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Endoscope gas-supply system

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Endoscope gas-supply system


Provided is an endoscope gas-supply system which enables to measure the intraluminal pressure of a human lumen unaffectedly by body motions, and to stably perform automatic gas supply into the lumen. In the endoscope gas-supply system, a gas-supply duct for automatic gas supply from a gas-supply apparatus into the lumen includes a buffer tank which has a predetermined volume. The intraluminal pressure of the lumen is indirectly obtained from a result of measurement of a pressure sensor in the gas-supply apparatus, and pressure control is performed such that the intraluminal pressure of the lumen becomes a set value. At this time, intraluminal pressure fluctuation due to volume variation of the lumen is absorbed at the buffer tank, so the pressure sensor can perform pressure measurement stably, and stabilization of automatic gas supply into the lumen can be achieved.
Related Terms: Intraluminal

Browse recent Fujifilm Corporation patents - Tokyo, JP
Inventor: Nobuyuki TORISAWA
USPTO Applicaton #: #20120277532 - Class: 600118 (USPTO) - 11/01/12 - Class 600 
Surgery > Endoscope >With Control Or Monitoring Of Endoscope Functions

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The Patent Description & Claims data below is from USPTO Patent Application 20120277532, Endoscope gas-supply system.

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BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to an endoscope gas-supply system, and in particular to an endoscope gas-supply system to supply predetermined gas through a gas-supply tube into a lumen of a subject.

2. Description of the Related Art

In recent years, a technique to observe and treat a site intended to be treated in a human lumen (for example, the stomach, large intestine, esophagus, or the like) with an insertion unit of an endoscope inserted in the lumen has been performed. At this time, for the purpose of securing a region for operating a treatment instrument while securing the field of view of the endoscope, the lumen is inflated by injecting gas into the lumen through a gas-supply tube of the endoscope (for example, see Japanese Patent Application Laid-Open No. 2006-288881). At this time, it is preferred that, as the gas injected in the lumen, carbon dioxide gas bioabsorbed quickly is used in order to relieve patient\'s pain. This makes it possible to perform various treatments while checking a treatment instrument inserted through a treatment instrument channel of the endoscope while observing the site intended to be treated in the lumen.

In a conventional endoscope gas-supply system, however, the gas injection into the lumen is performed typically by manual operation of an operator, so that frequent operation is required in order to keep the luminal pressure constant. Therefore, there is the problem that the operation burden on the operator is great.

On the other hand, in a laparoscopic surgical operation, in order to secure the field of view of the endoscope or a treatment space, a gas-supply apparatus is used which performs automatic gas supply to the abdominal cavity while performing pressure control such that the intra-abdominal pressure is kept constant, while measuring the intra-abdominal pressure from a pneumoperitoneum apparatus through an insertion instrument for pneumoperitoneum, such as a pneumoperitoneum needle or a trocar, inserted in the abdomen of a patient (for example, see Japanese Patent Application Laid-Open No. 2003-250886).

SUMMARY

OF THE INVENTION

A luminal volume is much smaller than an abdominal volume (about three liters), for example, the esophagus is 80 cc in volume and the stomach is 1500 cc in volume, and the percentage of luminal volume variation due to body motions caused by breathing and the like is very high. Therefore, if the gas-supply apparatus used in the laparoscopic surgical operation is used as it is, stable pressure measurement cannot be made because of a significant negative effect from the luminal volume variation, which results in the problem that the behavior of the system easily becomes unstable.

The present invention has been made in these circumstances, and an object thereof is to provide an endoscope gas-supply system that is not affected by body motions when measuring the intraluminal pressure of a lumen so that stabilization of automatic gas supply into the lumen can be achieved.

