Cleaning and liquid contact with solids inventions 02/08

20080047575 - Apparatus, circuitry, signals and methods for cleaning and processing with sound: The invention utilizes a multiple frequency ultrasound generator driving a multiple frequency harmonic transducer array to improve cleaning and processing effects while eliminating damage to parts being cleaned. An AC switch and circuitry to modify the output of an ultrasound generator in combination with techniques such as random AM and... Agent: Foley & Lardner LLP

20080047580 - Apparatus and method for treating substrates: A substrate treating apparatus for stripping photoresist on a substrate includes a support part for supporting the substrate, a dry-type treating part for stripping the photoresist on the substrate, and a wet-type treating part for stripping the photoresist on the substrate. While the substrate is supported by the support part,... Agent: Jenkins, Wilson, Taylor & Hunt, P. A.

20080047579 - Detecting the endpoint of a cleaning process: A method for determining the endpoint of a cleaning process in which a metallic residue is removed from an underlying surface which comprises a metal by contacting the residue with a cleaning agent which volatilizes the residue and which tends to attack the metal of the underlying surface and volatilizes... Agent: Air Products And Chemicals, Inc. Patent Department

20080047578 - Method for preventing clogging of reaction chamber exhaust lines: An apparatus and method are disclosed for cleaning exhaust lines from a reaction chamber used in manufacturing semiconductor devices. In particular, an apparatus is disclosed for receiving an exhaust gas from a semiconductor processing reaction chamber, mixing said exhaust gas with a cleaning gas, exciting the mixture to a plasma... Agent: Duane Morris LLPIPDepartment (tsmc)

20080047584 - Method for cleaning diffraction gratings: A method of cleaning a diffraction grating preferably includes exposing the grating surface to an aqueous base to remove an organic photoresist mask thereon; rinsing the grating surface with de-ionized water; oxidizing acid solution (such as Nanostrip™ or Nanostrip™ 2X) to remove metallic contaminants and residue organic compounds; rinsing the... Agent: James S. Tak Lawrence Livermore National Laboratory

20080047586 - Systems and methods for operating and monitoring abatement systems: Methods and systems are provided for abating effluent from a process tool. The invention includes one or more process tools; one or more abatement systems; and an interface manifold adapted to establish effluent fluid communication between the one or more process tools and the one or more abatement systems, wherein... Agent: Dugan & Dugan, PC

20080047587 - Method and apparatus for cleaning tanks and other containers: A closed-loop system for cleaning tanks and other enclosures utilizing adjustably mounted nozzles for spraying water, other wash fluid and/or beneficial chemical additive within the tanks or other enclosures to be cleaned. Effluent wash fluid leaving a tank is directed to a separator unit for separation of liquids and solids.... Agent: Ted M. Anthony Suite 1600

20080047589 - Apparatus and methods of cleaning substrates: An apparatus for wafer cleaning includes an enclosure. A stage is within the enclosure. At least one first wall is within the enclosure, around the stage. A plate is within the enclosure and above the stage, operable to enclose a first region between the stage and the first wall. The... Agent: Duane Morris LLPIPDepartment (tsmc)

20080047591 - Bell cup cleaning system and method: A spray applicator cleaning system and a method includes a valve and control means for discharging air and solvent in alternating bursts to shaping air nozzles, a coating supply conduit and a dedicated cleaning nozzle on the applicator.... Agent: Taylor & Aust, P.C. Illinois Tool Works Inc.

20080047576 - Single-substrate type apparatus for processing a substrate: In a single-substrate type apparatus for processing a substrate, the apparatus includes a chamber, a bottom panel, a solution supplying part and a substrate holder. The chamber has an upper portion and a lower portion. The bottom panel is detachably connected to the lower portion. The solution supplying part is... Agent: Marger Johnson & Mccollom, P.C.

20080047577 - Substrate cleaning device and cleaning method thereof: A substrate cleaning device includes a rotating table that rotatably holds a silicon substrate. A light irradiation device is capable of irradiating at least a portion of a surface of the held silicon substrate with light. A nozzle is capable of selectively supplying at least N2O water and a hydrofluoric... Agent: Slater & Matsil, L.L.P.

