Cleaning and liquid contact with solids inventions 04/08

20080092919 - Method and device for removing coatings on a metal structure: A device for removing layers of corrosion and other coatings from a metal surface is disclosed. Said device includes a signal generator driving an induction coil that is positioned on the structure. A control unit includes a temperature sensor that senses the temperature in the metal structure. The control unit... Agent: Morgan & Finnegan, L.L.P.

20080092918 - Method for removing foreign matter from substrate surface: A method for removing inorganic foreign matters from the surface of a substrate made of silicon or glass or the surface of an inorganic coating formed on the surface of the substrate, which comprises applying a light beam in a wavelength range which makes the light absorption coefficient of at... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080092920 - Methods and apparatus for wet cleaning electrode assemblies for plasma processing apparatuses: Methods of cleaning backing plates of electrode assemblies, or electrode assemblies including a backing plate and an electrode plate are provided. The methods can be used to clean backing plates and electrode plates made of various materials, such as silicon electrode plates and graphite and aluminum backing plates. The backing... Agent: Buchanan, Ingersoll & Rooney PC

20080092922 - System and method for cleaning a grinding machine: A grinding machine cleaning system and method provides a range of human safe products that can easily be introduced into the grinding chamber and cycled through the equipment. Some of the products include corn cobs, walnut shells, pecan shells, nuts, rice, dried corn kernels, corn meal, barley, wheat, bulgur, and... Agent: Romi N. Bose

20080092924 - Low-pressure sludge removal method and apparatus using coherent jet nozzles: Provided area cleaning apparatus and an associated method of using the disclosed apparatus wherein the apparatus utilizes one or more nozzles configured to provide a coherent stream of one or more cleaning fluids for removing accumulated fine particulate matter, sludge, from surfaces. The nozzles may be sized, arranged and configured... Agent: Harness, Dickey & Pierce, P.L.C

20080092925 - Removing photoresist from substrates by means of treatment liquid, and processing treatement liquid with ozone: A substrate is inclined when treatment liquid is ejected onto the substrate to remove photoresist from the substrate. Uniform processing of the substrate with the treatment liquid and collection of the treatment liquid are thus facilitated. Collected treatment liquid is treated with ozone and then reused.... Agent: Macpherson Kwok Chen & Heid LLP

20080092926 - Cleaning apparatus with disposable elements and methods of cleaning: A method of and system for cleaning a surface applies a first fluid to the surface by feeding the first fluid from a unitary cleaning receptacle removably secured to a cleaning unit and moves the unitary cleaning receptacle relative to the cleaning unit to agitate the cleaning solution. A second... Agent: S.c. Johnson & Son, Inc.

20080092928 - Method and apparatus for treating biofilm in an appliance: A method of sanitizing a washing machine, including the removal of a bio film from the wash chamber of a clothes washer.... Agent: Mcgarry Bair PC

20080092929 - Substrate processing apparatus and substrate processing method: A substrate processing apparatus includes a substrate holding unit for holding a substrate to be processed substantially horizontally, a process liquid nozzle for supplying a process liquid to a main surface of the substrate held by the substrate holding unit, a gas nozzle for supplying an inert gas to the... Agent: Ostrolenk Faber Gerb & Soffen

20080092921 - Post metal chemical mechanical polishing dry cleaning: Metal residue on a semiconductor surface resulting from metal chemical mechanical polishing (“CMP”) process are eradicated using a dry clean process. The dry cleaning uniformly removes or substantially eliminates metal residue from the surface of the semiconductor. An unintended metal short that may be present due to the residue may... Agent: Brinks Hofer Gilson & Lione

20080092923 - Device and process for cleaning, activation or pretreatment of work pieces by means of carbon dioxide blasting: The invention relates to a device and method for cleaning, activating or pre-treating workpieces by blasting a carbon dioxide snow which is produced from pressurized CO2-containing fluids and at least one type of carrying compressed gas and is accelerated by means of a discharge nozzle (14), wherein a two-phase carbon... Agent: Paul And Paul

