Cleaning and liquid contact with solids inventions 04/06

20060086371 - Particle remover, exposure apparatus having the same, and device manufacturing method: A particle remover includes an irradiation unit for irradiating plural lights onto a target from different directions, and for scanning the lights on the target, and a collector for collecting particles carried as a result of scanning of the lights....

20060086372 - Composition for the removing of sidewall residues: The present invention relates to a composition for the removal of so-called “sidewall residues” from metal surfaces, in particular from aluminium or aluminium-containing surfaces, in particular from aluminium or aluminium-containing surfaces, during the production of semiconductor elements....

20060086373 - Apparatus and method for drying substrates used to manufacture semiconductor devices: A wafer drying apparatus may include a porous member for absorbing alcohol. The alcohol may have a higher vapor pressure than water remaining on a wafer. The porous member may migrate from the center of the wafer to the edge of the wafer. Alcohol vapor evaporated from the porous member...

20060086374 - Process for producing and method of cleaning polyarylene sulfide, and method of purifying organic solvent used for cleaning: A process for producing a poly(arylene sulfide), comprising the respective steps of a washing step of washing a polymer separated from a reaction mixture containing the polymer formed with an organic solvent, which is arranged after a polymerization step, a purification step of purifying the organic solvent recovered after the...

20060086375 - Aerosol cleaning apparatus and control method thereof: An aerosol standby state is additionally provided for suspending the supply of aerosol producing gas while continuing the operation of a refrigerator, for the purpose of shortening the aerosol producing time and decreasing the consumption of argon gas and nitrogen gas....

20060086376 - Novel methods for cleaning ion implanter components: A method and apparatus for cleaning residue from components of an ion source region of an ion implanter used in the fabrication of microelectronic devices. To effectively remove residue, the components are contacted with a gas-phase reactive halide composition for sufficient time and under sufficient conditions to at least partially...

20060086377 - Self-flushing basement drainage pipe: A drainage pipe for use in a basement waterproofing system includes an interior cleaning device that includes a plurality of openings to allow fluid, such as air or water, to be forced out of the pipe and clean debris within the drainage pipe. The drainage pipe also includes an exterior...

20060086378 - Carboy support bracket and method of using same: A carboy support bracket is disclosed for use with a basin, the basin having a peripheral wall having an upper surface defining a generally horizontal plane, the carboy support bracket comprising a frame configured for stable positioning on the upper surface of the peripheral wall, and an aperture for receiving...

20060086379 - Flame treatment of washing machine parts: Plastic components exposed to a washing chamber of a washing machine are flame treated to improve the stain resistance of the plastic components. In accordance with the invention, a plastic component is exposed to flame treatment for a sufficient amount of time for a reaction to occur with the plastic...

20060086380 - Dishwasher: Dishwasher including a washing tub for placing dishes therein, a sump for accommodating washing water to wash the dishes in the washing tub, and a motor having a rotor and a stator, for generating pumping power to pump up the washing water from the sump to the washing tub, wherein...

20060086381 - Water powered fishing line washing apparatus: An automatic fishing line washing apparatus is disclosed. The apparatus is structured to be connected to a domestic water source and to be utilized in conjunction with a fishing reel and rod. The fishing line is automatically washed by allowing the fishing line to wind onto the apparatus storage reel...

20060081269 - Method and apparatus for cleaning and drying wafers: The present invention is directed to a method and an apparatus for cleaning and drying wafers. The apparatus includes an injection unit having first and second injection ports configured for injecting different fluids and arranged in a moving direction of the rose or on a line adjacent to the moving...

20060081270 - Methods and systems for processing a bevel edge of a substrate using a dynamic liquid meniscus: A system and method for processing an edge of a substrate includes an edge roller and a first proximity head. The first proximity head being mounted on the edge roller. The first proximity head capable of forming a meniscus and including a concave portion and multiple ports opening into the...

20060081271 - Steam humidifier and method: The steam humidifier fed with a premix of natural gas and forced air under low pressure (less than 1 psi) includes a main frame, a movable lower frame, a two part evaporation canister, releasably sealed, for water, an immersible combustion chamber retaining a radiant gas burner and a heat exchanger...

20060081272 - Dish washer and method for detecting failure of pump thereof: A dish washer, which detects failure of a washing pump, and a method for detecting failure of the washing pump of the dish washer. The method detects failure of the washing pump of the dish washer by measuring the temperature of water at different locations within the dish washer. It...

20060081273 - Dense fluid compositions and processes using same for article treatment and residue removal: A method for removing contaminants from an article is described herein. In one embodiment, there is provided a method comprising loosening at least a portion of the contaminants by treating the article with a treatment method involving a processing fluid and/or dense processing fluid to provide a partially treated article...

