Cleaning and liquid contact with solids inventions 01/07

20070017547 - Method for cleaning disk-shape glass substrate and magnetic disk: A method for cleaning a disk-shape glass substrate, which comprises rotating the disk-shape glass substrate on its center with its main surface vertical, and making a cleaning fluid irradiated with ultrasonic waves run down on the outer peripheral edge surface of the rotating glass substrate.... Agent: C. Irvin Mcclelland Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070017548 - System and method for cleaning or sanitizing items intended for re-use: A system and method for sanitizing an item, such as a grocery store shopping cart or a child stroller, for re-use utilizes a passageway having an entrance and an exit and a source of ozinated water. A pump and an associated piping network are used to direct the water, when... Agent: Michael E. Mckee Attorney At Law

20070017550 - Process for treatment and extraction of organic cork compounds by a dense fluid under pressure: Process for the treatment of cork or a cork-based material particularly with a view towards extracting contaminating organic compounds, in which said cork or said cork-based material is put into contact with a dense fluid under pressure at a temperature of from 10 to 120° C. and at a pressure... Agent: C. Irvin Mcclelland Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070017549 - Valveless intake screen airburst system: A method and apparatus for a backwash system for cleaning an underwater intake filter assembly is disclosed. The backwash system includes an underwater tank coupled on one end to a source of compressed fluid and on the other end to the intake screen assembly. The backwash system includes a U-shaped... Agent: Patterson & Sheridan, L.L.P.

20070017551 - Dishwasher fill control: A method of filling a dishwasher includes inputting first water into a dishwasher in a first fill, monitoring temperature of the first water, pumping the first water out of the dishwasher until the temperature of the first water reaches a first predetermined temperature, then filling the dishwasher with second water... Agent: Jansson, Shupe, Munger & Antaramian, Ltd

20070017552 - Mechanism and method of discharging solid object: The present invention provides a discharging method for discharging solid matter out of a container in which the solid matter is stored. In this discharging method of solid matter, a discharging liquid is supplied into the container 2 and thereby generates a spiral flow to cause the liquid and the... Agent: Drinker Biddle & Reath (dc)

20070017553 - Warewashing system containing low levels of surfactant: A method of washing ware in an automatic institutional warewashing machine, using a cleaning composition containing a surfactant which eliminates the need for a surfactant in the rinse step. A surfactant is employed in the wash step in an amount not to exceed 15 wt % based on weight of... Agent: S.c. Johnson Commercial Markets Inc

20070017554 - Semiconductor wafer treating apparatus: A semiconductor wafer treating apparatus comprising a housing, holding means rotatably disposed within the housing, rotating means for rotating the holding means, and cleaning means for cleaning a semiconductor wafer held on the holding means. Irradiation means for irradiating the semiconductor wafer held on the holding means with short wavelength... Agent: Smith, Gambrell & Russell

20070017555 - Substrate processing method and substrate processing apparatus: A substrate (W) is processed with the use of a process liquid such as a deionized water. Then, a first fluid which is more volatile than the process liquid is supplied to an upper surface of the substrate (W) from a fluid nozzle (12) to form a liquid film. Next,... Agent: Smith, Gambrell & Russell

20070017556 - Multiple wash zone dishwasher: The present invention relates to a dishwasher, and more particularly to a dishwasher having multiple wash zones. The dishwasher has an interior tub configured to provide an interior wash chamber for washing dishes. It also has a spray arm assembly configured to rotate within the tub and to spray a... Agent: Mcgarry Bair PC

20070017557 - Cleaning apparatus having multiple wash tanks for carbon dioxide dry cleaning and methods of using same: Cleaning apparatus having multiple wash tanks for washing articles in a carbon dioxide dry cleaning system employing a liquid carbon dioxide cleaning solution are provided. Cleaning apparatus having multiple wash tanks of the present invention may provide improved thermodynamic efficiency by allowing carbon dioxide vapor to be transferred between wash... Agent: Myers Bigel Sibley & Sajovec

20070017558 - Surface cleaner with multiple angled orifices: A system that cleans boat bottoms, or aquarium windows, and also stimulates the skin, yet does not penetrate or break the skin. The cleaning or skin stimulation is accomplished by high speed high pressure liquid flow, through multiple orifices carried by an orifice plate, with all or most orifices positioned... Agent: Charles A. Walton

20070017559 - Washer fluid spraying apparatus: In the present washer fluid spraying apparatus, when the amount of the remaining washer fluid in the tank is reduced, the buoyant force of the float does not have an effect to the valve member, and therefore the cross-sectional area of the flow passage of the valve member is reduced.... Agent: Rader, Fishman & Grauer PLLC

