Cleaning and liquid contact with solids inventions 09/08

20080230088 - method and system for washing a sedimentation device in a water treatment system using ultrasonic: This invention discloses a method and system for washing a sedimentation device in a water treatment system using ultrasonic. The system includes an ultrasonic transmitting device for transmitting the ultrasonic of a predetermined power and transmitting frequency to the sedimentation device. The system may further include a carrying device positioned... Agent: Stevens Law Group

20080230089 - Aqueous washing system and method: An aqueous washing system and method of operation for washing of articles such as engineering components, including curing of resin impregnated porous metal components, comprising placing the articles into a process chamber (10) and supplying from a supply tank (11) an aqueous washing fluid at a temperature at or above... Agent: Gauthier & Connors, LLP

20080230090 - Removal of niobium second phase particle deposits from pickled zirconium-niobium alloys: The present invention relates generally to a process and chemical composition for the removal of adherent niobium-rich second-phase particles (SPPs) from pickled niobium-containing zirconium alloys which includes applying to the alloy surface a chemical composition comprising alkaline hydrogen peroxide; an alkali metal meta-silicate; and a magnesium salt.... Agent: Westinghouse Electric Company, LLC

20080230091 - Rotisserie skewer, basket and parts cleaning assembly: A rotisserie skewer, basket and parts cleaning assembly is provided. The assembly is located within a wash tank that includes a jet nozzle to expel a stream of fluid into said wash tank. The assembly is rotatably mounted within the wash tank and is capable of holding parts for cleaning.... Agent: Sonnenschein Nath & Rosenthal LLP

20080230092 - Method and apparatus for single-substrate cleaning: A single-substrate cleaning apparatus and method of use are described. In an embodiment of the present invention, a liquid cleaning solution is dispensed in small volumes to form a substantially uniform static liquid layer over a substrate surface by atomizing the viscous liquid with an inert gas in a two-phase... Agent: Applied Materials/bstz Blakely Sokoloff Taylor & Zafman LLP

20080230093 - Apparatus, vehicle and method for cleaning surfaces fouled with chewing gum: The invention relates to an apparatus for cleaning diverse types of surface, such as public highways, pavements, squares and so on. The invention also relates to a vehicle for cleaning such surfaces. The invention further relates to a method for cleaning such surfaces.... Agent: The Webb Law Firm, P.C.

20080230095 - Cleaning compositions and methods: A cleaning composition comprises a water-in-oil emulsion which upon breakdown of the emulsion undergoes a physical change which is accompanied by an increase in the temperature of the composition.... Agent: Norris, Mclaughlin & Marcus

20080230094 - Method to inhibit growth of microorganisms in aqueous systems and on substrates using persulfate and a bromide: The invention is a method to inhibit the growth of at least one microorganism in an aqueous system capable of supporting such growth. This includes controlling, and preferably preventing, slime formation in the aqueous system. The method mixes a persulfate salt, a bromide salt, and water under conditions sufficient to... Agent: Nixon Peabody, LLP

20080230101 - Substrate treating apparatus: A substrate treating apparatus for treating substrates with treating liquids. The apparatus includes a treating tank for storing the treating liquids, a holding mechanism for holding the substrates and placing the substrates in a treating position inside the treating tank, a first treating liquid supply device for supplying a first... Agent: Ostrolenk Faber Gerb & Soffen

20080230096 - Substrate cleaning device and substrate processing apparatus: The device forms a flow of a back-side gas over a back-side surface of the end portion of the wafer undergoing a cleaning process executed by radiating an electromagnetic wave such as an ultraviolet ray onto the end portion of the wafer. During the cleaning process, a flow of front-side... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080230097 - Methods for processing wafer surfaces using thin, high velocity fluid layer: Among the many embodiment, in one embodiment, a method for processing a substrate is disclosed which includes generating a fluid layer on a surface of the substrate, the fluid layer defining a fluid meniscus. The generating includes moving a head in proximity to the surface, applying a fluid from the... Agent: Martine Penilla & Gencarella, LLP

20080230098 - Cooling/heating system for co2 cleaning machine: The invention relates to a system for cleaning articles with liquid or supercritical carbon dioxide consisting of a cleaning chamber, a storage tank, a still with a vaporizer and a tube connecting said still with said storage tank, wherein said tube comprises a condenser. Heat is transferred between vaporizer and... Agent: The Boc Group, Inc.

