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PhotocopyingBelow are recently published patent applications awaiting approval from the USPTO. Recent week's RSS XML file available below.
Listing for abstract view: USPTO application #, Title, Abstract excerpt,Patent Agent. Listing format for list view: USPTO National Class full category number, title of the patent application. 02/05/2015 > 10 patent applications in 5 patent subcategories.
20150036110 - Developing apparatus, developing method and storage medium: A developing apparatus includes: a substrate holder that hold a substrate horizontally; a developer nozzle that supplies a developer onto the substrate to form a liquid puddle; a turning flow generation mechanism including a rotary member that rotates about an axis perpendicular to the substrate while the rotary member is... Agent:
20150036109 - Developing method, developing apparatus and storage medium: A developing method includes: horizontally holding an exposed substrate by a substrate holder; forming a liquid puddle on a part of the substrate, by supplying a developer from a developer nozzle; rotating the substrate; spreading the liquid puddle on a whole surface of the substrate, by moving the developer nozzle... Agent:
20150036113 - Apparatus and method for providing fluid for immersion lithography: An immersion lithography system and method exposes a substrate through a liquid. The substrate is exposed through the liquid, which is provided between a final optical element of a projection lens and the substrate. The liquid is recovered from an upper surface of the substrate via a recovery opening of... Agent:
20150036112 - Exposure apparatus, exposure method, and device manufacturing method: An exposure apparatus that exposes a substrate includes: an optical system that includes an emission surface from which an exposure light is emitted; a first surface that is disposed in at least a part of a surrounding of an optical path of the exposure light emitted from the emission surface;... Agent: Nikon Corporation
20150036111 - Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method: In an exposure station, positional information of a holding member that holds a wafer is measured by a first measurement system including a measurement member, and in a measurement station positional information of the holding member that holds a wafer is measured by a second measurement system including another measurement... Agent:
20150036115 - Illumination optical unit for euv projection lithography: Illumination optical unit for EUV projection lithography guides illumination light to an object field. The illumination optical unit has a first facet mirror, which comprises a multiplicity of individual mirrors which can be switched between at least two tilt positions. A second facet mirror of the illumination optical unit is... Agent:
20150036114 - Optoelectronic module with improved optical system: The invention relates to an optoelectronic module (112), more particularly to an optoelectronic chip-on-board module (114). The optoelectronic module (112) comprises a substrate (116), wherein the substrate (116) has a planar design. Furthermore, the optoelectronic module (112) comprises a plurality of optoelectronic components (118) that are arranged on the substrate... Agent: Heraeus Noblelight Gmbh
20150036116 - Aperture for photolithography: An aperture is configured to be disposed between an illumination source and a semiconductor substrate in a photolithography system. The aperture includes a light-transmission portion with a non-planar thickness profile to compensate the discrepancy of wave-fronts of the light beams of different orders.... Agent: United Microelectronics Corp.
20150036117 - Maskless nanoimprint lithography: A method for creating a nanoimprint lithography template includes exposing (600) a mass transport layer of material adjacent to a support substrate to electromagnetic radiation in a predetermined pattern to form a nanoimprint lithography template in the mass transport layer.... Agent: University Of Utah
20150036118 - Pattern forming apparatus and pattern forming method, movable body drive system and movable body drive method, exposure apparatus and exposure method, and device manufacturing method: A partial section of an aerial image measuring unit is arranged at a wafer stage and part of the remaining section is arranged at a measurement stage, and the aerial image measuring unit measures an aerial image of a mark formed by a projection optical system. Therefore, for example, when... Agent:01/29/2015 > 10 patent applications in 4 patent subcategories.
20150029476 - Projection optical system, exposure apparatus, and exposure method: An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element... Agent:
20150029478 - Fuel stream generator, source collector apparatus and lithographic apparatus: A fuel stream generator comprising a nozzle connected to a fuel reservoir, wherein the nozzle is provided with a gas inlet configured to provide a sheath of gas around fuel flowing along the nozzle is disclosed. Also disclosed are a method of generating fuel droplets and a lithography apparatus incorporating... Agent: Asml Netherlands B.v.
20150029481 - Method of operating a patterning device and lithographic apparatus: A lithographic reticle is illuminated to transfer a pattern to a substrate, inducing distortions due to heating. The distortions are calculated using reference marks in a peripheral portion of the reticle and measuring changes in their relative positions over time. A plurality of cells are defined for which a system... Agent: Asml Netherlands B.v.
