Cleaning and liquid contact with solids inventions 08/07

20070199578 - Cleaning apparatus, cleaning method and product manufacturing method: A cleaning apparatus is provided with a plurality of cleaning mechanisms such as a blast unit, a vibration brush unit and a pulse spraying unit. Cleaning of objects with the blast unit and vibration brush unit is conducted within cleaning liquid reserved in a cleaning vessel in order to prevent... Agent: Staas & Halsey LLP

20070199580 - System and method for removing foreign particles from semiconductor device: A vibration device separates foreign particles from a semiconductor device, and a suction interface of a suction device covers an opening portion of the semiconductor device. A space connected with a vacuum passage and a communication passage is formed between the semiconductor device and the suction interface. The suction device... Agent: Posz Law Group, PLC

20070199583 - Semiconductor inspecting apparatus having device for cleaning tip of probe card and method for cleaning the tip: An apparatus for inspecting a semiconductor and a method for automatically cleaning the tip of a probe card may include an inspection chamber having a probe card for inspecting a wafer, and a chemical-wetting chamber for applying a chemical agent to a cleaning member. The inspection chamber and the chemical-wetting... Agent: Lee & Morse, P.C.

20070199577 - Method and device for removing liquids from the surface of a strip: A method for removing liquids from the surface of a strip, characterized in that the liquid is excited in such a way that it oscillates. The invention is based on the recognition that the root of the problem of removing liquids from the surface of a strip lies in the... Agent: Henry M Feiereisen, LLC

20070199579 - Substrate treatment method, substrate treatment apparatus, and semiconductor device manufacturing method: According to an aspect of the invention, there is provided a substrate treatment method including performing a treatment including intermittently supplying a cleaning fluid to a central area of a treatment substrate while continuously rotating the substrate, and continuously supplying a cleaning fluid to a peripheral area of the substrate,... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070199581 - Cleaning and sanitizing system: A high pressure water stream (14) is discharged onto a surface to be cleaned. An ozone/water stream (16) is discharged on the same surface for sanitizing the surface. The high pressure water and ozone/water streams (14, 16) are discharged simultaneously along closely adjacent paths that are either parallel (FIG. 3)... Agent: Black Lowe & Graham, PLLC

20070199582 - Water supply apparatus and cleaning system for cleaning the water supply apparatus: A cleaning system designed for cleaning a water supply apparatus which is provided with: a tap water inlet (2); a mineral dosing ubtil unit (18) with the aid of which, on the basis of tap water, mineral water can be generated; water processing means and a control unit (24) designed... Agent: Altera Law Group, LLC

20070199584 - Basket for a dishwashing machine having various receptacles and/or holders: The present invention relates to a basket (1) for a dishwashing machine having various receptacles and/or holders for plates or cups whereby in particular a cup support (3) comprises a shelf pivotably mounted in the basket (1) and assuming a horizontal position to form a second supporting surface about hinge... Agent: Fox Rothschild LLP Princeton Pike Corporate Center

20070193602 - Systems and methods for photoresist strip and residue treatment in integrated circuit manufacturing: Plasma systems and methods for supplying activation energy to remove cross-linked photoresist crust using ion bombardment of the substrate from a plasma, at reduced temperature, achieved in part by operating the processing chamber at low pressures. Reduced temperatures prevent “popping” of the photoresist which can cause particulate contamination. The gas... Agent: Wilson Sonsini Goodrich & Rosati

20070193603 - Method and device for washing conveyor belts: a

20070193605 - Apparatus and method for dewatering endoscope channels: An apparatus washes/disinfects, at a time, a plurality of endoscopes having a plurality of channels with different diameters, and dewaters the channels at a time. For the dewatering, the apparatus includes plural ports for receiving air supply, and a plurality of tubes for connecting between each of the plurality of... Agent: Scully Scott Murphy & Presser, PC

20070193604 - Method for determining a fluid flow in a passageway of a medical device using pressure measurement: A method for the reprocessing of a device having a plurality of internal passageways by applying a plurality of fluid channel flows to the internal passageways of the device to permit reuse of the device in a clean environment, including providing a manifold having an input of the manifold and... Agent: Caesar, Rivise, Bernstein, Cohen & Pokotilow, Ltd.

