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Apparatus for embossing a flexible substrate with a pattern carried by an optically transparent compliant mediaRelated Patent Categories: Plastic Article Or Earthenware Shaping Or Treating: Apparatus, Means Applying Electrical Or Wave Energy Directly To Work, Radiated EnergyApparatus for embossing a flexible substrate with a pattern carried by an optically transparent compliant media description/claimsThe Patent Description & Claims data below is from USPTO Patent Application 20060188598, Apparatus for embossing a flexible substrate with a pattern carried by an optically transparent compliant media. Brief Patent Description - Full Patent Description - Patent Application Claims
FIELD OF THE INVENTION [0001] The present invention relates generally to an apparatus for embossing a flexible substrate. More specifically, the present invention relates to an apparatus for embossing a photopolymer coated flexible substrate with an imprint pattern transferred from an imprint stamp carried by an optically transparent compliant media. The imprint stamp is irradiated through the compliant media with ultraviolet light contemporaneously with the embossing so that the transferred imprint pattern cures, hardens, and retains its shape. BACKGROUND OF THE INVENTION [0002] Current roll-to-roll soft lithography processes for embossing a photopolymer coated web include a process and apparatus used by Epigem Ltd., wherein a web material that is transparent to ultraviolet light is coated with a layer of photopolymer resist and the coated side of the web is brought into contact with an embossing shim that carries an imprint pattern. When the web separates from the embossing shim, the imprint pattern is embossed in (i.e. is replicated in) the layer of photopolymer resist. An ultraviolet light source irradiates the layer of photopolymer resist through the web and cures the embossed pattern so that the pattern hardens and retains its embossed shape. Because the web is transparent to the ultraviolet light, placement of the ultraviolet light source is not problematic and the embossing shim can be opaque to ultraviolet light and the irradiation can occur from the web side. [0003] One disadvantage of the above apparatus is that if the web material and the embossing shim are opaque to ultraviolet light, then the irradiation will not be effective from the web side or the embossing shim side. Accordingly, if a roll-to-roll process requires the web material to be opaque to ultraviolet light, then the embossing shim must be optically transparent to the ultraviolet light so that the irradiation of the embossed pattern in the layer of photopolymer resist can occur from the embossing shim side. [0004] In contrast, researchers at various universities (e.g. University of Texas at Austin, Step and Flash Imprint Lithography) have used quartz shims (templates) that are optically transparent to ultraviolet light. However, that process is a batch oriented wafer-based process that is not suitable for a roll-to-roll soft lithography process. [0005] Consequently, there is an unmet need for an apparatus for implementing a roll-to-roll soft lithography process wherein an optically transparent compliant media that carries an imprint stamp, is used to emboss a pattern in a photopolymer coated on an opaque flexible substrate. There is also a need for an apparatus that allows the pattern embossed in the flexible substrate to be cured by ultraviolet light that irradiates the pattern through the compliant media and the imprint stamp. SUMMARY OF THE INVENTION [0006] Broadly, the present invention is embodied in an apparatus for embossing a flexible substrate with a pattern carried by an optically transparent compliant media. The compliant media includes an optically transparent imprint stamp that includes an imprint pattern. The compliant media can be connected with an optically transparent belt material or with an optically transparent cylinder. [0007] The flexible substrate includes a coated side that is coated with a photopolymer material and the coated side is urged into contact with the compliant media so that the imprint pattern carried by the imprint stamp is embossed in the photopolymer material. An ultraviolet light source irradiates the photopolymer material with ultraviolet light that passes through the compliant media and the imprint stamp and impinges on the pattern embossed in the photopolymer material thereby curing the pattern. The curing of the pattern in the photopolymer material occurs contemporaneously with the embossing so that the pattern hardens and retains its shape. [0008] One advantage of the apparatus of the present invention is that the irradiation occurs through the compliant media so that the flexible substrate can be opaque to ultraviolet light. [0009] Another advantage of the present invention is that the ultraviolet light source can be placed inside or outside of the belt material the compliant media is connected with. If a cylinder is used, then the ultraviolet light source can be placed or inside of or outside of the cylinder the compliant media is connected with. [0010] Other aspects and advantages of the present invention will become apparent from the following detailed description, taken in conjunction with the accompanying drawings, illustrating by way of example the principles of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS [0011] FIGS. 1 through 5 depict patterning and etching a master substrate to define an imprint pattern according to the present invention. [0012] FIG. 6 depicts a release layer conformally deposited on an imprint pattern according to the present invention. [0013] FIG. 7 depicts a silicon-based elastomer layer deposited over a release layer according to the present invention. [0014] FIGS. 8 through 10 depict separating a silicon-based elastomer layer from a release layer to form an imprint stamp according to the present invention. [0015] FIG. 11 depicts applying a thin plastic film to a silicone rubber backing according to the present invention. [0016] FIG. 12 depicts a coating of a thin plastic film with a photopolymer solution according to the present invention. [0017] FIGS. 13 and 14 depict a spreading of a photopolymer solution to form a photopolymer layer over a thin plastic film according to the present invention. [0018] FIG. 15 depicts a placing of a patterned side of an imprint stamp on a photopolymer layer according to the present invention. [0019] FIG. 16 depicts curing a photopolymer layer according to the present invention. [0020] FIG. 17 depicts removing an imprint stamp from a photopolymer layer according to the present invention. Continue reading about Apparatus for embossing a flexible substrate with a pattern carried by an optically transparent compliant media... Full patent description for Apparatus for embossing a flexible substrate with a pattern carried by an optically transparent compliant media Brief Patent Description - Full Patent Description - Patent Application Claims Click on the above for other options relating to this Apparatus for embossing a flexible substrate with a pattern carried by an optically transparent compliant media patent application. ###  How KEYWORD MONITOR works... a FREE service from FreshPatents1. Sign up (takes 30 seconds). 2. Fill in the keywords to be monitored. 3. Each week you receive an email with patent applications related to your keywords. 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