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Below are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application.
04/16/2015 > 5 patent applications in 3 patent subcategories.

20150103325 - Electrostatic clamp, lithographic apparatus and method: An electrostatic clamp (21) configured to hold an object, the electrostatic clamp comprising an electrode (24), a resistive portion (23) formed from a resistive material located on the electrode, and a dielectric portion (22) formed from a dielectric material located on the resistive portion.... Agent:

20150103326 - Optical element: The disclosure relates to an optical assembly for a projection exposure apparatus for semiconductor lithography. The optical assembly includes at least one optical element and a mounting body for mechanically fixing the element in a supporting structure. The optical assembly also includes at least one cooling body for dissipating heat... Agent:

20150103327 - Lithography apparatus with segmented mirror: A lithography apparatus is disclosed, which comprises a mirror having at least two mirror segments which are joined together in such a way that an interspace is formed between the mirror segments, and a sensor for detecting the relative position of the mirror segments, wherein the sensor is arranged in... Agent:

20150103328 - Lithography apparatus, power supplying method, and article manufacturing method: A lithography apparatus has a plurality of driving units each of which drives in synchronization within a specific period, a power source for supplying power required for driving to each driving unit, a plurality of capacitors capable of charging power from the power source, a plurality of switching units for... Agent:

20150103329 - Stage apparatus, lithography apparatus, and article manufacturing method: Provided is a stage apparatus that includes a first movable unit; a linear motor that includes a stator coil array arranged over a stroke range in a predetermined direction of the first movable unit and a mover magnet fixed to the first movable unit; a second movable unit that is... Agent:

04/09/2015 > 9 patent applications in 5 patent subcategories.

20150098066 - Interferometric spatial light modulator for production of digital holograms: A digital holographic apparatus, system, and method are disclosed. The apparatus includes an electronic display device comprising an interferometric spatial light modulator based display engine and a processor coupled to the electronic display device. The processor is operative to upload digital content to the electronic display device. The digital content... Agent:

20150098068 - Device for controlling temperature of an optical element: A device serves for controlling temperature of an optical element provided in vacuum atmosphere. The device has a cooling apparatus having a radiational cooling part, arranged apart from the optical element, for cooling the optical element by radiation heat transfer. A controller serves for controlling temperature of the radiational cooling... Agent:

20150098067 - Lithographic apparatus: A lithographic apparatus including a first body including a heat source, a second body and a heater device is presented. The second body has a facing surface facing the first body via a gap between the first and second bodies. The heat source is for providing a heat flux to... Agent: Asml Netherlands B.v.

20150098069 - Extreme ultraviolet lithography process and mask: A system of an extreme ultraviolet lithography (EUVL) is disclosed. The system includes an extreme ultraviolet (EUV) mask with three states. A reflection coefficient is r1, r2 and r3, respectively, wherein r3 is close to (r1+r2)/2. The system also includes a nearly on-axis illumination (ONI) with partial coherence a less... Agent: Taiwan Semiconductor Manufacturing Company, Ltd.

20150098070 - Light wavelength conversion module, illumination system, and projection apparatus: A light wavelength conversion module including a substrate, a first light wavelength conversion layer, and a first light transmissive layer is provided. The substrate has a light passing-through area and a first light wavelength conversion area. The first light wavelength conversion layer is located at the first light wavelength conversion... Agent: Coretronic Corporation

20150098071 - Optical arrangement for three-dimensionally patterning a material layer: The disclosure relates to an optical arrangement for three-dimensionally patterning a radiation-sensitive material layer, such as a projection exposure apparatus for microlithography. The optical arrangement includes a mask for forming a three-dimensional radiation pattern, a substrate with the radiation-sensitive material layer, and a projection optical unit for imaging the three-dimensional... Agent:

20150098072 - Beam guidance system for the focusing guidance of radiation from a high-power laser light source toward a target and lpp x-ray source comprising a laser light source and such a beam guidance system: A beam guidance system serves for the focusing guidance of radiation from a high-power laser light source toward a target. The beam guidance system has at least one mirror as reflective beam guidance component and at least one transmission component which is at least partially transmissive to the radiation as... Agent:

20150098073 - Lithography apparatus and device manufacturing method: A lithography apparatus and device manufacturing methods are disclosed. A lithography apparatus includes a support stage, and a measurement system including a sensor part and a reference part, the measurement system being configured to determine the position and/or orientation of the support stage, or of a component mounted on the... Agent: Asml Netherlands B.v.

20150098074 - Stage braking system for a motor: A stage assembly that moves a device includes a stage that retains the device, a stage mover that moves the stage, a measurement system that provides a measurement signal that relates to the position or movement of the stage, and a control system that control the stage mover. The control... Agent:

04/02/2015 > 10 patent applications in 4 patent subcategories.

20150092167 - Processing liquid supplying apparatus and processing liquid supplying method: Disclosed is a processing liquid supplying apparatus. The apparatus includes: a processing liquid supply source configured to supply a processing liquid for processing a substrate to be processed; an ejection unit configured to eject the processing liquid to the substrate to be processed; a filter device configured to remove foreign... Agent:

20150092168 - Substrate holder, lithographic apparatus, and device manufacturing method: A substrate holder for use in a lithographic apparatus. The substrate holder comprises a main body, a plurality of burls and a heater and/or a temperature sensor. The main body has a surface. The plurality of burls project from the surface and have end surfaces to support a substrate. The... Agent: Asml Netherlands B.v.

