|Photocopying patents - Monitor Patents|
USPTO Class 355 | Browse by Industry: Previous - Next | All
Recent | 14: Sep | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan | 13: Dec | Nov | Oct | Sep | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan | 12: Dec | Nov | Oct | Sep | Aug | July | June | May | April | Mar | Feb | Jan | 11: Dec | Nov | Oct | Sep | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan | 10: Dec | Nov | Oct | Sep | Aug | Jul | Jun | May | Apr | Mar | Feb | Jan | | 09: Dec | Nov | Oct | Sep | Aug | Jl | Jn | May | Apr | Mar | Fb | Jn | | 2008 | 2007 |
PhotocopyingBelow are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 09/04/2014 > 5 patent applications in 5 patent subcategories.
20140247434 - Lithographic focus and dose measurement using a 2-d target: In order to determine whether an exposure apparatus is outputting the correct dose of radiation and its projection system is focusing the radiation correctly, a test pattern is used on a mask for printing a specific marker onto a substrate. This marker is then measured by an inspection apparatus, such... Agent: Asml Netherlands B.v.
20140247435 - Radiation source device, lithographic apparatus, and device manufacturing method: In a discharge-produced plasma source, a pair of electrodes is charged using a transmission line. In an embodiment, a pair of transmission lines may be used, connected symmetrically to the electrodes. The impedance of the transmission lines, or the total impedance of the transmission lines, is equal to that of... Agent: Asml Netherlands B.v.
20140247436 - Exposure apparatus, exposure method, and device manufacturing method: An exposure apparatus is equipped with a fine movement stage that can hold a liquid with a projection optical system when the stage is at a position facing an outgoing surface of the projection optical system, and a blade that comes into proximity within a predetermined distance of the fine... Agent: Nikon Corporation
20140247437 - Illumination system of a microlithographic projection exposure apparatus: An illumination system of a microlithographic projection exposure apparatus includes an optical raster element configured to produce a plurality of secondary light sources located in a system pupil surface. The optical raster element has a plurality of light entrance facets, each being associated with one of the secondary light sources.... Agent: Carl Zeiss Smt Gmbh
20140247438 - Reticle defect correction by second exposure: Correction of reticle defects, such as EUV reticle defects, is accomplished with a second exposure. Embodiments include obtaining a reticle with a first pattern corresponding to a design for a wafer pattern, detecting dark defects and/or design/OPC weak spots in the first pattern, exposing a resist covered wafer using the... Agent: Globalfoundries Inc.08/28/2014 > 5 patent applications in 3 patent subcategories.
20140240684 - Exposure apparatus, exposure method, and method for producing device: An exposure apparatus having a projection system with a final element projects exposure light to an upper surface of a substrate through liquid between the final element and the substrate upper surface. A liquid confinement member has a recovery outlet via which the liquid is removed along with gas, the... Agent: Nikon Corporation
20140240683 - Focus position adjusting apparatus, reticle, focus position adjusting program, and method of manufacturing semiconductor device: According to one embodiment, a step difference estimation unit, an assist pattern generation unit, and a spherical aberration conversion unit are installed. The step difference estimation unit estimates step difference of a processing layer. The assist pattern generation unit adds an assist pattern having different sensitivity to spherical aberration in... Agent: Kabushiki Kaisha Toshiba
20140240686 - Arrangement of a mirror: A mirror for EUV radiation comprises a total reflection surface, which has a first EUV-radiation-reflecting region and at least one second EUV-radiation-reflecting region, wherein the EUV-radiation-reflecting regions are structurally delimited from one another, wherein the first region comprises at least one first partial reflection surface which is surrounded along a... Agent:
20140240685 - Exposure apparatus, exposure method, and method for producing device: An exposure apparatus irradiates a substrate with light via a projection system and liquid, and includes a stage that moves below the projection system, and a light-receiving element having a light-receiving surface. An optical member provided on the stage has a first surface contacting the liquid when moved to face... Agent: Nikon Corporation
20140240687 - Exposure apparatus, exposure method, and device fabrication method: The present invention provides an exposure apparatus which transfers a pattern of a mask to a substrate, including a measurement unit configured to measure, at a first measurement point and a second measurement point, a height of a measurement target portion in a shot region of the substrate held by... Agent: Canon Kabushiki Kaisha08/21/2014 > 13 patent applications in 7 patent subcategories.
