Cleaning and liquid contact with solids inventions 07/08

20080178905 - Laser cleaning of components: When capacity coupling between an output gate electrode (OG) and a last-stage transfer electrode is large at an output end of a CCD shift register, an electric potential of the OG is varied according to transfer clocks with the result that noise is liable to generate in an output signal.... Agent: Oliff & Berridge, PLC

20080178906 - Bare aluminum baffles for resist stripping chambers: Bare aluminum baffles are adapted for resist stripping chambers and include an outer aluminum oxide layer, which can be a native aluminum oxide layer or a layer formed by chemically treating a new or used bare aluminum baffle to form a thin outer aluminum oxide layer.... Agent: Buchanan, Ingersoll & Rooney PC

20080178907 - Method for treating a thermally loaded component: A method for treating a thermally loaded component having a metallic substrate and at least partially coated on an outer side with a protective coating, is provided. The method includes the step of predamaging the protective coating before removing the protective coating from the substrate using dry ice blasting. The... Agent: Darby & Darby P.C.

20080178908 - Solutions of silicon metal and methods of making and using same: The present invention generally relates to a formulation created by reacting sodium hydroxide, water, and silicon metal which has unique properties and many uses. The instant invention is further directed to methods of producing and using such formulations.... Agent: Crowell & Moring LLP Intellectual Property Group

20080178909 - Automated detection and control system and method for high pressure water wash application and collection applied to aero compressor washing: The present invention relates to a system and method for washing gas turbine engines comprising a manifold comprising one or more tubes; a pumping system for providing pressurized washing liquid to the manifold, the pumping system comprising a pump, and one or more valves; and a control unit for regulating... Agent: Ip Group Of Dla Piper US LLP

20080178910 - Substrate cleaning apparatus, substrate cleaning method, and storage medium: A substrate cleaning apparatus (1) of the present invention is the substrate cleaning apparatus (1) for cleaning a substrate (wafer 7) with the use of a cleaning agent (e.g., Caro's acid) that is generated by reacting plural kinds of chemical liquids (e.g., sulfuric acid and hydrogen peroxide solution). The substrate... Agent: Smith, Gambrell & Russell

20080178911 - Apparatus for ejecting fluid onto a substrate and system and method incorporating the same: A fluid dispenser for use in the processing of substrates. The dispenser has a dome shaped body with a convex upper surface and has a number of conduits designed to supply fluid to the surface of a substrate at predetermined points.... Agent: Wolf, Block, Schorr & Solis-cohen LLP

20080178916 - Apparatus for monitoring operation of a dishwasher device and associated system and method: An apparatus for monitoring operation of a dishwasher device is provided. Such an apparatus comprises a light projection device operably engaged with the dishwasher device and configured to project light therefrom. The projected light is configured to form at least one of an alphanumeric character and a graphical character, corresponding... Agent: Alston & Bird LLP

20080178917 - Substrate processing apparatus and substrate processing method: A substrate processing apparatus has an ejection part for ejecting conductive processing liquid toward a substrate in a state where the processing liquid flows continuously and constantly. A conductive liquid contact part is provided in the vicinity of an outlet in the ejection part, and is connected to a potential... Agent: Ostrolenk Faber Gerb & Soffen

20080178912 - Agricultural sterilizing and detoxifying assembly for vegetables and fruit: An agricultural sterilizing and detoxifying assembly for vegetables and fruit has a rough-washing tank, a re-washing tank, a water-clarifying assembly and a sterilizing assembly. The rough-washing tank holds vegetables and fruit to be washed for the first time. The re-washing tank communicates with the rough-washing tank and holds vegetables and... Agent: Lariviere, Grubman & Payne, LLP

20080178913 - Process for wafer backside polymer removal with a ring of plasma under the wafer: A process is provided for removing polymer from a backside of a workpiece. The process includes supporting the workpiece on the backside in a vacuum chamber while leaving at least a peripheral annular portion of the backside exposed. The process further includes confining gas flow at the edge of the... Agent: Law Office Of Robert M. Wallace

20080178914 - Substrate processing apparatus: A substrate processing apparatus that can reduce the number of parts. A first gas introduction hole through which the hydrogen fluoride gas is introduced into a GDP is formed in an upper lid. A second gas introduction hole through which hydrogen fluoride gas is introduced from a hydrogen fluoride gas... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080178915 - Arrangement for the cleaning of a pipe separator: Device or arrangement for cleaning a pipe separator (1) in which the separator body (2) consists of an extended, tubular body with an inlet (4) and an outlet (5) having essentially the same diameter as the separator body. At the outlet, there's a bend or a loop (3) designed to... Agent: Wenderoth, Lind & Ponack, L.L.P.

