Cleaning and liquid contact with solids inventions 10/07

20070246070 - Dispenser for a drawer-type dishwasher: A drawer-type dishwasher includes a dispenser mounted to a basin slidably supported in an outer body of the dishwasher. The dispenser includes a main body portion, a reservoir formed in the main body portion for receiving detergent and a lid hingedly mounted for selectivity closing the reservoir. The reservoir includes... Agent: Diederiks & Whitelaw, PLC #301

20070246077 - Dispenser rinse system for a drawer-type dishwasher: A drawer-type dishwasher includes a tub having front, rear, bottom and opposing side walls that collectively define a washing chamber and a lid shiftably mounted relative to the tub for selectively closing the washing chamber. A dispenser is mounted to one of the front, rear and opposing side walls and... Agent: Diederiks & Whitelaw, PLC

20070246078 - Wash/rinse system for a drawer-type dishwasher: A wash/rinse system for a drawer-type dishwasher includes a wash mechanism having a paddlewheel and a spray bar mounted in a washing chamber of the dishwasher. The spray bar includes at least one nozzle that is positioned so as to deliver a jet of washing fluid onto a deflector member... Agent: Diederiks & Whitelaw, PLC

20070246089 - Pump housing for a domestic appliance: A domestic appliance includes a pump that establishes and directs a flow of washing fluid into a tub during a washing operation. The pump includes a pump housing having a rigid main body portion that defines an inlet section and an outlet section, as well as a plurality of resilient... Agent: Diederiks & Whitelaw, PLC

20070246090 - Multi-piece dishrack for a drawer dishwasher: A dishrack system for a drawer-type dishwasher having a tub including bottom, rear and opposing side walls includes a side portion and a readily removable base portion supported by the side portion. The side portion includes a base section having first and second leg members, and a back wall section.... Agent: Diederiks & Whitelaw, PLC

20070246062 - Method of cleaning deposition chamber: A process for cleaning a deposition chamber. The process includes feeding a fluorine-containing gas into the deposition chamber; maintaining the fluorine-containing gas in the deposition chamber at a first pressure; providing RF power to ignite plasma of the fluorine-containing gas within the deposition chamber; keeping the deposition chamber at a... Agent: North America Intellectual Property Corporation

20070246063 - Method of performing a pressure calibration during waferless autoclean process: A method of performing pressure calibration in a chamber during a waterless dry plasma cleaning process is provided, wherein the chamber is used to perform a wafer contact etch. First, the chamber is placed on-line. Next, pressure calibration is performed using a gas. A first waferless dry plasma cleaning process... Agent: Akin Gump Strauss Hauer & Feld L.L.P.

20070246064 - Method of treating a substrate: A method of cleaning a substrate within a controlled environment includes placing the substrate into a high pressure vessel. The high pressure vessel is then supplied with a dense fluid under pressure. The dense fluid is contacted with the substrate for a selected period of time to at least partially... Agent: Dufault Law Firm, P.C.

20070246065 - Ion sampling method for wafer: An ion sampling method for wafer provides a wafer in a sampling chamber, wherein the wafer surface that is going to be sampled faces upward; spraying an extraction liquid continuously on the wafer surface to form a liquid film thereon; keeping the thickness of the film constant for dissolving the... Agent: Jianq Chyun Intellectual Property Office

20070246066 - Method for cleaning an automatic process device: This invention pertains to a method for cleaning an automatic process device. The device is an apparatus for thermally treating a photosensitive element to form a relief surface. One or more contactable surfaces in the device can become contaminated with residue or other materials deposited from the photosensitive element during... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center

20070246067 - Closed-loop system for cleaning vessels containing drilling fluid residue: A closed-loop system for cleaning vessels containing drilling fluid residue. High pressure jets of water-based cleaning fluid are used to clean the interior of a vessel. The resulting slurry is sent to one or more solids/liquid separation stages to remove drill cuttings and other drilling fluid solids. The substantially solids-free... Agent: Kean, Miller, Hawthorne, D'armond, Mccowan & Jarman, L.L.P.

