Cleaning and liquid contact with solids inventions 10/06

20060237029 - Method for treating a body of a polluted porous medium: A method for treating a body of a polluted porous medium, includes the steps of: preparing a reactive solution containing nanoparticles; injecting the reactive solution into the body of the polluted porous medium so as to decompose pollutants in the polluted porous medium by reacting the nanoparticles with the pollutants;...

20060237030 - Method and apparatus for cleaning and surface conditioning objects with plasma: A method and apparatus for cleaning and surface conditioning objects using plasma are disclosed. An embodiment of the method discloses providing a plurality of elongated dielectric barrier members, the members having inner electrodes connected therein, providing a plurality of blocking members within predetermined gaps between the elongated dielectric barrier members,...

20060237031 - Apparatus and method for treating substrate: In an embodiment, an apparatus and method for cleaning a wafer include a container containing deionized water, and a cover opening/closing an opened upper portion of the container. A nozzle is installed in the cover to spray the deionized water to a space defined by the cover. A first electrode...

20060237033 - Cleaning apparatus and method: In an embodiment, a cleaning apparatus and method can prevent adsorption of nano-size particles by wafers. The apparatus includes a cleaning chamber for filling with a cleaning solution for cleaning an object and a drying chamber disposed over the cleaning chamber for drying the object by supplying drying fluid from...

20060237032 - Cleaning method for semiconductor elements: A method for cleaning semiconductor elements includes steps of positioning the semiconductor elements; washing the semiconductor elements by high-pressure water steam or solvent steam from front, top and rear sides to blow out soldering flux or oil residue; and repeating washing by steam two or three times. As the steam...

20060237035 - Dishwasher with food particle disposal system: A dishwasher incorporating a food waste disposal system and has a sump formed in its lower portion and a drain pump located in the sump is provided. The drain pump includes a motor driving an impeller and a chopping blade. A fine filter is positioned before the inlet portion of...

20060237034 - Process for recycling components of a pem fuel cell membrane electrode assembly: The membrane electrode assembly (MEA) of a PEM fuel cell is recycled by contacting the MEA with a lower alkyl alcohol solvent which separates the membrane from the anode and cathode layers of the assembly....

20060237036 - Fill level control system for an article cleaning apparatus: A fill level control system for an article cleaning apparatus is provided. The fill level control system uses a sensor array to monitor a plurality of fill level points within, for example, a dishwasher. The level of water for each wash phase is monitored as a function of its height...

20060237037 - Robot cleaner driving method: Disclosed herein is a robot cleaner driving method. The robot cleaner driving method comprises one or more setting steps of setting an imaginary space, including a space to be cleaned, and partitioning the imaginary space into one or more cells, one or more cleaning steps, which are assigned to the...

20060237040 - Cleaning system and method of use: A cleaning apparatus is provided for cleaning an inner surface of a container. A spray head is arranged for operable fluid communication with a fluid pump and has a nozzle configured to disperse liquid in a mist. A mount carries the spray head and is removably supportable on a container...

20060237039 - Pouch cleaner: A device for cleaning an ostomy pouch is provided. The device comprises a waste collector having a wide mouth and a circular aperture in its base, a waste tube, a pedestal and, first and second water sprayers connected to a high pressure water source. An ostomy pouch is hung from...

20060237038 - Process for cleaning filters: Filters used in the beverage industry fouled by polyphenol-protein complexes and carbohydrate polymers can be cleaned by treating the filters either with the following methods:—Solubilisation of at least part of the carbohydrate polymers followed by a treatment of the resulting polyphenol protein complex with an oxidative chemical.—Treatment of the fouled...

20060237041 - Food line cleaner: A food line cleaner (1) including a pressurised water supply, a hose (12) and a nozzle (13) with the nozzle (13) attached and substantially co-linear to the end of the hose (12). Both hose (12) and nozzle (13) are sized to fit within the food line and receive pressurised water...

