Cleaning and liquid contact with solids inventions 03/08

20080072924 - Fouling removing method: The present invention relates to a fouling removing method which removes a fouling, comprised of a chemical compound containing carbon, on an object surface by laser light irradiation. The fouling removing method irradiates the fouling on the object surface with laser light while blowing a supporting gas on this area.... Agent: Mcdermott Will & Emery LLP

20080072928 - Carbon dioxide dry cleaning: A method for cleaning objects in a cleaning fluid is disclosed. The cleaning fluid initially includes a dense phase gas and water and in a subsequent cleaning step at least part of the water is filtered out of the cleaning fluid.... Agent: Crowell & Moring LLP Intellectual Property Group

20080072927 - Water-based cleaning agent and method for cleaning a spray gun: The present invention generally relates to a cleaning agent for a spray gun and a method and apparatus for cleaning the spray gun, and more specifically, to the agent and method of use thereof for cleaning a water-based spray gun using a novel cleaning agent comprising a solvent of n-butanol,... Agent: Vedder Price Kaufman & Kammholz

20080072929 - Dilution gas recirculation: The present invention comprises a method and an apparatus for recirculating a process gas through a system. The process gas may be evacuated from the chamber, and a portion of the process gas may pass through at least a particle trap/filter while another portion of the process gas may be... Agent: Patterson & Sheridan, LLP

20080072930 - Dishwasher and method of controlling the same: Provided is an air break, a dishwasher having the air break, and a method of controlling the dishwasher. The dishwasher includes a tub defining a washing chamber, a sump for pumping washing water into the tub, an air break connected to the sump. The sump includes an overflow line, which... Agent: Mckenna Long & Aldridge LLP

20080072931 - Substrate processing apparatus and method: After the completion of a cleaning process by deionized water on substrates in a first processing bath, alcohol is supplied to the first processing bath by an alcohol supply part, to replace a processing liquid in the first processing bath by alcohol. Then, a cleaning process by a liquid of... Agent: Ostrolenk Faber Gerb & Soffen

20080072932 - Paint roller cover washer: A paint roller cover washer comprises a chamber open at one end to allow a used paint roller cover to be slipped in onto a spindle. A capped pipe section is attached along one side of the chamber parallel to the spindle, and the pipe section can be connected to... Agent: Gregory Smith & Associates

20080072925 - Wafer cleaning apparatus: A wafer cleaning apparatus preferably includes a first plate configured to hold a wafer. The first plate may have a first supply pipe configured to supply a cleaning solution to a first surface of the wafer. A second plate preferably has a second supply pipe configured to supply the cleaning... Agent: Marger Johnson & Mccollom, P.C.

20080072926 - Method for cleaning soi wafer: A method for cleaning an SOI wafer having a silicon thin film on an insulator, wherein the SOI wafer is subjected to two-fluid cleaning in which two or more fluids are mixed and used for cleaning the wafer. Thereby, there is provided a method for cleaning an SOI wafer that... Agent: Oliff & Berridge, PLC

20080072933 - Ventilation device for the discharge pipe of a water supply household appliance: A ventilation device for the discharge pipe for removing a flow medium pumped to a household appliance. A pipe ventilation valve is connected to the discharge pipe by a channel and comprises a valve body disposed in a float chamber filled with a working medium which is separated from the... Agent: Bsh Home Appliances Corporation Intellectual Property Department

20080072934 - Sump for dishwasher: A sump for a dishwasher includes a sump case for storing washing fluid, a washing pump assembly including a flow guide to pump out the washing fluid, and a filtering assembly including a flow guide to accumulate foreign particles contained in the washing fluid during the circulation of the washing... Agent: Mckenna Long & Aldridge LLP

20080072935 - Dishwasher: A dishwasher includes a tub defining a washing chamber, and a door rotatably connected to the tub. The door includes a door cover and a door liner connected to a rear side of the door cover. A condenser is disposed between the door cover and the door liner to condense... Agent: Mckenna Long & Aldridge LLP

20080072936 - Sump for dishwasher: A sump for a dishwasher includes a sump case for collecting washing fluid, a pump housing on the sump case, a filtering assembly provided on an upper portion of the pump housing, and a sealing member disposed around the pump housing. The pump housing is provided with a pump case... Agent: Mckenna Long & Aldridge LLP

