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Abrading inventions 05/07

Recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing format for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application.

  05/31/2007 > patent applications in patent subcategories.

20070123149 - Apparatus for evaluating the quality of a lapping plate: Embodiments of the present invention pertain to a evaluating the quality of a lapping plate. In one embodiment, an information receiver receives information while the lapping plate is being used to lap a slider. The information indicates the quality of a lapping plate. A quality determiner that evaluates the quality... Agent: Wagner, Murabito & Hao LLP

20070123150 - Method of evaluating the quality of a lapping plate: Embodiments of the present invention pertain to a evaluating the quality of a lapping plate. In one embodiment, information that indicates the quality of a lapping plate is received while the lapping plate is being used to lap a slider, and the information is used to evaluate the quality of... Agent: Wagner, Murabito & Hao LLP

20070123151 - Apparatus for optical inspection of wafers during polishing: The present invention is aimed to provide a measurement system installable within a processing equipment and more specifically within the exit station of a polishing machine. The optical scheme of this system includes a spectrophotometric channel, an imaging channel and also means for holding the wafer under measurement.... Agent: Browdy And Neimark, P.l.l.c. 624 Ninth Street, Nw

20070123152 - Incorporation of particulate additives into metal working surfaces: A mechanical device for lapping, and a method therefor, the device including: (a) a metal workpiece having a metal working surface; (b) a contact surface, disposed generally opposite the working surface, for moving in a relative motion to the working surface; (c) abrasive particles disposed between the contact surface and... Agent: Dr. Mark Friedman Ltd. C/o Bill Polkinghorn

20070123153 - Texturing slurry and texturing method by using same: Texturing slurry for texturing a substrate for a magnetic hard disk is obtained by dispersing abrading particles of a specified kind in a specified kind of dispersant. The abrading particles include diamond clusters formed with artificial diamond particles with primary particle diameter of 20 nm or less and surrounded by... Agent: Beyer Weaver LLP

20070123154 - Polishing apparatus: A polishing apparatus is used to polish a workpiece such as a semiconductor wafer. The polishing apparatus includes a polishing table having a polishing surface, a dresser for dressing the polishing surface, a substrate holder for holding and pressing a substrate against the polishing surface to polish the substrate with... Agent: Wenderoth, Lind & Ponack, L.L.P.

20070123155 - Sharpening system having multiple abrasive components: An abrasive sharpening system having multiple sharpening stations supported on a base. One of the stations includes ceramic rods having a partial curved outer surface and a pair of flat intersecting surfaces forming a longitudinally extending abrasive edge. The base further supports a flat abrasive stone and a pair of... Agent: Edward D. Gilhooly

  
05/24/2007 > patent applications in patent subcategories.

20070117496 - Method for preparing decorative elements: A process for making a slab of, e.g., stone, wood, White Granite and the like, decorative element, by sandblasting therein a relatively deep cavity, using a jet of particles having at least hardness 7 that are forced through a resilient PVC (Poly Vinyl Chloride) mask, which protects the surfaces of... Agent: Kevin D Mccarthy Roach Brown Mccarthy & Gruber

20070117497 - Friction reducing aid for cmp: The invention provides a chemical-mechanical polishing system for polishing a substrate comprising a polishing component, a water-soluble silicate compound, an oxidizing agent, and water, wherein the pH of the polishing system is about 8 to about 12. The invention further provides a method of chemically-mechanically polishing a substrate with the... Agent: Steven Weseman Associate General Counsel, I.p.

