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Abrading April category listing, related patent applications 04/12

Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application.
04/26/2012 > 10 patent applications in 6 patent subcategories.

20120100779 - Apparatus and method for compensation of variability in chemical mechanical polishing consumables: Apparatus and methods for conditioning a polishing pad in a CMP system are provided. In one embodiment, a method includes performing a pre-polish process including urging a conditioner disk against a polishing surface of a polishing pad disposed in a polishing station, moving the conditioner disk relative to the polishing... Agent: Applied Materials, Inc.

20120100780 - Improved abrasive saw: An abrasive saw having an associated cutting wheel is used for cutting objects. The saw includes a base, a cutting assembly operably mounted to the base and a controller. The cutting assembly includes a pivot shaft, a drive shaft operably mounted to the pivot shaft, a drive, and a drive... Agent: Illinois Tool Works Inc.

20120100781 - Multiple matching reference spectra for in-situ optical monitoring: A method of controlling polishing includes storing a plurality libraries, each library including a plurality of reference spectra, polishing a substrate, measuring a sequence of spectra of light from the substrate during polishing, and for each measured spectrum of the sequence of spectra, finding a best matching first reference spectrum... Agent:

20120100782 - Apparatus and method for polishing cavities in mechanical components: An apparatus (1) for polishing cavities in mechanical components (4), characterized in that said apparatus (1) comprises a supporting framework (2) supporting a working plane (3) thereon are housed the mechanical workpieces (4) to be subjected to the polishing process, said mechanical workpieces (4) being clamped to said working plane... Agent: Luben S.r.l.

20120100783 - Polishing pad, manufacturing method thereof and polishing method: A polishing pad capable of improving an affinity to polishing liquid and stabilizing polishing performance is provided. A polishing pad 10 is equipped with a urethane sheet 2. The urethane sheet 2 has a polishing surface P for polishing an object to be polished. The urethane sheet 2 is formed... Agent: Fujibo Holdings Inc.

20120100785 - Method for chamfering wafer: In a conventional wafer chamfering process, the chamfered shape (cross-sectional shape) of the wafer circumference is uniform. However, in the chamfering step in wafer manufacture, the uniform chamfered shape varies with respective circumferential positions. Therefore, a wafer chamfering method that takes into account deformation in the chamfering step in the... Agent: Daito Electron Co., Ltd.

20120100786 - Method of manufacturing glass substrate for magnetic recording media: The invention provides a method of manufacturing a glass substrate for magnetic recording media. And the glass substrate has high surface smoothness and little waviness. In the primary, secondary and tertiary lapping process, diamond pads 20A, 20B, and 20C are used, respectively. The diamond pad 20A has an average diamond... Agent: Showa Denko K.k.

20120100784 - Microfiber reinforcement for abrasive tools: An abrasive article includes an organic bond material, an abrasive material dispersed in the organic bond material, mineral wool microfibers uniformly dispersed in the organic bond material, the mineral wool microfibers being individual filaments, one or more reinforcement and/or chopped strand fibers dispersed in the organic bond material and one... Agent: Saint-gobain Abrasives, Inc.

20120100787 - Cmp pad dresser with oriented particles and associated methods: CMP pad dressers with superabrasive particles oriented into an attitude that controls CMP pad performance, and methods associated therewith are disclosed and described. The controlled CMP pad performance may be selected to optimize CMP pad dressing rate and dresser wear.... Agent:

20120100788 - Manufacturing method of carrier for double-side polishing apparatus, carrier for double-side polishing apparatus, and double-side polishing method of wafer: A manufacturing method of a carrier for a double-side polishing apparatus for polishing surfaces of a wafer, the carrier having: a carrier body arranged between upper and lower turn tables, the carrier body having a holding hole for holding the wafer; and a ring-shaped resin insert arranged along an inner... Agent: Shin-etsu Handotai Co., Ltd.

04/19/2012 > 11 patent applications in 9 patent subcategories.