20080072937 - Dishwasher with adjustable basket(s): A dishwasher is disclosed which includes a washing cabinet, a frame disposed within the washing cabinet, and a basket, which is placed on the frame, and whose height is adjustable by a back and forth movement. With this construction, there is no need to lift the basket, rotate it 90°,... Agent: Ked & Associates, LLP

20080072938 - Lift/immersion bath: The lift/immersion system for treating, particularly cleaning, workpieces, comprises at least two chambers into each of which a treatment liquid can be filled which forms an immersion bath, and a lift device as well as a basket connected thereto, into which the workpieces can be put. During the treatment process... Agent: Pyle & Piontek LLC

20080066778 - Method of cleaning uv irradiation chamber: A method of cleaning a UV irradiation chamber includes steps of: (i) after completion of irradiating a substrate with UV light transmitted through an optical transmitted window provided in the UV irradiation chamber, generating radical species of a cleaning gas outside the UV irradiation chamber; and (ii) introducing the radical... Agent: Knobbe Martens Olson & Bear LLP

20080066783 - Substrate treatment apparatus and substrate treatment method: A substrate treatment apparatus according to the present invention includes: a plate to be positioned in spaced opposed relation to one surface of a substrate and having a plurality of outlet ports and a plurality of suction ports provided in an opposed surface thereof to be opposed to the one... Agent: Ostrolenk Faber Gerb & Soffen

20080066784 - Methods and compositions for thermally treating a conduit used for hydrocarbon production or transmission to help remove paraffin wax buildup: Methods are provided for increasing the temperature of a section of conduit used for the production or transmission of hydrocarbon. According to one aspect, the method includes the steps of: (a) forming a treatment fluid comprising: (i) a carrier fluid; and (ii) a first reactant and a second reactant; and... Agent: Robert A. Kent

20080066786 - Method and apparatus for cleaning spin coater: A method of cleaning a spin coater apparatus is provided. In one embodiment, the method comprises providing a spin coater apparatus having a coater cup comprising a basin with sidewalls, a rotatable platform situated inside the cup adapted for holding and rotating a wafer to be coated, and a solvent... Agent: Birch, Stewart, Kolasch & Birch, LLP

20080066788 - Liquid hard surface cleaning composition: The present invention relates to a process of cleaning a hard surface, said process comprising the step of applying a liquid hard surface cleaner composition onto said hard surface in the form of a spray, wherein said composition comprises a hydrophobically modified nonionic polyol.... Agent: The Procter & Gamble Company Intellectual Property Division - West Bldg.

20080066787 - Treatment method and treatment apparatus for substrate: A method for treating a substrate using a supercritical fluid as a medium is disclosed. The method includes the steps of mixing the supercritical fluid with a chemical under a pressure higher than a pressure for treating the substrate, and subsequently treating the substrate with the supercritical fluid mixed with... Agent: Rader Fishman & Grauer PLLC

20080066779 - Removing solution, cleaning method for semiconductor substrate, and process for production of semiconductor device: The removing solution containing a cerium (IV) nitrate salt, periodic acid or a hypochlorite can be applied to metals containing copper, silver or palladium and also to metals containing other metals having a relatively large oxidation-reduction potential.... Agent: Young & Thompson

20080066780 - Substrate cleaning apparatus and substrate cleaning method using the same: Disclosed is a substrate cleaning apparatus including a brush cleaning unit which cleans a substrate by making a roll brush in contact with a surface of the substrate, and a transporting unit which conveys the substrate. The roll brush includes a bristle. At least one of a diameter of the... Agent: Young & Thompson

20080066781 - Stripe removal system: A system for removing paint and other coatings from hard surfaces is mounted on a truck for over-the-road travel. The truck bed carries a high power vacuum pump, a self propelled tractor with an attached blast head, a liquid reservoir, a sump or vacuum tank, and a ramp for loading... Agent: Mchale & Slavin, P.A.

20080066782 - Turbulent flow washing apparatus and method: Methods and apparatus utilizing turbulent fluid flow to wash soiled items. A washing chamber (2) is connected to a pump (10) and contains a baffle (5) that divides or partially divides the chamber (2). The baffle (5) contains one or more openings (12) through which fluid surges in response to... Agent: Quarles & Brady LLP

20080066785 - Method of refurbishing a magnet assembly for plasma process chamber: A method of refurbishing a wall of a plasma process chamber which has a surface with a magnet assembly fitted thereon. The magnet assembly has an expandable hollow collar with a plurality of magnets inside. In the method, the diameter of the hollow collar of the magnet assembly is expanded... Agent: Janah & Associates, P.C.

