Cleaning and liquid contact with solids inventions 08/06

20060191555 - Method of cleaning etching apparatus: To provide a cleaning method for an etching apparatus for a metal film that efficiently removes an etching residue deposited in an etching process chamber, assures the reproducibility of the etching performance, and keeps the etching process chamber in a low-dust-emission condition. Each time one workpiece with a metal film...

20060191556 - Substrate processing apparatus and substrate processing method: In a substrate processing apparatus (1), a ring-shaped cover part (61) opposed to an annular surface (51a) of a rotating part (51) is provided and the rotating part (51) rotates the substrate (9) while holding the substrate (9). An exhaust flow space (64) connecting with a gap space (62) between...

20060191557 - Cleaning implement: A single layer cleaning pad is provided for cleaning a surface without separate application of a cleaning solution. The pad can be removably attached to a cleaning instrument for ease of use. Prior to use, the pad is stored in a vessel so that the pad is saturated with cleaning...

20060191558 - Method for cleaning the pipes of a heat exchanger by use of an abrasive and device suitable for this method: A method for cleaning pipes of a heat exchanger includes placing a throttle-free jet nozzle against an end of a pipe. The throttle-free jet nozzle has an outlet opening of a same size or slightly smaller than an inner cross-sectional area of the pipe. A stream of air containing an...

20060191559 - Pipeline cleaning apparatus: A cleaning apparatus useful for cleaning the interior of a pipeline contains: (A) a platform of a dimension sufficient to be inserted through an opening in the pipeline, the platform containing one or more portions; (B) a fluid interruptor having one or more parts to provide a surface to contact...

20060191560 - Substrate brush scrubbing and proximity cleaning-drying sequence using compatible chemistries, and method, apparatus, and system for implementing the same: In one embodiment, a substrate preparation system is provided. The system includes a brush, a front head, and a back head. The brush is configured to brush scrub a back surface of a substrate using a brush scrubbing chemistry. The front head is defined in close proximity to a front...

20060191561 - Undercarriage washer for self-serve car wash bay: An undercarriage carwash system for use in a self-serve carwash bay includes a housing, a conduit with a plurality of nozzles, and a control. The bay has a support surface at which a vehicle is parked during the washing of the vehicle, and has a pressurized fluid system for discharging...

20060191562 - Ultrasonic washing device: In an ultrasonic washer for washing by splaying washing toward an object to be washed or a portion to be washed from a front end of a nozzle, a part of an ultrasonic wave propagation member connected to an ultrasonic transducer is protruded into a cavity of the nozzle into...

20060185688 - Semiconductor wafer cleaning method and wafer cleaned by same method: A semiconductor wafer cleaning method has steps of cleaning a surface of a semiconductor wafer with a cleaning solution that has an etching function; and cleaning the surface of the semiconductor wafer with a high-purity organic solvent while circulating the high-purity organic solvent so as to remove Ca and Mg...

20060185689 - Transportable holding tank for stripe removal system: A transportable holding tank for containing clean water and for accepting waste from a stripe removal system. The holding tank is carried on a flatbed vehicle and requires less deck space, thus effectively increasing the cargo-carrying capacity of the vehicle compared with that available if the vehicle were carrying a...

20060185690 - Automatic cleaning apparatus: An automatic cleaning apparatus has a cleaner body having at least one driving wheel, and in certain disclosed embodiments, a vapor spray means installed in the cleaner body for generating water vapor during operation, and spraying the generated water vapor toward a lower part of the cleaner body....

20060185691 - Method and system for cleaning heat exchanger tube bundles: A method and system utilizing a mobile cleaning unit for providing cleaning of heat exchanger tube bundles. The mobile cleaning unit utilizes a pressurized seal positioned about top door of the cleaning enclosure to provide a fluid and vapor lock of the cleaning enclosure. An oxygen purging system of the...

