Cleaning and liquid contact with solids inventions 06/07

20070144555 - Supercritical co2 cleaning system and method: A supercritical CO2 cleaning system is provided, comprising: a closed high-pressure cleaning trough, which is a funnel-shaped vessel tapered from top to bottom; a bearer platform, located within the closed high-pressure cleaning trough and rotated with respect to an object to be cleaned and used for bearing the object to... Agent: Bacon & Thomas, PLLC

20070144557 - Cleaning method of apparatus for depositing ai-containing metal film and ai-containing metal nitride film: A dry cleaning method for an apparatus for depositing a thin film that deposits an Al-containing metal film and an Al-containing metal nitride film is provided. The method includes maintaining a temperature inside of chamber of the apparatus for depositing a thin film at 430° C. or higher and cleaning... Agent: Ladas & Parry LLP

20070144559 - Unit for preventing a substrate from drying, substrate cleaning apparatus having the unit and method of cleaning the substrate using the unit: A unit for preventing a substrate from drying includes a transfer arm for transferring a substrate from a first bath containing a first cleaning solution to a second bath containing a second cleaning solution, a spraying part connected to the transfer arm, wherein the spraying part sprays a drying prevention... Agent: F. Chau & Associates, LLC

20070144566 - Dishwasher machine with door and handle element: The invention describes a hinged door (2) for a dishwasher machine (10) comprising a handle element (3) for unlocking and actuating the door (2), the handle element (3) being arranged on an upper side (5) of the door (2).... Agent: Bsh Home Appliances Corporation Intellectual Property Department

20070144554 - Cleaning of electrostatic chucks using ultrasonic agitation and applied electric fields: A method of cleaning an ESC comprises immersing a ceramic surface of the ESC in dielectric fluid; spacing the ceramic surface of the ESC apart from a conductive surface such that the dielectric fluid fills a gap between the ceramic surface of the ESC and the conductive surface; and subjecting... Agent: Buchanan, Ingersoll & Rooney PC

20070144556 - Reciprocating megasonic probe: A method of cleaning a substrate comprises placing the substrate on a rotating fixture, placing a liquid on at least one side of the substrate, and creating a standing wave of megasonic energy oriented generally parallel to the substrate. The standing wave generates an associated pattern of high-agitation regions in... Agent: Wolf, Block, Schorr & Solis-cohen LLP

20070144558 - Dishwashing machine having a dosing device for additives and associated method: A dish washing machine is provided having a dosing device operable to add an additive product into the dishwasher, the dosing device being operatively connected to an arrangement that separately stores the basic chemical products of an all-round additive product independent of one another. The dosing device is operable to... Agent: Bsh Home Appliances Corporation Intellectual Property Department

20070144560 - Cleaning apparatus and method of circuit boards in advanced electronic devices by making use of insulating liquids: The present invention relates to a cleaning apparatus and method of circuit boards by making use of insulating liquids and, more particularly, to the cleaning apparatus of live circuit-boards in advanced electronic and communication devices, while the power is on, by specially prepared cleaning liquid. The invention provides a safe... Agent: Han Sup Uhm

20070144561 - Degreasing jig, method for degreasing ceramic molded body, and method for manufacturing honeycomb structured body: A degreasing jig according to the present invention is a degreasing jig for degreasing of a ceramic molded body containing a ceramic powder, a binder, and a dispersion medium, comprising a bottom plate for placing the ceramic molded body thereon, and an air-permeable cover member provided in a manner to... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070144562 - Household appliance with a part which can be moved by a handle and handle: A household appliance, in particular a domestic dishwasher machine, provided with a handle (2) and a part (1) which can be moved by the handle (2) is described, said part having a fastening means (13, 19, 20) whereby the handle (2) can be releasably connected to the movable part (1).... Agent: Bsh Home Appliances Corporation Intellectual Property Department

20070144563 - Substrate treatment apparatus and substrate treatment method: A substrate treatment apparatus includes a substrate holding mechanism, a substrate attitude changing mechanism which changes the attitude of a substrate held by the substrate holding mechanism between a generally horizontal attitude and a tilted attitude in which the substrate is tilted with respect to a horizontal plane, a treatment... Agent: Ostrolenk Faber Gerb & Soffen

20070144564 - Component for a household appliance, in particular for a dishwasher, and sump for a household appliance, in particular for a dishwasher, using it: The present invention relates to a component for a household appliance, in particular for a dishwasher, and to a sump for a household appliance, in particular for a dishwasher, using it. Both the component and the sump are adapted to detect and/or control the level of a liquid in a... Agent: Intellectual Property Group Fredrikson & Byron, P.A.