20080066789 - Steam mop: A steam mop having a main body having a boiler with a water inlet and a steam outlet positioned therein, a pump having an inlet and an outlet with the pump outlet connected to the boiler inlet, a water container for storing water connected to the pump inlet, and a... Agent: Michael I. Wolfson Greenberg Traurig LLP

20080066790 - Autonomous personal vehicle washing and drying system: An autonomous vehicle washing and drying apparatus (10) that is truly portable, easily stored, and capable of fully independent and automatic operation. The apparatus (10) is self-contained and requires no connection to a water or power source. One or more tanks (175) hold the necessary water, detergent and automotive chemicals... Agent: Darby & Darby (formerly Sacco & Associates)

20080060676 - Workpiece processing with preheat: A method for cleaning vias, trenches, or other features on a workpiece, such as a semiconductor wafer, includes pre-heating the wafer to a desired temperature. A heated processing or cleaning fluid is then applied to the workpiece. The workpiece may be heated to a temperature higher than the temperature of... Agent: Perkins Coie LLP/semitool

20080060677 - Wiper system and method for controlling the same: In a low speed wiping mode, reciprocal wiping movement of a wiper is executed at a first wiping speed without spraying the washer fluid from washer nozzles. In a high speed wiping mode, reciprocal wiping movement of the wiper is executed at a second wiping speed that is higher than... Agent: Posz Law Group, PLC

20080060679 - Apparatus for cleaning a drainable ostomy pouch and a method for cleaning a drainable ostomy pouch: There is disclosed a drainable ostomy pouch flusher which is easily inserted into a drainable pouch without spilling any of the flush water, and, a method for cleaning a drainable ostomy pouch which is less difficult, less time consuming, and which can be achieved with a high degree of cleanliness.... Agent: James D. Cashel Montgomery, Mccracken, Walker & Rhoads, LLP

20080060680 - Bulk supply apparatus and method for cleaning a combustion engine system: A method and apparatus for cleaning a combustion engine having, an intake and combustion chamber having a fuel injector injection device, an oil lubrication system, a catalytic converter and a fuel supply tank. Various solvents are introduced from bulk supply sources into the crank case and into the combustion chamber... Agent: James David Haynes

20080060681 - Apparatus and method for treating substrate: A substrate treating apparatus includes a treating unit including a treating bath which a treating solution is supplied into and stored in and treating solution supply means for supplying the treating solution into the treating bath; and a drying unit including a drying bath into which fluid is supplied and... Agent: Harness, Dickey & Pierce, P.L.C

20080060682 - High temperature spm treatment for photoresist stripping: A method for stripping photoresist and cleaning a semiconductor substrate include a high temperature stripping process in a freshly mixed SPM solution followed by cleaning in a water soluble organic co-solvent such as acetone, IPA, methanol, ethanol, butanol, or DMSO. The substrate may undergo back side heating during the SPM... Agent: Duane Morris LLPIPDepartment (tsmc)

20080060683 - Apparatus and methods for cleaning a wafer edge: Apparatus removes contaminants from edge areas of a wafer by spinning the wafer. Nozzles spray or jet fluid onto both the first and second sides of the wafer, near the edge of the wafer. Typically the spray or jet is at an acute angle to the wafer surface. Contaminants are... Agent: Perkins Coie LLP/semitool

20080060685 - Pulsed-gas agitation process for enhancing solid surface biological removal efficiency of dense phase fluids: Methods and systems for cleaning articles include a vessel into which the article is disposed and accompanying equipment associated with a fluid source to deliver pulses of dense phase gas to the vessel. Cleaning of the articles occurs by removing debris from the surfaces of the articles and/or by inactivating... Agent: Air Liquide Intellectual Property Dept.

