Abrading inventions 02/07

20070042676 - Blasting apparatus and blasting method: The present invention provides a lasting apparatus which is provided with an ejection device, which ejects blast media, and a recovery device, which sucks and recovers ejected and used blast media, on a traveling carriage, ejects the blast media to a surface to be treated by the ejection device while... Agent: Roberts, Mlotkowski & Hobbes

20070042677 - Methods for lapping using pneumatically actuated flexible coupling end effectors: Methods for performing surface lapping using a robotic system are provided. In one embodiment, a method for lapping a surface includes providing a lapping assembly having a first base coupled to a second base by a flexible coupling member, and a lapping medium coupled to the second base, the flexible... Agent: Lee & Hayes, PLLC

20070042678 - Plating removing apparatus for three-piece wheel: To provide a plating removing apparatus for 3-piece wheels, which can easily and neatly remove plating at the welding planned portion of the superimposed part of the inner rim and the outer rim. A plating removing apparatus that removes plating of a welding planned portion R in a three-piece wheel... Agent: Armstrong, Kratz, Quintos, Hanson & Brooks, LLP

20070042675 - Spectrum based endpointing for chemical mechanical polishing: Methods and apparatus for spectrum-based endpointing. An endpointing method includes selecting a reference spectrum. The reference spectrum is a spectrum of white light reflected from a film of interest on a first substrate and has a thickness greater than a target thickness. The reference spectrum is empirically selected for particular... Agent: Fish & Richardson P.C.

20070042681 - Spectrum based endpointing for chemical mechanical polishing: Methods and apparatus for providing a chemical mechanical polishing pad. The pad includes a polishing layer having a top surface and a bottom surface. The pad includes an aperture having a first opening in the top surface and a second opening in the bottom surface. The top surface is a... Agent: Fish & Richardson P.C.

20070042680 - Spectrum based endpointing for chemical mechanical polishing: Methods and apparatus for providing a flushing system for flushing a top surface of an optical head. The flushing system includes a source of gas configured to provide a flow of gas, a delivery nozzle, a delivery line that connects the source of gas to the delivery nozzle, a vacuum... Agent: Fish & Richardson P.C.

20070042679 - Substrate polishing apparatus: A substrate polishing apparatus (10) polishes a substrate (20) to a flat mirror finish. The substrate polishing apparatus (10) has a polishing table (12) against which a substrate (20) is pressed, a light-emitting and light-receiving device (24) to emit measurement light from the polishing table (12) to the substrate (20)... Agent: Wenderoth, Lind & Ponack, L.L.P.

20070042682 - Transparent polishing pad: The present invention relates to a polishing pad useful for planarizing a substrate in a CMP process using a polishing composition. The polishing pad is transparent and allows for the use of an in-situ optical end-point detection apparatus without the need for a separate aperture or window in the polishing... Agent: Rohm And Haas Electronic Materials Cmp Holdings, Inc.

20070042683 - Optical fiber polishing and finishing system, device and method: A method, device and system for polishing and/or finishing one or more optical fibers. The method comprising securing an optical fiber connector to at least one holder, generating a tilting motion at the end of the optical fiber, adjusting the tilting motion of the optical fiber to create the desired... Agent: Gardere Wynne Sewell LLP Intellectual Property Section

20070042684 - Glass bottle with engraved label and method therefor: A glass bottle having a body adapted to contain a beverage with a label that carries a predetermined information, and a method for engraving the label are provided. The label is engraved on a predetermined portion of the body by selectively removing glass from the body. The selective glass removal... Agent: Park Law Firm

20070042686 - Method and apparatus for cleaning slurry depositions from a water carrier: Disclosed herein is a process for diminishing contamination of an integrated circuit wafer caused by residual slurry components disposed on a back side of a carrier for engaging an integrated circuit wafer. Also disclosed is a CMP machine configured to wash a back side of a carrier.... Agent: Hitt Gaines, PC Agere Systems Inc.

