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PhotocopyingBelow are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 11/13/2014 > 8 patent applications in 3 patent subcategories.
20140333909 - Exposure apparatus, exposure method, method for manufacturing device: An exposure apparatus exposes a substrate via a projection optical system and liquid. The exposure apparatus includes a first pipe section that flows liquid supplied from a liquid supplying device, and a second pipe section that is disposed at an outside of the first pipe section so as to surround... Agent: Nikon Corporation
20140333910 - Immersion photolithography system and method using microchannel nozzles: A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles... Agent:
20140333911 - Liti mask and laser irradiation device including the same: A laser irradiation device includes a light source, a laser induced thermal imaging (LITI) mask, and a stage. The light source may emit a laser beam at constant output energy. The LITI mask may be disposed under the light source. The stage may be disposed under the LITI mask, and... Agent: Samsung Display Co., Ltd.
20140333912 - Microlithographic projection exposure apparatus: A microlithographic projection exposure apparatus has a mirror array having a base body and a plurality of mirror units. Each mirror unit includes a mirror and a solid-state articulation, which has at least one articulation part that connects the mirror to the base body. A control device makes it possible... Agent: Carl Zeiss Smt Gmbh
20140333913 - Microlithography projection objective: Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.... Agent:
20140333915 - Radiation source: A radiation source (SO) suitable for providing a beam of radiation to an illuminator of a lithographic apparatus. The radiation source comprises a nozzle (128) configured to direct a stream of fuel droplets along a trajectory (140) towards a plasma formation location (212). The radiation source is configured to receive... Agent: Asml Netherlands B.v.
20140333914 - Reflective lithography masks and systems and methods: Various non-planar reflective lithography masks, systems using such lithography masks, and methods are disclosed. An embodiment is a lithography mask comprising a transparent substrate, a reflective material, and a reticle pattern. The transparent substrate comprises a curved surface. The reflective material adjoins the curved surface of the transparent substrate, and... Agent:
20140333916 - Method and apparatus for the formation of conductive films on a substrate: Provided herein are a method and apparatus for the formation of conductive films on a substrate using precise sintering of a conductive film and thermal management of the substrate during sintering. In particular, a method may include depositing a conductive metal-based ink on a translucent or transparent substrate, positioning a... Agent:11/06/2014 > 11 patent applications in 6 patent subcategories.
20140327890 - Coating and developing apparatus and method, and storage medium: In one embodiment, a coating and developing apparatus is provided with transfer units, provided between a stack of early-stage processing unit blocks and a stack of later-stage processing unit blocks to transfer a substrate between the transport mechanisms of laterally-adjacent unit blocks, and a vertically-movable auxiliary transfer mechanism for transporting... Agent: Tokyo Electron Limited
20140327889 - Conductive pattern formation method, conductive pattern-bearing substrate, and touch panel sensor: A conductive pattern formation method of the present invention includes a first exposure step of radiating active light in a patterned manner to a photosensitive layer including a photosensitive resin layer provided on a substrate and a conductive film provided on a surface of the photosensitive resin layer on a... Agent:
20140327893 - Lithographic apparatus and device manufacturing method: An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the... Agent: Asml Netherlands B.v.