In order to achieve the above object, an endoscope gas-supply system according to a first aspect of the present invention is endoscope gas-supply system which supplies gas from a gas supply source into a lumen of a living body, the endoscope gas-supply system comprising: a gas-supply duct which supplies gas from the gas supply source into the lumen of the living body; a pressure regulation device which regulates a pressure of the gas supplied from the gas supply source; a pressure measurement device which measures an intraluminal pressure of the lumen through the gas-supply duct; a setting device which sets a set value of the intraluminal pressure of the lumen; a pressure control device which controls the pressure of the gas regulated by the pressure regulation device based on a result of the measurement by the pressure measurement device such that the intraluminal pressure of the lumen becomes the set value set by the setting device; and a buffer tank which is provided in the gas-supply duct and which temporarily stores the gas flowing through the gas-supply duct.

According to the first aspect, the intraluminal pressure fluctuation due to volume variation of the lumen can be absorbed effectively by the buffer tank, and the pressure measurement device can measure the intraluminal pressure of the lumen stably and reliably through the gas-supply duct. This makes it possible to supply the gas regulated to a predetermined pressure stably into the lumen, thereby reducing the operation burden on the operator.

An endoscope gas-supply system according to a second aspect of the present invention is the endoscope gas-supply system according to the first aspect of the present invention, wherein the pressure regulation device is provided in the gas-supply duct.

According to the second aspect, it becomes possible to regulate the pressure of the gas supplied from the gas supply source through the gas-supply duct.

An endoscope gas-supply system according to a third aspect of the present invention is the endoscope gas-supply system according to the first or second aspect of the present invention, wherein the buffer tank is larger in volume than the lumen.

According to the third aspect, it becomes possible to improve the effect of the buffer tank to absorb the intraluminal pressure fluctuation due to volume variation of the lumen.

An endoscope gas-supply system according to a fourth aspect of the present invention is the endoscope gas-supply system according to any one of the first to third aspects of the present invention, wherein the buffer tank is a variable volume buffer tank which increases and decreases in volume according to the volume of the lumen.

According to the fourth aspect, since the volume of the buffer tank increases or decreases according to the volume of the lumen, it become possible to optimize control of the pressure of the gas supplied into the lumen.

An endoscope gas-supply system according to a fifth aspect of the present invention is the endoscope gas-supply system according to any one of the first to fourth aspects of the present invention, wherein the buffer tank has a gas-liquid separation structure which separates gas and liquid flowing through the gas-supply duct from each other.

According to the fifth aspect, since luminal contents (for example, filth, residues, or the like) flowing back through the gas-supply duct are trapped in the buffer tank, it becomes possible to prevent the luminal contents from entering an upstream side (a gas supply source side) of the gas-supply duct beyond the buffer tank. This makes it possible to perform stable gas supply into the lumen.

An endoscope gas-supply system according to a sixth aspect of the present invention is the endoscope gas-supply system according to any one of the first to fifth aspects of the present invention, further including a gas-supply device which supplies at least an amount of the gas equal to a volume of the gas-supply duct between the buffer tank and the lumen, before the pressure measurement device performs the pressure measurement.

According to the sixth aspect, the pressure measurement device can perform the pressure measurement stably without being affected by intraluminal contents flowing back through the gas-supply duct.

An endoscope gas-supply system according to a seventh aspect of the present invention is the endoscope gas-supply system according to any one of the first to sixth aspects of the present invention, further including a duct resistance varying device which can vary a ratio of a first duct resistance being a resistance of the gas-supply duct on a gas supply source side with respect to the buffer tank, to a second duct resistance being a resistance of the gas-supply duct on a lumen side with respect to the buffer tank.

An endoscope gas-supply system according to an eighth aspect of the present invention is the endoscope gas-supply system according to the seventh aspect of the present invention, further including a duct resistance control device which determines whether or not the intraluminal pressure of the lumen is more than a predetermined threshold value, and which controls the duct resistance varying device so as to make the first duct resistance higher than the second duct resistance when the intraluminal pressure of the lumen is more than the predetermined threshold value.

An endoscope gas-supply system according to a ninth aspect of the present invention is the endoscope gas-supply system according to the eighth aspect of the present invention, wherein the duct resistance control device controls the duct resistance varying device so as to make the first duct resistance lower than the second duct resistance when the intraluminal pressure of the lumen is equal to or less than the predetermined threshold value.

