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  Capacitively coupled plasma reactor with magnetic plasma controlUSPTO Application #: 20080023143Title: Capacitively coupled plasma reactor with magnetic plasma control Abstract: A plasma reactor includes a vacuum enclosure including a side wall and a ceiling defining a vacuum chamber, and a workpiece support within the chamber and facing the ceiling for supporting a planar workpiece, the workpiece support and the ceiling together defining a processing region between the workpiece support and the ceiling. Process gas inlets furnish a process gas into the chamber. A plasma source power electrode is connected to an RF power generator for capacitively coupling plasma source power into the chamber for maintaining a plasma within the chamber. The reactor further includes at least a first overhead solenoidal electromagnet adjacent the ceiling, the overhead solenoidal electromagnet, the ceiling, the side wall and the workpiece support being located along a common axis of symmetry. (end of abstract) Agent: Law Office Of Robert M. Wallace - Ventura, CA, US Inventors: Daniel J. Hoffman, Matthew L. Miller, Jang Gyoo Yang, Heeyeop Chae, Michael Barnes, Tetsuya Ishikawa, Yan Ye USPTO Applicaton #: 20080023143 - Class: 156345330 (USPTO)
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