Chemistry: electrical and wave energy inventions 10/06

20060237300 - Treatment of granular solids in a fluidized bed with microwaves: This invention relates to a method for the thermal treatment of granular solids in a fluidized bed (3, 3a) which is located in a fluidized-bed reactor (1, 1a), wherein microwave radiation is fed into the fluidized-bed reactor (1, 1a) through at least one wave guide (5), and to a corresponding...

20060237301 - Apparatus for producing nanocarbon, method for producing nanocarbon and method for collecting nanocarbon: In a nanocarbon manufacturing apparatus (183), a spray (181) is provided at a side face of a nanocarbon recovery chamber (119), and a mist (195) is sprayed on the entire nanocarbon recovery chamber (119) from the spray (181)....

20060237302 - Process for the physical depolymerization of glycosaminoglycanes and products obtained therefrom: The invention relates to a process for the depolymerization of glycosaminoglycanes characterized by the use of UVC radiation. The invention also relates to the intermediate depolymerized heparin obtained by the process. The intermediate depolymerized heparin can be dissolved in a buffer solution and fractionated by Gel Permeation for obtaining the...

20060237303 - Sputtering target, method of manufacturing a multilayer reflective film coated substrate, method of manufacturing a reflective mask blank, and method of manufacturing a reflective mask: A sputtering target is substantially made of ruthenium (Ru), has a sintered density of 95% or more, and contains oxygen (O) and carbon (C) each in an amount of 200 ppm or less....

20060237304 - Electroplating apparatus: An electroplating apparatus is provided which includes a solution tank which has at least a bottom plate and a side plate and inside which electroplating solution is poured and a cathode plate and an anode plate which are horizontally placed so as to face each other in the electroplating solution...

20060237305 - Electrolysis cell and structural elements to be used therein: The present invention concerns an arrangement of one or more structural elements (3) in a cell lining, in particular for use as a side lining in aluminium electrolysis cells (5). The present invention concerns in particular improvements to the design of and choice of materials for side linings designed to...

20060237306 - Hydrogen production apparatus: There is provided a hydrogen production apparatus which is easily to be manufactured and can obtain an excellent electrolytic efficiency. This apparatus comprises a solid polymer electrolyte membrane 2, a pair of rigid power feeders 3, 4, separators 5, 6, pressing means for pressing the separators 5, 6 and the...

20060237307 - Electrochemical processing cell: Embodiments of the invention may generally provide a small volume electrochemical plating cell. The plating cell generally includes a fluid basin configured to contain a plating solution therein, the fluid basin having a substantially horizontal weir. The cell further includes an anode positioned in a lower portion of the fluid...

20060237308 - Contact ring with embedded flexible contacts: A contact assembly for supporting a substrate in an electrochemical plating system, wherein that contact assembly includes a contact ring and a thrust plate assembly. The contact ring includes an annular ring member having an upper surface and a lower surface, an annular bump member positioned on the upper surface,...

20060237309 - Arc evaporator with a powerful magnetic guide for targets having a large surface area: A magnetic guide is presented that controls an electric arc between an anode and a cathode, which may be a target, over the whole cathode surface. The magnetic guide may be included in an arc evaporator and may include a first magnetic system having a group of permanent magnets located...

20060237311 - Immersion measuring probe: An immersion measuring probe, particularly a drop-in measuring probe for molten metal, is provided having a measuring head, on which at least one sensor carrier having at least one sensor is arranged. The sensor carrier is held at or in an opening in the measuring head. At or near the...

20060237310 - Interdigitated chemical sensors, and methods of making and using the same: The present invention relates to the field of chemical detection. More specifically, the invention provides devices that can detect various target analytes (e.g., chemicals and/or biological materials) present in an environment by adsorption or absorption of the target analyte(s) to or in a chemical sensing material such that an electrical...