20070042687 - Method and device for feeding a chemical-mechanical polishing machine with a polishing product: In a chemical-mechanical polishing machine, polishing product comprising abrasive particles suspended in a reactive liquid is fed to the machine for use in a polishing operation that is divided into at least a first step and a second step. During the second step, the polishing machine is fed via a... Agent: Jenkens & Gilchrist, PC

20070042685 - System and method for cutting granite or similar materials: An improved frame saw system has multiple blades for cutting slabs of masonry materials. The improved systems and methods allow for cutting masonry materials into slabs having surface small deviations. A frame saw system may include a support structure of unifying material bonded to at least one of the blades... Agent: Pepper Hamilton

20070042688 - Apparatus for treating edges of panels and method: An apparatus for treating edge surfaces of panels, comprises conveyor tables to displace panels in sequence, two of the conveyor tables being configured such that panels are sequentially displaced in longitudinal alignment between the two conveyor tables with a longitudinal edge first. Two other of the conveyor tables are configured... Agent: Ogilvy Renault LLP

20070042689 - Device for grinding spinning cots: The device has a rotating grinding surface and a receptacle into which a spinning cot to be ground is inserted. The receptacle is advanced in a direction toward the grinding surface until the spinning cot inserted into the receptacle contacts the grinding surface. A size determination device for determining the... Agent: Gudrun E. Huckett Draudt

20070042690 - Rotor structure of pneumatic tool: A rotor structure of pneumatic grinder, including a rotor main body and at least one reinforcing plate. The rotor main body is formed with a central shaft hole for a rotary shaft to pass through. Several radial projecting sections are formed on outer circumference of the rotor main body at... Agent: Rosenberg, Klein & Lee

20070042691 - Polishing pad cleaner and chemical mechanical polishing apparatus comprising the same: A polishing pad cleaner of a chemical mechanical polishing apparatus throughly and efficiently cleans the polishing pad of the apparatus. The head of the polishing pad cleaner includes a nozzle support plate, a plurality of nozzles mounted to the nozzle support plate, and extending from the bottom of the nozzle... Agent: Volentine Francos, & Whitt PLLC

20070042692 - Grinding ring having grinding segments: A grinding ring having grinding covers for grinding profiled strips or profiled edges. The grinding ring includes a row of carrier segments, each carrier segment having grinding segments thereon. The grinding segments are connected with one another to form a one-piece grinding ring.... Agent: Barnes & Thornburg LLP

20070042693 - Polishing pad and method of manufacture: The present invention relates to a method of manufacturing a polishing pad with embedded polymeric capsules useful for planarizing a substrate in a CMP process using a polishing composition. The method reduces non-uniformity of the polishing pad due to capsule floating, differential heating and capsule expansion by the use of... Agent: Rohm And Haas Electronic Materials Cmp Holdings, Inc.

20070037484 - Method and system for cleaning: A method and a system for cleaning the glass surface of an object, such as a surface light, a run way guide light, or a reflector, installed on various pavements or roads, by propelling a cleaning agent from a blast nozzle to the glass surface. The blast nozzle is installed... Agent: Striker Striker & Stenby

20070037485 - Method of aligning the upper and lower centering bells of a lens doublet assembly machine: A method for aligning the upper and lower centering bells of a lens doublet assembly machine is provided. In one example of the method, the method includes positioning an alignment tool with respect to a base plate of the lens doublet aligning apparatus; positioning an upper bell shaft with respect... Agent: Haverstock & Owens LLP

20070037486 - Polishing pad, method of manufacturing the polishing pad, and chemical mechanical polishing apparatus comprising the polishing pad: A polishing pad of a CMP apparatus has a plurality of pores. A characteristic associated with the pores, such as average size or pore density, varies substantially from region to region of the pad across the pad in a diametral direction of the pad. The polishing pad can be designed... Agent: Volentine Francos, & Whitt PLLC

20070037487 - Polishing pad having a sealed pressure relief channel: The present invention provides a chemical mechanical polishing pad comprising a window formed in the polishing pad, the window having a void provided on a side thereof. The invention further provides a pressure relief channel provided in the polishing pad from the void to a periphery of the polishing pad.... Agent: Rohm And Haas Electronic Materials Cmp Holdings, Inc.