20080060686 - Substrate processing apparatus, liquid film freezing method and substrate processing method: A cooling gas is discharged from a cooling gas discharge nozzle toward a local section of a front surface of a substrate on which a liquid film is formed. And then the cooling gas discharge nozzle moves from a rotational center position of the substrate toward an edge position of... Agent: Ostrolenk Faber Gerb & Soffen

20080060688 - Dishwashing machine: A dishwashing machine is capable of carrying out a normal washing program with a powder detergent as well as programs using solid detergents with additives having rinse aid properties and/or water softening properties. The machine includes a detergent dispenser having three chambers. Each chamber is adapted for a specific kind... Agent: Whirlpool Patents Company - Md 0750

20080060689 - Washing apparatus for an electric shaver: A washing apparatus for an electric shaver for flushing the shaver head unit of an electric shaver with a washing liquid to wash the shaver head unit, including a washer main body for holding the shaver head unit, a washing liquid tank mounted in the washer main body and storing... Agent: Quinn Emanuel Urquhart Oliver & Hedges. LLP Koda/androlia

20080060690 - Household washing appliance with biocide element in a wash chamber: A household washing appliance having a wash chamber with a sump region at the bottom is disclosed. The sump region is in communication with a filter housed in a filter chamber is disclosed. The appliance further includes a biocide element in communication with the wash chamber. The wash chamber operatively... Agent: Whirlpool Patents Company - Md 0750

20080060678 - Dust removal apparatus and method: The invention provides dust collecting apparatus 500 for use in collecting airborne dust adjacent to a moving surface, such as a paper web 511. The apparatus comprises an elongate duct 503 extending in a direction transverse to the direction of movement of the moving surface, the duct having along its... Agent: Kirk Hahn

20080060684 - Flat surface washing apparatus: An engine and high pressure pump are mounted onto a wheeled chassis. High pressure water is distributed to a rotating wand and nozzle assembly on the wheeled chassis so that as the chassis is moved along a linear path, high pressure water is sprayed onto an underlying surface to clean... Agent: Hancock Hughey LLP

20080060687 - Azeotropic compositions comprising fluorinated compounds for cleaning applications: The present invention relates to compositions comprising fluorinated olefins or fluorinated ketones, and at least one alcohol, halocarbon, hydrofluorocarbon, or fluoroether. In one embodiment, these compositions are azeotropic or azeotrope-like. In another embodiment, these compositions are useful in cleaning applications as a degreasing agent or defluxing agent for removing oils... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center

20080053478 - Substrate-processing method and method of manufacturing electronic device: A method of manufacturing an electronic device includes dipping a substrate in a solution containing sulfuric acid, which is accommodated in a processing vessel. An aqueous solution of hydrogen peroxide supplies the sulfuric acid accommodated in the processing vessel for generating peroxomonosulfuric acid (Caro's acid). Therefore, an organic material present... Agent: Pearne & Gordon LLP

20080053480 - Burr hog cleaning device: An automated cleaning device for dental drill bits, also called dental burrs. The cleaning device includes an enclosed cleaning compartment that houses two rotating, circular brushes. The dental burr is guided through a small opening in the cleaning compartment and forced in between the two rotating brushes. The dental burr... Agent: Seto Patents

20080053479 - Vacuum cleaning tool and method for its operation: A vacuum cleaning tool has a housing having a connecting socket for effecting flow communication to a vacuum device of a vacuum cleaning device. The housing has a suction opening through which a working air flow enters the housing. The housing has an outlet opening through which the working air... Agent: Gudrun E. Huckett Draudt

20080053484 - Apparatus and method for cleaning solids from a tank: A method and system for removing solid materials from an oil production tank containing a liquid hydrocarbon portion and a solid portion is provided. The system includes an intake for drawing off a portion of the liquid hydrocarbon and a solid portions from the tank. A rotational particle separator receives... Agent: Fulwider Patton LLP

20080053485 - Method for cleaning and drying substrate: A method for cleaning and drying a substrate in order to restrain formation of minute defects on a substrate surface when the substrate is dried by supplying the vapor of an organic solvent such as IPA. The method comprises the steps of: rinsing a surface of the substrate in a... Agent: Mcdermott Will & Emery LLP

20080053487 - Substrate processing method and substrate processing apparatus: A method capable of eliminating occurrence of a development failure when a DI water discharge nozzle 20 is scanned to dry a substrate by spinning is provided. A substrate W is held in a horizontal posture by a spin chuck 10 and rotated about a vertical axis by a rotation... Agent: Ostrolenk Faber Gerb & Soffen