20060185692 - Method and apparatus for cleaning articles used in the production of semiconductors: An apparatus and a method serve for cleaning articles used in the production of semiconductors, such as wafers, containers for transporting wafers (known as FOUPs), LCD substrates and photomasks. The articles are cleaned in a treatment chamber by means of a liquid and subsequently dried. A drying gas, such as...

20060185693 - Cleaning step in supercritical processing: An apparatus for removing a residue from a surface of an object located on a support region within a processing chamber is disclosed. The apparatus comprises means for performing a dual-pressure cleaning process and means for performing a rinsing process. The means for performing a dual-pressure cleaning process comprises: means...

20060185694 - Rinsing step in supercritical processing: An apparatus for removing a residue from a surface of an object located on a support region within a processing chamber is disclosed. The apparatus comprises means for performing a dual-pressure rinsing process and means for performing a series of decompression cycles. The means for performing a dual-pressure rinsing process...

20060185695 - Method and apparatus for cleaning semiconductor wafer: A wafer is placed on a rotatable stage to clean an upper surface of the wafer with a cleaning liquid while the stage and wafer are rotating. A cup-shaped cover is provided over the upper surface of the wafer. A frame portion of the cover is brought into close contact...

20060185696 - Substrate cleaning apparatus: An inexpensive cleaning apparatus capable of exerting cleaning power on a side surface of a substrate at the same level as on a main surface thereof, and capable of changing an angle of a jetting device during cleaning without so changing a jet distance. The apparatus 1 comprise a table...

20060185697 - Method of cleaning a washing machine or a dishwasher: A method of cleaning the interior surfaces of a non-loaded washing machine or a non-loaded automatic dishwasher with a liquid composition, by forming in said washing machine or automatic dishwasher an aqueous liquor comprising water and said liquid composition, wherein said liquid composition comprises an acid system comprising formic acid...

20060185698 - Holding device for glasses: The present invention provides a holding device for glasses for use in a dishwasher, having a base plate (1) with holding recesses (2) for receiving stems of glasses and which can be positioned by means of carrier rods (10) in a distance to a basket for dishes. The base plate...

20060185699 - Dishwasher, and door hinge for the same: A dishwasher and a door hinge thereof are provided. The dishwasher and the door hinge include a door cover support plate that aligns a position of a door cover during assembly of the door cover and a door liner....

20060185700 - Dishwasher, and gasket for the same: A dishwasher and a gasket for the dishwasher are provided. The dishwasher and the gasket include a gasket body forming a hole through which a guide pin and a guide sleeve insert, and a packing member that seals a gap between the gasket body and the guide sleeve in order...

20060180172 - Enhanced megasonic based clean using an alternative cleaning chemistry: The present invention relates to the use of a C1 to C5 alcohol during the cleaning step. With the use of said alcohol, the surface tension of the solution is reduced which allows the application of reduced megasonic power with increased cleaning efficiency....

20060180173 - System and method for removal of materials from an article: The system and method of the present invention removes organic and organometallic materials from an article in reduced pressure atmosphere containing ozone and activated oxygen. A dielectric barrier discharge lamp induces an intermolecular molecule energy transfer to the organic and organometallic material. The dielectric barrier discharge lamp emits vacuum ultraviolet...

20060180175 - Method and system for determining flow conditions in a high pressure processing system: In a high pressure processing system configured to treat a substrate, a flow measurement device is utilized to determine a flow condition in the high pressure processing system. The flow measurement device can, for example, comprise a turbidity meter. The flow parameter can, for example, include a volume flow rate...

20060180174 - Method and system for treating a substrate with a high pressure fluid using a peroxide-based process chemistry in conjunction with an initiator: A method and system is described for treating a substrate with a high pressure fluid, such as carbon dioxide in a supercritical state. A process chemistry containing a process peroxide is introduced to the high pressure fluid for treating the substrate surface. The peroxide-based chemistry is used in conjunction with...