20070037488 - Polishing pad having a window with reduced surface roughness: The present invention provides a polishing pad for performing chemical mechanical planarization of semiconductor substrates. The polishing pad comprises a polishing pad body having an aperture formed therein and a window fixed in the aperture for performing in-situ optical measurements of the substrate. The window has a lower surface capable... Agent: Rohm And Haas Electronic Materials Cmp Holdings, Inc.

20070037489 - Centerless grinder: A centerless grinder for grinding an elongated workpiece includes a grinding wheel having a working surface with a plurality of raised areas extending circumferentially around at least a portion of the working surface. A platform is provided having an elongated top surface for supporting the workpiece substantially adjacent to the... Agent: Lerner, David, Littenberg, Krumholz & Mentlik

20070037490 - Methods and apparatus for selectively removing conductive material from a microelectronic substrate: Methods and apparatuses for selectively removing conductive materials from a microelectronic substrate. A method in accordance with an embodiment of the invention includes positioning the microelectronic substrate proximate to and spaced apart from an electrode pair that includes a first electrode and a second electrode spaced apart from the first... Agent: Perkins Coie LLP Patent-sea

20070037491 - Chemically modified chemical mechanical polishing pad, process of making a modified chemical mechanical polishing pad and method of chemical mechanical polishing: A method of CMP of a substrate surface includes providing a polishing pad having a polishing layer, that may be substantially free of abrasive particles, with a functional group chemically bonded (covalent or ionic) to the polishing layer. The functional group acts as an activator or catalyst for a compound... Agent: Ppg Industries, Inc. Department Of Law - Intellectual Property

20070037492 - Method of removing a coating: A method of removing at least a part of a thermal sprayed wear resistant coating on a gas turbine engine part includes grinding the thermal sprayed wear resistant coating with a superabrasive grinding wheel.... Agent: Kinney & Lange, P.A.

20070037493 - Pad conditioner for conditioning a cmp pad and method of making such a pad conditioner: The invention provides a pad conditioner for conditioning a CMP pad. The pad conditioner includes a substrate, a plurality of cavities on the substrate, a bonding agent filling in the cavities, and a plurality of abrasive particles securely placed and fixed in the cavities separately. The cavities are arranged in... Agent: Pai Patent & Trademark Law Firm

20070037494 - Sanding tool with rotatable handle: A hand-held, manually-operated sanding tool including a base member, a clamping mechanism, a handle and a mounting assembly. The clamping mechanism is adapted to secure a sheet-like abrasive material to the base member. The handle includes a neck and a grip. The mounting assembly rotatably mounts the handle to the... Agent: 3m Innovative Properties Co.

20070037495 - Abrasive water jet cutting machine: To provide an abrasive water jet cutting machine in which an abrasive recovery unit can be continuously used without needing maintenance, and an abrasive having a uniform grain size can be easily recovered, the machine has a catch tank for receiving a high-pressure abrasive mixture liquid jetted from a jet... Agent: Wenderoth, Lind & Ponack, L.L.P.

20070037496 - Compensation for a fluid cutting apparatus: A system and method for positioning a fluid stream for cutting a double contour workpiece includes a compensation module configured to receive information regarding a contour path in at least five degrees of freedom for cutting the double contour workpiece and a velocity of movement of the fluid stream during... Agent: Westman Champlin & Kelly, P.A.

20070037497 - Plating removing apparatus for two-piece wheel: To provide a plating removing apparatus for 2-piece wheels, which can easily and beautifully remove plating at the welding planned portion on the rim inner circumferential surface and achieves 2-piece wheels with rims plated without requiring any troublesome operation, said apparatus comprising a pair of support rollers 13 horizontally arranged,... Agent: Armstrong, Kratz, Quintos, Hanson & Brooks, LLP

20070037498 - Sanding apparatus for a sanding machine: A sanding device for a sanding machine includes a carrier, a sanding element and at least two coupling elements with which the sanding element is coupled to the carrier. A movable connection is provided between the sanding element and the carrier, and the ends of the coupling elements coupled to... Agent: Kenyon & Kenyon LLP

20070037499 - Motorized game ticket scratch-off apparatus: A game ticket scratch-off device that includes a housing, a power supply such as a battery, a motor, a head, and an abrasive element. The battery is contained within the housing. The motor is electrically connectable to the battery to be driven thereby. The head is coupled to the motor... Agent: The Law Office Of Randall T. Erickson, P.C.