20060237042 - Rack adjustment mechanism for an article cleaning apparatus: A dishwasher having an adjustable article rack is provided. The dishwasher includes a pair of horizontal slide assemblies attached to opposed sidewalls and a fixed vertically extending member is attached to each slide assembly. A vertically moveable member is attached to each fixed member, the vertically movable member of the...

20060237043 - Method and apparatus for cleaning semiconductor substrates: According to one aspect of the present invention, a method and apparatus for cleaning a semiconductor substrate are provided. The apparatus may include a chamber wall defining a processing chamber having a chamber gas therein, a semiconductor substrate support, and a fluid nozzle within the processing chamber having first and...

20060237044 - Dishwasher with controlled induction motor/pump: A dishwasher having a speed-controlled induction motor coupled to a pump to drive the pump during dishwasher operation. A motor controller is connected to the induction motor to control the speed of operation of the induction motor. A dishwasher controller is connected to the motor controller for sending signals to,...

20060237052 - Computer-controlled system for dishwashers: A method and system for dynamically controlling operation of a dishwasher during a cleaning cycle. The method includes detecting a plurality of conditions in the dishwasher during operation, evaluating the plurality of detected conditions to determine a dynamic control response, and sending a signal representing the dynamic control response to...

20060237050 - Dishwasher collection chamber filter cleaning system: A dishwasher incorporates a primary filter cleaning system for removing food debris from circulated wash water. The dishwasher having a sump formed in the floor of the dishwasher and a wash pump having an inlet in communication with the sump. A collection chamber is formed in the bottom of the...

20060237048 - Dishwasher incorporating a pump prime sensing system for managing a filtration system: A pump priming sensing system for managing a filtration system is provided. The sensing system is capable of monitoring the state of the motor that operates the pump in a dishwasher to determine if the pump is receiving enough water to operate at a normal torque level. A filter is...

20060237045 - Kitchenware washers and methods of manufacturing the same: A kitchenware washing assembly in one embodiment generally includes a tank for holding fluid for washing kitchenware. The tank can include two wall portions, and an outlet positioned on each of the two wall portions. The kitchenware washing assembly can also include at least one inlet and at least two...

20060237046 - Kitchenware washers and methods of manufacturing the same: A kitchenware washing assembly includes a tank for holding fluid for washing kitchenware, and at least one pump. The kitchenware washing assembly can also include at least one outlet chamber for dispensing fluid into the tank, and at least one intake chamber for receiving fluid from the tank. The kitchenware...

20060237047 - Kitchenware washers and methods of manufacturing the same: A kitchenware washing assembly includes at least one wall defining at least a portion of a tank for holding fluid for washing kitchenware. The kitchenware washing assembly also includes at least one pump and at least one chamber in fluid communication with the tank. The kitchenware washing assembly is formed...

20060237049 - Primary filter cleaning system for a dishwasher: A dishwasher incorporates a primary filter cleaning system for removing food debris from circulated wash water. The dishwasher having a sump formed in the bottom and a wash pump having an inlet in communication with the sump. A collection chamber is formed through the bottom of the sump and a...

20060237051 - Utensil holder assembly for a dishwasher: A utensil holder assembly for a dishwasher includes multiple utensil baskets that can be mounted in various different configurations in the dishwasher to provide a consumer with the flexibility to construct diverse arrangements of dishware, cookware, utensils and the like for a washing operation. In a first configuration, two utensil...

20060237053 - Utensil holder for a dishwasher: A utensil holder for use in a dishwasher includes a basket including front, rear, bottom and opposing side walls, as well as an upper opening. The rear wall has a height greater than the front wall. A lid member, having a support surface across which are arrayed a plurality of...

20060237054 - Apparatus and method for washing quartz parts, particularly for process equipment used in semiconductor industries: An apparatus for washing quartz parts, particularly for process equipment used in semiconductor industries, includes a process unit that is suitable to perform washing, a unit for managing washing and rinsing fluids, and a control unit, the units being mutually separate, the process unit having a bell-shaped element that is...