20080047582 - Method and apparatus for wafer cleaning: An apparatus for wet processing individual wafers comprising; a means for holding the wafer; a means for providing acoustic energy to a non-device side of the wafer; and a means for flowing a fluid onto a device side of the wafer.... Agent: Applied Materials/blakely

20080047581 - Vapor phase growth and apparatus and its cleaning method: A mass flow controller is connected to an exhaust path of a reaction chamber. A controller detects cleaning completion in accordance with a change of an output signal of the mass flow controller in cleaning the reaction chamber.... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20080047583 - Substrate processing method and apparatus: A substrate processing method can form highly-reliable interconnects with little current leakage between interconnects without causing significant damage to the interconnects. The substrate processing method comprises heating and reacting a contaminant on a substrate with a carboxylic acid in an atmosphere containing the carboxylic acid, thereby removing the contaminant.... Agent: Wenderoth, Lind & Ponack, L.L.P.

20080047585 - Cleaning apparatus and cleaning method: A cleaning apparatus which can efficiently and satisfactorily clean component parts facing narrow spaces. A mixture of a substance in gaseous form and the same substance in liquid form or solid form as the former is jetted out from a jet pipe toward deposits attached to a structural object. The... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080047588 - Conveyor-type dishwasher and method for operating it: Dishwasher and method of operating it, wherein a wash operation is followed by a hot post-wash operation during which a hot post-wash liquid has a higher temperature than a final-rinse liquid.... Agent: Thompson Hine LLP Intellectual Property Group

20080047590 - Simplified device for cleaning an object: A cleaning device comprising an enclosure, a cover allowing it to be opened in order to place an object to be cleaned within the enclosure, a supply of cleaning fluid, the enclosure comprising a piston that can move thanks to a motor, a geometry allowing a contact with an external... Agent: Ronald R. Santucci Frommer Lawrence & Haug

20080047592 - Alkaline chemistry for post-cmp cleaning: This disclosure discusses cleaning of semiconductor wafers after the Chemical-Mechanical Planarization (CMP) of the wafer during the manufacturing of semiconductor devices. Disclosed is an alkaline chemistry for the post-CMP cleaning of wafers containing metal, particularly copper, interconnects. Residual slurry particles, particularly copper or other metal particles, are removed from the... Agent: Air Liquide Intellectual Property

20080047593 - Rollover car wash for large vehicles: A vehicle washer of the rollover type especially suitable for washing large vehicles such as buses and trucks. The washer includes an overhead carriage moving along an overhead guide rail structure and including opposed L-shaped spray arms adapted to wash top and side surfaces of the vehicle as the carriage... Agent: Young & Basile, P.C.

20080047594 - Car washing appliance: A car washing appliance has first and second cotton sheets which are joined together about their respective edges to cooperate to define a cavity therewithin. An opening in one of the sheets enables access to the cavity in which is deposited a quantity of detergent. Preferably, the detergent is a... Agent: The Weintraub Group, P.L.C

20080041417 - Device and method for cleaning selective catalytic reduction protective devices: One embodiment described herein relates to a system for removing pollutants from a flue gas. The system includes a selective catalytic reduction (SCR) system having a SCR reactor containing a NOx reducing catalyst and one or more SCR protective devices. At least one of the SCR protective devices is connected... Agent: Wiggin And Dana LLP Attention: Patent Docketing

20080041423 - Apparatus and method for cleaning and removing liquids from front and back sides of a rotating workpiece: An apparatus for simultaneously rinsing and drying front and back surfaces of a workpiece comprises a chuck adapted to spin the workpiece, a plurality of posts coupled to the chuck and adapted to support the workpiece, and first and second mechanical arms. The first mechanical arm is adapted to be... Agent: Ingrassia Fisher & Lorenz, P.C.

20080041430 - Cleaning solution spraying unit and wafer cleaning apparatus with the same: There is provided a cleaning solution spraying unit. The cleaning solution spraying unit comprises a number of nozzles installed in a nozzle base, along a top surface of a wafer, and radially spraying a cleaning solution on the wafer, wherein the nozzle base is positioned above the wafer; and a... Agent: Mills & Onello LLP

20080041414 - Pump cleaning: The invention relates to the cleaning of a pump used to evacuate a semiconductor process tool. During use of the pump, a reactant such as NF3 is introduced into a foreline extending between the tool and the pump. A plasma generator located within the foreline generates from the NF3 fluorine... Agent: The Boc Group, Inc.