20070144565 - Cleaning and sanitizing system: A high pressure water stream (14) is discharged onto a surface to be cleaned. An ozone/water stream (16) is discharged on the same surface for sanitizing the surface. The high pressure water and ozone/water streams (14, 16) are discharged simultaneously along closely adjacent paths that are either parallel (FIG. 3)... Agent: Black Lowe & Graham, PLLC

20070137671 - Fluorine based cleaning of an ion source: A deposit cleaning system for removing deposits from interior surfaces of ion sources and/or electrodes includes a fluorine source, a throttle mechanism, and a controller. The fluorine source supplies fluorine to the ion source as a cleaning material. The throttle mechanism mitigates loss of fluorine through a source aperture of... Agent: Eschweiler & Associates, LLC National City Bank Building

20070137678 - Washing unit particularly for vegetables, with stacked tanks and forced path: A washing unit for vegetables, comprising at least one upper and one lower stacked tanks, which are suitable to contain washing water and vegetables to be washed, and wherein a connection is provided between an upper and a lower tank of said tanks, said connection being suitable to allow for... Agent: Modiano & Associati

20070137672 - Spin cleaning apparatus and wafer cleaning method: To provide a wafer cleaning method capable of restricting breakage of fine structures disposed on a wafer, and a spin cleaning apparatus enabling such cleaning. The spin cleaning apparatus injects a cleaning liquid on a wafer surface while moving a nozzle, and at the same time, with an ultrasonic wave... Agent: Westerman, Hattori, Daniels & Adrian, LLP

20070137673 - Method and apparatus for cleaning a photoactive and/or hydrophilic surface: A method of cleaning a photoactive and/or hydrophilic surface includes contacting the surface with conditioned water and optionally a cleaning agent solution. A device for cleaning a photoactive and/or hydrophilic surface includes a housing having an inlet and an outlet, a first chamber and an optional second chamber located in... Agent: Andrew C. Siminerio Ppg Industries, Inc.

20070137674 - Readying cooling circuits for use in fuel cells: A flush and fill process is used to ready a fuel cell cooling circuit for initial use. An external flushing system relasably connected to the cooling circuit circulates flushing coolant through the cooling circuit to remove contaminants from the wetted surfaces of the cooling circuit before the fuel cell is... Agent: Randy W. Tung Tung & Associates

20070137675 - Method for removal of flux and other residue in dense fluid systems: Method for removing flux residue and defluxing residue from an article using a dense processing fluid and a dense rinse fluid is disclosed herein. In one embodiment, there is provided a method comprising: introducing the article comprising contaminants into a processing chamber; contacting the article with a dense processing fluid... Agent: Air Products And Chemicals, Inc. Patent Department

20070137676 - Method for the removal of airborne molecular contaminants using extra clean dry air: The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a portion of the interior surfaces. A contaminated purge gas is produced... Agent: Hamilton, Brook, Smith & Reynolds, P.C.

20070137677 - Substrate cleaning method and substrate cleaning apparatus: A substrate cleaning method including rotating a substrate at least for a period, supplying a liquid to the front surface of the substrate and cleaning the substrate, and drying the substrate is provided. Said drying of the substrate includes: reducing a rotational speed of the substrate to a first rotational... Agent: Smith, Gambrell & Russell

20070137679 - Single side workpiece processing: A centrifugal workpiece processor for processing semiconductor wafers and similar workpieces includes a head which holds and spins the workpiece. The head includes a rotor having a gas system. Gas is sprayed or jetted from inlets in the rotor to create a rotational gas flow. The rotational gas flow causes... Agent: Perkins Coie LLP/semitool

20070137680 - Hydrolasing system for use in storage tanks: A hydrolasing system for use in storage tanks includes a remotely-operated water lance having an elongated main body and an axle assembly that folds parallel to the main body so that it can be deployed and retrieved through a small-diameter riser of storage tank. After deployment, the system can be... Agent: Dorr, Carson & Birney, P.C. One Cherry Center

20070131244 - Method and apparatus for removing minute particles from a surface: A method and apparatus for removing one or more minute particle(s) from a surface of a sample using laser technology is provided. The laser energy wavelength, the pulse length and shape of the laser energy, the laser energy density, the pulse repetition rate of the laser energy, the laser beam... Agent: Ked & Associates, LLP

20070131243 - Method for cleaning surface of resin layer: A method for cleaning a surface of a resin layer capable of sufficiently improving peel strength of a metal film formed by plating on a surface which is roughened by performing a desmear treatment on a resin layer containing a resin added with a large amount of filler is provided.... Agent: Rankin, Hill, Porter & Clark LLP

