|Abrading patents - Monitor Patents|
USPTO Class 451 | Browse by Industry: Previous - Next | All
12/2010 | Recent | 15: May | Apr | Mar | Feb | Jan | 14: Dec | Nov | Oct | Sep | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan | 13: Dec | Nov | Oct | Sep | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan | 12: Dec | Nov | Oct | Sep | Aug | July | June | May | April | Mar | Feb | Jan | 11: Dec | Nov | Oct | Sep | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan | 10: Dec | Nov | Oct | Sep | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan | | 09: Dec | Nov | Oct | Sep | Aug | Jl | Jn | May | Apr | Mar | Fb | Jn | | 2008 | 2007 |
Abrading December patent applications/inventions, industry category 12/10Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 12/30/2010 > patent applications in patent subcategories.
20100330877 - Determining the buff radius during tire buffing: Methods, apparatus and computer programs for correcting a buff of tread from a crown of a tire, the steps of the method including measuring the distance between the tire crown surface and the belt at each of the plurality of locations; calculating a projected distance between the crown surface and... Agent: Hahn Loeser & Parks, LLP
20100330878 - Polishing apparatus and polishing method: A polishing apparatus has a polishing table having a polishing surface and a top ring for pressing a substrate against the polishing surface while independently controlling pressing forces applied to a plurality of areas on the substrate. The polishing apparatus has a sensor for monitoring substrate conditions of a plurality... Agent: Wenderoth, Lind & Ponack, L.L.P.
20100330879 - Leak proof pad for cmp endpoint detection: In one aspect, a polishing pad includes a homogeneous unitary polishing layer having a polishing surface, an opposed bottom surface, a recess in the polishing surface extending partially but not entirely through the polishing layer, and a solid light-transmissive window is secured in the recess. In another aspect, a polishing... Agent: Fish & Richardson P.C.
20100330880 - Machine tools and methods of operation thereof: A machine tool is provided which comprises a machine base (10), a first support (20,100) mounted on a first rotational machine axis on the base, and a second support (22,102) mounted on a second rotational machine axis on the base. The second rotational axis is parallel to and spaced laterally... Agent: Marshall, Gerstein & Borun LLP
20100330881 - Method for the double sided polishing of a semiconductor wafer: Semiconductor wafers are double sided polished by a method of polishing a frontside of the wafer in a first step with a polishing pad with fixed abrasive and simultaneously polishing a backside of the wafer with a polishing pad containing no abrasive, but during which an abrasive polishing agent is... Agent: Brooks Kushman P.C.
20100330883 - Method for the local polishing of a semiconductor wafer: The edge region of one side of a semiconductor wafer is polished by pressing the wafer by means of a rotatable polishing head against a polishing pad lying on a rotating polishing plate, and containing fixed abrasive. The polishing head is provided with a resilient membrane radially subdivided into a... Agent: Brooks Kushman P.C.
20100330882 - Polishing pad and method for polishing a semiconductor wafer: A semiconductor wafer is polished, wherein in a first step, the rear side of the wafer is polished by a polishing pad comprising fixedly bonded abrasives having a grain size of 0.1-1.0 μm, while supplying a polishing agent free of solid materials having a pH of at least 11.8, and,... Agent: Brooks Kushman P.C.
20100330884 - Diatomaceous earth-containing slurry composition and method for polishing organic polymer-based ophthalmic substrates using the same: The present invention provides a slurry composition and method for polishing organic polymer-based ophthalmic substrates. The slurry composition according to the invention includes an aqueous dispersion of particles of diatomaceous earth and, optionally, particles of abrasives selected from alumina, zirconia, silica, titania and combinations of the foregoing. Slurry compositions according... Agent: Rankin, Hill & Clark LLP
20100330885 - Method for polishing the edge of a semiconductor wafer: A method for polishing the edge of a semiconductor wafer comprises (a) providing a semiconductor wafer which has been polished on its side surfaces and which has a rounded edge; (b) polishing the edge of the wafer by fixing the semiconductor wafer on a centrally rotating chuck, delivering the wafer... Agent: Brooks Kushman P.C.
