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Abrading March listing by industry category 03/10

Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application.
03/25/2010 > patent applications in patent subcategories.

20100075576 - Polishing state monitoring apparatus and polishing apparatus and method: A polishing state monitoring apparatus measures characteristic values of a surface, being polished, of a workpiece to determine the timing of a polishing end point. The polishing state monitoring apparatus includes a light-emitting unit for applying light from a light source to a surface of a workpiece being polished, a... Agent: Wenderoth, Lind & Ponack, L.L.P.

20100075577 - Method of polishing glass substrate: An object of the present invention is to provide a polishing method for diminishing concave defects of a glass substrate used in a reflective mask for EUVL and the like. The invention relates to a method of polishing a glass substrate which comprises polishing a major surface of the glass... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20100075578 - Abrasive polishing net with a stickable fiber layer: An abrasive polishing net with a stickable fiber layer includes an abrasive polishing net layer and a stickable fiber layer. This abrasive polishing net layer is consisted by metal meshes and has an outer surface, an inner surface and multiple conduits. The adhesive polishing net layer is coated with a... Agent: Rosenberg, Klein & Lee

20100075579 - Device for comminuting dry ice granules, and dry ice dispensing arrangement having such a device: The invention relates to a device for comminuting dry ice granules, comprising a housing having a flow channel for dry ice granules which can be applied, by means of compressed gas, to a surface to be cleaned, and also comprising a first comminution member for comminuting the dry ice granules... Agent: Lipsitz & Mcallister, LLC

20100075580 - Small cutting wheel: The invention relates to a small cutting wheel for producing a scribed/scored predetermined breaking line, wherein the cutting wheel has a radial peripheral line defining an outer periphery of the wheel which at least partially presents a cutting edge having cutting teeth which form a rough tooth system and which... Agent: Greer, Burns & Crain

20100075581 - Extended utility tool: e

20100075582 - Polishing pad assembly with glass or crystalline window: Methods and apparatus for providing a chemical mechanical polishing pad. The pad includes a polishing layer having a top surface and a bottom surface. The pad includes an aperture having a first opening in the top surface and a second opening in the bottom surface. The top surface is a... Agent: Fish & Richardson P.C.

20100075583 - Sharpening apparatus for plane iron crowning: A sharpening apparatus having a slightly convexly or concavely curved abrasive surface, for use in sharpening woodworking tools or in other fields requiring such processing of precision parts or tools. The invention may further employ either cylindrical or conic abrasive surfaces. Cylindrical abrasive surfaces are desirable when a curvature of... Agent: Joseph S. Iandiorio Iandiorio & Teska

03/18/2010 > patent applications in patent subcategories.

20100068974 - Abrasive particles having a unique morphology: An abrasive particle having an irregular surface, wherein the surface roughness of the particle is less than about 0.95. A method for producing modified abrasive particles, including providing a plurality of abrasive particles, providing a reactive coating on said particles, heating said coated particles; and recovering modified abrasive particles.... Agent: Diamond Innovations

20100068975 - Razor blade sharpener and method of sharpening: such that when the razor blade unit with the razor blade is inserted through the opening into the carriage and the power is turned on by the switch the sharpening wheel rotates and the carriage holding the razor blade reciprocates at the same time, with the shaving edge of the... Agent: Lipsitz & Mcallister, LLC

20100068976 - Systems and methods for preparation of conductors for electric motors: The present invention discloses, in certain aspects, methods for removing material from ends of wires, the wires being electrical conductor wires of a coil for an electric motor, the ends of the wires projecting from the coil, the methods including: securing a holder apparatus to a coil, the coil having... Agent: National Oilwell Varco Attention Victor Segura

20100068977 - Sander having a damping element: A sander according to the present invention having a housing, a motor mounted in the housing, wherein the housing comprises an upper housing section and a lower housing section, the upper housing section includes an inner surface, the lower housing section includes a motor housing, the lower housing section at... Agent: Mcdermott, Will & Emery LLP Attn:IPDepartment

20100068978 - Machine tool with rest apparatus and machining method thereof: The machine tool with the rest apparatus comprising a base 10, a spindle head 20 mounted on the base 10 to hold rotatably one end of a workpiece W, a tail stock 30 mounted on the base 10 to be faced to the spindle head 20 and to hold rotatably... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20100068979 - Tool setter for a grinding machine: A device or tool setter has the purpose of setting the position of a support bar, adjustably connected to a grinding machine, in relation to a rotatable grindstone of the machine for obtaining a desired edge angle of a tool supported for grinding by the support bar. The device is... Agent: Breiner & Breiner, L.L.C.

