Abrading inventions 05/08

20080125013 - Method of beveling an ophthalmic lens blank, machine programmed therefor, and computer program: The present invention is directed to a machine programmed to edge an ophthalmic lens blank. The machine includes an edger device for forming a bevel in a peripheral edge of the lens blank, a central processing unit operably associated with the edger device for controlling operation thereof, and a computer... Agent: Berenato, White & Stavish, LLC

20080125014 - Sub-aperture deterministric finishing of high aspect ratio glass products: The invention is directed to large LCD image masks having a final flatness of less than 40 nm and a method of making such LCD image masks by utilizing subaperture deterministic grinding/lapping/polishing. In one preferred embodiment the final flatness is <20 μm. In another the final flatness is <10 nm.... Agent: Corning Incorporated

20080125015 - Machining apparatus: A machining apparatus capable of obscuring periodic machining irregularities. A workpiece W is mounted on a workpiece mounting surface of a worktable, and a tool T is supported by an elastic member (leaf spring) that is attached to a movable unit. A piezoelectric element is provided on the back of... Agent: Lowe Hauptman Ham & Berner, LLP

20080125016 - Method for producing polishing agent, polishing agent produced thereby and method for producing silicon wafer: The present invention is a method for producing a polishing agent in which silica particles are dispersed in an aqueous solution, comprising at least a step of removing metal compound ions from a prepared silica sol by ion exchange (B); a step of purifying further the ion-exchanged silica sol (D);... Agent: Oliff & Berridge, PLC

20080125017 - Polishing composition and polishing method: The polishing composition of the present invention comprises abrasive grains selected from silica and ceria; an alkali selected from ammonia, an ammonium salt, an alkali metal salt and an alkali metal hydroxide; and an organic modified silicone oil selected from a polyoxyethylene-modified silicone oil, a poly(oxyethyleneoxypropylene)-modified silicone oil, an epoxy/polyether-modified... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.C.

20080125019 - Polishing pad and a chemical-mechanical polishing method: The present invention provides a polishing pad, which has a flatness area and an emboss area on its polishing surface, wherein the flatness area is a flat surface with a roughness less than 20 μm, for polishing a wafer; the emboss area has grooves, holes or a combination thereof, for... Agent: Squire, Sanders & Dempsey L.L.P.

20080125018 - Solution for fixed abrasive chemical mechanical polishing process and fixed abrasive chemical mechanical polishing method: A solution for fixed abrasive chemical mechanical polishing process including a protection constituent, a hydrolysis constituent and water is described. The protection constituent is used to protect a silicon nitride and its concentration is between 0.001 wt % and 10 wt %. The hydrolysis constituent is used to hydrolyze a... Agent: J C Patents, Inc.

20080125020 - Polishing pad and a chemical-mechanical polishing method: The present invention provides a polishing pad, which has a flatness area and an emboss area on its polishing surface, wherein the flatness area is a flat surface with a roughness less than 20 um, for polishing a wafer; the emboss area has grooves, holes or a combination thereof, for... Agent: Squire, Sanders & Dempsey L.L.P.

20080125021 - Disk holder and disk rotating device having the same: A disk holder suitable for a disk rotating device of a chemical-mechanical polishing apparatus is provided. The disk holder is provided with a base and a fence. The base has a bearing surface at the bottom for bearing a disk thereon. The fence is connected to the peripheral of the... Agent: J C Patents, Inc.

20080125022 - Polishing apparatus and pad replacing method thereof: A polishing apparatus and a pad replacing method thereof are provided. The polishing apparatus includes a first clamping element, a second clamping element and a polishing head. The first clamping element includes a first upper clamper and a first lower clamper for clamping one end of a first polishing pad.... Agent: Bacon & Thomas, PLLC

20080119111 - Fiber optic polisher: A fiber optic polishing apparatus is disclosed including a single degree-of-freedom (DOF) gear transmission system, a pressurizing module, a fixture module, and a housing assembly. The single DOF gear transmission system would enable a fiber optic polishing machine, . or polisher to be driven by only one motor, or... Agent: Princetel, Inc

20080119112 - Set-up method for cmp process: A method of performing a chemical mechanical polishing (CMP) process is disclosed and includes; detecting a removal rate profile for a material layer formed on a wafer, converting the detected material layer removal rate profile into a condition effect profile for a predetermined section of the wafer, monitoring the converted... Agent: Volentine & Whitt Pllc

20080119113 - Method for machining surfaces: A method for abrasive machining of surfaces of components is provided. The method is effectuated by the device including a tool (1) having an inlet (11) and an outlet (12); a supply unit for conveying to the inlet (11) a liquid in which abrasive agents are dissolved and which emerges... Agent: Boyle Fredrickson S.c.