20070193606 - Dishwashing machine with a self-closure mechanism for locking the door and method for operating the dishwashing machine: A dishwashing machine (1) comprising a washing container (2) and devices (3, 4) for washing crockery is described in which an access opening (5) of the washing container (2) can be closed in a watertight manner by means of a door (6). In this case, a closure mechanism (7) is... Agent: Bsh Home Appliances Corporation Intellectual Property Department

20070193607 - Methods and apparatus for cleaning edges of a substrate: In methods and apparatus for cleaning a wafer, a cleaning liquid is sprayed or jetted in a direction generally tangent to the circular edge of a spinning wafer. This enhances removal of contaminants from areas near the edge. Re-deposition of contaminant pieces or particles back onto the wafer is reduced... Agent: Perkins Coie LLP/semitool

20070193609 - Dosing device for the addition of an additive to a treatment chamber and dishwasher machine with a dosing device: A dosing device for the addition of an additive to a treatment chamber (8) is described, wherein the additive can be added to the treatment chamber (8) by means of a conveying device (5, 6, 7), characterised in that the dosing device (1) has at least one actuator (9, 10,... Agent: Bsh Home Appliances Corporation Intellectual Property Department

20070193608 - Sink mounting type dish washer: The invention relates to a sink mounting type dish washer, and more particularly, relates to a sink mounting type dish washer which may be conveniently attachable to a conventional sink. According to an aspect of the invention, there is provided a sink mounting type dish washer comprising a drain body... Agent: Ipla P.A.

20070193610 - System for semi-automatic line cleaning: This invention describes a system for semi-automatic line cleaning in a beverage dispensing system, said beverage dispensing system comprising at least one tap (1) connected via at least one beverage line (3) to at least one coupling means (4) for a keg or other beverage container (5), said cleaning system... Agent: Ecolab Inc.

20070186955 - Abrasive wire cleaning apparatus with stirring nozzles: A stirring nozzle used in an apparatus for abrasive wire cleaning. The stirring nozzles can be used in series to create multiple cleaning steps wherein fresh cleaning compound contacts the wire to be cleaned. The cleaning apparatus moves both the wire and an abrasive cleaning compound through the interior of... Agent: John E. Menear

20070186954 - Method for generating electrochemically activated cleaning liquid: A method is provided, which includes moving a mobile floor cleaning device along a floor; electrochemically activating a liquid on the mobile floor cleaning device, and dispensing the electrochemically activated liquid from the mobile floor cleaning device.... Agent: Westman Champlin & Kelly, P.A.

20070186956 - Apparatus and method for cleaning the interior of transport truck trailers: The invention is directed toward an apparatus and method for cleaning trailers of transport trucks, which makes use of an air supply of an air brake system within the transport truck. A portable cleaning apparatus is connected to the air brake system to allow a user to clean soiled surfaces... Agent: Bereskin And Parr

20070186957 - Method and apparatus for producing humanly-perceptable indicator of electrochemical properties of an output cleaning liquid: A surface cleaning apparatus is provided. The apparatus includes a mobile body configured to travel over a surface, a cleaning device carried by the mobile body, a liquid flow path, and an electrolyzing device in the liquid flow path. An indicator provides a humanly-perceptible indication of an electrical operating characteristic... Agent: Westman Champlin & Kelly, P.A.

20070186958 - Method of producing a sparged cleaning liquid onboard a mobile surface cleaner: A method is provided, which includes moving a mobile floor cleaning machine along a floor. Onboard the mobile floor cleaning machine, a liquid is sparged by electrolysis. The sparged liquid is dispensed from the mobile floor cleaning machine.... Agent: Westman Champlin & Kelly, P.A.