20070017560 - Substrate carrier: The present invention includes a plurality of carrier arms provided close to each other, each of the carrier arms for supporting a substrate and carrying the substrate in the horizontal direction. The plurality of carrier arms are arranged such that carriage paths thereof overlap one on the other in plan... Agent: C. Irvin Mcclelland Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070012335 - Photomask cleaning using vacuum ultraviolet (vuv) light cleaning: A multi-step cleaning procedure cleans phase shift photomasks and other photomasks and Mo-containing surfaces. In one embodiment, vacuum ultraviolet (VUV) light produced by an Xe2 excimer laser converts oxygen to ozone that is used in a first cleaning operation. The VUV/ozone clean may be followed by a wet SC1 chemical... Agent: Duane Morris, LLPIPDepartment

20070012336 - Photomask cleaning using vacuum ultraviolet (vuv) light cleaning: A multi-sub-process cleaning procedure cleans phase shift photomasks and other photomasks and Mo-containing surfaces. In one embodiment, vacuum ultraviolet (VUV) light produced by an Xe2 excimer laser converts oxygen to ozone that is used in a first cleaning operation. The VUV/ozone clean may be followed by a wet SC1 chemical... Agent: Duane Morris LLPIPDepartment (tsmc)

20070012334 - Resonant frequency bottle sanitation: A system and method of cleaning an enclosure of a container defined by inner walls, including providing a container, orienting the container so that the opening is lowermost and opens downwardly and generating resonant vibration in the container at a predetermined frequency and at an energy level sufficient to dislodge... Agent: Pepsico, Inc. C/o Goodwin Procter LLP

20070012337 - In-line metrology for supercritical fluid processing: The system includes a metrology module coupled to a supercritical processing chamber, and the method includes positioning a substrate on a substrate holder in a metrology chamber, measuring a residue in at least one feature of the substrate, determining a supercritical cleaning process recipe based on the measured residue, positioning... Agent: Wood, Herron & Evans, LLP (tokyo Electron)

20070012338 - Methods and removers for removing anodized films: A remover contains an alkaline component, a bivalent zinc ion, a ferric ion, a chelating agent, and a nitrate ion. By using this remover, an anodized film can be selectively removed from an aluminum or aluminum-alloy member.... Agent: C. Irvin Mcclelland Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070012339 - Cleaning apparatus, coating and developing apparatus, and cleaning method: A wafer W is held in a horizontal attitude within an airtight container 41 by a vacuum chuck 42 such that small gaps are formed between the wafer W and the inner surfaces of the airtight container 41. A cleaning liquid is supplied toward the center portion of a front... Agent: C. Irvin Mcclelland Oblon, Spivak, Mcclelland, Maier & Neustadt, P.C.

20070012340 - System and method for cleaning or sanitizing items intended for re-use: A system and method for sanitizing or cleaning an item, such as a grocery store shopping cart or a child stroller, for re-use utilizes a passageway having an entrance and an exit and a sanitizing or cleaning station between the entrance and exit. The item is conveyed through the passageway... Agent: Michael E. Mckee Attorney At Law

20070012341 - Supercritical fluid delivery system for semiconductor wafer processing: An elevated pressure and temperature fluid processing system providing a pressurized fluid delivery system including a process fluid supply system and pump for supplying a process fluid at a process pressure, and a process fluid heater for heating the process fluid; a process chamber with a process chamber heater; and... Agent: Maine & Asmus

20070012342 - Apparatus and methods for cleaning combustion systems: The invention provides compositions and methods for more thoroughly cleaning internal combustion engines, fuel systems and emission systems and that operate with reduced toxic emissions. The invention provides an apparatus that contains at least one vessel for receiving a cleaning fluid and an electrode in a cleaning fluid flow path... Agent: Bell, Boyd & Lloyd, LLC

20070012343 - Ultrasonic edge washing apparatus: An edge of a material to be washed is held between forked portions of a vibration transmitting portion. An ultrasonic vibrator is attached to an enlarged portion of the vibration transmitting portion, and the ultrasonic waves supplied from the ultrasonic vibrator irradiate the washing liquid flowing to the forked portion,... Agent: Richard M. Goldberg

20070006892 - Uniform, far-field megasonic cleaning method and apparatus: A method and apparatus for megasonic cleaning of substrates by placing the wafers in the far-field megasonic zone to eliminate sonic-induced damage to highly sensitive small-scale device structures that occurs in the near-field megasonic zone. Folded acoustic beam paths are defined by at least one reflector to achieve sufficient path... Agent: Harris Zimmerman Law Offices Of Harris Zimmerman