20150029477 - Optical system for a microlithographic projection exposure apparatus: An optical system for a microlithographic projection exposure apparatus has an optical axis, at least one mirror arrangement having a plurality of mirror elements that are adjustable independently of one another for altering an angular distribution of the light reflected by the mirror arrangement, and a deflection device which includes,... Agent:
20150029480 - Optical system of a microlithographic projection exposure apparatus: An optical system of a microlithographic projection exposure apparatus comprises at least one mirror arrangement, having a plurality of mirror elements which are adjustable independently of one another for varying an angular distribution of the light reflected by the mirror arrangement, a polarization-influencing optical arrangement, by which, for a light... Agent:
20150029479 - Projection exposure method and projection exposure apparatus for microlithography: A projection exposure method for exposing a radiation-sensitive substrate with at least one image of a pattern of a mask is provided. The method includes determining at least one light quiver parameter which describes a property of a light quiver, and controlling the operation of the projection exposure apparatus taking... Agent:
20150029483 - Exposure device, exposure method and method of manufacturing semiconductor device: The present invention provides a highly controllable device for exposure from the back side and an exposure method, and also provides a method of manufacturing a semiconductor device using the same. The present invention involves exposure with the use of the back side exposure device of which a reflecting means... Agent: Semiconductor Energy Laboratory Co., Ltd.
20150029482 - Projection optical system, exposure apparatus, and exposure method: An immersion projection optical system having, for example, a catadioptric and off-axis structure, reduces the portion of an image space filled with liquid (immersion liquid). The projection optical system, which projects a reduced image of a first plane onto a second plane through the liquid, includes a refractive optical element... Agent:
20150029484 - Stage apparatus, lithography apparatus and method of manufacturing article: The present invention provides a stage apparatus which holds a substrate, including a first moving stage, a second moving stage supported by the first moving stage, a linear motor including a coil arranged on the first moving stage, and a magnet arranged on the second moving stage in correspondence with... Agent:
20150029485 - Substrate holder and method of manufacturing a substrate holder: An object holder (100) for a lithographic apparatus has a main body (400) having a surface (400a). A plurality of burls (406) to support an object are formed on the surface or in apertures of a thin-film stack (410, 440, 450). At least one of the burls is formed by... Agent: Asml Netherlands B.v.01/22/2015 > 10 patent applications in 5 patent subcategories.
20150022790 - Continuously producing digital micro-scale patterns on a thin polymer film: A coating mechanism disposes a liquid (e.g., polymer) thin film onto a conveyor surface (e.g., roller or belt) that is moved by a suitable motor to convey the thin film into a precisely controlled gap (or nip) region where applied potentials generate an electric field that causes the liquid to... Agent:
20150022791 - Exposure apparatus and transfer characteristics measuring method: According to one embodiment, an exposure apparatus includes a light blocking unit that blocks an exposure light reflected on a reflective mask at a part other than an aperture; a detection unit that measures a light intensity of the exposure light passed through the light blocking unit; and a calculation... Agent: Kabushiki Kaisha Toshiba
20150022792 - Microlithographic apparatus and method of changing an optical wavefront in such an apparatus: A microlithographic apparatus comprises an optical wavefront manipulator. The latter includes an optical element and a gas-tight cavity that is partly confined by the optical element or contains it. A gas inlet device directs a gas jet towards the optical element. The location, where the gas jet impinges on the... Agent:
20150022793 - Lithography apparatus, lithography method, lithography system, storage medium, and article manufacturing method: Provided is a lithography apparatus that includes a plurality of patterning devices each of which is configured to perform patterning for a substrate supplied from a preprocessing apparatus; and a controller configured to control the plurality of patterning devices such that a plurality of substrates respectively belonging to a plurality... Agent:
20150022794 - Semiconductor device manufacturing method and semiconductor device manufacturing apparatus: A method of manufacturing a semiconductor device includes: preparing a wafer member, the wafer member including a wafer, a conductive layer formed on a surface of the wafer and a negative photoresist formed on the conductive layer; applying a light blocking material so as to cover at least a part... Agent: Lapis Semiconductor Co., Ltd.
