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Applied Materials, Inc. patents

The following is a sampling of recent Applied Materials, Inc. patent applications (USPTO Patent Application #, Patent Title) sorted by month.

August 2012 - Applied Materials, Inc. patents

20120216691 - Blade for silk-screen printing on a print support
20120216694 - Method for centering a print track
20120216833 - Real time liquid particle counter (lpc) end point detection system
20120218620 - Electrochromic devices
20120218621 - Materials and device stack for market viable electrochromic devices
20120219725 - Substrate processing apparatus and method
20120219841 - Lithium ion cell design apparatus and method
20120220116 - Dry chemical cleaning for semiconductor processing
20120210937 - Substrate processing apparatus using a batch processing chamber
20120211164 - Systems for plasma enhanced chemical vapor deposition and bevel edge etching
20120211354 - Uniformity tuning capable esc grounding kit for rf pvd chamber
20120211358 - Interior antenna for substrate processing chamber
20120211359 - Wafer processing deposition shielding components
20120211462 - Remotely-excited fluorine and water vapor etch
20120211484 - Methods and apparatus for a multi-zone pedestal heater
20120213500 - Edge ring for a thermal processing chamber
20120213938 - System for utilization improvement of process chambers and method of operating thereof
20120213940 - Atomic layer deposition of silicon nitride using dual-source precursor and interleaved plasma
20120214047 - Method for high volume manufacturing of thin film batteries
20120214112 - Ambient laminar gas flow distribution in laser processing systems
20120204795 - Methods to improve the in-film defectivity of pecvd amorphous carbon films
20120204938 - Interconnect technologies for back contact solar cells and modules
20120204965 - Method and apparatus for controlling a processing system
20120205046 - Tunable ground planes in plasma chambers
20120205241 - Process kit for rf physical vapor deposition
20120205347 - Scanned laser light source
20120205793 - Seed layer passivation
20120208300 - Etch processing chamber
20120208306 - Method for encapsulating an organic light emitting diode
20120208339 - Passivating glue layer to improve amorphous carbon to metal adhesion
20120208366 - Prevention and reduction of solvent and solution penetration into porous dielectrics using a thin barrier layer
20120208372 - Process gas delivery for semiconductor process chambers
20120208371 - Method and apparatus for multizone plasma generation
20120208373 - Method for depositing an amorphous carbon film with improved density and step coverage
20120208374 - Amorphous carbon deposition method for improved stack defectivity
20120208438 - Polishing system having a track
20120199071 - Plasma immersion chamber
20120199469 - Pvd sputtering target with a protected backing plate
20120199872 - Method for hybrid encapsulation of an organic light emitting diode
20120201267 - Low temperature measurement and control using low temperature pyrometry
20120201959 - In-situ hydroxylation system
20120202316 - Plasma treatment of tco layers for silicon thin film photovoltaic devices
20120202315 - In-situ hydrogen plasma treatment of amorphous silicon intrinsic layers
20120202338 - Epitaxy of high tensile silicon alloy for tensile strain applications
20120202357 - In situ vapor phase surface activation of sio2
20120192792 - Plasma, uv and ion/neutral assisted ald or cvd in a batch tool
20120193218 - Device for supporting a rotatable target and sputtering apparatus
20120193456 - Gas distribution plate with discrete protective elements
20120193623 - Carbon addition for low resistivity in situ doped silicon epitaxy
20120196155 - Resist fortification for magnetic media patterning
20120196242 - Substrate support with heater and rapid temperature change
20120196447 - Uniform dry etch in two stages
20120196450 - Method to increase silicon nitride tensile stress using nitrogen plasma in-situ treatment and ex-situ uv cure
20120196451 - Embedded catalyst for atomic layer deposition of silicon oxide
20120196452 - Method to increase tensile stress of silicon nitride films using a post pecvd deposition uv cure
20120196511 - Gathering spectra from multiple optical heads