20070186960 - Pure water supply system, and cleaning system and cleaning method using pure water: There is provided a system capable of supplying pure water containing almost no dissolved gas and pure water containing dissolved gas without increasing the amount of pure water manufactured in a volume production semiconductor factory. In the present invention, pure water is supplied using a pure water supply system, which... Agent: Young & Thompson

20070186964 - Extra width dishwasher: A dishwasher includes a cabinet and a wash system slidably mounted within the cabinet in such a manner that it may be withdrawn horizontally out of the cabinet for loading with dishes. The wash system includes an open top wash chamber having a floor and side walls adapted to accommodate... Agent: Trexler, Bushnell, Giangiorgi, Blackstone & Marr, Ltd.

20070186952 - Method of cleaning substrate processing chamber, storage medium, and substrate processing chamber: A method of cleaning a substrate processing chamber that enables formation of an oxide film on a surface of a processing chamber inside component to be prevented. A substrate processing chamber 11 has therein a processing space S into which a wafer W is transferred and carries out reactive ion... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070186953 - Systems and methods for photoresist strip and residue treatment in integrated circuit manufacturing: Plasma systems and methods for supplying activation energy to remove cross-linked photoresist crust using ion bombardment of the substrate from a plasma, at reduced temperature, achieved in part by operating the processing chamber at low pressures. Reduced temperatures prevent “popping” of the photoresist which can cause particulate contamination. The gas... Agent: Wilson Sonsini Goodrich & Rosati

20070186959 - Methods and systems for leaching silicone hydrogel ophthalmic lenses: This invention includes methods and systems for processing hydrogel lenses using aqueous solutions as leaching aids.... Agent: Philip S. Johnson Johnson & Johnson

20070186961 - Automated non-contact cleaning: The disclosed system, device and method for automated non-contact cleaning of hardware articles generally includes: a cleaning chamber configured to at least partially enclose the hardware article to be cleaned; a plurality of nozzles configured to spray a sublimating agent on the hardware article; an air inlet configured to purge... Agent: Noblitt & Gilmore, LLC.

20070186962 - Portable, self-contained, bioremediation waste water treatment apparatus with integrated particulate removal: A closed-loop wash system is provided for use with a washing assembly that includes a collection basin and a self-contained, bioremediation treatment apparatus. A housing assembly defines a plurality of chambers in series flow communication from an upstream collection chamber to a downstream clean wash fluid chamber. A central media... Agent: Beyer Weaver LLP

20070186963 - Drainage structure cleaning apparatus: An apparatus for cleaning a culvert includes a rod pushing and pulling machine, a rod string made from a series of extension rods coupled end to end, which rod string is mounted at a proximal end to the rod pushing and pulling machine. A debris removal tool is mounted on... Agent: Philip G. Meyers Law Office

20070181148 - Wafer cleaning apparatus and related method: Embodiments of the invention provide a semiconductor wafer cleaning apparatus and a related method. In one embodiment, the invention provides a semiconductor wafer cleaning apparatus comprising a wafer stage adapted to support a wafer; a first cleaning unit adapted to spray a first cleaning solution onto the wafer to remove... Agent: Volentine & Whitt PLLC

20070181153 - Semiconductor substrate cleaning method and semiconductor substrate cleaning machine: A semiconductor substrate cleaning method includes a first cleaning step of cleaning the surface of a semiconductor substrate with the use of a first brush and a second cleaning step of cleaning the surface of the semiconductor substrate with the use of a second brush after the first cleaning step.... Agent: Mcdermott Will & Emery LLP

20070181159 - Disk cleaning apparatus, disk immersing and extracting mechanism and disk cleaning method: A disk immersing and extracting mechanism is provided, which utilizes a floating-control means to control a disk, so as to prevent the disk from floating up or falling over in the rinse tank and to prevent liquid droplets from dripping from the floating-control means onto the disk to cause an... Agent: J C Patents, Inc.