20070006893 - Free radical initiator in remote plasma chamber clean: This invention relates to an improvement in the remote plasma cleaning of CVD process chambers and equipment from unwanted deposition byproducts formed on the walls, surfaces, etc. of such deposition process chambers and equipment. The improvement in the remote cleaning process resides in providing a free radical initiator downstream of... Agent: Air Products And Chemicals, Inc. Patent Department

20070006894 - Process solutions containing surfactants used as post-chemical mechanical planarization treatment: Process solutions comprising one or more surfactants are used to reduce the number of defects in the manufacture of semiconductor devices. In certain preferred embodiments, the process solution of the present invention may reduce defects when employed as a rinse solution either during or after the development of the CMP... Agent: Air Products And Chemicals, Inc. Patent Department

20070006895 - Substrate cleaning brush, and substrate treatment apparatus and substrate treatment method using the same: An inventive substrate cleaning brush includes a peripheral surface cleaning portion, and a marginal area cleaning portion connected to the peripheral surface cleaning portion. The peripheral surface cleaning portion has a peripheral surface cleaning surface to be pressed against a peripheral surface of a substrate. The marginal area cleaning portion... Agent: Ostrolenk Faber Gerb & Soffen

20070006896 - Automatic cleaning device for metal mask, and control method thereof: An automatic cleaning device for a metal mask and a control method thereof are provided. The device includes a temperature controller for maintaining and increasing a temperature of cleaning solution; a first cleaner for keeping, circulating and spraying the cleaning solution mixable with water, and cleaning a metal mask; a... Agent: Park Law Firm

20070006898 - Dishwasher and method of controlling the same: A dishwasher includes a drying fan formed on a side of the door to suck wet-vapor existing in a tub, a fan driving motor for rotating the drying fan, a sump formed on a bottom of the tube to reserve washing water, a drain motor for draining the washing water... Agent: Song K. Jung Mckenna Long & Aldridge LLP

20070006897 - Paint washing apparatus: A paint washing apparatus for washing paint equipment includes a holder for holding one or more pieces of paint equipment to be washed. There is also provided a container for collecting wash water and in which a flocculant can be provided to flocculate paint in the wash water. In addition,... Agent: Streets & Steele

20070006899 - Dishwasher and method of controlling the same: A dishwasher is provided. The dishwasher includes a control unit for controlling an operation of the dishwasher, a washing motor for pumping out washing water reserved in a sump according to a control signal from the control unit, and a fluid passage switching valve providing a flow path for the... Agent: Song K. Jung Mckenna Long & Aldridge LLP

20070006900 - Method and device for cleaning a beverage conduit in a dispensing system: A method and a device are used for cleaning a beverage conduit (5) in a dispensing system. The beverage conduit (5) is filled with a cleaning agent. A parameter (UM) representing the cleaning condition of the beverage conduit (5) is measured during the cleaning of said beverage conduit (5), and... Agent: Harness, Dickey & Pierce, P.L.C

20070006901 - Dishwasher and method of controlling the same: A dishwasher is provided. The dishwasher includes a tub defining a washing chamber, a lower nozzle formed in the tube to spray washing nozzle, an upper nozzle formed in the tube above the lower nozzle, a key input unit for inputting one of a lower nozzle washing course and a... Agent: Song K. Jung Mckenna Long & Aldridge LLP

20070006902 - Fixture for optical elements for use in cleaning processes: A fixture for optical elements includes a washing bar, a holder and a vacuum pump. The washing bar includes an inner channel and a connecting portion in communication with the inner channel. A hole is formed in the washing bar for communicating with the inner channel. The holder connects with... Agent: PCe Industry, Inc. Att. Cheng-ju Chiang Jeffrey T. Knapp

20070006903 - Crockery basket for a dishwasher machine, comprising an intensive washing zone: A dishwasher apparatus includes a dish rack having a wire member, and a feed tube for a spray arm rotatably disposed beneath the dish rack. An intensive washing zone is provided in a region of the dish rack, the intensive washing zone including a rod-shaped pipe element attached to the... Agent: Darby & Darby P.C.