July 2012 - Applied Materials, Inc. patents

20120187467 - Floating gates and methods of formation
20120187534 - Pulse method of oxidizing sidewall dielectrics for high capacitance applications
20120190178 - Polysilicon films by hdp-cvd
20120190182 - Defect-free junction formation using octadecaborane self-amorphizing implants
20120190185 - Plasma treatment of silicon nitride and silicon oxynitride
20120191735 - Session table framework
20120191865 - Session table framework
20120180954 - Semiconductor processing system and methods using capacitively coupled plasma
20120181166 - Pvd process with synchronized process parameters and magnet position
20120181167 - Electrochromic tungsten oxide film deposition
20120183915 - Use of infrared camera for real-time temperature monitoring and control
20120175250 - Target cooling through gun drilled holes
20120177841 - Low temperature silicon carbide deposition process
20120177846 - Radical steam cvd
20120178200 - Integrated in-line processing system for selective emitter solar cells
20120167942 - Low-concentration flat profile photovoltaic modules
20120167954 - Monolithic module assembly using back contact solar cells and metal ribbon
20120167986 - Photovoltaic modules manufactuerd using monolithic module assembly techniques
20120168135 - Apparatus and method for solar cell module edge cooling during lamination
20120170603 - Protection device for solid state laser
20120171391 - Thin film deposition using microwave plasma
20120171797 - Seasoning of deposition chamber for dopant profile control in led film stacks
20120171853 - Defect-free junction formation using octadecaborane self-amorphizing implants
20120171855 - Methods to adjust threshold voltage in semiconductor devices
20120171933 - Pressure controlled polishing platen

June 2012 - Applied Materials, Inc. patents

20120164470 - Silver-nickel core-sheath nanostructures and methods to fabricate
20120164827 - Fabrication of through-silicon vias on silicon wafers
20120164829 - Fabrication of through-silicon vias on silicon wafers
20120164845 - Dual zone gas injection nozzle
20120152727 - Alkali metal deposition system
20120152751 - Electrolytic copper process using anion permeable barrier
20120152895 - Methods for etching a substrate
20120152900 - Methods and apparatus for gas delivery into plasma processing chambers
20120154974 - High efficiency electrostatic chuck assembly for semiconductor wafer processing
20120156863 - Substrate pretreatment for subsequent high temperature group iii depositions
20120156872 - Methods for depositing materials in high aspect ratio features
20120156890 - In-situ low-k capping to improve integration damage resistance
20120145079 - Loadlock batch ozone cure
20120145684 - Method of thermal processing structures formed on a substrate
20120146509 - Generating plasmas in pulsed power systems
20120148701 - Apparatus and method of improving beam shaping and beam homogenization
20120149192 - Methods for depositing metal in high aspect ratio features
20120149194 - Substrate support with gas introduction openings
20120138457 - Encapsulated sputtering target
20120138472 - Method of forming a process chamber component having electroplated yttrium containing coating
20120141667 - Methods for forming barrier/seed layers for copper interconnect structures
20120142192 - Oxide-rich liner layer for flowable cvd gapfill
20120142198 - Wet oxidation process performed on a dielectric material formed from a flowable cvd process