20070181160 - Supporter and apparatus for cleaning substrates with the supporter, and method for cleaning substrates: Provided are a supporter and a substrate cleaning apparatus including the supporter, and a method for cleaning substrates. In the apparatus, a guide plate is provided close to an outer surface of an outermost substrate among substrates arranged in a cleaning process. The guide plate is shaped such that cleaning... Agent: Marger Johnson & Mccollom, P.C.

20070181163 - Electronic device cleaning equipment and electronic device cleaning method: Electronic device cleaning equipment includes a cleaning stage having a processing face on which a substrate having an obverse face at which an electronic device is formed is to be placed, a vapor supply nozzle for supplying vapor to the obverse face of the substrate, and chemical solution supply means... Agent: Mcdermott Will & Emery LLP

20070181164 - Apparatus for and method of cleaning substrates: An apparatus for cleaning substrates includes a substrate support that is configured to support a plurality of substrates horizontally as spaced regularly one above the other, a rotating device for rotating the substrate support and a liquid supply system for dispensing cleaning liquid onto the substrates. The substrate support has... Agent: Volentine & Whitt PLLC

20070181166 - Method and agent for removing graffiti: For the removal of graffiti 10 a method and removal agent are provided, said agent being comprised of solvents and surface-active agents and present in the form of a gel-like compound, applied to the background surface 3 to be cleaned. This gel-like compound 12 adheres to the background surface, which... Agent: James C. Wray

20070181169 - Parts immersion apparatus and method: A parts immersion system and method includes a trough through which a conveyor belt carries the parts. A chemical solution is introduced into the trough through an opening in the bottom of the trough, from above the trough, and/or from the sides of the trough. The parts on the conveyor... Agent: Barnes & Thornburg LLP

20070181145 - Method for cleaning process chamber of substrate processing apparatus, substrate processing apparatus, and method for processing substrate: In a substrate processing apparatus configured to perform a predetermined process on a target substrate accommodated in a process chamber, the process chamber is cleaned by alternately performing an operation of generating plasma of a gas containing oxygen within the process chamber, and an operation of generating plasma of a... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070181146 - Plasma cvd apparatus and dry cleaning method of the same: In a parallel flat plate type plasma CVD apparatus, plasma damage of constituent parts in a reaction chamber due to irregularity of dry cleaning in the reaction chamber is reduced and the cost is lowered. In the parallel flat plate type plasma CVD apparatus in which high frequency voltages of... Agent: Fish & Richardson P.C.

20070181147 - Processing-fluid flow measuring method: An object to be processed such as a semiconductor wafer is processed by supplying a process fluid such as an ozone gas and a water vapor into a process vessel from a supply source through a supply pipe. During the process, a temperature of the process fluid flowing through the... Agent: Smith, Gambrell & Russell

20070181149 - Single wafer backside wet clean: A method and apparatus for cleaning a backside of a substrate is disclosed. The method includes placing the substrate parallel to a platter, wherein the backside of the substrate is facing a top side of the platter in a spaced apart relation, thus defining a gap therebetween. Subsequently, a liquid... Agent: Patterson & Sheridan, LLP

20070181150 - Cleaning solution and cleaning method of a semiconductor device: A cleaning method for removing foreign bodies during the fabrication of semiconductor devices including treating a substrate with a cleaning solution including an oxidizer to form a chemical oxide layer and then removing the chemical oxide layer, thereby removing foreign bodies from a surface of the semiconductor substrate. Accordingly, the... Agent: Frank Chau,esq. F. Chau & Associates, LLC

20070181152 - Substrate edge part cleaning apparatus and substrate edge part cleaning method: The substrate edge part cleaning apparatus 100 has a cleaning head which cleans by wiping an edge part of a substrate for display A while moving rectilinearly, the apparatus including a camera 117 which captures images of the proximity of an edge of a color filter which is placed on... Agent: Wenderoth, Lind & Ponack L.L.P.