20080041415 - Clean process for an electron beam source: One embodiment of the present invention is a method for cleaning an electron beam treatment apparatus that includes: (a) generating an electron beam that energizes a cleaning gas in a chamber of the electron beam treatment apparatus; (b) monitoring an electron beam current; (c) adjusting a pressure of the cleaning... Agent: Applied Materials C/o Pillsbury Winthrop Shaw Pittman LLP

20080041418 - Anti-soiling detergent composition: To provide an anti-soiling detergent composition that has excellent detergency, endows cleaned surfaces with a pronounced anti-soiling effect, effectively sustains the anti-staining effect, possesses superb storage stability, and can be used on restrooms, sinks, baths, and other damp, hard surfaces. The anti-soiling detergent composition contains (A) 0.05 to 10 mass... Agent: Johnsondiversey, Inc.

20080041416 - Dispensing brush: A dispensing brush is used to groom while deodorizing and/or styling the receiver. The receiver can be a human but is commonly a household pet such as a dog or cat. The brush is comprised of a head attached to a handle and includes a bristle cap mounted to the... Agent: M2 Ventures LLP

20080041419 - Multi-tank dishwasher comprising a backwash device: Multi-tank dishwashers are used, in particular, industrially, in order to clean items which are to be washed. The invention relates to a multi-tank dishwasher which is provided with a washing area. The washing area comprises at least one rinsing water storage tank, at least one filter housing, at least one... Agent: Mg-ip Law, PLLC

20080041422 - Semiconductor substrate cleaning system: A modular semiconductor substrate cleaning system is provided that processes vertically oriented semiconductor substrates. The system features a plurality of cleaning modules that may include a megasonic tank-type cleaner followed by a scrubber. An input module may receive a horizontally oriented substrate and rotate the substrate to a vertical orientation,... Agent: Dugan & Dugan, PC

20080041420 - Substrate cleaning method and computer readable storage medium: A wafer W is processed by supplying a two-fluid, high pressure jet water, or mega-sonic water onto the wafer W, while rotating the wafer W in an essentially horizontal state. After supply of the cleaning fluid is stopped, the wafer W is dried by rotating the wafer W at a... Agent: Smith, Gambrell & Russell

20080041421 - Vacuum cleaner with removable dust collector, and methods of operating the same: A vacuum cleaner includes a dust collector that compresses dust stored inside a dust container to minimize the volume of the dust. The dust collector would include one or more pressing plates that are used to compress the dust stored in dust collector. Various methods are used to control movements... Agent: Ked & Associates, LLP

20080041425 - Instant stain removing device, formulation and absorbent means: A device for applying stain treatment formulation to a garment or article of clothing while it is being worn is disclosed. The device includes a reservoir with an applicator tip for containing the formulation and dispensing the formulation to a stain, spot or mark on the garment. The device also... Agent: S.c. Johnson & Son, Inc.

20080041424 - Liquid applicator and absorbent scrubbing means: A device for applying a functional formulation to a surface is disclosed. The device includes a reservoir with a valve assembly for dispensing an effective stain removal formulation directly to the stain, spot or mark. The device also includes a shell accommodating absorbent pads. In use, the functional formulation is... Agent: S.c. Johnson & Son, Inc.

20080041426 - Device for washing vehicle wheels: A device is disclosed for washing vehicle wheels with a rim and a tyre mounted thereon, comprising a supporting member for supporting a wheel, so that the wheel may rotate about its axis of symmetry, and means for driving a rotation of the wheel about said axis of symmetry in... Agent: Cantor Colburn, LLP

20080041427 - Temperature control of a substrate during wet processes: Embodiments of the invention provide methods of applying a liquid to a backside of a substrate to bring the substrate to the temperature of the liquid. By controlling the temperature of the substrate the temperature of the semiconductor processing liquid may be maintained at a particular temperature or a type... Agent: Intel/blakely

20080041428 - Device and method to prevent the exsiccation of fluid products in a dispensing machine for said products: A device to prevent the exsiccation of fluid products in a delivery head of a dispensing machine for said fluid products. The device comprises a first element able to generate a flow of air mixed with steam or with at least a solvent, and a second element able to convey... Agent: Vern Maine & Associates