20060237056 - Pressurized apparatus for cleaning objects: A cleaning apparatus includes a working housing for receiving objects to be cleaned, a receptacle for supplying a pressurized fluid to the working housing, and a pump for pumping the pressurized fluid into the working housing, for removing releasing agents or solutions from the objects. A control valve is coupled...

20060237055 - Pressurized facility for cleaning objects: A cleaning facility includes a working housing for receiving objects to be cleaned, a receptacle for supplying a pressurized fluid to the working housing, and a pump for pumping the pressurized fluid into the working housing, and thus into the perforations of the objects, for removing containments from the objects....

20060231119 - Apparatus and method for cleaning a substrate: An apparatus and method for cleaning a wafer are provided. According to various embodiments, deionized water can be activated by forming an electric field in a supply member through which the deionized water is supplied. The activated deionized water preferably contains radicals with excellent reactivity, in addition to ions. The...

20060231118 - Tape cleaning device and tape cleaning method: Disclosed is a tape cleaning device and tape cleaning method which can improve tape cleaning efficiency. The tape cleaning device includes a cleaning section structured in such a way so as to hold dipping water in a dipping tank, in which second and third guide rollers are dipped to dip...

20060231120 - Flexible cleaning tool with replaceable non-woven pad: A flexible cleaning tool (22) is disclosed. The cleaning tool (22) includes a handle (24) connected to an elongated flexible support member (26) that includes a plurality of discrete, rotatably interconnected segments (40). A cleaning pad (28) encloses the support rod (26)....

20060231121 - Low pressure injection module and method for low pressure injection cleaning with residual dirt analysis of components: A method for low-pressure spray cleaning and residual contaminant analysis of components includes providing a receiver tank filled with flushing medium, pressurizing the receiver tank with compressed air on the inlet side, transmitting the pressurized flushing medium to a spray lance, spray cleaning a component by spraying the flushing medium...

20060231122 - Dishwasher with counter-convection air flow: A dishwasher provides forced air flow in a counter-convectional direction so as to exhaust air out of a bottom portion of the washing volume in contrast to normal convective air flow....

20060231123 - Method for removing a layer area of a component: Prior art methods for removing a layer area of a component (stripping) lead to poor results since a removal, for example, ensues in a nonuniform manner. In addition, these prior art methods are time intensive. An inventive method for removing a layer area of a component consists of firstly treating...

20060231124 - Substrate processing method: Provided is a processing method capable of reliably processing the inside of a depression such as a trench, a contact hole, a deep pattern, or a pore of a porous substrate. A chemical solution M is supplied into a processing bath 1 placing a substrate W, and the processing bath...

20060231125 - Apparatus and method for cleaning a semiconductor wafer: A cleaning apparatus is provided comprising a process chamber defining a work space, a supporter apparatus for rotating a wafer, the supporter apparatus being located in the work space and the wafer being mounted on the supporter apparatus such that a processing surface of the wafer is upwardly facing, an...

20060231126 - Electrical sensor device for the level of the washing water in a washing machine, in particular in a dish-washing machine: The device comprises at least one electrical air pressure threshold sensor, with a body which has an inlet connector; a support structure intended to be fixed in the machine, and to which the body of the pressure sensor is fixed; and at least one duct having one end coupled to...

20060231127 - Spin scrubber apparatus: A spin scrubber apparatus has an index unit configured to support one or more cassettes, a processing unit having one or more cleaning stations facing the index unit across a transfer space, and a substrate transfer device disposed in the transfer space for transferring substrates one-by-one between the index unit...

20060225767 - Method and apparatus for cleaning a cvd chamber: The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from a reaction volume of the chamber. In one embodiment, a source of RF power is coupled to...

20060225768 - Directional control for dual brush robotic pool cleaners: A self-propelled robotic pool cleaner (100) has a first pair of driven brushes (12, 14) and second pair of free brushes co-axially mounted for rotation on axles (16) at the opposite ends of the pool cleaner that are transverse to the direction of movement. The first pair of brushes are...