20120094577 - Method for machining a surface of an optical lens: Method for determining movement data representing the movement of a machining tool of an optical lens 3D machining device for machining a surface of an optical lens, wherein the method comprises: a machining tool data providing stage, a surface data providing stage, a machining rule providing stage, a 3D surface... Agent:

20120094579 - Coated abrasive products containing aggregates: A coated abrasive product includes a particulate material containing green, unfired abrasive aggregates having a generally spheroidal or toroidal shape, the aggregates formed from a composition comprising abrasive grit particles and a nanoparticle binder. Free abrasive products, bonded abrasive products, and the particulate material also contain aggregates.... Agent: Saint-gobain Abrasives, Inc.

20120094578 - Heterocoagulate, and compositions and method for polishing and surface treatment: A heterocoagulate comprises first particles, having a particle size of at most 999 nm, on a second particle, having a particle size of at least 3 microns. The first particles comprise cerium oxide, and second particle comprises at least one member selected from the group consisting of silicon oxides, aluminum... Agent:

20120094580 - Airfoil mask, airfoil and mask system, and masking method for edge profile finishing: A mask for performing high speed media finishing on airfoils includes a thicker portion and a thinner portion. The thicker portion is spaced further from an edge that will become a leading edge in the final airfoil than the thinner portion. The media is redirected by the thicker portion toward... Agent:

20120094581 - Method and system for removing contaminants: A method and apparatus for removing contaminants from at least one portion of a semiconductor mold are disclosed. A nozzle is positioned at a preset position with respect to the portion of the semiconductor mold. Solid particles of a material that sublimes instantaneously along with at least one of the... Agent:

20120094582 - Blade sharpening device: The invention provides a blade sharpening device designed for sharpening a blade for a uniform sharpening of the edge thereof. Generally, the blade sharpening device includes a base, a guide, a carriage, and a blade holder. The blade holder secures the blade while being sharpened. The blade holder is connected... Agent:

20120094583 - Grind-stone-mount of honing head: A plurality of grind-stone-mounts 12 each having a grind stone 15 on its outer side are attached to a holder 11 of a honing head 10 expandably along a radial direction. Each of the grind-stone-mounts 12 is provided with a support part 13 disposed inside along the radial direction, and... Agent: Honda Motor Co., Ltd.

20120094584 - Sheet for mounting a workpiece and method for making the same: The present invention relates to a sheet for mounting a workpiece and a method for making the same. The method includes the steps of: (a) providing a sheet body having a top surface, a bottom surface, at least one side surface and a plurality of pores, wherein some of the... Agent: San Fang Chemical Industry Co., Ltd.

20120094585 - Tool and related methods and apparatus: A tool for use in abrading, honing, lapping or otherwise finishing or working the interior surface of a bore, aperture, cylinder or like work piece includes an abrading element dependently supported about a mandrel assembly. The abrading element has a longitudinal slit in order that the abrading element is radially... Agent:

20120094587 - Flexible grinding product and method of producing the same: The present invention relates to a flexible grinding product and a method of producing the same. Such a grinding product comprises a flexible underlay (1) which consists of two layers laminated to each other. These comprise a lower base layer (2) and an upper layer (3), a cavity layer. The... Agent: Oy Kwh Mirka Ab

20120094586 - Polishing pad with multi-modal distribution of pore diameters: Polishing pads with multi-modal distributions of pore diameters are described. Methods of fabricating polishing pads with multi-modal distributions of pore diameters are also described.... Agent:

04/12/2012 > 7 patent applications in 6 patent subcategories.

20120088438 - Eddy current sensor and polishing method and apparatus: An eddy current sensor is used for detecting a metal film (or conductive film) formed on a surface of a substrate such as a semiconductor wafer. The eddy current sensor includes a sensor coil disposed near a metal film or a conductive film formed on a substrate, and the sensor... Agent:

20120088437 - Glass manufacturing device: A glass manufacturing device includes a work container, a loading device, a sandblaster, a shield device, and a lift device. The loading device is received in the work container and loads a glass substrate in place. The sandblaster is arranged opposite to the loading device and sandblasts the glass substrate.... Agent: Hon Hai Precision Industry Co., Ltd.