20140327891 - Lithography projection objective, and a method for correcting image defects of the same: A lithography projection objective for imaging a pattern in an object plane onto a substrate in an image plane. The projection objective comprises a multiplicity of optical elements along an optical axis. The optical elements comprise a first group of optical elements following the object plane, and a last optical... Agent:
20140327892 - Method of operating a microlithographic projection exposure apparatus and projection objective of such an apparatus: A projection objective of a microlithographic projection exposure apparatus has a wavefront correction device comprising a first refractive optical element and a second refractive optical element. The first refractive optical element comprises a first optical material having, for an operating wavelength of the apparatus, an index of refraction that decreases... Agent:
20140327894 - Lithography apparatus having effective thermal electron enhancement unit and method of forming pattern using the same: A lithography apparatus and a method of using the same, the apparatus including a stage for accommodating a substrate that has a photoresist film thereon; a main unit on the stage, the main unit being configured to irradiate a projection beam to the photoresist film; and an electric field unit... Agent:
20140327897 - Exposure device and method for producing structure: In order to exposure interference fringes to photoresist and form a desired irregular pattern, it is necessary to know the cycle of the interference fringes in advance. In order to confirm the cycle of the interference fringes beforehand, conventional techniques include observing the formed irregular pattern with the use of... Agent: Hitachi High-technologies Corporation
20140327895 - Optical component: An optical component comprising a mirror array having a multiplicity of mirror elements, which each have at least one degree of freedom of displacement, and which are each connected to at least one actuator for displacement, has a multiplicity of local regulating devices for damping oscillations of the mirror elements,... Agent:
20140327896 - Optical component: An optical component comprises a mirror array having a multiplicity of mirror elements, which are each connected to at least one actuator for displacement, a multiplicity of signal lines for the signal-transmitting connection of the actuators to an external, global control/regulating device for predefining an absolute position of the individual... Agent:
20140327898 - Microlithography projection optical system and method for manufacturing a device: In some embodiments, a catoptric microlithgraphy projection optical system includes a plurality of reflective optical elements arranged to image radiation from an object field in an object plane to an image field in an image plane. The image field can have a size of at least 1 mm×1 mm. This... Agent:
20140327899 - Movable body system, movable body drive method, pattern formation apparatus, pattern formation method, exposure apparatus, exposure method, and device manufacturing method: An exposure apparatus exposes a substrate with an exposure beam via a projection system supported by a frame. A substrate stage having a table that mounts the substrate is placed on a base under the projection system. A measurement device has a plurality of heads provided at the table and... Agent: Nikon Corporation10/30/2014 > 12 patent applications in 7 patent subcategories.
20140320831 - Environmental system including vacuum scavenge for an immersion lithography apparatus: A liquid immersion exposure apparatus includes an optical assembly having a final optical element, from which exposure light is projected through immersion liquid filling an optical path of the exposure light under the final optical element, a containment member surrounding a tip portion of the optical assembly, and a movable... Agent: Nikon Corporation
20140320832 - Position-measurement systems: Apparatus are disclosed for measuring the position of an object surface along an axis. An exemplary apparatus has at least one actuator coupled to a fixed member such as a metrology frame. At least one analog proximity sensor is coupled to the at least one actuator. The at least one... Agent: Nikon Corporation
20140320833 - Optical arrangement of autofocus elements for use with immersion lithography: A lithographic projection apparatus includes a projection system having a last element, by which an exposure light is projected onto an upper surface of a wafer through liquid locally covering a portion of the upper surface of the wafer. The last element has a lower surface from which the exposure... Agent: Nikon Corporation
20140320834 - Exposure device and image forming apparatus: An exposure device includes an exposure member, a positioning member, and a movement restricting member. The exposure member includes multiple light-emitting devices arranged along a first direction, which is an axial direction of an image carrier that rotates. The exposure member exposes the image carrier to light by emitting light... Agent: Fuji Xerox Co., Ltd.
20140320838 - Imaging optical system: The disclosure generally relates to imaging optical systems that include a plurality of mirrors, which image an object field lying in an object plane in an image field lying in an image plane, where at least one of the mirrors has a through-hole for imaging light to pass through. The... Agent:
20140320836 - Lithography apparatus, lithography method, and method for manufacturing device: An apparatus includes an optical system configured to irradiate a surface of a substrate with a beam, a control unit configured to control a position of the irradiation of the beam, and a first measurement unit and a second measurement unit each configured to measure a position of a mark... Agent: Canon Kabushiki Kaisha
20140320835 - Method and device for inspecting spatial light modulator, and exposure method and device: A method for inspecting a spatial light modulator includes: performing such control that in an inspection target area in an array of mirror elements, the mirror elements in a first state in which incident light is given a phase change amount of 0 and the mirror elements in a second... Agent: Nikon Corporation