20080230099 - Stethoscope cleaning assembly: An assembly structured to clean the head portion of a stethoscope comprising a housing including a path of travel along which the head portion passes during cleaning. A supply of cleaning fluid is associated with a dispensing assembly which is cooperatively disposed relative to an activating assembly. The activating assembly... Agent: Malloy & Malloy, P.A.

20080230100 - Nozzle assembly: A nozzle assembly for use in cleaning tubular members of a tube-type heat exchange having a protective coating. A metal nozzle core for communicating with a source of high-pressure water is covered at an exterior portion thereof with a plastic nozzle sleeve for engagement with the heat exchanger. A circumferential... Agent: Kratz, Quintos & Hanson, LLP

20080223399 - Substrate processing apparatus, substrate processing method and storage medium: A substrate processing apparatus includes: a mounting table to have the substrate placed thereon in a process chamber; a first temperature adjusting mechanism temperature-adjusting the substrate placed on the mounting table; a lifter mechanism lifting up the substrate from the mounting table in the process chamber; and a second temperature... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080223400 - Substrate processing apparatus, substrate processing method and storage medium: A substrate processing apparatus includes: a support member supporting a substrate in a process chamber; a first temperature adjusting member in thermal contact with the support member; and a second temperature adjusting member capable of thermally coming into contact with and separating from the support member, wherein the first temperature... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080223401 - Cleaning hardware kit for composite showerhead electrode assemblies for plasma processing apparatuses: Apparatus to clean silicon electrode assembly surfaces which controls or eliminates possible chemical attack of electrode assembly bonding materials, and eliminates direct handling contact with the parts to be cleaned during acid treatment, spray rinse, blow dry, bake and bagging. Aspects of the apparatus include a kit including an electrode... Agent: Buchanan, Ingersoll & Rooney PC

20080223402 - Disk-shaped substrate manufacturing method and washing apparatus: The disk-shaped substrate manufacturing method is provided with: scrub-washing a first surface and a second surface of a disk-shaped substrate by respectively using a first porous roller and a second porous roller that have a cylindrical shape and are rotationally driven. The process of the scrub-washing determines a distance between... Agent: Sughrue Mion, PLLC

20080223403 - System for handling gases when treating the interior of a vehicle: A portable system (8) for handling gases when treating a surface within an interior space of an object. The object has one or more openings (20a, 22) that can be used as an inlet opening (26) and one or more openings that can be used as an outlet opening (28).... Agent: Battelle Memorial Institute

20080223404 - Space disinfection: A method for disinfecting a volume or surfaces bounding a volume comprising nebulizing a solution comprising a sterilizing agent in a solvent having a lower boiling point than the sterilizing agent, for example ultrasonic nebulization of aqueous hydrogen peroxide, to form a nebulant. The nebulant is subjected to energy of... Agent: Senniger Powers LLP

20080223405 - Apparatus and method for washing a vehicle: An apparatus for washing a vehicle having a first lateral side, a second lateral side, and a top side between the first lateral side and the second lateral side. The apparatus comprises a portal for allowing the vehicle to pass therethrough. The apparatus also comprises at least one nozzle mounted... Agent: Serge Allaire

20080223406 - Carbon dioxide cleaning method: A method for cleaning objects is disclosed. The method includes placing the objects into a cleaning chamber and contacting them with a dense phase gas. After draining the dense phase gas from the cleaning chamber, the pressure in the cleaning chamber is changed at a rate of at least 1... Agent: Crowell & Moring LLP Intellectual Property Group

20080223407 - Vacuum cleaner equipped with agitator and clutch assembly: An upright vacuum cleaner includes a nozzle assembly having a suction inlet and a rotary agitator. A canister assembly is pivotally connected to the nozzle assembly. The vacuum cleaner also includes a suction generator and a dirt collection vessel. Still further, the vacuum cleaner includes a clutch assembly for controlling... Agent: King & Schickli, PLLC