20080119114 - Liquid honing machine and liquid honing method: A honing machine 1 is provided with a honing zone 5 for subjecting a work 2 to a liquid honing process and a washing zone 6 for subjecting the work 2 to which the liquid honing process was executed at the honing zone 5 to a washing process in a... Agent: Oblon, Spivak, Mcclelland Maier & Neustadt, P.c.

20080119115 - Polishing apparatus, polishing brush and manufacturing method of disk-shaped substrate: The polishing apparatus that polishes an inner circumferential surface of a disk-shaped substrate including a portion having a hole at the center thereof, the polishing apparatus is provided with: a rotating table that holds piled workpieces in which a plurality of disk-shaped substrates are piled, a polishing brush that is... Agent: Sughrue Mion, Pllc

20080119116 - Method and apparatus for chemical mechanical polishing: A method and apparatus for performing first and second polishings on a workpiece wherein the first and second polishings are performed using different operating parameters.... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20080119117 - Brake rotor deglazing tool: A deglazing tool for use on motorcycle and ATV disc brake rotors. The tool is handheld and has abrasive pads that engage the rotor braking surface. The abrasive pads cut through the glaze on the braking surface of the rotor. Grip pressure on the handles maintains pad engagement with the... Agent: Carstens & Cahoon, LLP

20080119118 - Retaining ring, flexible membrane for applying load to a retaining ring, and retaining ring assembly: A carrier head that has a base assembly, a retaining ring assembly, a carrier ring, and a flexible membrane is described. A retaining ring assembly has a flexible membrane shaped to provide an annular chamber and an annular retaining ring, wherein annular concentric projections of the flexible membrane are sized... Agent: Fish & Richardson P.c.

20080119119 - Carrier ring for carrier head: A carrier head that has a base assembly, a retaining ring assembly, a carrier ring, and a flexible membrane is described. A carrier ring has an annular upper portion and an annular lower portion having a lower surface with a smaller inner diameter than the upper surface of the annular... Agent: Fish & Richardson P.c.

20080119120 - Carrier head with retaining ring and carrier ring: A carrier head that has a housing, a base assembly, a retaining ring, a carrier ring, and a flexible membrane is described. The base assembly is vertically movable relative to the housing. The retaining ring is connected to and vertically movable relative to the base assembly and has a lower... Agent: Fish & Richardson P.c.

20080119121 - Substrate holding apparatus and polishing apparatus: The present invention relates to a substrate holding apparatus for holding a substrate such as a semiconductor wafer in a polishing apparatus for polishing the substrate to a flat finish. The substrate holding apparatus according to the present invention comprises a top ring body having a receiving space therein, and... Agent: Wenderoth, Lind & Ponack, L.l.p.

20080119122 - Flexible membrane for carrier head: A carrier head that has a base assembly, a retaining ring assembly, a carrier ring, and a flexible membrane is described. The flexible membrane has a main portion and an outer annular portion, wherein a junction between the main portion and the outer annular portion comprises a peripheral edge hinge... Agent: Fish & Richardson P.c.

20080119123 - Fuel filler pipe having trigger point: A fuel filler pipe having a trigger point formed between the fuel supply port and the fuel tank. The trigger point is a trough-like depression which, if there is a structural disruption of the vehicle, will facilitate a buckling mode in the pipe and consequent energy absorption. This configuration reduces... Agent: Thomas Moga Butzel Long

20080113588 - Gemstone polishing device and method of polishing: A method of polishing diamonds held by a tang (100) having a predefined axis (160) orthogonal to polishing surface (110). The axis (160) returns to its original spatial orientation with respect to the polishing surface (110) at the end of each facet of the diamond (122) polishing.... Agent: Smith Frohwein Tempel Greenlee Blaha, Llc

20080113589 - Composition and method for damascene cmp: The invention provides a method of chemically-mechanically polishing a substrate having at least one feature defined thereon, wherein the feature has at least one dimension with a size W, with a chemical-mechanical polishing composition. The polishing composition comprises particles of an abrasive wherein the particles have a mean particle diameter... Agent: Steven Weseman Associate General Counsel, I.p.

