be used to effectively clean a variety of articles such as optical lenses, optical glasses, camera and video camera lenses, head and face protective masks, scientific instruments including gauges,... Agent: Husch Blackwell Sanders, LLP Welsh & Katz

20080257383 - Method for semiconductor wafer fabrication utilizing a cleaning substrate: In one disclosed embodiment, the present method for semiconductor fabrication utilizing a cleaning substrate comprises loading a cleaning substrate capable of removing an undesirable particle from a semiconductor processing tool onto the tool, causing the undesirable particle to be attracted to the cleaning substrate, and unloading the cleaning substrate from... Agent: Farjami & Farjami LLP

20080257385 - Method and device for cleaning an electrode used in resistance point welding or a cap and device for resistance point welding: The invention relates to a method for cleaning an electrode (1) used in resistance point welding, particular a cap (2) which can be placed on the electrode. According to the invention, the electrode (1) and/or the cap (2) are impinged upon with a cold medium. The temperature difference between the... Agent: Blakely Sokoloff Taylor & Zafman LLP

20080257387 - Method and apparatus for cleaning ophthalmic lenses: The present invention relates to a method and a device for cleaning ophthalmic lenses, particularly contact lenses. The method and the device are suitable for integration into an automated production of ophthalmic lenses, particularly contact lenses.... Agent: Ciba Vision Corporation Patent Department

20080257386 - Water-based cleaning: A method of cleaning a surface, comprising applying de-gassed water (containing no more than 1 ppm gas) to the surface to disperse or dissolve dirt on the surface in the water. The method may also comprise dissolving hydrophobic dirt on the surface using a non-aqueous solvent, and dispersing the non-aqueous... Agent: Knobbe Martens Olson & Bear LLP

20080257390 - Method for selectively washing used reaction cuvettes in an automatic analyzer: A method for cleansing used reaction cuvettes so that whenever certain assays are to be or have been performed in the reaction cuvette, the cuvette is automatically subjected to an additional cleaning operation by providing a number of washing and drying manifolds, each of which is independently selectively activated to... Agent: Dade Behring Inc. Legal Department

20080257391 - Pass-through dishwasher with controlled drying: A pass-through dishwasher is provided having at least one washing zone, at least one rinsing zone and a drying zone. The pass-through dishwasher is used to clean items to be washed and comprises a conveyor device for conveying the items to be washed through successive treatment zones. The pass-through dishwasher... Agent: Muncy, Geissler, Olds & Lowe, PLLC

20080257388 - Gaming chip washing machine: A machine for cleaning gaming chips or coins which includes means to convey individual coins or chips to a carrier wheel consisting of a vertically oriented disc having arranged about its periphery a plurality of coin or chip sized open recesses to receive individual coins or chips so that the... Agent: Greenberg Traurig

20080257389 - Devices, assemblies, and methods for extracting extractable materials from polymerized biomedical devices: A biomedical device carrier includes multiple recesses for holding a plurality of polymerized biomedical devices, such as polymerized ophthalmic lenses, during an extraction procedure. A biomedical device extraction assembly includes multiple biomedical device carriers. The structure of the individual carriers and the arrangement of the carriers in the assembly provide... Agent: Klein, O'neil & Singh, LLP

20080251100 - Method for cleaning photo mask: The present invention provides a method for cleaning a photo mask without the need for removal of the pellicle mounted on the photo mask, without the large scale equipment for washing with a solution, with a small number of steps for cleaning and inspection, and without the increase of the... Agent: Ladas & Parry LLP

20080251099 - Method for removing smear and magnetic recording/reproducing apparatus with function of removing smear: Provided is a smear-removing method that can remove smear of a manufactured thin-film magnetic head. The method is performed to a thin-film magnetic head including an MR effect element for reading data having two electrode layers sandwiching an MR effect multilayer as a magneto-sensitive portion therebetween. The method comprises the... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080251101 - Substrate cleaning method, substrate cleaning equipment, computer program, and program recording medium: In a dry process after a cleaning process using a cleaning-liquid nozzle and a rinse process using a side rinse nozzle are performed on a wafer W, the wafer W is turned, feeding of pure water to a center point of the wafer W from a pure-water nozzle is started,... Agent: Smith, Gambrell & Russell

20080251102 - Cleaning device for endoscopic devices: A device for cleaning an endoscopic device is disclosed. The device has a flexible sleeve movable between a collapsed position and an extended position. The sleeve has an opening at its proximal end. A cleaning tool is disposed within the sleeve. Further, cleaning fluid is included within the sleeve. A... Agent: Calfee Halter & Griswold, LLP