20080223409 - Method and apparatus for extending equipment uptime in ion implantation: An in situ cleaning system is disclosed for use with semiconductor processing equipment. In accordance with an important aspect of the invention, the cleaning system provides for dynamic cleaning of the semiconductor processing system by varying the pressure of the cleaning gas over time during a cleaning cycle. In particular,... Agent: Patent Administrator Katten Muchin Rosenman LLP

20080223408 - System & method for preventing scaling in a flue gas desulphurization system: A system & Method for Preventing Scaling in a Flue Gas Desulphurization System is provided. The system includes an injector configured to direct a barrier fluid toward a surface that is otherwise susceptible to scaling when it comes in contact with super-saturated alkaline solutions such as slurry used to capture... Agent: Alstom Power Inc. Intellectual Property Law Dept.

20080223410 - Cleaning a plurality of supply lines: The fluid supply apparatus includes a plurality of supply lines (308), each line having an outlet control device (328) configurable to either allow or prevent fluid in the line flowing to a shared outlet conduit (326). A controller (332) sets the outlet control devices of one or more of the... Agent: King & Schickli, PLLC

20080223411 - Substrate processing apparatus and substrate processing method: A substrate processing apparatus of a simplified structure, which is capable of decreasing an amount of a process liquid to be used, and of restraining change in temperature of the process liquid is provided. The substrate processing apparatus includes: a processing unit that holds one substrate and processes the substrate... Agent: Smith, Gambrell & Russell

20080223412 - Substrate support member and apparatus and method for treating substrate with the same: A substrate support unit supplies a swirl flow to a substrate to rotate and float the substrate from a chuck plate during a process. A process is performed while rotating and floating the substrate. Thus, the substrate is supported and rotates at a process speed while floating form the chuck... Agent: Jenkins, Wilson, Taylor & Hunt, P. A.

20080223415 - Chamber for wafer cleaning and method for making the same: A wafer processing chamber “chamber” is provided. Broadly speaking, the chamber allows a fluid flow and a fluid pressure within the chamber to be controlled in a variable manner. More specifically, the chamber utilizes removable plates that can be configured to control the fluid flow and the fluid pressure in... Agent: Martine Penilla & Gencarella, LLP

20080223413 - Color changing soap: A color changing soap dispenser having a reservoir and a pump. The reservoir contains a color changing soap. The color changing soap contains a soap composition comprising water and a surfactant, an indicator dye which exhibits an observable color change at a color change pH, and a base selected from... Agent: Legal Department (m-495)

20080223414 - Compositions and methods for removing titanium dioxide from surfaces: Compositions for removing titanium dioxide-containing materials located on a surface of a piece of process equipment generally include an aqueous carrier and a polycarboxylic acid component in an amount effective to provide the composition with an acidic pH in a range of between about 4.0 to about 5.0. The compositions... Agent: Stout, Uxa, Buyan & Mullins LLP

20080223416 - Metal cleaning agent and method for cleaning metal parts: A cleaning agent for metal parts (e.g., steel articles) includes sodium hydroxide in an approximate amount of 15 wt % (percent by weight) to 25 wt %, sodium tripolyphosphate in an approximate amount of 6 wt % to 9 wt %, sodium metasilicate in an approximate amount of 48 wt... Agent: PCe Industry, Inc. Att. Cheng-ju Chiang

20080223421 - Dishwasher and method for production thereof: A dishwasher includes a washing container provided with a washing tub and a housing cover which is connected to the washing tub. The washing tub is provided with an inner tub and a plastic support in order to reduce the noise occurring when the washing liquid comes into contact with... Agent: Bsh Home Appliances Corporation Intellectual Property Department

20080223417 - Washing agent dispenser for a household washing machine, in particular a dishwasher, and process for manufacturing said dispenser: A washing-agent dispenser for a household washing machine having a main casing, defining at least a container for a washing agent, and a member for closing the container. The closing member includes a substantially rigid body made of a first material, associated to which there are sealing means, made at... Agent: Heslin Rothenberg Farley & Mesiti PC

