Cleaning and liquid contact with solids inventions 05/07

20070119477 - Method and apparatus for semiconductor wafer cleaning using high-frequency acoustic energy with supercritical fluid: An apparatus and a method is provided for using high-frequency acoustic energy with a supercritical fluid to perform a semiconductor wafer (“wafer”) cleaning process. High-frequency acoustic energy is applied to the supercritical fluid to impart energy to particulate contamination present on the wafer surface. Energy imparted to particulate contamination via... Agent: Martine Penilla & Gencarella, LLP

20070119476 - Substrate processing apparatus and substrate processing method: A substrate held by a spin chuck is supplied with a chemical solution by a chemical solution nozzle and a processing of the substrate is performed. At this time, the chemical solution supplied to the substrate scatters around and adheres to members (processing cup and splash guard) residing near the... Agent: Ostrolenk Faber Gerb & Soffen

20070119478 - Dishwasher control system: A dishwasher includes a plurality of electrical wash system components connected to a control system constituted by a user interface controller and a main controller. The user interface controller includes a plurality of user input selectors for establishing model dependent operational parameters for a washing operation. The main controller broadcasts... Agent: Diederiks &whitelaw, PLC

20070119479 - Rinse method and developing apparatus: A rinse method for rinsing a substrate having an exposure pattern thereon developed includes presetting conditions for a rinse process according to surface states of the substrate, measuring a surface state of the substrate, selecting a corresponding condition for the rinse process based on the measured surface state of the... Agent: Smith, Gambrell & Russell

20070119480 - Apparatus and method of supplying chemical solution: An apparatus for supplying a chemical solution includes a mother tank storing a chemical solution, an intermediate tank disposed in a higher position than the mother tank with a first height difference (h), and the intermediate tank is adapted to receive a fixed amount of chemical solution from the mother... Agent: F. Chau & Associates, LLC

20070119481 - Dishwasher with variable heat damping: A drying device enables the moist dishwashing items located in the washing container to be dried quickly in hygienic and economically viable conditions. The dishwasher has a washing container that is at least partially surrounded by a heat damping layer with variable heat conductivity that can be adjusted according to... Agent: Russell W. Warnock Bsh Home Appliances Corp

20070119483 - Flexible utility link for a drawer-type dishwasher: A drawer-type dishwasher includes a outer housing and an extensible wash chamber that in a first position resides completely within the outer housing and in a second position extends completely out from the outer housing. The wash chamber is connected to the outer housing through a utility link. In order... Agent: Diederiks & Whitelaw, PLC

20070119482 - Lid seal for a drawer-type dishwasher: A drawer-type dishwasher includes a frame assembly, a wash tub slidably mounted in the frame assembly, and a lid member. The lid member can be lowered onto the wash tub when the wash tub is shifted into the frame assembly, and raised when the wash tub is shifted out of... Agent: Diederiks & Whitelaw, PLC

20070119484 - Control panel of a laundry processing machine: The control panel of a laundry processing machine according to the present invention making the light emitted from plural LEDs direct only to transparent protrusions by protrudingly forming the ribs in between plural transparent protrusions. Therefore user recognition effect may be increased.... Agent: Mckenna Long & Aldridge LLP

20070119485 - Latching and sealing mechanism for a drawer-type dishwasher: A dishwasher includes a drawer which is slidably mounted in a frame and forms a washing chamber. A lid assembly is mounted to the frame for selectively sealing the washing chamber during a washing operation. A closing mechanism moves the lid assembly from a first or open position to a... Agent: Diederiks & Whitelaw, PLC

20070119486 - System for rinsing and drying semiconductor substrates: A system for cleaning and drying semiconductor wafers improves device yield by providing more advanced control of the ratio of drying fluid to cleaning fluid, for example the ratio of N2 vapor to IPA vapor. In addition, a quick drain process is employed to improve process throughput, and to further... Agent: Mills & Onello LLP