20070246068 - Drip shield for a drawer-type dishwasher: A drip shield is mounted to a drawer of a drawer-type dishwasher so as to extend along an outer rear surface of the drawer and catch droplets of washing fluid falling from a lid of the dishwasher. The drip shield includes a shelf that extends between up-turned wall portions. The... Agent: Diederiks & Whitelaw, PLC

20070246072 - Dishwasher and method of controlling the same: There is provided a dishwasher and a method of controlling the dishwasher. The dishwasher includes a temperature detecting unit for detecting a temperature of washing water supplied, a control unit for calculating an actual washing time in response to the washing water temperature detected by and transferred from the temperature... Agent: Birch Stewart Kolasch & Birch

20070246073 - Dishwasher and method of controlling the same: There is provided a dishwasher and a method of controlling the dishwasher. The dishwasher includes a temperature detecting unit for detecting a temperature of washing water supplied, a rinse dispensing unit for dispensing rinse when washing water is heated up to a rinse dispensing temperature, and a control unit for... Agent: Birch Stewart Kolasch & Birch

20070246069 - Method and apparatus for selectively releasing a rinse aid in a dishwasher: A dishwasher includes a system for conditionally releasing a rinse aid into a washing chamber. The dishwasher includes a dispenser for storing rinse aid, a sensor for detecting a temperature of washing fluid in the washing chamber and a controller operatively coupled to the sensor and the dispenser. The controller,... Agent: Diederiks & Whitelaw, PLC

20070246071 - Method for transporting items to be cleaned through a conveyor-type dishwasher, and a conveyor-type dishwasher: A method for transporting items to be cleaned through a conveyor-type dishwasher and a conveyor-type dishwasher is provided. The conveyor-type dishwasher comprises a wash zone, a final-rinse zone and a drying zone. The items to be cleaned are cleaned in the wash zone, rinsed clear in the final-rinse zone and... Agent: Mcgrath, Geissler, Olds & Richardson, PLLC

20070246074 - Load lock system for supercritical fluid cleaning: A substrate is transferred from an environment at about vacuum into a load lock through a first door. The substrate is then sealed within the load lock. The pressure within the load lock is raised to a high pressure above vacuum. A second door coupling the load lock to a... Agent: Morgan Lewis & Bockius LLP

20070246075 - Method for cleaning electroless process tank: A method for cleaning a metal plating tank is provided herein. In accordance with the method, the tank is exposed to a first acid (103), after which the tank is exposed to a second acid in the presence of a first oxidizing agent (107).... Agent: Fortkort & Houston P.C.

20070246076 - Methods for prevention of surface adsorption of biological materials to capillary walls in microchannels: Methods for reducing surface adsorption of biological materials to the walls of microfluidic conduits in microscale devices are provided. In an example of the methods, one or more colloidal-size particles, such as colloidal silica particles, are flowed in a fluid within the microfluidic conduit in the presence of one or... Agent: Caliper Life Sciences, Inc.

20070246080 - Microelectronic device drying devices and techniques: Improved methods of rinsing and drying microelectronic devices by way of an immersion processing apparatus are provided for effectively cleaning microelectronic devices. Methods and arrangements control the separation of one or more microelectronic devices from a liquid environment as part of a replacement of the liquid environment with a gas... Agent: Kagan Binder, PLLC

20070246079 - Multi zone shower head for cleaning and drying wafer and method of cleaning and drying wafer: A method and system to clean and rinse and dry wafer comprises a precision control of an outward-moving inner boundary condition and a steady state edge boundary condition. The edge boundary condition can confine the liquid within the substrate by an edge liquid flow step, to create an outer liquid... Agent: Tue Nguyen

20070246081 - Methods and apparatus for cleaning a substrate: The present invention provides methods, apparatus, and systems for cleaning a substrate that include a controller and a nozzle coupled to the controller. The controller is adapted to direct the nozzle to dispense a uniform fluid spray pattern onto a substrate. The controller is adapted create the uniform fluid spray... Agent: Dugan & Dugan, PC