20080113590 - Polishing method for semiconductor wafer and polishing apparatus for semiconductor wafer: A polishing method for a semiconductor wafer having a polishing target surface at a periphery portion thereof is disclosed. The method includes pressing a polishing member against the polishing target surface along a circumference of the semiconductor wafer by a plurality of pressing portions while rotating the semiconductor wafer in... Agent: Finnegan, Henderson, Farabow, Garrett & Dunner LLP

20080113591 - Blade sharpening holder: A sharpening holder for manually-sharpening a cutting edge to be honed over a honing surface includes a cylindrical body having a first end, a second end and an opening formed through the body between the first end and the second end, the opening having a tool support surface, an adjustable... Agent: Mesmer & Deleault, Pllc

20080113592 - Method of lapping gears: The present invention provides a controllable gear lapping process whereby the lapping process may be modified at discrete locations on the tooth surface in order to selectively modify the tooth flank surface.... Agent: The Gleason Works

20080113593 - Polishing holder for workpiece end surface: In a polishing holder for workpiece end surface, a main body and a framework are respectively provided with corresponding fixing portions, at least one of the two fixing portions has at least one set of upper and lower contact portions, the upper and the lower contact portions on each set... Agent: Bruce H. Troxell

20080113594 - Centerless belt grinder: A multi-head centerless belt grinder for removing material from a workpiece includes a common base and a plurality of grinding heads spaced apart from one another and mounted to the common base. Each grinding head includes a moveable work rest blade, a moveable regulating wheel and a moveable grinding belt... Agent: Harness, Dickey & Pierce, P.L.C

20080113595 - Pool cue tip conditioning apparatus: An apparatus for abrading and shaping a pool cue tip comprises: i) a block having an upper side portion having a concave contour therein said contour having an abrasive surface so that a pool cue tip can be abraded and shaped therewith; and, ii) a block holder adapted to closely... Agent: Red Gallagher

20080108280 - Initial position setting method of grinding wheel in vertical double disc surface grinding machine: The present invention provides an initial position setting method of grinding wheels, before starting a grinding operation, in a vertical double disc surface grinding machine for surface grinding the upper and lower grinding surfaces of a work-piece simultaneously by rotation-driving a pair of grinding wheels by a grinding wheel rotation... Agent: Crowell & Moring LLP Intellectual Property Group

20080108281 - Slurry blasting apparatus for removing scale from sheet metal: An apparatus and method of removing scale from the surfaces of processed sheet metal employs a scale removing medium propelled by counter-rotating pairs of wheels positioned in close proximity to the sheet metal surfaces.... Agent: Thompson Coburn, LLP

20080108279 - Control system and method for processing jewelry and the like: A control system for controlling processing of workpieces such as jewelry has gantry and gimbal units having x, y, z translational and x, y, z rotational degrees of freedom, the units carrying a gripper for holding a piece of jewelry. Drive motors are associated with each translational and rotational degree... Agent: Gordon & Rees LLP

20080108282 - Method for manufacturing fuel cell metallic separator: A metallic separator according to a first embodiment is formed by obtaining a blank by rolling a metallic material having conductive inclusions, and removing a surface of the blank by 2% or more of the thickness of the blank. A metallic separator according to a second embodiment is formed by... Agent: Arent Fox LLP

20080108283 - Tire uniformity machine grinding assembly: A grinding assembly contacts a tire supported by a frame relative to the tire. The grinding assembly includes at least one section, and an axial positioning assembly supporting the at least one section. The axial positioning assembly enables the at least one section to be axially repositioned relative to the... Agent: Edward G. Greive, Esq. Renner, Kenner, Greive, Bobak, Taylor & Weber

20080108284 - Assembly for grinding electrodes: A device for grinding welding electrodes comprises a driving motor, a shaft driven by said driving motor and a grinding wheel driven by said driving motor through said shaft, said grinding wheel having a first and a second grinding surface. A first guiding block is provided having at least one... Agent: Law Offices Silber & Fridman

20080108285 - Multi-bladed razor cartridge sharpener with aloe vera gel lubricant: Apparatus for sharpening and or honing a multi-bladed razor cartridge including a sharpening member, a housing to secure the sharpening member. An aloe Vera or soap solution dispenser provides a lubricant to the sharpening member to lubricate the razor and a housing to limit the travel of the razor on... Agent: Buhler Associates Buhler, Kirk A.

