Cleaning and liquid contact with solids inventions 09/06

20060207629 - Method and apparatus for an in-situ ultraviolet cleaning tool: The present invention provides an apparatus and a method for an ultraviolet cleaning tool. The cleaning tool includes ultraviolet source spaced apart from a surface having contaminant particles. The ultraviolet source can create ozone between the surface and the ultraviolet source which breaks the chemical bonds between particles and the...

20060207630 - Device for cleaning cvd device and method of cleaning cvd device: An apparatus for cleaning a CVD apparatus that can efficiently remove a by-product such as SiO2 or Si3N4 stuck and deposited onto the surface of an internal wall, an electrode, or the like in a reaction chamber in a film forming process, and a method for cleaning a CVD apparatus....

20060207631 - Apparatus and method of cleaning a sustrate: A cleaning apparatus is provided with a processing bath to be filled with a cleaning chemical, an ultrasonic oscillator, and a retainer for holding a substrate to be immersed into a cleaning chemical. The front surface of the substrate is cleaned while ultrasonic waves are radiated from the ultrasonic oscillator...

20060207632 - Dishwasher and controlling method thereof: A dishwasher is provided. The dishwasher includes a sump, a wash motor, a disposer, a screen filter, and a drain motor. The sump stores wash liquid. The wash motor pumps the wash liquid stored in the sump. The disposer is installed inside the sump and connected to the wash motor...

20060207633 - Device and method for cleaning photomask: Disclosed herein is a device and a method of cleaning a photomask, which prevents haze from being generated on a surface of the photomask during a photolithography process. The photomask is heat treated to remove residual ions on a surface thereof and to induce curing and oxidation of Cr and...

20060207634 - Methods and apparatus for maintaining a fluid level in a tank: In a first aspect, a method is provided that includes the steps of (1) providing a tank having a volume of fluid filled to a level; (2) inserting a substrate into the tank; (3) displacing fluid in the tank due to a volume of the substrate; and (4) adjusting the...

20060207635 - Barrier polishing fluid: The polishing fluid is useful for polishing tantalum-containing barrier materials of a semiconductor substrate. The polishing fluid includes a nitrogen-containing compound having at least two nitrogen atoms comprising imine compounds and hydrazine compounds. The nitrogen-containing compound is free of electron-withdrawing substituents; and the polishing fluid is capable of removing the...

20060207636 - Multi-menisci processing apparatus: A substrate preparation apparatus is provided. The apparatus includes a housing configured to be installed in a substrate fabrication facility. The housing includes a manifold for use in preparing a wafer surface. The manifold is configured to include a first process window in a first portion of the manifold. A...

20060201532 - Semiconductor substrate cleaning system: In a first aspect, a method is provided for cleaning a substrate without scrubbing the substrate. Two different megasonic frequencies are applied to the substrate. Preferably two different fluids, each having a different ph, are used to apply the two different megasonic frequencies. Numerous other aspects are provided....

20060201533 - Cvd apparatus and method for cleaning cvd apparatus: There is provided a CVD apparatus capable of efficiently removing a by-product such as SiO2 or Si3N4 which is stuck and deposited onto the surface of an internal wall, an electrode or the like in a CVD chamber in a film forming process, and furthermore, executing cleaning having a small...

20060201534 - Method and apparatus for cleaning and surface conditioning objects using plasma: An apparatus and method for cleaning objects using plasma are disclosed. The apparatus provides a plurality of elongated dielectric barrier members arranged adjacent each other, a plurality of electrodes each contained within, and extending substantially along the length of, the plurality of elongated dielectric barrier members, and at least one...

20060201535 - Photolithographic stepper and/or scanner machines including cleaning devices and methods of cleaning photolithographic stepper and/or scanner machines: Stepper and/or scanner machines including cleaning devices and methods for cleaning stepper and/or scanner machines are disclosed herein. In one embodiment, a stepper and/or scanner machine includes a housing, an illuminator, a lens, a workpiece support, a cleaning device for removing contaminants from the workpiece support, and a stage carrying...

20060201536 - Method for cleaning an industrial part: A method for cleaning an industrial part, such as crankshafts, engine blocks and the like, following a manufacturing operation after which manufacturing debris, such as oils, shavings, and/or foundry sand, are present on the part. The part is first spun at a speed and for a time period sufficient to...

20060201537 - Method for cleaning articles in a dish washing machine: The invention concerns a method for cleaning articles in a dish washing machine comprising an alkaline and an acidic cleaning step and at least one additional alkaline cleaning step, characterized in that a) in a hood dish washing machine there is a first alkaline cleaning step with an aqueous cleaning...

20060201538 - Fill control system for an in sink dishwasher: A dish-cleaning appliance comprising a sink having a bowl defining a wash chamber with an open top for providing access to the wash chamber. A liquid recirculation system is provided for spraying liquid throughout the wash chamber. A drain conduit can be provided, alone or in combination with the recirculation...

20060201539 - Method and apparatus for cleaning and sealing display packages: A method and apparatus for cleaning and sealing components of a display utilizes continuous isolation of the components between the cleaning step and the sealing step. This limits exposure of the components to contaminants and isolates the components from oxidizing agents which can cause an oxide to form on the...

