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Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application.
12/04/2014 > 8 patent applications in 4 patent subcategories.

20140354967 - Environmental system including a transport region for an immersion lithography apparatus: An immersion lithography apparatus includes (i) an optical assembly including an optical element, and configured to project a beam onto a substrate through an immersion liquid; (ii) a containment member that surrounds a path of the beam; and (iii) a stage on which the substrate is held, the substrate on... Agent: Nikon Corporation

20140354965 - Immersion liquid replenishing apparatus, replenishing method, and wafer scribing lines inspection machine with immersion liquid replenishing apparatus: The present invention discloses an immersion liquid replenishing apparatus, a replenishing method, and a wafer scribing lines inspection machine with the immersion liquid replenishing apparatus. The immersion liquid replenishing apparatus inputs an immersion liquid from a first pipe of the cover and outputs the immersion liquid from a second pipe... Agent: Yayatech Co., Ltd.

20140354966 - Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and calibration method: A controller measures positional information of a stage within an XY plane using three encoders which at least include one each of an X encoder and a Y encoder of an encoder system, and the stage is driven in the XY plane, based on measurement results of the positional information... Agent:

20140354968 - Focusing method, focusing apparatus, exposure method, and device manufacturing method: A target object has an upper surface including a first surface and a second surface located below the first surface. A method of focusing an optical system includes: measuring a surface position of the first surface; measuring a surface position of the second surface; obtaining, based on a measurement results... Agent: Canon Kabushiki Kaisha

20140354971 - Exposure method, exposure apparatus, and device manufacturing method: Within area where of four heads installed on a wafer stage, heads included in the first head group and the second head group to which three heads each belong that include one head different from each other face the corresponding areas on a scale plate, the wafer stage is driven... Agent: Nikon Corporation

20140354970 - Lithographic apparatus and device manufacturing method: A lithographic or exposure apparatus has a projection system and a controller. The projection system includes a stationary part and a moving part. The projection system is configured to project a plurality of radiation beams onto locations on a target. The locations are selected based on a pattern. The controller... Agent: Asml Netherlands B.v.

20140354969 - Methods and apparatus for measuring a property of a substrate: In the measurement of properties of a wafer substrate, such as Critical Dimension or overlay a sampling plan is produced (2506) defined for measuring a property of a substrate, wherein the sampling plan comprises a plurality of sub-sampling plans. The sampling plan may be constrained to a predetermined fixed number... Agent: Asml Netherlands B.v.

20140354972 - Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method: A controller inclines a movable body with respect to an XY plane at an angle α in a periodic direction of a grating, based on a measurement value of an interferometer which measures an angle of inclination of the movable body to the XY plane, and based on a measurement... Agent:

11/27/2014 > 9 patent applications in 6 patent subcategories.

20140347639 - Developing method for developing apparatus: A developing method including a developing step in which, while a wafer horizontally held by a spin chuck is being rotated, the wafer is developed by supplying a developer onto a surface of the wafer, wherein provided before the developing step is a pre-wetting step in which, simultaneously with the... Agent:

20140347641 - Device, lithographic apparatus, method for guiding radiation and device manufacturing method: A device having a waveguide formed of a continuous body of material that is transparent to radiation that passes through the waveguide, wherein the body has an input surface and an output surface, and a cooler configured to cool the input surface and/or the output surface. An exposure apparatus having... Agent: Asml Netherlands B.v.

20140347642 - Lithographic apparatus and device manufacturing method: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate, Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element... Agent: Asml Netherlands B.v.

20140347640 - Substrate processing apparatus: The invention relates to a substrate processing apparatus (10) comprising a support frame (60), a radiation projection system (20) for projecting radiation onto a substrate to be processed, a substrate support structure (30) for supporting the substrate, and a fluid transfer system (150). The radiation projection system comprises a cooling... Agent:

20140347643 - Lithography apparatus, lithography method, lithography system, and method of manufacturing article: The present invention provides a lithography apparatus which forms a pattern on a substrate, the apparatus including a first dosing device configured to apply a first dose to the substrate based on data corresponding to the pattern, an acquiring device configured to acquire information of an error of a dimension... Agent: Canon Kabushiki Kaisha

20140347644 - System and method for performing lithography process in semiconductor device fabrication: Systems and methods that include providing for measuring a first topographical height of a substrate at a first coordinate on the substrate and measuring a second topographical height of the substrate at a second coordinate on the substrate are provided. The measured first and second topographical heights may be provided... Agent:

20140347645 - Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method: An illumination optical system which illuminates a surface to be illuminated on the basis of light from a light source has a first optical path in which a diffractive optical element can be arranged at a first position thereof; a second optical path in which a spatial light modulator with... Agent:

20140347646 - Method and apparatus for compensating at least one defect of an optical system: The invention relates to a method for compensating at least one defect of an optical system which comprises introducing an arrangement of local persistent modifications in at least one optical element of the optical system, which does not have pattern elements on one of its optical surfaces, so that the... Agent:

20140347647 - Method for adjusting a projection objective: A projection objective having a number of adjustable optical elements is optimized with respect to a number of aberrations by specifying a set of parameters describing imaging properties of the objective, each parameter in the set having an absolute value at each of a plurality of field points in an... Agent:

11/20/2014 > 9 patent applications in 6 patent subcategories.

