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04/24/08 | 9 views | #20080093215 | Prev - Next | USPTO Class 204 | About this Page  204 rss/xml feed  monitor keywords

Batch-type remote plasma processing apparatus

USPTO Application #: 20080093215
Title: Batch-type remote plasma processing apparatus
Abstract: A plasma processing apparatus comprises a processing chamber in which a plurality of substrates are stacked and accommodated; a pair of electrodes extending in the stacking direction of the plurality of substrates, which are disposed at one side of the plurality of substrates in said processing chamber, and to which high frequency electricity is applied; and a gas supply member which supplies processing gas into a space between the pair of electrodes. (end of abstract)
Agent: Hogan & Hartson L.L.P. - Los Angeles, CA, US
Inventors: Kazuyuki TOYODA, Yasuhiro INOKUCHI, Motonari TAKEBAYASHI, Tadashi KONTANI, Nobuo ISHIMARU
USPTO Applicaton #: 20080093215 - Class: 204298020 (USPTO)
Related Patent Categories: Chemistry: Electrical And Wave Energy, Apparatus, Coating, Forming Or Etching By Sputtering, Coating

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