20070119487 - Liquid dispenser for steam cleaner: There is provided a liquid dispenser to be used with a steam-cleaning device that enables a user to dispense a heated liquid, such as a cleaning fluid, soap or detergent while simultaneously steam-cleaning. This can be accomplished through the use of a main housing, a base, a housing connection aperture,... Agent: Steven A. Garner, Esq. Conair Corporation

20070119488 - Dish washer with disc type passage control valve: A dish washer is disclosed which includes a disc type passage control valve formed to have a simple disc structure, thereby being capable of smoothly supplying wash water to a washing arm. The dish washer includes an upper washing arm, a lower washing arm, a sump for receiving wash water,... Agent: Ked & Associates, LLP

20070113866 - Method for cleaning a surface of a photomask: A method of cleaning a surface of a photomask includes placing the photomask in a vessel, which is held under an elevated pressure and feeding a supercritical fluid, in particular, CO2 in a supercritical state, to the vessel. As a result, contaminants are efficiently removed from the photomask surface. An... Agent: Gregory L. Mayback, P.A.

20070113867 - Polymer treatment using a plasma brush: An atmospheric cold plasma brush was used to treat the surfaces of polymers. The surface properties of plasma-treated polymers were compared to those of the corresponding untreated polymers by static water contact angle measurements. Surface treatment usually resulted in a decrease in the static water contact angle, indicating that the... Agent: Los Alamos National Security, LLC

20070113868 - Apparatus and a method for cleaning a dielectric film: An apparatus and a method of cleaning a dielectric film are provided in the present invention. In one embodiment, an apparatus of cleaning a dielectric film the apparatus includes a chamber body adapted to support a substrate therein, a remote plasma source adapted to provide a plurality of reactive radicals... Agent: Patterson & Sheridan, LLP

20070113869 - Process for cleaning large format or giant screen movie screens: This invention relates to cleaning large format movie screens, such as vinyl screens and painted screens. There are different variations of the basic concept of using a cleaning head, cables, pulleys, an upper mounting bracket and a winch. In one instance a track may be used instead of a cable.... Agent: John R. Casperson

20070113870 - Method of cleansing filtration media and system therefor: A predetermined amount of filtration sand is suctioned out in the upward direction with a pump from a filtration reservoir embedded in the ground, during a backwash cleansing operation. The suctioned filtration sand is supplied to a sand cleansing apparatus and the filtration sand is cleansed to remove contaminants. The... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070113871 - Method and apparatus for waste evacuation: A method and apparatus for waste evacuation using an extendible and retractable hose for transferring the waste have been described.... Agent: Heimlich Law

20070113872 - Liquid processing method and liquid processing apparatus: A liquid processing method includes: placing a plate adjacently to at least one of surfaces of a target substrate, and supplying a process liquid into a gap between the plate and the target substrate, thereby forming a liquid film of the process liquid; subjecting the target substrate to a process... Agent: Smith, Gambrell & Russell

20070113873 - Method for cleaning optical films: A method of cleaning used to clean alkalized optical films has a first rinsing process by which a base liquid on the optical film is rinsed, a second rinsing process by which remaining alkaline solution on the optical film is rinsed, and a drying process by which water remaining on... Agent: North America Intellectual Property Corporation

20070113874 - Substrate processing method and substrate processing apparatus: Disclosed is a substrate processing method including a substrate rotating step for rotating a substrate with the substrate held almost horizontally within a chamber; a peripheral edge processing step for discharging a processing liquid to a lower surface of the substrate rotated in the substrate rotating step and causing the... Agent: Ostrolenk Faber Gerb & Soffen

20070113875 - Stabilization of alkaline hydrogen peroxide: A stabilized basic aqueous hydrogen peroxide composition is disclosed. The composition contains about 0.3 wt % to about 15 wt % of hydrogen peroxide; water; and a stabilizer system that contains about 10 ppm to about 1% of a stannate stabilizer; 10 ppm to about 1% of a phosphonic acid... Agent: Arkema Inc. Steven Boyd, Esquire

20070113876 - Cleaning apparatus: Cleaning apparatus is provided having tray carriers (10) supported on a carousel (19) that move by means of a driven chain (18) between a collection station (21) and a washing area (22). The tray carriers (10) are operably connected on a support plate (16) of the carousel (19) and slide... Agent: Paul R. Morico Baker Botts L.L.P.