20060180177 - Semiconductor substrate cleaning system: A modular semiconductor substrate cleaning system is provided that processes vertically oriented semiconductor substrates. The system features a plurality of cleaning modules that may include a megasonic tank-type cleaner followed by a scrubber. An input module may receive a horizontally oriented substrate and rotate the substrate to a vertical orientation,...

20060180176 - Wafer chucking apparatus for spin processor: A wafer chuck is configured to hold a wafer efficiently for spin process cleaning of wafer edges and back sides. A first group of retractable tips extend to hold the wafer during a first portion of the cleaning period. A second group of retractable tips extend to hold the wafer...

20060180178 - Apparatus and method for removing debris from a tool: An apparatus for removing debris from a tool has a head, and the head has a tool-shaped opening with an inner wall. The apparatus further has a blunt point contiguous with the head for inserting into the ground such that a tool in the shape of the opening can be...

20060180179 - Dishwasher for kosher operation: The invention relates to an automatic dishwasher (1) which can be operated in several operating modes (71, 72, 73, 74). The automatic dishwasher (1) proposed according to the invention can be switched from a first operating mode (71) to a second operating mode (72) only when a third operating mode...

20060174912 - Wafer cleaning solution for cobalt electroless application: A method and cleaning solution that removes contaminants from a dielectric material and polished surfaces of copper interconnect structures prior to an electroless deposition of a capping layer without substantially adversely affecting the interconnect formed therefrom are disclosed. The cleaning solution includes combinations of a core mixture and sulfuric acid...

20060174913 - Apparatus for and method of wet processing semiconductor substrates: A wet processing apparatus includes a bath in which a plurality of semiconductor substrates are to be seated, and which bath has drain valves defining drain openings between a bottom wall and the lower portions of side walls of the bath. Each of the drain valves also includes a gate...

20060174914 - Cleaning tool and method of use thereof: A tool advantageous for cleaning and sanitizing toilet bowls, urinals, and other surfaces. The cleaning tool comprises an arcuate-shaped handle and a cleaning head, wherein the cleaning head is permanently affixed to the handle, and wherein the handle and the cleaning head is formed from biodegradable material. Said tool is...

20060174917 - Pressure relief system for a dishwasher pump assembly: A dishwasher includes a filter chamber having a pressure relief system. The filter chamber preferably includes two drain ports, a first that leads to a drain line through a drain pump, and a second that leads directly to the drain line for over-pressure relief. The drain line is formed with...

20060174918 - Pump system for a drawer-type dishwasher: A drawer-type dishwasher includes a frame assembly, a tub, a wash arm and a pump system. The pump system includes a flow housing mounted at a rear portion of the tub and a drain conduit. The flow housing includes an inlet portion, an outlet portion, a pump portion and a...

20060174915 - Rapid heat system for a multi-tub dishwasher: A dishwasher includes a first washing chamber and a second washing chamber capable of performing a washing operation separately and/or concurrently. Each washing chamber includes a wash pump, a drain pump and a heating unit that are operatively connected to a controller. When initiating a washing fluid in one washing...

20060174916 - System for limiting pressure in a fine filter chamber for a dishwasher: A dishwasher includes wash chamber, a wash system for supplying washing fluid to wash arms to clean articles arranged in the wash chamber, and a washing fluid manifold having an inlet portion, an outlet portion and a passage interconnecting the inlet and outlet portions. A filter chamber is fluidly connected...

20060174919 - Apparatus and method for cleaning flat objects in a vertical orientation with pulsed liquid jet: An apparatus for cleaning flat objects such as semiconductor wafers with a pulsed liquid jet emitted from a group of nozzles that may be installed on one or on both sides of the wafer installed in a vertically arranged rotating chuck. The apparatus is comprised of a series of individual...