20060237312 - Ion measurement/calibration cell: A measurement/calibration cell for potentiometrically measuring ion concentration in a fluid interposes a barrier between measuring and reference electrodes and positions the measuring electrode at a sufficiently higher gravimetric potential above the reference electrode that seepage of electrolyte from the latter to the former is effectively precluded. A controller associated...

20060237313 - Electrochemical sensor: An electrochemical sensor with at least one measuring electrode (3), at least one auxiliary electrode (7) and at least one reference electrode (5), wherein a protective electrode (6), which ensures at the reference electrode (5) the at least partial shielding of the reference electrode (5) against substances that would lead...

20060237315 - Gas sensor: A gas sensor 100 includes: a cylindrical metal shell 110; a gas detection element 120; a cylindrical sleeve 170 at least partially located inside the metal shell 110, and an axial hole 170c penetrating through the sleeve and accommodating the gas detection element 120 therein; and a connector 180 joined...

20060237316 - Methods of making gas sensors and sensors formed therefrom: In one embodiment, a method of making a sensor comprises: forming a slurry comprising a metal oxide, a binder, an acetate, and a reducing material, applying the slurry to at least a portion of a sensing element comprising two electrodes with an electrolyte disposed therebetween, and calcining the slurry to...

20060237314 - Solid-electrolyte sensing elements provided with a hollow element for thermal expansion: A sensor element having a layer-type construction is used to determine a physical quantity of a measurement gas, in particular to determine the concentration of a gas component of the measurement gas. The sensor element includes at least one heater and at least one measurement element. The heater is surrounded...

20060237317 - Rapid assembly casting system for slab gels: Flat plates serving as molds and enclosures for slab gels are held together by a clamping frame in which the side edges of the plates slide into facing channels and are clamped by lever-operated cams that compress the channel walls against the plate surfaces. The joined plates are held on...

20060237318 - Method and apparatus for decontamination of fluid: The invention relates to methods and devices for the decontamination of fluid, particularly the removal of heavy metals and/or arsenic and/or their compounds from water, by means of electrolysis, wherein the water to be purified subjected to electrodes of different polarities. The invention can include means for control of the...

20060231381 - Growth of and defect reduction in nanoscale materials: Methods by which the growth of a nanostructure may be precisely controlled by an electrical current are described here. In one embodiment, an interior nanostructure is grown to a predetermined geometry inside another nanostructure, which serves as a reaction chamber. The growth is effected by a catalytic agent loaded with...

20060231384 - Back-biased face target sputtering: A facing target sputtering device for semiconductor fabrication includes an air-tight chamber in which an inert gas is admittable and exhaustible; a pair of target plates placed at opposite ends of said air-tight chamber respectively so as to face each other and form a plasma region therebetween; a pair of...

20060231383 - Oscillating magnet in sputtering system: A multi-chamber processing system is described for depositing materials on multiple workpieces (wafers, display panels, or any other workpieces) at a time in a vacuum chamber. The system includes a sputtering chamber and a separate pre-clean chamber, where wafers can be transferred between the two chambers by a robotic arm...

20060231382 - Rotating pallet in sputtering system: A multi-chamber processing system is described for depositing materials on multiple workpieces (wafers, display panels, or any other workpieces) at a time in a vacuum chamber. The system includes a sputtering chamber and a separate pre-clean chamber, where wafers can be transferred between the two chambers by a robotic arm...

20060231385 - Device for controlling the travel distance of a chisel in a feeding system for an aluminium production electrolytic cell: Device for equipment of a cell (1) comprising an electrolytic bath (4) covered with a crust (5), with a chisel (13) that can be moved vertically between a high position in which it is above the crust (5) and a low position in which the crust (5) is perforated and...

20060231386 - Solid polymer membrane-type water-electrolysis apparatus: A solid polymer membrane-type water-electrolysis apparatus according to the present invention includes a solid polymer electrolyte membrane, an oxygen electrode mounted in contact with one side of the solid polymer electrolyte membrane, a hydrogen electrode mounted in contact with the other side of the solid polymer electrolyte membrane, separator plates...