20150092169 - Exposure apparatus, exposure method, and device manufacturing method: An exposure apparatus comprises a controller configured to control scanning of an original holding unit and a substrate holding unit so as to expose a first pattern forming area onto a second pattern forming area exposed in advance on the substrate via a second projection optical system having a second... Agent:

20150092170 - Method for repairing optical elements, and optical element: A method for repairing a collector for an EUV projection exposure apparatus having a first coating and a second coating, wherein the first coating is arranged between the second coating and a surface of the collector. The method includes completely or partly removing the first coating by treatment with a... Agent:

20150092173 - Illumination optical system, exposure apparatus and device manufacturing method: The illumination optical system for illuminating an illumination target surface with light from a light source is provided with a polarization converting member which converts a polarization state of incident light to form a pupil intensity distribution in a predetermined polarization state on an illumination pupil of the illumination optical... Agent:

20150092174 - Illumination optical unit: An illumination optical unit comprises a first faceted element and a second faceted element having a multiplicity of displaceable micromirrors which can be grouped flexibly to form facets.... Agent:

20150092171 - Lithographic apparatus: A lithographic apparatus includes a patterning device support to support a patterning device to form a patterned radiation beam, the patterning device support including a moveable structure movably arranged with respect to an object, a patterning device holder movably arranged relative to the movable structure and holding the patterning device,... Agent: Asml Netherlands B.v.

20150092172 - Optical apparatus, projection optical system, exposure apparatus, and method of manufacturing article: The present invention provides an optical apparatus for deforming a reflecting surface of a mirror, comprising a base plate, a plurality of first actuators each configured to apply a force to the surface opposite to the reflecting surface, a plurality of second actuators each having rigidity lower than that of... Agent:

20150092175 - Lithography apparatus, method of measuring surface position, and method of producing device: An apparatus includes a conductive holding part configured to hold an insulating material, and a capacitance sensor configured to generate an electric field between the capacitance sensor and the holding part. The apparatus determines a surface position of a surface of the insulating material based on information of an output... Agent:

20150092176 - Movable body drive method and system, pattern formation method and apparatus, exposure method and apparatus for driving movable body based on measurement value of encoder and information on flatness of scale, and device manufacturing method: A drive unit drives a wafer stage in a Y-axis direction based on a measurement value of an encoder that measures position information of the wafer stage in the Y-axis direction and based on information on the flatness of a scale that is measured by the encoder. In this case,... Agent: Nikon Corporation

03/26/2015 > 9 patent applications in 5 patent subcategories.

20150085265 - Pellicle: There is provided a pellicle having a frame, a membrane and an agglutinant layer (adhesive to bond the pellicle on a photo mask) in which the release liner (detachable sheet) laid to the agglutinant layer for protection thereof is controlled to have a surface roughness of 5-30 micrometers on the... Agent: Shin-etsu Chemical Co., Ltd.

20150085264 - Rotary euv collector: An EUV collector is rotated between or during operations of an EUV photolithography system. Rotating the EUV collector causes contamination to distribute more evenly over the collector's surface. This reduces the rate at which the EUV photolithography system loses image fidelity with increasing contamination and thereby increases the collector lifetime.... Agent:

20150085266 - Differential dose and focus monitor: A dose and focus monitor structure includes at least one complementary set of unit dose monitors and at least one complementary set of unit focus monitors. Each complementary set of unit dose monitors generate edges on a photoresist layer such that the edges move in opposite directions as a function... Agent: International Business Machines Corporation

20150085267 - Method of determining focus corrections, lithographic processing cell and device manufacturing method: A method of, and associated apparatus for, determining focus corrections for a lithographic projection apparatus. The method comprises exposing a plurality of global correction fields on a test substrate, each comprising a plurality of global correction marks, and each being exposed with a tilted focus offset across it; measuring a... Agent: Asml Netherlands B.v.

20150085268 - Extreme ultraviolet lithography process and mask: A system of an extreme ultraviolet lithography (EUVL) is disclosed. an extreme ultraviolet lithography (EUVL) system includes an extreme ultraviolet (EUV) reflection-type mask having a patterned flare-suppressing-by-phase-shifting (FSbPhS) layer disposed over a patterned absorption layer. The system also includes a radiation to expose the EUV mask and a projection optics... Agent:

20150085269 - Method and apparatus for locally deforming an optical element for photolithography: The invention relates to a method for locally deforming an optical element for photolithography in accordance with a predefined deformation form comprising: (a) generating at least one laser pulse having at least one laser beam parameter; and (b) directing the at least one laser pulse onto the optical element, wherein... Agent:

20150085271 - Projection exposure apparatus and method for controlling a projection exposure apparatus: A method is provided for controlling a projection exposure apparatus for microlithography, embodied as a scanner, in the exposure operation, in which a reticle is moved along a scanning axis with respect to a frame of the projection exposure apparatus such that the reticle is scanned by an illumination field... Agent:

20150085270 - Reflective image-forming optical system, exposure apparatus, and device manufacturing method: A reflective imaging optical system which forms, on a second plane, an image of a pattern arranged on a first plane and illuminated with light from an illumination optical system includes a plurality of reflecting mirrors including first and second reflecting mirrors by which the light reflected by the first... Agent:

20150085272 - Optical system of a microlithographic projection exposure apparatus: The invention relates to an optical system of a microlithographic projection exposure apparatus, in particular for operation in the EUV, comprising at least one polarization-influencing arrangement having a first reflection surface and a second reflection surface, wherein the first reflection surface and the second reflection surface are arranged at an... Agent:

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