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  Centralized control architecture for a plasma arc systemUSPTO Application #: 20060108333Title: Centralized control architecture for a plasma arc system Abstract: Apparatus, systems, and methods for monitoring the processing of a workpiece that includes directing an incident laser beam onto the workpiece and using an optical detector for measuring a signal emitted from the workpiece as a result of the incident laser beam. The detector generates at least two signals based upon the optical signal. The method also involves use of a light source monitor in determining workpiece processing quality based upon the quotient of the two outputs as well as a magnitude of one of the two quotients. (end of abstract) Agent: Proskauer Rose LLP - Boston, MA, US Inventors: Tate S. Picard, Kenneth J. Woods, Roger E. Young, William J. Connally USPTO Applicaton #: 20060108333 - Class: 219121620 (USPTO) Related Patent Categories: Electric Heating, Metal Heating (e.g., Resistance Heating), By Arc, Using Laser, Beam Energy Control, Condition Responsive The Patent Description & Claims data below is from USPTO Patent Application 20060108333. Brief Patent Description - Full Patent Description - Patent Application Claims
RELATED APPLICATIONS [0001] This application is a continuation-in-part of U.S. Ser. No. 09/546,155, filed on Apr. 10, 2000. This application claims priority to and incorporates by reference in its entirety U.S. Ser. No. 09/546,155. FIELD OF THE INVENTION [0002] The present invention relates to a centralized control architecture for operating a material processing system. BACKGROUND OF THE INVENTION [0003] Material processing apparatus, such as lasers and plasma arc torches, are widely used in the cutting, welding, and heat treating of metallic materials. A laser-based apparatus generally includes a nozzle through which a gas stream and laser beam pass to interact with a workpiece. Both the beam and the gas stream exit the nozzle through an orifice and impinge on a target area of the workpiece. The laser beam heats the workpiece. The resulting heating of the workpiece, combined with any chemical reaction between the gas and workpiece material, serves to heat, liquefy and/or vaporize a selected area of workpiece, depending on the focal point and energy level of the beam. This action allows the operator to cut or otherwise modify the workpiece. [0004] Similarly, a plasma arc torch generally includes a cathode block with an electrode mounted therein, a nozzle with a central exit orifice mounted within a torch body, electrical connections, passages for cooling and arc control fluids, a swirl ring to control fluid flow patterns in the plasma chamber formed between the electrode and nozzle, and a power supply. The torch produces a plasma arc, which is a constricted ionized jet of a plasma gas with high temperature and high momentum that exits through the nozzle orifice and impinges on the workpiece. Gases used in the torch can be non-reactive (e.g., argon or nitrogen), or reactive (e.g., oxygen or air). [0005] It is generally desirable that the results of any material processing be of high quality. For example, the edges of the cut kerf produced by laser and plasma cutting should be dross-free, smooth, straight and uniform. Edge irregularities caused by, for example, uneven heating of the workpiece by the laser, excessive chemical reactions between the assist gas and workpiece, or incomplete removal of cutting debris, should be minimized. [0006] Presently, the operation of CNC-controlled plasma arc or laser cutting systems typically requires several manual parameter adjustments to achieve workpiece processing results of desired quality. Consequently, users typically choose conservative values of process parameters to ensure process reliability over a wide range of operating conditions. The tradeoff often results in an accompanying decrease in material processing productivity (e.g., due to a reduced cutting speed in laser cutting). For more aggressive process parameters to be used, a reliable and automated means of monitoring the cutting process is necessary, which could alert the user to degradation in the quality of the cut in real time. Such a system could also be required to adjust to changes in operating conditions to maintain optimal process performance, i.e., good cut quality and maximum productivity. SUMMARY OF THE INVENTION [0007] In one aspect, the present invention relates to a control architecture for a material processing system. In particular, in one embodiment, the invention relates to a centralized control architecture for a laser beam cutting system, in which the "intelligence" of the system is integrated into a single controller. In another embodiment, the invention relates to a centralized control architecture for a plasma arc cutting system, in which the "intelligence" of the system is integrated into a single controller. [0008] In one aspect, the invention features a method of controlling an integrated laser beam system. According to one embodiment of the method, a first group of process parameters are input into a controller. A second group of process parameters are generated based on the first group of process parameters. At least one command signal is provided from the controller to at least one auxiliary device to control an output parameter generated by the at least one auxiliary device. At least one auxiliary device is either an energy source or an automatic process controller. The output parameter generated by the auxiliary device is detected and the command signal provided to the auxiliary device is adjusted based on the detected output parameter. [0009] In another aspect, the invention features a method of controlling an integrated material processing stream system. In one embodiment, the material processing stream is a laser beam. In another embodiment, the material processing stream is a plasma arc. [0010] At least one auxiliary device can be the automatic process controller. The pressure of gas exiting the automatic process controller can be detected and the command signal provided to the automatic process controller for controlling the gas flow can be adjusted based on the pressure. At least one auxiliary device can be the energy source for the laser beam. A feedback signal generated by the energy source indicative of an energy beam of the laser system can be detected and the command signal provided to the energy source for controlling the energy beam of the laser system can be adjusted based on the feedback signal. [0011] At least one auxiliary device can include a first auxiliary device and a second auxiliary device. A first output parameter generated by the first auxiliary device can be detected and the command signal provided to the second auxiliary device can be adjusted based on the first output parameter. For example, the first auxiliary device can be the automated process controller and the second auxiliary device can be the energy source for a laser beam. The pressure of an outlet gas exiting the automated process controller can be detected and the command signal provided to the energy source for controlling laser beam energy can be adjusted based on the pressure. A feedback signal generated by the energy source indicative of an energy beam of the laser system can be detected and the command signal provided to the automatic process controller for controlling the gas flow can be adjusted based on the feedback signal. Alternatively, the first auxiliary device can be the energy source and the second auxiliary device can be a laser height controller. The feedback signal generated by the energy source can be detected and the command signal provided to the laser height controller for controlling a standoff can be adjusted based on the feedback signal. BRIEF DESCRIPTION OF THE DRAWINGS [0012] The foregoing and other objects, features and advantages of the present invention, as well as the invention itself, will be more fully understood from the following description of preferred embodiments, when read together with the accompanying drawings, in which: [0013] FIG. 1 is a schematic diagram of an automated plasma arc system. [0014] FIG. 2 is a schematic diagram of a closely-coupled plasma arc system according to one embodiment of the present invention. [0015] FIG. 3 is a flow chart illustrating a screen hierarchy of the controller according to one embodiment of the present invention. [0016] FIG. 4 is a screen shot of a controller display screen according to one embodiment of the present invention. [0017] FIG. 5A is a screen shot of a parametric shape library for use in a controller according to one embodiment of the present invention. [0018] FIG. 5B is a screen shot of a change consumables screen of a controller according to one embodiment of the present invention. [0019] FIG. 6 is a block diagram illustrating a closed-loop power supply according to one embodiment of the present invention. Continue reading... Full patent description for Centralized control architecture for a plasma arc system Brief Patent Description - Full Patent Description - Patent Application Claims Click on the above for other options relating to this Centralized control architecture for a plasma arc system patent application. ###  How KEYWORD MONITOR works... a FREE service from FreshPatents1. Sign up (takes 30 seconds). 2. Fill in the keywords to be monitored. 3. Each week you receive an email with patent applications related to your keywords. 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