20070246082 - Apparatus for cleaning painting equipment: An apparatus for cleaning one or more parts of an automated painting or coating equipment including a source of gas under pressure, a source of a cleaning agent, a mixer for adding the cleaning agent to the gas, and supplying the cleaning agent to the automated painting or coating equipment.... Agent: Venable LLP

20070246084 - Drawer-type dishwasher having modular support body: A dishwasher includes a tub having a bottom wall and a plurality of side walls that collectively define a first washing chamber. The tub is supported in an outer, modular support body having first and second opposing side walls joined by a bottom wall, as well as a pair of... Agent: Diederiks & Whitelaw, PLC

20070246083 - Lid mechanism for a drawer-type dishwasher: A lid mechanism for a dishwasher having an least one washing unit provided with a lid includes at least one bracket that can be mounted to one of an outer support body and opposing side edge portions of a lid. The bracket includes a pin element that extends laterally outwardly... Agent: Diederiks & Whitelaw, PLC

20070246085 - Apparatus and method for photoresist removal processing: A processing apparatus includes: a processing chamber configured to process a workpiece; a moving unit configured to move the workpiece in the processing chamber; a first nozzle; a partition member; an inlet provided in communication with the downstream space; and an outlet provided in communication with the upstream space. The... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070246086 - Circuit board cleaning apparatus, burn-in board cleaning apparatus, methods of cleaning a circuit board, and methods of cleaning a burn-in board: This invention includes a circuit board cleaning apparatus comprising a circuit board support structure configured to receive a circuit board for cleaning. A plurality of spray openings is oriented to spray cleaning fluid onto said circuit board as received by the support structure. The spray openings are mounted above the... Agent: Wells St. John P.s.

20070246087 - Cartridge-filter cleaning machine: A machine for cleaning cartridge filters used in pool filtration systems. The machine has a cleaning chamber which holds an adjustable tail stock assembly with a first cone and a second cone mounted onto a power-driven motor. The cones are pulled apart to accommodate a dirty cartridge filter. One end... Agent: Mary J. Gaskin Annelin & Gaskin

20070246088 - Automatic, touchless, exterior rollover vehicle wash machine and system: The present invention provides an improved exterior rollover vehicle washing machine and/or cleaning system including an external frame, a gantry having no internal propulsion, a motor, a drive line/pulley system, at least two washer arm assemblies, a water supply line and a chemical supply line. In one embodiment, the motor... Agent: Williams Mullen

20070240737 - Post etch wafer surface cleaning with liquid meniscus: A method for cleaning the surface of a semiconductor wafer is disclosed. A first cleaning solution is applied to the wafer surface to remove contaminants on the wafer surface. The first cleaning solution is removed with some of the contaminants on the wafer surface. Next, an oxidizer solution is applied... Agent: Albert S. Penilla Martine Penilla & Gencarella, LLP

20070240735 - Aligner and self-cleaning method for aligner: When a self-cleaning method for an aligner is carried out, a reflecting plate having a convex lens portion is set in an original plate holder, and exposure light rays are irradiated from a light source. The surface of the lens portion is coated with a reflective film. The light rays... Agent: Rabin & Berdo, PC

20070240733 - Decontamination materials, methods for removing contaminant matter from a porous material, and systems and strippable coatings for decontaminating structures that include porous material: Methods of removing contaminant matter from porous materials include applying a polymer material to a contaminated surface, irradiating the contaminated surface to cause redistribution of contaminant matter, and removing at least a portion of the polymer material from the surface. Systems for decontaminating a contaminated structure comprising porous material include... Agent: Battelle Energy Alliance, LLC

20070240734 - Method of cleaning post-cmp wafer: A post-CMP wafer is loaded into a buffer unit of a cleaning apparatus and is kept moist by adding a chemical. The post-CMP wafer is then loaded into a cleaning unit of the cleaning apparatus for performing the following cleaning process. The chemical added in the buffer unit is used... Agent: North America Intellectual Property Corporation