20070037500 - Flexible abrasive article and method of making: A flexible hand-held abrasive article includes a conformable backup pad having opposed major surfaces, a backing layer affixed to one surface of the backup pad, the backing layer containing a plurality of biaxially oriented openings, and abrasive particles arranged on the backing layer, thereby defining an abrasive surface. A method... Agent: 3m Innovative Properties Company

20070037501 - Abrasive tool: An abrasive tool, suitable for cutting, slotting, grinding and polishing hard materials, such as ceramics, metals, and composites thereof, and methods for making same. The tool includes a plurality of pores positioned in an abrasive region adjacent an outer circumference of the disk. The pores have any predetermined shape, size... Agent: Lowrie, Lando & Anastasi, LLP S1432

20070032169 - Method for aligning and assembling two lens pieces, and a machine to accomplish this task: A method for aligning and assembling two lens pieces, and a machine to accomplish this task are provided. In one example of the method, the method includes holding an upper lens above a lower lens, holding the lower lens in a horizontal position, lowering the upper lens into a contact... Agent: Haverstock & Owens LLP

20070032170 - Polishing pad with built-in optical sensor: An optical sensor that includes a light source and a detector is located within a cavity in a polishing pad so as to face the surface that is being polished. Light from the light source is reflected from the surface being polished and the detector detects the reflected light. The... Agent: Crockett & Crockett

20070032171 - Methods and systems for conditioning planarizing pads used in planarizing susbstrates: Monitoring the process of planarizing a workpiece, e.g., conditioning a CMP pad, can present some difficulties. Aspects of this invention provide methods and systems for monitoring and/or controlling such a planarization cycle. For example, a control system may monitor the proximity of a workpiece holder and an abrasion member by... Agent: Perkins Coie LLP Patent-sea

20070032172 - Polishing liquids for activating and/or conditioning fixed abrasive polishing pads, and associated systems and methods: Polishing liquids for activating and/or conditioning fixed abrasive polishing pads, and associated systems and methods are disclosed. A method in accordance with one embodiment of the invention includes disposing a polishing liquid on a polishing surface of a microfeature workpiece polishing pad. The polishing pad can include a matrix material... Agent: Perkins Coie LLP Patent-sea

20070032173 - Method of finishing cutting elements: A method for manufacturing drill bit inserts in which the inserts are finished in a centrifugal disc finishing machine. The centrifugal disc finishing machine comprises a configured surface rotating relative to a stationary receptacle, and the inserts may be finished with a mass of materials comprising at least one of... Agent: Osha Liang L.L.P.

20070032176 - Method for polishing diamond wafers: A method for polishing diamond wafers. At least a diamond wafer is mounted onto a ceramic plate with wax disposed therebetween and is pressed onto the ceramic plate. The ceramic plate is fixed on a first transmission device of a polishing machine by a vacuum. The ceramic plate is driven... Agent: Rosenberg, Klein & Lee

20070032174 - Polishing apparatus: The present invention relates to a polishing apparatus for polishing a workpiece such as a semiconductor wafer to form a flat surface thereon. The polishing apparatus includes a polishing table (20), a polishing tool (1) attached to an upper surface of the polishing table (20), and a fluid passage (40)... Agent: Wenderoth, Lind & Ponack, L.L.P.

20070032175 - Polishing cloth, polishing cloth processing method, and substrate manufacturing method using same: The present invention is a polishing pad used for polishing a semiconductor substrate, wherein, at least, grooves having a radial pattern are formed on a surface of the polishing pad, and (an average value of the sum totals of the groove volumes in parts immediately below the substrate/area of the... Agent: Oliff & Berridge, PLC

20070032177 - Wafer processing apparatus and wafer processing method using the same: A wafer processing apparatus and a wafer processing method using the same are provided. A grinding wheel may include a wheel body having a plurality of wheel blades to remove a backside of a wafer, each of the plurality of wheel blades in an annular array with respect to each... Agent: Harness, Dickey & Pierce, P.L.C

