Chemistry: electrical and wave energy inventions 04/06

20060086604 - Organism inactivation method and system: The invention utilizes multiple frequency ultrasound generators driving multiple frequency harmonic transducer arrays at sweeping frequencies. Generator signals that increase cavitation efficiency and that have successive time periods with predominantly stable cavitation and predominantly transient cavitation further improve the performance of the cleaning, microbiological inactivation, sonochemistry or processing systems. Probes...

20060086603 - Radio frequency hydrogen and oxygen generator and method: The present invention includes a method and device for generating hydrogen and oxygen from water using the heterodyning or impacting of two radio frequencies, one higher than the other with one of the radio frequencies being in the ultra high radio frequency bandwidth (UHF) and the other being in the...

20060086605 - Method for magnetron sputtering: The invention relates to a method for enhancing erosion uniformity on the sputtering surface of a magnetron cathodic sputtering target. The invention is characterised in that it consists in adding to said target intended to be coupled to a magnetron maintained fixed as compared to this target, at least one...

20060086606 - Method for manufacturing perpendicular magnetic recording medium: Embodiments of the invention provide a manufacturing method which permits a high quality perpendicular magnetic recording medium to be manufactured with a high yield by preventing abnormal discharge which sputters particles from the target. In one embodiment, while the perpendicular magnetic recording medium is formed, DC pulses are applied to...

20060086607 - Aluminum production installation employing fused-salt electrolysis: The invention relates to an electrolysis installation, intended for the production of aluminium based on igneous electrolysis, comprising a potroom, a plurality of electrolytic cells arranged inside the potroom, a service aisle parallel to the line of cells and located inside the potroom, and at least one first mobile lifting...

20060086608 - Contact ring design for reducing bubble and electrolyte effects during electrochemical plating in manufacturing: A contact ring for use in electroplating of a substrate material is constructed such that fluid (e.g., electrolyte) is allowed to flow radially away from the axis of a toroidal support ring, thus preventing the trapping of fluids between the substrate and the toroidal support ring. The contact ring is...

20060086609 - Current-leveling electroplating/electropolishing electrode: A current-leveling electrode for improving electroplating and electrochemical polishing uniformity in the electrochemical plating or electropolishing of metals on a substrate is disclosed. The current-leveling electrode includes a base electrode and at least one sub-electrode carried by the base electrode. The at least one sub-electrode has a width which is...

20060086610 - Ge-cr alloy sputtering target and process for producing the same: A Ge—Cr alloy sputtering target containing 5 to 50 at % of Cr and having a relative density of 95% or more, and a manufacturing method of such a Ge—Cr alloy sputtering target wherein Cr powder having a minus sieve of 75 μm or less, and Ge powder having a...

20060086611 - Preconcentration interface coupling liquid chromatography to capillary electrophoresis: An arrangement for two-dimensional separation of a complex analyte mixture is provided comprising a first separation device for the separation in a first dimension and a second device for the separation in the second dimension. In the area of the interface between the first and the second device a concentration...

20060086612 - Capillary electrophoretic instrument and capillary array assembly: The troublesomeness during the setting of a plurality of capillaries is eliminated by composing pairs of electrodes, which are electrically connected to the common electrode, and capillaries. By bringing electrodes installed in the vicinity of each capillary disposed at the pitch of wells on the side of sample plate (within...

20060086613 - Electrophoresis apparatus using capillary array and sample plate assembly used therefor: A sample plate assembly for an electrophoresis apparatus including a tray at a sample supply portion of a capillary array, an adapter for the tray, a sample plate mounted on the adapter, a septer mounted on the sample plate and a septer holder mounted on the septer. Thereby, many number...

20060081457 - Method of making coated article having ir reflecting layer with predetermined target-substrate distance: A coated article is provided, where a coating is supported by a substrate. The coating may include at least one infrared (IR) reflecting layer of or including Ag, Au or the like. The IR reflecting layer(s) may be sandwiched between first and second dielectric layers in certain example embodiments of...

20060081458 - Methods and apparatus for sputtering: A method of sputtering with sputtering apparatus is for depositing a layer upon a substrate. The apparatus includes a sputter target with a face exposed to the substrate and a magnetron providing a magnetic field that moves relative to the target face. The speed of movement of the field is...

