Chemistry: electrical and wave energy inventions 10/09

20090242381 - Photoreduction processing method of three-dimensional metal nanostructure: In a method of producing a metal structure by photoreducing metal ion, a substance capable of suppressing growth of metal crystal is added to a medium in which metal ion is dispersed to prevent growth of the metal crystal produced by photoreduction of the metal ion, thereby processing resolution of... Agent: Nixon & Vanderhye, PC

20090242382 - Hollow glass microsphere candidates for reversible hydrogen storage, particularly for vehicular applications: A source of hydrogen is a glass or glass-ceramic shell and a gas comprising at least 80% by volume of hydrogen. The glass shell has an initial permeability to hydrogen gas of less than about 50% decrease in pressure in 30 days and a final permeability to hydrogen of about... Agent: Mark A. Litman & Associates, P.A. York Business Center

20090242383 - Apparatus and method for rf grounding of ipvd table: An IPVD source assembly and method is provided for supplying and ionizing material for coating a semiconductor wafer. The assembly includes a process space containing a plasma and an electrostatic chuck moveable in to and out of the process space. The chuck is configured to support the semiconductor wafer. The... Agent: Wood, Herron & Evans, LLP (tokyo Electron)

20090242384 - Low pressure mixing system for desalting hydrocarbons: A method and system for reducing the salt content of a crude oil stream includes using a quill to disperse a water stream into the crude oil and then routing the mixed oil/water stream through a plurality of mixing stages. The water stream may include a wash water that has... Agent: Gable & Gotwals

20090242385 - Method of depositing metal-containing films by inductively coupled physical vapor deposition: A method for depositing a metal-containing film on a substrate using an inductively coupled (ICP) physical vapor deposition (PVD) system. The ICP PVD deposition is performed under process conditions that thermalize neutral sputtered metal atoms by collisions with a process gas and minimize or eliminate exposure of ions to the... Agent: Tokyo Electron U.s. Holdings, Inc.

20090242387 - Process for producing silica glass containing tio2, and optical material for euv lithography employing silica glass containing tio2: The claimed invention relates to a process for producing an optical material for EUV lithography, wherein the optical material contains a silica glass having a TiO2 concentration of from 3 to 12 mass % and a hydrogen molecule content of less than 5×1017 molecules/cm3 in the glass. The process including... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090242386 - System and method of fabricating pores in polymer membranes: A system of the present disclosure has a particle source that generates an ion beam and a vacuum chamber that houses a polymer film. The particle source bombards the polymer film with the ion beam. The system further has a controller that controls the particle source based upon an amount... Agent: Lanier Ford Shaver & Payne P.C.

20090242388 - Stress adjustment in reactive sputtering: In a dual cathode magnetron, an adjustment circuit is provided between a pair of sputter targets having a coaxial (preferably frusto-conical) relationship to modify the distribution of ion and electron currents flowing from the plasma discharge to a substrate residing within a sputter chamber. A stress adjustment circuit is used... Agent: Tue Nguyen

20090242389 - Method for manufacturing magnetic recording medium: A method for manufacturing a magnetic recording medium including a nonmagnetic substrate, an intermediate layer over the nonmagnetic substrate, and a granular magnetic layer for recording information, disposed on the intermediate layer. The method includes sputtering a Co alloy, a Ti oxide, a Si oxide and a Co oxide simultaneously... Agent: Greer, Burns & Crain

20090242390 - Electrode plate transportation apparatus: An electrode plate transportation apparatus moves up and down electrode plates moved to a position above an electrolytic bath, and places and draw the electrode plates in and from the electrolytic bath. The apparatus includes a stationary frame that is suspended from an upper position in a vertical direction, a... Agent: Birch Stewart Kolasch & Birch

20090242391 - Electrode for electrochemical cell operating with high differential pressure difference, procedure for the manufacturing of such electrode and electrochemical cell for the use of such electrode: The invention relates to a porous electrode used in an electrochemical cell, containing a carrier and/or catalytic agent, which is characterised by that it consists of two or more layers with different average pore sizes, out of which layers the contact layer with the smallest average pore size is in... Agent: Olson & Cepuritis, Ltd.

20090242392 - Stress adjustment in reactive sputtering: In a dual cathode magnetron, an adjustment circuit is provided between a pair of sputter targets having a coaxial (preferably frusto-conical) relationship to modify the distribution of ion and electron currents flowing from the plasma discharge to a substrate residing within a sputter chamber. A stress adjustment circuit is used... Agent: Tue Nguyen

