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Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application.
06/11/2015 > patent applications in patent subcategories.
06/04/2015 > patent applications in patent subcategories.
05/28/2015 > 13 patent applications in 6 patent subcategories.

20150146177 - Exposure apparatus and device manufacturing method: An exposure apparatus includes a measuring member disposed in a substrate stage for holding the substrate, at a side of a surface holding the substrate of a substrate stage, an auxiliary member disposed at a side of the surface of the substrate stage, with a gap with the measuring member,... Agent:

20150146178 - Substrate tuning system and method using optical projection: Techniques herein include systems and methods that provide a spatially-controlled or pixel-based projection of light onto a substrate to tune various substrate properties. A given pixel-based image projected on to a substrate surface can be based on a substrate signature. The substrate signature can spatially represent non-uniformities across the surface... Agent:

20150146176 - System and method for controlling a temperature of a reaction assembly: A stage assembly (10) that includes (i) a stage (14) that retains a device (26); (ii) a reaction assembly (18) that is spaced apart from the stage (14); (iii) a stage mover (16) that moves the stage (14), the stage mover (16) including a magnet array (38) that is coupled... Agent:

20150146179 - Low energy electron beam lithography: A low energy electron beam lithography system uses an 2 KeV electron beam of about two hundred microamperes, a 4 Division Complementary Mask (4DCM) formed from a monocrystalline silicon wafer with membranes about 100 nm thick that are surrounded by supporting silicon struts, and spaced about 50 microns from an... Agent:

20150146180 - Method for fabricating nanoantenna array, nanoantenna array chip and structure for lithography: A method for fabricating a nanoantenna array may include forming a resist layer on a substrate, forming a focusing layer having a dielectric microstructure array on the resist layer, diffusing light one-dimensionally in a specific direction by using a linear diffuser, forming an anisotropic pattern on the resist layer by... Agent: Korea Institute Of Science And Technology

20150146181 - Apparatus of photolithography process to liquid display panel and method thereof: The present invention discloses an apparatus of photolithography process to a liquid display panel, comprising: a platform, employed for loading the liquid display panel; a power supplying device, employed for supplying power to the liquid display panel; an ultraviolet light source supply device, employed for providing the ultraviolet light; a... Agent:

20150146185 - Catadioptric imaging systems for digital scanner: e

20150146183 - Illumination system of a microlithographic projection exposure apparatus: An illumination system of a microlithographic projection exposure apparatus includes an optical integrator having a plurality of light entrance facets each being associated with a secondary light source. A spatial light modulator has a light exit surface and transmit or to reflect impinging projection light in a spatially resolved manner.... Agent:

20150146184 - Illumination system of a microlithographic projection exposure apparatus: An illumination system includes an optical integrator having a plurality of light entrance facets, whose images at least substantially superimpose in a mask plane. A spatial light modulator transmits or reflects impinging projection light in a spatially resolved manner. A pupil forming unit directs projection light onto the spatial light... Agent:

20150146186 - Lithography mask repairing process: A method includes performing a beam scan on a photolithography mask to repair the photolithography mask. After the beam scan, a radiation treatment is performed on the photolithography mask. The method is performed by an apparatus including a beam generator configured to generate and project a beam on the lithography... Agent:

20150146182 - Radiation source: A radiation source for generating EUV radiation includes a laser configured to fire laser pulses at a target area to which is supplied a stream of fuel droplets, which may be tin droplets that emit EUV radiation when excited by the laser beam. The EUV radiation is collected by a... Agent:

20150146187 - Substrate carrying device: A substrate carrying device includes pads that hold a substrate, and a hand having recesses formed therein. The pads are placed in the recesses and detachably attached to the hand. Each of the pads includes a flange, and the flange of at least one of the pads includes an outer... Agent:

20150146188 - Method to determine the usefulness of alignment marks to correct overlay, and a combination of a lithographic apparatus and an overlay measurement system: A method to determine the usefulness of an alignment mark of a first pattern in transferring a second pattern to a substrate relative to the first pattern already present on the substrate includes measuring the position of the alignment mark, modeling the position of the alignment mark, determining the model... Agent:

05/21/2015 > 8 patent applications in 5 patent subcategories.

20150138519 - Contamination trap for a lithographic apparatus: Disclosed is a contamination trap arrangement (300) configured to trap debris particles that are generated with the formation of a plasma within a radiation source configured to generate extreme ultraviolet radiation. The contamination trap comprises a vane structure (310) for trapping the debris particles; a heating arrangement (330) for heating... Agent: Asml Netherlands B.v.

20150138520 - Holding device for an optical element in an objective: A holding device for an optical element in an objective has a mount that is connected to the objective, on the one hand, and at least indirectly to the optical element, on the other hand. Arranged between the mount and the optical element is a reinforcing element whose coefficient of... Agent:

20150138521 - Lens module comprising at least one exchangeable optical element: An optical system has a housing with a mount and an opening to a receiving region, the receiving region being located within the housing and including the mount. At least one optical element is inserted into and removed from the receiving region through the opening, and at least one gas... Agent:

20150138523 - Metrology method and apparatus, substrate, lithographic system and device manufacturing method: A metrology target formed by a lithographic process on a substrate includes a plurality of component gratings. Images of the target are formed using +1 and −1 orders of radiation diffracted by the component gratings. Regions of interest (ROIs) in the detected image are identified corresponding the component gratings. Intensity... Agent:

20150138522 - Roller mold manufacturing apparatus and method: In a so-called step-and-repeat method in which a mask pattern is circumferentially written by exposure onto each predetermined region on a surface of a roller mold, an object of the present invention is to improve the spacing accuracy between the mask patterns and to suppress the occurrence of misalignment at... Agent: Asahi Kasei Kabushiki Kaisha

20150138524 - Extreme ultraviolet lithography process and mask: A system of an extreme ultraviolet lithography (EUVL) is disclosed. The system includes a mask having reflective phase-shift-grating-blocks (PhSGBs). The system also includes an illumination to expose the mask to produce a resultant reflected light from the mask. The resultant reflected light contains mainly diffracted lights. The system also has... Agent:

20150138525 - Object exchange method, exposure method, carrier system, exposure apparatus, and device manufacturing method: A carrier apparatus positions a chuck member above a wafer mounted on a fine movement stage, relatively moves the chuck member and the fine movement stage in a vertical direction, makes the chuck member approach a position which is a predetermined distance away from the upper surface of the wafer,... Agent:

20150138526 - Instant film printer incorporating optical collimation layer: Disclosed is a printing device comprising a collimation layer disposed between a display screen and a sheet of instant film. The printing device quickly and compactly prints the display screen contents to the instant film, using a collimation layer that may be embedded in an opaque ribbon and drawn across... Agent: Pacific Opal LLC

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