According to the seventh to ninth aspects of the present invention, it becomes possible to stably supply the gas regulated to a predetermined pressure into the lumen, thereby reducing the operation burden on the operator.

Further, in order to achieve the above object, an endoscope gas-supply system according to a tenth aspect of the present invention is an endoscope gas-supply system which supplies gas from a gas supply source into a lumen of a living body, the endoscope gas-supply system including: a gas-supply duct for supplying gas from the gas supply source into the lumen of the living body; a pressure regulation device which regulates a pressure of the gas supplied from the gas supply source; a buffer tank which is provided in the gas-supply duct on a lumen side with respect to the pressure regulation device and which temporarily stores the gas flowing through the gas-supply duct; a pressure measurement device which measures an internal pressure of the buffer tank; a setting device which sets a set value of the intraluminal pressure of the lumen; and a pressure control device which calculates the intraluminal pressure of the lumen from a result of the measurement by the pressure measurement device, and which controls the pressure of the gas regulated by the pressure regulation device such that the intraluminal pressure of the lumen becomes the set value set by the setting device, wherein a first duct resistance of the gas-supply duct on a gas supply source side with respect to the buffer tank is larger than a second duct resistance of the gas-supply duct on a lumen side with respect to the buffer tank.

According to the tenth aspect, the intraluminal pressure fluctuation due to volume variation of the lumen can be effectively absorbed in the buffer tank, and the pressure measurement device can measure the intraluminal pressure of the lumen through the gas-supply duct stably and accurately. In particular, since the first duct resistance of the gas-supply duct between the buffer tank and the gas supply source is made larger than the second duct resistance of the gas-supply duct between the buffer tank and the lumen in the case where the intraluminal pressure of the lumen is measured indirectly by measuring the internal pressure of the buffer tank, it become possible to control the intraluminal pressure of the lumen reliably while reducing a negative effect from the gas supply. This makes it possible to stably supply the gas regulated to a predetermined pressure into the lumen, thereby reducing the operation burden on the operator.

An endoscope gas-supply system according to an eleventh aspect of the present invention is the endoscope gas-supply system according to the tenth aspect of the present invention, further including a duct resistance varying device which can vary a ratio of the first duct resistance to the second duct resistance; and a duct resistance control device which determines whether or not the intraluminal pressure of the lumen is more than a predetermined threshold value, and which controls the duct resistance varying device so as to make the first duct resistance larger than the second duct resistance when the intraluminal pressure of the lumen is more than the predetermined threshold value.

According to the eleventh aspect, since control is made such that the first duct resistance becomes larger than the second duct resistance, depending on the intraluminal pressure of the lumen, it becomes possible to perform the intraluminal pressure control more stably and reliably, thereby significantly reducing the operation burden on the operator.

An endoscope gas-supply system according to a twelfth aspect of the present invention is the endoscope gas-supply system according to the eleventh aspect of the present invention, wherein the duct resistance control device controls the duct resistance varying device so as to make the first duct resistance smaller than the second duct resistance when the intraluminal pressure of the lumen is equal to or less than the predetermined threshold value.

According to the twelfth aspect, since the first duct resistance is made smaller than the second duct resistance when the intraluminal pressure of the lumen is equal to or less than the predetermined threshold value (namely, an initial stage of starting gas supply into the lumen), it become possible to improve the rate of gas supply into the lumen.

An endoscope gas-supply system according to thirteenth aspect of the present invention is the endoscope gas-supply system according to the eleventh or twelfth aspect of the present invention, wherein the duct resistance varying device includes: a plurality of ducts with different duct resistances from each other, the plurality of ducts being arranged in parallel with each other and connected to the gas-supply duct; and a selector valve which can selectively switch among the plurality of ducts so as to make one of the plurality of ducts communicate with the gas-supply duct, and the duct resistance varying device controls the selector valve to cause a desired one of the plurality of ducts to communicate with the gas-supply duct. According to the thirteenth aspect, the duct resistance of the gas-supply duct can be easily varied by selecting one from the plurality of ducts.

