Cleaning and liquid contact with solids inventions 04/07

20070089762 - Method and cleaning device for cleaning a spraying device: To clean an atomizer used for automatic series-production coating of work pieces in a cleaning device provided for this purpose, the outer housing of the atomizer is sprayed by nozzles of the cleaning device, while simultaneously painting and rinsing agents sprayed by the spray head of the atomizer in a... Agent: Young & Basile, P.C.

20070089761 - Non-plasma method of removing photoresist from a substrate: A method is provided to remove in particular ion implanted photoresist from a substrate, such as a semiconductor wafer, consisting of heating the photoresist for deforming an interface of a crust and bulk layer of the photoresist, and controlling a temperature of the heating for cracking the photoresist.... Agent: Joshua L. Cohen Boc, Inc.

20070089763 - Dishwasher: The aim of the invention is to provide a dishwasher (1) that can be used to efficiently clean and dry the objects to be washed in the washing basket from an economical point of view, and to maintain the related energy costs as low as possible. To this end, the... Agent: Bsh Home Appliances Corporation Intellectual Property Department

20070089764 - Gas tight vessel with a diffusion barrier layer of metal hydrides: The present invention relates to a gas tight storage and/or transport tank for low molecular filling media, in particular for hydrogen, with a tank wall which comprises a thermoplastic polymer and at least one diffusion barrier. The diffusion barrier comprises a metal hydride.... Agent: Marshall, Gerstein & Borun LLP

20070089765 - Paint implements cleaning system: A paint implement cleaning system consists of a basic container having at least three water pressure nozzles located therein. There is at least one at the bottom of the container and others are located midway within the container and diametrically opposite from each other. The basic container has a closure... Agent: Kevin Michael Clark

20070089766 - Mobile device for washing bulky articles: A device for washing bulky items including a trailer having a wash compartment. The floor of the wash compartment allows waste water to be collected and pumped from the interior of the compartment. Onboard generators provide power to a pump for collecting waste water and to a pressure washer that... Agent: Schneck & Schneck

20070089767 - Substrate cleaning apparatus: An apparatus for cleaning a whole substrate by ejecting a cleaning liquid from a nozzle while rotating the substrate, the apparatus comprising: two or more linear reciprocating driving sources capable of generating outputs independently of one another; a rotation shaft; two or more cam mechanisms for converting the outputs into... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20070084481 - System and method of cleaning substrates using a subambient process solution: A system and method of cleaning a substrate utilizing sonic energy and a film of subambient gasified process solution that assists in reducing damage to the substrate. In one aspect, the invention is a method comprising: a) supporting a substrate in a substantially horizontal orientation; b) applying a solution comprising... Agent: Wolf, Block, Schorr & Solis-cohen LLP

20070084482 - Apparatus and method for cleaning semiconductor wafer: Method and apparatus for precisely removing dusts from a side edge of a wafer, improving a production yield of wafers, and reducing a manufacturing cost for semiconductor devices. The apparatus includes: a retaining table having a circular top plan view, capable of retaining the wafer disposed on the top surface,... Agent: Young & Thompson

20070084483 - Method and apparatus for cleaning a semiconductor substrate: A method for cleaning a substrate is provided. The method initiates with applying an activation solution to a surface of the substrate. The activation solution and the surface of the substrate are contacted with a surface of a solid cleaning surface. The activation solution is absorbed into a portion of... Agent: Martine Penilla & Gencarella, LLP

20070084484 - Selectively controllable heated wash system: A selectively controllable heated wash system for a vehicle surface includes a wiper system control module operatively disposed in the vehicle and may be adapted to receive at least one sensed input. A fluid heating module is controlled by the wiper system control module, the heating module adapted to heat... Agent: Julia Church Dierker Dierker & Associates, P.C.

20070084485 - Method and apparatus for cleaning a semiconductor substrate: A method for cleaning a substrate is provided. The method initiates with disposing a fluid layer having solid components therein to a surface of the substrate. A shear force directed substantially parallel to the surface of the substrate and toward an outer edge of the substrate is then created. The... Agent: Martine Penilla & Gencarella, LLP

20070084486 - Dish washer: A dish washer includes a steam generating unit that is configured to control the amount of steam in accordance with the amount of items in the dish washer. The steam generating unit is positioned outside of the tub and is configured to generate and supply steam to the tub. The... Agent: Mckenna Long & Aldridge LLP

20070084487 - Surface cleaning device: A surface cleaning device has a cleaning chamber for goods to be cleaned with a cleaning medium. At least one tank for the cleaning medium is provided. A cleaning medium circuit is provided that has a supply device that conveys the cleaning medium from the at least one tank to... Agent: Gudrun E. Huckett Draudt

20070084488 - Cleaning device for internal combustion engine: A cleaning device for internal combustion engine by way of suction force generated at the air-inlet tube of the engine is disclosed. The tapered air passage accelerates the air stream to produce a suction force, or a moveable or adjustable valve device to change the surface area of the air... Agent: Leong C Lei

20070079848 - Method and apparatus for removing contamination from substrate: A cleaning material is disposed over a substrate. The cleaning material includes solid components dispersed within a liquid medium. A force is applied to the solid components within the liquid medium to bring the solid components within proximity to contaminants present on the substrate. The force applied to the solid... Agent: Martine Penilla & Gencarella, LLP

20070079849 - Integrated chamber cleaning system: Methods and apparatus for cleaning a process chamber using a fluorine gas, wherein the fluorine gas is at least partially recycled for further use in the cleaning cycle. The method includes generation of the fluorine, separation of fluorine from the waste gas of the process chamber and abatement of the... Agent: The Boc Group, Inc.