20090242394 - Al-based alloy sputtering target and manufacturing method thereof: The present invention provides an Al—(Ni, Co)—(Cu, Ge)—(La, Gd, Nd) alloy sputtering target capable of decreasing a generation of splashing in an initial stage of using the sputtering target, preventing defects caused thereby in interconnection films or the like and improving a yield and operation performance of an FPD, as... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090242395 - Al-ni-la-cu alloy sputtering target and manufacturing method thereof: The present invention provides a technique capable of decreasing a generation of splashing upon depositing by using an Al—Ni—La—Cu alloy sputtering target comprising Ni, La, and Cu. The invention relates to an Al—Ni—La—Cu alloy sputtering target comprising Ni, La and Cu, in which (1) a total area of an Al—Ni... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090242393 - Nonmagnetic material particle dispersed ferromagnetic material sputtering target: Provided is a nonmagnetic material particle dispersed ferromagnetic material sputtering target comprising a material including nonmagnetic material particles dispersed in a ferromagnetic material. The nonmagnetic material particle dispersed ferromagnetic material sputtering target is characterized in that all particles of the nonmagnetic material with a structure observed on the material in... Agent: Howson & Howson LLP

20090242396 - Adjustable magnet pack for semiconductor wafer processing: A magnetron system is provided for a PVD system in which a magnet pack is formed in two subassemblies, one relatively moveable with respect to the other and one or both moveable relative to a sputtering target. The magnet pack may include a plurality of magnet rings that are interconnected... Agent: Wood, Herron & Evans, LLP (tokyo Electron)

20090242397 - Systems for controlling cathodic arc discharge: A system for controlling cathodic arc discharge is provided. The system includes a vacuum chamber forming an anode. The system also includes a power supply connected to the vacuum chamber, wherein the power supply is configured to generate an electric field within the vacuum chamber. The system further includes a... Agent: General Electric Company Global Research

20090242398 - Device and method for monitoring an electrochemical gas sensor: An electrochemical gas sensor testing device that includes a test signal generator that generates a multiplexed signal that includes a first test signal that includes alternating current (AC) and is free from a direct current (DC) component and a second signal that includes a DC bias voltage, an electrochemical cell... Agent: Allison Johnson, P.A.

20090242399 - Analyte sensor: Systems and methods of use for continuous analyte measurement of a host's vascular system are provided. In some embodiments, a continuous glucose measurement system includes a vascular access device, a sensor and sensor electronics, the system being configured for insertion into communication with a host's circulatory system.... Agent: Knobbe Martens Olson & Bear LLP

20090242400 - Gas sensor, nox sensor and method of manufacturing gas sensor: It is an object of the present invention to provide a NOx sensor for accurately obtaining the resistance value of a heater. When a second layer is laminated immediately above a first layer on which the heater for electrically heating the proximity of an inner space of the NOx sensor... Agent: Burr & Brown

20090242401 - Nox sensor: A sensor for specifying a concentration of a predetermined gas component in a measurement gas on the basis of a current flowing in an electrolyte by decomposition of the predetermined gas component, includes an internal space; a reference gas space; a pumping cell capable of pumping out oxygen in the... Agent: Burr & Brown

20090242402 - Nox sensor: A gas sensor for specifying a concentration of a predetermined gas component in a measurement gas on the basis of a current flowing in an electrolyte by decomposition of the predetermined gas component, includes an internal space; a reference gas space; a pumping cell capable of pumping out oxygen in... Agent: Burr & Brown

20090242404 - Gas sensor: A gas sensor for detecting a predetermined gas component in a measurement gas includes a sensor element in which an opening of a first gas inlet and an opening of a second gas inlet for introducing the measurement gas from an outside are provided at one end. The openings are... Agent: Burr & Brown

20090242403 - Sensor element and gas sensor: A gas sensor element, wherein an amount of flexure in a first section extending in a longitudinal direction of the sensor element from the position 8/27 of a size of the element apart from one end of the element to the other end, is set to be greater than or... Agent: Burr & Brown

20090242405 - Bottom-up assembly of structures on a substrate: Examples of the present invention include methods of assembling structures, such as nanostructures, at predetermined locations on a substrate. A voltage between spaced-apart electrodes supported by substrate attracts the structures to the substrate, and positional registration can be provided the substrate using topographic features such as wells. Examples of the... Agent: Gifford, Krass, Sprinkle,anderson & Citkowski, P.c

20090242406 - Methods for fabricating electrokinetic concentration devices: The present invention provides a device and methods of use thereof in concentrating a species of interest and/or controlling liquid flow in a device. The methods make use of a device comprising a fluidic chip comprising a planar array of channels through which a liquid comprising a species of interest... Agent: Pearl Cohen Zedek Latzer, LLP

20090242407 - Electromagnetic field treatment method and electromagnetic field treatment equipment of water: For example, a coil 2 is provide on the outer side of a water pipe 1 of a water channel, water to be treated 3 is fed, and a specific alternating current having a specific frequency or a specific peak current is supplied from an AC power supply 4 to... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20090242408 - Photo-catalyst cleaning device: A photo-catalyst cleaning device includes a first photo-catalyst layer and a first electrode plate. The first photo-catalyst layer is capable of generating electrons and holes when absorbing excitation light. The first electrode plate is positioned corresponding to the first photo-catalyst layer. The first electrode plate is capable of polarizing the... Agent: PCe Industry, Inc. Att. Steven Reiss