20060174920 - Method and apparatus for cleaning flat objects with pulsed liquid jet: A method and apparatus for pulsed jet cleaning of flat objects based on the principle of enhancing formation of droplets of the cleaning medium by increasing the boundary surface area between the jets emitted though the nozzles of the cleaning unit and the surrounding atmosphere. In various embodiments of the...

20060174921 - Single wafer dryer and drying methods: In a first aspect, a module is provided that is adapted to process a wafer. The module includes a processing portion having one or more features such as (1) a rotatable wafer support for rotating an input wafer from a first orientation wherein the wafer is in line with a...

20060174922 - Device and method for disinfecting a milking component: The invention relates to a device and a method for disinfecting a milking component, said device comprising a container for storing a disinfectant base material, and a processing unit. Said processing unit can be used to produce a disinfectant containing chlorine dioxide, from the disinfectant base material by means of...

20060174923 - Multi-use sump for a drawer-type dishwaher: A drawer-type dishwasher includes a frame assembly, a wash tub, a plurality of wash system components and a sump. The sump is either integrally formed with or separately formed and mounted to a bottom wall portion of the tub, while being provided with a plurality of fluid conduits that extend...

20060174924 - Pump and filter system for a drawer-type dishwasher: A drawer-type dishwasher includes a pump system which functions to pump and filter washing fluid in the dishwasher. The pump system includes a sump having an inlet passage, a recirculation passage, a drain passage, a coarse article collection chamber, a filter assembly that is divided into a filter chamber and...

20060174925 - Dishwasher drain pump assembly: A dishwasher includes a drain pump assembly having a chopper assembly coupled to an impeller and driven by a synchronous motor. The chopper assembly includes an impeller housing that includes a central hub portion for pivotally supporting a plurality of rotatable chopper blades. An apertured plate is secured to the...

20060169300 - Method of and apparatus for heating liquid used in the manufacturing of semiconductor devices, and method of processing substrates with heated liquid: Liquid used in manufacturing a semiconductor device is rapidly heated to a desired temperature at which the liquid is most effective at processing substrates. An apparatus for heating the liquid includes a chemical bath in which the liquid is stored, circulation piping connected to the chemical bath, so that the...

20060169301 - Cleaning wipe with variable loft working surface: A cleaning wipe useful as a wet cleaning wipe for picking up diverse debris, such as hair and other debris such as dirt, including a web defining a working surface opposite a second surface. The working surface has first, second, and third regions each having a different degree of loftiness...

20060169303 - Apparatus and method for cleaning industrial vessels: An apparatus includes a winding device and a windable member having a first end and a second end. The first end is operatively connected to the winding device. A rotatable nozzle device is operatively connected to the second end of the windable member. An electronic controller is in electronic communication...

20060169302 - Aqueous tube cleaning apparatus and method: An aqueous tube cleaning apparatus and method includes a cleaning receptacle and a vertical receptacle, which is taller than the cleaning receptacle. A tube, or bundle of tubes, is placed in the cleaning receptacle, extending through an inlet port from the vertical receptacle, and a gate is closed to clamp...

20060169304 - Method and system in a heat exchange system and methods for air/fuel control and for soot cleaning optimization: Means for obtaining accurate knowledge of location and amount of fouling inside a heat exchange system, such as a boiler of a power plant, are provided. According to the invention this knowledge can be used to optimize cleaning of a heat exchange system. The system of the invention comprises: Means...

20060169305 - Heat exchanger cleaning process: Disclosed is a novel process for cleaning and restoring the operating efficiency of organic liquid chemical exchangers in a safe and effective manner and in a very short period of time, without a need to disassemble the equipment and without the need to rinse contaminate from the equipment after cleaning....

20060169306 - Cleaning fluid container: The invention aims at improving a cleaning fluid container (3) for a cleaning device (RV) for personal needs, in particular for cleaning a shaving head (SK) of a dry shaving apparatus (R), with a housing (20), with an inlet port (15) provided on the housing (20) to admit cleaning fluid...