20080173326 - Oxygen plasma clean to remove carbon species deposited on a glass dome surface: A method for in-situ cleaning of a dielectric dome surface having been used in pre-clean processes is provided. Carbon containing deposits are removed by providing a plasma of one or more oxidizing gases which react with the carbon containing films to form volatile carbon containing compounds.... Agent: Patterson & Sheridan, LLP - - Appm/tx

20080173327 - Two-fluid nozzle, substrate processing apparatus, and substrate processing method: A substrate processing apparatus has a two-fluid nozzle having an inner cylindrical member and an outer cylindrical member. Gas flows in the inner cylindrical member which is a gas passage and the processing liquid downwardly flows in a processing liquid passage constituted of the inner and outer cylindrical members. The... Agent: Ostrolenk Faber Gerb & Soffen

20080173328 - Cleaning liquid and cleaning method using the same: A cleaning liquid used in cleaning of a substrate for use in semiconductor devices conducted after chemical mechanical polishing in manufacture of semiconductor devices, comprising a polycarboxylic acid, an anionic surfactant having an aromatic ring structure in a molecule, a polymer compound having an acidic group on a side chain,... Agent: Sughrue Mion, Pllc

20080173329 - Cleaning sheets, transfer member having cleaning function, and method of cleaning substrate-processing apparatus with these: A cleaning sheet which comprises a porous layer as a cleaning layer; or a cleaning sheet which comprises a sheet material having a porous layer and, formed on one side of the sheet material, an adhesive layer.... Agent: Sughrue Mion, Pllc

20080173331 - Method for producing battery can: A method for producing a battery can including the steps of: (1) making a battery can having a cylindrical body, a bottom, and an opening from a steel plate; (2) cleaning the battery can with water; and (3) heating and drying the battery can by transporting the battery can through... Agent: Mcdermott Will & Emery LLP

20080173330 - System and method for optimized gas turbine compressor cleaning and performance measurement: The present invention is directed to a system and method for optimizing a wash procedure. Embodiments of the present invention are directed to a system for optimizing a wash procedure. In a first embodiment, a system comprises: means for collecting a sample of fouling, wherein the sample of fouling comprises... Agent: Ip Group Of Dla Piper Us LLP

20080173332 - Manual system for dredging heavy turning pipeline: Provided is a manual system for dredging a heavy-turning pipeline, comprising a pipeline dredger and a water-pressure dredge pipe comprising a rocker and a spring-type dredge pipe connected thereto; wherein a spring-type dredge bit is disposed on an end of the spring-type dredge pipe; the water-pressure dredge pipe is a... Agent: Matthias Scholl

20080173333 - Cleaning apparatus and method and computer readable medium: A control mechanism of a cleaning apparatus is preset to control the apparatus for a cleaning process or a rinsing process to include delivering a process liquid, which is corresponding one of a cleaning liquid and a rinsing liquid, from a back surface liquid supply nozzle through a liquid delivery... Agent: Smith, Gambrell & Russell

20080173334 - Vessel and methods for calibrating, cleaning or removing an implement located in such a vessel or inserting an implement into such a vessel: A vessel having an implement located in a fluid receiving space inside the vessel. The vessel includes an enclosure for enclosing a closed space around the implement. An actuator actuates the enclosure to and fro between an open position, in which the enclosure does not enclose a closed space around... Agent: Venable LLP