20060225769 - Isothermal control of a process chamber: An apparatus for use in providing a fluid at a predetermined temperature is disclosed. The apparatus comprises: means for supplying a first quantity of a fluid at a first temperature; means for supplying a second quantity of a fluid at a second temperature; and flow-control means for controlling a ratio...

20060225770 - Pyrolysis methods and ovens therefor: Pyrolysis methods for disassociating an organic mass, or coating from an article, by placing the article in an air tight processing chamber, circulating a gaseous mixture of ambient air and at least 40% water vapor from an opening, through the processing chamber and out of an exhaust port, and maintaining...

20060225771 - Method and apparatus for cleaning percolation basins: A method and apparatus for cleaning accumulated silt from the floor of a percolation basin are provided. An underwater terrain vehicle (UTV) moves along the basin floor and carries a series of blades that cut and lift the accumulated silt. An eductor driven vacuum head also carried by the UTV...

20060225772 - Controlled pressure differential in a high-pressure processing chamber: A method and apparatus for controlling a pressure differential in a high pressure processing chamber are disclosed. The pressure differential is related to a difference between a pressure generated within the high pressure processing chamber and a sealing force for maintaining the high-pressure processing chamber. By maintaining the pressure differential...

20060219257 - Cleaning device and cleaning method: The invention provides a cleaning device for cleaning or rinsing a wafer disposed in a cleaning bath by cleaning fluid in the cleaning bath including a front wall that configures the cleaning bath by being in abutment with a device body and is formed with an opening corresponding to a...

20060219259 - Method of cleaning a semiconductor wafer: A method of cleaning a semiconductor wafer, including the steps of supplying a mixed solution of a dilute hydrofluoric acid solution and hydrogen peroxide solution to a bath; loading the semiconductor wafer into the bath such that the semiconductor wafer is dipped into the mixed solution, and rinsing the semiconductor...

20060219258 - Methods for rinsing microelectronic substrates utilizing cool rinse fluid within a gas enviroment including a drying enhancement substance: Rinsing and drying a surface of a microelectronic device and the enhanced removal of rinse fluid from the surface of the microelectronic device while the microelectronic device is rotated is provided as part of a spray processing operation. Rinse fluid is generally directed to the surface of the microelectronic device...

20060219260 - Substrate treatment apparatus and substrate treatment method: A substrate treatment apparatus includes a substrate holding mechanism which holds a substrate, a scrub brush for scrubbing a surface of the substrate held by the substrate holding mechanism to remove foreign matter from the substrate surface, a treatment liquid supplying mechanism which supplies an alkaline treatment liquid to the...

20060219261 - Monitoring of cleaning process: A method for monitoring a cleaning process for a medical instrument, includes the steps of placing the instrument in a cleaning chamber; placing a soil standard in the cleaning chamber; cleaning the instrument and the soil standard with a cleaning solution; and detecting whether soil remains on said soil standard....

20060219262 - Water fill level control for dishwasher and associated method: A control device and method for detecting and controlling a water fill level in a dishwasher or other similar appliance that includes a pump motor is provided. The control monitors the pump motor current over time, determines a current change, and compares the current change to a threshold current change...

20060219263 - System and method for cleaning, disinfection, sterilization, and decontamination: A system and method for cleansing, including cleaning, disinfection, sterilization and decontamination comprises apparatus for generating and issuing superheated vapor including at least one (1) sterilant, the liquid from which the superheated vapor is generated comprising solution of sterilant and in some applications at least one anticorrosive and includes control...

20060219264 - Substrate processing apparatus and substrate processing method: An on-off valve 81 is opened during rinsing, whereby a part of DIW supplied to a processing liquid supply section 43 is guided into inside a suction pipe 82. After rinsing, a puddle is formed between a lower cleaning nozzle 29 and the bottom surface of a wafer. As the...