20080092927 - Prevention of deposits on ceramics: A method to prevent deposits on a ceramic surface comprising: (1) pretreating the surface by applying an aqueous solution containing from about 200 ppm to about 1000 ppm by weight of an amphoteric fluorosurfactant, and (2) periodically applying an aqueous maintenance solution comprising from about 1 ppm to about 200... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center

20080092930 - Cleaning fluid for electrical personal care apparatus: The present invention relates to a fluid aqueous composition for cleaning an electric personal care apparatus, in particular an apparatus for removing hair, the composition comprising at least one alkyl benzene sulfonate; and at least one non-ionic surfactant. The invention further relates to a method for preparing said fluid composition... Agent: Philips Electronics North America Corporation Intellectual Property & Standards

20080092931 - Dishwasher and the control method: The present invention relates to a dishwasher (1) wherein the irritating odor that dissipates as the result of long keeping of the dirty dishes in the tub (2) with the door closed between two consecutive operations like operating the dishwasher once a week, is prevented and a control method thereof.... Agent: Venable, Campillo, Logan & Meaney, P.C.

20080092932 - Steam cleaning appliance: A portable domestic steam cleaner has a housing accommodating a releasable water tank. A pump transfers water from the tank to a boiler for generating steam. In use, steam exits a nozzle for cleaning etc. A pump suitable for use in the steamer is also disclosed.... Agent: Birch Stewart Kolasch & Birch

20080092933 - Dish washer: In this dishwasher 1, a spring 33 utilized for moving a door 7 up and down is accommodated within a column 6 of a washer body 2, so as to be confined within the column 6, whereby the appearance becomes better while the spring 33 is protected against water. Also,... Agent: Osha Liang L.L.P.

20080092934 - Unit for washing containers: A unit for washing containers comprises a conveying device for supporting and advancing in an orderly manner said containers to a grasping, moving and washing device; the grasping, moving and washing device comprises at least a conveyor provided with a grasping arrangement for grasping in succession groups of said containers... Agent: Nixon & Vanderhye, PC

20080092935 - Nozzle beam with means for setting working width and method for setting working width of a nozzle strip: The nozzle beam is arranged on a device for generation of liquid streams for the treatment of fibres of a material web running along the nozzle beam. The nozzle beam comprises an upper piece (4), running across the working width of the web and a lower piece (5), which runs... Agent: K.f. Ross P.C.

20080087300 - Gas turbine compressor water wash control of drain water purge and sensing of rinse and wash completion: A purge drain valve including a spool spliced in a fluid line includes a control valve and an actuator coupled to the control valve for regulating fluid flow. During a washing operation, fluid flows between a supply end and a delivery end of the spool, and during a purging operation,... Agent: Ip Group Of Dla Piper US LLP

20080087302 - Cleaner for the smelt spout of a recovery boiler: A cleaning apparatus for a smelt spout of a recovery boiler, which apparatus comprises a motorized cleaning member (7) for cleaning the smelt spout (1). The cleaning apparatus further comprises a path (5) and a cleaning unit, which comprises motorized transfer means for transferring the cleaning unit to the location... Agent: Venable LLP

20080087303 - Method of preparing core rods for optical fiber preforms: Core rods or other glass components associated with optical fiber preforms are cleaned by loading them into a number of first sleeves, and partially obstructing entrance and exit ends of the sleeves to retain the components. The sleeves are contained inside a second sleeve so that the entrance ends of... Agent: Law Office Of Leo Zucker

20080087305 - Dust suppressant: A dust suppressant for suppressing dust that is otherwise lifted from an earthen surface, such as by wind, comprises a mixture of expired beverages. The expired beverage dust suppressant may be applied to any surface for which dust suppression is desired and may be applied using a water truck, for... Agent: Knobbe Martens Olson & Bear LLP

20080087298 - Method and apparatus for cleaning magnetic head slider, and method for manufacturing the same: Embodiments of the present invention provide a method and an apparatus for cleaning a magnetic head slider, and a method for manufacturing the same, which can achieve a magnetic head slider having high cleanness. According to one embodiment, in a rinsing process, a magnetic head slider is accommodated within a... Agent: Townsend And Townsend And Crew LLP

