Cleaning and liquid contact with solids inventions 07/06

20060162739 - Cleaning chuck in situ: Embodiments of the invention provide a method and an apparatus for in situ chuck cleaning, which advantageously reduces downtime to restore flatness. In one embodiment, a method of cleaning a chuck in situ comprises providing a cleaning layer on a substrate, the cleaning layer comprising a deformable material; positioning the...

20060162742 - Cleaning method of processing apparatus, program for performing the method, and storage medium for storing the program: A plasma processing apparatus includes a processing chamber, in which a wafer W is plasma-processed, and a CPU controlling an operation of each component. A processing gas is introduced into the processing chamber under a first condition defined by a flow rate and a molecular weight of the processing gas,...

20060162740 - Method and apparatus for cleaning and surface conditioning objects using non-equilibrium atmospheric pressure plasma: A method and apparatus for cleaning and surface conditioning objects using plasma is disclosed. One embodiment of the method discloses providing a plurality of elongated dielectric barrier members arranged adjacent each other, the members having electrodes connected therein, introducing the objects proximate the members, and producing a dielectric barrier discharge...

20060162741 - Method and apparatus for cleaning and surface conditioning objects with plasma: A method and apparatus for cleaning and surface conditioning objects using plasma is disclosed. One embodiment of the method discloses providing a plurality of elongated dielectric barrier plates arranged adjacent each other, the plates having inner electrodes connected therein, introducing the objects proximate the plates, and producing a dielectric barrier...

20060162743 - Method for cleaning a tub of a washing machine: Method for cleaning a tub of a washing machine including the steps of supplying water to a tub without introduction of laundry into the tub, washing for the first time for permeation of water into contaminants, and removal of contaminants lightly stuck to a surface of the tub, soaking the...

20060162744 - Dishwasher with high voltage dc motor: A dishwasher which uses a high voltage DC motor to drive a pump. The dishwasher cleans dishes and cooking and eating utensils by the use of a high pressure water spray driven by an electric pump which circulates water. The DC motor may have a built in motor controller to...

20060162745 - Substrate processing method and substrate processing device: A processing tank 10 is divided into a washing section 15 and a drying section 30, a clearance is formed in the joint between the sections, and the clearance is communicated with by sink 29. In drying a substrate, the substrate is moved from the washing section to the drying...

20060162746 - Dishwasher and corresponding control method: This invention relates to a dishwasher (1) comprising a biosensor (7) and a control method which provides an efficient, clean and hygienic washing wherein the main water supply and washing water are microbiologically analyzed in the phases of the program, and the washing water temperature and circulation period are adjusted...

20060162747 - Polypro scrap accumulator: A kitchenware washing apparatus having an improved scrap accumulator. The scrap accumulator is composed of a molded plastic material to provide efficient drainage and secure retention in the kitchenware washing apparatus. The scrap accumulator is produced at a lower cost than one made of metal....

20060162748 - Wafer guide and semiconductor wafer drying apparatus using the same: A wafer guide and a semiconductor wafer drying apparatus using the same are disclosed. The wafer guide includes a body and supporters formed on the body. The supporters present a plurality of grooves to engage and support a periphery of a wafer. A discharge structure, e.g., a discharging hole, promotes...

20060162749 - Cleaning device for a hair removing apparatus: A cleaning device has a basin that receives an operator head of the hair removing apparatus, a tank storing a volume of a cleaning liquid, and a pump supplying the liquid from the tank to the basin for cleaning the operator head. A drip pan is formed separately from the...

20060162750 - Adjustable-angle pipe and rod pushing device: A rod and pipe pushing device having opposed belt structures for engaging opposite sides of an elongated member that is to be pushed into an embedded pipe having a larger diameter than the elongated member. The device includes a pipe pushing apparatus pivotally mounted on a main support frame having...