20060081459 - In-situ monitoring of target erosion: A target sputtering apparatus capable of monitoring target erosion has a sputtering chamber having a sputtering target with a sputtering surface. The apparatus can have a wireless receiver to receive a wireless signal and a controller to control the receiver and components of the sputtering chamber to sputter-deposit material on...

20060081460 - Method and apparatus for electrochemical planarization of a workpiece: An electrochemical planarization apparatus for planarizing a metallized surface on a workpiece includes a polishing pad and a platen. The platen is formed of conductive material, is disposed proximate to the polishing pad and is configured to have a negative charge during at least a portion of a planarization process....

20060081461 - Electroless plating apparatus and method: An electroless plating solution includes a first liquid chemical containing a metal salt and a second liquid chemical containing a reducing agent. In respective liquid chemical supply lines, liquid chemical opening/closing units are installed in the vicinity of a junction therebetween, and at the same time, a plating solution opening/closing...

20060081462 - Electrode for electric discharge surface treatment, method for manufacturing electrode, and method for storing electrode: An electrode for electric discharge surface treatment, in which a pulse-like electric discharge is caused between the electrode and a work in a dielectric fluid or an atmosphere, and in which a coat of an electrode material or a substance that is generated by a reaction of the electrode material...

20060081463 - Sputtering device: This invention is a sputtering device comprising at least: a vacuum container defining a vacuum space; a substrate holder installed rotatably in said vacuum space; a substrate installed on said substrate holder; a target for forming thin film on said substrate; and a rotatable sputtering cathode in which said target...

20060081465 - Assembly for sputtering aluminum-neodymium alloys: i

20060081464 - Backing plates for sputtering targets: A backing plate for sputtering targets contains an aluminum alloy having an average coefficient of linear expansion of 23.0×10−6/° C. or less at temperatures of 25° C. to 100° C. This backing plate prevents warp occurring upon bonding with a target, reduces stress occurring upon film deposition (sputtering) of Al—Nd...

20060081466 - High uniformity 1-d multiple magnet magnetron source: A plasma sputter reactor includes a vacuum chamber; a pedestal for supporting a substrate in said vacuum chamber; a sputtering target positioned in opposition to said pedestal; and a magnetron positioned on a side of said target opposite said sputtering target, the magnetron having magnets providing a race-track beam....

20060081467 - Systems and methods for magnetron deposition: Systems and methods are disclosed for face target sputtering to fabricate semiconductors by an air-tight chamber in which an inert gas is admittable and exhaustible; a first cylindrical target plate; inner and outer cylindrical magnets respectively disposed adjacent to the cylindrical target plate such that magnet poles of different polarities...

20060081468 - Magnetic latch for a vapour deposition system: The invention relates to a magnetic latch for securing substrates on a planetary rotating platform suspended above a coating source in a vacuum chamber of a vapor deposition system, e.g. a chemical vapor deposition (CVD) system or a physical vapor deposition (PVD) system. The magnetic latch includes a permanent magnetic,...

20060081469 - Battery pack of a mobile communication terminal to be capable of reading output of bio-sensors and self-diagnosis system: A battery pack for self-diagnosis and a system using the same, which can read a data value from a body fluid sensor (referred to as a biosensor) reacting with body fluid such as urine, and indicate a measurement value of a test item such as a blood glucose level, a...

20060081470 - Electrochemical sensing circuit having high dynamic range: An electronic sensing circuit for an electrochemical gas sensor cell providing high dynamic range is described. The electronic circuit utilizes an amplifier with a resistive feedback element to provide high sensitivity linear sensing of low detected gas concentrations. The electronic circuit also provides the ability to source sufficient current to...

20060081471 - Multiparameter system for environmental monitoring: A miniature, lightweight, inexpensive, environmental monitoring system containing a number of sensors that can simultaneously and continuously monitor fluorescence, absorbance, conductivity, temperature, and several ions. Sensors that monitor similar parameters can cross-check data to increase the likelihood that a problem with the water will be discovered....