20060081274 - Substrate holding device and substrate processing apparatus: A substrate holding device according to the present invention comprises: a motor; a rotating shaft rotated by the driving force of the motor; a spin base coupled to the rotating shaft and rotated integrally with the rotating shaft; a cover member surrounding the motor and having its one end arranged...

20060081275 - Enhanced ultrasonic cleaning devices: Ultrasonic cleaning devices comprise a sonotrode and a power supply adapted to supply current to the sonotrode, and further include one or more features which facilitate use of the ultrasonic cleaning devices by consumers, improve the safety of the ultrasonic cleaning devices when used by consumers, and/or improve the cleaning...

20060076034 - Cleaning method and cleaning apparatus for performing the same: A cleaning apparatus includes upper and lower nozzle assemblies supplying a cleaning liquid to edge and bottom sections of a semiconductor substrate. The upper nozzle assembly has a first nozzle supplying the cleaning liquid onto the edge section, and second and third nozzles supplying a nitrogen gas for preventing the...

20060076035 - Surface cleaning apparatus: A surface cleaning apparatus comprises a body including a plurality of compartments. An elongate rotating brush arrangement is positioned within and extends across a first compartment. An electric motor is positioned in a second compartment for driving the brush. The motor for the brush can be operated at a plurality...

20060076037 - Dishwasher and method for controlling the same: A dishwasher and a method for controlling the same are disclosed, the dishwasher including washing part comprising a sump for accommodating wash water for washing contaminated dishes, a washing pump for pumping wash water accommodated in the sump, and a filtering member for filtering contaminants contained in the wash water,...

20060076036 - Metal removal from solvent: An apparatus for cleaning a substrate. A cleaning chamber contacts the substrate with a cleaning solution. The cleaning solution thereby removes contaminants from the substrate and additionally leaches material from the substrate. A gettering chamber receives the cleaning solution, and includes a surface for chemically attracting the leached material and...

20060076038 - Washing method for a dishwasher, and dishwasher for carrying out one such method: A method for washing and drying items in a dishwasher and a dishwasher are provided. After the dishwasher is placed in a program execution readiness state in which a given washing or drying program can be executed, a washing program and then a drying program are executed. In response to...

20060076039 - Robot cleaner coordinates compensation method and a robot cleaner system using the same: A coordinates compensation method of a robot cleaner using an angle sensor compensates coordinates of the robot cleaner with reference to absolute coordinates of a recharging station, so as to improve robot cleaner's path following. The robot cleaner is in a standby mode at the recharging station, and moves to...

20060076040 - Semiconductive substrate cleaning systems: In one aspect, the invention includes a method of treating a surface of a substrate. A mixture which comprises at least a frozen first material and liquid second material is provided on the surface and moved relative to the substrate. In another aspect, the invention encompasses a method of treating...

20060076041 - Apparatus and method for cleaning tanks: A rotating and telescoping cleaning system improves high pressure water cleaning of the inner surfaces of vessels or tanks. Vessels can be vertically divided with dividing plates with centered through-holes. Synchronized and controlled transverse and rotary movements of water jets result in a controlled spiral or helical cleaning track along...

20060070637 - Supercritical fluid technology for cleaning processing chambers and systems: The invention includes a method of cleaning a processing chamber by introducing supercritical fluid into the processing chamber. A residue over an internal chamber surface is contacted with the supercritical fluid to remove the residue from the surface. The invention also includes a method of removing deposited material from internal...

20060070638 - Methods and apparatus for rinsing and drying: A method for rinsing and drying a workpiece includes placing the workpiece into a chamber and spinning the workpiece. A rinsing fluid, such as water, is applied onto the workpiece through a first outlet in the chamber, with the rinsing fluid moving outwardly towards the edge of the workpiece via...

20060070639 - Fluid delivery ring and methods for making and implementing the same: A method for rinsing a semiconductor wafer in a module utilizing a fluid delivery ring is provided. The method includes providing a process bowl having a generally circular shape bottom wall, a sidewall that extends upwardly from the bottom wall to define a cylindrical chamber, and a plurality of channels...

20060070640 - Method and system for injecting chemistry into a supercritical fluid: A method and system is described for introducing chemistry into a high pressure fluid for treating a substrate. In particular, the method includes dispersing the chemistry throughout the volume of high pressure fluid in order to promote mixing of the two or more fluids, while the high pressure fluid is...

20060070641 - Cleaning probe and megasonic cleaning apparatus having the same: A cleaning probe capable of providing uniform cleaning to an entire wafer while not damaging the edge portion of the wafer, and a megasonic cleaning apparatus having the cleaning probe are provided. The cleaning probe comprises a front portion located near the center of the wafer, a rear portion connected...