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AbradingBelow are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 09/18/2014 > 35 patent applications in 23 patent subcategories.
09/11/2014 > 32 patent applications in 12 patent subcategories.
20140256223 - Machining method for hard-fine machining of noise-optimized gears on a gear-cutting machine: The present invention relates to a method for hard-fine machining of tooth flanks with corrections and/or modifications on a gear-cutting machine, wherein respective toothed wheel pairings which mesh with one another within a transmission or a test device are machined while taking account of the respective mating flanks, and wherein... Agent: Liebherr-verzahntechnik Gmbh
20140256224 - Method for ascertaining topography deviations of a dressing tool in a grinding machine and correspondingly equipped grinding machine: The invention relates to a method for ascertaining topography deviations of a dressing tool. The method includes executing a predefined relative movement of a dressing tool in relation to a dressable grinding tool, wherein during the execution of the relative movement, at least one contour region of the dressing tool... Agent: Klingelnberg Ag
20140256226 - Broad spectrum, endpoint detection window chemical mechanical polishing pad and polishing method: A chemical mechanical polishing pad is provided, comprising: a polishing layer having a polishing surface; and, a broad spectrum, endpoint detection window block having a thickness along an axis perpendicular to a plane of the polishing surface; wherein the broad spectrum, endpoint detection window block, comprises an olefin copolymer; wherein... Agent:
20140256225 - Chemical mechanical polishing pad with broad spectrum, endpoint detection window and method of polishing therewith: A chemical mechanical polishing pad is provided, comprising: a polishing layer having a polishing surface; and, a broad spectrum, endpoint detection window block having a thickness along an axis perpendicular to a plane of the polishing surface; wherein the broad spectrum, endpoint detection window block, comprises a cyclic olefin addition... Agent: Roham And Haas Electronic Materials Cmp Holdings Inc
20140256227 - Double-side polishing method: The present invention is directed to a double-side polishing method including interposing a wafer held by a carrier between upper and lower turn tables to which respective polishing pads are attached, and rotating and revolving the carrier while supplying a polishing agent to polish both surfaces of the wafer at... Agent: Shin-etsu Handotai Co., Ltd.
20140256228 - In-process compensation of machining operation and machine arrangement: The present invention relates to a method for performing in-process compensating a machining operation on a workpiece, wherein the compensation process includes generating a control signal representative of magnitude of a contact force exerted on a cutting tool in a normal direction in relation to a machining surface of the... Agent:
20140256229 - Method of improving bond strength of peek implants with bone cement: A method for improving the bond between a PEEK joint component and bone cement comprising roughening a surface of the PEEK component by air-blasting abrasive water-soluble particles against the component until an average surface roughness of 4 to 6 micrometers is attained and subsequently submerging the component in water to... Agent: Howmedica Osteonics Corp.
20140256232 - Broad spectrum, endpoint detection window multilayer chemical mechanical polishing pad: A multilayer chemical mechanical polishing pad is provided, having: a polishing layer having a polishing surface, a counterbore opening, a polishing layer interfacial region parallel to the polishing surface; a porous subpad layer having a bottom surface and a porous subpad layer interfacial region parallel to the bottom surface; and,... Agent: Rohm And Haas Electronic Materials Cmp Holdings Inc.
20140256230 - Multilayer chemical mechanical polishing pad: A multilayer chemical mechanical polishing pad is provided, having: a polishing layer having a polishing surface, a counterbore opening, a polishing layer interfacial region parallel to the polishing surface; a porous subpad layer having a bottom surface and a porous subpad layer interfacial region parallel to the bottom surface; and,... Agent: Rohm And Haas Electronic Materials Cmp Holdings, Inc.
20140256231 - Multilayer chemical mechanical polishing pad with broad spectrum, endpoint detection window: A multilayer chemical mechanical polishing pad is provided, having: a polishing layer having a polishing surface, a counterbore opening, a polishing layer interfacial region parallel to the polishing surface; a porous subpad layer having a bottom surface and a porous subpad layer interfacial region parallel to the bottom surface; and,... Agent: Rohm And Haas Electronic Materials Cmp Holdings, Inc.