20060081472 - Gas sensor: A gas sensor is used for detecting a physical property of a measuring gas, preferably for determining the oxygen concentration of an exhaust gas of an internal combustion engine. The gas sensor includes a layered sensor element which has a measuring gas space, in which an electrode on a solid...

20060081473 - Resistive type oxygen sensor and air/fuel ratio control system using it: A resistance-type oxygen sensor which is provided to be used mainly for measuring the oxygen gas partial pressure of automobile exhaust gas, and which has a short output response time in response to changes in oxygen partial pressure, low resistivity of the oxide semiconductor, and low temperature dependence of the...

20060081474 - Methods and apparatus for the location and concentration of polar analytes using an alternating electric field: A method is disclosed for effecting the concentration of a polar analyte in an alternating electric field. In the method, a relative translation of the polar analyte and an alternating electric field along a translation path is effected. A portion of the polar analyte is then trapped and concentrated in...

20060076229 - Magnetic activated carbon and the removal of contaminants from a fluid streams: Magnetic activated carbon and the removal of contaminants from a fluid stream using the magnetic activated carbon is described. The magnetic activated carbon is preferably magnetic powdered activated carbon and may contain titania. The magnetic activated carbon (10) may be used to remove contaminants such as mercury from fluid streams...

20060076232 - Magnetron having continuously variable radial position: A continuously variable multi-position magnetron that is rotated about a central axis in back of a sputtering target at a freely selected radius. The position is dynamically controlled from the outside, for example, through a hydraulic actuator connected between a pivoting arm supporting the magnetron and an arm fixed to...

20060076231 - Method for magnetron sputter deposition: A method for depositing a coating on an interior surface of a hollowed workpiece. The method comprises providing the hollowed workpiece in a vacuum chamber, the hollowed workpiece comprising an interior surface substantially defining a bore having a longitudinal axis; positioning a magnetron within thed bore along substantially the length...

20060076230 - Sputtering target fixture: A method and apparatus for sputter deposition. The method including: providing a sputter target having a back surface and an exposed front surface; providing a source of magnetic field lines, the magnetic field lines extending through the sputter target from the back surface to the exposed front surface of the...

20060076233 - Magnetic recording medium and method for production thereof: A reactive sputtering method is provided for producing a magnetic layer in a stable manner with good reproducibility. One aspect of the invention is to form a magnetic layer for a magnetic recording medium without adversely affecting magnetic properties. Carbon oxide gas is added at the time of reactive sputtering....

20060076234 - Non-planar sputter targets having crystallographic orientations promoting uniform deposition: A non-planar sputter target having differing crystallographic orientations in portions of the sputter target surface (25) that promote more desirable deposition and density patterns of material sputtered from the target surface onto a substrate is disclosed. A closed dome (22) end of the sputter target (20) is comprised of a...

20060076235 - System and apparatus for magnetron sputter deposition: A magnetron sputter coating apparatus is provided for coating the interior surface of a hollowed workpiece with sputter material from a sputter target material having a longitudinal bore. The apparatus includes a magnet assembly positionable substantially within a sputter target material disposed within workpiece and radially inward of the interior...

20060076236 - Fabrication of multi-sensor arrays: The disclosure provides methods for fabricating a long-term analyte sensor for measuring at least one analyte in the body of a user. The analyte sensors made by these methods include a plurality of analyte contacting sensor elements and at least one structure for relaying information to and from the sensor....

20060076237 - Coated hydrophilic membrances for electrophoresis applications: The present invention is directed to an electrophoresis gel plate for analysing or separating macromolecules in a mixture comprising a polymerised gel matrix supported by a hydrophilic microporous membrane....

20060076238 - Field emission devices using ion bombarded carbon nanotubes: The present invention relates to a field emission device comprising an anode and a cathode, wherein said cathode includes carbon nanotubes which have been treated with an ion beam. The ion beam may be any ions, including gallium, hydrogen, helium, argon, carbon, oxygen, and xenon ions. The present invention also...

20060076239 - Electrophoresis apparatus: In an electrophoresis apparatus comprising capillaries for containing therein fluorescence-labeled substances, and a sensor for irradiating the capillaries with exciting light and detecting fluorescences, the sensor has a substrate including a datum surface for holding thereon the capillaries, and a groove sinking from the datum surface, and the groove has...