20080041429 - Photomask cleaner: A photomask cleaner includes a clamp assembly using clamping plates with an elastic buffer device for clamping a photomask to be cleaned positively, a displacement mechanism for moving the clamp assembly among workstations subject to a predetermined track, a cleaning unit installed in one workstation for cleaning the photomask carried... Agent: Bacon & Thomas, PLLC

20080035168 - Prime coat, indicia and clear coat removal process for a golf ball: A process for removing the coating layers from finished golf balls is disclosed herein. The process involves soaking the golf balls in a removal solution and then subjecting the golf balls to ultrasonic treatment in order to remove a coating layer, an indicia and/or a paint layer.... Agent: Callaway Golf C0mpany

20080035170 - Cleaning apparatus for cleaning a chamber used in manufacturing a semiconductor device and method of cleaning a chamber by using the same: In a cleaning apparatus and a method of cleaning a chamber used in manufacturing a semiconductor device, a first plasma may be provided into a chamber to remove a first residue from an inner wall of the chamber where the first residue is attached. A second plasma may then be... Agent: Harness, Dickey & Pierce, P.L.C

20080035174 - Soluble foaming article:

20080035176 - Automated cart and container cleaning system: The present invention relates to a mobile or stationary waste container cleaning system used for residential, commercial and industrial waste, garbage, trash, storage or operations containers or receptacles. Other applications include, but are not limited to cleaning of chemical drums, grease dumpsters (e.g. behind restaurants), rain barrels and non-uniform residential,... Agent: Peacock Myers, P.C.

20080035179 - Surface treatment device: A surface treatment device (10) is provided for applying a surface treatment medium to an article (60). The device comprises an application member (12, 14) for holding and applying the surface treatment medium to the article. The device has a securing arrangement (40) for securing the application member to the... Agent: Oliff & Berridge, PLC

20080035189 - Lid operating mechanism for a drawer-type dishwasher: A dishwasher includes an outer housing, a drawer having front, rear, bottom and opposing side walls that collectively define a washing tub, a lid for selectively closing the washing tub and an operating mechanism that raises and lowers the lid as the drawer is shifted into and out of the... Agent: Diederiks & Whitelaw, PLC

20080035181 - Cleaning apparatus: In order to achieve the above described object, the present invention provides a cleaning apparatus comprising cleaning lines 2A and 2B comprised of lower and upper two levels, each of the levels comprising a plurality of cleaning processing chambers 2a to 2d or 2e to 2h; a center transporting means... Agent: Paul A. Fattibene Fattibene & Fattibene

20080035182 - Substrate treatment apparatus: A substrate treatment apparatus, comprising a box-shaped treatment tank (11) having an opening part at its upper side and a cover body (21) openably covering the opening part of the treatment tank. The cover body (21) is characterized in that a drying chamber (23) storing and drying a treated substrate... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20080035169 - Cleaning means for large area pecvd devices using a remote plasma source: This invention describes a method for cleaning a deposition chamber that is compatible with large area deposition. It comprises transport of activated gas from a remote plasma source to an area in the chamber in a uniform way through at least two injection points on equivalent paths for the reactive... Agent: Pearne & Gordon LLP

20080035171 - Cleaning method and cleaning apparatus for porous member: A porous member cleaning method enables effective cleaning of the interior of a porous member even when it has a small pore size, a high density and a large volume. The porous member cleaning method includes: disposing a porous member in a hermetic space, and cleaning the interior of the... Agent: Wenderoth, Lind & Ponack, L.L.P.

20080035172 - Method and apparatus for cleaning consumable drink and food containers: A cleaning apparatus configured to clean a consumable drink or food container includes a handle portion, a bristle base, and a plurality of bristles. The handle portion, which is generally cylindraceous, includes a first end, a second end, a grip, and an end portion. The grip is positioned proximate to... Agent: Frost Brown Todd, LLC

20080035173 - Stem web: A stem web is disclosed that comprises a backing layer having a first surface and a second surface, and an array of 600 to 20000 upstanding stems projecting from the first surface of the backing. The stems comprise a height from 0.3 and 2.0 millimeters and a shore hardness less... Agent: 3m Innovative Properties Company