20100068980 - Safe guarding assembly for a grinding gun: A safe guarding assembly for a grinding gun has a body, a rear protective cap and a front protective cap. The body has a casing. The casing has a front end, a shaft hole and a retaining ring. The shaft hole is formed through the casing. The retaining ring is... Agent: Law Offices Of Khalilian Sira, LLC

20100068981 - Foam buffing pad with compressed foam face: A polymeric foam buffing pad is made from a foam preform that has a convex outer working surface slit and compressed. Preferably, the working face is slit to form a pattern of foam fingers. The slit convex preform is flattened to place the outer working surface in compression and the... Agent: Andrus, Sceales, Starke & Sawall, LLP

03/11/2010 > patent applications in patent subcategories.

20100062684 - Polishing system with in-line and in-situ metrology: A computer-implemented method for process control in chemical mechanical polishing in which an initial pre-polishing thickness of a substrate is measured at a metrology station, a parameter of an endpoint algorithm is determined from the initial thickness of the substrate, a substrates is polished at a polishing station, and polishing... Agent: Fish & Richardson P.C.

20100062685 - Cmp system with wireless endpoint detection system: A CMP polishing pad with an optical sensor assembly embedded in the pad, connected to a transceiver and/or power supply mounted at the center of the pad or at the outer edge of the pad which communicates wirelessly with a control system.... Agent: Crockett & Crockett, P.C.

20100062686 - Notched grind wheel and method to manufacture a rotor blade retention slot: A method of grinding a slot base of a blade retention slot within a rotor disk includes rotationally aligning a grind wheel about an axis of rotation to align a first notch with a first and second opposed lobe of the blade retention slot of the rotor disk; transiting the... Agent: Carlson, Gaskey & Olds/pratt & Whitney

20100062688 - Carrier plate holding an abrading element and abrading plate: The invention concerns a carrier plate holding an abrading element, for detachable mounting on a rotatably mounted abrading plate driven during use, for abrading stone or concrete floors, which carrier plate has sides which form an acute angle with each other. The sides have flanges which are formed for surrounding... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, L.L.P.

20100062687 - Cerium oxide powder for abrasive and cmp slurry comprising the same: Disclosed are cerium oxide powder for an abrasive; CMP slurry including the same; and a shallow trench isolation (STI) process using the CMP slurry. At least two kinds of cerium oxides prepared by using cerium carbonates having different crystal structures are mixed in an appropriate ratio and used as an... Agent: Rothwell, Figg, Ernst & Manbeck, P.C.

20100062689 - Working apparatus: A working apparatus, provided with a base stage, work hold and rotation means for holding and rotating a work, working means movable toward and away from the work via slider mechanism and having a working tool, press means for pressing the working tool toward the work via the working means,... Agent: Sughrue Mion, PLLC

20100062690 - Method of grinding an indexable insert and grinding wheel for carrying out the grinding method: In an indexable insert having wide sides, inclined narrow sides are to be ground, that is to say the grinding allowance 38 is to be removed. To this end, the indexable insert is set in rotation about a driven axis of rotation between a clamping insert and a thrust bolt.... Agent: Jordan And Hamburg LLP

20100062691 - Substrate holding mechanism, substrate polishing apparatus and substrate polishing method: A substrate holding mechanism, a substrate polishing apparatus and a substrate polishing method have functions capable of minimizing an amount of heat generated during polishing of a substrate to be polished and of effectively cooling a substrate holding part of the substrate holding mechanism, and also capable of effectively preventing... Agent: Wenderoth, Lind & Ponack, L.L.P.

20100062692 - Honing method and honing machine: A honing processing technology for making uniform the load applied to honing grindstones by cooperating the reciprocal motion of the honing grindstones with the feeding and expanding motion at high precision by a specified relation. Servo motors are used as drive sources respectively for spindle reciprocal drive part and grindstone... Agent: Cheng Law Group, PLLC

20100062693 - Two step method and apparatus for polishing metal and other films in semiconductor manufacturing: A method and apparatus for removing a metal or conductive film from over a surface of a semiconductor wafer provides a two step process carried out within a single wafer processing apparatus. A first step is a wet chemical or mechanical removal process that removes an upper portion of the... Agent: Duane Morris LLP (tsmc)IPDepartment