20060070868 - Method for manufacturing isotope-doped carbon nanotubes: A method for manufacturing isotope-doped carbon nanotubes (10) includes the steps of: (a) providing a carbon rod (209) connected with an anode (214) of an electrical source, the carbon rod including at least two kinds of carbon isotope segments (202, 203) arranged therealong according to need; (b) providing a pure...

20060070870 - Flexible extruded plastic profile, especially plastic tube and method for producing the same: A method for making the plastic profile comprising depositing an inner thin film with a metallic appearance onto the surface of the flexible extruded plastic profile depositing an outer protective cover layer that is at least partially transparent onto the inner thin film wherein the inner thin film and the...

20060070869 - Thin film coating and temporary protection technology, insulating glazing units, and associated methods: The present invention in some embodiments provides sputter deposition techniques for applying thin film and thereafter applying over the sputtered film a temporary protective film. The thin film can optionally be applied by sputtering a target in a gaseous sputtering atmosphere containing an oxidizing gas and/or an inert gas. The...

20060070871 - Cathodic protection system for underground storage tank: There is provided a method for implementing a cathodic protection system for an underground storage tank. A DC voltage source provides a test current between the installed anode and storage tank resulting in the flow of electrical current. If the output is above a defined value, an automatic control DC...

20060070872 - Pad design for electrochemical mechanical polishing: A method and apparatus for processing a substrate by electrochemical mechanical planarization and electrochemical mechanical plating is disclosed. Included are various embodiments of a processing pad article comprising an open cell foam subpad that is adapted to retain an electrolyte while encountering centrifugal motion, and simultaneously provide electrical and/or abrasive...

20060070873 - Expandable anodes for chlor-alkali diaphragm cells: An adjustable elastic element (19) for forcing the surfaces of expandable-type anodes for diaphragm chlor-alkali cells wherein such element consists of a U-shaped elastic sheet provided with at least one adjusting mechanism comprising both one collar (29) which fastens the elastic sheet through openings obtained in the sheet itself and...

20060070874 - Hydrogen evolving cathode: Highly active hydrogen evolving cathode using a platinum group metal catalyst in an amount smaller than that used in the conventional hydrogen evolving cathode. The hydrogen evolving cathode includes a conductive substrate, and a catalyst layer comprising at least one selected from the group consisting of silver and a silver...

20060070875 - Coils for generating a plasma and for sputtering: A sputtering coil for a plasma chamber in a semiconductor fabrication system is provided. The sputtering coil couples energy into a plasma and also provides a source of sputtering material to be sputtered onto a workpiece from the coil to supplement material being sputtered from a target onto the workpiece....

20060070876 - Physical vapor deposition target constructions: The invention includes a target construction having a sputtering region and a flange region laterally outward relative to the sputtering region. The flange region has a front surface disposed on a front face of the construction and a back surface opposing the front surface. An o-ring groove is disposed within...

20060070877 - Magnetron sputtering device: The present invention relates to a magnetron sputtering device and technique for depositing materials onto a substrate at a high production rate in which the deposited films have predictive thickness distribution and in which the apparatus can operate continuously and repeatedly for very long periods. The present invention has realized...

20060070878 - Electrochemical biosensor strip: An electrochemical biosensor strip has a base, an electrode system, a spacer and a cover. The electrode system is laid on the base and preferably comprises at least three electrodes. There is a short circuit formed between two selected electrodes of the at least three electrodes. The spacer is laid...

20060070879 - Method and apparatus for programmable fluidic processing: A method and apparatus for microfluidic processing by programmably manipulating a packet. A material is introduced onto a reaction surface and compartmentalized to form a packet. A position of the packet is sensed with a position sensor. A programmable manipulation force is applied to the packet at the position. The...

20060070880 - Methods and apparatus for manipulating separation media: Methods and apparatus for manipulating separation media in the context of filling one or more capillaries with a separation medium for electrophoresis. A polymer-displacement pump system and method for reciprocating a pump piston in a first direction to draw fresh fluid into a chamber, and reciprocating the pump piston in...