20140256233 - Abrasive article and method of making the same: An abrasive article and method of making same wherein the abrasive article comprises a mounting assembly and an abrasive attachment assembly wherein the first interlock member of the mounting assembly and the second interlock member of the abrasive attachment assembly are configured to align the central axis of the abrasive... Agent: 3m Innovative Properties Company
20140256234 - System for dispensing abrasive particles in a liquid jet apparatus: A submersible liquid jet apparatus is provided for a system with a portable liquid jet tool that may be handled by human divers or remotely operated vehicles (ROV). The present apparatus facilitates the portability of a liquid jet tool with a support unit supplying high pressure working liquid and pressurized... Agent: Chukar Waterjet, Inc.
20140256235 - Surface flow finishing machine: A machine for the flow finishing of mechanical pieces is described. The machine has a rotary vat for containing finishing media and a unit for moving pieces having at least one mechanical arm for moving the pieces being machined, said mechanical arm being associated to means for rotating the pieces... Agent:
20140256236 - Pad conditioning tool and method of manufacturing the same: A pad conditioning tool includes a sapphire chip having a side surface defining a polishing surface and a plurality of sapphire grains formed on the polishing surface in an integral manner. Each of the sapphire grains had a three-dimensional geometric structure. The sapphire grains are arranged on the polishing surface... Agent: Tera Xtal Technology Corporation
20140256237 - Drywall sander: A sanding tool including a blade and a handle, the blade having first and second opposing faces. An attachment layer removably secures to the sanding tool at the opposing faces, thereby to provide opposing abrasive layers on opposing sides of the blade. The shape of the blade, with a wider... Agent: Hmb Products, LLC
20140256238 - Composite abrasive wheel: A composite abrasive wheel comprises primary and secondary abrasive portions. The primary abrasive portion comprises shaped ceramic abrasive particles retained in a first organic binder. The secondary abrasive portion is bonded to the primary abrasive portion, and comprises secondary crushed abrasive particles retained in a second organic binder. The primary... Agent: 3m Innovative Properties Company09/04/2014 > 3 patent applications in 3 patent subcategories.
20140248823 - Composition and method for polishing glass: The invention provides a chemical-mechanical polishing composition containing (a) abrasive particles, (b) a polymer, and (c) water, wherein (i) the polymer possesses an overall charge, (ii) the abrasive particles have a zeta potential Za measured in the absence of the polymer and the abrasive particles have a zeta potential Zb... Agent: Cabot Microelectronics Corporation
20140248824 - Processing apparatus and optical member manufacturing method: There is provided a processing apparatus and an optical member manufacturing method that can improve the figure accuracy and the waviness accuracy, and can highly and precisely process an optical element surface. A processing apparatus generates a pressure between a polishing member and a workpiece and relatively moves the polishing... Agent: Canon Kabushiki Kaisha
20140248825 - Methods and apparatus for deflecting and supporting a tire sidewall: Particular embodiments of the invention include methods and apparatus for deforming a tire sidewall. Such methods include the step of providing a tire having at least one sidewall connected to a corresponding bead. A further step includes constraining at least one of the sidewall and bead from moving laterally toward... Agent: Compagnie Generale Des Etablissements Michelin08/28/2014 > 19 patent applications in 11 patent subcategories.
20140242881 - Feed forward parameter values for use in theoretically generating spectra: A method of controlling a polishing operation is described. A controller stores an optical model for a layer stack having a plurality of layers and a plurality of input parameters including a first parameter and a second parameter. The controller stores data defining a plurality of default values for the... Agent:
20140242882 - Grinding machine and grinding method: There are provided a grinding machine and a grinding method that make it possible to achieve a high degree of accuracy of the roundness of a workpiece. As at least one of a coolant dynamic pressure and a grinding efficiency varies depending on a phase of the workpiece, a pressing... Agent: Jtekt Corporation
20140242880 - Optical model with polarization direction effects for comparison to measured spectrum: A method of controlling a polishing operation includes storing an optical model for a layer stack having a plurality of layers. The optical model has a plurality of input parameters, the plurality of input parameters including a first parameter and a second parameter. The second parameter is a polarization angle... Agent: Applied Materials, Inc.
20140242879 - Path for probe of spectrographic metrology system: A method of operating a polishing system includes polishing a substrate at a polishing station, the substrate held by a carrier head during polishing, transporting the substrate to an in-sequence optical metrology system positioned between the polishing station and another polishing station or a transfer station, measuring a plurality of... Agent: Applied Materials, Inc.
20140242877 - Spectrographic metrology with multiple measurements: A method of controlling a polishing system includes transporting a substrate to an in-line optical metrology system positioned in a chemical mechanical polishing system, at the in-line optical metrology system, moving a probe relative to the substrate to measure a plurality of spectra reflected from the substrate at a plurality... Agent: Applied Materials, Inc.