20070079850 - Device for controlling spray channels in dishwasher machines: A dishwasher machine with a compact device for spraying items to be rinsed is provided whereby the rinsing liquid is regularly sprayed in the rinsing container and the spray jets created by the spray device can be varied. To this end, the rinsing device comprises at least one spray channel... Agent: Bsh Home Appliances Corporation Intellectual Property Department

20070079851 - Dishwasher: There is provided a dishwasher. The dishwasher includes a tub for receiving dishes, a steam generation unit provided at an outside of the tub and generating steam that will be supplied to the tub, a steam passage along which the steam generated from the steam generation unit is supplied to... Agent: Mckenna Long & Aldridge LLP

20070079852 - Removal of residual concrete from ready mixed concrete drums: Residual concrete in the drum of a ready mixed concrete truck is removed by high-pressure water. A nozzle is mounted on the leading end of a torpedo-shaped nozzle housing that is hingedly mounted to an elongate boom. The boom enters the mouth of the drum at an angle that matches... Agent: Smith Hopen, Pa

20070074737 - Method of surface treatment of composite material structures with atmospheric plasma beams: The invention relates to a method of surface treatment of predetermined areas of a composite material structure with at least one plasma beam at atmospheric pressure, produced by a plasma generator provided with an emission nozzle in order to facilitate its adhesive bonding to another structure, in which: a) the... Agent: Ladas & Parry

20070074738 - Cleaning method of semiconductor manufacturing apparatus and semiconductor manufacturing apparatus: A cleaning method of a semiconductor manufacturing apparatus begins by introducing film forming gas include reaction gas not forming a film by itself to reaction chamber to form the film on a semiconductor substrate, decreasing pressure of the reaction chamber, solidifying or liquefying the reaction gas to form particles by... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070074739 - Cleaning method of treatment equipment and treatment equipment: In a state of the inside of a treatment chamber of treatment equipment being evacuated, therein a cleaning gas containing trifluoroacetic acid (TFA) as a cleaning agent is supplied. Metal such as copper used in the formation of an interconnection or an electrode and stuck on an inner wall surface... Agent: Pillsbury Winthrop Shaw Pittman, LLP

20070074740 - Debris collection apparatus and method for collecting debris from a data storage library: Debris collection apparatus includes a housing that substantially conforms to a dimensional standard for a specified type of data cartridge. A debris attractant operatively associated with a surface of the housing attracts and holds debris from a region to be cleaned.... Agent: Hewlett Packard Company

20070074742 - Aer wet cleaning indicator: A soil standard for monitoring a cleaning process for a medical instrument, employs a soil which contains moisture so as to more accurately mimic soil which may be present upon an instrument to be cleaned in the cleaning process.... Agent: Philip S. Johnson Johnson & Johnson

20070074741 - Method for dry cleaning nickel deposits from a processing system: A method for dry cleaning a process chamber including a nickel deposit. The method includes exposing a system component in the process chamber to a process gas with a carbonyl gas, reacting the nickel deposit on the system component with the carbonyl gas in a dry cleaning process to form... Agent: Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070074743 - H2 conditioning of chamber following cleaning cycle: The present invention relates to methods and apparatus used in the cleaning of chambers, such as semiconductor processing chambers. In particular, fluorine from a fluorine generator is used in the cleaning cycle and by-product hydrogen from the fluorine generation is used to condition the chamber and remove residual fluorine following... Agent: The Boc Group, Inc.

20070074744 - Cellular aqueous tube cleaning system and method: An aqueous tube cleaning system as described herein can be utilized to clean a plurality of tubes having different lengths. The system includes a tower assembly having a wash chamber that houses the tubes during the cleaning cycle. The tower assembly is held in a horizontal load/unload position for loading... Agent: Ingrassia Fisher & Lorenz, P.C.

20070074745 - Exhaust system for use in processing a substrate: Disclosed is an exhaust system for discharging a fluid which is supplied into a hermetically closed container 54 for containing a semiconductor wafer W, a substrate to be supplied in the container 54 and subjected to a process. The exhaust system comprises an outer exhaust pipe 71 which is connected... Agent: Smith, Gambrell & Russell

20070074746 - Dishwasher with integrated spray channels: A device for spraying spray products in a dishwasher enables the dishes to be impinged upon with dishwashing fluid in an efficient manner and to avoid wear and tear caused by moving parts and to provide trouble-free operation. The spraying device sprays dishwashing fluid into the inside of the washing... Agent: Bsh Home Appliances Corporation Intellectual Property Department

20070074747 - Substrate processing method, substrate processing apparatus and computer-readable memory medium: A substrate processing method which removes an ArF resist film from a wafer having the ArF resist film. As an ultraviolet irradiation process is performed on the ArF resist film, and then an ozone gas and water vapor are fed to the ArF resist film, the ArF resist film is... Agent: Morrison & Foerster, LLP