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Method and apparatus of electrophoretic deposition

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Method and apparatus of electrophoretic deposition


A method of electrophoretic deposition includes: providing an electrophoresis tank, an anode substrate, and a cathode substrate; disposing the anode substrate and the cathode substrate oppositely in the electrophoresis tank; adjusting relative positions of the cathode substrate and the anode substrate for varying each of the distances between corresponding regions on the cathode substrate and the anode substrate; and inputting cathode voltage and anode voltage respectively to a cathode electrode of the cathode substrate and a anode electrode of the anode substrate for performing the electrophoretic deposition.

Inventors: Wen-Ching Shih, Jian-Min Jeng, Yu-Hao Chen, Mei-Tsao Chiang, Huai-An Li
USPTO Applicaton #: #20120298508 - Class: 204471 (USPTO) - 11/29/12 - Class 204 
Chemistry: Electrical And Wave Energy > Non-distilling Bottoms Treatment >Electrophoresis Or Electro-osmosis Processes And Electrolyte Compositions Therefor When Not Provided For Elsewhere >Coating Or Forming Of Object

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The Patent Description & Claims data below is from USPTO Patent Application 20120298508, Method and apparatus of electrophoretic deposition.

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BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a method and an apparatus of electrophoretic deposition, and more particularly, to a method and an apparatus of electrophoretic deposition improving the uniformity of the electrophoretic deposition while a voltage distribution of electrodes is non-uniform.

2. Description of the Prior Art

Electrophoresis is a reaction that charged particles in an electrophoresis buffer may move toward two electrode substrates with opposite charges under an effect of an electric field. Materials carried by the charged particles may gather on the electrode substrate for forming a coating layer in the electrophoresis buffer called an electrophoretic deposition.

The electrophoretic deposition may be employed for depositing coating materials, metal oxides, and fluorescent powders. In recent years, related technologies and applications of carbon nanotubes (CNT) have been rapidly developed, and the electrophoretic deposition also has been employed for depositing CNT films. Electrophoresis in the electrophoresis buffer is driven by the electrical field between two electrodes. Uniformity of the electrophoretic deposition may be difficult to control because the voltage drop issue on the electrode may be serious, especially when the pattern of the electrode is linear or when the area of the electrode is enlarged. The voltage distribution of different regions on the electrode may become non-uniform, and the uniformity of the electrophoretic deposition may be therefore affected. Display quality and manufacturing yield of a display device, such as a large-sized display device, may be affected when the electrophoretic deposition is employed for forming material layers in the display device.

SUMMARY

OF THE INVENTION

It is one of the objectives of the present invention to provide a method and an apparatus of electrophoretic deposition for improving the non-uniform distribution of voltage caused by the shape and the size of the electrodes and the uniformity of the electrophoretic deposition may then be enhanced.

To achieve the purposes described above, a preferred embodiment of the present invention provides a method of electrophoretic deposition. The method of the electrophoretic deposition includes the following steps. First, an electrophoresis tank, an anode substrate, and a cathode substrate are provided. The electrophoresis tank contains an electrophoresis buffer. The anode substrate includes at least one anode electrode, and the cathode substrate includes at least one cathode electrode. The anode substrate and the cathode substrate are then disposed in the electrophoresis buffer, and the anode substrate and the cathode substrate are disposed oppositely in the electrophoresis tank. Relative positions of the cathode substrate and the anode substrate are adjusted for varying each of the distances between corresponding regions on the cathode substrate and the anode substrate. Cathode voltage and anode voltage are inputted respectively to the cathode electrode of the cathode substrate and to the anode electrode of the anode substrate for performing the electrophoretic deposition.

To achieve the purposes described above, another preferred embodiment of the present invention provides a method of electrophoretic deposition. The method of the electrophoretic deposition includes the following steps. First, an electrophoresis tank, an anode substrate, and a cathode substrate are provided. The electrophoresis tank contains an electrophoresis buffer. The anode substrate includes a plurality of anode electrodes, and the cathode substrate includes at least one cathode electrode. The anode substrate and the cathode substrate are then disposed in the electrophoresis buffer, and the anode substrate and the cathode substrate are disposed oppositely and parallel to each other in the electrophoresis tank. Cathode voltage is inputted to the cathode electrode of the cathode substrate, and anode voltage with different values is inputted respectively to each of the anode electrodes of the anode substrate for performing the electrophoretic deposition.

To achieve the purposes described above, a preferred embodiment of the present invention provides an apparatus of electrophoretic deposition. The apparatus of the electrophoretic deposition includes a power supply, an electrophoresis tank, a cathode substrate, and an anode substrate. The power supply includes an anode terminal and a cathode terminal. The electrophoresis tank is used to contain an electrophoresis buffer. The cathode substrate is disposed in the electrophoresis tank. The cathode substrate includes at least one cathode electrode electrically connected to the cathode terminal of the power supply. The anode substrate is disposed correspondingly to the cathode substrate in the electrophoresis tank. The anode substrate includes at least one anode electrode electrically connected to the anode terminal of the power supply. The anode substrate is disposed tiltedly toward the cathode substrate, and a distance between one region on the anode substrate and a corresponding region on the cathode substrate is different from a distance between another region on the anode substrate and another corresponding region on the cathode substrate.

To achieve the purposes described above, another preferred embodiment of the present invention provides an apparatus of electrophoretic deposition. The apparatus of the electrophoretic deposition includes a power supply, an electrophoresis tank, a cathode substrate, and an anode substrate. The power supply includes a plurality of anode terminals and a cathode terminal. The electrophoresis tank is used to contain an electrophoresis buffer. The cathode substrate is disposed in the electrophoresis tank. The cathode substrate includes at least one cathode electrode electrically connected to the cathode terminal of the power supply. The anode substrate is disposed parallel to the cathode substrate in the electrophoresis tank. The anode substrate includes a plurality of anode electrodes electrically connected to the anode terminals of the power supply respectively. Each of the anode terminals is employed for providing anode voltage with different values to each of the anode electrodes, and the cathode terminal is employed for providing cathode voltage to the cathode electrode.

In the present invention, the distances between regions on two electrode substrates may be adjusted and a plurality of anode electrodes may be employed for compensating the voltage drop issue on the cathode substrate. The problem caused by the non-uniform distribution of voltage on the cathode substrate due to the effect of the voltage drop may be improved, and the uniformity of the electrophoretic deposition rate may then be enhanced.

These and other objectives of the present invention will no doubt become obvious to those of ordinary skill in the art after reading the following detailed description of the preferred embodiment that is illustrated in the various figures and drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a cross-sectional view diagram illustrating an apparatus of electrophoretic deposition according to a preferred embodiment of the present invention.

FIG. 2 is a stereoscopic view diagram illustrating an apparatus of electrophoretic deposition according to a preferred embodiment of the present invention.

FIG. 3 is a schematic diagram illustrating a cathode substrate of an apparatus of electrophoretic deposition according to another preferred embodiment of the present invention.

FIG. 4 is a cross-sectional view diagram illustrating an apparatus of electrophoretic deposition according to further another preferred embodiment of the present invention.

FIG. 5 is a stereoscopic view diagram illustrating an apparatus of electrophoretic deposition according to further another preferred embodiment of the present invention.

FIG. 6 is a schematic diagram illustrating an anode substrate of an apparatus of electrophoretic deposition according to further another preferred embodiment of the present invention.

DETAILED DESCRIPTION



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stats Patent Info
Application #
US 20120298508 A1
Publish Date
11/29/2012
Document #
13225494
File Date
09/05/2011
USPTO Class
204471
Other USPTO Classes
204622
International Class
25D13/00
Drawings
7



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