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Photocopying

Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application.
  
05/21/2015 > 8 patent applications in 5 patent subcategories.

20150138519 - Contamination trap for a lithographic apparatus: Disclosed is a contamination trap arrangement (300) configured to trap debris particles that are generated with the formation of a plasma within a radiation source configured to generate extreme ultraviolet radiation. The contamination trap comprises a vane structure (310) for trapping the debris particles; a heating arrangement (330) for heating... Agent: Asml Netherlands B.v.

20150138520 - Holding device for an optical element in an objective: A holding device for an optical element in an objective has a mount that is connected to the objective, on the one hand, and at least indirectly to the optical element, on the other hand. Arranged between the mount and the optical element is a reinforcing element whose coefficient of... Agent:

20150138521 - Lens module comprising at least one exchangeable optical element: An optical system has a housing with a mount and an opening to a receiving region, the receiving region being located within the housing and including the mount. At least one optical element is inserted into and removed from the receiving region through the opening, and at least one gas... Agent:

20150138523 - Metrology method and apparatus, substrate, lithographic system and device manufacturing method: A metrology target formed by a lithographic process on a substrate includes a plurality of component gratings. Images of the target are formed using +1 and −1 orders of radiation diffracted by the component gratings. Regions of interest (ROIs) in the detected image are identified corresponding the component gratings. Intensity... Agent:

20150138522 - Roller mold manufacturing apparatus and method: In a so-called step-and-repeat method in which a mask pattern is circumferentially written by exposure onto each predetermined region on a surface of a roller mold, an object of the present invention is to improve the spacing accuracy between the mask patterns and to suppress the occurrence of misalignment at... Agent: Asahi Kasei Kabushiki Kaisha

20150138524 - Extreme ultraviolet lithography process and mask: A system of an extreme ultraviolet lithography (EUVL) is disclosed. The system includes a mask having reflective phase-shift-grating-blocks (PhSGBs). The system also includes an illumination to expose the mask to produce a resultant reflected light from the mask. The resultant reflected light contains mainly diffracted lights. The system also has... Agent:

20150138525 - Object exchange method, exposure method, carrier system, exposure apparatus, and device manufacturing method: A carrier apparatus positions a chuck member above a wafer mounted on a fine movement stage, relatively moves the chuck member and the fine movement stage in a vertical direction, makes the chuck member approach a position which is a predetermined distance away from the upper surface of the wafer,... Agent:

20150138526 - Instant film printer incorporating optical collimation layer: Disclosed is a printing device comprising a collimation layer disposed between a display screen and a sheet of instant film. The printing device quickly and compactly prints the display screen contents to the instant film, using a collimation layer that may be embedded in an opaque ribbon and drawn across... Agent: Pacific Opal LLC

  
05/14/2015 > 14 patent applications in 8 patent subcategories.

20150131065 - Foreign substance detection method, foreign substance detection apparatus, exposure method, and method of manufacturing device: A foreign substance detection method includes: judging the presence/absence of a foreign substance by measuring a surface condition of a substrate; measuring a surface condition of a second substrate different from the substrate upon replacing the substrate on the chuck with the second substrate, when it is judged in the... Agent:

20150131064 - Object holder and lithographic apparatus: An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first... Agent: Asml Netherlands B.v.

20150131066 - Mask pattern generation method and optical image calculation method: In a method for generating, with a computer, a pattern of a mask, a pattern on an object plane of a projection optical system is set, shifted plural pupil functions are generated, a matrix containing the generated plural pupil functions is defined, an image of the pattern on the object... Agent:

20150131067 - Lithographic apparatus and device manufacturing method: A field manipulator to provide high resolution control of position in the XY plane and/or focus control. The field manipulator includes a plate located between the patterning device and the substrate. Control of the XY position is provided by tilting of the plate, while control of the focus position may... Agent: Asml Netherlands B.v.

20150131068 - Laser device, and exposure device and inspection device provided with laser device: A laser device includes: a laser light output unit that outputs a fundamental wave laser light; a wavelength conversion unit that performs wavelength conversion of the fundamental wave laser light and outputs a converted laser light; an output detector that detects a power of the converted laser light; a power... Agent:

20150131069 - Mask protection device, exposure apparatus, and method for manufacturing device: A reticle protection device capable of keeping a reticle therein is provided with an inner pod capable of keeping the reticle therein; an outer pod capable of keeping the inner pod therein; an electroconductive movable contact portion provided on at least one of the inner pod and the outer pod... Agent: Nikon Corporation

20150131070 - Photolithography system, method for transporting photo-mask and unit therein: A photolithography system includes a photo-mask storage, at least one photolithography machine and an overhead crane for transporting at least one photo-mask at least between the photo-mask storage and the photolithography machine. The overhead crane includes at least one main rail, a mask girder, a mask hoist and a mask... Agent: Taiwan Semiconductor Manufacturing Co., Ltd.