20070131245 - Method of cleaning plasma etching apparatus, and thus-cleanable plasma etching apparatus: Aimed at providing a method of cleaning a plasma etching apparatus capable of suppressing variation in line width among wafers in a single lot, and improving throughput in the cleaning process, a method of cleaning a plasma etching apparatus of the present invention has steps of supplying a cleaning gas... Agent: Young & Thompson

20070131246 - Substrate processing method and substrate processing apparatus: A substrate having a liquid film formed by pre-processing unit is transported by a substrate transport robot from the pre-processing unit to a freeze processing unit disposed away from the pre-processing unit. In the freeze-processing unit, the liquid film is frozen. This causes the adhesion power of contaminants adhering to... Agent: Ostrolenk Faber Gerb & Soffen

20070131247 - Method and apparatus for surface tension control in advanced photolithography: A method and apparatus for cleaning and drying a semiconductor wafer is disclosed. Within a sealable chamber, a wafer having photoresist features thereon is spun while a cleaning fluid is applied to the top surface of the semiconductor wafer to clean off excess photoresist. A rinsing solution is applied to... Agent: Trask Britt, P.C./ Micron Technology

20070131248 - Article and method: A cleaning article comprises a substrate in the form of a wipe loaded with a cleaning agent and loaded with a heat generating agent which generates heat when the wipe is exposed to water.... Agent: Norris, Mclaughlin & Marcus

20070131249 - Probe washing method of scanning probe microscope: A probe to which a foreign matter has adhered is pressed to a sample. At this time, between a scanner in a cantilever side and a sample base, there are relatively generated a horizontal oscillation and a vertical oscillation. By generating a suitable friction to the probe tip, the foreign... Agent: Brinks Hofer Gilson & Lione

20070131250 - Dishwasher machine with a sound wave generator and relevant method: A dishwasher machine (1), in particular a domestic dishwasher machine, is described, comprising a washing container (2) and devices for washing items to be washed by means of washing solution, as well as a sound wave generator (5), wherein the sound wave generator (5) is used to generate a sound... Agent: Bsh Home Appliances Corporation Intellectual Property Department

20070131252 - Alkylsilanes as solvents for low vapor pressure precursors: Compositions and methods for cleaning deposition systems utilizing alkylsilanes are described herein. In an embodiment, a method of cleaning a semiconductor fabrication system comprises flushing the system with a solvent comprising at least one alkylsilane. In another embodiment, a method of removing at least one chemical precursor from a semiconductor... Agent: Air Liquide

20070131253 - Alkylsilanes as solvents for low vapor pressure precursors: The substrate processing apparatus includes a plurality of processing chambers. A given processing chamber is cleaned by first executing first processing during which voltage application control is executed to control a voltage applied to an electrostatic chuck based upon first processing voltage application information provided for the particular processing chamber... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070131251 - Device and method for cleaning a thick matter delivery pipe: The invention relates to a device for cleaning a thick matter delivery pipe (10), comprising an end-hose (18) which is mounted on an outlet side, a device (24) for introducing a pressurised fluid into the thick matter delivery pipe (10), and a cleaning body (22) that can be driven through... Agent: Akerman Senterfitt

20070131254 - Washing apparatus with bubbling reaction and a washing method of using bubbling reaction: The present invention relates to a washing apparatus with bubbling reaction and a washing method of using bubbling reaction which are based on compression technology of an interface diffusion layer with bubbling, by the aid of using a bubble wall generated by a pneumatic means as a reaction interface in... Agent: Birch Stewart Kolasch & Birch

20070131255 - Method for removing a layer area of a component: A method for removing a layer area of a component in which the component is firstly treated in at least one salt bath, and then, in a further method step, treated at least once in an acid bath. The method can include adding sodium oxide to a salt bath as... Agent: Siemens Corporation Intellectual Property Department

20070131256 - Substrate cleaning method, substrate cleaning apparatus and computer readable recording medium: After a rinse process on a wafer W is performed by feeding pure water to the surface of the wafer W at a predetermined flow rate while rotating the wafer W in an approximately horizontal state, a feed amount of the pure water to the wafer W is reduced, and... Agent: Smith, Gambrell & Russell

20070131257 - Dishwasher and method of supplying water to the dishwasher: Provided are a dishwasher and a method of supplying water in the dishwasher. The dishwasher includes a tub defining a washing chamber; a sump retaining washing water that is supplied to the tub; a steam generating device mounted on a side of the tub and having a steam chamber provided... Agent: Mckenna Long & Aldridge LLP

20070131258 - Dishwasher including a first door and a second door: A dishwasher includes a housing at least partially defining an interior area configured to receive dishware. The interior area includes a first access opening and a second access opening. A first door is attached with respect to the housing and configured to selectively close the first access opening. A second... Agent: Pearne & Gordon LLP