20070117498 - Apparatus at a flat card or roller card for grinding a clothing drawn onto a rotating roller: In an apparatus at a carding machine for grinding a clothing drawn onto a rotating roller, having a carrying device with at least one grinding element and an advancing device serving to set the grinding element against the clothing, wherein the apparatus comprises a biasing device serving for automatically continuing... Agent: Venable LLP

20070117499 - Rotary protecting hood of a pneumatic grinder: The invention discloses a rotary protecting hood of a pneumatic grinder that comprises a connecting end disposed on a pneumatic grinder body, a grinder wheel disposed on the connecting end, and a protecting hood for sheltering the grinder wheel, wherein the connecting end includes a limit member, and the limit... Agent: Birch Stewart Kolasch & Birch

20070117500 - Materials for chemical mechanical polishing: A polishing article and method for manufacturing a polishing article for use in a chemical mechanical polishing process is disclosed. The polishing article has a plurality of polishing material tiles separated by grooves formed in or through a polishing material and may be adhesively bound to a base film. The... Agent: Patterson & Sheridan, LLP

  
05/17/2007 > patent applications in patent subcategories.

20070111637 - Substrate holding apparatus and polishing apparatus: A substrate holding apparatus holds a substrate such as a semiconductor and presses the substrate against a polishing surface. The substrate holding apparatus includes a top ring body (2) for holding the substrate, a plurality of fluid passages (33, 34, 35, 36) for supplying a fluid to a plurality of... Agent: Wenderoth, Lind & Ponack, L.L.P.

20070111638 - Pad assembly for electrochemical mechanical polishing: Embodiments of a pad assembly for processing a substrate are provided. The pad assembly includes a processing layer having a working surface adapted to process a substrate, a lower layer coupled to and disposed below the processing layer, and an electrode having an upper surface disposed above the lower layer... Agent: Patterson & Sheridan, LLP

20070111639 - Slurry supply unit for cmp apparatus: A slurry supply unit for a CMP apparatus is disclosed. The slurry supply unit includes a slurry flow sensor in a slurry injection pipe to measure the flow of the injected slurry, an auxiliary pump engaged with a slurry distribution line to discharge the slurry at a predetermined flow, and... Agent: The Law Offices Of Andrew D. Fortney, Ph.d., P.C.

20070111640 - Method and system for communicating an operating state of a dental milling machine: An improved milling machine makes use of individually controlled x-axis, y-axis, and z-axis carriages. These carriages provide positive and precise control of the position of the cutting tools and the blank to be cut. The tools are located in spindles that are moved in the x-axis. A work piece or... Agent: David H. Judson

20070111641 - Methods and apparatus for electromechanically and/or electrochemically-mechanically removing conductive material from a microelectronic substrate: Methods and apparatuses for electromechanically and/or electrochemically-mechanically removing conductive material from a microelectronic substrate. An apparatus in accordance with one embodiment includes a support member configured to releasably carry a microelectronic substrate and first and second electrodes spaced apart from each other and from the microelectronic substrate. A polishing medium... Agent: Perkins Coie LLP Patent-sea

20070111642 - Apparatus and methods for slurry cleaning of etch chambers: Described are methods of cleaning debris from semiconductor etch chambers or chamber components, one method comprising directing atomized abrasive slurry onto at least some internal surfaces of such a chamber or chamber components. Apparatus for carrying out the methods are also described.... Agent: The Boc Group, Inc.

20070111643 - Apparatus and method for grinding workpieces: An exemplary method for grinding workpieces is provided. Firstly, a plurality of workpieces (18) are bonded together. The bonded workpieces have a central axis (181). Secondly, a grinding wheel (10) is provided. The grinding wheel has a rotating axis (100), and the rotating axis is perpendicular to the central axis.... Agent: PCe Industry, Inc. Att. Cheng-ju Chiang Jeffrey T. Knapp

20070111644 - Thick perforated polishing pad and method for making same: A thick perforated polishing pad and method for making same which includes a polishing pad having a thick polymer sheet with multiple circular openings or perforations contained therein that are produced in the pad by machining techniques such as drilling.... Agent: Snell & Wilmer L.L.P. (main)