20070240736 - Substrate cleaning method, substrate cleaning system and program storage medium: The present invention provides a substrate cleaning method capable of removing particles from the entire surface of a substrate to be processed at a high removing efficiency. In the substrate cleaning method according to the present invention, a substrate to be processed W is immersed in a cleaning liquid in... Agent: Smith, Gambrell & Russell Suite 800

20070240738 - Dishwasher with an automatically regulated drying process: A dishwasher is provided having a washing container for retaining therein objects to be washed by the dishwasher and a system for drying objects to be washed, making it possible to efficiently dry the wet objects to be washed while taking into account economic considerations. The system for drying objects... Agent: Bsh Home Appliances Corporation Intellectual Property Department

20070240739 - System and method for on-line cleaning of black oil heater tubes and delayed coker heater tubes: A system and method whereby on-line cleaning of black oil heater tubes and delayed coker heater tubes may be effectuated by injecting a high pressure water charge through the tubes during normal process operations so as to prevent tube fouling and heater downtime. The high pressure water charge begins the... Agent: Gable & Gotwals

20070240740 - Cleaning of contaminated articles by aqueous supercritical oxidation: Method for removing contaminant material from a contaminated article comprising contacting the contaminated article with a reactive cleaning fluid comprising water and an oxidant material at a temperature at or above the critical temperature of the reactive cleaning fluid and a pressure at or above the critical pressure of the... Agent: Air Products And Chemicals, Inc. Patent Department

20070240741 - Apparatuses and methods for removing particulate materials: A vibratory apparatus for removing particulate materials from an object includes a container having a curved inner surface disposed about a generally horizontally extending longitudinal axis, the container being resiliently supported above a base. A plate is disposed in the container with a first edge spaced from the curved surface... Agent: Marshall, Gerstein & Borun LLP

20070240742 - Electrostatic precipitator wash system: An electrostatic precipitator wash system includes a plurality of fluidic oscillator nozzles through which wash solution is directed at the electrostatic cell of the electrostatic precipitator. The nozzles are provided in a manifold rotatable about an axis of the manifold. The manifold is rotated through an arc of about 90°... Agent: Taylor & Aust, P.C. Illinois Tool Works Inc.

20070240743 - Substrate processing apparatus: A substrate processing apparatus of the present invention is to apply processing using a processing liquid to a substrate. The substrate processing apparatus includes a first-side plate disposed oppositely to a first surface of the substrate with a distance and provided with plural discharge ports and suction ports in a... Agent: Ostrolenk Faber Gerb & Soffen

20070240744 - Dishwasher machine: The invention relates to a dishwasher having a rinsing container (1) which is sealable on its front side by an appliance door that is pivotable on its bottom section about a horizontal axis, whereby a base area (3) that extends beneath the rinsing container (1) is bordered at the bottom... Agent: Fox Rothschild LLP Princeton Pike Corporate Center

20070235062 - Substrate processing method and substrate processing apparatus: A substrate on the surface of which the liquid film is formed in a cleaning unit is transported to a freezing unit by a substrate transporting mechanism. The liquid film is frozen in the freezing unit and the volume of the liquid film increases. Accordingly, adhesive forces between the substrate... Agent: Charles N. Dickey

20070235063 - Dishwasher having steam washing function and dishwashing method: A steam/water mixed dishwasher using steam and water together, and, more particularly, a dishwasher and dishwashing method of achieving improvement in washing performance and efficiency via direct steam injection to dishes. The dishwasher includes a body containing a dishwashing tub, at least one dish basket disposed in the dishwashing tub... Agent: Staas & Halsey LLP

20070235058 - System and method for removing residue from a wafer processing chamber using sound waves: Embodiments of the present technique relate to a system and method of removing residual particles from a wafer processing chamber. Specifically, embodiments of the present technique include performing a cleaning operation on a process chamber of a wafer processing system and utilizing sonic wave emissions to enhance cleansing. The sonic... Agent: Fletcher Yoder (micron Technology, Inc.)