20070107748 - Vacuum cavitational streaming: An enhanced Vacuum Cavitational Streaming (VCS) process focuses on the formation of vapor bubbles and the transfer of a chemical from the solvent to the surface of the object while the chemical is in the vapor state within the bubble, i.e. a chemical mechanism. There is less importance on the... Agent: Barlow, Josephs & Holmes, Ltd.

20070107750 - Method of using nf3 for removing surface deposits from the interior of chemical vapor deposition chambers: The present invention relates to a remote plasma cleaning method for removing surface deposits from a surface, such as the interior of a depositions chamber that is used in fabricating electronic devices. The process involves activating a gas stream comprising an oxygen source, NF3, and a fluorocarbon and contacting the... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center

20070107749 - Process chamber cleaning method: A cleaning method for a process chamber is disclosed. The process is performed following an etch process on a wafer, and thereafter comprises unloading a wafer from the process chamber, injecting a cleaning gas comprising at least one gas selected from a group of gases consisting of C, H, F,... Agent: Volentine Francos, & Whitt PLLC

20070107751 - Ozone processing apparatus and ozone processing method: Water vapor is mixed to O3 gas generated by an ozone generator of discharge type. The mixed fluid is cooled by a cooler, thereby impurities such as metals and nitrogen oxides contained in the O3 gas dissolve into condensed water. Subsequently, a gas-liquid separator separates the O3 gas from the... Agent: Morrison & Foerster, LLP

20070107752 - Dry type cleaning apparatus and dry type cleaning method: A dry type cleaning technology is disclosed. Dust adhering to a cleaning object is removed with a cleaning medium caused to flow by a high-speed airflow. The removed dust is separated from the cleaning medium with a porous member including holes through which air, dust, and granular material can pass... Agent: Dickstein Shapiro LLP

20070107753 - Dishwasher with comminution device: A dishwasher is provided with a washing container for receiving items to be washed by the dishwasher, a circulatory pump for circulating a rinsing liquid into contact with items received in the washing container, and a comminution device for comminuting rinsing residue. The comminution device and the circulatory pump are... Agent: Bsh Home Appliances Corporation Intellectual Property Department

20070107754 - Dishwasher having avatar display portion: A dishwasher having an avatar display portion is provided. The dishwasher includes a tub for housing dishes, a pump for forcing wash water into the tub, a system microcomputer for controlling loads of the dishwasher including the pump and controlling an avatar image display operation, and a display unit including... Agent: Mckenna Long & Aldridge LLP

20070107755 - Apparatus for washing and disinfecting endoscope: There is provided an apparatus for washing and disinfecting an endoscope equipped with an insertion tube through which a duct is formed and a base portion integrated with the insertion tube. The apparatus comprises a bath member providing a washing bath; and an accommodating member on which the endoscope is... Agent: Scully Scott Murphy & Presser, PC

20070107756 - Meniscus proximity system for cleaning semiconductor substrate surfaces: A system and apparatus for cleaning a substrate is provided. The system includes a first head configured as a bar shape that extends approximately a diameter of the substrate. The first head is configured for placement on a first side of the substrate. A second head is also provided, and... Agent: Martine Penilla & Gencarella, LLP

20070107757 - Free standing portable car washer: A free standing portable car washer with sprays connected to a common source of water under pressure, has a device operated solely by the water under pressure from the common source for metering positively a predetermined amount of detergent to the sprays.... Agent: Polster, Lieder, Woodruff & Lucchesi