20080223418 - Device for cleaning and doping equipment for threads: A device for cleaning and doping (lubrication) equipment for threads (3b, 4b) of the type used to join pipes (4) to a pipe string (3), especially in connection with petroleum production, where cleaning fluid and dope (lubricant) are sprayed at the threads (3b, 4b) at relatively high pressure from at... Agent: Gable & Gotwals

20080223419 - Portable stain removing instrument from a dry-cleaned laundry: A portable stain removing instrument from a laundry is provided. The stain removing instrument of the current application is to remove stains from a laundry after cleaning. The stain removing instrument is comprised of a head set, which has pluralities of small holes developed on the upper surface of an... Agent: Bong Ha Chun

20080223420 - Dish washing machine preventing excessive water pressure: Disclosed herein is a dish washing machine that is capable of preventing the unintentional drainage of some wash water by the increase of the water pressure in a sump due to the excessive accumulation of filth in the sump. The dish washing machine includes a washing tub, at least one... Agent: Staas & Halsey LLP

20080216863 - Methods and apparatus for monitoring the rotation of a substrate during cleaning: Systems, methods, and apparatus for monitoring rotation of a substrate during cleaning are disclosed. The invention may include a substrate cleaner adapted to support and clean a substrate; an optical source adapted to provide a light beam having a path within the substrate cleaner; and an optical sensor positioned along... Agent: Dugan & Dugan, Pc

20080216864 - Method and system for distributing gas for a bevel edge etcher: A plasma etch processing chamber configured to clean a bevel edge of a substrate is provided. The chamber includes a bottom edge electrode and a top edge electrode defined over the bottom edge electrode. The top edge electrode and the bottom edge electrode are configured to generate a cleaning plasma... Agent: Martine Penilla & Gencarella, LLP

20080216865 - Plasma processing method: The invention provides a plasma processing method capable of reducing particle caused by flinging up of particles by airflow due to the pressure fluctuation in the processing chamber during the time the sample is carried into the processing chamber, subjected to plasma processing and carried out of the processing chamber.... Agent: Antonelli, Terry, Stout & Kraus, LLP

20080216866 - Surface treatment process and applicator: A packaged cleaning composition and process for cleaning a surface involves the simultaneous application of two liquids to the surface, such that a self-supporting gel is formed, acting on soil while delaying it from drying out. The gel and entrained soil are subsequently removed.... Agent: Norris, Mclaughlin & Marcus

20080216868 - Method for wiping a window, and wiper system, in particular for a motor vehicle: A process is disclosed for wiping a glass pane (10), in particular a windshield of a motor vehicle. A first wiping lever (12) and a second wiping lever (20) oscillate in a continuous stage of operation between a first reversal position (U1) and a second reversal position (U2). According to... Agent: Michael J. Striker

20080216867 - Methods and apparatus for cleaning an edge of a substrate: In one aspect, an apparatus for cleaning an edge of a substrate is provided. The apparatus includes (1) one or more rollers of a first diameter adapted to contact an edge of a substrate and rotate the substrate; and (2) one or more rollers of a second diameter that is... Agent: Dugan & Dugan, Pc

20080216869 - Systems and methods for robotic gutter cleaning along an axis of rotation: In embodiments of the present invention, a gutter-cleaning device comprises a housing containing an impeller drive facility, the housing configured to fit into a gutter, an impeller, disposed at an end of the housing and driven by the impeller drive facility, and a transport facility for transporting the housing along... Agent: Strategic Patents P.c..