20070235059 - Method of recovering valuable material from exhaust gas stream of a reaction chamber: A semiconductor processing chamber is cleaned by introducing a cleaning gas into a processing chamber, striking a plasma in a remote plasma source that is in communication with the processing chamber, measuring the impedance of the plasma, vaporizing a ruthenium containing deposit on a surface of the processing chamber to... Agent: Patterson & Sheridan, LLP

20070235060 - Ignition control of remote plasma unit: A method of maintaining a remote plasma unit for cleaning a semiconductor-processing apparatus includes: (i) detecting if the semiconductor-processing apparatus is in an idle state; (ii) if the idle state is detected, igniting the remote plasma unit for cleaning the semiconductor-processing apparatus after a lapse of a given time period;... Agent: Knobbe Martens Olson & Bear LLP

20070235061 - Cleaning agent for substrate and cleaning method: The present invention provides a cleaning agent for a substrate and a cleaning method thereof, which can effectively remove fine particles (particles) present on a surface of substrate or impurities derived from various kinds of metals (metallic impurities), without causing roughness surface of a substrate, in particular, a semiconductor substrate,... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20070235064 - Substrate processing apparatus and method: Pure water dissolving nitrogen gas and containing microbubbles is supplied to a substrate. Since microbubbles are very minute in size and also have the electrostatic property, they can efficiently adsorb particles on the substrate surface or in the pure water. Further, since pure water dissolving nitrogen gas is unlikely to... Agent: Ostrolenk Faber Gerb & Soffen

20070235065 - Food cleaning device: A food cleaning device has a housing, a liquid inlet, a magnetizing device and an ozone generating device. The housing has a space for containing liquid and an open top communicating with the space. The liquid inlet defined in the housing and communicating with the space. The magnetizing device is... Agent: Bacon & Thomas, PLLC

20070235066 - Simplified cleaning and filling device with a piston: A device for difficult intervention in a closed enclosure, comprising an enclosure connected to the closed enclosure via a duct, a piston that can move thanks to a motor, a geometry allowing a contact with the outside air when the piston occupies a certain position within the enclosure in order... Agent: Ronald R. Santucci Frommer Lawrence & Haug

20070227562 - Apparatus and methods for treating substrates: This invention is related to an apparatus for treating substrates. According to the present invention, the substrate is cleaned by injecting high temperature and high pressure steam on substrate. A steam generator is configured to continually provide steam on substrate. After cleaning by steam, cleaning by brush may be followed.... Agent: Harness, Dickey & Pierce, P.L.C

20070227563 - Cleaning apparatus and cleaning method: Embodiments in accordance with the present invention provide straightening plates at the upstream side of a cleaning tank and a straightening plate at the downstream side of the object to be cleaned. Apertures are arranged in the planes of the respective straightening plates. An aperture ratio of the upstream straightening... Agent: Townsend And Townsend And Crew LLP

20070227566 - Substrate processing apparatus and substrate processing method: A rinsing liquid adheres in a piled up state to the entire front surface of the substrate which is rinsed with the rinsing liquid discharged from a rinse nozzle, thereby forming a so-called puddle-like rinse layer. An opposed surface of a proximity block is positioned in the vicinity of a... Agent: Ostrolenk Faber Gerb & Soffen

20070227554 - Semiconductor processing with a remote plasma source for self-cleaning: A plasma CVD device includes a reaction chamber, a remote plasma discharge chamber that is provided remotely from the reaction chamber, and piping that links the reaction chamber and the remote plasma discharge chamber. The remote plasma discharge chamber activates cleaning gas by plasma discharge energy, and the activated cleaning... Agent: Knobbe Martens Olson & Bear LLP

20070227555 - Method to manipulate post metal etch/side wall residue: A method of semiconductor manufacturing to treat sidewall residue such that the side wall remains substantially vertical or peels back from the resist prior to removal of the resist by ashing or other means.... Agent: Schneck & Schneck