20080087297 - Portble dusting tool: A dusting tool comprises a selectively activated duster actuator, and a duster member carrying a number of bristles and connected to the duster actuator. The bristles of the duster member have an enhanced electrostatic charge build-up capability. The duster actuator can be activated to actuate the duster member, which causes... Agent: Fraser Clemens Martin & Miller LLC

20080087299 - Directional control for dual brush robotic pool cleaners: A method and apparatus for accurately controlling the directional and turning movement of a self-propelled robotic pool cleaner having at least one pair of rotational support members for propelling and cleaning along a surface of a pool or tank include accelerating at least one pair of the rotational support members... Agent: Abelman, Frayne & Schwab

20080087301 - Aeroengine washing system and method: An adjustable nozzle dispenser and a multi-nozzle dispenser are disclosed for washing an aerofoil of a gas turbine engine. The dispensers are characterised by their nozzle arrangements being capable of washing at least two different parts of the aerofoil. A system and a method of operating such a nozzle dispenser... Agent: Manelli Denison & Selter

20080087304 - System and method for processing a substrate utilizing a gas stream for particle removal: A system and method of processing a substrate. The method and system applies a liquid to a surface of the substrate so as to form a film of the liquid on the surface of the substrate, wherein a boundary layer exists at the interface of the surface and the film... Agent: Wolf, Block, Schorr & Solis-cohen LLP

20080087306 - Part washer: The present invention provides a part washer for cleansing various parts using cleansing solution, in particular to a part washer, which discharges the high-pressure air to be sprayed to the parts and the solution for cleansing the parts at the state where they are heated by means of heating means... Agent: Ipla P.A.

20080087307 - Dishwasher: A dishwasher includes a tub defining a washing chamber, a door for opening/closing the tub, a condenser provided inside the door to condense steam discharged from the tub, a fan assembly connected to the condenser, and an outside air guide for supplying outside air to the fan assembly. The fan... Agent: Mckenna & Aldridge LLP Song K. Jung

20080087308 - Parts washer with solvent recycler: A washing and recycling system for use with removing paint from a coated article. The system includes a basin, a reservoir connected to the basin and which holds a solvent which removes the paint from the coated article, a washing system connected to the reservoir and to the basin such... Agent: Stein, Mcewen & Bui, LLP

20080087309 - Device for monitoring a wash process: A device is provided for monitoring a wash process inside a mechanical washing apparatus, comprising sensor means for measuring physical and/or mechanical parameters of the wash process and recording means for recording the measured parameters within the device. This device comprises means for conducting a washing liquor past the sensor... Agent: Johnsondiversey, Inc.

20080083426 - Simplified method for cleaning production tools used for metal forming: Chemical method of cleaning metallic residue from forming tools utilizing the application of a caustic material including base or mild acid to the tool for a short period of time. The caustic material is held in substantially fixed relation for a period of time to dislodge the metallic residue followed... Agent: General Motors Corporation Legal Staff

20080083428 - Gantry method of washing vehicles: A method of washing a vehicle with a gantry-type apparatus in only two passes uses the first pass to apply a pre-wash solution while subsequently brushing the top and sides of the vehicle and a second pass to initially brush the sides of the vehicle, then apply a spot-free rinse... Agent: Dorsey & Whitney, LLP Intellectual Property Department

20080083430 - Adjustable flexible flap for mechanized sweeper: A flap for a hood on a mechanized sweeper comprises a rubber member and connectors. The rubber member has a horizontal portion configured to overlay an upper surface of the hood and attach to the hood. The rubber member further has a vertical portion configured to extend perpendicularly downward from... Agent: Sirote & Permutt, P.c.

20080083429 - Cartridge flap for mechanized sweeper: A flap for a hood on a mechanized sweeper comprises a cartridge, a rubber member, and connectors. The cartridge is configured to extend perpendicularly downward from an upper surface on the hood. The rubber member is configured to attach to the cartridge and further configured to extend perpendicularly downward from... Agent: Sirote & Permutt, P.c.