20080173335 - Semiconductor wafer cleaning system: The present invention related to a semiconductor wafer cleaning system comprising a preliminary cleaning station for removing particles on a wafer in advance by spraying deionized water thereon; a first cleaning station for cleaning remaining particles firstly by rotating frictionally a pair of brushes disposed to be contacted with a... Agent: Intellectual Property / Technology Law

20080173336 - Garbage container with protected drain: A container is shown with a sump and a strainer separating the container interior from the sump. The sump is provided with a drain for draining liquid in the container from any solid material.... Agent: Joel I Rosenblatt

20080173337 - Pad washing system with splash guard: A pad washing system is provided. This system includes a filter device that further includes: a filter component having a textured top surface and at least one baffle formed on the underside thereof; a filter support apparatus adapted to receive the filter device, wherein the filter support apparatus further includes:... Agent: Mcnees Wallace & Nurick Llc

20080173338 - Dishwasher: Provided is a dishwasher. The dishwasher includes a sump case forming a space to store wash liquid, and a drain pump provided at one side of the sump case. The drain pump includes a drain impeller that induces a flow of wash liquid, and a plurality of mutually separable cases... Agent: Birch Stewart Kolasch & Birch

20080173339 - Method for cleaning semiconductor device: A method for cleaning semiconductor device is disclosed. The steps include providing a mask-protective device, providing a mask with a defined pattern, and combining the mask-protective device with the cleaned mask layer, such that the space between the mask-protective device and the mask layer can fill with the cleaning gas... Agent: Birch Stewart Kolasch & Birch

20080169003 - Field reactive amplification controlling total adhesion loading: Systems and methods are provided through which in some embodiments for controlling intermolecular forces between a contact surface and a fabricated microstructure having a base and at least one or more nano-structures. The contact surface and the fabricated microstructure are joined by the interplay of electrostatic and van der Waals... Agent: Nasa Goddard Space Flight Center

20080169004 - Cleaning composition for semiconductor substrates: The present invention relates to a semi-aqueous cleaning composition used to remove unwanted organic and inorganic residues and contaminants from semiconductor substrates. The cleaning composition comprises a buffering system comprising a polyprotic acid having at least three carboxylic acid groups with a pKa value of about 5 to about 7.... Agent: Air Products And Chemicals, Inc. Patent Department

20080169005 - Device and method for fluid dynamics cleaning of constrained spaces: A method for cleaning interior surfaces of a header region of a hemodialyzer includes steps of: introducing an insertion device having an end portion and a shaft through a hemodialyzer plug port so that the end portion of the insertion device is within the header region; rotating the shaft at... Agent: Merchant & Gould PC

20080169006 - Method of cleaning fouled or scaled membranes: A method of cleaning a fouled or a scaled RO or NF membrane surface with a solution containing one or more thermo-responsive polymers is disclosed. More specifically, the method comprises: treating the membrane surface in a membrane separation system with a solution containing one or more TRP, wherein said TRP... Agent: Peter A. Dimattia Patent And Licensing Department

20080169007 - Apparatus and method for processing a hydrophobic surface of a substrate: A method of processing a substrate comprising a) supporting a substrate having a hydrophilic surface in a substantially horizontal orientation, b) rotating the substrate, c) applying a film of an aqueous solution of HF to the hydrophilic surface of the substrate for a period of time sufficient to convert the... Agent: Wolf, Block, Schorr & Solis-cohen LLP

20080169008 - Enhanced wafer cleaning method: A method for removing post-processing residues in a single wafer cleaning system is provided. The method initiates with providing a first heated fluid to a proximity head disposed over a substrate. Then, a meniscus of the first fluid is generated between a surface of the substrate and an opposing surface... Agent: Martine Penilla & Gencarella, LLP

20080169009 - Washing items support for a dishwasher: A washing items support assembly for a dishwasher supports items of cutlery for washing that have been laid in a first cutlery container arranged in a first container region and supports other washing items in a second container region in which at least one washing items holder is arranged in... Agent: Bsh Home Appliances Corporation Intellectual Property Department

20080163889 - Megasonic transducer matching network for wet clean chambers: The present invention generally provides a cost-effective method and apparatus for matching power source and transducer load impedances for an array of acoustic-wave transducers used in wet processing chambers. In one embodiment, a single radio frequency generator provides power to multiple megasonic transducers. Each transducer contains multiple piezoelectric crystals, and... Agent: Patterson & Sheridan, LLP - - Appm/tx

