|Abrading patents - Monitor Patents|
USPTO Class 451 | Browse by Industry: Previous - Next | All |
10/2010 | Recent | 15: May | Apr | Mar | Feb | Jan | 14: Dec | Nov | Oct | Sep | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan | 13: Dec | Nov | Oct | Sep | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan | 12: Dec | Nov | Oct | Sep | Aug | July | June | May | April | Mar | Feb | Jan | 11: Dec | Nov | Oct | Sep | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan | 10: Dec | Nov | Oct | Sep | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan | | 09: Dec | Nov | Oct | Sep | Aug | Jl | Jn | May | Apr | Mar | Fb | Jn | | 2008 | 2007 |
Abrading October categorized by USPTO classification 10/10Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 10/28/2010 > patent applications in patent subcategories. categorized by USPTO classification
20100273396 - Polishing method, polishing apparatus and method of monitoring a substrate: A method of polishing a substrate is described. The method includes rotating a polishing table having a polishing surface, holding a substrate by a top ring, bringing the substrate into contact with the polishing surface while swinging and rotating the top ring to polish the substrate, and monitoring a surface... Agent: Wenderoth, Lind & Ponack, L.L.P.
20100273397 - Servo stroking method and system for producing special shapes: A servo stroking method and system for honing wherein the cam stroking motion is controlled via combined acceleration and deceleration cam profiles to produce a finite jerk profile, a precision positioning capability for the honing element or elements, and accurate position feedback. The stroking motion is synchronized with one or... Agent: Matthews Edwards LLC
20100273398 - Customized polish pads for chemical mechanical planarization: A polishing pad for chemical mechanical planarization of a film on a substrate is customized by obtaining one or more characteristics of a structure on a substrate. For example, when the structure is a chip formed on a semiconductor wafer, the one or more characteristics of the structure can include... Agent: Blakely Sokoloff Taylor & Zafman LLP
20100273399 - Cmp porous pad with particles in a polymeric matrix: The invention provides a chemical-mechanical polishing pad comprising a polymeric matrix and 0.1-15 wt. % of metal oxide particles. The polymeric matrix has pores, the metal oxide particles are uniformly distributed throughout the pores, and the metal oxide particles have a specific surface area of about 25 m2/g to about... Agent: Steven Weseman Associate General Counsel, I.p.
20100273400 - Method and device for removing a secondary burr on an end-cut work piece wheel: A method and a device for removing secondary burrs raised on the tooth flanks of a work piece wheel by a chamfering of the end tooth edges of said work piece wheel provides a tool wheel that rotationally meshes with the work piece wheel. Said tool wheel has cutting edges... Agent: The Gleason Works
20100273402 - Cmp conditioner and method of manufacturing the same: A chemical mechanical polishing (CMP) conditioner has diamond abrasive grits adhered to a conditioning surface which faces and makes contact with an abrasive pad of a CMP machine. The diamond abrasive grit is adhered to the CMP conditioner body by a metal plating layer, and the CMP conditioner body is... Agent: Edwards Angell Palmer & Dodge LLP
20100273401 - Polishing apparatus and polishing method: A polishing apparatus includes a polishing table with a polishing pad at an upper surface, and a conditioning disc carrying out conditioning of the polishing pad, and a moving mechanism (constructed, for example, from a swing arm) capable of moving the conditioning disc to a standby position above the polishing... Agent: Mcginn Intellectual Property Law Group, PLLC
20100273403 - Contour guide for ice skate sharpener: A guide assembly for an ice skate sharpener cooperates with a template of a desired contour of a skate blade to control the relative disposition of a sharpening wheel and a skate blade. The guide assembly comprises a base and a carriage slidably mounted on the base so as to... Agent: Blake, Cassels & Graydon LLP
20100273405 - Polishing apparatus: A polishing apparatus is used for polishing a substrate such as a semiconductor wafer to a flat mirror finish. The polishing apparatus includes a polishing table (100) having a polishing surface (101a), a top ring body (2) configured to hold and press a substrate against the polishing surface (101a), and... Agent: Wenderoth, Lind & Ponack, L.L.P.
20100273404 - Polishing pad and polishing device: A polishing pad used in semiconductor polishing process is provided in the present invention and a pressure sensitive adhesive is used to couple the polishing pad. The polishing pad includes a substrate, and the substrate includes a polishing surface and a reverse surface corresponding to the polishing surface. The polishing... Agent: Sinorica, LLC10/21/2010 > patent applications in patent subcategories. categorized by USPTO classification
20100267314 - Arrangement of devices and a method for empirically for determining efficiency index in abrasive waterjet cutting and application thereof in a device for simultaneous control of abrasive waterjet cutting: An arrangement of devices for determining an efficiency index in abrasive waterjet cutting, i.e. the index unambiguously defining for a certain material the shape of a cut, roughness of surfaces created by cutting, their conical nature depending on the incidence angle of the abrasive waterjet. The arrangement of the invention... Agent: Jacobson Holman PLLC
20100267315 - Polishing composition: (In the formula (1), Ra, Rb, and Rc represent H or an alkyl group of 1 to 4 carbon atoms, and Rd represents a group selected from the group consisting of a benzyl group, a vinyl group, an alkyl group of 1 to 4 carbon atoms, and a group in... Agent: Sughrue Mion, PLLC
20100267316 - Floor grinding apparatus: A grinding apparatus for grinding a surface includes a plurality of satellites, a carrier for supporting the plurality of satellites, a plurality of primary gears rotatably mounted within the carrier and disposed about a motor output, a static gear which is fixed with respect to the motor and co-axial with... Agent: Merchant & Gould PC
20100267317 - Substrate holder and substrate holding method: A substrate holder is a mechanism for holding a substrate, to be polished, by vacuum suction. The substrate holder includes a substrate-holding stage having a suction surface for the substrate, and a fluid passage selectively coupled to a vacuum source and a fluid supply source. The suction surface has a... Agent: Wenderoth, Lind & Ponack, L.L.P.
20100267318 - Polishing pad with projecting portion: A polishing pad include a polishing layer having a polishing surface and a backing layer on a side of the polishing layer opposite the polishing surface. An outer edge of the polishing layer overhangs an outer edge of the backing layer.... Agent: Fish & Richardson P.C.
20100267319 - System for connecting a disc to a disc holder, as well as a disc for such system: A system for connecting a disc to a disc holder, e.g. for grinding or polishing purposes, has a disc with an operating surface, an opposite connection surface and a protrusion which is mounted to the connection surface. The disc holder has a supporting surface for supporting the connection surface of... Agent: Young & Thompson- None available for 10/01/2010
- None available for 10/7/2010
Previous industry: Foundation garments
Next industry: Butchering
RSS FEED for 20150611:
Integrate FreshPatents.com into your RSS reader/aggregator or website to track weekly updates.
For more info, read this article.
Thank you for viewing Abrading patents on the FreshPatents.com website. These are patent applications which have been filed in the United States. There are a variety ways to browse Abrading patent applications on our website including browsing by date, agent, inventor, and industry. If you are interested in receiving occasional emails regarding Abrading patents we recommend signing up for free keyword monitoring by email.