20070227556 - Methods for removing photoresist: In a method for removing an organic film such as photoresist from a wafer, the wafer is placed into a chamber. A liquid including an acid, such as sulfuric acid is applied to the surface of the wafer. Sulfur trioxide is supplied into the chamber. Alternatively, fuming sulfuric acid may... Agent: Perkins Coie LLP/semitool

20070227557 - Thickened surfactant-free cleansing and multifunctional liquid coating compositions containing nonreactive abrasive solid particles and an organosilane quaternary compound and methods of using: Cleansing and multifunctional coating compositions containing an organosilane quaternary compound, nonreactive abrasives, thickeners and, optionally, hydrogen peroxide, in aqueous formulations are used to improve water and soil repellency and residual antimicrobial activity on surfaces. Various surfaces may be treated including metal, glass, plastics, rubber, porcelain, ceramic, marble, granite, cement, tile,... Agent: Wood, Herron & Evans, LLP

20070227558 - Vehicle washing system and method for washing a vehicle: A vehicle washing system for cleaning a vehicle includes a track operably disposed at a washing site, a first generally U-shaped gantry operably disposed on the track for moving back and forth along the track and a second generally U-shaped gantry operably disposed on the track for moving back and... Agent: A Patent Lawyer Corp, PC R William Graham

20070227559 - Chopping system for a dishwasher pump assembly: A dishwasher includes a pump assembly having a chopper blade and apertured plate arrangement which function to chop soil particles entrained in a flow of washing fluid. The chopper blade floats or axially slides relative to a drive member from a first position spaced from the apertured plate to a... Agent: Diederiks & Whitelaw, PLC

20070227560 - Conveyor-type dishwasher and method for operating it: A conveyor-type dish washer and a method of operating it, characterised in that a final-rinse operation is executed with the consumption of final-rinse liquid of 3 l/m2 movement of the horizontal take-up plane of a dish carrier or less, preferably of 1 l/m2-2.5 l/m2, while the items (154, 156) which... Agent: Thompson Hine LLP Intellectual Property Group

20070227561 - Reactor for washing particulate matter: A reactor for washing sand contaminated with hydrocarbons comprises a vessel having an aperture in a bottom portion thereof. A steam cleaning device is located near a top of the vessel for receiving contaminated sand and cleaning the contaminated sand as it is introduced into the vessel. A rinsing device... Agent: Oyen, Wiggs, Green & Mutala LLP 480 - The Station

20070227564 - Method and apparatus for washing particulate matter: A system for washing contaminated sand comprises a plurality of reactors arranged in a sequence from a first to a last reactor. The first reactor is configured to receive contaminated sand. Each reactor comprises a funnel portion in a lower section thereof for accumulating a sand layer and a sand... Agent: Oyen, Wiggs, Green & Mutala LLP 480 - The Station

20070227565 - Workstation and cleaning apparatus thereof: A workstation comprises a substrate, a cleaning apparatus used for cleaning a mask, and a controller for controlling the cleaning apparatus. The cleaning apparatus comprises a housing having dust-free surroundings, a holder, a cleaner and a blower. The holder, the cleaner and the blower are disposed in the housing. The... Agent: Birch, Stewart, Kolasch & Birch, LLP

20070227567 - Processing liquid and processing method for semiconductor device, and semiconductor manufacturing apparatus: Disclosed is a process liquid which causes only little dissolution of atoms from a semiconductor surface and enables to form a clean and flat semiconductor surface. Also disclosed are a processing method and an apparatus for manufacturing a semiconductor. Specifically disclosed is a process liquid-which causes only little dissolution of... Agent: Foley And Lardner LLP Suite 500

20070227568 - Device for injecting a fluid into moving containers: The distributor (44) defines a manifold (46) which extends along a length of the conveyor corresponding to the number N of inlets (36) selected, a seal (50) being provided to ensure a sealed contact between the manifold (46) and the feed track (32), and the dispenser (44) has means (52)... Agent: Sughrue Mion, PLLC