May 2012 - Applied Materials, Inc. patents

20120132397 - Temperature control in plasma processing apparatus using pulsed heat transfer fluid flow
20120132518 - Method for predicting and compensating erosion in a magnetron sputtering target
20120132618 - Method and apparatus for modulating wafer treatment profile in uv chamber
20120135155 - Process chamber component having yttrium-aluminum coating
20120135609 - Apparatus and process for atomic layer deposition
20120136476 - Damaged substrate handling apparatus and method for substrate processing systems
20120136622 - Sensor system for semiconductor manufacturing apparatus
20120125488 - Method of producing a plasma-resistant thermal oxide coating
20120129275 - Dual-bulb lamphead control methodology
20120129351 - Composite removable hardmask
20120118225 - Epitaxial growth temperature control in led manufacture
20120118224 - Transfer chamber metrology for improved device yield
20120118510 - Method for debonding components in a chamber
20120119218 - Method for forming a semiconductor device using selective epitaxy of group iii-nitride
20120121799 - Method for segregating the alloying elements and reducing the residue resistivity of copper alloy layers
20120121823 - Process for lowering adhesion layer thickness and improving damage resistance for thin ultra low-k dielectric film
20120122253 - Apparatus and method of aligning and positioning a cold substrate on a hot surface
20120122302 - Apparatus and methods for deposition of silicon carbide and silicon carbonitride films
20120122320 - Method of processing low k dielectric films
20120111272 - Mocvd single chamber split process for led manufacturing
20120112186 - Treatment of gate dielectric for making high performance metal oxide and metal oxynitride thin film transistors
20120113559 - Electrostatic discharge prevention for large area substrate processing system
20120103257 - Deposition ring and electrostatic chuck for physical vapor deposition chamber
20120103263 - Pre-heat ring designs to increase deposition uniformity and substrate throughput
20120103388 - Monolithic module assembly using back contact solar cells and metal ribbon
20120103425 - Flow meter with improved thermal stability and methods of use
20120103524 - Plasma processing apparatus with reduced effects of process chamber asymmetry
20120103526 - High purity aluminum coating hard anodization
20120103800 - Homing of arbitrary scan path of a rotating magnetron
20120103936 - Methods for reducing photoresist interference when monitoring a target layer in a plasma process
20120103939 - Methods and apparatus for controlling photoresist line width roughness
20120103970 - Heater with independent center zone control
20120104616 - Method for depositing a thin film electrode and thin film stack
20120104703 - Electrostatic chuck and showerhead with enhanced thermal properties and methods of making thereof
20120104950 - Methods for calibrating rf power applied to a plurality of rf coils in a plasma processing system
20120105088 - Apparatus and method for testing back-contact solar cells
20120107502 - Bisamineazaallylic ligands and their use in atomic layer deposition methods
20120107504 - Evaporation system and method
20120107996 - Surface treatment process performed on a transparent conductive oxide layer for solar cell applications
20120108058 - Methods of forming layers on substrates
20120108062 - Nitrogen-containing ligands and their use in atomic layer deposition methods
20120108079 - Atomic layer deposition film with tunable refractive index and absorption coefficient and methods of making
20120108081 - Apparatus having improved substrate temperature uniformity using direct heating methods
20120109355 - Substrate processing system

April 2012 - Applied Materials, Inc. patents

20120097093 - Load lock chamber, substrate processing system and method for venting
20120097266 - Apparatus for controlling gas distribution using orifice ratio conductance control
20120097330 - Dual delivery chamber design
20120097332 - Substrate support with symmetrical feed structure
20120097870 - Apparatus for forming a magnetic field and methods of use thereof
20120097908 - Low force substrate lift
20120099949 - Apparatus for providing a rotation carrier magazine, and method of operating thereof
20120100312 - Methods for enhancing tantalum filament life in hot wire chemical vapor deposition processes
20120100779 - Apparatus and method for compensation of variability in chemical mechanical polishing consumables
20120090691 - Quartz showerhead for nanocure uv chamber
20120090784 - Chamber lid heater ring assembly
20120090990 - Deposition apparatus and methods to reduce deposition asymmetry
20120091095 - Method and apparatus for reducing particle defects in plasma etch chambers
20120091098 - High efficiency gas dissociation in inductively coupled plasma reactor with improved uniformity
20120091099 - Methods and apparatus for recovery and reuse of reagents
20120091104 - Multi-zoned plasma processing electrostatic chuck with improved temperature uniformity
20120091108 - Methods and apparatus for controlling substrate temperature in a process chamber
20120094468 - Two silicon-containing precursors for gapfill enhancing dielectric liner
20120085733 - Self aligned triple patterning
20120086464 - In-situ vhf voltage/current sensors for a plasma reactor
20120088193 - Radiation patternable cvd film
20120088327 - Methods of soldering to high efficiency thin film solar panels
20120088356 - Integrated platform for in-situ doping and activation of substrates
20120088369 - Atomic layer deposition of photoresist materials and hard mask precursors
20120088371 - Methods for etching substrates using pulsed dc voltage
20120079982 - Module for ozone cure and post-cure moisture treatment
20120080081 - Thin-film solar fabrication process, deposition method for solar cell precursor layer stack, and solar cell precursor layer stack
20120080092 - High efficiency solar cell device with gallium arsenide absorber layer
20120080309 - Systems and methods for forming a layer of sputtered material
20120080753 - Gallium arsenide based materials used in thin film transistor applications
20120080779 - Ultra high selectivity doped amorphous carbon strippable hardmask development and integration
20120082884 - Electrospinning for integrated separator for lithium-ion batteries
20120083133 - Amine curing silicon-nitride-hydride films