20070181151 - System and method for cleaning chemistry and processing during thin film magnetic head wafer fabrication: A solution of ammonium citrate and benzotriazole (BTA) is used to clean thin film magnetic head wafers. When used with brushing, the solution is a highly efficient process for removing particles, such as those generated during chemical-mechanical polishing (CMP), without causing corrosion and roughness. This process may be used on... Agent: Bracewell & Giuliani LLP

20070181156 - Dishwasher and control method thereof: This invention relates to a dishwasher (1) and a control method thereof, where the effects influencing the washing performance negatively such as filter clogging, rotor blocking, foaming or increase in viscosity are identified by detecting the current (I) drawn by the circulation pump (4) from the network and the solution... Agent: Venable, Campillo, Logan & Meaney, P.C.

20070181154 - Dishwasher control for dealing with large amounts of food residues by variable wash programs: A method is provided enabling a dishwasher to be operated with variable wash programs, wherein the filter systems of the dishwasher do not become overloaded with protruding wash residues in the rinsing fluid. The method makes it possible to vary the pressure used to convey the rinsing fluid from the... Agent: Bsh Home Appliances Corporation Intellectual Property Department

20070181155 - Dishwasher with a system for recognition of filling level: A dishwasher with a system for filling level recognition may be achieved which reliably determines the fluid level inside the dishwasher without the use of moving parts, whereby the dishwasher is provided with at least one capacitive filling level sensor for recognition of the fluid level of the rinsing fluid... Agent: Bsh Home Appliances Corporation Intellectual Property Department

20070181157 - Apparatus and methods for flushing medical devices: Apparatus and methods for flushing medical devices are provided. In one embodiment, a flushing apparatus includes a container of carbon dioxide, a filter, a heat exchanger and an actuator for controlling delivery of carbon dioxide from the apparatus. In another embodiment, the flushing apparatus may be a syringe and a... Agent: VistaIPLaw Group LLP

20070181158 - Drill cuttings treatment system: A process for the separation of oil from invert mud drill cuttings. Invert mud drill cuttings are supplied to a mixing chamber of a jet pump. The invert mud drill cuttings are agitated within the jet pump to effect transformation of the solids-oil matrix of the invert mud drill cuttings.... Agent: Christensen, O'connor, Johnson, Kindness, PLLC

20070181162 - Method for detecting the load of items to be washed, and dishwasher machine: A method for determining at least one of the type and the quantity of items to be washed in a dishwasher machine is provided for use with a dishwashing machine having a washing chamber in which the items are placed in receptacles for subsequent washing of the items during a... Agent: Bsh Home Appliances Corporation Intellectual Property Department

20070181161 - Starch removal process: Starch is removed from the surface of an article using a multi-step method that includes presoaking the article in an acidic solution to remove the starch from the surface of the article and washing the article in an alkaline solution to clean the article.... Agent: Kinney & Lange, P.A.

20070181165 - Stripping and removal of organic-containing materials from electronic device substrate surfaces: Described herein is a method of removing an organic-containing material from an exposed surface of a large substrate (at least 0.25 m2). The substrate may comprise an electronic device. The exposed surface is treated with a stripping solution comprising ozone (O3) in a solvent, where the solvent comprises acetic anhydride.... Agent: Patent Counsel Applied Materials, Inc.

20070181167 - Method for masking and removing stains from rugged solid surfaces: Methods, compositions and kits for masking and subsequent removal of oil, grease, rust and other stains from a variety of rough solid surfaces, including, but not limited to stone, concrete, asphalt, stucco brick, and ceramic. The methods include coating the stains with an opaque or translucent thin film of a... Agent: Law Offices Of Brian S Steinberger

20070181168 - Dishwasher with a door seal: A seal is provided between the door apron and the lip of the container in a dishwasher, enabling a high sealing performance to be obtained during the entire service life of the dishwasher and providing an esthetic design. The seal can be mounted in a reliable manner without any considerable... Agent: Bsh Home Appliances Corporation Intellectual Property Department

20070181170 - Apparatus including an improved nozzle unit: An apparatus for supplying a solution to a substrate includes a nozzle unit. The nozzle unit may include at least one nozzle having a variable structure in which lateral portions of the at least one nozzle are bent toward a central portion of the at least one nozzle. Each nozzle... Agent: Lee & Morse, P.C.