20070032178 - Shot blast machine: The shot blast machine having a projector with an impeller includes the impeller which is made of a high abrasion-resistant rubber. Therefore, it can increase the durability without damage of the impeller and projectile; it can use the projectile with high grindability, with small particle and light gravity; and it... Agent: Jordan And Hamburg LLP

20070032179 - Shot blast machine: The shot blast machine having a projector with an impeller includes the impeller which is made of a high abrasion-resistant rubber. Therefore, it can increase the durability without damage of the impeller and projectile; it can use the projectile with high grindability, with small particle and light gravity; and it... Agent: Jordan And Hamburg LLP

20070032180 - Slurry residence time enhancement system: A slurry residence time enhancement system for a chemical mechanical polishing apparatus having a base, a platen on the base, a polishing pad on the platen and a polishing head over the polishing pad is disclosed. The system includes at least one slurry distribution unit having a slurry distribution member... Agent: Tung & Associates

20070032181 - Belt oscillating apparatus of belt sander: A belt oscillating apparatus of a belt sander, wherein the belt sander includes a machine frame, a driving wheel, a driven wheel, a sand belt mounted on the driving wheel and the driven wheel, and the belt oscillating apparatus is mounted on the machine frame, comprising two oscillating devices, two... Agent: Bruce H. Troxell

20070032182 - Polishing pad and method of fabricating semiconductor substrate using the pad: It is provided a polishing pad of novel construction capable of controlling actively and efficiently a slurry flow during polishing a surface of a semiconductor substrate, such as a wafer, thus making it possible to precisely and stably performing a desired polishing process. Onto a surface of a pad substrate... Agent: Oliff & Berridge, PLC

20070026768 - Sharpening-trimming assembly: The present invention relates to a sharpening-trimming assembly comprising a base, a casing mounted on said base, the casing having at least two insertion slots provided on the upper portion of the casing for receiving the tool to be sharpened, a moveable rod connecting the base to a engine by... Agent: Merchant & Gould PC

20070026770 - Abrasive agglomerate polishing method: Provided is a method of polishing comprising providing a workpiece, providing a fixed abrasive article, providing conditioning particles, and relatively moving the workpiece and the fixed abrasive article in the presence of the conditioning particles to modify the surface of the workpiece and to condition the fixed abrasive. The fixed... Agent: 3m Innovative Properties Company

20070026769 - Chemical mechanical polishing apparatus and a method for planarizing/polishing a surface: The present invention provides a method for planarizing/polishing a surface, a method for manufacturing an integrated circuit and a chemical mechanical polishing apparatus. The method for planarizing/polishing a surface, among other elements, includes providing a chemical mechanical polishing apparatus (200, 300, 400) having a polishing platen (210, 310, 410), a... Agent: Texas Instruments Incorporated

20070026771 - Edge buster series round blade sharpener and the edge tracker sharpener: Apparatus for sharpening, grinding or sizing a cutting edge on a circular blade which has dulled, chipped, or needs re-sizing blades from 2½″ to 48″ diameter. Differs from prior art in that it sharpens, grinds or sizes circular blades and blades with different geometrical shaped blades. Manually or pneumatically externally... Agent: Kathleen Harden

20070026772 - Apparatus for use in processing a semiconductor workpiece: The present invention provides a chuck for receiving and supporting a semiconductor workpiece for processing. The chuck includes a body for supporting the workpiece. The body is porous or has a plurality of openings, apertures or channels. A compressible corrosion resistant member is disposed around the outer periphery of the... Agent: Mcdermott Will & Emery LLP

20070026773 - Tool for machining surfaces, edge areas and contours: The tool according to the invention has a variable loading of working means (3-6). The total set of working means (3-6) is divided into subsets, which, with respect to the direction of rotation (18), have different working angles (15, 16, 17). By changing the height (35) of subregions (23-28) of... Agent: Notaro And Michalos

20070026774 - Self-contained conditioning abrasive article: Provided is a fixed abrasive article for polishing a workpiece having a hardness comprising (a) a substrate having a first surface and a second surface, (b) a region of abrasive composites distributed on the first surface of the substrate, and (c) a region of conditioning amalgams distributed on the first... Agent: 3m Innovative Properties Company