20060162751 - Oil flushing equipment for machinery with rotating parts: Oil flushing equipment has four function modes (40) for machinery with rotating parts: the first fills the machinery (40) with oil from a tank (1), the second re-circulates the oil through the machinery (40), the third empties the oil from the machinery (40) to the tank (1) and the fourth...

20060162752 - Method and device for effecting the, in particular, continuous surface treatment, especially cleaning, of a metal strip: The invention relates to a device for operating and a method for modifying an installation for effecting the, in particular continuous, treatment, preferably the cleaning, of a metal strip 2 by means of a treatment liquid, particularly a pickling liquid, the metal strip 2 being guided, preferably horizontally, through at...

20060157079 - Method for cleaning substrate surface: There is provided a surface cleaning apparatus and method using plasma to remove a native oxide layer, a chemical oxide layer, and a damaged portion from a silicon substrate surface, and contaminants from a metal surface. A mixture of H2 and N2 gas is used as a first processing gas....

20060157080 - Cleaning method for semiconductor wafer: A cleaning method according to the present invention is provided. The method includes at least two stages of cleaning processes. In the first stage, dilute HF is provided as a cleaning solution, and a brushing process is performed. In the second stage, dilute HF is also provided as a cleaning...

20060157081 - Packaging machine and process: A packaging machine utilizing side connected chains of open bags is disclosed. The machine has loading and closure sections which are moveable between operating and cleaning/service positions. A resistance heater subassembly is removeable to enable washdown....

20060157082 - Vacuum ring designs for electrical contacting improvement: Recesses (72), surface contours, contact tip modifications (52, 56), and/or other methods of ensuring pressure between a bottom surface (50) of a test plate (5) and top surfaces (52) of electrical contacts (18) are employed to enhance cleaning of the top surfaces (52) of the electrical contacts (18) to promote...

20060157083 - Drainage structure cleaning tool and method: A tool for cleaning a culvert comprises a rod having a center longitudinal axis, a housing having a center longitudinal axis and coupled coaxially to the rod, the housing having an interior chamber, the housing has an outside dimension that can be accommodated within the culvert, and at least one...

20060157084 - Automatic washing machine detergent dispensing device: An automatic washing machine detergent dispensing device comprises a bar of detergent disposed within a channel. The detergent bar completely fills at least a portion of the channel across the entire bore of the channel. The channel has an inlet aperture which is in communication therewith....

20060157085 - Screening nest, method of screening wiring layers in a multi-layer ceramic and cleaning the screening mask and mask cleaning station: A screening nest, method of screening green sheets and cleaning the mask and a mask cleaning station. The screening nest includes an electromagnet that clamps the mask to a green sheet on the nest during screening. The mask may be electromagnetically dampened during application and removal. The cleaning station electromagnetically...

20060157087 - A method and arrangement in connection with a chemical recovery boiler: The present invention relates to a method in connection with smelt removal form a recovery boiler, whereby the smelt is removed from the boiler via a smelt spout surrounded outside the boiler by a hood and a dispersion medium, preferably steam, is fed into the smelt flow falling from the...

20060157086 - Apparatus and method for dispensing fluid: A method of dispensing a fluid into a washing device including a wash chamber. The method includes positioning a fluid dispensing system within a door assembly including an outer wall, an inner wall, and a cavity defined therebetween. The inner wall includes an outer surface and an inner surface, wherein...

20060157088 - Process for enhanced liquid extraction from fabrics: A process of extracting liquid from a fabric having a first content of liquid includes the steps of creating a surfactant surface layer including at least one surfactant at an air-liquid interface of the liquid on the fabric, wherein the surface layer has a first surface tension, and adding at...

20060157089 - Automatic eyeglass cleaner: An eyeglass cleaner can include a clip configured to hold a pair of eyeglasses, an agitator arm coupled to the clip, and a solution tank. The agitator arm can be configured to move the clip in a forward and backward motion during at least one of a cleaning operation or...