20140232997 - Index matched grating inscription: The disclosed embodiments provide systems and methods for mitigating lensing and scattering as an optical fiber is being inscribed with a grating. The disclosed systems and methods mitigate the lensing phenomenon by surrounding an optical fiber with an index-matching material that is held in a vessel with a sealed phase... Agent: Ofs Fitel, LLC
20140232999 - Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine: A lithographic projection apparatus includes a stage assembly having a substrate table on which a substrate is supported and exposed with an exposure beam from a final optical element of a projection optical assembly through an immersion liquid. A confinement member encircles a portion of a path of the exposure... Agent: Nikon Corporation
20140232998 - Semiconductor manufacturing apparatus and manufacturing method of semiconductor device: A semiconductor manufacturing apparatus according to the present embodiment comprises a vacuum chamber. A first stage is configured to temporarily attach a reticle thereonto in order to attract a foreign material present on a back surface of the reticle. A second stage is configured to attach the reticle thereonto after... Agent: Kabushiki Kaisha Toshiba
20140233000 - Method for producing optical orientation film method for producing retardation film, system for producing optical orientation film, optical orientation film and retardation film: A method for producing an optical orientation film is disclosed, the method being able to realize highly accurate exposure in a pattern, even if a simple device and non-parallel light are used and a long continuous resin substrate is used and fed continuously. The method for producing the optical orientation... Agent: Dai Nippon Printing Co., Ltd.
20140233001 - Apparatus and method for performing multi-beam based lithography: An apparatus for performing lithography includes a light source that emits light. A light enhancer is configured to receive and enhance the emitted light. The light enhancer includes a first lens and a second lens. A first position adjusting unit is configured to adjust a position of the second lens.... Agent: Samsung Electronics Co., Ltd.
20140233002 - Exposure apparatus, method for producing device, and method for controlling exposure apparatus: A liquid immersion exposure apparatus includes a projection system, a liquid supply inlet, a liquid collection outlet, a separator fluidically connected to the liquid collection outlet, the separator separating one of liquid and gas, which have been collected via the liquid collection outlet from the other, and a flow-meter configured... Agent: Nikon Corporation
20140233003 - Immersion photolithography system and method using microchannel nozzles: A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles... Agent: Asml Holding N.v.
20140233004 - Lithographic apparatus and device manufacturing method: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help... Agent: Asml Netherlands B.v.
20140233006 - Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to... Agent:
20140233007 - Method of calculating amount of fluctuation of imaging characteristic of projection optical system, exposure apparatus, and method of fabricating device: In a case where a substrate is exposed to exposure light of a first wavelength band, an exposure coefficient, which is defined as an amount of fluctuation of an imaging characteristic of a projection optical system per unit of exposure energy, for the first wavelength band is calculated using data... Agent: Canon Kabushiki Kaisha
20140233005 - System and method for adjusting seed laser pulse width to control euv output energy: A method and apparatus for controlling the seed laser in a laser produced plasma (LPP) extreme ultraviolet (EUV) light system are disclosed. In one embodiment, a seed laser generates both pre-pulses and main pulses which are amplified and irradiate a target material. The widths of the main pulses are adjusted,... Agent: Cymer, Inc.
20140233008 - Illumination optical system, exposure apparatus, device production method, and light polarization unit: An illumination optical system which illuminates an illumination objective surface with a light from a light source. The illumination optical system includes a spatial light modulator which includes a plurality of optical elements arranged within a predetermined plane and controlled individually, and which forms a light intensity distribution in an... Agent: Nikon Corporation
20140233009 - Shear-layer chuck for lithographic apparatus: A lithographic apparatus is described that comprises a support structure to hold an object. The object may be a patterning device or a substrate to be exposed. The support structure comprises a chuck, on which the object is supported, and an array of shear-compliant elongated elements normal to the chuck... Agent: Asml Holding N.v.08/14/2014 > 9 patent applications in 5 patent subcategories.
