Cleaning and liquid contact with solids inventions 09/07

20070221248 - Apparatus and process for cleaning process surfaces: A brush, as well as a method for cleaning a process surface using the brush, having: a hollow cylinder having a closed first end, a closed second end, and a peripheral wall with an internal and external surface; with bristles arranged on the external surface of the peripheral wall thereof;... Agent: The Procter & Gamble Company Intellectual Property Division - West Bldg.

20070221255 - Method for cleaning industrial equipment exposed to volatile organic compounds: The present invention relates to a method for cleaning industrial vessels that are exposed to volatile organic compounds. The method has the steps of providing industrial equipment to be cleaned that has accumulated volatile organic compounds. Next, an organic cleaning solution is provided. The cleaning solution is transformed into foam.... Agent: Brouse Mcdowell Lpa

20070221254 - Substrate processing apparatus and substrate processing method: Substrates having liquid films with preprocessing liquid on surfaces thereof in a preprocessing unit are transported to a freezing unit arranged separately from the preprocessing unit by a substrate transporting robot. In the freezing unit, the substrates are accommodated in a processing space in a processing chamber and the liquid... Agent: Ostrolenk Faber Gerb & Soffen

20070221245 - Cleaning and polishing rusted iron-containing surfaces: A method for cleaning and polishing a rusted iron-containing metal surface is disclosed. The metal surface is contacted with a composition containing fluorometallate anions of a Group IVB metal.... Agent: Ppg Industries, Inc. Intellectual Property Department

20070221246 - Method for dissolving oilfield scale: A method of removing metal scale from surfaces that includes contacting the surfaces with a first aqueous solution of a chelating agent, allowing the chelating agent to dissolve the metal scale, acidifying the solution to form a precipitant of the chelating agent and a precipitant of the metal from the... Agent: Osha Liang/mi

20070221250 - Method of cleaning and/or regenerating wholly or partially de-activated catalysts for stack-gas nitrogen scrubbing: The invention concerns a method of cleaning and/or regenerating wholly or partially de-activated catalysts for stack-gas nitrogen scrubbing, in which the catalysts are treated with a washing and/or regenerating liquid, characterized by the washing or regenerating liquid consisting wholly or in part of demineralized water.... Agent: Fish & Richardson P.C.

20070221249 - Methods and apparatus for determining scrubber brush pressure: In a scrubber adapted to clean a semiconductor wafer, the torque of a brush rotation motor is monitored while a scrubber brush is in contact with the wafer and is being rotated by the motor. The position of the brush relative to the wafer may be adjusted based on the... Agent: Dugan & Dugan, PC

20070221247 - Scouring element for cleaning points that are difficult to access: Disclosed is a scouring cloth (1) comprising a support material (2) which is made of a planar textile structure (3), is formed by a fleece material that is compacted by water jet, and is provided with at least one cleaning area (4) with an embossed pattern (5). The cleaning area... Agent: Leydig Voit & Mayer, Ltd

20070221251 - Cleaning method: A cleaning apparatus is provided for cleaning an inner surface of a container. A spray head is arranged for operable fluid communication with a fluid pump and has a nozzle configured to disperse liquid in a mist. A mount carries the spray head and is removably supportable on a container... Agent: Reising, Ethington, Barnes, Kisselle, P.C.

20070221252 - High-pressure processing method: An etching is performed to a wafer using a first processing fluid which is produced through the addition of a liquid mixture to a supercritical carbon dioxide, the liquid mixture including hydrogen fluoride, ammonium fluoride, and isopropyl alcohol, whereby SiO2 film formed on the surface of the wafer is removed.... Agent: Ostrolenk Faber Gerb & Soffen

20070221253 - Wet processing device and wet processing method: The flow of a processing liquid poured onto the surface of a substrate at a standstill to process the substrate from the surface to the back surface of the substrate is suppressed to achieve satisfactory cleaning. When a processing liquid is poured onto a substrate held in a horizontal position... Agent: Smith, Gambrell & Russell

20070221256 - Methods and apparatus for improving edge cleaning of a substrate: In a first aspect, an apparatus is provided that includes (1) an idler adapted to contact a substrate, to rotate therewith, and to sense rotation of the substrate; and (2) a driving mechanism coupled to the idler and adapted to drive the idler. Numerous other aspects are provided.... Agent: Dugan & Dugan, PC

20070221258 - Etching method and apparatus: An etching method capable of controlling the film thickness of a hard mask layer uniformly is provided. A plasma etching is performed on a native oxide film by using an etching gas containing, for example, CF4 and Ar while a thickness of a silicon nitride film is being monitored and... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070221259 - Multi-use kitchen appliance: A multi-use kitchen appliance which can be used for dishwashing, washing produce, and dehydrating food. The appliance includes an article holding unit having article retaining means located in the interior thereof, water introduction means, air heating and air introduction means, and means for introducing a cleaning agent and/or disinfectant. Controller... Agent: Robert E. Howard

20070221260 - Brush and roller cleaner: A brush and roller cleaner includes a hollow canister to receive a spray wand. A control knob pivots with respect to the canister to direct pressurized liquid from apertures of the spray wand. A top cap assembly mates with the canister in one of two positions, 180 degrees offset from... Agent: Kramer & Amado, P.C.