20080083431 - Device and method for clearing debris from the front of a hood in a mechanized sweepers: A device for a mechanized sweeper includes a hood and a moveable connector. The hood has a front portion and a rear portion. The front portion of the hood is configured to attach to the sweeper. The moveable connector is configured to connect the hood to the sweeper. The connector... Agent: Sirote & Permutt, P.c.

20080083434 - Washing apparatus: A washing apparatus has a housing comprising a spray element such that in use, fluid is forced through at least one aperture creating a substantially elongate spray onto at least one roller wheel or roller sleeve substantially causing the roller wheel to spin and be washed or cleaned. A method... Agent: Young & Thompson

20080083435 - Method of inhibiting corrosion in storage and transport vessels: This invention provides a method of inhibiting corrosion on a vessel with particular relevance to storage or transport vessels holding corrosive materials. The invention also provides a method for preventing contamination and maintaining quality of materials stored or transported within a vessel. The method includes providing a new or freshly... Agent: Edward O.yonter Patent And Licensing Department

20080083425 - Method for non-contact cleaning of a surface: A flame torch can be used to clean the surface of a contact-sensitive object, such as a glass optic, extremely thin workpiece, or semiconductor wafer by providing a reactive precursor gas to the feed gases of the torch. Reactive atom plasma processing can be used to clean the surface of... Agent: Fliesler Meyer LLP

20080083427 - Post etch residue removal from substrates: A method for removing residue from a workpiece includes preparing a liquid including de-ionized water, sulfuric acid, and optionally hydrofluoric acid. Carbon dioxide gas is provided into the liquid. The liquid is maintained at a desired temperature. The liquid is applied onto a workpiece in a process chamber. The liquid... Agent: Perkins Coie LLP/semitool

20080083432 - Multifunctioning method utilizing a two phase non-aqueous extraction process: A method of laundering a fabric load is disclosed including the steps of processing a fabric load in an aqueous-based working fluid, substantially replacing the aqueous-based working fluid with a non-aqueous working fluid of the type which extracts some of the aqueous-based working fluid from the fabric load.... Agent: Whirlpool Patents Company - Md 0750

20080083433 - Dishwasher comprising a sorption drying device, and method for the operation thereof: A dishwasher comprising at least one partial program step “drying” in which air from a washing container of the dishwasher and/or ambient air is directed through a sorption column with reversibly dehydratable material into the washing container by a fan, and humidity is removed from the air when the same... Agent: Bsh Home Appliances Corporation Intellectual Property Department

20080083436 - Method and apparatus for wafer cleaning: An apparatus for wet processing individual wafers comprising; a means for holding the wafer; a means for providing acoustic energy to a non-device side of the wafer; and a means for flowing a fluid onto a device side of the wafer.... Agent: Applied Materials/blakely

20080083437 - Method and apparatus for wafer cleaning: An apparatus for wet processing individual wafers comprising; a means for holding the wafer; a means for providing acoustic energy to a non-device side of the wafer; and a means for flowing a fluid onto a device side of the wafer.... Agent: Michael A. Bernadicou Applied Materials, Inc.

20080083438 - Apparatus for removing a coating from a substrate: A process of stripping a coating according to the invention comprises subjecting a coated substrate to an aqueous medium containing a peroxide and an interfacial mixing agent, and to heating preferably by either ultraviolet (UV) and/or infrared (IR) radiation. The substrate is completely stripped of the coating and suffers no... Agent: Philip G. Meyers Law Office

20080083439 - Cleaning method and cleaner device for laminated substrate fabrication apparatus: A method for cleaning a laminated substrate fabrication apparatus that efficiently cleans a surface used to attract a substrate while enabling stable cleaning. A cleaning unit, which includes an attraction surface for attracting and holding the substrate, is arranged in a processing chamber to clean the attraction surface.... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20080083440 - Microbubble washing composition, microbubble washing method, and microbubble washing apparatus: The present invention provides a microbubble washing composition for washing a human body or an animal, a microbubble washing method using the microbubble washing composition, and a microbubble washing apparatus suitable for carrying out the method are provided which are capable of safely removing sebum and old keratin adhering to... Agent: Birch Stewart Kolasch & Birch

20080078420 - Method for post-cmp wafer surface cleaning: A method for cleaning a wafer after a Chemical Mechanical Polishing (CMP) of the wafer includes: performing an ultrasonic cleaning on the wafer for time T1; cleaning the wafer with a chemical agent and then with deionized water for n times for time T2, T3, . . . , Tn+1,... Agent: Squire, Sanders & Dempsey L.L.P.