20140320837 - Monitoring apparatus and method particularly useful in photolithographically processing substrates: Apparatus for processing substrates according to a predetermined photolithography process includes a loading station in which the substrates are loaded, a coating station in which the substrates are coated with a photoresist material, an exposing station in which the photoresist coating is exposed to light through a mask having a... Agent:
20140320839 - Position detector, position detection method, exposure apparatus, and method of manufacturing device: A position detector (16), configured to detect a position of a mark on an object to be detected, comprises an image pickup unit (34), an optical system, a noise obtaining unit (36) and a correction unit (38). The image pickup unit picks up an image of the object to be... Agent:
20140320840 - Exposure apparatus and exposure method: To provide a mask aligner that can appropriately manage very small-quantity production and multiproduct production. The present invention is a mask aligner 1 that exposes a wafer W in a predetermined size through a mask M, and has a configuration that includes: a conveying device 5 for conveying the wafer... Agent: National Institute Of Advanced Industrial Science And Technology
20140320841 - Holding apparatus, processing apparatus, and method of manufacturing article: The present invention provides a holding apparatus for holding a substrate by an electrostatic force, the apparatus including a base including an electrode for generating the electrostatic force, a plurality of pins provided on the base, and a seal provided on the base and configured to seal a first space... Agent: Canon Kabushiki Kaisha
20140320842 - Imprint method, imprint apparatus, and method of manufacturing article: The present invention provides an imprint method comprising a deformation step of deforming a pattern surface of a mold so that the mold is gradually brought into contact with the imprint material outward from a central portion of the pattern surface, an obtaining step of obtaining a shift amount indicating... Agent: Canon Kabushiki Kaisha10/23/2014 > 9 patent applications in 5 patent subcategories.
20140313493 - Exposure apparatus and a method for exposing a photosensitive element and a method for preparing a printing form from the photosensitive element: The invention pertains to an exposure apparatus, a method for exposing a photosensitive element to radiation using the exposure apparatus, and a method for preparing a printing form from the photosensitive element. The exposure apparatus includes a base assembly having an exposure bed that supports the photosensitive element, and a... Agent: E I Du Pont De Nemours And Company
20140313494 - Lithographic apparatus and device manufacturing method: In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under... Agent: Asml Netherlands B.v.
20140313495 - Optical element and projection exposure apparatus based on use of the optical element: An optical element for use in an exposure apparatus configured to illuminate a mask with an exposure light beam for transferring a pattern on the mask onto a substrate through a projection optical system and to interpose a given liquid in a space between a surface of the substrate and... Agent: Nikon Corporation
20140313496 - Lithographic apparatus and method: A lithographic apparatus comprising a support structure constructed to support a patterning device, the patterning device being capable of imparting an EUV radiation beam with a grating in its cross-section to form a patterned EUV radiation beam, and a projection system configured to project the patterned EUV radiation beam onto... Agent: Asml Netherlands B.v.
20140313497 - Exposure apparatus and a method for controlling radiation from a lamp for exposing a photosensitive element: The invention pertains to an exposure apparatus, a method for controlling a photosensitive element to radiation using the exposure apparatus, and a method for exposing a photosensitive element to radiation. The exposure apparatus includes a base assembly having an exposure bed that supports the photosensitive element, and a lamp housing... Agent: E I Du Pont De Nemours And Company
20140313499 - Exposure apparatus, method of obtaining amount of regulation of object to be regulated, program, and method of manufacturing article: The present invention provides an exposure apparatus including a projection device including an object whose at least one of a position, an attitude and a shape is regulatable, and configured to project light from a reticle onto a substrate, a regulating device configured to regulate the at least one of... Agent:
20140313498 - Polarization-influencing optical arrangement, in particular in a microlithographic projection exposure apparatus: A polarization-influencing optical arrangement comprises a first retardation element and a second retardation element.... Agent: Carl Zeiss Smt Gmbh
20140313500 - Lithographic apparatus, device manufacturing method, and method of applying a pattern to a substrate: A lithographic apparatus includes at least one image alignment sensor for receiving radiation projected from an alignment mark on a reticle. Processor processes signals from the sensor(s) to resolve spatial information in the projected alignment mark to establish a reference for measuring positional relationships between a substrate support and the... Agent:
20140313501 - Controller for optical device, exposure method and apparatus, and method for manufacturing device: An exposure method for exposing a mask pattern, which includes plural types of patterns, with a high throughput and optimal illumination conditions for each type of pattern. The method includes guiding light from a first spatial light modulator illuminated with pulse lights of illumination light to a second spatial light... Agent: Nikon CorporationPrevious industry: Optics: image projectors
Next industry: Optics: measuring and testing
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