20080251103 - Method for activating surface of base material and apparatus thereof: A method for activating the surface of a base material and an apparatus thereof, which is suited to be utilized for pretreatment in electrochemical treatment such as, for example, electroplating or the like, in which the surface of a base material such as metal can be subjected to degreasing treatment... Agent: Jordan And Hamburg LLP

20080251104 - Systems and methods for determination of endpoint of chamber cleaning processes: Apparatus and method for determination of the endpoint of a cleaning process in which cleaning fluid is contacted with a structure to effect cleaning thereof. The cleaning process includes contacting a cleaning fluid with a structure to be cleaned and producing a cleaning effluent having a sensible heat thermal energy... Agent: Intellectual Property / Technology Law

20080251105 - Cleaning compositions comprising hydrogen peroxide: The present invention is directed to cleaning compositions and cleaning systems comprising an anionic surfactant, a nonionic surfactant, lactic acid, hydrogen peroxide and water. In various embodiments, the compositions may further comprise an amphoteric or pseudo-cationic surfactant, an alcohol and a glycol ether solvent. The present invention is also directed... Agent: Colgate-palmolive Company

20080251106 - Process of cleaning a hard surface with zwitterionic copolymer: The present invention relates to a process of cleaning a hard surface with a composition comprising a specific water-soluble or water-dispersible copolymer, said process comprises the steps of applying said composition onto said surface in diluted form and leaving said diluted composition to dry on said surface without rinsing said... Agent: The Procter & Gamble Company Global Legal Department - Ip

20080251108 - Sulfuric acid recycling type cleaning system and a sulfuric acid recycling type persulfuric acid supply apparatus: If incorporated in a cleaning system using persulfuric acid, the invention serves for continuous cleaning while increasing the persulfuric acid concentration adequately to ensure enhanced cleaning performance. The invention provides a feeding apparatus that feeds persulfuric acid to a cleaning apparatus. The cleaning system uses an electrolysis reactor 10 that... Agent: Anderson, Kill & Olick, P.C.

20080251107 - Nozzle and a substrate processing apparatus including the same: A nozzle of a nozzle device includes an arm pipe that extends in a horizontal direction and a downstream pipe formed so as to curve downward from one end of the arm pipe. In the nozzle, a metallic pipe is provided inside a second resin pipe. Moreover, a first resin... Agent: Ostrolenk Faber Gerb & Soffen

20080245387 - Method for cleaning elements in vacuum chamber and apparatus for processing substrates: To clean an element in a vacuum chamber by causing particles sticking to the element to scatter, the present invention uses a means for applying a voltage to the element and causing the particles to scatter by utilizing Maxwell's stress, a means for electrically charging the particles and causing the... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080245388 - Method for cleaning elements in vacuum chamber and apparatus for processing substrates: To clean an element in a vacuum chamber by causing particles sticking to the element to scatter, the present invention uses a means for applying a voltage to the element and causing the particles to scatter by utilizing Maxwell's stress, a means for electrically charging the particles and causing the... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080245389 - Method for cleaning elements in vacuum chamber and apparatus for processing substrates: To clean an element in a vacuum chamber by causing particles sticking to the element to scatter, the present invention uses a means for applying a voltage to the element and causing the particles to scatter by utilizing Maxwell's stress, a means for electrically charging the particles and causing the... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080245390 - Method for cleaning semiconductor wafer surfaces by applying periodic shear stress to the cleaning solution: Systems and methods for cleaning particulate contaminants adhered to wafer surfaces are provided. A cleaning media including dispersed coupling elements suspended within the cleaning media is applied over a wafer surface. External energy is applied to the cleaning media to generate periodic shear stresses within the media. The periodic shear... Agent: Martine Penilla & Gencarella, LLP

20080245391 - System and method for wiping a windshield: A system and a method for wiping a windshield are provided here. The system may include a first elongated member and a second elongated member. Both members are coupled to each other. The distance between the members may be adjusted to sandwich the windshield between them. The system may be... Agent: Law Office Of Martin E. Jerisat

20080245392 - Washing a tub or a drum in a washing machine: The present invention relates to a method for washing a washing tub (120) in a washing machine, and a washing machine having a washing tub washing course provided thereto for enabling washing tub (120) washing by the same, and more particularly, to a method for which makes effective washing tub... Agent: Mckenna Long & Aldridge LLP

20080245393 - Washing apparatus: e

20080245394 - Conveyor-type dishwasher and method for operating it: A conveyor-type dish washer and method of operating it, wherein items to be cleaned are conveyed through the dishwasher and are subjected to the action of steam prior to a final-rinse operation but after a wash operation.... Agent: Thompson Hine LLP Intellectual Property Group

20080245395 - Antimicrobial compositions and methods: Antimicrobial compositions and methods eradicate and remove fungi and bacteria from indoor and outdoor structures and materials including porous substrates. The antimicrobial compositions can be made from gel precursors, utilized in gel states and adjusted to reduce the viscosity for applications where low viscosity is advantageous. The antimicrobial compositions applied... Agent: Walter L. Beavers