20060231387 - Electrode for use in hydrogen generation: An electrode for use in hydrogen generation comprising a conductive base and a coating layer formed thereon of a composition obtainable by thermally decomposing, in the presence of an organic acid, a mixture comprising at least one type of platinum compound....

20060231388 - Multi-station sputtering and cleaning system: A multi-chamber processing system is described for depositing materials on multiple workpieces (wafers, display panels, or any other workpieces) at a time in a vacuum chamber. The system includes a sputtering chamber and a separate pre-clean chamber, where wafers can be transferred between the two chambers by a robotic arm...

20060231389 - Insulated pallet in cleaning chamber: A multi-chamber processing system is described for depositing materials on multiple workpieces (wafers, display panels, or any other workpieces) at a time in a vacuum chamber. The system includes a sputtering chamber and a separate pre-clean chamber, where wafers can be transferred between the two chambers by a robotic arm...

20060231390 - Temperature control of pallet in sputtering system: A multi-chamber processing system is described for depositing materials on multiple workpieces (wafers, display panels, or any other workpieces) at a time in a vacuum chamber. The system includes a sputtering chamber and a separate pre-clean chamber, where wafers can be transferred between the two chambers by a robotic arm...

20060231392 - Cross-contaminant shield in sputtering system: A multi-chamber processing system is described for depositing materials on multiple workpieces (wafers, display panels, or any other workpieces) at a time in a vacuum chamber. The system includes a sputtering chamber and a separate pre-clean chamber, where wafers can be transferred between the two chambers by a robotic arm...

20060231391 - Top shield for sputtering system: A multi-chamber processing system is described for depositing materials on multiple workpieces (wafers, display panels, or any other workpieces) at a time in a vacuum chamber. The system includes a sputtering chamber and a separate pre-clean chamber, where wafers can be transferred between the two chambers by a robotic arm...

20060231394 - Cylindrical ac/dc magnetron with compliant drive system and improved electrical and thermal isolation: An AC/DC cylindrical magnetron with a drive system that absorbs large variations in the rotation of the target tube, an efficient high capacity electrical transfer system, and improved electrical isolation....

20060231393 - Target backing plate for sputtering system: A multi-chamber processing system is described for depositing materials on multiple workpieces (wafers, display panels, or any other workpieces) at a time in a vacuum chamber. The system includes a sputtering chamber and a separate pre-clean chamber, where wafers can be transferred between the two chambers by a robotic arm...

20060231395 - Control for an excimer emitter: A control for an excimer emitter, particularly for the dryer in a printing press, comprises an HF generator that is connected on the output side to an excimer emitter. To enable a higher UV intensity of radiation, the HF generator (1) is provided in the form of a tube-type generator...

20060231396 - Thin analyzing device: The present invention relates to an analysis tool (1) including a reaction space (6) for holding a sample liquid and in which a reagent portion (33) is disposed. The reagent portion (33) is constituted so as to dissolve when a sample liquid is held in the reaction space (6). Part...

20060231397 - Porous electrode and process of producing the same: A technology which makes it possible to prolong the service life of a porous electrode constituted by a sintered body of an electrode metal material and a ceramic material, and the service life of an NOx sensor element having the porous electrode. The porous electrode is produced so as to...

20060231398 - Microfluidic method and device for transferring mass between two immiscible phases: A method of transferring mass of at least one solute between a liquid first phase and a fluid second phase that is immiscible with the first phase, the method comprising moving at least one droplet of said liquid first phase in a microfluidic device by using electric-type forces (electrowetting or...

20060231399 - Single-wall carbon nanotube compositions: The invention relates to a process for sorting and separating a mixture of (n, m) type single-wall carbon nanotubes according to (n, m) type. A mixture of (n, m) type single-wall carbon nanotubes is suspended such that the single-wall carbon nanotubes are individually dispersed. The nanotube suspension can be done...