20140226136 - Method and apparatus for cleaning photomask handling surfaces: The cleaning device may clean the handling and support interface for a reticle inside a reticle handling tool, such as a micrographic scanner/stepper printer, without opening the tool. The cleaning device may have the same or approximate form factor as either a reticle without a pellicle or a reticle with... Agent:
20140226137 - Pattern forming method and manufacturing method of semiconductor device: A pattern forming method includes forming a spin on dielectric film on a substrate, washing the spin on dielectric film by using a washing liquid, drying a surface of the spin on dielectric film after the washing, forming a photosensitive film on the dried coating type insulation film, emitting energy... Agent: Kabushiki Kaisha Toshiba
20140226139 - Novel lithographic method with the capability of spectrum engineering to create complex microstructures: The present invention relates to a method for microstructuring a substrate. In the method according to the invention a substrate with a region to be structured is provided, and then by applying colloid spheres into this region, a colloid sphere monolayer is formed. The thus applied colloid sphere monolayer exhibits... Agent: University Of Szeged
20140226138 - Photomask, photomask manufacturing apparatus, and photomask manufacturing method: A photomask according to the present embodiment is used to transfer a pattern to a transfer target substrate in a non-telecentric optical system. A mask substrate includes a first face having a pattern formed thereon and a second face on an opposite side from the first face. A convex portion... Agent: Kabushiki Kaisha Toshiba
20140226140 - 193nm laser and inspection system: An improved solid-state laser for generating sub-200 nm light is described. This laser uses a fundamental wavelength between about 1030 nm and 1065 nm to generate the sub-200 nm light. The final frequency conversion stage of the laser creates the sub-200 nm light by mixing a wavelength of approximately 1109... Agent: Kla-tencor Corporation
20140226141 - Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus: Microlithographic illumination system includes individually drivable elements to variably illuminate a pupil surface of the system. Each element deviates an incident light beam based on a control signal applied to the element. The system also includes an instrument to provide a measurement signal, and a model-based state estimator configured to... Agent: Carl Zeiss Smt Gmbh
20140226142 - Mirror system comprising at least one mirror for use for guiding illumination and imaging light in euv projection lithography: A mirror serves for use for guiding illumination and imaging light in EUV projection lithography. The mirror has a reflective surface, the reflective surface forming a magnetic field in such a way that at least one polarization property of the illumination and imaging light is influenced via the magnetic field... Agent:
20140226143 - Lithography system and method for mask inspection: The present disclosure provides a method that includes capturing a first image of a mask in a first exposure apparatus using a first exposure source and a first imaging sensor; capturing a second image of the mask in a second exposure apparatus using a second exposure source and a second... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.
20140226144 - Substrate holding unit, exposure apparatus having same, exposure method, method for producing device, and liquid repellant plate: An exposure apparatus exposes a substrate through a projection optical system and a liquid immersion area formed by liquid supplied to an image plane side of the projection optical system. The apparatus includes a stage which has a substrate holding portion that holds the substrate, and which is movable with... Agent: Nikon CorporationPrevious industry: Optics: image projectors
Next industry: Optics: measuring and testing
RSS FEED for 20140904:
Integrate FreshPatents.com into your RSS reader/aggregator or website to track weekly updates.
For more info, read this article.
Thank you for viewing Photocopying patents on the FreshPatents.com website. These are patent applications which have been filed in the United States. There are a variety ways to browse Photocopying patent applications on our website including browsing by date, agent, inventor, and industry. If you are interested in receiving occasional emails regarding Photocopying patents we recommend signing up for free keyword monitoring by email.
Results in 0.29199 seconds