20080163890 - Tunable megasonics cavitation process using multiple transducers for cleaning nanometer particles without structure damage: A method and system for cleaning a substrate is provided. More particularly systems and methods that allows for precise tailoring of megasonics distribution at a substrate surface to be above the threshold required for particle removal efficiency (PRE), yet below the value which causes structural damage are provided. This method... Agent: Patterson & Sheridan, LLP - - Appm/tx

20080163891 - Method and apparatus of multi steps atomization for generating smaller diw dropplets for wafer cleaning: An apparatus for cleaning a wafer has a first chamber and a component coupled to the first chamber. The first chamber has a first input to form de-ionized water droplets. The component is coupled to the first chamber to further atomize and apply the atomized de-ionized water droplets on the... Agent: Applied Materials/blakely

20080163892 - Cleaning wafer including detergent layer for exposure apparatus of immersion lithography system, composition of detergent layer, method of using cleaning wafer and application system: A method of an in situ cleaning of an objective lens of a semiconductor apparatus includes placing a cleaning wafer having a detergent layer on a scanning stage of the semiconductor apparatus. A cleaning composition in the detergent layer is dissolved by using an immersion liquid (water), so that the... Agent: J C Patents, Inc.

20080163893 - Substrate cleaning processes through the use of solvents and systems: A method for removing common contaminates or residues which include but are not limited to ionic residues, particulate residues and moisture from semiconductor wafers used in the manufacture of IC (integrated circuits), liquid crystal displays and flat panel displays. The process includes the use of certain esters or certain esters... Agent: Brett L. Nelson Eastman Chemical Company

20080163894 - Fluid cleaning apparatus: A fluid cleaning apparatus and method for use with a fluid interface that has structure for creating a fluid flowrate of a selected fluid, wherein the apparatus includes a housing that has a surrounding side wall about a longitudinal axis, the sidewall defining an interior between proximal end and distal... Agent: Roger A. Jackson, Esq.

20080163895 - Method of cleaning an industrial tank using electrical energy and critical fluid: A method of cleaning an industrial tank using electrical energy and critical fluid comprises the steps of transmitting electrical energy into an industrial tank to a first predetermined temperature, providing a critical fluid with a reactant or catalyst into the tank for diffusion into the contents of the tank at... Agent: Pearson & Pearson, LLP

20080163896 - Device for preparation and dispensing of beverages, with cleaning device: The invention concerns a device for preparation and dispensing of beverages with a mechanism for initiating and carrying out a cleaning process. The device consists of at least one line, serving to transport the beverages to a beverage outlet and means for adding a cleaner for at least partial cleaning... Agent: Pepper Hamilton LLP

20080163897 - Two step process for post ash cleaning for cu/low-k dual damascene structure with metal hard mask: A method and apparatus for removing residue on a wafer is described. A first solution is applied to remove a first type of residue from a metal mask on the wafer. A second solution is applied to remove a second type of residue from the metal mask on the wafer.... Agent: Applied Materials/blakely

20080163899 - Substrate cleaning apparatus, substrate cleaning method, and computer-readable storage medium: A disclosed substrate cleaning apparatus for cleaning a back surface of a substrate includes a first substrate supporting portion configured to support the substrate at a first area of a back surface of the substrate, the back surface facing down; a second substrate supporting portion configured to support the substrate... Agent: Smith, Gambrell & Russell

20080163898 - System for processing a workpiece: A wafer processing system has a moveable drain assembly having multiple drain rings. The drain rings may be spaced apart sufficiently to allow a process fluid applicator to move between them. Each drain ring provides a separate drain path, optionally in a separate recirculation loop carrying a single process fluid.... Agent: Perkins Coie LLP/semitool

20080163906 - Dish washer and display structure thereof: A display structure of a dishwasher is provided. The display structure includes a cabinet, a door, a top table, and a refraction unit. The door is rotatably mounted on a front side of the cabinet and has a display formed on an upper side thereof. The top table covers the... Agent: Mckenna Long & Aldridge LLP