20080216870 - Dry ice blasting with ozone-containing carrier gas: A surface of a target item is treated by directing a flow of solid carbon dioxide entrained in ozone towards it.... Agent: Air Liquide Intellectual Property

20080216871 - Method and system for monitoring contamination on a substrate: A method and system for measuring contamination, such as metal contamination, on a substrate. A dry cleaning system is utilized for non-destructive, occasional removal of contamination, such as metal containing contamination, on a substrate, whereby a monitoring system coupled to the exhaust of the dry cleaning system is employed to... Agent: Dla Piper Us LLP

20080216872 - Carburetor, method of vaporizing material solution, and method of washing carburetor: There is obtained an MOCVD oriented vaporizer which eliminates a phenomenon that thin-film materials are adhered to a portion of the vaporizer near and around a spout thereof. A carrier gas/small amount oxidizing gas supply part supplies a carrier gas, which is supplied through an internally formed gas passage and... Agent: Jordan And Hamburg LLP

20080216873 - System and devices for collecting and treating waste water from engine washing: The present invention relates to the field of washing engines, particularly using washing liquids such as water and detergent or water only, and more specifically to systems, apparatus and a mobile cart comprising such a system for collecting and treating the waste water from engine washing operations. The system comprises... Agent: Ip Group Of Dla Piper Us LLP

20080216874 - Apparatus and method for cleaning an electric hair-cutting device, and kit including such an apparatus: A cleaning apparatus (4) for cleaning a hair-cutting portion (2) of an electric hair-cutting device (1) includes a cleaning-liquid basin (5) for receiving the hair-cutting portion of the electric hair-cutting device in a central area such that the hair-cutting portion is at least partially immersed in the cleaning liquid (13).... Agent: Philips Intellectual Property & Standards

20080216880 - Substrate treatment apparatus: A substrate treatment apparatus includes a container holder which holds a container for containing multiple substrates vertically stacked in horizontal postures, a substrate treatment section which collectively applies treatment to multiple substrates horizontally stacked in vertical postures, a main conveyance mechanism which conveys multiple substrates horizontally stacked in vertical postures... Agent: Ostrolenk Faber Gerb & Soffen

20080216875 - Conveyor ware washer: Conveyor ware washer, comprising of a treatment device (70) for the treatment of sprayed final rinse liquid and/or post wash liquid, resp., so that the treated final rinse liquid and post wash liquid, resp. has the quality of potable water from the microbiological perspective and can be reused as final... Agent: Thompson Hine LLP Intellectual Property Group

20080216876 - Pipe clearing systems: A method of clearing a pipe of contents with an air system. The method may include providing air by the air system at high pressure and low velocity until the contents begin to move within the pipe, providing air by the air system air at low pressure and high velocity... Agent: Sutherland Asbill & Brennan LLP

20080216877 - Cleaning system for above-ground container and methods thereof: The present invention is directed towards devices combining swimming pool skimmers, pumps, and removable, disposable filters into integral, sidewall-mounted systems for above-ground pools and other above-ground liquid containment enclosures, and methods for the use of such systems to remove both larger floating debris and smaller particulate matter to maintain water... Agent: Troutman Sanders LLP

20080216878 - Material-removal system: A material-removal system can include a spray-head assembly with a plurality of rotatable fluid bars arranged in a single shroud with overlapping sweeps. A gear-box assembly can index the rotations of the fluid bars to coordinate their rotation and prevent the fluid bars from interfering with one another. The material-removal... Agent: Butzel Long Ip Docketing Dept

20080216879 - Sanitizer cleaning system for shopping carts: A self-contained, fogging/atomizing sanitizer cleaning system for multiple grocery/shopping carts is manufactured and retro-fit for any size room which is used to hold shopping/grocery carts before they are distributed to consumers for use in retail stores. A stationary pumping station has a direct drive stainless steel high-pressure pump, a control... Agent: Ryan Johnson

20080210256 - Method of and device for cleaning a metal sheet: The invention relates to a method of a cleaning a metal strip (1). In order to improve the cleaning of the strip, according to the invention, it is provided that the metal strip (1) is first subjected to a first high-pressure cleaning (4) with at least one liquid jet in... Agent: Abelman, Frayne & Schwab