20070215173 - Heated single wafer megasonic processing plate: A method and apparatus for heating a megasonic wafer processing plate to approximate the temperature of the processing liquid, whereby the chemical processing of the wafer is optimized. Heater blankets may be secured to the back side of the megasonic plate, or internal heating elements or passages may be disposed... Agent: Zimmerman & Cronen, LLP

20070215179 - Concrete/asphalt wet washing system: A surface cleaning system having a storage container, debris collection apparatus and debris conduit is disclosed. Water discharged from spray nozzles configured in a circular arrangement forces debris into a debris collection ring and then a debris conduit. An auger, water pressure or air pressure is used to force the... Agent: Greenberg Traurig

20070215178 - Protective film removing device, mixed chemical solution recovering method and program storage medium: The protective film removing device includes: a recovery line communicating with an atmosphere surrounding a substrate to recover a mixed chemical solution, an intermediate tank connected to the outlet end of the recovery line, a volatilization preventing liquid supply means for supplying a volatilization preventing liquid having a specific gravity... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070215180 - Cleaning method of substrate processing equipment, substrate processing equipment, and recording medium for recording program thereof: A cleaning method of substrate processing equipment includes performing a processing chamber cleaning after a specific process is performed on a substrate transferred into the processing chamber. Further, in the cleaning method, the cleaning is performed by a kind of the process, based on specific cleaning setting information which is... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070215181 - Method for cleaning a photmask: Disclosed herein is a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof and to induce curing and oxidation of Cr and MoSiON layers, thereby... Agent: Adam K. Sacharoff Much Shelist Freed Denenberg Ament&rubenstein,pc

20070215188 - Device for cleaning a photomask: Disclosed herein is a device for cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof and to induce curing and oxidation of Cr and MoSiON layers, thereby... Agent: Adam K. Sacharoff Much Shelist Freed Denenberg Ament&rubenstein,pc

20070215172 - Substrate cleaning method, substrate cleaning system and program storage medium: The present invention provides a substrate cleaning method capable of removing particles from the entire surface of a substrate to be processed at a high removing efficiency. In the substrate cleaning method according to the present invention, a substrate to be processed W is immersed in a cleaning liquid in... Agent: Smith, Gambrell & Russell

20070215174 - Process for the plasma cleaning of a component: Cracks are conventionally difficult to clean which often leads to damage to other regions of the component for cleaning. According to the invention, a plasma cleaning method is used, whereby a pressure and/or a separation of an electrode to the component are varied, in order to achieve a plasma cleaning... Agent: Siemens Corporation Intellectual Property Department

20070215175 - Method for adjusting a wiping angle: The invention relates to a method for adjusting a wiping angle (φ1, φ2) between a park position and a reversal position (28, 30) of a wiper lever (16, 18) of a windshield wiper system for a motor vehicle with at least one wiper lever (18) whose park position or reversal... Agent: Michael Best & Friedrich, LLP

20070215176 - Concrete/asphalt wet washing system: A surface cleaning system having a storage container, debris collection apparatus and debris conduit is disclosed. Water discharged from spray nozzles forces debris into a debris collection apparatus such that a series of rotating brushes can transport the debris to an open end of the debris conduit. An auger, water... Agent: Greenberg Traurig

20070215177 - Method for cleaning object to be cleaned and apparatus therefor: A cleaning operation is repeatedly performed by constantly cleaning an object to be cleaned by a cleaning mechanism. When the cleaning operation from an initial step to completion can be performed with one type of cleaning solution, the same cleaning effects as those obtained when a plurality of cleaning tanks... Agent: Jordan And Hamburg LLP

20070215182 - Process for washing the interior of containers made of plastic material: Process for washing containers (1) made of plastic material with capacity ranging between 5 and 30 litres which may be provided with a handle (7) to facilitate handling, comprises: gripping the container (1) in upside down condition, i.e. with a mouth (9) oriented downwards, spraying suitable cleaning liquid inside the... Agent: Arent Fox PLLC

20070215184 - Clear detergent and cleaning agent having a flow limit: Aqueous compositions comprising: (a) a surfactant; and (b) a thickening system comprising: (i) a gellan gum; and (ii) a thickener selected from the group consisting of polyacrylate thickeners, xanthan gums, guar flours, alginates, carrageenans, carboxymethylcelluloses, bentonites, wellan gums, carob flours and mixtures thereof; wherein the surfactant comprises a fatty acid... Agent: Connolly Bove Lodge & Hutz LLP

20070215185 - Cleaning apparatus, in particular for the wheels of a golf trolley: Cleaning apparatus, particularly suitable for cleaning the wheels of golf trolleys (20) comprises a support surface (3) along which the trolley is rolled from an entry end (27) to an exit end (28) and manifolds (16), (17) which spray water downwardly and outwardly towards the respective wheels. The rolling surface... Agent: Keusey, Tutunjian & Bitetto, P.C.