20150022798 - Illumination system for microlithography: A raster arrangement includes first and second types of raster elements which have different bundle-influencing effects. There is a distance step between a first raster area and a second raster area. The first raster area comprises a raster element of the first raster element type. The second raster area includes... Agent:
20150022796 - Interferometer, lithography apparatus, and method of manufacturing article: An interferometer includes: an optical system configured to generate interfering light by dividing light from a light source, and combining reference light and measurement light; a detector configured to detect the interfering light generated by the optical system; and an optical member configured to give spatial coherence to the light... Agent:
20150022797 - Lithography apparatus, lithography method, and article manufacturing method: Provided is a lithography apparatus which forms a pattern on a substrate that includes a detector configured to detect a mark formed on the substrate; a controller configured to obtain a displacement amount of a position of the mark from a reference position thereof based on an output of the... Agent:
20150022795 - Power supply for a discharge produced plasma euv source: A power supply for providing HV power to a lithography illumination source comprising a HV power source arranged to provide the HV power, a HV power transmission line arranged to transmit the HV energy from the HV power source and one or more RF terminations provided on one or more... Agent: Asml Netherlands B.v.
20150022799 - Microlithographic imaging optical system including multiple mirrors: An imaging optical system includes a plurality of mirrors configured to image an object field in an object plane of the imaging optical system into an image field in an image plane of the imaging optical system. An illumination system includes such an imaging optical system. The transmission losses of... Agent:01/15/2015 > 12 patent applications in 5 patent subcategories.
20150015856 - Lithographic apparatus and device manufacturing method: A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to... Agent: Asml Netherlands B.v.
20150015858 - Lithographic apparatus and device manufacturing method: Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from... Agent: Carl Zeiss Smt Ag
20150015857 - Lithographic apparatus, drying device, metrology apparatus and device manufacturing method: An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface.... Agent: Asml Netherlands B.v.
20150015859 - Digital exposure device using digital micro-mirror device and a method for controlling the same: Provided is a digital exposure device. The digital exposure device includes a stage mounted with a substrate on which a pattern is formed, a first light source, a first head, and a digital micro-mirror device control unit. The stage is configured to move in a scan direction. The first light... Agent: Samsung Display Co., Ltd.
20150015860 - Reticles, and methods of mitigating asymmetric lens heating in photolithography: A method of mitigating asymmetric lens heating in photolithographically patterning a photo-imageable material using a reticle includes determining where first hot spot locations are expected to occur on a lens when using a reticle to pattern a photo-imageable material. The reticle is then fabricated to include non-printing features within a... Agent:
20150015861 - Calibration method, measurement apparatus, exposure apparatus, and method of manufacturing article: The present invention provides a method for calibrating an encoder which includes a scale and a light receiving unit configured to receive light reflected by the scale, and detects a change in relative position between the scale and the light receiving unit, the method comprising a measurement step of measuring... Agent:
20150015865 - Illumination intensity correction device for predefining an illumination intensity over an illumination field of a lithographic projection exposure apparatus: An illumination intensity correction device serves for predefining an illumination intensity over an illumination field of a lithographic projection exposure apparatus. The correction device has a plurality of bar-shaped individual stops arranged alongside one another and having bar axes arranged parallel to one another, which are arranged in a manner... Agent:
20150015862 - Illumination optical unit for projection lithography: An illumination optical unit for projection lithography illuminates an illumination field with illumination light of a primary light source. The illumination optical unit has a raster arrangement to predefine a shape of the illumination field, a transfer optical unit for the superimposing transfer of the illumination light toward the illumination... Agent:
20150015864 - Projection exposure apparatus for microlithography for the production of semiconductor components: A projection exposure apparatus for microlithography for the production of semiconductor components includes at least one optical assembly with at least one optical element which can be actuated in a mechanically controlled manner is mounted in a structure. For carrying out the mechanical actuation, a control signal transmission device and/or... Agent:
20150015863 - Radiation source and lithographic apparatus: The present invention provides a method of monitoring the operation of a radiation source fuel droplet stream generator comprising a fuel-containing capillary and a piezo-electric actuator (500). The method comprises analysing the resonance frequency spectrum of a system comprising the fuel-containing capillary and the piezo-electric actuator in particular to look... Agent: Asml Netherland B.v.
20150015866 - Radiating device and media exposure device: This invention relates to a media exposing device for exposing media. The media exposure device includes a holding structure; a substrate having a plurality of diodes mounted thereon; and a radiation modification element for modifying the radiation emitted by the diodes. The substrate and the radiation modification element are secured... Agent:
20150015867 - Method and apparatus for forming pattern: There is provided a pattern forming apparatus which transfers a paste to a predetermined position of a pattern forming object fixed to a table through a pattern forming mask having opening portions at predetermined positions using a discharge mechanism part. To realize a pattern forming which allows the stable forming... Agent:Previous industry: Optics: image projectors
Next industry: Optics: measuring and testing
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