20070111645 - Sweeper burnish head arrangement and method for burnishing a surface of a disc: A skewed burnishing head arrangement is provided for burnishing the surface of a disc. The skewing of the burnishing head relative to the diameter perpendicular to a sweeping direction provides improved wiping action that catches loose particles and surface contamination, as well as performing aggressive asperity cutting and surface conditioning,... Agent: Mcdermott, Will & Emery

20070111646 - System for satin finishing of sheet metal by means of mechanically fixed flap wheels: A system (1) for satin finishing of sheets of metal (4) uses mechanically fixed flap wheels (6), namely flap wheels (6) whose flaps (9) are fixed mechanically to the hub (10) of the flap wheel (6). The system includes at least one satin finishing station (5)—equipped with at least one... Agent: Young & Thompson

20070111647 - Apparatus for supplying small part for manufacturing vehicle: An apparatus for supplying a small part for manufacturing a vehicle includes: a stage on which a plurality of small parts are disposed; a first transferrer transferring the plurality of small parts loaded on the stage to a leading edge of the stage; a stopper which is disposed on the... Agent: Morgan, Lewis & Bockius LLP (sf)

  
05/10/2007 > patent applications in patent subcategories.

20070105483 - Methods and apparatus for discrete mirror processing: A method is described for the processing of substrates for utilization as discrete mirrors. The method includes temporarily mounting a first end of at least one substrate onto a grinding machine plate, engaging a second end of the at least one substrate with a grinding wheel, rotating the plate and... Agent: Honeywell International Inc.

20070105484 - System and method for duplicating keys: A key duplication system employs a modular key duplication attachment in combination with a high-speed, rotary powered tool and a profiled abrasive cutter. The attachment comprises a base, a carriage assembly movable relative to the base, a profiled stylus secured to the base, a first clamping vise for retaining a... Agent: Brian Dinicola

20070105485 - Method of producing iii-nitride substrate: An ingot 3 of a hexagonal III-nitride crystal is cut using a wire array 21 composed of a wire 22. On this occasion, the ingot 3 is cut in such a manner that the ingot 3 is sliced with supply of an abrasive fluid while feeding at least one of... Agent: Mcdermott Will & Emery LLP

20070105486 - Subsea abrasive jet cutting system and method of use: An apparatus for cutting a material underwater is disclosed where the apparatus uses a mixture of abrasive material in a non-aspirated suspension mixed with a high pressure fluid, e.g. seawater. It is emphasized that. this abstract is provided to comply with the rules requiring an abstract which will allow a... Agent: Duane Morris LLP

20070105487 - Apparatus and process for cylindrically grinding workpieces: An apparatus for cylindrically grinding workpieces includes a first holding tool (10), a second holding tool (12), and a grinding wheel (14). The first holding tool is configured for positioning un-ground workpieces (18), and the first holding tool defines a plurality of first grooves (104) for containing the un-ground workpieces... Agent: PCe Industry, Inc. Att. Cheng-ju Chiang Jeffrey T. Knapp

20070105488 - Tools, machines and processes for deburring cut edges on workpieces: A tool for deburring cut edges on workpieces has a pressure body in the form of a rolling body, by means of which, as relative longitudinal movement of rolling body and workpiece takes place, pressure can be applied to the burr on the relevant cut edge in the direction towards... Agent: Fish & Richardson PC

20070105489 - Compound hook and loop drum system for a floor sander: A powered floor sanding system with a motorized drum-type floor sander with a sanding drum configured as a drum core with a compliant sole covered with a first component layer of a hook and loop fastener system, to which is fastened a removable drum surface of back to back layers... Agent: Maine & Asmus

20070105490 - Pneumatic blocking support for an optical lens: The pneumatic blocking support which is used to block an optical lens (200) on a machine or device has means (3) for fixing it on a corresponding element of the machine or device. The blocking means comprise a central cavity (8) and a joint (9) having at least one annular... Agent: Young & Thompson

20070105491 - Wafer carrier pivot mechanism: A pivoting wafer carrier having a minimum of internal friction and a smooth, continuous pivoting motion. The pivot mechanism includes a lower ring mounted on a pressure plate, an upper ring mounted on a housing upper plate and ball transfer units disposed on the lower ring. Corresponding bearing wedges depend... Agent: Crockett & Crockett

  
05/03/2007 > patent applications in patent subcategories.