20070131259 - Method for eliminating odors in a dishwasher machine: A method for operating a dishwasher machine (1), in particular a domestic dishwasher machine, in which in order to eliminate odors, the air located in a washing container (2) is passed by a photocatalytic layer (5) exposed to a light source (6) in order to oxidise the odour-forming molecules contained... Agent: Bsh Home Appliances Corporation Intellectual Property Department

20070131260 - Dishwasher with regulatable heat recovery: The invention relates to a conveyor dishwasher having at least one washing zone (3, 4), at least one rinsing zone (5, 6), a suction-extraction location (23) and/or a heat-recovery device (11). The dishwasher also comprises at least one drying zone (7). The flow direction (30) of the exhaust air within... Agent: Birch Stewart Kolasch & Birch

20070131261 - Dishwasher and method of supplying water of dishwasher: Provided are a dishwasher and a method of supplying water in the dishwasher. The dishwasher includes a tub enclosing a washing chamber, a sump holding washing water to be supplied to the tub, and an air brake assembly having a steam generating unit that heats the washing water to be... Agent: Mckenna Long & Aldridge LLP

20070131262 - Construction machine: A washer tank is integrally formed with a front air duct, and the washer tank and the front air duct are installed within a cab. Thus, the washer tank can be installed within the cab by the use of spaces around the air duct. This arrangement makes it possible to... Agent: Mattingly Stanger Malur & Brundidge John R Mattingly

20070125400 - In-line wafer cleaning system and method: A wafer cleaning system includes a wafer chuck for holding a wafer top side down and a stage having a top surface opposing the wafer. The top surface of the stage includes thereon a plurality of cleaning liquid nozzles, a plurality of rinsing liquid nozzles, a central drain funnel and... Agent: Mcginn Intellectual Property Law Group, PLLC

20070125402 - Apparatus for cleaning seal bar in bag-making machine: An apparatus for cleaning a seal bar of a bag-making machine comprises a frame positioned in operative association with the seal bar, and a carriage mounted on the frame for movement along the length thereof. An articulable cleaning member is mounted on the carriage for movement therewith along the frame,... Agent: Wood, Phillips, Katz, Clark & Mortimer

20070125401 - Equipment and method for removing deposits created in electrolytic refining: The invention relates to an equipment for removing deposits accumulated in electrolytic refining on the surface of an electrode, such as a cathode, said equipment including at least one element for stripping the deposits and at least one element for controlling the stripping element; said equipment includes at least one... Agent: Smith-hill And Bedell, P.C.

20070125404 - Apparatus and method for cleaning and drying a container for semiconductor workpieces: The invention provides an apparatus for cleaning and drying a container for semiconductor workpieces. The apparatus comprises a load port with a fixture that receives a dirty container and delivers it to a deck assembly with a carrier that removably receives the container for further handling. While the container is... Agent: Perkins Coie LLP/semitool

20070125403 - Operating-phase-dependent control of a heat-recovery device in dishwashers: The invention relates to a conveyor dishwasher having at least one washing zone (6, 7), at least one rinsing zone (8, 9) and a heat-recovery device (13) with a suction-extraction means. The dishwasher also comprises a drying zone (11). Openings (17, 18, 19, 20, 21) are provided for the suction... Agent: Birch Stewart Kolasch & Birch

20070125405 - Substrate cleaning method and substrate cleaning apparatus: A substrate cleaning method, including a step of supplying a two-fluid spray made up of a liquid and a gas to the front surface of a substrate, is provided; wherein the supplying of the two-fluid spray is carried out using a mixture of purified water and isopropyl alcohol as a... Agent: Smith, Gambrell & Russell

20070125406 - Water powered eductor cleaner: A water-powered eductor cleaner for removing accumulated matter from within a chamber of an eductor. The water-powered eductor cleaner includes an eductor cleaning system for separating accumulated matter from the inside walls of the eductor chamber. The eductor cleaning system utilizes a high-pressured water stream from within the eductor chamber... Agent: Troutman Sanders LLP

20070125407 - Jet stream cleaning apparatus: A jet stream cleaning apparatus includes a housing and a cleaning device. The housing is formed with a mounting space to be supplied with a pressurized cleaning fluid. The cleaning device includes a hollow nozzle retainer mounted in the mounting space, a particle-collecting pad mounted on the nozzle retainer, and... Agent: Ladas & Parry

20070125408 - Clamping apparatus for washing optical members: An exemplary clamping apparatus (9) for optical members includes a top fixture (10) and a bottom fixture (20). The top fixture has a top washing slot (13) defined therein. The bottom fixture has a bottom washing slot (24) defined therein. The bottom washing slot communicates with the top washing slot.... Agent: PCe Industry, Inc. Att. Cheng-ju Chiang Jeffrey T. Knapp