20080163900 - Ipa delivery system for drying: A method and system for cleaning a batch of substrates is provided. The system includes a first cluster of vertical processing chambers, an IPA reservoir, and an IPA delivery system in fluid communication with the IPA reservoir and the first cluster of vertical processing chambers, wherein the IPA delivery system... Agent: Patterson & Sheridan, LLP - - Appm/tx

20080163901 - Sump of dish washer: A sump assembly of a dishwasher includes a sump housing having a washing water storing portion, a water supply connector formed on a first portion of the washing water storing portion, and a heater insertion hole formed on a second portion of the washing waster storing portion, which is opposite... Agent: Mckenna Long & Aldridge LLP

20080163902 - Compressor cleaning: Rotor blades and hub of the impeller are cleaned by means of a cleaning fluid jet which is directed along the rotational axis of the impeller onto the impeller. The cleaning fluid jet in this case is directed, or sprayed, towards the impeller by a feed nozzle which is arranged... Agent: Buchanan, Ingersoll & Rooney PC

20080163903 - Leakage preventing structure of dish washer: A leakage preventing structure of a dishwasher is provided. The structure includes a wash motor with a motor shaft disposed at its center, a sump housing that the motor shaft passes through, and a scaling portion that seals the space between the wash motor and the sump housing. The sealing... Agent: Mckenna Long & Aldridge LLP

20080163904 - Nozzle structure of dish washer: A nozzle structure of a dish washer is provided. In the nozzle structure, a nozzle holder is provided, a gasket unit is mounted on an end of the nozzle holder and it includes at least one inlet port, a flap support unit is protruded from a front of the gasket... Agent: Mckenna Long & Aldridge LLP

20080163905 - Two step process for post ash cleaning for cu/low-k dual damascene structure with metal hard mask: A method and apparatus for removing residue on a wafer is described. A first solution is applied to remove a first type of residue from a metal mask on the wafer. A second solution is applied to remove a second type of residue from the metal mask on the wafer.... Agent: Applied Materials/blakely

20080156347 - Cleaning liquid and cleaning method for electronic material: A cleaning liquid for an electronic material, in particular, a silicon wafer, uses ultra-pure water or hydrogen water as raw material water, and performs cleaning in combination with ultrasonic irradiation under the presence of hydrogen micro-bubbles. The method enables efficient cleaning and removal of particle components and the like on... Agent: Brooks Kushman P.c.

20080156346 - Method and apparatus for cleaning a substrate: A method for photolithography processing includes forming a photoresist layer on a surface of a substrate, baking the substrate to remove solvents from the photoresist layer, cleaning an edge of the substrate with a tape, and exposing the photoresist layer with radiation energy. The tape includes a cleaning material. The... Agent: Haynes And Boone, LLP

20080156348 - Process chamber lid and controlled exhaust: A method and apparatus for efficiently exhausting harmful vapors and fumes from a substrate processing chamber is described. The processing chamber includes a lower volume configured as a liquid atmosphere, and an upper volume configured as a gaseous atmosphere to at least partially contain vapors or fumes above the liquid.... Agent: Patterson & Sheridan, LLP - - Appm/tx

20080156349 - Method for cleaning silicon wafer: The present invention relates to a method for cleaning a silicon wafer, including (S1) a first cleaning step for cleaning surfaces of a silicon wafer using an SC-1 cleaning solution according to standard clean 1; (S2) a second cleaning step for cleaning the surfaces of the silicon wafer, cleaned in... Agent: Greer, Burns & Crain

20080156350 - Device and method: A device for treating a surface to give a cleaning benefit comprises a container (302) containing a cleaning liquid. The liquid can be delivered to an outlet zone (306). By virtue of the outlet zone and a separate defining means (322) which may be provided the cleaning liquid is accurately... Agent: Norris, Mclaughlin & Marcus

20080156351 - Substrate processing apparatus and substrate processing method: A substrate processing apparatus has an indexer block and a processing block. One side of the processing block has a vertical stack of a plurality of top surface cleaning units and the other side of the processing block has a vertical stack of a plurality of back surface cleaning units.... Agent: Ostrolenk Faber Gerb & Soffen