March 2012 - Applied Materials, Inc. patents

20120073501 - Process chamber for dielectric gapfill
20120074126 - Wafer profile modification through hot/cold temperature zones on pedestal for semiconductor manufacturing equipment
20120074951 - System and method for current-based plasma excursion detection
20120075108 - System and method for voltage-based plasma excursion detection
20120076574 - Vacuum process chamber component and methods of making
20120077335 - Methods for depositing germanium-containing layers
20120069174 - Apparatus and method for analyzing thermal properties of composite structures
20120070136 - Transparent reflector plate for rapid thermal processing chamber
20120070957 - Air gap formation
20120070982 - Methods for forming layers on a substrate
20120070999 - Replaceable substrate masking on carrier and method for processing a substrate
20120060919 - Junction box for a photovoltaic solar panel
20120060971 - Methods and loadport apparatus for purging a substrate carrier
20120061605 - Gate valve
20120063874 - Low profile dual arm vacuum robot
20120064225 - Spray deposition module for an in-line processing system
20120064698 - Multiple section showerhead assembly
20120055535 - Photovoltaic devices with textured glass superstrate
20120055534 - Photovoltaic devices with high work-function tco buffer layers and methods of manufacture
20120056173 - Staggered thin film transistor and method of forming the same
20120056290 - Thin-film solar fabrication process, deposition method for solar cell precursor layer stack, and solar cell precursor layer stack
20120058281 - Methods for forming low moisture dielectric films
20120048132 - Method and apparatus for screen printing a multiple layer pattern
20120048467 - Component temperature control by coolant flow control and heater duty cycle control
20120049128 - Transparent conductive zinc oxide display film and production method therefor
20120052204 - Workpiece wetting and cleaning
20120052216 - Gas distribution showerhead with high emissivity surface
20120052347 - Flow battery systems
20120052690 - Temperature enhanced electrostatic chucking in plasma processing apparatus
20120053719 - Method and apparatus for automated validation of semiconductor process recipes