20080035175 - Conveyor-type dishwasher and method for operating it: A conveyor-type dishwasher and related method of operation utilizes a recirculated spray solution for a spray operation of items to be cleaned and produces a control signal that is contamination dependent or time dependent to cause a filtering operation to be carried out on the recirculated spray solution or a... Agent: Thompson Hine LLP Intellectual Property Group

20080035177 - Method and apparatus for flushing asphalt feeding devices: A vehicle mounted patching system for patching potholes and the like and incorporating method and apparatus for removing and flushing asphalt emulsion from the feed lines of the patcher which completely recycles the cleaning agent used to flush the feed lines, as well as eliminating any external discharge of potentially... Agent: Volpe And Koenig, P.C. Dept. Mot

20080035178 - Process for cleaning passages in workpieces, and associated apparatus: The invention relates to a process for cleaning passages in workpieces, in particular cooling-air passages in turbine components, such as transition pieces or turbine blades or vanes, wherein the workpiece having the passages is immersed in a liquid bath and a liquid is suddenly forced under pressure through the passages.... Agent: Siemens Corporation Intellectual Property Department

20080035180 - Controlling accumulation of select adsorbers on a piezoelectric cantilever sensor: The techniques described herein are directed to removing material that has attached to or preventing material from attaching to the surface of a piezoelectric cantilever. The material can be a target material, other, non-target, material that may be weakly bound or attached to the cantilever sensor, or the material may... Agent: Woodcock Washburn LLP

20080035183 - Dishwasher with a modular structure: A dishwasher with a rinsing container having the advantages of an inert, steel rinsing container, which is easy to produce and which can be adapted to differing requirements. Said aim is achieved in that the dishwasher is provided with a bottom module and a rinsing container, wherein the bottom group... Agent: Bsh Home Appliances Corporation Intellectual Property Department

20080035184 - Cleaning nozzle: The cleaning nozzle according to the invention having a nozzle body (100) and a nozzle head (104) arranged on a shaft (106) rotatably seated on said nozzle body, and having a cavity (107), which extends in axial direction in said nozzle body (100) and which is connected with a pressurized... Agent: Darby & Darby P.C.

20080035185 - Apparatus for cleaning paint rollers: An apparatus for cleaning a paint roller includes a container having a top with an insertion opening for introducing a paint-carrying surface of the paint roller into the container and a bottom with a discharge opening for discharging paint out of the container. A spray pipe has holes formed therein... Agent: Lerner Greenberg Stemer LLP

20080035186 - Dishwasher: A dishwasher includes a housing, a dish rack movably disposed in the housing, and a first and a second roller respectively disposed on opposite sides of the dish rack. The first and second rollers are configured to movably support the dish rack on respective first and second running surfaces. A... Agent: Darby & Darby P.C.

20080035187 - Fuel supply component cleaning system: A method is provided for operating a regeneration assembly to regenerate a filter assembly during a regeneration cycle, and for supplying fuel through a fuel flow path to at least one fuel injector unit associated with the regeneration assembly during the regeneration cycle. The method includes dispensing a cleaning substance... Agent: Caterpillar/finnegan, Henderson, L.L.P.

20080035188 - Water vapor cleaning system: A water vapor cleaning system includes a vapor-producing chamber in communication with a water source, e.g. a hot water line, of an existing plumbing system. The vapor-producing device includes a vapor exit. The cleaning system includes a nozzle having an inlet, an outlet, and a valve selectively allowing or denying... Agent: Harshaw Research, Inc.

20080029123 - Sonic and chemical wafer processor: A workpiece processor has a process chamber for holding a liquid. A sonic element, such as a megasonic transducer, is positioned to provide sonic energy into the liquid. A workpiece holder is moveable from a first position, wherein a workpiece is held immersed in the liquid, for sonic processing, to... Agent: Perkins Coie LLP/semitool

20080029125 - Method and apparatus for damage-free, single wafer, sonic boundary layer, megasonic cleaning: A method and apparatus for megasonic cleaning of semiconductor wafers. The wafer is positioned so that the surface to be cleansed is parallel to and faces the radiating surface of a quartz or similar resonator which receives sonic waves through a liquid medium from a transducer. The sonic waves striking... Agent: Zimmerman & Cronen, LLP

20080029126 - Compositions and methods for improved planarization of copper utilizing inorganic oxide abrasive: The present invention provides an aqueous composition useful for polishing copper on a semiconductor wafer at a down force pressure of at least less than 20.68 kPa, comprising by weight percent oxidizer, 0.001 to 5 inhibitor for a nonferrous metal, complexing agent for the nonferrous metal, 0.01 to 5 carboxylic... Agent: Rohm And Haas Electronic Materials Cmp Holdings, Inc.