20060231400 - Electrophoretic apparatus and electrophoretic method: The present invention relates to detection of an emission spectrum by irradiating excitation light onto a plurality of electrophoretic paths and dispersing fluorescent light output from the electrophoretic paths in a direction approximately vertical to an electrophoretic direction. According to the invention, since an emission spectrum to be detected does...

20060231401 - Image display panel manufacturing method, image display device manufacturing method, and image disiplay device: In the case of filling and setting the liquid powders or the particles in a plurality of cells formed by the partition walls on the substrate, the method includes the steps of: setting a nozzle at an upper portion of a container; setting the substrate, on which the partition walls...

20060231402 - Method for producing metallic moulded bodies comprising a ceramic layer, metallic moulded body, and the use of the same: The invention relates to a method for producing metallic moulded bodies comprising a ceramic layer according to the membrane method, whereby a porous metallic membrane is used. The invention also relates to a metallic moulded body comprising a ceramic layer and to the use of one such metallic moulded body....

20060231403 - Chambered electrodeionization apparatus with uniform current density, and method of use: The present invention pertains to a specialized electrodeionization (EDI) apparatus that includes at least 5 chambers and to a method of using this apparatus. The EDI of the present invention (1) is a continuous EDI (CEDI) apparatus, with constant regeneration of ion exchange materials; (2) has improved removal of all...

20060231404 - Method of ion chromatography wherein a specialized electrodeionization apparatus is used: The present invention pertains to a method of ion chromatography wherein a specialized electrodeionization (EDI) apparatus is used for (1) the preparation of a pure acid or pure base for use as an eluent in a chromatographic separation column and/or (2) for ion suppression (or neutralization) of the acid or...

20060231405 - Device for dielectrophoretic manipulation of particles: A device for dielectrophoretic manipulation of suspended particulate matter comprises a plurality of interleaved layers of electrically conductive and non-conductive material wherein at least one channel is defined through a plurality of the interleaved layers of electrically conductive material....

20060231406 - Regeneration of adsorption media within electrical purification apparatuses: The present disclosure generally relates to methods, systems, and devices for electrically purifying liquids containing species such as minerals, salts, ions, organics, and the like. One aspect of the invention provides an electrical purification apparatus, including an electrodeionization device. The electrodeionization device may be run in any suitable fashion, for...

20060225997 - Magnetron with in-situ cleaning target and its application method: This invention provides a magnetron and its application method. The magnetron has a function of in-situ cleaning and can be used to prevent the pollution problem during the ion etching and cleaning. The target of the magnetron can be rotated around its central axis by controlling the inner magnetic field...

20060225998 - Direct ion beam deposition method and system: Disclosed herein is a direct ion beam deposition method through ion beam sputtering. The method comprises the steps of: a) providing a workpiece on which a certain material is to be deposited with a certain desired thickness; b) providing a deposit material having a certain area from which the deposit...

20060225999 - Ti oxide film having visible light-responsive photocatalytic activites and process for its production: A Ti oxide film formed on a substrate, characterized in that when a voltage is applied to the Ti oxide film while the Ti oxide film is irradiated with light of a xenon lamp having a luminance of 100 mW/cm2 and having ultraviolet light of less than 400 nm cutoff,...

20060226000 - Microelectronic workpiece holders and contact assemblies for use therewith: The invention provides an improved contact ring and an improved workpiece support, each of which is useful alone or jointly with the other in a workpiece holder for electrochemically treating microelectronic workpieces. Several embodiments of the invention provide a composite contact ring having a dielectric base carrying a conductor which...

20060226001 - Heat and electromagnetic wave generator: The system presented is an electrolytic cell and system for electrolysizing and/or heating a fluid electrolyte containing hydrogen in one of its several isotopic and compound forms having a conductive solution electrolyte. The electrolytic cell includes an electrically conductive electrode prepared of selected metals and/or their alloys. The cell is...