20060157090 - Method of monitoring membrane cleaning processes: Methods and systems for monitoring and/or controlling the cleaning of membrane separation systems or processes are provided. The present invention utilizes measurable amounts of inert fluorescent tracer(s) added to a membrane cleaning process stream to evaluate and/or control the removal of contaminants and/or impurities during cleaning. The methods and systems...

20060157091 - Device for treating pieces of a substrate at high pressure with a supercritical or near-critical treatment medium, piece by piece or in batches: A device for treating pieces of a substrate at high pressure, piece by piece or in batches, with a treatment medium in the supercritical or near-critical state, includes a first pressure chamber, a pipe system for supplying and discharging the treatment medium, to and from the pressure chamber under high...

20060157092 - Warewasher water heating system with immersion tube and associated turbulator: A warewash machine includes a housing at least in part defining a wash area. A water tank supplies water to the wash area and a water heating system is provided for heating water in the water tank. The water heating system includes a heat exchange tube immersed in water within...

20060157094 - Vehicle and watercraft wash station: A wash station for a vehicle is provided which includes a wash housing having a base with a platform as an upper surface. The platform has a plurality of spray nozzles laterally mounted across the platform. A tower having at least one spray nozzle therein is positioned on each lateral...

20060157093 - Vehicle wash apparatus: A vehicle wash apparatus including a carriage assembly is supported above a vehicle. A pair of opposed shuttle assemblies are operatively supported by the carriage assembly and moveable generally transverse to the carriage assembly. A pair of spray manifold assemblies are operatively supported by one of the opposed shuttle assemblies,...

20060157095 - Systems and methods for spinning semiconductor wafers: Systems and methods are disclosed to process first and second sides of a wafer. The system includes a platform adapted to receive and rotate said wafer; and first and second heads coupled to the platform to access said first and second sides of said wafer....

20060157096 - Drainage structure cleaning tool and method: A tool for cleaning a culvert comprises a rod having a center longitudinal axis, a housing having a center longitudinal axis and coupled coaxially to the rod, the housing having an interior chamber, the housing has an outside dimension that can be accommodated within the culvert, and at least one...

20060151000 - Systems and methods for single integrated substrate cleaning and rinsing: Inventive methods and systems of cleaning patterned integrated circuit (“IC”) substrates are described. The cleaning methods of the present invention include: (1) providing the patterned integrated circuit substrate having thereon poly silicon lines adjacent to each other; (2) charging a solution, which contains at least a solute selected to promote...

20060151001 - Wash-target holder, and wash-target holding apparatus, washing apparatus and method for washing wash-target using the same: It is to improve the washing efficiency of the wash-target and the cleanness of the washing. There is provided a wash-target holder that is soaked in a wash tank by holding at least one wash-target, which comprises a tray for placing the wash-target, wherein a suction hole is provided at...

20060151002 - Method of cvd chamber cleaning: A method for cleaning a plasma CVD reactor includes, during a cleaning cycle, (i) providing cleaning active species derived from a cleaning gas in the plasma CVD reactor, and (ii) generating a hydrogen plasma in an interior of the plasma CVD reactor to clean the interior of the reactor....

20060151003 - Brush for cleaning wafer: In a formulation of a wafer cleaning brush, forming a polymer solution with a plurality of nano-scale porogens or with a synthetic pore forming agent and curing the polymer solution to form a porous polymeric material....

20060151004 - Cleaning sheet and method for cleaning substrate processing apparatus: The means for solving the aims of the invention concerns a cleaning sheet comprising a cleaning layer provided on one side of a base material, from which cleaning layer F−, Cl−, Br−, NO2−, NO3−, PO43−, SO42−, Na+, NH4+ and K+ are extractable with pure water each in an amount of...

20060151005 - Washing machine and washing tub cleaning method: A method of cleaning a washing tub mounted in a water tub of a washing machine includes supplying water necessary to clean the washing tub to the water tub, and rotating the washing tub while supplying heat to the water tub by means of at least one heat supply device...