20070215187 - Dishwasher having a height-adjustable upper rack: A dishwasher includes a washing tub, a height-adjustable upper rack, and a spray arm disposed on the upper rack. A stationary liquid conduit disposed in the washing tub supplies the spray arm with wash water, the liquid conduit having a portion extending from the sidewall. A feed tube member including... Agent: Darby & Darby P.C.

20070215186 - Rack protecting body of dish washer, and dish washer using the same: A rack protecting body of a dishwasher (100) and a dishwasher (100) using the same are provided. The rack protecting body (200) includes a cushion (210) that absorbs shock applied to the dish rack (300) and a coupling portion that couples the cushion (210) with the dish rack (300). The... Agent: Mckenna Long & Aldridge LLP

20070215189 - Cleaning apparatus: An apparatus is provided for cleaning products such as squid and having a support frame with a start end and a finish end. The frame also has a top member and a base and includes start posts that are vertically oriented at the start end and finish posts at the... Agent: John Maier, Iii

20070215190 - Device for cleaning a flexible hollow shaft of a medical instrument: A device is used for cleaning a flexible hollow shaft of a medical instrument, the wall of said flexible hollow shaft is provided with openings. The device comprises a hollow space in which at least one portion of said hollow shaft can be received. A cleaning liquid can be delivered... Agent: St.onge Steward Johnston & Reens LLC

20070209681 - Washing and storing system for machinery: A device for washing and storing machinery is provided. This device includes a storage apparatus and a washing apparatus formed integrally with the storage apparatus. The storage apparatus further includes: a housing defining an internal chamber therein; a base attached to the bottom portion of the housing, wherein the base... Agent: Mcnees Wallace & Nurick LLC

20070209682 - Cleaning of photolithography masks: A method and an equipment for cleaning masks used for photolithography steps, including at least one step of thermal treatment under pumping at a pressure lower than the atmospheric pressure and at a temperature greater than the ambient temperature.... Agent: Stmicroelectronics Inc. C/o Wolf, Greenfield & Sacks, P.C.

20070209686 - Apparatus for cleaning chamber using gas separation type showerhead: An apparatus for cleaning an inside of a chamber using a gas separation type showerhead is provided. The apparatus includes: a gas supply module through which first and second gases are separately supplied; a gas separation module through which the first and second gases are separately dispersed; and a gas... Agent: Cantor Colburn, LLP

20070209677 - Self-cleaning catalytic chemical vapor deposition apparatus and cleaning method thereof: Provided is a self-cleaning catalytic chemical vapor deposition apparatus which suppresses the corrosion-induced degradation of a catalytic body by a cleaning gas without heating a catalytic body to not less than 2000° C. and permits practical cleaning rates and good cleaning at low cost. With conductors 5a, 5b which supply... Agent: Arent Fox PLLC

20070209678 - Cloth accessory: A cloth accessory and methods for the use thereof are disclosed and described. In one aspect, the cloth accessory may include a cover member forming an enclosure with a cavity therein, and a cloth attached to the cover member. The cloth may have a first configuration wherein the cloth is... Agent: Thorpe North & Western, LLP.

20070209679 - Cloth accessory: A cloth accessory and methods for the use thereof are disclosed and described. In one aspect, the cloth accessory may include a cover member forming an enclosure with a cavity therein, and a cloth attached to the cover member. The cloth may have a first configuration wherein the cloth is... Agent: Thorpe North & Western, LLP.

20070209680 - Cloth accessory: A cloth accessory and methods for the use thereof are disclosed and described. In one aspect, the cloth accessory may include a cover member forming an enclosure with a cavity therein, and a cloth attached to the cover member. The cloth may have a first configuration wherein the cloth is... Agent: Thorpe North & Western, LLP.