20060226002 - Insoluble anode: The invention relates to an insoluble anode for electrolytic plating, the insoluble anode having two or more phases comprising an anode base body and a screen wherein the anode base body of steel, stainless steel, nickel, nickel alloy, cobalt, and cobalt alloy....

20060226003 - Apparatus and methods for ionized deposition of a film or thin layer: A coil assembly (200) is described herein that comprises a) at least one coil (220) with a width (240); and b) at least one boss (210) coupled to the at least one coil, wherein the at least one boss comprises at least two support sections. Methods of forming and/or producing...

20060226004 - Machine for coating a substrate, and module: A machine for coating a transparent substrate for the production of display screens comprises a coating chamber that has a modular design. Each of the modules 1 features a chamber section 2, a first support 3 that is arranged removably in or at the chamber section 2, and a second...

20060226005 - Aluminum-based sputtering targets: An Al-based sputtering target mainly containing Al has a total number of concave defects having largest depths of 0.2 μm or more and equivalent area diameters of 0.2 μm or more of 45000 or less per square millimeter of unit surface area of a surface of the sputtering target corresponding...

20060226006 - Enzymatic electrochemical-based sensor: An enzymatic electrochemical-based sensor includes a substrate and a conductive layer formed from a dried water-miscible conductive ink. The water-miscible conductive ink used to form the conductive layer includes a conductive material, an enzyme, a mediator, and a binding agent and is formulated such that the water-miscible conductive ink is...

20060226007 - Method for manufacturing an enzymatic electrochemical-based sensor: A method for manufacturing a portion of an enzymatic electrochemical-based sensor includes applying a water-miscible conductive ink to a substrate of an enzymatic electrochemical-based sensor. The water-miscible conductive ink includes a conductive material, an enzyme, a mediator, and a binding agent (that becomes operatively water-insoluble upon drying) formulated as a...

20060226008 - Water-miscible conductive ink for use in enzymatic electrochemical-based sensors: A water-miscible conductive ink for use in enzymatic electrochemical-based sensors includes a conductive material, an enzyme, a mediator and a binding agent. The conductive material, enzyme, mediator, and binding agent are formulated as a water-miscible aqueous-based dispersion wherein the binding agent becomes operatively water-insoluble upon drying....

20060226009 - Probe: A measuring sensor is described for determining a physical property of a measured gas, especially for determining the oxygen concentration or the pollutant concentration in the exhaust gas of internal combustion engines, which has a sensor element that is exposable to the measured gas which is at least partially coated...

20060226010 - Integrated 2d gel electrophoresis method and system: Described is a process for the separation of a sample mixture for analytical reason based on two-dimensional gel electrophoresis. The method is involving a first separation in a first gel strip on the basis of isoelectric points and a second separation in a second gel on the basis of molecular...

20060226011 - Electrodeposition painting method and throughflow system for carrying out said method: Method of electrocoating substrates using an electrocoating tank, wherein the substrates are connected as cathode or anode....

20060226012 - Integrated microfluidic transport and sorting system: The invention integrates a two-stage dielectrophoretic (DEP) droplet dispensing and distribution system with particulate DEP to create a novel LOC platform capable of manipulating biological cells based on the varied dielectrophoretic signatures that distinguish cells in a population, for example, healthy from diseased cells. The two-stage DEP droplet transport system...

20060226013 - Manipulation of objects with fluid droplets: A system for manipulation of a small object comprises a carrier to transport the small object to a substrate to receive the small object. A fluid droplet which couples the small object detachably to the carrier and/or to the substrate. The coupling of the small object to the fluid droplet...

20060219546 - Concentration-graded alloy sputtering target: A sputtering target comprising a concentration-graded alloy is utilized to achieve a uniform seed layer across a microelectronic wafer for the formation of microelectronic device interconnects. The concentration-graded alloy sputtering target achieves the substantially uniform seed layer by counteracting the affects of a sputtering system which would normally result in...