20070006904 - Substrate cleaning system and substrate cleaning method: A substrate cleaning system that cleans a glass substrate by supplying liquid and gas to spray nozzles and by spraying fluid, where the liquid and the gas are mixed in the spray nozzles, onto the substrate in order to effectively remove foreign objects attached on the end surface of substrate... Agent: Birch Stewart Kolasch & Birch

20070000517 - Control of the ph in washwater recovery system for a glass forming line: A neutralization system for controlling the pH of the washwater used to clean and maintain polyacrylic bound glass forming equipment is provided. The neutralization system introduces a base solution to a washwater solution when the pH of the washwater solution contained in a closed loop washwater recovery system and in... Agent: Owens Corning

20070000516 - Device and method for cleaning the edges of substrates: A device and method for cleaning the edges of substrates, including at least one cleaning head for receiving at least one nozzle element for supplying medium to a substrate. Formed in a main body of the cleaning head are a medium-suctioning port and an adjoining medium-suctioning duct. The cleaning head... Agent: Roberts W. Becker & Associates

20070000518 - Method for removing material from semiconductor wafer and apparatus for performing the same: A pressure is maintained within a volume within which a semiconductor wafer resides at a pressure that is sufficient to maintain a liquid state of a precursor fluid to a non-Newtonian fluid. The precursor fluid is disposed proximate to a material to be removed from the semiconductor wafer while maintaining... Agent: Martine Penilla & Gencarella, LLP

20070000519 - Removal of residues for low-k dielectric materials in wafer processing: A method of removing post-etch residue from a patterned low-k dielectric layer is disclosed. The low-k dielectric layer preferably comprises a porous silicon oxide-based material with the post-etch residue thereon. The post-etch residue is a polymer, a polymer contaminated with an inorganic material, an anti-reflective coating and/or a combination thereof.... Agent: Haverstock & Owens LLP

20070000520 - Motor vehicle with exhaust purification: A method of cleaning a filter during operation of a vehicle, having an internal combustion engine, which during operation sends exhaust to an exhaust system including the filter, and a transmission drivable by the engine. The method is characterized by the step of selecting a gear ration in the vehicle... Agent: Young & Thompson

20070000521 - System and method for mid-pressure dense phase gas and ultrasonic cleaning: Workpieces are loaded into a cleaning chamber. The cleaning chamber is pressurized with a first dense-phase cleaning fluid, the temperature and pressure of the first dense-phase fluid being maintained at less than about 1500 psi using a temperature control device. The workpieces are soaked in the first dense-phase fluid for... Agent: Morgan, Lewis & Bockius, LLP.

20070000522 - Container handling machine: A container treatment machine having a frame, a table top inclined to the horizontal being attached to the topside so that at least one collecting opening for fluids, container fragments or similar foreign bodies is formed in the table top, and the areas of the table top connected to the... Agent: Marshall, Gerstein & Borun LLP

20070000523 - Cleaning composition and related methods: A cleaning composition is disclosed. The cleaning composition comprises about 80 to 99.8999 percent by weight of an ammonium fluoride aqueous solution, about 0.1 to 5 percent by weight of a buffering agent, and about 0.0001 to 15 percent by weight of a corrosion-inhibiting agent. A method of preparing the... Agent: Volentine Francos, & Whitt PLLC

20070000524 - Substrate processing apparatus and substrate processing method: Carbon dioxide is dissolved in deionized water by the application of pressure to generate a carbon-dioxide-dissolved rinse. Substrates are immersed in a processing bath which retains the carbon-dioxide-dissolved rinse, and then lifted out of the processing bath in a chamber which is in an atmosphere of an IPA gas for... Agent: Ostrolenk Faber Gerb & Soffen

20070000525 - Filter system for a household dishwasher: This invention relates to a filter system for a household dishwasher comprising a wash space and a liquid circuit that comprises a coarse sieve (33) and one or several fine filters (18, 19). The coarse sieve (33) is movable between at least two positions with the aid of means (29,... Agent: Pearne & Gordon LLP

20070000526 - Portable vehicle underbody washing system: A portable washing device to be used to wash vehicles, consisting of a water supply tank (1), a gravity-flow supply hose (2) leading to a pressurizing pump (3), the pressurizing pump, a distribution hose (4), an underbody washer mechanism (5) of booms (6), rollers (7), and spray nozzles (8) and... Agent: R. Stephen Hansell

20070000527 - Workpiece support for use in a process vessel and system for treating microelectronic workpieces: A workpiece support apparatus for use in a process vessel and process system for treating semiconductor workpieces. The process vessel is to be utilized in an integrated tool for wet chemical treatment of a semiconductor workpiece. The workpiece support apparatus includes a rotor having a central cavity and guide pins... Agent: Wallenstein & Wagner, Ltd.

20070000528 - Nozzle and method for washing gas turbine compressors: A nozzle (54) for cleaning a gas turbine unit (1) during operation. The invention further relates to a method for washing a gas turbine unit (1) during operation. The nozzle (54) is arranged to atomize a wash liquid in the air stream in an air intake (2) of the gas... Agent: Coats & Bennett, PLLC