20060151006 - Substrate dryer and a drying method: A substrate dryer includes, among other things, means for generating isopropyl alcohol bubbles, and a vibrator to atomize stored isopropyl alcohol. A heater may be provided to heat pumped isopropyl alcohol, as wells as a spray nozzle to spray the heated IPA to the vibrator. It is possible to increase...

20060151007 - Workpiece processing using ozone gas and chelating agents: In systems and methods for cleaning a wafer having an oxide on a surface of the wafer, an aqueous liquid including a chelating agent is applied onto the wafer, while the wafer is also contacted by ozone gas. The ozone readily oxidizes the contaminants in the presence of the aqueous...

20060151008 - Cleaning method, method for removing foreign particle, cleaning apparatus, and cleaning liquid: The present invention provides a mechanism capable of removing a minute particle adhered to a fine pattern or the like without giving damages to the pattern or the like. After being installed on a device which can perform rotating operation, the high viscosity liquid is dropped on an upper surface...

20060151009 - Operation method of laundry device: The present invention relates to an operation method of a laundry device, and more particularly, to an operation of a new type of laundry device capable of performing a washing cycle and a drying cycle at the same time successively or simultaneously, as well as enabling the entire washing performed...

20060151011 - Dishdrawer-camming arrangement: A dishwasher is disclosed which is suitable for mounting within a cavity under a bench. The dishwasher is chassis less and includes no outer wrapper or cabinet and as such is mounted directly to the cavity. Also disclosed are a number of embodiments relating to mechanisms for closing the lid...

20060151010 - Drive unit for dish washing machines: A drive unit for dish washing machines includes solid waste chambers with bottom surfaces that are stepped. One of the solid waste chambers has an inlet/outlet port. The solid waste chambers are inclined downward toward the inlet/outlet port. Consequently, filtering capacity is increased, and discharge of solid waste is facilitated....

20060151012 - Flush rinse apparatus for electroplating operations: An apparatus for rinsing an article includes a tank having an upper portion, the upper portion including a rim; a discharge pipe connected to the tank; a generally cylindrical spray assembly disposed in a middle portion of the tank; a second tank; a source of rinse fluid connected to the...

20060151013 - Clean assembling module device, produciton system formed with the module, industrial robot, and pollution spred prevention system: A clean assembling module device that achieves cleanliness of a work area where assembling, processing, transportation, etc. of a work item are performed and that can be downsized. The invention also includes a production system, an industrial robot, and a pollution spread prevention system that are formed with the device....

20060151015 - Chemical liquid processing apparatus for processing a substrate and the method thereof: In this disclosure, air flow is formed above chemical liquid film and a move of the chemical liquid is generated by making the air flow into a contact with the surface of chemical liquid. Further, a negative pressure is generated in a space between a processing object substrate and a...

20060151014 - Device and method for wet treating disc-like substrates: Disclosed is a device for wet treating a flat plate-like substrate utilizing ultrasonic energy and a method associated with the device....

20060151016 - Drive unit for dish washing machines: A drive unit for dish washing machines includes a flow channel housing, a filter housing and an arm holder, which are thermally fused to one another to form an integral unit. Consequently, assembly of the drive unit is simplified, leakage of wash water is prevented, and pumping performance is increased....

20060151017 - Systems and methods for surface pasteurization of produce: A method of transporting produce on a conveyor and rotating the produce substantially continuously during the transport. While the produce is being transported, steam is applied to an outer surface of the produce on the conveyor. Lane dividers are provided along the conveyor in a direction of travel of the...

20060144417 - Method of lowering contact angles on an optical film surface: The present invention relates to a method of lowering contact angles on an optical film surface, especially a cellulose acetate butyrate film. The optical film is first cleaned by alkaline purge and acidic purge to remove tiny impurities on the surface, and then treated with non-thermal plasmas to lower the...

20060144418 - Components for film forming device and method of washing the component: Herein disclosed are a component of a film-forming device, in which a thin films is formed on a substrate using a film-forming material, whose surface structure makes any breakage, peeling off and/or falling off of a film adhered to the component quite difficult, while the structure permits easy removal of...