20060219547 - Vertical production of photovoltaic devices: The present invention provides a photovoltaic thin-film solar cell produced by a providing a vertically oriented pallet based substrate to a series of reaction chambers where layers can be sequentially formed on the pallet....

20060219549 - Sputtering target of silver alloy for producing reflection layer of optical recording medium: Ag alloy sputtering target of the invention comprises (1) an Ag alloy containing 0.1 to 20 wt % of Zn, 0.1 to 3 wt % of Al, and a balance of Ag, (2) an Ag alloy containing 0.1 to 20 wt % of Zn, 0.1 to 3 wt % of...

20060219550 - Magnet arrangement for a planar magnetron: A magnetic arrangement for a planar magnetron, in which an initial magnetic pole encompasses a second magnetic pole. This magnetic arrangement is moved linear in longitudinal direction to a target by a specific value and then moved back in opposite direction by the same value. In one version, an additional...

20060219548 - Magnetron: Disclosed herein is a magnetron. The magnetron comprises an anode cylinder, upper and lower magnets provided to upper and lower portions of the anode cylinder, and upper and lower magnetic poles connected to the magnets, respectively. Each of the magnets has an inner diameter of 19˜21 mm, a thickness of...

20060219551 - Electrochemical test sensor: Disclosed is an electrochemical sensor for the determination of analytes in body fluids, e.g. glucose in blood. The sensor involves a non-conductive base which provides a flow path for the body fluid with the base having a working and counter electrode on its surface which are in electrical communication with...

20060219553 - Gas detection apparatus, gas-sensor control circuit used for gas detection apparatus, and inspection method for gas detection apparatus: A gas detection apparatus including a gas sensor element and a gas-sensor control circuit. The gas sensor element includes at least one sensor cell including a solid electrolyte member and a pair of electrodes, and external connection terminals electrically connected to the electrodes. The gas-sensor control circuit includes control terminals...

20060219552 - Gas sensor: A gas sensor which includes walls delimiting a gas detection chamber, and having an introduction port (or an inlet) through which an observed gas is introduced into the gas detection chamber, a measuring element disposed in the gas detection chamber and measuring concentration of a subject gas contained in the...

20060219554 - Gas sensor element, method for manufacturing the same, and gas sensor: A method for manufacturing a gas sensor element (300), which includes a plate-like second solid electrolyte member (109), a fourth electrode (110) formed on the second solid electrolyte member (109), and a protection layer (111) including a reinforcement member (112) having an insertion hole (112a), and a porous electrode protection...

20060219555 - Gas sensor control unit: A gas sensor control unit (1) including a single signal-switching and outputting circuit (33) adapted for switching and outputting plural signals transmitted from plural gas sensors (8,9)....

20060219556 - Vortex-stabilized electrophoretic devices and methods: A vortex-stabilized electrophoretic processor comprises an annular processing chamber at least partly defined by concentric first and second processing chamber surfaces. At least one of the processing chamber surfaces is rotatable relative to the other processing chamber surface. The electrophoretic processor further comprises an electric field generator operative to be...

20060219557 - Methods and systems for reducing background signal in assays: Methods and systems of monitoring reactions, e.g., assays, that filter out background signal from substrate, in detecting the product. The methods and systems controllably move detectable reaction product from a first location to a second location at which the product is detected while controllably moving potentially interfering substrate materials away...

20060219558 - Improved methods and devices for concentration and fractionation of analytes for chemical analysis including matrix-assisted laser desorption/ionization (maldi) mass spectrometry (ms): A device for pre-concentration and purification of analytes from biological samples, such as human serum, to be analyzed by Matrix-Assisted Laser Desorption Ionization Mass Spectrometry (MALDI MS) and methods of use thereof are provided....

20060219559 - Capillary array and capillary electrophoresis apparatus: In a case where the temperature of capillaries cannot be controlled rapidly in accordance with the change of the amount of heat generated from the capillaries, the phoretic speed of the sample is not controlled constant to lower the analyzing performance for the sample. This invention intends to stabilize the...