20080210257 - Washing method, method of manufacturing semiconductor device and method of manufacturing active matrix-type display device: In an ultrasonic washing method of washing a thing to be washed by supplying ultrasonic-wave-applied cleaning fluid to the thing, the ultrasonic wave is applied to the cleaning fluid in such a manner that the ultrasonic wave is turned on and off repeatedly at specific time intervals.... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20080210258 - Scrubber box and methods for using the same: A scrubber box is provided that includes a tank adapted to receive a substrate for cleaning, supports outside of the tank and adapted to couple to ends of scrubber brushes disposed within the tank, a motor mounted to each of the supports and adapted to rotate the scrubber brushes, a... Agent: Dugan & Dugan, PC

20080210259 - Catalyst cleaning tool: A device for cleaning a selective catalyst reduction unit by directing air or a cleansing solution directly into or out of honeycomb cells of the selective catalyst reduction unit. The device utilizes a plurality of orifices which are sufficient in diameter and number to cleanse honeycomb cells thereby directing air... Agent: Baker & Daniels LLP

20080210260 - Multipurpose aqueous parts washer: The present disclosure relates generally to a multipurpose parts washer used to remove grease, oil, and dirt from mechanical parts, and more particularly, to an apparatus for washing parts within a single housing having an automatic cleaning portion, with a first cleaning chamber for spraying parts, a second cleaning chamber... Agent: Vedder Price P.C.

20080210261 - Substrate processing apparatus and substrate processing method: A substrate processing apparatus for drying a substrate including a chamber, a vapor supply part, an open/close valve, and a controller, is disclosed. While the chamber is hermetically sealed, a substrate is cleaned by pure water. Water vapor of high temperature and pressure is thereafter supplied from the vapor supply... Agent: Ostrolenk Faber Gerb & Soffen

20080210262 - Cleaning method and apparatus: A method for cleaning an interior surface of a processing equipment using a treatment liquid, the processing equipment including a pipe section defining pipe section first and second ends, the pipe section defining a pipe section volume delimited by the pipe section first and second ends, the pipe section being... Agent: Invention Quebec

20080210263 - Method and apparatus for washing and rinsing glassware: A warewashing apparatus includes a chamber for holding items to be cleaned, a wash system including a plurality of wash nozzles for spraying wash liquid and a rinse system including a plurality of rinse nozzles for spraying rinse liquid. A controller is programmed to carry out a cleaning cycle during... Agent: Thompson Hine LLP Intellectual Property Group

20080210264 - Turbine cleaning: Depending on the actual operating situation and the composition of the fuels used for driving the internal combustion engine, contamination of the moving blades, of the guide device and of the turbine casing parts occurs sooner or later in the exhaust gas turbine. According to the invention, a small quantity... Agent: Buchanan, Ingersoll & Rooney PC

20080210265 - Coating removal composition: The present invention is directed to a coating removal composition comprising at least one weak metal binding agent, a solvent system comprising at least one alcohol or ester, and a corrosion inhibition system. A method of removing a coating from an intentionally colored concrete floor is also disclosed. Utilization of... Agent: Johnsondiversey, Inc.

20080210266 - Purge solution: A composition comprising a polypropylene glycol, a polyethylene glycol ester, an amine, and optionally an alcohol. The composition can be used as a purge solution to clean paint equipment.... Agent: Harness, Dickey And Pierce, P.L.C

20080210267 - Cleaning container: A cleaning container (1) for a cleaning device (4), which has a handle (6) and a cleaning head (5), in particular for a toilet brush, is described, wherein the cleaning container (1) comprises a main chamber (3) for the cleaning and storing of the cleaning device (4) and a secondary... Agent: Leydig Voit & Mayer, Ltd

20080210279 - Shroud-type dishwashing machine with condensation precipitation device: A shroud-type dishwashing machine for commercial use has a lower frame, a dishwashing chamber and a shroud which can be opened and at least partially surrounds the dishwashing chamber. A condensation precipitation device is connected to the dishwashing chamber when the shroud is closed. This condensation precipitation device is equipped... Agent: Ronald E. Greigg Greigg & Greigg P.l.l.c.

20080210280 - Multipurpose aqueous parts washer: The present disclosure relates generally to a multipurpose parts washer used to remove grease, oil, and dirt from mechanical parts, and more particularly, to an apparatus for washing parts within a single housing having an automatic cleaning portion, with a first cleaning chamber for spraying parts, a second cleaning chamber... Agent: Vedder Price P.C.