20100330886 - Corrosion-resistant cmp conditioning tools and methods for making and using same: An abrasive tool for conditioning CMP pads includes abrasive grains coupled to a substrate through a metal bond and a coating, e.g., a fluorine-doped nanocomposite coating. The abrasive grains can be arranged in a self-avoiding random distribution. In one implementation, an abrasive tool includes a coated plate and a coated... Agent: Anabela Cristina Taylor, Esq. Houston Eliseeva LLP
20100330887 - Abrasive flap wheel with custom profiles: A flap sander is disclosed for use with a workpiece having a nonlinear profile. The flap sander comprises a cylindrical rotary head including a central hub concentric with an axis of rotation of the rotary head, and an inclined surface extending radially outward from the central hub. A plurality of... Agent: John P. O'banion O'banion & Ritchey LLP
20100330888 - Glass-plate working machine: A glass-plate working machine 1 is arranged such that while a cutting head 9 for forming a cut line on a glass plate 5 and a grinding head 10 for grinding a peripheral edge of the glass plate 5 bend-broken along the cut line are being moved simultaneously in parallel... Agent: Nixon & Vanderhye, PC
20100330889 - Portable device for sharpening the edges of a ski: A portable device for sharpening the edges of a ski is composed of a carriage equipped with first and second pressing means on the ski in lateral and transverse directions, and of a support mounted on the carriage and comprising fixing means of a machining unit. The fixing means enable... Agent: Oliff & Berridge, PLC
20100330890 - Polishing pad with array of fluidized gimballed abrasive members: An abrasive article with an array of independently gimballed abrasive members that are capable of selectively engaging with nanometer-scale and/or micrometer-scale height variations and micrometer-scale and/or millimeter-scale wavelengths of waviness, on the surfaces of substrates. Each abrasive member maintains a fluid bearing (air is the typical fluid) with the substrate.... Agent: Clise, Billion & Cyr, P.A.12/23/2010 > patent applications in patent subcategories.
20100323583 - Support for tread band buffing: An apparatus and method of roughening the sole side surface of a tread band is provided wherein the sole side surface of a tread band is roughened with at least one abrasive roller. The bottom of at least one groove in a tread side of the tread band is supported... Agent: Hahn Loeser & Parks, LLP
20100323584 - Polishing liquid for metal film and polishing method: wherein the water-soluble polymer has a weight average molecular weight of 150,000 or more and is at least one member selected from among a polycarboxylic acid, a salt of a polycarboxylic acid, and a polycarboxylic acid ester. According to the invention, provided is a polishing liquid for metal film, by... Agent: Westerman, Hattori, Daniels & Adrian, LLP
20100323585 - Method for chemically grinding a semiconductor wafer on both sides: A semiconductor wafer processed on both sides simultaneously, the wafer lying in freely movable fashion in a cutout in one of a plurality of carriers that rotate by means of a rolling apparatus, and one thereby being moved on a cycloidal trajectory, the semiconductor wafer being processed in material-removing fashion... Agent: Brooks Kushman P.C.
20100323586 - Methods for producing and processing semiconductor wafers: Semiconductor wafers are polished by a material-removing polishing process A, on both sides of the wafer, using an abrasive-free polishing pad, and a polishing agent which contains abrasive; and a material-removing polishing process B, on at least one side of the wafer, using a polishing pad with a microstructured surface... Agent: Brooks Kushman P.C.
20100323587 - Chemical mechanical planarization methods and apparatus: A semiconductor process includes polishing a substrate with a slurry in an enclosure. Polishing the substrate is stopped. First mist is injected into the enclosure, such that the first mist has at least about 80% of saturation of a liquid or gaseous solvent in a carrier within the enclosure.... Agent: Duane Morris LLP (tsmc)IPDepartment
20100323588 - System and method for drying grit used for abrasive blasting: A method and method for processing grit used for abrasive blasting may include receiving grit blasted onto a surface, where the grit includes moisture content. Air in which the grit being recycled is being processed may be heated. The moisture content may be evaporated from the grit using the heated... Agent: Snr Denton US LLP
20100323589 - Centerless grinding machine: A centerless grinding machine includes a frame with an upper base and includes a driven regulating wheel and a driven grinding wheel mounted to the frame. At least one of the wheels is mounted to the upper base and hangs downwardly from the upper base. At least one of the... Agent: Mark A. Koch Professional Corporation
20100323590 - Grinding machine for bearing rings: A bearing ring grinding machine having a grinding unit arranged to machine the bearings with micron-size tolerances and reduce a grinding cycle period. The grinding unit includes a fixed plate which supports a horizontally movable loader and sliding carriage. A carriage stopper, in the loader, holds the ring against the... Agent: Davis & Bujold, P.l.l.c.