20070102020 - Ultrasonic cleaning method and device: An ultrasonic cleaning device (50) comprises: an ultrasonic oscillation plate (2) having a plurality of ultrasonic oscillators (1); an ultrasonic wave guide chamber (3) for collecting an ultrasonic wave force generated by the ultrasonic oscillation plate; and a cleaning tank (4) in which a cleaning solution (20) is stored, wherein... Agent: Harness, Dickey & Pierce, P.L.C

20070102021 - Solvent compositions comprising unsaturated fluorinated hydrocarbons: Disclosed is a method for removing residue from a surface comprising: contacting the surface with a composition comprising at least one unsaturated fluorinated hydrocarbon selected from the group consisting of compounds having the formula E- or Z-R1CH═CHR2, wherein R1 and R2 are, independently, C1 to C6 perfluoroalkyl groups, or C1... Agent: E I Du Pont De Nemours And Company Legal Patent Records Center

20070102022 - Active rinse shield for electrofill chemical bath and method of use: An active rinse shield designed to protect electrofill chemical baths from excessive dilution during rinse sprays on the semiconductor wafer. The shield uses overlapping blades to cover the bath, making a physical barrier between the bath chemistry and the wafer rinse water. The blades are interconnecting ribs that actuate around... Agent: Law Office Of Delio & Peterson, LLC.

20070102023 - Apparatus for treating substrates with phosphoric acid solution and method for regenerating the phosphoric acid solution employed therein: An apparatus and method for removing silicate from a phosphoric acid solution, including a treating unit, a regeneration line coupled to the treating unit, an additive solution supply member in communication with the regeneration line to decrease the temperature of the phosphoric acid solution and the concentration of the phosphoric... Agent: Lee & Morse, P.C.

20070102024 - Domestic machine comprising a system for feeding a cleaning product into the cleaning liquid: A dishwasher machine or washing machine includes a device that takes into account the loaded state of the machine or the type of dirtiness of the items to be washed, in order to be able to determine and regulate the amount of washing-active substances required in the cleaning liquid for... Agent: Russell Warnock

20070102025 - Dishwasher and controlling method thereof: A dishwasher and a controlling method thereof are provided. The dishwasher includes a tub, a door, a steam generator, and a dish storage. The tub holds dishes and is opened at one end. The door selectively seals the opened end of the tub. The steam generator is provided outside the... Agent: Mckenna Long & Aldridge LLP

20070102026 - Dishwasher and controlling method thereof: A dishwasher and a controlling method thereof are provided. The dishwasher includes a tub, a door, a steam supplying unit, a fan, and a passage. The tub stores dishes. The door opens and closes the tub. The steam supplying unit supplies steam into the tub. The fan blows the steam.... Agent: Mckenna Long & Aldridge LLP

20070102027 - Washing device and aqua stopping device for the same: An aqua stopping device (200) for washing device (100) is provided. The aqua stopping device (200) includes a valve body (210), at least one valve (280), a signal wire (271), a connecting wire (271), a connecting portion (272), an inner case (260), an outer case (250). The valve body (210)... Agent: Mckenna Long & Aldridge LLP

20070102029 - Acoustic seal for use in kitchen appliance: An acoustic blanket is provided for an appliance. The acoustic blanket includes a main body, a margin and a fold line connecting the main body to the margin. The margin is folded about the fold line relative to the main body in order to provide an edge seal around the... Agent: Owens Corning

20070102028 - Dish washer: Sump assembly in a dishwasher holds washing water and supplies the washing water to spray nozzles. The sump assembly includes a sump housing for holding washing water, a heater assembly fastened to an inside of the sump housing for heating the washing water, and a pump fastened to the sump... Agent: Mckenna Long & Aldridge LLP

20070102030 - Dishwasher having a variable speed circulation pump controlled responsive to sensed turbidity: A dishwasher includes an enclosure within which dishes are washed with a wash liquid. A pump moves the wash liquid to wash the dishes within the enclosure. The pump has a plurality of operational states. A sensor senses turbidity within the wash liquid. The dishwasher includes means to control the... Agent: Pearne & Gordon LLP