20080210268 - Shopping cart washer and sanitizer: A shopping cart washer and sanitizer includes an enclosure fitted with components that facilitate the entry and exit of rolling shopping carts. Within the apparatus, the carts are washed, rinsed, disinfected and dried. The apparatus is primarily for use inside retail establishments and is intended to provide each shopper a... Agent: Shoemaker And Mattare, Ltd

20080210269 - Removing unwanted film from wafer edge region with reactive gas jet: Unwanted films can be eliminated by directing a stream of reactive gas(es) at reactive zone in an edge region of the wafer. The action of the reactive gas can be enhanced by heating the gas in a nozzle, immediately prior to the gas impinging on the wafer. The action of... Agent: Cantor Colburn LLP - IBM Fishkill

20080210270 - Removing unwanted film from wafer edge region with reactive gas jet: Unwanted films can be eliminated by directing a stream of reactive gas(es) at reactive zone in an edge region of the wafer. The action of the reactive gas can be enhanced by heating the gas in a nozzle, immediately prior to the gas impinging on the wafer. The action of... Agent: Cantor Colburn LLP - IBM Fishkill

20080210271 - Method and apparatus for cleaning the cutting system of an electric shaver: By providing a shaver receiving and supporting housing which is constructed for enabling cleaning fluid to be delivered directly to the interior of a shaver in a highly efficient manner, a fully integrated shaving cleaning system is realized which is capable of providing automated cleaning of the shaver in an... Agent: Christopher M. Goff (27860) Armstrong Teasdale LLP

20080210273 - Batch photoresist dry strip and ash system and process: Photoresist stripping is provided that employs batch processing to maximize throughput and an upstream plasma activation source using vapor or gas processing to efficiently create reactive species and minimize chemical consumption. An upstream plasma activation source efficiently creates reactive species remote from the photoresist on the substrate surfaces. Either a... Agent: Wood, Herron & Evans, LLP (tokyo Electron)

20080210272 - Dishwasher machine comprising a storage container: A dishwasher includes a treatment compartment, a storage container in the treatment compartment, and a drive for moving the storage container out of and/or into the treatment compartment.... Agent: Bsh Home Appliances Corporation Intellectual Property Department

20080210274 - Multiple wash zone dishwasher: The present invention relates to a dishwasher, and more particularly to a dishwasher having multiple wash zones. The dishwasher has an interior tub configured to provide an interior wash chamber for washing dishes. It also has a spray arm assembly configured to spray a first flow of wash liquid over... Agent: Whirlpool Patents Company - Md 0750

20080210275 - Rack guiding device and dish washer comprising the same: The present invention relates to a rack guiding device and a dish washer having the same. According to the present invention, a drawing length of a rack is increased substantially by a moving rail which is drawn out of a washing chamber as it slides along a guide rail, and... Agent: Birch Stewart Kolasch & Birch

20080210276 - Multipurpose aqueous parts washer: The present disclosure relates generally to a multipurpose parts washer used to remove grease, oil, and dirt from mechanical parts, and more particularly, to an apparatus for washing parts within a single housing having an automatic cleaning portion, with a first cleaning chamber for spraying parts, a second cleaning chamber... Agent: Vedder Price P.C.

20080210278 - Substrate processing apparatus: A substrate processing apparatus is provided. The apparatus includes a plurality of fluid suppliers 61, 61, 63 for supplying different processing fluids. In processing a wafer W, the substrate processing apparatus moves the fluid suppliers 61, 62, 63 along the peripheral part of the wafer W relatively. The fluid suppliers... Agent: Smith, Gambrell & Russell

20080210277 - Warewasher and associated door construction: A warewasher for washing wares including a housing defining an internal space with at least one spray zone for washing wares. The housing includes an opening defined in part by a lower shelf. A liquid delivery system provides a spray of liquid within the spray zone. An access door has... Agent: Thompson Hine LLP Intellectual Property Group