20080108286 - Carrier plate holding an abrading element and abrading plate: The invention concerns a carrier plate (2) holding an abrading element, for detachable mounting on a rotatably mounted abrading plate (1) driven during use, for abrading stone or concrete floors, which carrier plate (2) has sides (2a, 2b) which form an acute angle with each other. The sides (2a, 2b)... Agent: Merchant & Gould Pc

20080108287 - Fixture for grinding machines: A fixture for grinding machines includes a first base (10), a second base (20) and a driving component (40). The first base defines a first working groove (11) therein. The second base defines a second working groove (21) corresponding to the first working groove therein. The driving component is configured... Agent: Pce Industry, Inc. Att. Cheng-ju Chiang

20080108288 - Conductive polishing article for electrochemical mechanical polishing: Embodiments of a polishing article for processing a substrate are provided. In one embodiment, a polishing article for processing a substrate comprises a fabric layer having a conductive layer disposed thereover. The conductive layer has an exposed surface adapted to polish a substrate. The fabric layer may be woven or... Agent: Patterson & Sheridan, LLP - - Appm/tx

20080102732 - Carrier head for workpiece planarization/polishing: An edge control system for deployment on a CMP carrier head comprising a bladder and a carrier head housing having a passage extending therethrough. The bladder includes a flexible diaphragm and is coupled to the carrier head housing. The edge control system comprises first and second annular ribs, each of... Agent: Ingrassia Fisher & Lorenz, P.C.

20080102736 - Method for machining rotary parts: In a method for machining rotation pieces, including at least one working step, and wherein at least one surface of the workpiece which is clamped in the device is subjected to a grinding step, at least one front-sided boring is carried out in the workpiece in the same clamping device... Agent: Jordan And Hamburg LLP

20080102737 - Pad conditioning device with flexible media mount: A method and apparatus for conditioning is provided. In one embodiment, a conditioning disk includes a plurality of conditioning elements each having an abrasive working surface, and a flexible foundation having the conditioning elements coupled thereto. The flexible foundation has physical properties that retain the working surfaces in a substantially... Agent: Patterson & Sheridan, LLP

20080102733 - Apparatus for grinding and/or finishing a workpiece: The invention relates to a device (2) for grinding and/or finishing a workpiece (8) mounted on and/or in a workpiece mounting (22, 28). The workpiece (8) and the workpiece mounting (22, 28) may be set in an oscillating movement (86) by means of a drive device (60, 108) and form... Agent: Brinks Hofer Gilson & Lione

20080102734 - Polishing pad assembly with glass or crystalline window: Methods and apparatus for providing a chemical mechanical polishing pad. The pad includes a polishing layer having a top surface and a bottom surface. The pad includes an aperture having a first opening in the top surface and a second opening in the bottom surface. The top surface is a... Agent: Fish & Richardson P.C.

20080102735 - Concentrated abrasive slurry compositions, methods of production, and methods of use thereof: Concentrated slurry compositions for use in loose-abrasive machining processes, particularly concentrated abrasive slurries for use in wire saw processes. These concentrated slurry compositions comprise abrasive particles uniformly and stably dispersed in a vehicle. The concentrated slurry compositions are easily converted to working slurry compositions by simple dilution and mixing with... Agent: Edwards Angell Palmer & Dodge LLP

20080102738 - Method and system of using offset gage for cmp polishing pad alignment and adjustment: A method and system are provided using an offset dial gage for alignment and adjustment of a polishing pad that has been attached to a turntable of a chemical mechanical polishing (CMP) device. In a described embodiment, an offset dial gage has a surface that contacts a side of a... Agent: Hitt Gaines, PC Lsi Corporation

20080102739 - Pneumatic grinder with improved handle structure: A pneumatic grinder with improved handle structure comprising a driving portion, a connecting portion, and a grinding portion wherein the connecting portion has a handle fixing portion at one side thereof that has an accommodating space to receive a pivot element wherein the handle fixing portion has a slot on... Agent: Rosenberg, Klein & Lee

20080102740 - Pad for preventing axial shift for use in grinding of eyeglass lens coated with fluorine: The problem is solved by a pad for preventing axial shift for use in grinding of a eyeglass lens coated with fluorine comprising a laminate containing a first pressure-sensitive adhesive layer, an elastic material layer, an adhesive layer, a resin film and a second pressure-sensitive adhesive layer, the elastic material... Agent: Birch Stewart Kolasch & Birch

20080102741 - Single-layer polishing pad: A foamed plastic is cut to form a single-layer polishing pad having a desired rigidity and compressibility. A polishing surface of the polishing pad has a higher density than a mounting surface of the polishing pad. The polishing surface and the mounting surface may have different areas having different densities... Agent: Pai Patent & Trademark Law Firm