20080245396 - Inflatable splash washer and method: A method for discharging a fluid in an inflated assembly. The method includes inflating a roller assembly having a roller, rotatably coupling the inflated roller assembly to an inflated structure, and discharging a fluid against the inflated roller assembly to cause the inflated roller to rotate. An inflated water toy... Agent: Law Offices Of John W. Carpenter

20080236613 - Apparatus and method for removing dust from optical lenses: An exemplary dust removing apparatus applicable for removing dust or dirt from a surface of an optical lens is provided. The dust removing apparatus includes an ultrasonic oscillation device, at least a dust removing device, and a tray. The ultrasonic oscillation device is configured for causing an ultrasonic vibration of... Agent: PCe Industry, Inc. Att. Cheng-ju Chiang

20080236614 - Plasma processing apparatus and plasma processing method: A plasma processing apparatus includes a vacuum chamber, a processing chamber housed in the vacuum chamber, and a sample stage located in the processing chamber, for supporting on its upper surface a disk-like sample to be processed, wherein plural disk-like samples are continuously processed with plasma generated in the processing... Agent: Antonelli, Terry, Stout & Kraus, LLP

20080236615 - Method of processing wafers in a sequential fashion: A method and apparatus for processing two substrates is provided. The apparatus comprises a chamber having an upper opening, a lower process volume adapted to retain a process solution, and an upper process volume, wherein the chamber is proportioned to vertically process two substrates. The apparatus further comprises a substrate... Agent: Patterson & Sheridan, LLP - - Appm/tx

20080236616 - Method and apparatus for commissioning power plants: An apparatus and method for commissioning steam turbine generator power plants to advance the cleanliness of the complete steam cycle by the conditioned discharge of steam to the plant surface condenser.... Agent: Burns & Levinson, LLP

20080236618 - Cleaning of bonded silicon electrodes: Methods of cleaning plasma processing chamber components include contacting surfaces of the components with a cleaning solution, while avoiding damage of other surfaces or areas of the components by the cleaning solution. An exemplary plasma processing chamber component to be cleaning is an elastomer bonded electrode assembly having a silicon... Agent: Buchanan, Ingersoll & Rooney PC

20080236619 - Cobalt capping surface preparation in microelectronics manufacture: Cleaning compositions and methods in connection with cobalt-based capping of interconnects in integrated circuit semiconductor devices.... Agent: Senniger Powers LLP

20080236617 - Use of dilute hydrochloric acid in advanced interconnect contact clean in nickel semiconductor technologies: A method for cleaning oxide from the interconnects of a semiconductor that are comprised of nickel (Ni) silicide or nickel-silicide alloys where nickel is the primary metallic component is disclosed. The cleaning comprises performing an SC1 cycle, exposing the wafer comprising a NiSi contact to an SC1 solution. This removes... Agent: International Business Machines Corporation Dept. 18g

20080236620 - Methodology for cleaning of surface metal contamination from electrode assemblies: Systematic and effective methodology to clean capacitively coupled plasma reactor electrodes and reduce surface roughness so that the cleaned electrodes meet surface contamination specifications and manufacturing yields are enhanced. Pre-cleaning of tools used in the cleaning process helps prevent contamination of the electrode being cleaned.... Agent: Buchanan, Ingersoll & Rooney PC

20080236622 - Control method of dish washing machine: A method for controlling a home appliance is disclosed. The method includes selecting one of a plurality of steam washing modes for washing dishes. Each steam washing mode has a corresponding steam washing pattern. Selecting the number of steam washing pattern cycles for the selected steam washing mode, or selecting... Agent: Mckenna Long & Aldridge LLP

20080236625 - Control method of dish washing machine: A method for controlling a dish washing machine having a steam generator is disclosed. The control method includes initially supplying water into a steam generator to supply stream to dishes and deciding a water replenishment pattern during the steam operation of the steam generator, based on the initial amount of... Agent: Mckenna Long & Aldridge LLP

20080236621 - Integrated washer and sterilizer: A method and apparatus provides for cleaning and sterilizing a device in one machine. The method comprises the steps of: a) placing the device into a container; b) placing the container into a washing/sterilization apparatus; c) the washing/sterilization apparatus washing the device by applying a washing fluid to an interior... Agent: K&l Gates LLP

20080236627 - Method for cleaning web-like object to be cleaned and apparatus using the same: m

20080236624 - Method for controlling a dish washing machine: A dish washing machine and a control method of the same are disclosed. The control method of a dish washing machine includes supplying water into a washing compartment through spray arms, a first supplying steam, generated by a first steam generator, into the washing compartment, and when the abnormal operation... Agent: Mckenna Long & Aldridge LLP