20060144420 - Apparatus and method for manufacturing semiconductor device: An apparatus for manufacturing a semiconductor device performs wet cleaning of a semiconductor wafer in a cleaning chamber, transfer of the wet-cleaned semiconductor wafer into a drying chamber and drying of the semiconductor wafer in the drying chamber. The apparatus includes an atmosphere control means for controlling the atmosphere near...

20060144419 - Method of degasification in semiconductor cleaning: A method of improving the effectiveness of semiconductor cleaning solvents is provided. Insoluble gas bubbles, typically air, hinder wet chemical cleaning methods. Preferred embodiments include purging a first, insoluble gas from the cleaning system and replacing it with a second, soluble gas. After replacing the first gas with the second...

20060144421 - Semiconductor substrate treating method, semiconductor component and electronic appliance: A semiconductor substrate treating method is disclosed that can selectively remove contaminants or unnecessary substances present on the surface of a semiconductor substrate. Also disclosed are a semiconductor component of enhanced reliability produced by this method and an electronic appliance incorporating the semiconductor component. The semiconductor substrate treating method comprises...

20060144422 - Method of removing tacky substance or waste liquid containing tacky substance: A method of removing a sticky substance or a waste liquid containing a sticky substance which comprises, mixing a solid substance having inflammability and liquid-absorptivity into the sticky substance or the waste liquid containing the sticky substance wherein these are mixed to allow a liquid component of the sticky substance...

20060144423 - Probe card needle cleaning frequency optimization: A system and method for optimizing cleaning of a probe card including using the probe card to test the functionality of dies on a wafer, when a die fails the probe test, and the probe reports failure to contact the pads of the die, checking the resistance of the probe...

20060144424 - Washing machine with a dispenser for a diversified dispensing of washing agents, and a device and method for implementation thereof: The present invention relates to a washing machine, in particular a dishwasher, having a washing agents dispenser with an actuator for dispensing washing agents inside a wash tub of the washing machine, and a wash pump for wash water circulation inside a hydraulic circuit of the machine. The actuator is...

20060144425 - Method and system for removal of contaminates from phaseshift photomasks: A system and method to clean the pellicle frame and adhesive ring of a photomask reticle are described. One embodiment includes a cover that isolates the photomasks from the pellicle frame. The reticle is secured between a spin chuck and the cover so that the photomasks are isolated and protected...

20060144426 - Towelette, and method: The invention is a towelette, as well as a sanitation method that incorporates use of the inventive towelette....

20060144427 - Plasma cleansing apparatus that eliminates organic and oxidative contaminant and may effectively dissipate heat and eliminate exhaust gas and integrated system for the same: A plasma cleansing apparatus that eliminates organic and oxidative contaminant and effectively dissipates heat and eliminates exhaust gas comprises an electrode unit, an exothermic unit, a raw gas ducting unit, a raw gas supply ducting unit, and an air drawing and exhausting unit. The exothermic unit is provided with a...

20060144428 - Processing-subject cleaning method and apparatus, and device manufacturing method and device: The invention reduces the amounts of cleaning liquids and rinse liquid used, as well as the energy consumption. A cleaning head has a plurality of cleaning units and a drying unit. An organic substance cleaning portion of each cleaning unit blows a first cleaning agent selectively over a portion to...

20060144429 - Device and process for liquid treatment of wafer-shaped articles: A device for liquid treatment of a defined area of a wafer-shaped article, especially of a wafer, near the edge, in which the liquid is applied to a first surface, flows essentially radially to the outside to the peripheral-side edge of the wafer-shaped article and around this edge onto the...

20060144430 - Adaptable car wash messaging system: A method of providing information to a user of a car wash is disclosed. The method includes receiving from a car wash one or more signals representing one or more payments. One or more signals are received from the car wash representing a value of one or more car wash...