20080156352 - Contact mechanism cleaning: One embodiment of the present invention includes a method for reactively cleaning a contact mechanism. The method comprises measuring contact resistance (CRES) associated with a plurality of electrical contacts of the contact mechanism. The method also comprises generating at least one statistic of the measured CRES associated with the plurality... Agent: Texas Instruments Incorporated

20080156353 - Apparatus for removing haze in photo mask and method for removing haze in a photo mask: An apparatus for removing haze in a photo mask includes sealed chamber having a bake module disposed therein to support a photo mask, a reactant gas feed line to feed a reactant gas into the chamber, and a discharge device to discharge impurities in the chamber to the outside.... Agent: Marshall, Gerstein & Borun LLP

20080156354 - System and method for cleaning catalytic converter: A cleaning system for removing contaminants from a catalytic converter includes a vibrator for vibrating the catalytic converter when the converter is placed in a cleaning liquid. The vibrator is mounted on a lift-connector of the system. The lift-connector defines a pair of forklift-openings for receiving forks of a forklift.... Agent: Senniger Powers LLP

20080156355 - Systems and methods for single integrated substrate cleaning and rinsing: Inventive methods and systems of cleaning patterned integrated circuit (“IC”) substrates are described. The cleaning methods of the present invention include: (1) providing the patterned integrated circuit substrate having thereon poly silicon lines adjacent to each other; (2) charging a solution, which contains at least a solute selected to promote... Agent: Kirkpatrick & Lockhart Preston Gates Ellis LLP

20080156356 - Cleaning liquid, cleaning method, liquid generating apparatus, exposure apparatus, and device fabricating method: An exposure apparatus exposes a substrate through an exposure liquid with exposure light. A cleaning liquid is provided to the exposure apparatus, in order to clean at least part of the exposure apparatus. In the clearing liquid, a prescribed gas of an amount that is greater than or equal to... Agent: Oliff & Berridge, Plc

20080156357 - Substrate processing apparatus: A reversing unit includes a fixed plate, a first movable plate provided so as to face one surface of the fixed plate, a second movable plate provided so as to face the other surface of the fixed plate and a rotary actuator. The rotary actuator rotates the first movable plate,... Agent: Ostrolenk Faber Gerb & Soffen

20080156358 - Dishwasher and rack assembly therefor: A dish washer capable of washing dishes of various sizes is provided. The dishwasher includes a rack assembly having a plurality of dish holders into which dishes may be inserted and by which the dishes supported are separated from each other on the rack assembly. The plurality of dish holders... Agent: Ked & Associates, LLP

20080156359 - Systems and methods for modular and configurable substrate cleaning: Embodiments of the invention generally relate to a modular, configurable system in which distinct cleaning and drying modules can be arranged in different combinations selectable by a user of the system. In one embodiment a configurable system for substrate cleaning is provided. The configurable system provides a frame including first... Agent: Patterson & Sheridan, LLP - - Appm/tx

20080156360 - Horizontal megasonic module for cleaning substrates: Embodiments of the present invention relate to semiconductor device manufacturing, and more particularly to a horizontal megasonic module for cleaning substrates. In one embodiment an apparatus for cleaning a substrate is provided. The apparatus comprises a tank adapted to contain a cleaning fluid, a movable housing having a first side... Agent: Patterson & Sheridan, LLP - - Appm/tx

20080156361 - Substrate processing apparatus: A reversing unit includes a fixed plate, a first movable plate provided so as to face one surface of the fixed plate, a second movable plate provided so as to face the other surface of the fixed plate and the rotary actuator. The rotary actuator rotates the first movable plate,... Agent: Ostrolenk Faber Gerb & Soffen

20080156362 - Dishwasher and rack assembly therefor: A dishwasher is provided in which heights of basket(s) of a rack assembly may be easily changed. The dishwasher may include a frame configured to be inserted into and withdraw from a washing tub and plurality of basket positioning device configured to receive and support basket(s) at different heights.... Agent: Ked & Associates, LLP