20150131071 - Semiconductor device manufacturing apparatus: A semiconductor device manufacturing apparatus includes a mask stage including a mask holder system that fixes a photomask, the mask holder system having a first fixing portion mounted at a first position of the mask holder system to fix the photomask, and a second fixing portion at a second position... Agent:

20150131072 - Low contact imprint lithography template chuck system for improved overlay correction: Imprint lithography template chucks and related systems and methods are provided that substantially maintain structural support functions while significantly enhancing imprint quality functions. The chucks incorporate dynamic vacuum seals to substantially reduce template contact during alignment and distortion correction while still providing good structural support upon separation.... Agent: Canon Nanotechnologies, Inc.

20150131073 - Original holding apparatus, exposure apparatus, method of manufacturing article and original holding method: The present invention provides an original holding apparatus which holds an original, comprising a first holding unit configured to hold the original, a second holding unit configured to hold the original, a fixing unit configured to fix the second holding unit, and an adjustment unit configured to perform adjustment of... Agent:

20150131075 - Drawing apparatus, and method of manufacturing article: A drawing apparatus includes: a blanker; a deflector; a stage configured to hold the substrate and to be movable; and a controller configured to control the deflector and the stage so as to perform drawing by scanning the charged particle beam on the substrate by causing the deflector to deflect... Agent:

20150131077 - Electron beam lithography methods including time division multiplex loading: An embodiment of a method of lithography includes generating a beam of electrons. A first pixel and a second pixel are each configured to pattern the beam. Using time domain multiplex loading, the first and second pixels are controlled such that the beam is patterned. The patterning includes receiving a... Agent:

20150131076 - Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method: A lithographic apparatus is disclosed. The lithographic apparatus includes a scatterometer configured to measure a property of the substrate. The scatterometer includes a radiation source configured to produce a radiated spot on a target on the substrate, where the radiated spot includes positions on the target. The scatterometer further includes... Agent: Asml Netherlands B.v.

20150131074 - Method for the construction of a shaped body: The invention relates to a method for the construction of a shaped body from photopolymerizable material by using lithography-based generative production (rapid prototyping), in which a layer of liquid photopolymerizable material is defined on a production platform (1, 2, 3, 4), the layer is polymerized in an exposure region having... Agent: Ivoclar Vivadent Ag

  
05/07/2015 > 8 patent applications in 4 patent subcategories.

20150124229 - Charged particle lithography system and beam generator: The invention relates to a charged particle lithography system for exposing a target. The system includes a charged particle beam generator for generating a charged particle beam; an aperture array (6) for forming a plurality of beamlets from the charged particle beam; and a beamlet projector (12) for projecting the... Agent:

20150124230 - Liquid immersion member, exposure apparatus, exposing method, method for manufacturing device, program, and recording medium: A liquid immersion member is used in a liquid immersion exposure apparatus, and forms a liquid immersion space above an object which is movable below the optical member. The liquid immersion member includes a first member that is disposed at at least a portion of surrounding of the optical member,... Agent:

20150124231 - Assembly for modifying properties of a plurality of radiation beams, a lithography apparatus, a method of modifying properties of a plurality of radiation beams and a device manufacturing method: An assembly to modify a property of a plurality of radiation beams, the assembly including a plurality of waveguides configured to guide the plurality of radiation beams closer together, and a frequency multiplying device configured to receive the plurality of radiation beams guided by the plurality of waveguides and generate... Agent: Asml Netherlands B.v.

20150124232 - Exposure apparatus, exposure method, and device manufacturing method: An exposure apparatus is provided with a light source for emitting pulse light and exposes a substrate via to the pulse light an original. Further, the exposure apparatus comprises a detection unit for detecting the light quantity of the pulse light and a controller for controlling the light source and... Agent:

20150124233 - Illumination system for an euv projection lithographic projection exposure apparatus: An illumination system for an EUV projection lithographic projection exposure apparatus comprises an EUV light source, which generates an output beam of EUV illumination light with a predetermined polarization state. An illumination optical unit guides the output beam along an optical axis, as a result of which an illumination field... Agent:

20150124234 - Substrate holder, lithographic apparatus, and device manufacturing method: A substrate holder for use in a lithographic apparatus, the substrate holder including: a main body having a surface; a plurality of burls projecting from the surface and having end surfaces to support a substrate; and a thin film stack on the main body surface and forming an electric component,... Agent: Asml Netherlands B.v.

20150124235 - Tray for an exposure machine: A tray for a panel exposure machine, and also such a machine, enabling a panel to be retained and pressed down so as to be presented facing an exposure device. The tray comprises a work surface (13) adapted to receive panels of different sizes, said work surface (13) being substantially... Agent:

20150124236 - Light exposure system and light exposure process: A light exposure system includes a light source device, a shutter device and a control device. The light source device is capable of emitting a light to an assembly liquid crystal cell. The shutter device is located on an optical path of the light. The control device controls the light... Agent:

  
04/30/2015 > 17 patent applications in 8 patent subcategories.