20060201540 - Photolithographic stepper and/or scanner machines including cleaning devices and methods of cleaning photolithographic stepper and/or scanner machines: Stepper and/or scanner machines including cleaning devices and methods for cleaning stepper and/or scanner machines are disclosed herein. In one embodiment, a stepper and/or scanner machine includes a housing, an illuminator, a lens, a workpiece support, a cleaning device for removing contaminants from the workpiece support, and a stage carrying...

20060201541 - Cleaning-drying apparatus and cleaning-drying method: It is an object to provide a semiconductor manufacturing apparatus provided with an apparatus performing a cleaning-drying process without a defect due to static electricity or the like, in a manufacturing process of a semiconductor device. One of features is that an ionizer included in a sheath is provided in...

20060196525 - Method for removing a residue from a chamber: A method for removing a residue from a surface is disclosed herein. In one aspect, the method includes: providing a chamber containing the surface coated with the residue; providing in the chamber a cleaning composition of an oxidizing gas and optionally an organic species; and irradiating the cleaning composition with...

20060196527 - Method of surface processing substrate, method of cleaning substrate, and programs for implementing the methods: A method of surface processing a substrate that enables deposit to be removed from a substrate so as to obtain a clean substrate. A substrate is cleaned with a liquid chemical. A deposit which is formed through the cleaning with liquid chemical is exposed to an atmosphere of a mixed...

20060196526 - Methods of spin-on wafer cleaning: A method for spin-on wafer cleaning. The method comprises controlling spin speed and vertical water jet pressure. The vertical jet pressure and the spin speed are substantially maintained in inverse proportion. Wafer spin speed is between 50 to 1200 rpm. Vertical wafer jet pressure is between 0.05 to 100 KPa....

20060196528 - Apparatus and method for washing pots and pans: A sink having a front wall, a rear wall, an opposed pair of sidewalls, and vertically-extending corner sections connecting the front and rear walls to the sidewalls. A pump circulates cleaning fluid withdrawn from the sink to at least one nozzle located in each corner section of the sink to...

20060196529 - Chemical concentration controller and recorder: A chemical concentration controller and recorder is disclosed for controlling and recording chemical concentrations in a cleaning system. The invention allows a user to control the concentration of two or more chemicals in the cleaning system simultaneously using either concentration-based feed or timed feed. The invention records and archives chemical...

20060196530 - Novel semiconductor wafer lifter: A novel semiconductor wafer lifter is disclosed for handling wafers during wet bench processing. In particular, the lifter has a plurality of holes formed in its vertical support surface to allow cleaning or rinsing fluid to flow through the vertical support instead of around its sides. These holes facilitates a...

20060196531 - Substrate processing apparatus: A substrate processing apparatus includes a substrate processing part 46 for processing a substrate by a processing liquid and a processing-liquid recovery path 137 allowing of a passage of the processing liquid discharged from the substrate processing part 46. The processing-liquid recovery path 137 is provided with foreign substance removal...

20060196525 - Method for removing a residue from a chamber: A method for removing a residue from a surface is disclosed herein. In one aspect, the method includes: providing a chamber containing the surface coated with the residue; providing in the chamber a cleaning composition of an oxidizing gas and optionally an organic species; and irradiating the cleaning composition with...

20060196527 - Method of surface processing substrate, method of cleaning substrate, and programs for implementing the methods: A method of surface processing a substrate that enables deposit to be removed from a substrate so as to obtain a clean substrate. A substrate is cleaned with a liquid chemical. A deposit which is formed through the cleaning with liquid chemical is exposed to an atmosphere of a mixed...

20060196526 - Methods of spin-on wafer cleaning: A method for spin-on wafer cleaning. The method comprises controlling spin speed and vertical water jet pressure. The vertical jet pressure and the spin speed are substantially maintained in inverse proportion. Wafer spin speed is between 50 to 1200 rpm. Vertical wafer jet pressure is between 0.05 to 100 KPa....

20060196528 - Apparatus and method for washing pots and pans: A sink having a front wall, a rear wall, an opposed pair of sidewalls, and vertically-extending corner sections connecting the front and rear walls to the sidewalls. A pump circulates cleaning fluid withdrawn from the sink to at least one nozzle located in each corner section of the sink to...

20060196529 - Chemical concentration controller and recorder: A chemical concentration controller and recorder is disclosed for controlling and recording chemical concentrations in a cleaning system. The invention allows a user to control the concentration of two or more chemicals in the cleaning system simultaneously using either concentration-based feed or timed feed. The invention records and archives chemical...

20060196530 - Novel semiconductor wafer lifter: A novel semiconductor wafer lifter is disclosed for handling wafers during wet bench processing. In particular, the lifter has a plurality of holes formed in its vertical support surface to allow cleaning or rinsing fluid to flow through the vertical support instead of around its sides. These holes facilitates a...

20060196531 - Substrate processing apparatus: A substrate processing apparatus includes a substrate processing part 46 for processing a substrate by a processing liquid and a processing-liquid recovery path 137 allowing of a passage of the processing liquid discharged from the substrate processing part 46. The processing-liquid recovery path 137 is provided with foreign substance removal...