Apparatus for the efficient coating of substrates

Title: Apparatus for the efficient coating of substrates

Related Patent Categories: Coating Apparatus, Gas Or Vapor Deposition

Brief Patent Description - Full Patent Description - Patent Claims

The Patent Description & Claims data below is from USPTO Patent Application 20070199509, Apparatus for the efficient coating of substrates.

1. A chemical vapor reaction apparatus comprising: a fluid input portion; a vapor chamber, said vapor chamber fluidically coupled to said fluid input portion; and a process chamber, said process chamber fluidically coupled by a first chemical vapor delivery line to said vapor chamber.

2. The chemical vapor reaction apparatus of claim 1 wherein said fluid input portion comprises one or more fluid withdrawal portions.

3. The chemical vapor reaction apparatus of claim 1 wherein said fluid input portion comprises one or more chemical reservoirs.

4. The chemical vapor reaction apparatus of claim 2 wherein said fluid withdrawal portion comprises a first syringe pump.

5. The chemical vapor reaction apparatus of claim 4 wherein said fluid withdrawal portion further comprises: an input line coupled to said first syringe pump and adapted to receive fluid from a first chemical reservoir; and a first isolating valve, said first isolating valve located to fluidically isolate said first chemical reservoir from said first syringe pump.

6. The chemical vapor reaction apparatus of claim 5 further comprising: a first output line adapted to deliver fluid from said first syringe pump to said vapor chamber; and a second isolating valve, said second isolating valve located to fluidically isolate said first syringe pump from said vapor chamber.

7. The chemical vapor reaction apparatus of claim 1 further comprising a vacuum inlet line, said vacuum inlet line fluidically coupled to said process chamber.

8. The chemical vapor reaction apparatus of claim 7 wherein said vacuum inlet line is fluidically coupled to said vapor chamber.

9. The chemical vapor reaction apparatus of claim 8 further comprising a vapor chamber heater.

10. The chemical vapor reaction apparatus of claim 8 further comprising a vapor chamber isolation valve, said vapor chamber isolation valve adapted to fluidically isolate said vapor chamber from said process oven.

11. The chemical vapor reaction apparatus of claim 10 further comprising a first limit switch, said first limit switch adapted to regulate the pressure in said vapor chamber.

12. A chemical vapor reaction apparatus comprising: a vacuum chamber; a vapor chamber, said vapor chamber fluidically coupled to said vacuum chamber, said vapor chamber fluidically isolatable from said vacuum chamber; and a chemical delivery system, said chemical delivery system fluidically coupled to said vapor chamber, said chemical delivery system fluidically isolatable from said vapor chamber.

13. The chemical vapor reaction apparatus of claim 12, further comprising a gas delivery system, said gas delivery system fluidically coupled to said vacuum chamber, said gas delivery system fluidically isolatable from said vacuum chamber.

14. The chemical vapor reaction apparatus of claim 13, further comprising a vacuum delivery system, said vacuum delivery system fluidically coupled to said vacuum chamber.

15. The chemical vapor reaction apparatus of claim 14, wherein said vacuum system is fluidically coupled to said vapor chamber.

16. The chemical vapor reaction apparatus of claim 12 wherein said vapor chamber comprises a vapor chamber heater.

17. The chemical vapor reaction apparatus of claim 16 wherein said chemical delivery system is adapted to deliver a first amount of a first chemical to said vapor chamber.

18. The chemical vapor reaction apparatus of claim 17 wherein said chemical delivery system is adapted to deliver a second amount of a second chemical to said vapor chamber.

19. The chemical vapor reaction apparatus of claim 17 wherein said gas delivery system comprises a gas heating portion.

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Brief Patent Description - Full Patent Description - Patent Claims

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Previous Patent Application:
Substrate holder and substrate treatment apparatus
Next Patent Application:
Systems and methods for sealing in site-isolated reactors
Industry Class:
Coating apparatus

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