20080236623 - Method for controlling dish washing machine: A method for controlling a dish washing machine is disclosed. The disclosed method includes turning off a heater of a steam generator when a water level sensor for the steam generator indicates a minimum water level, supplying water to the steam generator for a first time, to remove air bubbles... Agent: Mckenna Long & Aldridge LLP

20080236626 - Non-electric powered automatic washing apparatus: The present invention is directed to a non-electric hand-washing apparatus. The present invention is adapted to be used in connection with a supply of pressurized water. The present invention utilizes the water pressure to power at least a timing mechanism that operates to control a wash cycle. The wash cycle... Agent: Sheridan Ross PC

20080236628 - Pool cleaner with high pressure cleaning jets: A pool cleaning apparatus includes a housing and a pump for drawing water and debris through an intake port into a filter. A jet-valve housing having a jet valve flap is mounted over the pump to direct a propulsion jet stream from the pump to move the cleaner in a... Agent: Abelman, Frayne & Schwab

20080236629 - Cleaning method for turbo molecular pump: A cleaning method for a turbo molecular pump, which enables the exhausting ability of the turbo molecular pump to be restored without bringing about a decrease in the productivity of a substrate processing apparatus. A vaporizing gas that vaporizes foreign matter attached to an internal surface of the turbo molecular... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080236630 - Dish washer and method of controlling the same: Disclosed are a dish washer and a method of controlling the same, in which the amount of water consumed is reduced and a washing time is maintained while assuring a washing performance. The dish washer includes a washing tub; dish baskets provided in the washing tub to accommodate dishes; and... Agent: Staas & Halsey LLP

20080236631 - Washer and decontaminator with lid control: A method and apparatus provide for automatically cleaning and decontaminating medical instruments. The method comprising the steps of: a) placing the medical instruments into a container after their use in a medical procedure; b) closing the container to seal the instruments inside whereby to prevent personnel contact with the instruments... Agent: K&l Gates LLP

20080236632 - Smudge removal from electronic device displays: An apparatus and method is provided for removing smudges (506, 706, 806, 906) including oils and dust from portable electronic displays. The apparatus comprises a display device (110, 150, 500, 700, 800, 900, 1000) positioned within a housing (102, 104, 808), comprising a transparent cover (302, 502, 702, 802, 902,... Agent: Ingrassia Fisher & Lorenz, P.C. (mot)

20080236633 - Method and device for cleaning welding torches with co2 dry ice: The invention relates to a process and devices for cleaning welding torches, for example in automated welding lines, on welding robots and in single-piece production, by means of a cold medium, preferably CO2 dry ice, the CO2 snow produced by expanding the pressurised liquid CO2 being directly applied with low... Agent: Collard & Roe, P.C.

20080236639 - Substrate treating apparatus: A substrate treating apparatus for treating substrates with a treating liquid includes a treating tank having an inner tank for storing the treating liquid, and an outer tank for collecting the treating liquid overflowing the inner tank. A supply pipe interconnects the inner tank and the outer tank for circulating... Agent: Ostrolenk Faber Gerb & Soffen

20080236634 - Substrate processing system and substrate cleaning apparatus: A substrate processing system that enables foreign matter adhered to a rear surface or a periphery of a substrate to be completely removed. A substrate processing apparatus performs predetermined processing on the substrate. A substrate cleaning apparatus cleans the substrate at least one of before and after the predetermined processing.... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080236635 - Steam mop: A steam mop having a main body with a boiler, a water container, a mechanical water pump between the boiler and container and at least one side arm connecting the boiler steam outlet to a fabric steam pocket frame. The water pump is actuated by movement of the mop when... Agent: Michael I. Wolfson Greenberg Traurig, LLP

20080236636 - Dishwasher: The present invention relates to a dishwasher. A dishwasher includes a washing tub in which dishes are placed, a steam generator that generates steam and a nozzle part in which a flow direction of the steam is diverted at least one time to allow the steam exhausted to the washing... Agent: Mckenna Long & Aldridge LLP

20080236637 - Dishwasher and sound-insulation member therefor: A dishwasher is provided which can reduce the discharge of noise produced by the dishwasher, thereby preventing a user from being upset due to the noise and achieving not only a comfortable use environment but also an improvement in productivity. With the dishwasher, it is possible to prevent the noise,... Agent: Ked & Associates, LLP

20080236638 - Dishwasher pump apparatus with a sound absorbing layer: A dishwasher pump apparatus includes a liquid pump member, a motor operably connected to the liquid pump member and a cooling fan configured to cool the motor. The cooling fan includes an outer fan housing. Example dishwasher pump apparatus can further include an outer sound absorbing layer at least partially... Agent: Pearne & Gordon LLP