20070209683 - Method for cleaning reactor and method for manufacturing a chip thereof: A method for cleaning a reactor and a method for manufacturing a chip thereof are provided. The reactor at least includes a reaction cavity and an inner tube. The inner tube is disposed inside the reaction cavity. The wall of the inner tube has a foreign particle. In the cleaning... Agent: Birch Stewart Kolasch & Birch

20070209684 - Copper deposition chamber having integrated bevel clean with edge bevel removal detection: Embodiments of the invention generally provide apparatus and method for detecting and controlling edge bevel removal of a semiconductor substrate. One embodiment of the present invention provides an apparatus for inspecting a rotating substrate. The apparatus comprises a substrate support configured to support the rotating substrate on a back side... Agent: Patterson & Sheridan, LLP

20070209685 - Method of descaling metallic devices: Methods are provided for descaling metallic components devices such as stents. The devices or components are cleaned under ultrasound in a cleaning solution of ammonium hydrogen fluoride at a temperature within a range of about 60° to 80° C., then rinsed at that temperature with an aqueous rinse containing a... Agent: Beyer Weaver LLP

20070209687 - Automotive glass washer arrangement: An automotive glass washer arrangement includes a washer pump having an outlet in fluid connection with at least one automotive glass washer nozzle. The arrangement comprises a fluid coupling having a female element with a chamber therein. A replaceable filter is disposed in the chamber. The fluid coupling further has... Agent: General Motors Corporation Legal Staff

20070204880 - Method of working surfaces of a coating made of hard carbon: The invention relates to methods of working surfaces of a coating made of hard carbon such as —C or ta-C. In accordance with the object set, a smoothing of the surface of such a coating should be achieved with a low effort and low costs and a working of contoured... Agent: Kaplan Gilman Gibson & Dernier L.L.P.

20070204881 - Method and apparatus for collecting chemicals from semiconductor wafer: An apparatus and a method are provided for accurately analyzing and evaluating a degree of contamination on a chamfered part without mixing impurities from parts other than the chamfered part into chemicals. At a position in which, on a front plane flat part of a semiconductor wafer, a boundary region... Agent: Welsh & Katz, Ltd

20070204882 - Process for removing particles from reticle: A tool and a process for removing particles from a reticle are described. The tool is disposed in front of a pellicle particle detector, including at least a gas spray member toward a surface of the reticle for removing particles and a supporting member supporting the gas spray member in... Agent: Jianq Chyun Intellectual Property Office

20070204883 - System for removal of stains: An apparatus for removing stains from a fabric includes a device configured to draw a stain removal liquid through the fabric. The stain removal liquid may be drawn through the liquid through the use of suction directed by a nozzle. The nozzle may be placed over the fabric, which is... Agent: Snell & Wilmer, LLP (dial Corp)

20070204884 - Apparatus and method for cleaning beverage lines: Conduit can connect a beverage line in fluid communication with a supply of first fluid. A pump operates to allow a second fluid to enter the conduit in a predetermined proportion relative to the first fluid. A primary first fluid control means and a secondary first fluid control means are... Agent: Christopher John Rudy

20070204885 - Substrate processing apparatus for resist film removal: Semiconductor wafers are cleaned by placing the semiconductor wafers in a processing vessel, forming a pure water film on the surfaces of the wafers, forming an ozonic water film by dissolving ozone gas in the pure water film, and removing resist films formed on the wafers by the agency of... Agent: Morrison & Foerster, LLP

20070204886 - Lift/immersion bath: The lift/immersion system for treating, particularly cleaning, workpieces, comprises a housing into which a treatment liquid, particularly a cleaning liquid, can be filled which forms an immersion bath in the housing, further comprising a lift device and a lift table connected thereto and provided with passage openings, on which the... Agent: Pyle & Piontek LLC

20070204887 - Pet waste away device: A pet waste disposal device having a motor driving a set of cutting blades inside of an open ended plenum. A water supply such as a garden hose provides water to a nozzle or jet inside of the plenum, the water washes away the waste as it is chopped by... Agent: Barber Legal

20070204888 - Apparatus and method for retaining discarded flatware: A method and apparatus for interrupting flatware from falling into a receptacle allow debris or other material potentially containing flatware to fall through a vertical chute toward a receptacle, sense the presence of flatware within the falling debris or other material and move a hinged panel across the vertical chute... Agent: Burns & Levinson, LLP

20070204889 - Articulable arm for a mobile mark removal system: Briefly, disclosed is an articulable arm particularly suited for mobile systems utilized to remove coatings from marked surfaces with high pressure liquid. The mobile systems generally employ a liquid reservoir connected to a high pressure pump for directing ultra high pressure water through at least one blast head mounted on... Agent: Mchale & Slavin, P.A.

20070204890 - Endoscopic passage confluent structure: An endoscopic flow-passage confluent structure that connects a gas-feed tube and a liquid-feed tube provided in an endoscope to a confluent tube communicating with an ejection nozzle arranged at a tip of an insertion portion of the endoscope and for ejecting a cleaning fluid toward a viewing window of the... Agent: Birch Stewart Kolasch & Birch