20080029127 - Method of applying solution of oil repellent: First, an object and an applicator for supplying a solution prepared by dissolving an oil repellent in a volatile solvent are arranged with an end of the applicator and the object substantially away from each other. Then, the solution is supplied from a solution reservoir for storing the solution to... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20080029128 - Apparatus and method for cleaning a spray gun: A cleaning unit for cleaning a spray gun positioned in or within a direct vicinity to a spray booth includes a cleaning nozzle and a media delivering system. A valve communicates with the media delivering system and controls an outflow of cleaning media from the cleaning nozzle.... Agent: Tarolli, Sundheim, Covell & Tummino L.L.P.

20080029129 - Flue pan washer for maple sugar evaporator: The present invention is directed to an automatic washer system mounted within a maple sugar evaporator above the rear flue pan for removing niter and sediment built up during the boiling of sap. The evaporator comprises a furnace, a steam hood, a pan and a nozzle for washing the pan.... Agent: Thomas G. Ference

20080029124 - Electric switch cleaning apparatus and method: An electric switch cleaning apparatus and method. The apparatus includes a transformer adapted to deliver AC voltage less than what is lethal to a human, a voltage-providing component for providing AC voltage to the transformer, connectors for temporarily making electrical connections to an electrical switch, a current-conducting component coupled to... Agent: Hartman & Hartman, P.C.

20080029130 - Surface active bleach and dynamic ph: The present invention provides methods and compositions for dynamic pH control, particularly in detergent applications. In particularly preferred embodiments, the detergent compositions find use in surface removal of soils from fabrics, including clothing. In some particularly preferred embodiments, the present invention provides combinations of enzymes to provide for dynamic pH... Agent: Kamrin T. Macknight Genencor International, Inc.

20080029131 - Device for operating a conveying dishwashing machine: A conveyor dishwasher is provided with a transporting arrangement for transporting wash ware through a plurality of treatment zones through which the wash ware is transported in the transporting direction. At least one of spray systems provided in the treatment zones can be moved relative to the transporting direction of... Agent: Mg-ip Law, PLLC

20080029132 - Ultrasonic cleaning apparatus: An ultrasonic cleaning apparatus which cleans a material at a surface by supplying an ultrasonic wave from an ultrasonic wave application head to a cleaning liquid on the surface, and cleans the surface, wherein the ultrasonic wave application head has an ultrasonic wave transmission member which is provided opposite the... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080029133 - Portable cleaning system and method: A portable cleaning system and method of use are provided. In one form, a portable cleaning system includes an elongated housing including openings at non-contiguous opposing ends and an internal spray system operable to spray contents placed within the housing along a three hundred and sixty (360) degree radius at... Agent: Raymond M. Galasso Galasso & Associates Lp

20080029134 - Powered cleaner/polisher: A motorized cleaning/polishing device includes a housing and a carrier with a detachable cleaning/polishing attachment. The housing contains a rechargeable battery, motor and flex mount having flexible pillars to which the carrier is mounted. The carrier is also coupled to the motor drive shaft via an eccentric element and bearing.... Agent: S.c. Johnson & Son, Inc.

20080029136 - Undercarriage washer: The present invention describes an undercarriage washer including a stabilizing skid plate and an outlet that permits non-vertical fluid discharge. The washer is adapted for use with a high-pressure washing fluid. The undercarriage washer includes a rigid tube and an angled inlet and an outlet. A skid plate is fixedly... Agent: James R. Williams

20080029135 - Car wash apparatus with pivotable arms: An apparatus for washing a vehicle that is relatively moved through the apparatus includes pivotal side arms with independently pivotal nozzles for the dispensing of cleansing fluids as well as a pivotal overhead boom that also includes independently pivotal nozzles so that the side arms and the boom as well... Agent: Dorsey & Whitney, LLP Intellectual Property Department