20150116674 - Apparatus for treating substrate: A substrate treating apparatus according to the present invention includes: an index unit having an index robot and a port on which a container containing a substrate is placed; a process treating unit having a development treating unit in which a first development treating chamber and a second development treating... Agent:

20150116675 - Lithographic apparatus and device manufacturing method: A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or... Agent: Asml Netherlands B.v.

20150116676 - Lithographic apparatus and device manufacturing method: A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that... Agent: Asml Netherlands B.v.

20150116677 - Lithographic apparatus and device manufacturing method: In an immersion lithography apparatus, the immersion liquid is supplied from a tank via a flow restrictor. The liquid held in the tank is maintained at a substantially constant height above the flow restrictor to ensure a constant flow of liquid.... Agent: Asml Netherlands B.v.

20150116678 - System and method for real-time overlay error reduction: Disclosed is a lithography system. The lithography system includes a radiation source to provide radiation energy for lithography exposure; a substrate stage configured to secure a substrate; an imaging lens module configured to direct the radiation energy onto the substrate; at least one sensor configured to detect a radiation signal... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20150116679 - Mechanisms for performing a photolithography process: Embodiments of performing a photolithography process are provided. The method for performing the photolithography process includes providing a substrate and forming a photoresist layer over the substrate. The method further includes forming exposed photoresist portions by performing an exposure process on the photoresist layer. The method further includes performing a... Agent: Taiwan Semiconductor Manufacturing Co., Ltd.

20150116681 - Computer-readable storage medium, generating method, generating apparatus, driving apparatus, processing apparatus, lithography apparatus, and method of manufacturing article: The present invention provides a computer-readable storage medium which stores a program for causing a computer to generate time-series data of an electric current to be supplied to a motor in order to cause, a control system, including the motor configured to drive an object, to transit from a first... Agent:

20150116683 - Lithographic apparatus and device manufacturing method: A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation... Agent: Asml Netherlands B.v.

20150116682 - Programmable imaging assembly for manufacturing biotest post arrays: An imaging assembly for directing a pattern of energy at a workpiece includes (i) a reticle that defines a reticle array that includes a plurality of spaced apart, transmitting regions; (ii) an illumination source that generates an illumination beam; and (iii) a director assembly that selectively directs the illumination beam... Agent:

20150116684 - Spatial light modulator and exposure apparatus: The spatial light modulator is provided with: a substrate; a fixed electrode disposed on a surface of the substrate; a connecting section, which has one end of the connecting section connected to the surface of the substrate; a movable section, which is connected to another end of the connecting section;... Agent: Nikon Corporation

20150116680 - Ultraviolet laser device, and exposure device and inspection device provided with ultraviolet laser device: An ultraviolet laser device, includes: a first laser light output unit outputs a first infrared laser light; a second laser light output unit outputs a second infrared laser light; a first wavelength conversion optical system generates a first ultraviolet laser light of a fifth harmonic of the first infrared laser... Agent:

20150116685 - Extreme ultraviolet lithography process to print low pattern density features: The present disclosure provides a method for extreme ultraviolet lithography (EUVL) process. The method includes loading a binary phase mask (BPM) to a lithography system, wherein the BPM includes two phase states and defines an integrated circuit (IC) pattern thereon; setting an illuminator of the lithography system in an illumination... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20150116686 - Edge-dominant alignment method in exposure scanner system: An edge-dominant alignment method for use in an exposure scanner system is provided. The method includes the steps of: providing a wafer having a plurality of shot areas, wherein each shot area has a plurality of alignment marks; determining a first outer zone of the wafer, wherein the first outer... Agent: Taiwan Semiconductor Manufacturing Co., Ltd.

20150116688 - Measuring apparatus, measuring method, lithography apparatus, and article manufacturing method: A measuring apparatus measures a position of each of shot regions formed on a substrate. The apparatus includes a detector configured to detect a mark formed with respect to a shot region on the substrate, and a processor configured to obtain a position of each of the shot regions based... Agent:

20150116687 - Microprocessing system, microprocessing apparatus, and microprocessing method: According to one embodiment, a microprocessing system for transferring a concave-convex pattern of a template to a resist layer formed on a substrate by bringing the template with concave-convex formed close or pressing the template against the resist layer, the microprocessing system includes a microprocessing apparatus, and a control device.... Agent: Kabushiki Kaisha Toshiba

20150116689 - Support unit and substrate treating device including the same: Provided is a method of manufacturing a support unit that supports a substrate. The method includes: providing a support plate formed of a non-conductive material and supporting a substrate; providing a base plate disposed below the support plate and formed of a material including a conductive material; and depositing a... Agent: Semes Co., Ltd.

20150116690 - Bit patterned media template including alignment mark and method of using same: A method is disclosed that includes forming at least one substrate alignment mark and at least one lithography alignment mark in a substrate; forming a seed layer on the substrate; and forming a guide pattern and at least one guide pattern alignment mark in the seed layer, where the at... Agent: Seagate Technology LLC

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