An endoscope gas-supply system according to fourteenth aspect of the present invention is the endoscope gas-supply system according to the eleventh or twelfth aspect of the present invention, wherein: the duct resistance varying device includes a control valve which can vary the cross-sectional area of the gas-supply duct; and the duct resistance control device controls the control valve such that the duct resistance of the gas-supply duct becomes a desired value.

According to the fourteenth aspect, since the duct resistance of the gas-supply duct can be varied by varying the cross-sectional area of the control valve, space saving can be achieved as compared with the case where switching among the duct resistances is performed through the use of the plurality of ducts.

An endoscope gas-supply system according to fifteenth aspect of the present invention is the endoscope gas-supply system according to any one of the eleventh to fourteenth aspects of the present invention, wherein the duct resistance varying device is provided in the gas-supply duct on a gas supply source side with respect to the buffer tank.

An endoscope gas-supply system according to sixteenth aspect of the present invention is the endoscope gas-supply system according to any one of the eleventh to fourteenth aspects of the present invention, wherein the duct resistance varying device is provided in the gas-supply duct on a lumen side with respect to the buffer tank.

Like the fifteenth and sixteenth aspects, the duct resistance varying device may be disposed in the gas-supply duct between the buffer tank and the gas supply source, or may be disposed in the gas-supply duct between the buffer tank and the lumen. In each case, it is possible to vary the ratio of the first duct resistance to the second duct resistance, thereby achieving stable pressure control.

An endoscope gas-supply system according to a seventeenth aspect of the present invention is the endoscope gas-supply system according to any one of the tenth to sixteenth aspects of the present invention, wherein the pressure regulation device is provided in the gas-supply duct.

According to the seventeenth aspect, it becomes possible to regulate the pressure of the gas supplied from the gas supply source through the gas-supply duct.

An endoscope gas-supply system according to an eighteenth aspect of the present invention is the endoscope gas-supply system according to any one of the tenth to seventeenth aspects of the present invention, wherein the buffer tank is larger in volume than the lumen.

According to the eighteenth aspect, becomes possible to improve the effect from the buffer tank of reducing the intraluminal pressure fluctuation due to volume variation of the lumen.

According to the present invention, since the intraluminal pressure fluctuation due to volume variation of the lumen can be absorbed effectively in the buffer tank, the pressure measurement device can measure the intraluminal pressure of the lumen stably and reliably through the gas-supply duct. This makes it possible to stably supply the gas regulated to a predetermined pressure into the lumen, thereby reducing the operation burden on the operator.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a schematic view showing the configuration of an endoscope gas-supply system according to a first embodiment;

FIG. 2 is a perspective view showing a distal end portion of an insertion unit of the endoscope shown in FIG. 1;

FIG. 3 is a side sectional view showing the configuration of an insertion aid shown in FIG. 1;

FIG. 4 is a configuration diagram showing the internal configuration of an gas-supply apparatus shown in FIG. 1;

FIG. 5 is a schematic view showing a first configuration example of a variable volume buffer tank;

FIG. 6 is a schematic view showing a second configuration example of the variable volume buffer tank;

FIG. 7 is a schematic view showing a third configuration example of the variable volume buffer tank;

FIG. 8 is a schematic view showing the configuration of an endoscope gas-supply system according to a second embodiment;

FIG. 9 is a perspective view showing a distal end portion of an insertion unit of the endoscope shown in FIG. 8;

FIG. 10 is a schematic view showing the configuration of an endoscope gas-supply system according to a third embodiment;

FIGS. 11A and 11B are conceptual diagrams showing a difference in effectiveness when duct resistance is variable; and



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stats Patent Info
Application #
US 20120277532 A1
Publish Date
11/01/2012
Document #
13452796
File Date
04/20/2012
USPTO Class
600118
Other USPTO Classes
International Class
61B1/015
Drawings
13


Intraluminal


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