20060219265 - Actuator for an aerosol can device: Provided is an actuator for use with an aerosol can drain clearing device that removes a drain blockage with pressurized gas contained in the aerosol can. The actuator includes an actuator piece with an actuator dome having a dome aperture therethrough and at least one sidewall that circumscribes the dome...

20060219266 - On-line heat exchanger cleaning method: A method for the on-line cleaning of a heat exchanger used with petroleum process fluids which create coke deposits of asphaltenic origin on the exchanger tubes. The asphaltenes are removed by re-dissolution in a solvent oil of high solubility power for the asphaltenes. Certain asphaltenic crudes are useful as solvents...

20060219267 - System, method and apparatus for self-cleaning dry etch: A method for cleaning a processing chamber that includes heating an inner surface of the processing chamber to a first temperature. The first temperature can be sufficient to cause a first species to become volatile. The first species can be one of several species deposited on the inner surface. A...

20060219268 - Neutralization of systemic poisoning in wafer processing: A method for the pre-treatment of a wafer that has been treated to an ammonia plasma. The pre-treatment can neutralize the poisoning effects caused by the ammonia plasma, which can prevent proper etching in subsequent steps....

20060219270 - Method for cleaning and transporting rubber stoppers and apparatus for cleaning and transporting rubber stoppers: A method for cleaning and transporting rubber stoppers includes the steps of ejecting pressurized water, fed from a water storage division, from a jet nozzle to form a jet stream flowing into a negative pressure-creating pipe for suction to create a negative pressure inside the negative pressure-creating pipe; transporting rubber...

20060219269 - Mobile on-wing engine washing and water reclamation system: A system for on-wing engine washing and water reclamation is provided. The system has at least one spray device for introducing a cleaning liquid containing at least water into the engine while the engine is being operated, and an effluent trough for collecting the cleaning liquid from an exit end...

20060219272 - Dishwasher and assembly method thereof: A dishwasher and assembly method thereof are disclosed, by which an overall height of the dishwasher is reduced, by which water can stably flow and by which assembly efficiency can be enhanced. The present invention includes a sump accommodating water therein and a wash pump assembled to the sump in...

20060219271 - Dishwasher utensil rack and utensil basket therefor: An automatic dishwasher comprises an open-faced cabinet defining a wash chamber and a utensil rack mounted within the wash chamber. The utensil rack comprises a frame mounted to the cabinet and a basket removably mounted to the frame, and the frame and the basket are configured such that the basket...

20060219273 - Substrate processing apparatus: In a solution change processing which comprises: changing a processing solution stored in a processing bath, specifically deionized water for sulfuric acid; and controlling the temperature of sulfuric acid so changed to a predetermined temperature, first, deionized water is discharged from a processing bath and an external bath. Subsequently, sulfuric...

20060219274 - Substrate processing apparatus: A dry-air supplying duct and a dry-air exhaust duct are opposite each other across a processing tank. Inside the dry-air supplying duct, a plurality of ventilation guides are provided that extend horizontally by a predetermined length from an end of the dry-air supplying duct, and a plurality of ventilation paths...

20060219275 - Device for cleaning wafers after a cmp process: An apparatus for cleaning wafers using the CMP process includes a transport device of a feeding station at the beginning of a cleaning line which has a plurality of transport rollers disposed and driven transversely to the direction of transport. The cleaning line transports polished wafers to a main cleaning...

20060219276 - Improved method to separate and recover oil and plastic from plastic contaminated with oil: A method for removing contaminants from synthetic resin material containers using a first organic solvent system and a second carbon dioxide system. The organic solvent is utilized for removing the contaminants from the synthetic resin material and the carbon dioxide is used to separate any residual organic solvent from the...

20060219277 - Substrate-treating apparatus: According to this invention, a bracket 10 which is hoisted or lowered by a hoisting/lowering device 15 is provided with a treating tool 3 for carrying out the treatment such as cleaning for the surface of a substrate in contact with the surface under a prescribed pressure therefor, an operating...