20100062694 - Carrier head using flexure restraints for retaining ring alignment: One embodiment provides a retaining ring assembly. The retaining ring assembly comprises a retaining ring configured to circumferentially surround and retain the substrate within an inner surface of the retaining ring, and a flexure coupled to the retaining ring. The flexure is configured to maintain a gap between an inner... Agent: Patterson & Sheridan, LLP - - Appm/tx

20100062695 - Eccentric grinder: An eccentric grinder has a drive which is arranged in a housing and the drive shaft of which drives a supporting shaft of a back-up pad by way of an eccentric mounting. Also provided is a friction braking device, which comprises a friction braking element on the housing and a... Agent: Michael J. Striker

20100062696 - Retractable water dispenser arm for grinder/polisher: A retractable water dispenser arm system for a grinder/polisher includes a flexible hose formed, in part in a loop and affixed at at least one location to a base of the grinder polisher. A spout is mounted to an end of the flexible hose. A biased tension arm engages the... Agent: Levenfeld Pearlstein, LLC (illinois Tool Works)

03/04/2010 > patent applications in patent subcategories.

20100056023 - Adjusting polishing rates by using spectrographic monitoring of a substrate during processing: A computer-implemented method includes receiving a sequence of current spectra of reflected light from a substrate; comparing each current spectrum from the sequence of current spectra to a plurality of reference spectra from a reference spectra library to generate a sequence of best-match reference spectra; determining a goodness of fit... Agent: Fish & Richardson P.C.

20100056024 - Structured abrasive article, method of making the same, and use in wafer planarization: A structured abrasive article comprises an at least translucent film backing and an abrasive layer disposed on the backing. The abrasive layer comprises a plurality of shaped abrasive composites. The shaped abrasive composites comprise abrasive particles dispersed in a binder. The abrasive particles consist essentially of ceria particles having an... Agent: 3m Innovative Properties Company

20100056025 - Guided rotary file: A rotary file includes: (a) a body having first and second ends, and an outer surface comprising at least one cutting edge; (b) a shank extending from the first end of the body which is adapted to be mounted in a rotary tool; and (c) a pilot extending from the... Agent: Trego, Hines & Ladenheim, PLLC

20100056026 - Polishing liquid composition: A polishing liquid composition includes composite oxide particles containing cerium and zirconium, a dispersing agent, and an aqueous medium. A powder X-ray diffraction spectrum of the composite oxide particles obtained by CuKα1 ray (λ=0.154050 nm) irradiation includes a peak (first peak) having a peak top in a diffraction angle 2θ... Agent: Birch Stewart Kolasch & Birch

20100056027 - Method for polishing a semiconductor wafer: Semiconductor wafers are CMP polished by polishing the rear side of the semiconductor wafer by means of CMP with a material removal with a profile along the diameter of the wafer wherein material removal is higher at the center than at the edge of the rear side; and polishing the... Agent: Brooks Kushman P.C.

20100056028 - Substrate holding apparatus and polishing apparatus: The present invention relates to a substrate holding apparatus for holding a substrate such as a semiconductor wafer in a polishing apparatus for polishing the substrate to a flat finish. The substrate holding apparatus according to the present invention comprises a top ring body having a receiving space therein, and... Agent: Wenderoth, Lind & Ponack, L.L.P.

20100056029 - Adapter for mounting a tool on an oscillating drive: An adapter is disclosed for mounting a tool on an oscillating drive having a drive shaft that can be driven to oscillate about its longitudinal axis, wherein the adapter is passed by a central opening, and has at its drive end at least one positive-locking element for positive connection with... Agent: St. Onge Steward Johnston & Reens, LLC

20100056030 - Mechanism for detecting shaft motion, and conditioner head: To provide a shaft motion detection mechanism capable of detecting the displacement of a rotating body in a direction along a rotational axis and whether or not the rotating body is rotated, and a conditioner head capable of detecting the displacement of a polishing disk in a direction along a... Agent: Patterson & Sheridan, LLP - - Appm/tx

20100056031 - Polishing pad: The present invention provides a polishing pad, and is more particularly related to a polishing pad, the width of groove bottom of polishing surface of which is 0 mm. The polishing pad includes a polishing surface on which comprises a plurality of grooves, wherein each groove includes a groove opening... Agent: Sinorica, LLC

20100056032 - Method of manufacturing revolving whetstone and revolving whetstone manufactured by the same: In a method of manufacturing a revolving whetstone comprising a central portion in which a whetstone center hole into which a whetstone driving shaft of a grinder is inserted is arranged and a disk-shaped whetstone body that has an effective whetstone circular portion arranged in the circumferential outside of the... Agent: Paul A. Fattibene Fattibene & Fattibene

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