20070175494 - Electrode cleaning using electrical pulse: Cleaning an electrode used for acquiring measurement data while the electrode is contacting a medium using a set of electrical pulses. An electrical pulse causes a voltage drop between approximately 0.01 Volts and approximately 10 Volts across the electrode. A particular voltage drop and/or other aspects of the pulse(s) can... Agent: Hoffman Warnick & D'alessandro, LLC

20070175495 - Apparatus for treating plasma and method for cleaning the same: An apparatus for treating plasma includes an inner chamber, an outer chamber receiving the inner chamber and including a gas supplier that supplies a gas into the inner chamber, an inner electrode disposed in the inner chamber, and a plasma generator supplying power independently to the inner electrode and the... Agent: F. Chau & Associates, LLC

20070175497 - Apparatus having heating portion in chemical bath for substrate wet treatment and method of heating chemical for substrate wet treatment using the apparatus: There are provided an apparatus having a heating portion in a chemical bath for substrate wet treatment and a method of heating a chemical for substrate wet treatment using the apparatus. The apparatus includes a chemical bath containing a chemical for substrate wet treatment. A heating portion is installed in... Agent: Mills & Onello LLP

20070175498 - Method of washing wheels of a vehicle and apparatus therefor: A method of washing a vehicle and apparatus therefore is disclosed. In one aspect, a wheel washing apparatus is pivotable about a vertical axis. In another aspect, wheels of the vehicle are applied a selective treatment, different from a side of the vehicle.... Agent: Senniger Powers

20070175496 - Cleaning method with chemical agent and cleaning apparatus with chemical agent: A cleaning apparatus with chemical agent circulation is provided, in which the apparatus airlock resulted from the air intrusion into the circulating path caused by bubbles generated by the cleaning process can be prevented. When the chemical agent is discharged from the overflow tank, spiral vortexes may generate near the... Agent: J C Patents, Inc.

20070175499 - Method for cleaning surfaces using parallel flow: A cleaning device for removing contaminants from a surface of an object to be cleaned, the device adapted to be fluidically connected to a high-pressure gas supply. The device comprises at least one high-pressure passage with a predetermined miniature lateral scale with a high-pressure outlet for accelerating the gas. The... Agent: Squire, Sanders & Dempsey L.l.p

20070175500 - Device and method for wet treating disc-shaped articles: A device for wet treating flat plate-like substrates includes a spin-chuck (2) for holding and rotating the substrate, at least one dispenser (3) for dispensing a liquid onto at least one surface (W) of the substrate, a liquid collector (4) circumferentially surrounding the spin-chuck for collecting liquid, which is spun... Agent: Young & Thompson

20070175501 - Substrate cleaning apparatus, substrate cleaning method, and medium for recording program used for the method: In a substrate cleaning method and a substrate cleaning method according to the present invention, a brush 3 is brought into contact with a substrate W while rotating the same, and a cleaning position Sb of the brush 3 is moved relative to the substrate W from a center part... Agent: Smith, Gambrell & Russell

20070175502 - Apparatus and method for delivering acoustic energy through a liquid stream to a target object for disruptive surface cleaning or treating effects: Apparatus is provided for performing acoustically aided treatment or cleaning of workpieces or subjects. In a first embodiment, acoustic energy contributed by one or more emitted streams is summed for cooperative treatment at a common workpiece region or site. In a second embodiment, one or more impinging streams are shaped... Agent: David W. Collins - Intellectual Property Law