February 2012 - Applied Materials, Inc. patents

20120042825 - Extended life deposition ring
20120043023 - Symmetric vhf source for a plasma reactor
20120043518 - Variable resistance memory element and fabrication methods
20120043538 - Process to make metal oxide thin film transistor array with etch stopping layer
20120045631 - Index modified coating on polymer substrate
20120045852 - Autotuned screen printing process
20120045904 - Methods for forming a hydrogen free silicon containing dielectric film
20120037068 - Composite substrates for direct heating and increased temperature uniformity
20120037181 - Cleaning methods for improved photovoltaic module efficiency
20120037475 - Substrate inverting system
20120037503 - Rotatable sputter target base, rotatable sputter target, coating installation, method of producing a rotatable sputter target, target base connection means, and method of connecting a rotatable target base device for sputtering installations to a target b
20120040536 - A-si seasoning effect to improve sin run-to-run uniformity
20120040592 - Apparatus and method for temperature control during polishing
20120031332 - Water cooled gas injector
20120031333 - Vertical inline cvd system
20120031335 - Vertical inline cvd system
20120031425 - Modules and processes for metal particles removal
20120031479 - Thin film solar fabrication process, deposition method for tco layer, and solar cell precursor layer stack
20120033235 - System and method with automatic adjustment function for measuring the thickness of substrates
20120033340 - Electrostatic chuck and methods of use thereof
20120034136 - Symmetric vhf plasma power coupler with active uniformity steering
20120034382 - Substrate support material useful for screen printing processes
20120034469 - Semiconductor processing apparatus comprising a coating formed from a solid solution of yttrium oxide and zirconium oxide
20120034761 - Method of removing contaminants and native oxides from a substrate surface
20120034844 - Spectrographic monitoring using index tracking after detection of layer clearing
20120023728 - Apparatus and methods for transporting large photovoltaic modules
20120024229 - Control of plasma profile using magnetic null arrangement by auxiliary magnets
20120024340 - Solar cells with localized silicon/metal contact for hot spot mitigation and methods of manufacture
20120024339 - Photovoltaic module including transparent sheet with channel
20120024479 - Apparatus for controlling the flow of a gas in a process chamber
20120027918 - Showerhead support structure for improved gas flow
20120027954 - Magnet for physical vapor deposition processes to produce thin films having low resistivity and non-uniformity
20120028461 - Methods for depositing metal in high aspect ratio features
20120028813 - Selecting reference libraries for monitoring of multiple zones on a substrate

January 2012 - Applied Materials, Inc. patents

20120018402 - Plasma processing apparatus and liner assembly for tuning electrical skews
20120021671 - Real-time monitoring of retaining ring thickness and lifetime
20120021673 - Substrate holder to reduce substrate edge stress during chemical mechanical polishing
20120012172 - Thin-film solar fabrication process, deposition method for tco layer, and solar cell precursor layer stack
20120012171 - Thin film solar fabrication process, deposition method for tco layer, and solar cell precursor layer stack
20120012458 - Magnet arrangement for a target backing tube, target backing tube including the same, cylindrical target assembly and sputtering system
20120012465 - Methods for forming barrier/seed layers for copper interconnect structures
20120015113 - Methods for forming low stress dielectric films
20120015455 - Method and apparatus for calibrating optical path degradation useful for decoupled plasma nitridation chambers
20120015471 - Multiple-path laser edge delete process for thin-film solar modules
20120015521 - Amorphous carbon deposition method for improved stack defectivity
20120006092 - Methods and apparatus for insitu analysis of gases in electronic device fabrication systems
20120006385 - High performance multi-layer back contact stack for silicon solar cells
20120009347 - Precise temperature control for teos application by heat transfer fluid
20120009765 - Compartmentalized chamber
20120009796 - Post-ash sidewall healing
20120009803 - Mixing energized and non-energized gases for silicon nitride deposition
20120009847 - Closed-loop control of cmp slurry flow
20120000422 - Apparatuses and methods for atomic layer deposition
20120000424 - Cooled dark space shield for multi-cathode design
20120000490 - Methods for enhanced processing chamber cleaning
20120000511 - Method of manufacturing crystalline silicon solar cells using epitaxial deposition
20120000772 - Deposition apparatus and methods to reduce deposition asymmetry
20120000773 - Reactive sputtering zinc oxide transparent conductive oxides onto large area substrates
20120000888 - Methods and apparatus for radio frequency (rf) plasma processing
20120003388 - Methods and apparatus for thermal based substrate processing with variable temperature capability
20120003398 - Apparatus and method for exposing a substrate to uv radiation using a reflector having both elliptical and parabolic reflective sections
20120003599 - Substrate support for use with multi-zonal heating sources
20120003759 - Endpoint control during chemical mechanical polishing by detecting interface between different layers through selectivity change
20120003833 - Methods for forming tungsten-containing layers