20100323591 - Self-aligning rotary blade holder for sharpener: A universal blade sharpening machine is operable to securely hold and sharpen any one of multiple variously sized circular blades. The machine includes a blade-sharpening drive with an adjustable blade sharpener and also includes a universal blade holder that is rotatably powered by the drive. The blade holder includes a... Agent: Hovey Williams LLP
20100323592 - Switch mechanism for a power cutter: A switch mechanism includes a support structure and an electric switch having an activator moveable between a first position where the electric switch is ON and a second position where the electric switch is OFF. A cam is connected to a first actuator, moveably mounted on the support structure, so... Agent: The Black & Decker Corporation
20100323593 - Dust-protected hand-held power tool: A battery-operated hand-held power tool (2), especially an angle grinder, comprises a housing base (4) accommodating the electromotive drive components and air inlet openings (10) supplying the electromotive drive components with a cooling air flow. In order to protect the electromotive components from dirt, the hand-held power tool is designed... Agent: Dreiss, Fuhlendorf, Steimle & Becker
20100323594 - Grinding disc structure: An improved grinding disc structure includes a support disc having first through holes and second through holes; a main disc body, with a distal surface connected onto the support disc, and having dust exhaust holes, a longitudinal guiding portion at the center, and a longitudinal guiding portion with outwardly extended... Agent: Wang Law Firm, Inc.
20100323595 - Hand-held power tool, in particular hand-guided grinding machine: A protective guard is provided for a hand-held power tool, in particular a hand-guided grinding machine. According to the invention, the tool is at least partially covered by the protective guard. The guard is supported in an elastically flexible fashion in the circumference direction of the bearing journal by means... Agent: Ronald E. Greigg Greigg & Greigg P.l.l.c.
20100323596 - Notched grind wheel and method to manufacture a rotor blade retention slot: A grind wheel includes a rim having at least one notch formed in the rim to grind a slot base of a blade retention slot within a rotor disk.... Agent: Carlson, Gaskey & Olds/pratt & Whitney
20100323597 - Apparatus for precision steeling/conditioning of knife edges: A knife edge enhancing apparatus includes a support having a support surface and knife blade clamping structure mounted to the support and located above the support surface. An object having a knife edge modifying surface which could be abrasive or non-abrasive is mounted to a holder which is freely slidable... Agent: Connolly Bove Lodge & Hutz LLP12/16/2010 > patent applications in patent subcategories.
20100317259 - Surface grinding machine and method for adjusting a surface grinding machine: The present disclosure relates to a surface grinder having at least one grinding tool, a workpiece holder for holding at least one workpiece, a drive unit for driving the workpiece holder in a rotational direction and a clutch device that provides a rotationally fixed connection between the drive unit and... Agent: Brinks Hofer Gilson & Lione/ann Arbor
20100317260 - Process for producing surface conditioned aluminum castings: A process for producing surface conditioned aluminum castings, comprising a step of applying to aluminum castings an alkaline surface conditioning liquid containing at least one organic builder and/or one chelating agent, wherein the alkaline surface conditioning liquid used in the step has a surface conditioning activity (CD; mol/l) in the... Agent: Henkel Corporation
20100317262 - Abrasive article with uniform height abrasive particles: A method of making an abrasive article including the step of preparing a master plate with a surface having a shape. Depositing a spacer layer on the surface of the master plate. A slurry containing an adhesive and abrasive particles is deposited on a surface of the spacer layer. A... Agent: Clise, Billion & Cyr, P.A.
20100317261 - Chemical mechanical polishing pad having a low defect integral window: A chemical mechanical polishing pad having a polishing layer with an integral window and a polishing surface adapted for polishing a substrate selected from a magnetic substrate, an optical substrate and a semiconductor substrate, wherein the formulation of the integral window provides improved defectivity performance during polishing. Also provided is... Agent: Rohm And Haas Electronic Materials Cmp Holdings, Inc.