20070099544 - Apparatus and method for fabricating liquid crystal display panel: An apparatus and method for fabricating a liquid crystal display panel are disclosed. In case of the single mode that liquid crystal display panels are fabricated with the same size on a large glass substrate, unit liquid crystal display panels are kept and discarded not to proceed with a follow-up... Agent: Mckenna Long & Aldridge LLP

20070099543 - Numeric-control work-centre for machining plates of glass, stone, marble or the like, with two or more machining heads: A numeric-control work-centre for machining plates of glass, marble and natural or synthetic stones comprises: a bench, defining a work surface, designed to receive the plates to be machined; two fixed side members, set at the two sides of the work surface; an overhead cross-member, guided over the two side... Agent: Nixon & Vanderhye, PC

20070099545 - Pad characterization tool: Tools and methods for in-situ characterizing of a surface of a polishing pad are described. A characterization tool is integrated with polishing tool so that the polishing pad can be monitored in-situ. The characterization tool and the polishing pad can be rotated or moved so that any portion of the... Agent: Fish & Richardson P.C.

20070099546 - Grinding apparatus for treatment of a surface: The present invention concerns a grinding apparatus (1) for processing a workpiece (20), including a support arrangement (4) for a number of grinding heads (6) that each includes a grinding element (2) and a grinding motor (3) driving an associated grinding element (2), where the support arrangement (4) includes an... Agent: James C. Wray

20070099547 - Polishing device and method with multi composite: A polishing device and method with a multi composite are provided. The polishing device has a first end and a second end, and includes a spinning axle having a magnetic end mounted on the first end, an inductance coil wound around the spinning axle, a magnetic pole connected to the... Agent: Bever Hoffman & Harms, LLP Tri-valley Office

20070099548 - Grinding wheel for roll grinding application and method of roll grinding thereof: Iron and steel rolls are ground to production quality requirements with a grinding wheel that requires minimal wheel wear compensation, profile error compensation or taper error compensation during the grinding process. The grinding wheel consists essentially of a superabrasive material selected from the group of natural diamond, synthetic diamond, cubic... Agent: Pepper Hamilton LLP

20070099549 - Abrasive cleaning and honing device and method of honing concrete surfaces: A cleaning element (36) for a rotating disc cleaning pad 32 to hone a cement floor surface. Each cleaning element has a flat flexible abrasive surface (39) that is transversely positioned to the direction of motion to provide flex during cleaning of a cement floor surface.... Agent: Reising, Ethington, Barnes, Kisselle, P.C.

20070099550 - Wafer grinding and tape attaching apparatus and method: A wafer grinding and tape attaching apparatus and method, the method includes providing a wafer to a chuck table, grinding a back side of the wafer, providing a wafer ring having dicing tape and attaching the dicing tape to the back side of the ground wafer.... Agent: Harness, Dickey & Pierce, P.L.C

20070099551 - Sanding blocks for use with adhesive-backed sandpaper: A sanding block and a kit for sanding curved surfaces are provided. The sanding block includes an elongated body which has a first sanding surface; and a sandpaper removably affixed to the first sanding surfaces wherein the body is elastically deformable such that the block can conform against a curved... Agent: Sutherland Asbill & Brennan LLP

20070099552 - Conductive pad with ion exchange membrane for electrochemical mechanical polishing: An article of manufacture and apparatus are provided for processing a substrate surface. In one aspect, an article of manufacture is provided for polishing a substrate including polishing article comprising a body having at least a partially conductive polishing surface. An electrode is disposed below the polishing surface having a... Agent: Patterson & Sheridan, LLP

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