20140242878 - Weighted regression of thickness maps from spectral data: A method of controlling a polishing operation includes measuring a plurality of spectra at a plurality of different positions on a substrate to provide a plurality of measured spectra. For each measured spectrum of the plurality of measured spectra, a characterizing value is generated based on the measured spectrum. For... Agent: Applied Materials, Inc.
20140242883 - Determination of wafer angular position for in-sequence metrology: A polishing apparatus includes a carrier head configured to hold a wafer in a first plane, the wafer having a perimeter and a fiducial, a drive shaft having an axis perpendicular to the first plane and configured to rotate the carrier head about the axis, a light source configured to... Agent: Applied Materials, Inc.
20140242884 - Synethetic quartz glass subtrate polishing slurry and manufacture of synethetic quartz glass substrate using the same: A polishing slurry comprising a collagen derivative and a colloidal solution is effective for polishing of synthetic quartz glass substrates. It prevents formation of defects having a size that can be detected by a high-sensitivity flaw detector.... Agent: Shin-etsu Chemical Co., Ltd.
20140242885 - Polishing apparatus and polishing method: A polishing apparatus includes a peripheral-portion polishing unit configured to polish a peripheral portion of the substrate, a CMP unit configured to polish a flat surface of the substrate W, a cleaning unit configured to clean the polished substrate, a transport system configured to transport the substrate. The transport system... Agent:
20140242886 - Polishing head in chemical mechanical polishing apparatus and chemical mechanical polishing apparatus including the same: A polishing head of a chemical mechanical polishing apparatus includes a housing moving up and down, a base assembly connected to a bottom of the housing to support the housing, a membrane on a bottom of the base assembly and a retainer ring surrounding the membrane and connected to the... Agent: Samsung Electronics., Ltd.
20140242887 - Hand power tool: A hand power tool includes a drive unit, an electronic unit, and a cooling device configured to cool at least one of the drive unit and the electronic unit. The hand power tool also includes at least one of an open-loop control unit and a closed-loop control unit configured to... Agent: Robert Bosch Gmbh
20140242888 - Hand power tool: A hand power tool includes a drive unit, an electronic unit, and a switching unit. The switching unit includes at least one actuating element configured to activate and deactivate the drive unit. The switching unit also includes at least one switching element configured to be positioned in at least one... Agent: Robert Bosch Gmbh
20140242889 - Hand power tool: An angle grinder including at least one ECO mode unit configured to provide an ECO mode and at least one functional device configured to make available a function of the angle grinder that is at least partially essential for an operating state.... Agent: Robert Bosch Gmbh
20140242890 - Handheld power tool: An angle grinder including at least one boost mode unit configured to provide a boost mode, and a switching-over unit configured to switch over between a conventional mode and the boost mode.... Agent: Robert Bosch Gmbh
20140242891 - Tornado pad: A rotatory sander pad includes a rigid inner portion for attaching to a rotary sander tool and a flexible outer portion for accepting an abrasive medium. The flexible outer portion includes a substantially flat bottom surface for accepting the abrasive medium, a through-hole substantially in its center, and a multi-dimensional... Agent:
20140242892 - Rotary abrasive brush for deburring and method of manufacturing: A rotary tool containing a core hub with helical groove on its outer surface filled in with continuous abrasive filament formed by folding of a pre-cut abrasive sheet including multiple bristle like straps extending radially from the hub. The method of manufacturing includes the steps of providing a hub, and... Agent: Dburr Technologies
20140242893 - Abrasive device: An abrasive device including at least one substrate, provided as a carrier element of a binder layer at least partially accommodating at least one abrasive grain, and having at least one fastening element, configured to detachably fasten the at least one substrate to an abrasive handling device.... Agent: Robert Bosch Gmbh
20140242894 - Polishing pad and method for producing same: Provided are: a polishing pad which is capable of alleviating a scratch problem that occurs when a conventional hard (dry) polishing pad is used, and which is excellent in polishing rate and polishing uniformity and is usable not only for primary polishing but also for finish polishing; and a method... Agent:
20140242895 - Knife sharpener: A knife sharpener having an angled bolster for providing predetermined sharpening angles with respect to the sharpening surface is provided. The angled bolster of the knife sharpener preferably includes two different angled surfaces for establishing at least two different predetermined sharpening angles for a cutting implement to be sharpened. The... Agent: Lifetime Brands, Inc.Previous industry: Foundation garments
Next industry: Butchering
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