20080078421 - Reduction of entrance and exit marks left by a substrate-processing meniscus: A proximity head for generating and maintaining a meniscus for processing a substrate is described. The proximity head includes a plurality of meniscus nozzles formed on a face of the proximity head, the nozzles being configured to supply liquid to the meniscus, a plurality of vacuum ports formed on the... Agent: Martine Penilla & Gencarella, LLP

20080078422 - Nozzle for online and offline washing of gas turbine compressors: A nozzle assembly for cleaning turbines includes an offline cleaning nozzle and a pair of online cleaning nozzles. The offline cleaning nozzle directs cleaning fluid towards the inlet of turbine. The online cleaning nozzles direct a cleaning fluid in a fan-shaped pattern in a direction substantially parallel to the direction... Agent: Ip Group Of Dla Piper US LLP

20080078423 - Substrate processing method and substrate processing apparatus: Holes having a variety of shapes exist on a surface of a substrate. When pure water is supplied on the substrate in a rinsing process, part of the pure water enters the holes. The pure water which have entered the holes can be hardly shaken off even though the substrate... Agent: Ostrolenk Faber Gerb & Soffen

20080078424 - Methods to accelerate photoimageable material stripping from a substrate: Embodiments of methods for decreasing the process time for photoresist stripping from photomasks are herein disclosed. In some embodiments, a stripping solution and a cleaning solution are consecutively applied in an alternating manner to a photomask to remove photoresist from the mask. The stripping solution and the cleaning solution can... Agent: Applied Materials/blakely

20080078426 - Substrate processing apparatus and substrate processing method: A rinsing liquid (DIW) is discharged from a rinsing liquid discharge port formed in a blocking member to perform rinsing processing to a substrate surface while a nitrogen gas is supplied into a clearance space, and a liquid mixture (IPA+DIW) is discharged from a liquid mixture discharge port formed in... Agent: Ostrolenk Faber Gerb & Soffen

20080078425 - Substrate processing apparatus and substrate processing method: A substrate processing apparatus includes liquid tanks, a conveyor mechanism that dips multiple semiconductor substrates, arranged with provision of spaces, collectively into liquids in the liquid tanks, and water vapor spray nozzles disposed in gaps between the multiple semiconductor substrates so as to face rear surfaces of the semiconductor substrates.... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20080078427 - Substrate cleaning method and semiconductor device manufacturing method: According to an aspect of the invention, there is provided a substrate cleaning method of discharging cleaning liquid from a nozzle above a processing target substrate to clean the substrate while rotating the substrate such that the nozzle is scanned from the center of the substrate toward an outside of... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20080078428 - Substrate processing apparatus: An substrate processing apparatus includes a substrate holding unit, a process liquid supplying unit, a first guide portion provided around the substrate holding unit for guiding the process liquid scattered from the substrate, a second guide portion provided outside the first guide portion for guiding the process liquid scattered from... Agent: Ostrolenk Faber Gerb & Soffen

20080078429 - Cleaning device for paint rollers: Paint rollers may be cleaned of water soluble paints within this apparatus which is comprised of an enclosed housing with a drain at the bottom which also contains an oscillating water manifold the length of the roller which produces a series of water jets aligned with the elongated axis of... Agent: Paul M. Denk

20080078430 - Washing machine: An automotive parts washing machine (10) having a turntable (20). The turntable (20) has sprocket teeth (26) that are engaged by pins (29) of a pinion assembly (28).... Agent: Ladas & Parry