20100317263 - Polishing pad: A method for manufacturing a polishing pad that has high level of optical detection accuracy and is prevented from causing slurry leak from between the polishing region and the light-transmitting region includes preparing a cell-dispersed urethane composition by a mechanical foaming method; placing a light-transmitting region at a predetermined position... Agent: Morrison & Foerster LLP
20100317264 - Grinding apparatus for manufacturing optical device, method for manufacturing optical device, and precise measuring apparatus for measuring shape and size of mold used to manufacture optical device or shape and size of optical device: When a large optical device is incorporated into a large telescope or the like, a support state and a load distribution are different from those when an object to be ground is placed on a workpiece supporting fixture of a processing machine, and a surface shape measured in a state... Agent: Wenderoth, Lind & Ponack, L.L.P.
20100317265 - Chamfering apparatus for chamfering glass substrates: A chamfering apparatus is used to chamfer a peripheral edge of a glass substrate. The chamfering apparatus includes a grindstone having a cylindrical hollow end portion; a grindstone driving unit that rotates the grindstone around an axis of the cylindrical hollow end portion; a substrate rotation-driving unit that rotates the... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100317266 - Workpiece holder for a surface grinding machine: The present disclosure relates to a workpiece holder for a surface grinding machine, with a central workpiece holder shaft around which the workpiece holder can be driven in rotation, with at least one workpiece fixture to hold at least one workpiece, and with at least two holder parts movable relative... Agent: Brinks Hofer Gilson & Lione/ann Arbor
20100317267 - Grinding wheel with sloping groove and process for fabricating the same: In a manufacturing method for a grinding wheel in which a plurality of wheel chips each composed of an abrasive grain layer containing superabrasive grains and a foundation layer are adhered to a core attached to a wheel spindle carried by a wheel head of a grinding machine to be... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.
20100317268 - Scratch removal device and method: A polishing wheel including a lower polishing surface and defining a different color from a secondary portion of the polishing wheel, so as to indicate wear of the polishing surface. The polishing surface includes a plurality of main radial flutes extending from a central passage to an outer edge. A... Agent: Merchant & Gould PC12/09/2010 > patent applications in patent subcategories.
20100311308 - Apparatus and method for deterministic control of surface figure during full aperture polishing: A polishing system configured to polish a lap includes a lap configured to contact a workpiece for polishing the workpiece; and a septum configured to contact the lap. The septum has an aperture formed therein. The radius of the aperture and radius the workpiece are substantially the same. The aperture... Agent: Townsend And Townsend And Crew LLP / Llns
20100311309 - Dressing apparatus, dressing method, and polishing apparatus: A dressing apparatus for use in a polishing apparatus for polishing a substrate to planarize a surface of the substrate is disclosed. The dressing apparatus includes a dresser disk, a dresser drive shaft coupled to the dresser disk, a pneumatic cylinder configured to press the dresser disk against the polishing... Agent: Wenderoth, Lind & Ponack, L.L.P.
20100311310 - Eyeglass lens processing apparatus: An eyeglass lens processing apparatus comprising a processing control unit which performs polishing by controlling a lens rotating unit, a grindstone rotating unit and an axis-to-axis distance varying unit based on an input target lens shape so as to process a periphery of a lens, which has been finished, by... Agent: Sughrue-265550
20100311311 - Carrier head membrane: A flexible membrane includes a horizontal central portion, a vertical portion coupled to the central portion, a thick rim portion coupled to the vertical portion, and an extension coupled to the thick rim portion. An outer surface of the horizontal central portion provides a mounting surface configured to receive a... Agent: Fish & Richardson P.C.