20120088439 - Dynamic action abrasive lapping workholder: A method and apparatus for quickly moving workpieces from having abrading contact with abrasive-surfaced rotatable platens using a dynamic-action workholder apparatus frame moving device that is activated by a sensor. Flat-surfaced workpieces are attached to flat-surfaced workholders to abrade one surface of the workpieces by abrasive coated platens. The force... Agent:

20120088440 - Finishing of surfaces of tubes: The present disclosure involves various embodiments for finishing the internal wall of a capillary tube. A quantity of abrasive particles and a rod are placed in a capillary tube, wherein a portion of the abrasive particles is magnetic. A magnet is positioned near a side of the capillary tube, thereby... Agent:

20120088441 - Processing apparatus having four processing units: A processing apparatus including a turn table rotatably provided and having an opening; at least five chuck tables provided on the turn table, each chuck table having a holding surface for holding a workpiece; a support bed inserted through the opening of the turn table; four processing unit supporting mechanisms... Agent: Disco Corporation

20120088442 - Counter-rotating polisher: A counter-rotating polisher includes: an enclosure, an electric motor, a polishing arrangement and a counter-rotating arrangement. The electric motor is fixed to the enclosure and includes a driving axle. The polishing arrangement includes two polishing device. The polishing devices respectively include a fixed tray and a polishing material that are... Agent: Hammer Electronic Power Tools, Co., Ltd.

20120088443 - Nonwoven composite abrasive comprising diamond abrasive particles: An abrasive article includes a support, a first polymeric binder, a second polymeric binder, and abrasive particles. The support includes a plurality of nonwoven layers. A method of forming an abrasive article includes providing a support including, applying a first coating of the first polymeric binder to the support, applying... Agent: Saint-gobain Abrasives, Inc.

04/05/2012 > 8 patent applications in 6 patent subcategories.

20120083186 - Eyeglass lens processing apparatus: In an eyeglass lens processing apparatus, if a material selector selects a thermoplastic material for the lens, a control unit performs a first step and then a second step. In the first step, the control unit controls a lens rotating unit to position a lens in a plurality of lens... Agent: Nidek Co., Ltd.

20120083188 - Dispersion comprising cerium oxide and silicon dioxide: Aqueous dispersion comprising cerium oxide and silicon dioxide, obtainable by first mixing a cerium oxide starting dispersion and a silicon dioxide starting dispersion while stirring, and then dispersing at a shear rate of 10000 to 30000 s−1, wherein a) the cerium oxide starting dispersion—contains 0.5 to 30% by weight of... Agent: Evonik Degussa Gmbh

20120083187 - Polyurethane, composition for formation of polishing layers that contains same, pad for chemical mechanical polishing, and chemical mechanical polishing method using same: u

20120083189 - Chemical mechanical polishing apparatus having pad conditioning disk and pre-conditioner unit: A pad conditioning disk, a pre-conditioning unit, and a CMP apparatus having the same are provided. The pad conditioning disk includes a base in which mountain-type tips and valley-type grooves are repeatedly connected to each other, and a cutting layer formed on the base layer. The cutting layer including conditioning... Agent:

20120083190 - Ultra-low temperature magnetic polishing machine: An ultra-low temperature magnetic polishing machine includes a housing defining therein a grinding chamber, a door hinged to the housing and controllable to open/close the grinding chamber, a motor mounted inside the housing below the grinding chamber, a magnetic disc set in between the grinding chamber and the motor and... Agent: Holding Electric Co., Ltd.

20120083192 - Homogeneous polishing pad for eddy current end-point detection: Homogeneous polishing pads for polishing semiconductor substrates using eddy current end-point detection are described. Methods of fabricating homogeneous polishing pads for polishing semiconductor substrates using eddy current end-point detection are also described.... Agent:

20120083191 - Polishing pad for eddy current end-point detection: Polishing pads for polishing semiconductor substrates using eddy current end-point detection are described. Methods of fabricating polishing pads for polishing semiconductor substrates using eddy current end-point detection are also described.... Agent:

20120083193 - Universal abrasive disc: An abrasive disc adapted to mount on a surface of a sander, such as an orbital sander, having either five or eight dust extraction holes is provided. The abrasive disc includes a plurality of apertures arrangeable to at least partially overlap each of the five or eight dust extraction holes... Agent: Black & Decker Inc.

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