20140340659 - Lithographic apparatus and device manufacturing method: A lithographic apparatus component, such as a metrology system or an optical element (e.g., a mirror) is provided with a temperature control system for controlling deformation of the component. The control system includes channels provided close to a surface of the component through which a two phase cooling medium is... Agent: Asml Netherlands B.v.

20140340660 - Pattern formation method and pattern formation apparatus: According to one embodiment, a pattern formation method includes preparing a mold including a first pattern, preparing a substrate including a second pattern, coating a photosensitive resin onto the substrate, bringing the mold into contact with the photosensitive resin, determining whether or not the photosensitive resin is filled between the... Agent:

20140340661 - Exposure apparatus and method of manufacturing article: The present invention provides an exposure apparatus which exposes a substrate, comprising a substrate stage configured to be movable while holding the substrate, a measurement unit configured to measure a height of the substrate by irradiating the substrate with light and detecting the light reflected by the substrate, and a... Agent: Canon Kabushiki Kaisha

20140340663 - Apparatus for monitoring a lithographic patterning device: A lithographic patterning device deformation monitoring apparatus (38) comprising a radiation source (40), an imaging device (42), and a processor (50). The radiation source being configured to direct a plurality of beams of radiation (41) with a predetermined diameter towards a lithographic patterning device (MA) such that they are reflected... Agent: Asml Netherlands B.v.

20140340662 - Maskless exposure device: In an aspect, a grating light valve module including: a substrate; and a plurality of ribbons disposed on the substrate, wherein each of the ribbons includes an insulating layer, a conductive layer disposed on the insulating layer, and an anti-oxidation layer disposed on the conductive layer is provided.... Agent: Samsung Display Co., Ltd.

20140340664 - Projection exposure apparatus comprising a measuring system for measuring an optical element: A projection exposure apparatus (10) for microlithography has a measuring system (50) for measuring an optical element of the projection exposure apparatus. The measuring system (50) includes an irradiation device (54), which is configured to radiate measuring radiation (62) in different directions (64) onto the optical element (20), such that... Agent:

20140340665 - Ultraviolet light emitting diode array light source for photolithography and method: A light source includes a plurality of ultraviolet (UV) light emitting diodes (LEDs) and an LED phase shift controller coupled to the plurality of UV LEDs adapted to control the phase shift of each UV LED in the plurality of UV LEDs. The plurality of UV LEDs forms a UV... Agent: Taiwan Semiconductor Manufacturing Co., Ltd.

20140340667 - Exposure apparatus, exposure method, and device manufacturing method: An exposure apparatus is equipped with an encoder system which measures positional information of a wafer stage by irradiating a measurement beam using four heads installed on the wafer stage on a scale plate which covers the movement range of the wafer stage except for the area right under a... Agent: Nikon Corporation

20140340666 - Lithographic apparatus and device manufacturing method: An exposure apparatus including a projection system configured to project a plurality of radiation beams onto a target; a movable frame that is at least rotatable around an axis; and an actuator system configured to displace the movable frame to an axis away from an axis corresponding to the geometric... Agent: Asml Netherlands B.v.

11/13/2014 > 8 patent applications in 3 patent subcategories.

20140333909 - Exposure apparatus, exposure method, method for manufacturing device: An exposure apparatus exposes a substrate via a projection optical system and liquid. The exposure apparatus includes a first pipe section that flows liquid supplied from a liquid supplying device, and a second pipe section that is disposed at an outside of the first pipe section so as to surround... Agent: Nikon Corporation

20140333910 - Immersion photolithography system and method using microchannel nozzles: A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles... Agent:

20140333911 - Liti mask and laser irradiation device including the same: A laser irradiation device includes a light source, a laser induced thermal imaging (LITI) mask, and a stage. The light source may emit a laser beam at constant output energy. The LITI mask may be disposed under the light source. The stage may be disposed under the LITI mask, and... Agent: Samsung Display Co., Ltd.

20140333912 - Microlithographic projection exposure apparatus: A microlithographic projection exposure apparatus has a mirror array having a base body and a plurality of mirror units. Each mirror unit includes a mirror and a solid-state articulation, which has at least one articulation part that connects the mirror to the base body. A control device makes it possible... Agent: Carl Zeiss Smt Gmbh

20140333913 - Microlithography projection objective: Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.... Agent:

20140333915 - Radiation source: A radiation source (SO) suitable for providing a beam of radiation to an illuminator of a lithographic apparatus. The radiation source comprises a nozzle (128) configured to direct a stream of fuel droplets along a trajectory (140) towards a plasma formation location (212). The radiation source is configured to receive... Agent: Asml Netherlands B.v.

20140333914 - Reflective lithography masks and systems and methods: Various non-planar reflective lithography masks, systems using such lithography masks, and methods are disclosed. An embodiment is a lithography mask comprising a transparent substrate, a reflective material, and a reticle pattern. The transparent substrate comprises a curved surface. The reflective material adjoins the curved surface of the transparent substrate, and... Agent:

20140333916 - Method and apparatus for the formation of conductive films on a substrate: Provided herein are a method and apparatus for the formation of conductive films on a substrate using precise sintering of a conductive film and thermal management of the substrate during sintering. In particular, a method may include depositing a conductive metal-based ink on a translucent or transparent substrate, positioning a... Agent:

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