20100311312 - Double-side polishing apparatus and method for polishing both sides of wafer: The double-side polishing apparatus is capable of uniformly polishing a wafer and highly preventing an outer edge of the wafer from being damaged. The apparatus comprises: a lower polishing plate and an upper polishing plate for polishing both sides of the wafer; a carrier having a main body part, in... Agent: Birch Stewart Kolasch & Birch
20100311313 - Working object grinding method: A working object grinding method capable of grinding a working object reliably is provided. A working object 1 is irradiated with a laser beam while locating a converging point therewithin, so as to form a reformed region 7 in the working object 1 along a reformed-region forming line set at... Agent: Drinker Biddle & Reath (dc)
20100311314 - Pool cue shaping device: A pool cue shaping device, comprising: a block comprising a block exterior, one or more block exterior side surfaces, block cross-sections, two block ends and a block length; and at least one recessed elongated concave shaper, wherein the recessed elongated concave shaper comprises an elongated concave channel within the block... Agent: Darren Cordova12/02/2010 > patent applications in patent subcategories.
20100304642 - Gear cutting machine: The invention relates to a gear cutting machine for the grinding of external profiles and/or internal profiles of workpieces having at least one machining head which can be rotated about an axis and which has a grinding tool, and having a dressing unit. In accordance with the invention, the dressing... Agent: Dilworth & Barrese, LLP
20100304643 - Grinding apparatus and method for fabrication of liquid crystal display device: There is disclosed a grinding apparatus for fabrication of a liquid crystal display device that is adaptive for improving the adsorption defect of a substrate onto a substrate stage. A grinding apparatus for fabrication of a liquid crystal display device disclosed in the present invention includes a plurality of substrate... Agent: Morgan Lewis & Bockius LLP
20100304644 - Method and device for mechanically processing diamond: Method and device for processing a surface (5) of a diamond (1) with a mechanical part (3) which is moved in relation to the surface (5) of the diamond (1), whereby unbound diamond grains (2) are provided in between the mechanical part (3) and the surface (5) of the diamond... Agent: Browdy And Neimark, P.l.l.c. 624 Ninth Street, Nw
20100304645 - Grinding assembly for glass slabs and grinding head for a rectilinear grinding machine equipped with such assembly: A grinding assembly (3) is described, for a grinding head (1) for a grinding machine of glass slabs (2), comprising: a first (5) (and possibly a second (7)) grinding wheel adapted to tangentially work on the glass edge (2) and whose rotation axis A is parallel to the glass edge... Agent: Sheldon Mak & Anderson PC
20100304646 - Blade sharpening device: The present invention provides a blade sharpening device designed for sharpening a blade for a uniform sharpening of the edge thereof. Generally, the blade sharpening device includes a base, a guide, a carriage, and a blade holder. The base has a guide movable relative to the base. In one embodiment,... Agent: Barlow, Josephs & Holmes, Ltd.
20100304647 - Wheel polishing rotary stand: A device for polishing wheels of truck or cars without removing the valve or the tire of the wheel. The device comprises three parts: a rotative assembly fixed to a stand subject to an angular movement and housed upon a pendulum in extension. The rotative assembly includes a motor connected... Agent: Paul Biron
20100304648 - Hand-held power tool: The invention relates to a hand-held power tool, particularly an angle grinder having a housing that has a flange neck, having a protective device that can be accommodated on the flange neck and that can be pivoted in the circumferential direction, and having at least one device for blocking at... Agent: Ronald E. Greigg Greigg & Greigg P.l.l.c.
20100304649 - Device for preventing removal of a fixing member of a whetstone cover in a disc grinder: In a configuration in which a fixing screw 25 is tightened and fixed between opposite ends 22a and 22b of an attaching section 22 of a whetstone cover, the fixing screw 25 can be prevented from being removed from the end 22b of the attaching section 22 by fitting a... Agent: Oliff & Berridge, PLCPrevious industry: Foundation garments
Next industry: Butchering
RSS FEED for 20150611:
Integrate FreshPatents.com into your RSS reader/aggregator or website to track weekly updates.
For more info, read this article.
Thank you for viewing Abrading patents on the FreshPatents.com website. These are patent applications which have been filed in the United States. There are a variety ways to browse Abrading patent applications on our website including browsing by date, agent, inventor, and industry. If you are interested in receiving occasional emails regarding Abrading patents we recommend signing up for free keyword monitoring by email.
Advertise on FreshPatents.com - Rates & Info
FreshPatents.com Support - Terms & Conditions
Results in 0.10361 seconds