August 2011 - Applied Materials, Inc. patents

20110197814 - Anti-arc zero field plate
20110198229 - Electroplating apparatus based on an array of anodes
20110198322 - In-line metrology methods and systems for solar cell fabrication
20110198417 - Process chamber gas flow improvements
20110199476 - Metrology system for imaging workpiece surfaces at high robot transfer speeds
20110199477 - Method for imaging workpiece surfaces at high robot transfer speeds with reduction or prevention of motion-induced distortion
20110200247 - Method for imaging workpiece surfaces at high robot transfer speeds with correction of motion-induced distortion
20110201134 - Capacitively coupled plasma reactor with magnetic plasma control
20110192716 - Method for producing an ito layer and sputtering system
20110195184 - Substrate protection device and method
20110195202 - Oxygen pump purge to prevent reactive powder explosion
20110185972 - Balancing rf bridge assembly
20110186426 - Adjustable process spacing, centering, and improved gas conductance
20110186545 - Feedforward temperature control for plasma processing apparatus
20110189860 - Methods for nitridation and oxidation
20110190921 - Flexible process condition monitoring
20110191457 - Footprint reduction for a manufacturing facility management system

July 2011 - Applied Materials, Inc. patents

20110180122 - Floating grid module design for thin film silicon solar cells
20110180133 - Enhanced silicon-tco interface in thin film silicon solar cells using nickel nanowires
20110180233 - Apparatus for controlling temperature uniformity of a showerhead
20110180243 - Apparatus for controlling temperature uniformity of a substrate
20110180983 - Life enhancement of ring assembly in semiconductor manufacturing chambers
20110182699 - Transfer robot with substrate cooling
20110174212 - Epitaxial chamber with cross flow
20110174362 - Manufacture of thin film solar cells with high conversion efficiency
20110175084 - Thin film semiconductor material produced through reactive sputtering of zinc target using nitrogen gases
20110175140 - Methods for forming nmos epi layers
20110177648 - Method of manufacturing thin film solar cells having a high conversion efficiency
20110177669 - Method of controlling trench microloading using plasma pulsing
20110178628 - N-channel flow ratio controller calibration
20110168093 - Methods and apparatus for incorporating nitrogen in oxide films
20110168550 - Graded electrode technologies for high energy lithium-ion batteries
20110171758 - Reclamation of scrap materials for led manufacturing
20110171774 - Cleaning optimization of pecvd solar films
20110162674 - In-situ process chamber clean to remove titanium nitride etch by-products
20110162706 - Passivated polysilicon emitter solar cell and method for manufacturing the same
20110162704 - Reliability of back end of line process by adding pvd oxide film
20110162798 - Methods and apparatus for tuning matching networks
20110162800 - Reconfigurable multi-zone gas delivery hardware for substrate processing showerheads
20110162803 - Chamber with uniform flow and plasma distribution
20110163065 - System for batch processing of magnetic media
20110165347 - Dielectric film formation using inert gas excitation
20110165781 - Flowable dielectric using oxide liner