20080053488 - Substrate treatment apparatus and substrate treatment method: A substrate treatment apparatus according to the present invention includes: a substrate holding unit which holds a substrate; a push-pull plate to be positioned in spaced opposed relation to one surface of the substrate held by the substrate holding unit, the push-pull plate having a plurality of outlet ports which... Agent: Ostrolenk Faber Gerb & Soffen

20080053489 - Substrate cleaning method: A method is provided for reducing the amount of film fragments discharged into a processing liquid circulation system during removal of films from wafers, thereby reducing the frequency of filter cleaning or filter placement. The method includes exposing a wafer containing a film formed thereon in a process chamber of... Agent: Wood, Herron & Evans, LLP (tokyo Electron)

20080053490 - Method for hydrating a contact lens: The method involves filling a well containing a contact lens with aqueous solution. Multiple injection nozzles inject streams of the aqueous solution into the well. The multiple injection nozzles are arranged to prevent non-centering of the contact lens in the well.... Agent: Bausch & Lomb Incorporated

20080053495 - Fluid cleaning system: A fluid cleaning system includes a fluid source connected to a pump that is used to increase the pressure of the fluid. A two-way valve selectively allows the higher pressure fluid to flow back into the tank, or to flow to a rotary union. The union has a nozzle attached... Agent: Brooks Kushman P.C.

20080053481 - Installation and method for driving a submarine pipeline scraper: An installation for and a method for driving a submarine pipeline scraper, wherein one of the ends of the pipeline has a launch device and the other end has a receiving device. The scraper defines an upstream chamber and a downstream chamber. It can be launched inside the pipeline from... Agent: Ostrolenk Faber Gerb & Soffen

20080053482 - Compliant design of a horizontal solid-bowl centrifuge with cleaning-in-place nozzles: A horizontal solid-bowl centrifuge with cleaning-in-place jet nozzles for cleaning the bowl in a manner complying with good manufacturing procedure is provided. The bowl is cleaned by a defined arrangement of the cleaning jet nozzles, as the bowl rotates at a speed insufficient to produce a centrifugal force equal to... Agent: Synnestvedt & Lechner, LLP

20080053483 - Method for removing acidic deposit: A method for removing an acidic deposit containing a sulfur compound, which comprises contacting the acidic deposit with a prescribed amount of an aqueous cleaning fluid, characterized in that the concentration of sulfate ion (SO42−) in the aqueous cleaning fluid is measured, and the contact with the aqueous cleaning fluid... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080053486 - Semiconductor substrate cleaning apparatus: A semiconductor substrate processing apparatus and a method for processing semiconductor substrates are provided. The semiconductor substrate processing apparatus may include a liquid container where a semiconductor substrate may be immersed in a semiconductor processing liquid. The semiconductor substrate may then be removed from the semiconductor processing liquid while vapor... Agent: Blakely Sokoloff Taylor & Zafman

20080053491 - Wafer protection system employed in chemical stations: Semiconductor wafers have ashed photoresist residue and/or post-etch residue thereon to be cleaned through the chemical wet station, and a pattern of exposed metal layer. Post-etch residue removing solvent such as EKC-270 is fed into the solvent tank through a first solvent valve and first liquid feeding conduit that connected... Agent: North America Intellectual Property Corporation

20080053492 - Assembly & system for isolation of waste water in outdoor, open-air wash station: A system and method for the collection of waste water generated in the course of maintenance or washing of a large object in an open-air, outdoor environment. The system, in its simplest form, includes a wash deck having a drain located within a valley of the deck, an interceptor drain... Agent: Carey, Rodriguez, Greenberg & Paul LLP Attn: Steven M. Greenberg, Esq.

20080053493 - Substrate processing apparatus: A processing liquid stored in a recovery tank is stored in a purification tank after passing through an impurity removal filter and an ion component removal filter via a pipe by a suction operation of the pump. In the impurity removal filter, impurities (e.g., water, an etching residue, particles, or... Agent: Ostrolenk Faber Gerb & Soffen

20080053494 - Washing agent dispenser device for dishwashers: The main feature of the device is that it comprises connection and/or integration means suitable for associating said first body (1A) with at least one accessory component (1B; 1C, 1D, 1E, 1F) of said dishwasher, for the main purpose of providing optimal flexibility and efficiency of the washer, which employs... Agent: Norris, Mclaughlin & Marcus