20070095362 - Brush and method: A method for washing comprising providing an electrical vibrating device having a handle assembly coupled to a detachable head assembly, and dispensing at least one fluid from the head assembly for washing. An electrical vibrating device having a handle assembly coupled to a detachable head assembly. The head assembly includes... Agent: John W. Carpenter Esq

20070095363 - Substrate cleaning apparatus and substrate cleaning method: A substrate cleaning apparatus, comprises a process tank that holds a mixture containing a hydrogen peroxide solution and sulfuric acid and is used for cleaning a substrate immersed in said mixture; circulation piping that extends between a primary side of said process tank on which said mixture is injected into... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070095364 - Mobile flushing unit and process: In one embodiment of the invention, a method of cleaning a workpiece is disclosed. The method comprises providing a mobile flushing unit and servicing the workpiece as follows: a) connecting a flexible hose of the mobile flushing unit to one end of the workpiece and connecting another flexible hose of... Agent: Harrington & Smith, PC

20070095365 - Solids separation system: A solids removal system for use in removing sand and silt from well production fluids. The system has a manifold assembly provided with jetting nozzles, which is installed in a liquid- and solids-containing vessel, where solids have settled in the walls. The jetting nozzles deliver, in a pre-determined sequence, a... Agent: Keaty Professional Law Corporation Thomas S. Keaty

20070095366 - Stripping and cleaning of organic-containing materials from electronic device substrate surfaces: Disclosed herein is a method of removing an organic material from an electronic device substrate surface. The method is particularly useful when the device substrate includes exposed metal. According to the present method, an electronic device substrate surface is exposed to a solution comprising ozone (O3) at a concentration ranging... Agent: Shirley L. Church, Esq.

20070095367 - Apparatus and method for atomic layer cleaning and polishing: The present invention generally provides an apparatus and method of processing substrates to uniformly remove any residual contamination from the surface of a substrate by use of an appropriate cleaning chemistry and contact with a cleaning medium. In one embodiment, the cleaning medium, such as is a brush or a... Agent: Patterson & Sheridan, LLP

20070095368 - Methods of removing a conformal coating, related processes, and articles: The present invention relates to methods of removing a conformal coating from an article, related processes, and articles. According to one aspect of the present invention, a process of removing at least a portion of a conformal coating from an article includes the steps of providing an article that includes... Agent: Honeywell International Inc.

20070095369 - Dishwasher assembly having an air conduit: A dishwasher includes a cabinet having a wash chamber defined therein, a tub positioned within the wash chamber, a door coupled to the cabinet, and a fan positioned within the cabinet. An air conduit is positioned within the dishwasher and includes a conduit body configured to be mounted onto the... Agent: John S. Beulick (13307)

20070095370 - Mobile high-temperature washing plant: A mobile high-temperature washing plant, disposed upon a motor vehicle having an engine, includes a cleaning water storage vessel, a pump configured to pump the cleaning water from the cleaning water storage vessel for cleaning use, and a vacuum system for withdrawing and disposing of used cleaning water. An engine... Agent: David R. Mckinney, P.C.

20070095371 - Device in the form of a washing machine comprising a bioreactor for cleaning machine parts that are soiled with oil and fat: The invention relates to a device in the form of a washing machine for cleaning machine parts that are soiled with oil or fat. Said washing machine comprises a housing that can be closed with a lid and that houses a basket for receiving the soiled parts. A spray nozzle... Agent: White, Redway & Brown LLP

20070095372 - Flushing unit: A unit for internal cleaning of tube/house applications comprising a tank (2) and a filter unit (20) to be used with a cleaning media in form of liquid or gas that are pressed through a tube/hose application, RECOGNISED by a pump unit (23) which is an integrated part of the... Agent: Harness, Dickey & Pierce, P.L.C