June 2011 - Applied Materials, Inc. patents

20110154590 - Wafer edge cleaning
20110155058 - Substrate processing apparatus having a radiant cavity
20110155225 - Back contact solar cells having exposed vias
20110157760 - Electrostatic chuck with reduced arcing
20110159211 - Shadow ring for modifying wafer edge and bevel deposition
20110159213 - Chemical vapor deposition improvements through radical-component modification
20110159703 - Dielectric film growth with radicals produced using flexible nitrogen/hydrogen ratio
20110146577 - Showerhead with insulated corner regions
20110146770 - Enhanced passivation layer for wafer based solar cells, method and system for manufacturing thereof
20110147363 - Multifunctional heater/chiller pedestal for wide range wafer temperature control
20110151142 - Pecvd multi-step processing with continuous plasma
20110151590 - Apparatus and method for low-k dielectric repair
20110151674 - Smooth siconi etch for silicon-containing films
20110151676 - Methods of thin film process
20110151677 - Wet oxidation process performed on a dielectric material formed from a flowable cvd process
20110139755 - Multi-wavelength laser-scribing tool
20110139758 - Latitudinal iso-line scribe, stitching, and simplified laser and scanner controls
20110140023 - Water cooled valve
20110140726 - Apparatus and methods for measuring solar cell module performance
20110143170 - Methods for substrate surface planarization during magnetic patterning by plasma immersion ion implantation
20110144791 - Energy savings and global gas emissions monitoring
20110131792 - Shadow mask alignment and management system
20110132345 - Wire saw device and method for operating same
20110132884 - Laser modules and processes for thin film solar panel laser scribing
20110135552 - Methods and apparatus for treating exhaust gas in a processing system
20110135844 - Large area plasma processing chamber with at-electrode rf matching
20110136286 - Method of cleaning and forming a negatively charged passivation layer over a doped region
20110136327 - High mobility monolithic p-i-n diodes
20110136347 - Point-of-use silylamine generation
20110127156 - Chamber for processing hard disk drive substrates
20110129616 - Oxygen-doping for non-carbon radical-component cvd films
20110129732 - Compressed powder 3d battery electrode manufacturing
20110129959 - Crystallization processing for semiconductor applications
20110129990 - Method for doping non-planar transistors
20110130007 - In-situ clean to reduce metal residues after etching titanium nitride
20110130995 - Spectrometric metrology of workpieces using a permanent window as a spectral reference

May 2011 - Applied Materials, Inc. patents

20110120017 - Variable seal pressure slit valve doors for semiconductor manufacturing equipment
20110120502 - Substrate washing apparatus and methods of use
20110120505 - Apparatus and method for front side protection during backside cleaning
20110120651 - Showerhead assembly with improved impact protection
20110120862 - Anode rod for a sputtering system
20110121503 - Cvd apparatus
20110121649 - Energy savings based on power factor correction
20110123178 - Apparatus and method for enhancing the cool down of radiatively heated substrates
20110124169 - Methods of selectively depositing an epitaxial layer
20110114177 - Mixed silicon phase film for high efficiency thin film silicon solar cells
20110114519 - Component with enhanced shelf life
20110114601 - Plasma source design
20110115378 - Plasma source design
20110115589 - Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor
20110116900 - Substrate alignment apparatus
20110117680 - Inline detection of substrate positioning during processing
20110117728 - Method of decontamination of process chamber after in-situ chamber clean
20110118893 - Controls interface solution for energy savings
20110111137 - Curing non-carbon flowable cvd films
20110111181 - Methods and apparatus for balancing image brightness across a flat panel display using variable ink thickness
20110100348 - Mounting plate for a wire sawing device, wire sawing device comprising the same, and wire sawing process carried out by the device
20110100554 - Parallel system for epitaxial chemical vapor deposition
20110100799 - Sputter deposition system and method
20110100955 - Apparatus and methods for forming energy storage and photovoltaic devices in a linear system
20110101247 - Temperature control of a substrate during a plasma ion implantation process for patterned disc media applications
20110101442 - Multi-layer charge trap silicon nitride/oxynitride layer engineering with interface region control
20110104393 - Plasma ion implantation process for patterned disc media applications
20110104627 - Substrate transport system and method
20110104843 - Method of reducing degradation of multi quantum well (mqw) light emitting diodes
20110104848 - Hot wire chemical vapor deposition (cvd) inline coating tool

April 2011 - Applied Materials, Inc. patents

20110094537 - Apparatus and methods for brush and pad conditioning
20110094683 - Rf feed structure for plasma processing
20110094994 - Inductively coupled plasma apparatus
20110095007 - Thermal flux processing by scanning a focused line beam
20110095402 - Gate dielectric film with controlled structural and physical properties over a large surface area substrate
20110097518 - Vertically integrated processing chamber
20110097517 - Dynamic vertical microwave deposition of dielectric layers
20110097628 - Nucleation and growth of tin particles into three dimensional composite active anode for lithium high capacity energy storage device
20110097878 - Chamber for pecvd
20110097901 - Dual mode inductively coupled plasma reactor with adjustable phase coil assembly
20110088763 - Method and apparatus for improving photovoltaic efficiency
20110088762 - Barrier layer disposed between a substrate and a transparent conductive oxide layer for thin film silicon solar cells
20110088760 - Methods of forming an amorphous silicon layer for thin film solar cell application
20110089145 - Solder bonding method and apparatus
20110089559 - Method and installation for producing a semiconductor device, and semiconductor device
20110092058 - Ion implanted substrate having capping layer and method
20110092079 - Method and installation for producing an anti-reflection and/or passivation coating for semiconductor devices
20110083716 - Monolithic module assembly using back contact solar cells and metal ribbon
20110086466 - Contact fabrication of emitter wrap-through back contact silicon solar cells
20110079178 - Thickness measuring device, coating installation, method of measuring the thickness of a layer, and use of a thickness measuring device
20110079245 - Roller assembly for a brush cleaning device in a cleaning module
20110079508 - Method for coating a substrate and coater
20110079511 - Magnet arrangement for a target backing tube and target backing tube comprising the same
20110079918 - Plasma-based organic mask removal with silicon fluoride
20110081771 - Multichamber split processes for led manufacturing
20110081782 - Post-planarization densification

March 2011 - Applied Materials, Inc. patents

20110073463 - Methods for stable process in a reactive sputtering process using zinc or doped zinc target
20110073564 - Method and apparatus for high efficiency gas dissociation in inductive couple plasma reactor
20110076118 - Substrate transfer robot with chamber and substrate monitoring capability
20110076400 - Nanocrystalline diamond-structured carbon coating of silicon carbide
20110076420 - High efficiency low energy microwave ion/electron source
20110076422 - Curved microwave plasma line source for coating of three-dimensional substrates
20110076826 - Passivating glue layer to improve amorphous carbon to metal adhesion
20110076847 - Laser system for processing solar wafers in a carrier
20110067727 - Brush alignment control mechanism
20110068082 - Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injection
20110070375 - Modular substrate processing system and method
20110070691 - Methods of fabricating metal oxide or metal oxynitride tfts using wet process for source-drain metal etch
20110070721 - Epitaxial growth of compound nitride semiconductor structures
20110070724 - Defect-free junction formation using octadecaborane self-amorphizing implants
20110070811 - Point of use recycling system for cmp slurry
20110061685 - Method and apparatus for showerhead cleaning
20110061810 - Apparatus and methods for cyclical oxidation and etching
20110061812 - Apparatus and methods for cyclical oxidation and etching
20110064545 - Substrate transfer mechanism with preheating features
20110065227 - Common laser module for a photovoltaic production line
20110065264 - Methods of solid phase recrystallization of thin film using pulse train annealing method
20110065276 - Apparatus and methods for cyclical oxidation and etching
20110058919 - Mechanical modularity chambers
20110048515 - Passivation layer for wafer based solar cells and method of manufacturing thereof
20110048644 - Plasma reactor with tiltable overhead rf inductive source
20110049779 - Substrate carrier design for improved photoluminescence uniformity
20110051322 - Porous amorphous silicon-carbon nanotube composite based electrodes for battery applications
20110052833 - Gas distribution showerhead and method of cleaning
20110053307 - Repatterning of polyvinyl butyral sheets for use in solar panels
20110053380 - Silicon-selective dry etch for carbon-containing films

July 2009 - Applied Materials, Inc. patents

20090173894 - Ion implanters
20090166565 - Ion implanters


This listing is an abstract for educational and research purposes is only meant as a recent sample of applications filed, not a comprehensive history. is not affiliated or associated with Applied Materials, Inc. in any way and there may be associated servicemarks. This data is also published to the public by the USPTO and available for free on their website. Note that there may be alternative spellings for Applied Materials, Inc. with additional patents listed. Browse our Agent directory for other possible listings.